JP2007294410A - 電子銃及び電子線装置 - Google Patents
電子銃及び電子線装置 Download PDFInfo
- Publication number
- JP2007294410A JP2007294410A JP2007038804A JP2007038804A JP2007294410A JP 2007294410 A JP2007294410 A JP 2007294410A JP 2007038804 A JP2007038804 A JP 2007038804A JP 2007038804 A JP2007038804 A JP 2007038804A JP 2007294410 A JP2007294410 A JP 2007294410A
- Authority
- JP
- Japan
- Prior art keywords
- cathode
- dac
- emittance
- luminance
- electron gun
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010894 electron beam technology Methods 0.000 title claims description 12
- 238000000605 extraction Methods 0.000 claims description 50
- 230000007423 decrease Effects 0.000 claims description 12
- 238000002834 transmittance Methods 0.000 claims description 6
- 235000019557 luminance Nutrition 0.000 description 174
- 230000003287 optical effect Effects 0.000 description 49
- 238000004088 simulation Methods 0.000 description 42
- 230000000694 effects Effects 0.000 description 8
- 238000000034 method Methods 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 7
- 230000007547 defect Effects 0.000 description 5
- 230000004075 alteration Effects 0.000 description 4
- 238000009826 distribution Methods 0.000 description 4
- 230000014509 gene expression Effects 0.000 description 4
- 238000003384 imaging method Methods 0.000 description 4
- 238000007689 inspection Methods 0.000 description 4
- 230000002093 peripheral effect Effects 0.000 description 4
- 230000009467 reduction Effects 0.000 description 4
- 230000000630 rising effect Effects 0.000 description 4
- 238000001514 detection method Methods 0.000 description 3
- 230000003993 interaction Effects 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 229910025794 LaB6 Inorganic materials 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000010354 integration Effects 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 230000008094 contradictory effect Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 229910052743 krypton Inorganic materials 0.000 description 1
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Images
Landscapes
- Electron Sources, Ion Sources (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007038804A JP2007294410A (ja) | 2006-03-29 | 2007-02-20 | 電子銃及び電子線装置 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006119800 | 2006-03-29 | ||
| JP2007038804A JP2007294410A (ja) | 2006-03-29 | 2007-02-20 | 電子銃及び電子線装置 |
Related Child Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008176680A Division JP2008251547A (ja) | 2006-03-29 | 2008-07-07 | 電子銃 |
| JP2008329019A Division JP2009064792A (ja) | 2006-03-29 | 2008-12-25 | 電子銃及び電子線装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2007294410A true JP2007294410A (ja) | 2007-11-08 |
| JP2007294410A5 JP2007294410A5 (enExample) | 2008-08-14 |
Family
ID=38764798
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007038804A Pending JP2007294410A (ja) | 2006-03-29 | 2007-02-20 | 電子銃及び電子線装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2007294410A (enExample) |
-
2007
- 2007-02-20 JP JP2007038804A patent/JP2007294410A/ja active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US10879031B2 (en) | Apparatus of plural charged-particle beams | |
| KR101921351B1 (ko) | 집속 전자 빔 장치의 처리량을 향상시키는 다중 극 정전 편향기 | |
| JP4685115B2 (ja) | 電子ビーム露光方法 | |
| JP3658235B2 (ja) | 電子銃および電子銃を用いた描画装置および電子線応用装置 | |
| CN117396995B (zh) | 产生多个电子束的系统及方法 | |
| US20220367140A1 (en) | High throughput multi-electron beam system | |
| JP5065903B2 (ja) | 露光方法 | |
| JP2000012438A (ja) | マルチ電子ビーム露光方法及び装置、ならびにデバイス製造方法 | |
| US12494339B2 (en) | High resolution, multi-electron beam apparatus | |
| US8968045B2 (en) | Cathode selection method | |
| JP4959723B2 (ja) | 電子銃及び電子ビーム露光装置 | |
| US20080156998A1 (en) | Focused Ion Beam Apparatus | |
| US20040113073A1 (en) | Electron beam apparatus | |
| US6822246B2 (en) | Ribbon electron beam for inspection system | |
| JP5159035B2 (ja) | レンズアレイ及び該レンズアレイを含む荷電粒子線露光装置 | |
| JP2012009428A (ja) | 電子銃、電子線描画装置、物品製造方法および電子線装置 | |
| JP2007294410A (ja) | 電子銃及び電子線装置 | |
| JP2009064792A (ja) | 電子銃及び電子線装置 | |
| US20250357066A1 (en) | Electron beam metrology having a source energy spread with filtered tails | |
| JP2006277996A (ja) | 電子線装置及び該装置を用いたデバイス製造方法 | |
| JP3703774B2 (ja) | 荷電ビーム露光装置、荷電ビームを用いた露光方法およびこの露光方法を用いた半導体装置の製造方法 | |
| TWI903085B (zh) | 電子束裝置及產生多個電子束之方法 | |
| CN118302837B (zh) | 成像多电子束的方法及系统 | |
| JP2005158642A (ja) | パターンを評価する方法及びデバイス製造方法 | |
| JP2006278029A (ja) | 電子線装置及び該装置を用いたデバイス製造方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20080627 |
|
| A871 | Explanation of circumstances concerning accelerated examination |
Free format text: JAPANESE INTERMEDIATE CODE: A871 Effective date: 20080630 |
|
| A975 | Report on accelerated examination |
Free format text: JAPANESE INTERMEDIATE CODE: A971005 Effective date: 20080723 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20080805 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20081125 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20081224 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20090302 |
|
| A911 | Transfer to examiner for re-examination before appeal (zenchi) |
Free format text: JAPANESE INTERMEDIATE CODE: A911 Effective date: 20090309 |
|
| A912 | Re-examination (zenchi) completed and case transferred to appeal board |
Free format text: JAPANESE INTERMEDIATE CODE: A912 Effective date: 20090410 |