JP2007284472A - End sealing material - Google Patents
End sealing material Download PDFInfo
- Publication number
- JP2007284472A JP2007284472A JP2006109797A JP2006109797A JP2007284472A JP 2007284472 A JP2007284472 A JP 2007284472A JP 2006109797 A JP2006109797 A JP 2006109797A JP 2006109797 A JP2006109797 A JP 2006109797A JP 2007284472 A JP2007284472 A JP 2007284472A
- Authority
- JP
- Japan
- Prior art keywords
- epoxy resin
- inorganic filler
- average particle
- component
- liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000003566 sealing material Substances 0.000 title abstract description 6
- 239000004850 liquid epoxy resins (LERs) Substances 0.000 claims abstract description 33
- 239000002245 particle Substances 0.000 claims abstract description 27
- 239000011256 inorganic filler Substances 0.000 claims abstract description 26
- 229910003475 inorganic filler Inorganic materials 0.000 claims abstract description 26
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 14
- 150000003961 organosilicon compounds Chemical class 0.000 claims abstract description 13
- 239000004973 liquid crystal related substance Substances 0.000 claims abstract description 10
- 239000000463 material Substances 0.000 claims description 21
- 238000007789 sealing Methods 0.000 claims description 3
- 238000002156 mixing Methods 0.000 abstract description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 4
- 239000000203 mixture Substances 0.000 description 35
- 239000003822 epoxy resin Substances 0.000 description 31
- 229920000647 polyepoxide Polymers 0.000 description 31
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 24
- 238000001723 curing Methods 0.000 description 24
- 229920005989 resin Polymers 0.000 description 16
- 239000011347 resin Substances 0.000 description 16
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 11
- -1 chlorine ions Chemical class 0.000 description 11
- 229920003986 novolac Polymers 0.000 description 10
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 9
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 8
- 239000000047 product Substances 0.000 description 8
- 239000007788 liquid Substances 0.000 description 7
- 239000005011 phenolic resin Substances 0.000 description 7
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 6
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 6
- 239000000377 silicon dioxide Substances 0.000 description 6
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- 125000000524 functional group Chemical group 0.000 description 5
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 5
- LLPKQRMDOFYSGZ-UHFFFAOYSA-N 2,5-dimethyl-1h-imidazole Chemical compound CC1=CN=C(C)N1 LLPKQRMDOFYSGZ-UHFFFAOYSA-N 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 4
- 150000008065 acid anhydrides Chemical class 0.000 description 4
- 239000004305 biphenyl Substances 0.000 description 4
- 235000010290 biphenyl Nutrition 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 239000000460 chlorine Substances 0.000 description 4
- 229910052801 chlorine Inorganic materials 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 229910002027 silica gel Inorganic materials 0.000 description 4
- 239000000741 silica gel Substances 0.000 description 4
- 238000004381 surface treatment Methods 0.000 description 4
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 4
- 229930185605 Bisphenol Natural products 0.000 description 3
- 239000006087 Silane Coupling Agent Substances 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 125000004018 acid anhydride group Chemical group 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 125000003700 epoxy group Chemical group 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 230000001771 impaired effect Effects 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 238000007665 sagging Methods 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 239000012756 surface treatment agent Substances 0.000 description 3
- OQSQRYMTDPLPNY-UHFFFAOYSA-N 1,2-diethylimidazole Chemical compound CCC1=NC=CN1CC OQSQRYMTDPLPNY-UHFFFAOYSA-N 0.000 description 2
- GIWQSPITLQVMSG-UHFFFAOYSA-N 1,2-dimethylimidazole Chemical compound CC1=NC=CN1C GIWQSPITLQVMSG-UHFFFAOYSA-N 0.000 description 2
- CQOZJDNCADWEKH-UHFFFAOYSA-N 2-[3,3-bis(2-hydroxyphenyl)propyl]phenol Chemical compound OC1=CC=CC=C1CCC(C=1C(=CC=CC=1)O)C1=CC=CC=C1O CQOZJDNCADWEKH-UHFFFAOYSA-N 0.000 description 2
- PQAMFDRRWURCFQ-UHFFFAOYSA-N 2-ethyl-1h-imidazole Chemical compound CCC1=NC=CN1 PQAMFDRRWURCFQ-UHFFFAOYSA-N 0.000 description 2
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- TYOXIFXYEIILLY-UHFFFAOYSA-N 5-methyl-2-phenyl-1h-imidazole Chemical compound N1C(C)=CN=C1C1=CC=CC=C1 TYOXIFXYEIILLY-UHFFFAOYSA-N 0.000 description 2
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 2
- 229910002012 Aerosil® Inorganic materials 0.000 description 2
- 229910002014 Aerosil® 130 Inorganic materials 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- UUQQGGWZVKUCBD-UHFFFAOYSA-N [4-(hydroxymethyl)-2-phenyl-1h-imidazol-5-yl]methanol Chemical compound N1C(CO)=C(CO)N=C1C1=CC=CC=C1 UUQQGGWZVKUCBD-UHFFFAOYSA-N 0.000 description 2
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- ZSWFCLXCOIISFI-UHFFFAOYSA-N cyclopentadiene Chemical compound C1C=CC=C1 ZSWFCLXCOIISFI-UHFFFAOYSA-N 0.000 description 2
- 229910021485 fumed silica Inorganic materials 0.000 description 2
- 238000013007 heat curing Methods 0.000 description 2
- 229910010272 inorganic material Inorganic materials 0.000 description 2
- 239000011147 inorganic material Substances 0.000 description 2
- 150000002903 organophosphorus compounds Chemical class 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- MLBZLJCMHFCTQM-UHFFFAOYSA-N (2-methylphenyl)-diphenylphosphane Chemical compound CC1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 MLBZLJCMHFCTQM-UHFFFAOYSA-N 0.000 description 1
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 1
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 1
- RUEBPOOTFCZRBC-UHFFFAOYSA-N (5-methyl-2-phenyl-1h-imidazol-4-yl)methanol Chemical compound OCC1=C(C)NC(C=2C=CC=CC=2)=N1 RUEBPOOTFCZRBC-UHFFFAOYSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- FBHPRUXJQNWTEW-UHFFFAOYSA-N 1-benzyl-2-methylimidazole Chemical compound CC1=NC=CN1CC1=CC=CC=C1 FBHPRUXJQNWTEW-UHFFFAOYSA-N 0.000 description 1
- XZKLXPPYISZJCV-UHFFFAOYSA-N 1-benzyl-2-phenylimidazole Chemical compound C1=CN=C(C=2C=CC=CC=2)N1CC1=CC=CC=C1 XZKLXPPYISZJCV-UHFFFAOYSA-N 0.000 description 1
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 1
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 1
- GQHTUMJGOHRCHB-UHFFFAOYSA-N 2,3,4,6,7,8,9,10-octahydropyrimido[1,2-a]azepine Chemical compound C1CCCCN2CCCN=C21 GQHTUMJGOHRCHB-UHFFFAOYSA-N 0.000 description 1
- RNIPJYFZGXJSDD-UHFFFAOYSA-N 2,4,5-triphenyl-1h-imidazole Chemical compound C1=CC=CC=C1C1=NC(C=2C=CC=CC=2)=C(C=2C=CC=CC=2)N1 RNIPJYFZGXJSDD-UHFFFAOYSA-N 0.000 description 1
- YTWBFUCJVWKCCK-UHFFFAOYSA-N 2-heptadecyl-1h-imidazole Chemical compound CCCCCCCCCCCCCCCCCC1=NC=CN1 YTWBFUCJVWKCCK-UHFFFAOYSA-N 0.000 description 1
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical class [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 1
- 125000006020 2-methyl-1-propenyl group Chemical group 0.000 description 1
- ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1 ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 0.000 description 1
- LLEASVZEQBICSN-UHFFFAOYSA-N 2-undecyl-1h-imidazole Chemical compound CCCCCCCCCCCC1=NC=CN1 LLEASVZEQBICSN-UHFFFAOYSA-N 0.000 description 1
- SESYNEDUKZDRJL-UHFFFAOYSA-N 3-(2-methylimidazol-1-yl)propanenitrile Chemical compound CC1=NC=CN1CCC#N SESYNEDUKZDRJL-UHFFFAOYSA-N 0.000 description 1
- SZUPZARBRLCVCB-UHFFFAOYSA-N 3-(2-undecylimidazol-1-yl)propanenitrile Chemical compound CCCCCCCCCCCC1=NC=CN1CCC#N SZUPZARBRLCVCB-UHFFFAOYSA-N 0.000 description 1
- IWXCYYWDGDDPAC-UHFFFAOYSA-N 4-[(3,4-dicarboxyphenyl)methyl]phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1CC1=CC=C(C(O)=O)C(C(O)=O)=C1 IWXCYYWDGDDPAC-UHFFFAOYSA-N 0.000 description 1
- GEYAGBVEAJGCFB-UHFFFAOYSA-N 4-[2-(3,4-dicarboxyphenyl)propan-2-yl]phthalic acid Chemical compound C=1C=C(C(O)=O)C(C(O)=O)=CC=1C(C)(C)C1=CC=C(C(O)=O)C(C(O)=O)=C1 GEYAGBVEAJGCFB-UHFFFAOYSA-N 0.000 description 1
- VQVIHDPBMFABCQ-UHFFFAOYSA-N 5-(1,3-dioxo-2-benzofuran-5-carbonyl)-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(C=2C=C3C(=O)OC(=O)C3=CC=2)=O)=C1 VQVIHDPBMFABCQ-UHFFFAOYSA-N 0.000 description 1
- ALEBYBVYXQTORU-UHFFFAOYSA-N 6-hydrazinyl-6-oxohexanoic acid Chemical compound NNC(=O)CCCCC(O)=O ALEBYBVYXQTORU-UHFFFAOYSA-N 0.000 description 1
- MWSKJDNQKGCKPA-UHFFFAOYSA-N 6-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1CC(C)=CC2C(=O)OC(=O)C12 MWSKJDNQKGCKPA-UHFFFAOYSA-N 0.000 description 1
- 229910002016 Aerosil® 200 Inorganic materials 0.000 description 1
- 229910002018 Aerosil® 300 Inorganic materials 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- TXOFSCODFRHERQ-UHFFFAOYSA-N N,N-Dimethylphenethylamine Chemical compound CN(C)CCC1=CC=CC=C1 TXOFSCODFRHERQ-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- PJANXHGTPQOBST-VAWYXSNFSA-N Stilbene Natural products C=1C=CC=CC=1/C=C/C1=CC=CC=C1 PJANXHGTPQOBST-VAWYXSNFSA-N 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- 238000003848 UV Light-Curing Methods 0.000 description 1
- ZGACYOKNEKDSNK-UHFFFAOYSA-N ac1mjht3 Chemical compound C1CC2(C)C3C(=O)OC(=O)C3C1(C(C)C)C=C2 ZGACYOKNEKDSNK-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 229910052910 alkali metal silicate Inorganic materials 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 125000004202 aminomethyl group Chemical group [H]N([H])C([H])([H])* 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 150000004982 aromatic amines Chemical class 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- UTTHLMXOSUFZCQ-UHFFFAOYSA-N benzene-1,3-dicarbohydrazide Chemical compound NNC(=O)C1=CC=CC(C(=O)NN)=C1 UTTHLMXOSUFZCQ-UHFFFAOYSA-N 0.000 description 1
- 150000001639 boron compounds Chemical group 0.000 description 1
- WKDNYTOXBCRNPV-UHFFFAOYSA-N bpda Chemical compound C1=C2C(=O)OC(=O)C2=CC(C=2C=C3C(=O)OC(C3=CC=2)=O)=C1 WKDNYTOXBCRNPV-UHFFFAOYSA-N 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 125000002057 carboxymethyl group Chemical group [H]OC(=O)C([H])([H])[*] 0.000 description 1
- 239000011362 coarse particle Substances 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 229910002026 crystalline silica Inorganic materials 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 1
- KEIQPMUPONZJJH-UHFFFAOYSA-N dicyclohexylmethanediamine Chemical compound C1CCCCC1C(N)(N)C1CCCCC1 KEIQPMUPONZJJH-UHFFFAOYSA-N 0.000 description 1
- 238000002050 diffraction method Methods 0.000 description 1
- BVURNMLGDQYNAF-UHFFFAOYSA-N dimethyl(1-phenylethyl)amine Chemical compound CN(C)C(C)C1=CC=CC=C1 BVURNMLGDQYNAF-UHFFFAOYSA-N 0.000 description 1
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229940042795 hydrazides for tuberculosis treatment Drugs 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 239000012263 liquid product Substances 0.000 description 1
- HCWCAKKEBCNQJP-UHFFFAOYSA-N magnesium orthosilicate Chemical compound [Mg+2].[Mg+2].[O-][Si]([O-])([O-])[O-] HCWCAKKEBCNQJP-UHFFFAOYSA-N 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- 239000000391 magnesium silicate Substances 0.000 description 1
- 229910052919 magnesium silicate Inorganic materials 0.000 description 1
- 235000019792 magnesium silicate Nutrition 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- VYKXQOYUCMREIS-UHFFFAOYSA-N methylhexahydrophthalic anhydride Chemical compound C1CCCC2C(=O)OC(=O)C21C VYKXQOYUCMREIS-UHFFFAOYSA-N 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- QOHMWDJIBGVPIF-UHFFFAOYSA-N n',n'-diethylpropane-1,3-diamine Chemical compound CCN(CC)CCCN QOHMWDJIBGVPIF-UHFFFAOYSA-N 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 150000004714 phosphonium salts Chemical group 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 229920003987 resole Polymers 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000000790 scattering method Methods 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- PJANXHGTPQOBST-UHFFFAOYSA-N stilbene Chemical compound C=1C=CC=CC=1C=CC1=CC=CC=C1 PJANXHGTPQOBST-UHFFFAOYSA-N 0.000 description 1
- 235000021286 stilbenes Nutrition 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- FAGUFWYHJQFNRV-UHFFFAOYSA-N tetraethylenepentamine Chemical compound NCCNCCNCCNCCN FAGUFWYHJQFNRV-UHFFFAOYSA-N 0.000 description 1
- USFPINLPPFWTJW-UHFFFAOYSA-N tetraphenylphosphonium Chemical compound C1=CC=CC=C1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 USFPINLPPFWTJW-UHFFFAOYSA-N 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- MXSVLWZRHLXFKH-UHFFFAOYSA-N triphenylborane Chemical compound C1=CC=CC=C1B(C=1C=CC=CC=1)C1=CC=CC=C1 MXSVLWZRHLXFKH-UHFFFAOYSA-N 0.000 description 1
- IIOSDXGZLBPOHD-UHFFFAOYSA-N tris(2-methoxyphenyl)phosphane Chemical compound COC1=CC=CC=C1P(C=1C(=CC=CC=1)OC)C1=CC=CC=C1OC IIOSDXGZLBPOHD-UHFFFAOYSA-N 0.000 description 1
- COIOYMYWGDAQPM-UHFFFAOYSA-N tris(2-methylphenyl)phosphane Chemical compound CC1=CC=CC=C1P(C=1C(=CC=CC=1)C)C1=CC=CC=C1C COIOYMYWGDAQPM-UHFFFAOYSA-N 0.000 description 1
- IUURMAINMLIZMX-UHFFFAOYSA-N tris(2-nonylphenyl)phosphane Chemical compound CCCCCCCCCC1=CC=CC=C1P(C=1C(=CC=CC=1)CCCCCCCCC)C1=CC=CC=C1CCCCCCCCC IUURMAINMLIZMX-UHFFFAOYSA-N 0.000 description 1
- 125000006839 xylylene group Chemical group 0.000 description 1
Abstract
Description
本発明は、薄型パネル、特に液晶や有機ELディスプレイのような中・大型パネルが水分により劣化することを防止するためのエンドシール材に関する。 The present invention relates to an end seal material for preventing deterioration of thin panels, particularly medium- and large-sized panels such as liquid crystals and organic EL displays due to moisture.
昨今、薄型ディスプレイの技術の向上は著しいものがあるが、特に液晶や有機ELパネルはその中・大型化の需要に対し、信頼性を確保することが困難となってきている。その原因である水分は液晶への汚染、あるいは有機EL素子の劣化を顕在化するものであり、問題視されている。 In recent years, there has been a remarkable improvement in the technology of thin displays, but in particular, it has become difficult to ensure the reliability of liquid crystal and organic EL panels in response to demands for their medium and large size. Moisture, which is the cause, is a problem because it causes contamination of the liquid crystal or deterioration of the organic EL element.
一方、上記液晶及び有機EL素子の劣化を阻止するため、構造上シール材(UV硬化タイプ、あるいはUV+熱硬化タイプ)を使用することで対応している。
しかしながら、このシール材のみでは、先のように中・大型パネルの信頼性を確保することは困難となってきている。
On the other hand, in order to prevent the deterioration of the liquid crystal and the organic EL element, a structural sealing material (UV curing type or UV + thermosetting type) is used.
However, it has become difficult to ensure the reliability of medium and large panels as described above with only this sealing material.
一方、吸湿性無機材を適用した例として、特許第2746826号公報(特許文献1)が提案されているが、上記シール材として適用したものであり、吸湿機能を十分に発揮しているとは言いがたい。また、CCDのパッケージ中に吸湿性無機材を添加した提案もある。 On the other hand, as an example of applying a hygroscopic inorganic material, Japanese Patent No. 2774626 (Patent Document 1) has been proposed, but it is applied as the above-mentioned sealing material and sufficiently exhibits a hygroscopic function. It's hard to say. There is also a proposal in which a hygroscopic inorganic material is added to the CCD package.
本発明は、上記事情に鑑みなされたもので、液晶や有機ELディスプレイ等の中・大型パネル内部への水分の混入を防止する信頼性に優れたエンドシール材を提供することを目的とする。 The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a highly reliable end seal material that prevents moisture from being mixed into the inside of a medium- or large-sized panel such as a liquid crystal or an organic EL display.
本発明者は、上記目的を達成するために鋭意検討を重ねた結果、(A)液状エポキシ樹脂、(B)硬化剤、(C)非反応性有機ケイ素化合物で表面処理された、平均粒径が0.01〜0.3μmである無機充填剤、及び(D)平均粒径が1μm以上25μm未満、BET比表面積が100m2/g以上400m2/g以下である吸湿性無機充填剤を含有する液状エポキシ樹脂組成物であって、(D)吸湿性無機充填剤を該組成物中20質量%以上65質量%以下配合してなる組成物を、液晶や有機ELディスプレイ等の中・大型パネルのエンドシール材として使用した場合、パネル内部への水分の混入を防止することができ、このエンドシール材は信頼性に優れたものであることを見出し、本発明をなすに至った。 As a result of intensive studies to achieve the above object, the present inventor has obtained an average particle diameter that has been surface-treated with (A) a liquid epoxy resin, (B) a curing agent, and (C) a non-reactive organosilicon compound. Containing an inorganic filler having an average particle size of 1 μm or more and less than 25 μm and a BET specific surface area of 100 m 2 / g or more and 400 m 2 / g or less. A liquid epoxy resin composition comprising (D) a composition comprising 20% by mass or more and 65% by mass or less of a hygroscopic inorganic filler in a medium or large panel such as a liquid crystal or an organic EL display When used as an end seal material, it was possible to prevent moisture from entering the panel, and the end seal material was found to be excellent in reliability, leading to the present invention.
従って、本発明は、
(A)液状エポキシ樹脂、
(B)硬化剤、
(C)非反応性有機ケイ素化合物で表面処理された、平均粒径が0.01〜0.3μmである無機充填剤、
(D)平均粒径が1μm以上25μm未満、BET比表面積が100m2/g以上400m2/g以下である吸湿性無機充填剤:全成分中20質量%以上65質量%以下
を含有してなるエンドシール材を提供する。
Therefore, the present invention
(A) Liquid epoxy resin,
(B) a curing agent,
(C) an inorganic filler that is surface-treated with a non-reactive organosilicon compound and has an average particle size of 0.01 to 0.3 μm;
(D) Hygroscopic inorganic filler having an average particle diameter of 1 μm or more and less than 25 μm and a BET specific surface area of 100 m 2 / g or more and 400 m 2 / g or less: comprising 20% by mass to 65% by mass of all components Provide end seal material.
本発明によれば、液晶や有機ELディスプレイ等の中・大型パネル内部への水分混入を防止する信頼性の高いエンドシール材が得られる。 ADVANTAGE OF THE INVENTION According to this invention, the reliable end-seal material which prevents a water | moisture content mixing in the inside of medium / large sized panels, such as a liquid crystal and an organic electroluminescent display, is obtained.
本発明のエンドシール材は、
(A)液状エポキシ樹脂、
(B)硬化剤、
(C)非反応性有機ケイ素化合物で表面処理された、平均粒径が0.01〜0.3μmである無機充填剤、
(D)平均粒径が1μm以上25μm未満、BET比表面積が100m2/g以上400m2/g以下である吸湿性無機充填剤
を含有してなる液状エポキシ樹脂組成物からなるものである。
The end seal material of the present invention is
(A) Liquid epoxy resin,
(B) a curing agent,
(C) an inorganic filler that is surface-treated with a non-reactive organosilicon compound and has an average particle size of 0.01 to 0.3 μm;
(D) A liquid epoxy resin composition comprising a hygroscopic inorganic filler having an average particle diameter of 1 μm or more and less than 25 μm and a BET specific surface area of 100 m 2 / g or more and 400 m 2 / g or less.
[液状エポキシ樹脂組成物]
[(A)液状エポキシ樹脂]
本発明の液状エポキシ樹脂組成物に用いられる(A)成分の液状エポキシ樹脂は、エンドシール材に硬化性を付与する成分であり、1分子中に2個以上のエポキシ基を有するもので、それ自体が室温で液状のものであることとの条件を満たせば、分子構造、分子量等は特に限定されず、公知のエポキシ樹脂を全て用いることができる。
[Liquid epoxy resin composition]
[(A) Liquid epoxy resin]
The liquid epoxy resin (A) used in the liquid epoxy resin composition of the present invention is a component that imparts curability to the end seal material, and has two or more epoxy groups in one molecule. The molecular structure, molecular weight, and the like are not particularly limited as long as they satisfy the condition that they are liquid at room temperature, and all known epoxy resins can be used.
この(A)成分としては、例えば、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂等のビスフェノール型エポキシ樹脂;脂環式エポキシ樹脂;フェノールノボラック型エポキシ樹脂、クレゾールノボラック型エポキシ樹脂等のノボラック型エポキシ樹脂;トリフェノールメタン型エポキシ樹脂、トリフェノールプロパン型エポキシ樹脂等のトリフェノールアルカン型エポキシ樹脂;フェノールアラルキル型エポキシ樹脂、ビフェニルアラルキル型エポキシ樹脂、スチルベン型エポキシ樹脂、ナフタレン型エポキシ樹脂、ビフェニル型エポキシ樹脂、シクロペンタジエン型エポキシ樹脂等が挙げられる。これらの液状エポキシ樹脂は1種単独でも2種以上組み合わせても使用することができる。 Examples of the component (A) include bisphenol type epoxy resins such as bisphenol A type epoxy resins and bisphenol F type epoxy resins; alicyclic epoxy resins; phenol novolac type epoxy resins and novolak type epoxy resins such as cresol novolak type epoxy resins. Resin; Triphenolalkane type epoxy resin such as triphenolmethane type epoxy resin and triphenolpropane type epoxy resin; Phenol aralkyl type epoxy resin, Biphenyl aralkyl type epoxy resin, Stilbene type epoxy resin, Naphthalene type epoxy resin, Biphenyl type epoxy resin And cyclopentadiene type epoxy resin. These liquid epoxy resins can be used singly or in combination of two or more.
これらの中でも、特に、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂等のビスフェノール型エポキシ樹脂が好ましい。更に、下記構造で示されるエポキシ樹脂も好ましく使用することができる。 Among these, bisphenol type epoxy resins such as bisphenol A type epoxy resin and bisphenol F type epoxy resin are particularly preferable. Furthermore, an epoxy resin represented by the following structure can also be preferably used.
また、この(A)成分の液状エポキシ樹脂中に含まれる全塩素含有量は、1,500ppm以下、特に1,000ppm以下であることが望ましい。また、液状エポキシ樹脂を50質量%含む水中における100℃×20時間の条件で抽出された塩素イオンの量が、10ppm以下であることが望ましい。前記全塩素含有量及び前記抽出塩素イオンの量が、前記上限以下であれば、耐湿性が良好であり、信頼性を損なうことがない。 Further, the total chlorine content contained in the liquid epoxy resin of the component (A) is preferably 1,500 ppm or less, particularly 1,000 ppm or less. Moreover, it is desirable that the amount of chlorine ions extracted under conditions of 100 ° C. × 20 hours in water containing 50% by mass of a liquid epoxy resin is 10 ppm or less. If the total chlorine content and the amount of extracted chlorine ions are not more than the upper limit, the moisture resistance is good and the reliability is not impaired.
[(B)硬化剤]
本発明の液状エポキシ樹脂組成物に用いられる(B)成分は、(A)成分の液状エポキシ樹脂を硬化させる成分である。この(B)成分としては、(A)成分中のエポキシ基と反応可能な官能基、例えば、フェノール性水酸基、アミノ基等の一価の基であれば、それを2個以上、また、例えば、酸無水物基等の実質上二価の基であれば、それを1個以上有する化合物であればよく、分子構造、分子量等は特に限定されず、公知のエポキシ樹脂硬化剤を全て使用することができる。
[(B) Curing agent]
The component (B) used in the liquid epoxy resin composition of the present invention is a component for curing the liquid epoxy resin as the component (A). As the component (B), two or more functional groups capable of reacting with the epoxy group in the component (A), for example, a monovalent group such as a phenolic hydroxyl group and an amino group, As long as it is a substantially divalent group such as an acid anhydride group, it may be a compound having one or more thereof, and the molecular structure, molecular weight, etc. are not particularly limited, and all known epoxy resin curing agents are used. be able to.
この(B)成分としては、例えば、1分子中にフェノール性水酸基を少なくとも2個以上有するフェノール樹脂が挙げられ、より具体的には、フェノールノボラック樹脂、クレゾールノボラック樹脂等のノボラック型フェノール樹脂;パラキシリレン変性ノボラック樹脂、メタキシリレン変性ノボラック樹脂、オルソキシリレン変性ノボラック樹脂等のキシリレン変性ノボラック樹脂;ビスフェノールA型樹脂、ビスフェノールF型樹脂等のビスフェノール型フェノール樹脂;ビフェニル型フェノール樹脂、レゾール型フェノール樹脂、フェノールアラルキル型樹脂、ビフェニルアラルキル型樹脂等のフェノール樹脂;トリフェノールメタン型樹脂、トリフェノールプロパン型樹脂等のトリフェノールアルカン型樹脂及びその重合体等のフェノール樹脂;ナフタレン環含有フェノール樹脂、ジシクロペンタジエン変性フェノール樹脂等がいずれも使用可能である。 Examples of the component (B) include phenol resins having at least two phenolic hydroxyl groups in one molecule. More specifically, novolak type phenol resins such as phenol novolak resin and cresol novolak resin; paraxylylene Modified novolak resins, metaxylylene modified novolak resins, orthoxylylene modified novolak resins and other xylylene modified novolak resins; bisphenol A type resins, bisphenol F type resins and other bisphenol type phenol resins; biphenyl type phenol resins, resol type phenol resins, phenol aralkyls Type resins, biphenyl aralkyl type resins and other phenol resins; triphenol methane type resins, triphenol alkane type resins such as triphenol propane type resins, and their polymers Lumpur resin; naphthalene ring-containing phenolic resins, dicyclopentadiene-modified phenolic resin and the like are both available.
(B)成分がアミンである場合としては、例えば、エチレンジアミン、ジエチレントリアミン、トリエチレンテトラミン、テトラエチレンペンタミン、ジエチルアミノプロピルアミン、ビス(4−アミノ−3−メチルジシクロヘキシル)メタン、ジアミノジシクロヘキシルメタン、ビス(アミノメチル)シクロヘキサン等の脂肪族アミン;メタフェニレンジアミン、ジアミノジフェニルメタン、ジアミノジフェニルスルフォン、3,3’−ジエチル−4,4’−ジアミノジフェニルメタン、3,3’,5,5’−テトラエチル−4,4’−ジアミノジフェニルメタン等の芳香族アミン等が挙げられる。 As the case where the component (B) is an amine, for example, ethylenediamine, diethylenetriamine, triethylenetetramine, tetraethylenepentamine, diethylaminopropylamine, bis (4-amino-3-methyldicyclohexyl) methane, diaminodicyclohexylmethane, bis ( Aliphatic amines such as aminomethyl) cyclohexane; metaphenylenediamine, diaminodiphenylmethane, diaminodiphenylsulfone, 3,3′-diethyl-4,4′-diaminodiphenylmethane, 3,3 ′, 5,5′-tetraethyl-4, And aromatic amines such as 4′-diaminodiphenylmethane.
(B)成分が酸無水物である場合としては、例えば、テトラヒドロ無水フタル酸、メチルテトラヒドロ無水フタル酸、メチルヘキサヒドロ無水フタル酸、ヘキサヒドロ無水フタル酸、ピロメリット酸二無水物、3,4−ジメチル−6−(2−メチル−1−プロペニル)−4−シクロヘキサン−1,2−ジカルボン酸無水物、1−メチル−4−(1−メチルエチル)−ビシクロ[2.2.2]オクト−5−エン−2,3−ジカルボン酸無水物、ベンゾフェノンテトラカルボン酸二無水物、3,3’,4,4’−ビフェニルテトラカルボン酸二無水物、ビス(3,4−ジカルボキシフェニル)エーテル二無水物、ビス(3,4−ジカルボキシフェニル)メタン二無水物、2,2−ビス(3,4−ジカルボキシフェニル)プロパン二無水物等の、好ましくは分子内に脂肪族環又は芳香族環を1個又は2個有するとともに、酸無水物基(即ち、−CO−O−CO−基)を1個又は2個有する、炭素原子数4〜25個、好ましくは8〜20個程度の酸無水物が好適である。 Examples of the case where the component (B) is an acid anhydride include tetrahydrophthalic anhydride, methyltetrahydrophthalic anhydride, methylhexahydrophthalic anhydride, hexahydrophthalic anhydride, pyromellitic dianhydride, 3,4- Dimethyl-6- (2-methyl-1-propenyl) -4-cyclohexane-1,2-dicarboxylic anhydride, 1-methyl-4- (1-methylethyl) -bicyclo [2.2.2] oct- 5-ene-2,3-dicarboxylic anhydride, benzophenonetetracarboxylic dianhydride, 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride, bis (3,4-dicarboxyphenyl) ether Dianhydrides, bis (3,4-dicarboxyphenyl) methane dianhydride, 2,2-bis (3,4-dicarboxyphenyl) propane dianhydride, etc. Or having one or two aliphatic rings or aromatic rings in the molecule and one or two acid anhydride groups (that is, —CO—O—CO— groups) having 4 to 4 carbon atoms. 25, preferably about 8 to 20 acid anhydrides are suitable.
(B)成分としては、上記のほかにジシアンジアミド、アジピン酸ヒドラジド、イソフタル酸ヒドラジド等のカルボン酸ヒドラジドも使用することができる。
この(B)成分の硬化剤は、1種単独でも2種以上を組み合わせても使用することができる。
As the component (B), carboxylic acid hydrazides such as dicyandiamide, adipic acid hydrazide, and isophthalic acid hydrazide can also be used.
The curing agent for component (B) can be used singly or in combination of two or more.
この(B)成分の使用量は、本発明のエンドシール材として使用される液状エポキシ樹脂組成物を、通常の硬化条件において、所望の程度に十分に硬化させることができる量であって、過度の硬化により硬化物が脆くなり、硬化後に硬化剤由来の官能基が残存せず、硬化物のガラス転移点、封止性もしくは密着性等の特性を損なわないとの条件を満たせば、特に制限されるものではない。例えば、上記(A)成分中のエポキシ基1モルに対して、上記硬化剤中に含まれるフェノール性水酸基、アミノ基、酸無水物基等の官能基の量(但し、多価官能基の場合は一価の基が複数あるものとして換算する)が、通常、0.8〜1.2モル、好ましくは0.9〜1.1モル程度となる量の硬化剤を使用するのがよい。 The amount of component (B) used is an amount that can sufficiently cure the liquid epoxy resin composition used as the end seal material of the present invention to a desired degree under normal curing conditions. If the conditions such that the cured product becomes brittle due to curing, the functional group derived from the curing agent does not remain after curing and the properties such as glass transition point, sealing property or adhesion of the cured product are not impaired are particularly limited. Is not to be done. For example, the amount of a functional group such as phenolic hydroxyl group, amino group, acid anhydride group, etc. contained in the curing agent with respect to 1 mol of the epoxy group in the component (A) (in the case of a polyvalent functional group) Is converted as having a plurality of monovalent groups), but it is usually preferable to use a curing agent in an amount of about 0.8 to 1.2 mol, preferably about 0.9 to 1.1 mol.
[硬化促進剤]
本発明の液状エポキシ樹脂組成物には、上記(B)成分の硬化剤とともに、必要に応じて、硬化促進剤を組み合わせて使用することができる。この硬化促進剤としては、硬化反応を促進させるものならば特に限定されず、公知のものが全て使用することができ、例えば、イミダゾール化合物、第3級アミン化合物、有機リン系化合物等を挙げることができる。
[Curing accelerator]
In the liquid epoxy resin composition of the present invention, a curing accelerator can be used in combination with the curing agent of the component (B) as necessary. The curing accelerator is not particularly limited as long as it accelerates the curing reaction, and all known ones can be used. Examples thereof include imidazole compounds, tertiary amine compounds, and organic phosphorus compounds. Can do.
イミダゾール化合物としては、例えば、2−メチルイミダゾール、2−エチルイミダゾール、2−ウンデシルイミダゾール、2,4−ジメチルイミダゾール、2−へプタデシルイミダゾール、1,2−ジメチルイミダゾール、1,2−ジエチルイミダゾール、2−フェニル−4−メチルイミダゾール、2,4,5−トリフェニルイミダゾール、2−エチル−4−メチルイミダゾール、2−フェニルイミダゾール、1−ベンジル−2−フェニルイミダゾール、1−シアノエチル−2−メチルイミダゾール、1−シアノエチル−2−ウンデシルイミダゾール、1−ベンジル−2−メチルイミダゾール、2−フェニル−4,5−ジヒドロキシメチルイミダゾール、2−アリル−4,5−ジフェニルイミダゾール、2−フェニル−4−メチル−5−ヒドロキシメチルイミダゾール等が挙げられる。 Examples of the imidazole compound include 2-methylimidazole, 2-ethylimidazole, 2-undecylimidazole, 2,4-dimethylimidazole, 2-heptadecylimidazole, 1,2-dimethylimidazole, 1,2-diethylimidazole. 2-phenyl-4-methylimidazole, 2,4,5-triphenylimidazole, 2-ethyl-4-methylimidazole, 2-phenylimidazole, 1-benzyl-2-phenylimidazole, 1-cyanoethyl-2-methyl Imidazole, 1-cyanoethyl-2-undecylimidazole, 1-benzyl-2-methylimidazole, 2-phenyl-4,5-dihydroxymethylimidazole, 2-allyl-4,5-diphenylimidazole, 2-phenyl-4- Methyl-5-hy B carboxymethyl and imidazole.
これらの中でも、2−フェニル−4−メチル−5−ヒドロキシメチルイミダゾール、2−フェニル−4,5−ジヒドロキシメチルイミダゾール、2−メチルイミダゾール、2−エチル−4−メチルイミダゾール、2−エチルイミダゾール、1,2−ジメチルイミダゾール、1,2−ジエチルイミダゾール、2,4−ジメチルイミダゾール、2−フェニル−4−メチルイミダゾールが好ましい。 Among these, 2-phenyl-4-methyl-5-hydroxymethylimidazole, 2-phenyl-4,5-dihydroxymethylimidazole, 2-methylimidazole, 2-ethyl-4-methylimidazole, 2-ethylimidazole, 1 , 2-dimethylimidazole, 1,2-diethylimidazole, 2,4-dimethylimidazole and 2-phenyl-4-methylimidazole are preferred.
また、第3級アミン化合物としては、例えば、トリエチルアミン、ベンジルジメチルアミン、ベンジルトリメチルアミン、α−メチルベンジルジメチルアミン等の窒素原子に結合する置換基としてアルキル基やアラルキル基を有するアミン化合物;1,8−ジアザビシクロ[5.4.0]ウンデセン−7及びそのフェノール塩、オクチル酸塩、オレイン酸塩等のシクロアミジン化合物やその有機酸との塩;下記構造式で表される化合物等のシクロアミジン化合物と4級ホウ素化合物との塩又は錯塩等が挙げられる。 Examples of the tertiary amine compound include amine compounds having an alkyl group or an aralkyl group as a substituent bonded to a nitrogen atom such as triethylamine, benzyldimethylamine, benzyltrimethylamine, and α-methylbenzyldimethylamine; 1,8 -Diazabicyclo [5.4.0] undecene-7 and cycloamidine compounds such as phenol salts, octylates and oleates thereof, and salts thereof with organic acids; cycloamidine compounds such as compounds represented by the following structural formula And a salt or complex salt of quaternary boron compound.
また、有機リン系化合物としては、例えば、トリブチルホスフィン、トリフェニルホスフィン、トリ(メチルフェニル)ホスフィン、トリ(ノニルフェニル)ホスフィン、トリ(メトキシフェニル)ホスフィン、ジフェニルトリルホスフィン、トリフェニルホスフィン・トリフェニルボラン等のトリオルガノホスフィン化合物;テトラフェニルホスホニウム・テトラフェニルボレート等の4級ホスホニウム塩等が挙げられる。
この硬化促進剤は、1種単独でも2種以上を組み合わせても使用することができる。
Examples of organic phosphorus compounds include tributylphosphine, triphenylphosphine, tri (methylphenyl) phosphine, tri (nonylphenyl) phosphine, tri (methoxyphenyl) phosphine, diphenyltolylphosphine, triphenylphosphine / triphenylborane. And quaternary phosphonium salts such as tetraphenylphosphonium and tetraphenylborate.
These curing accelerators can be used singly or in combination of two or more.
なお、硬化促進剤を使用する場合には、硬化促進効果が発揮され、液状エポキシ樹脂組成物の保存安定性を損なうことがないとの観点から、(A)成分の液状エポキシ樹脂100質量部に対して、通常、10質量部以下、好ましくは0.01〜10質量部、特に0.5〜5質量部の範囲の量とするのがよい。 In addition, when using a hardening accelerator, a hardening acceleration effect is exhibited and from a viewpoint that the storage stability of a liquid epoxy resin composition is not impaired, 100 parts by weight of the liquid epoxy resin of the component (A) On the other hand, the amount is usually 10 parts by mass or less, preferably 0.01 to 10 parts by mass, particularly 0.5 to 5 parts by mass.
[(C)非反応性有機ケイ素化合物で表面処理された無機充填剤]
本発明の液状エポキシ樹脂組成物に用いられる(C)成分の非反応性有機ケイ素化合物で表面処理された無機充填剤は、本液状エポキシ樹脂組成物のマトリックス中に均一に分散され、チキソ性を付与するために配合される成分である。一般に、エンドシール材は二枚のガラスの端面に厚めに塗布する場合が多く、塗布後のシール材のダレが大きいと厚さの不均一化の原因となり、水分の遮断を不可能とする。よって、チキソ性を付与し、形状維持することで、塗布後の厚さの不均一化を防止することができる。なお、前記非反応性有機ケイ素化合物とは、硬化反応に関与する官能基を有しない化合物であることを意味する。
[(C) Inorganic filler surface-treated with non-reactive organosilicon compound]
The inorganic filler surface-treated with the non-reactive organosilicon compound (C) used in the liquid epoxy resin composition of the present invention is uniformly dispersed in the matrix of the liquid epoxy resin composition and has thixotropy. It is a component blended for imparting. In general, the end seal material is often applied to the end surfaces of two sheets of glass, and if the sagging of the seal material after application is large, the thickness of the end seal material becomes non-uniform and it is impossible to block moisture. Therefore, by imparting thixotropy and maintaining the shape, non-uniform thickness after coating can be prevented. The non-reactive organosilicon compound means a compound that does not have a functional group involved in the curing reaction.
また、この(C)成分は、その平均粒径が0.01〜0.3μm、好ましくは0.01〜0.2μmである無機充填剤が、非反応性有機ケイ素化合物で表面処理されているものであることが必要である。前記無機充填剤の平均粒径が0.01μm未満であるとエポキシ樹脂組成物の粘度が高くなって、液状のものが得られないか、液状状態を維持できない。また、0.3μmを超えると形状維持ができない。 In addition, the component (C) has an inorganic filler whose average particle diameter is 0.01 to 0.3 μm, preferably 0.01 to 0.2 μm, and is surface-treated with a non-reactive organosilicon compound. It must be a thing. When the average particle size of the inorganic filler is less than 0.01 μm, the viscosity of the epoxy resin composition increases, and a liquid product cannot be obtained or the liquid state cannot be maintained. On the other hand, if it exceeds 0.3 μm, the shape cannot be maintained.
平均粒径が0.01〜0.3μmである無機充填剤としては、例えば、アエロジル130、アエロジル200、アエロジル300(商品名、日本アエロジル社製)等のフュームドシリカ;ニプシルVN−3−LP(商品名、日本シリカ工業社製)等の湿式シリカなどのシリカが好適に用いられる。なお、上記平均粒径については、下記(D)成分に記載の通りである。 Examples of the inorganic filler having an average particle diameter of 0.01 to 0.3 μm include fumed silica such as Aerosil 130, Aerosil 200, Aerosil 300 (trade name, manufactured by Nippon Aerosil Co., Ltd.); Nipsil VN-3-LP Silica such as wet silica such as (trade name, manufactured by Nippon Silica Kogyo Co., Ltd.) is preferably used. The average particle size is as described in the following component (D).
また、前記表面処理は、分散性を向上させるために行われる。表面処理に用いる非反応性有機ケイ素化合物としては、例えば、CH3Si(OCH3)3、(CH3)3SiOCH3、PhSi(OCH3)3、PhSiCH3(OCH3)2、{(CH3)3Si}2NH、CH3CH2Si(OCH3)3等(なお、前記「Ph」はフェニル基を意味する)が挙げられる。 The surface treatment is performed in order to improve dispersibility. Non-reactive organosilicon compounds used for the surface treatment include, for example, CH 3 Si (OCH 3 ) 3 , (CH 3 ) 3 SiOCH 3 , PhSi (OCH 3 ) 3 , PhSiCH 3 (OCH 3 ) 2 , {(CH 3 ) 3 Si} 2 NH, CH 3 CH 2 Si (OCH 3 ) 3 and the like (wherein “Ph” means a phenyl group).
また、前記無機充填剤の表面処理方法としては、前記無機充填剤を予め前記非反応性有機ケイ素化合物にて処理しておいてもよく、また、本発明の液状エポキシ樹脂組成物の調製時に前記非反応性有機ケイ素化合物を添加・配合するインテグラルブレンド法によって表面処理を行ってもよいが、前記非反応性有機ケイ素化合物の使用量を抑制する点から、前者の方法が好ましい。 In addition, as a surface treatment method of the inorganic filler, the inorganic filler may be previously treated with the non-reactive organosilicon compound, and when the liquid epoxy resin composition of the present invention is prepared, The surface treatment may be performed by an integral blend method in which a nonreactive organosilicon compound is added and blended, but the former method is preferred from the viewpoint of suppressing the amount of the nonreactive organosilicon compound used.
この(C)成分の使用量は、本発明の液状エポキシ樹脂組成物の全量に対し、通常、1〜5質量%、好ましくは2〜3質量%の範囲とするのがよい。前記使用量が少なすぎると、チキソ性を付与することが困難となる場合があり、また、逆に多すぎるとチキソ性が高くなり過ぎ、実質上液状のエポキシ樹脂組成物を得ることが困難となるおそれがある。 The amount of component (C) used is usually 1 to 5% by mass, preferably 2 to 3% by mass, based on the total amount of the liquid epoxy resin composition of the present invention. If the amount used is too small, it may be difficult to impart thixotropy, and conversely if too much, the thixotropy becomes too high and it is difficult to obtain a substantially liquid epoxy resin composition. There is a risk.
[(D)吸湿性無機充填剤]
本発明の液状エポキシ樹脂組成物に用いられる(D)成分の吸湿性無機充填剤は、得られる硬化物の吸湿性を付与するために配合される成分である。この(D)成分としては、平均粒径が1μm以上25μm未満、BET比表面積が100m2/g以上400m2/g以下の吸湿性無機充填剤であれば、従来から公知の各種の無機充填剤を使用することができ、例えば、溶融シリカ、結晶シリカ、アルミナ、ボロンナイトライド、アルミニウムナイトライド、シリコンナイトライド、マグネシア、マグネシウムシリケート等が挙げられる。これらは1種単独でも2種以上を組み合わせても使用することができる。
[(D) Hygroscopic inorganic filler]
The hygroscopic inorganic filler of component (D) used in the liquid epoxy resin composition of the present invention is a component blended to impart hygroscopic properties of the resulting cured product. As the component (D), various conventionally known inorganic fillers may be used as long as the hygroscopic inorganic filler has an average particle size of 1 μm or more and less than 25 μm and a BET specific surface area of 100 m 2 / g or more and 400 m 2 / g or less. Examples thereof include fused silica, crystalline silica, alumina, boron nitride, aluminum nitride, silicon nitride, magnesia, magnesium silicate, and the like. These can be used singly or in combination of two or more.
本発明では、(D)成分の平均粒径が1μm以上25μm未満であることが必要であり、好ましくは1〜10μmである。前記平均粒径が25μm以上であると粗粒が多くなり、1μm未満であるとエポキシ樹脂組成物の粘度が高くなり、流動性が低下する。そして、シリンジ等を用いてエンドシール材を塗布する場合に、ディスペンス性に劣るものとなるので作業上支障をきたすおそれがある。
なお、本発明において、上記平均粒径及び粒径は、例えばレーザー光回折法による粒度分布測定により測定することができる。また、平均粒径はメジアン径として求めることができる。
In the present invention, the average particle diameter of the component (D) is required to be 1 μm or more and less than 25 μm, and preferably 1 to 10 μm. When the average particle size is 25 μm or more, the number of coarse particles increases. When the average particle size is less than 1 μm, the viscosity of the epoxy resin composition increases and the fluidity decreases. And when apply | coating an end seal material using a syringe etc., since it becomes inferior to dispensing property, there exists a possibility of causing trouble on operation | work.
In the present invention, the average particle size and the particle size can be measured by, for example, particle size distribution measurement by a laser light diffraction method. Moreover, an average particle diameter can be calculated | required as a median diameter.
また、(D)成分は、BET比表面積が100m2/g以上400m2/g以下であることが必要であり、130m2/g以上300m2/g以下であることが好ましい。前記比表面積が100m2/g未満であると、吸湿機能が低下し、パネル内部への水分混入を余儀なくさせる。400m2/gを超えると高粘度化し、ディスペンス時作業上支障をきたす場合がある。 Further, the component (D) needs to have a BET specific surface area of 100 m 2 / g or more and 400 m 2 / g or less, and preferably 130 m 2 / g or more and 300 m 2 / g or less. When the specific surface area is less than 100 m 2 / g, the moisture absorption function is lowered, and water is inevitably mixed into the panel. If it exceeds 400 m 2 / g, the viscosity may be increased, which may hinder work during dispensing.
(D)成分の製造方法としては、例えばシリカの場合、表面平滑性に優れ、真球状の球状シリカゲル粒子を調製し、所定の条件で焼成することにより調製することができ、この場合、表面平滑性に優れ、真球状の球状シリカゲル粒子の調製は、種々の液相反応により得ることができるが、特に珪酸アルカリと鉱酸水溶液の反応により得られる球状シリカゲルが好ましく、具体的に例えば、特開2005−54129号、特開2005−54130号、特開2005−54131号公報等に示す方法で得ることができる。 As a method for producing the component (D), for example, in the case of silica, it can be prepared by preparing spherical silica gel particles that are excellent in surface smoothness and calcined under predetermined conditions. Preparation of spherical silica gel particles having excellent properties can be obtained by various liquid phase reactions, and spherical silica gel obtained by reaction of alkali silicate and mineral acid aqueous solution is particularly preferable. 2005-54129, JP-A-2005-54130, JP-A-2005-54131, and the like.
また、(D)成分は、市販品を用いることもでき、市販品としては、例えば、SS−150、SS−200(MRCユニテック社製)、シリカゲル等の多孔質シリカ及び多孔質無機物などを挙げることができる。 Moreover, a commercial item can also be used for (D) component, As a commercial item, porous silica and porous inorganic substances, such as SS-150, SS-200 (made by MRC Unitech Co., Ltd.), a silica gel, etc. are mentioned, for example. be able to.
この(D)成分の使用量は、本発明の液状エポキシ樹脂組成物の全量に対し、20質量%以上65質量%以下であり、好ましくは30〜60質量%の範囲とするのがよい。前記使用量が少なすぎると、得られる硬化物の吸湿機能が大きく低下し、パネル内部に水分が混入してしまう。逆に前記使用量が多すぎると、粘度が高くなりすぎて、液状のエポキシ樹脂組成物を得ることが困難となる。 The amount of component (D) used is 20% by mass or more and 65% by mass or less, preferably 30 to 60% by mass, based on the total amount of the liquid epoxy resin composition of the present invention. If the amount used is too small, the moisture absorption function of the resulting cured product is greatly reduced, and moisture is mixed into the panel. On the other hand, when the amount used is too large, the viscosity becomes too high, and it becomes difficult to obtain a liquid epoxy resin composition.
[他の配合成分]
本発明の液状エポキシ樹脂組成物には、上記各成分に加えて、必要に応じて他の成分を配合することができる。但し、得られるエポキシ樹脂組成物が液状であることが必要であり、かつ本発明の効果を損なうものであってはならない。
[Other ingredients]
In addition to each said component, the liquid epoxy resin composition of this invention can mix | blend another component as needed. However, the obtained epoxy resin composition needs to be in a liquid state, and must not impair the effects of the present invention.
例えば、得られる硬化物の応力を緩和させるために、シリコーンゴム、シリコーンオイル、液状のポリブタジエンゴム等を配合してもよい。
また、表面処理剤、接着性向上用のシランカップリング剤、カーボンブラック等の顔料、染料、酸化防止剤、その他の添加剤等を配合することができる。前記表面処理剤としては、例えば、ヘキサメチルジシラザン、テトラエトキシシラン等が挙げられ、これは無機充填剤成分の表面を疎水化処理し、樹脂成分との濡れ性向上に効果を発揮する。また、前記シランカップリング剤としては、公知のものを使用することができ、例えば、KBM403(商品名、信越化学工業社製)等が挙げられる。
For example, silicone rubber, silicone oil, liquid polybutadiene rubber or the like may be blended in order to relieve the stress of the obtained cured product.
Further, a surface treatment agent, a silane coupling agent for improving adhesion, a pigment such as carbon black, a dye, an antioxidant, and other additives can be blended. Examples of the surface treatment agent include hexamethyldisilazane, tetraethoxysilane, and the like. The surface treatment agent hydrophobizes the surface of the inorganic filler component and exhibits an effect of improving wettability with the resin component. Moreover, as said silane coupling agent, a well-known thing can be used, For example, KBM403 (brand name, the Shin-Etsu Chemical Co., Ltd. make) etc. are mentioned.
[液状エポキシ樹脂組成物の調製]
本発明の液状エポキシ樹脂組成物は、上記各成分を同時に、又は逐次的に、装置内へ投入し、必要により15〜25℃の範囲の冷却処理を行いながら、撹拌、溶解、混合、分散等の操作を行うことによって調製することができる。これらの撹拌、溶解、混合、分散等の操作に用いられる装置は特に限定されない。例えば、撹拌及び加熱装置を備えたライカイ機、3本ロールミル、ボールミル、プラネタリーミキサー等を用いることができる。また、前記装置の複数を適宜組み合わせてもよい。但し、硬化剤として酸無水物を使用する場合には、高温条件下であると得られるエンドシール材の接着性が低下する傾向があることから、10〜25℃の温度条件において本発明の液状エポキシ樹脂組成物の調製を行うことが好ましい。
[Preparation of liquid epoxy resin composition]
The liquid epoxy resin composition of the present invention is agitated, dissolved, mixed, dispersed, etc. while the above components are simultaneously or sequentially introduced into the apparatus and a cooling treatment in the range of 15 to 25 ° C. is performed as necessary. It can prepare by performing operation of. The apparatus used for operations such as stirring, dissolution, mixing, and dispersion is not particularly limited. For example, a laika machine equipped with a stirring and heating device, a three-roll mill, a ball mill, a planetary mixer, and the like can be used. Further, a plurality of the devices may be combined as appropriate. However, when an acid anhydride is used as a curing agent, the adhesive property of the end seal material obtained tends to be reduced when the temperature is high, so the liquid of the present invention is used at a temperature of 10 to 25 ° C. It is preferable to prepare an epoxy resin composition.
このようにして得られた液状エポキシ樹脂組成物は、薄型パネル、特に液晶や有機ELディスプレイのような中・大型パネル(なお、中・大型パネルとは10cm以上×10cm以上のものをいう)のエンドシール材として用いられ、この封止工程としては、シリンジ等のディスペンサーに前記エンドシール材を収容し、前記ディスペンサーから所要量のエンドシール材を封止部位に供給した後に、加熱硬化処理を施こすことができる。前記加熱硬化処理の条件としては、通常、80〜200℃、特に100〜150℃で、1〜2時間である。 The liquid epoxy resin composition thus obtained is a thin panel, particularly a medium / large panel such as a liquid crystal or an organic EL display (the medium / large panel means a thing of 10 cm or more × 10 cm or more). Used as an end seal material. In this sealing process, the end seal material is accommodated in a dispenser such as a syringe, and after supplying a required amount of the end seal material from the dispenser to the sealed portion, a heat curing treatment is performed. Can be rubbed. The conditions for the heat curing treatment are usually 80 to 200 ° C., particularly 100 to 150 ° C., and 1 to 2 hours.
以下、本発明を実施例及び比較例を示して具体的に説明するが、本発明は下記実施例に制限されるものではない。なお、下記の例において、wt%は質量%を意味し、平均粒径はレーザー回折散乱方式(Cilas Alcatel社製:シーラスレーザーHR850)により測定した値を示す。 EXAMPLES Hereinafter, although an Example and a comparative example are shown and this invention is demonstrated concretely, this invention is not restrict | limited to the following Example. In the following examples, wt% means mass%, and the average particle diameter is a value measured by a laser diffraction scattering method (Cilas Alcatel: Cirrus Laser HR850).
下記実施例及び比較例で使用した材料は、下記の通りである。
(A)液状エポキシ樹脂:ビスフェノールA型エポキシ樹脂(RE310、日本化薬社製)
(B)硬化剤:酸無水物(MH700、新日本理化社製)
硬化促進剤:マイクロカプセル化イミダゾール(HX−3741、旭化成工業社製)
(C)表面処理無機充填剤:ヘキサメチルジシラザン(SE31、信越化学工業社製)で表面処理したフュームドシリカ(アエロジル130、日本アエロジル社製、平均粒径:0.15μm)
(D)無機充填剤:下記表中に記載の通り(なお、各実施例及び比較例で用いたシリカの平均粒径、BET比表面積及びその商品名、製品名も下記表中に記載の通りである)
(E)その他:シランカップリング剤(γ−グリシドキシプロピルトリメトキシシラン、KBM403、信越化学工業社製)
The materials used in the following examples and comparative examples are as follows.
(A) Liquid epoxy resin: bisphenol A type epoxy resin (RE310, manufactured by Nippon Kayaku Co., Ltd.)
(B) Curing agent: acid anhydride (MH700, manufactured by Shin Nippon Chemical Co., Ltd.)
Curing accelerator: Microencapsulated imidazole (HX-3741, manufactured by Asahi Kasei Kogyo Co., Ltd.)
(C) Surface-treated inorganic filler: fumed silica (Aerosil 130, Nippon Aerosil Co., Ltd., average particle size: 0.15 μm) surface-treated with hexamethyldisilazane (SE31, manufactured by Shin-Etsu Chemical Co., Ltd.)
(D) Inorganic filler: as described in the following table (Incidentally, the average particle diameter of silica used in each Example and Comparative Example, BET specific surface area, its product name, and product name are also as described in the following table. Is)
(E) Others: Silane coupling agent (γ-glycidoxypropyltrimethoxysilane, KBM403, manufactured by Shin-Etsu Chemical Co., Ltd.)
[実施例1〜3、比較例1〜7]
上記成分を下記表1〜3に示す組成及び配合量で配合し、均一に混練することによりエポキシ樹脂組成物を得た。
[Examples 1 to 3, Comparative Examples 1 to 7]
The said component was mix | blended with the composition and compounding quantity shown to the following Tables 1-3, and the epoxy resin composition was obtained by knead | mixing uniformly.
<各種性能評価>
・粘度
得られた各エポキシ樹脂組成物の25℃における粘度(Pa・s)を、ブルックフィールド製E型粘度計を用いて測定した。測定結果を表1〜3に示す。
<Various performance evaluation>
-Viscosity The viscosity (Pa * s) in 25 degreeC of each obtained epoxy resin composition was measured using the Brookfield E-type viscosity meter. The measurement results are shown in Tables 1-3.
・組成物のダレの有無
得られた各エポキシ樹脂組成物を、内径2mmのノズルを装着したシリンジを用いてガラス板に線引きし、その後、ガラス板を垂直に立てて100℃/1時間で硬化させ、塗布物のダレの有無を確認した。結果を表1〜3に示す。
-Presence or absence of sagging of the composition Each epoxy resin composition obtained was drawn on a glass plate using a syringe equipped with a nozzle having an inner diameter of 2 mm, and then cured at 100 ° C / 1 hour by standing the glass plate vertically. The presence or absence of sagging of the coated product was confirmed. The results are shown in Tables 1-3.
・硬化物の吸湿性
得られた各エポキシ樹脂組成物を、4mm×10mm×100mmの形状の型内で150℃×2時間の条件で硬化させることにより角柱サンプルを作製した。
各サンプルを用い、PCT(Pressure Cooker TEST)にて121℃/2気圧下,24時間後の吸湿量を測定し、更に吸湿後のサンプルを用いて100℃/3時間後の排水量を測定した。測定結果を表1〜3に示す。
-Hygroscopicity of hardened | cured material The prism sample was produced by hardening | curing each obtained epoxy resin composition on 150 degreeC * 2 hours conditions in the type | mold of a shape of 4 mm x 10 mm x 100 mm.
Using each sample, the moisture absorption after 24 hours was measured at 121 ° C./2 atm using PCT (Pressure Cooker TEST), and the amount of drainage after 100 ° C./3 hours was measured using the sample after moisture absorption. The measurement results are shown in Tables 1-3.
Claims (2)
(B)硬化剤、
(C)非反応性有機ケイ素化合物で表面処理された、平均粒径が0.01〜0.3μmである無機充填剤、
(D)平均粒径が1μm以上25μm未満、BET比表面積が100m2/g以上400m2/g以下である吸湿性無機充填剤:全成分中20質量%以上65質量%以下
を含有してなるエンドシール材。 (A) Liquid epoxy resin,
(B) a curing agent,
(C) an inorganic filler that is surface-treated with a non-reactive organosilicon compound and has an average particle size of 0.01 to 0.3 μm;
(D) Hygroscopic inorganic filler having an average particle diameter of 1 μm or more and less than 25 μm and a BET specific surface area of 100 m 2 / g or more and 400 m 2 / g or less: comprising 20% by mass to 65% by mass of all components End seal material.
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JP2006109797A JP2007284472A (en) | 2006-04-12 | 2006-04-12 | End sealing material |
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Cited By (5)
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WO2010103967A1 (en) * | 2009-03-13 | 2010-09-16 | コニカミノルタホールディングス株式会社 | Organic electronic element and method for manufacturing same |
JP2012023038A (en) * | 2010-07-12 | 2012-02-02 | Samsung Mobile Display Co Ltd | Organic light-emitting apparatus and method of manufacturing the same |
WO2013108629A1 (en) * | 2012-01-18 | 2013-07-25 | 三井化学株式会社 | Composition, composition for display device end-face sealing agent comprising composition, and display device and method for manufacturing same |
JP2015015250A (en) * | 2009-01-23 | 2015-01-22 | 味の素株式会社 | Resin composition |
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Publication number | Priority date | Publication date | Assignee | Title |
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JP2015015250A (en) * | 2009-01-23 | 2015-01-22 | 味の素株式会社 | Resin composition |
WO2010103967A1 (en) * | 2009-03-13 | 2010-09-16 | コニカミノルタホールディングス株式会社 | Organic electronic element and method for manufacturing same |
US8455283B2 (en) | 2009-03-13 | 2013-06-04 | Konica Minolta Holdings, Inc. | Organic electronic element and its manufacturing method |
JP5494648B2 (en) * | 2009-03-13 | 2014-05-21 | コニカミノルタ株式会社 | Organic electronic device and method for manufacturing the same |
JP2012023038A (en) * | 2010-07-12 | 2012-02-02 | Samsung Mobile Display Co Ltd | Organic light-emitting apparatus and method of manufacturing the same |
US9105870B2 (en) | 2010-07-12 | 2015-08-11 | Samsung Display Co., Ltd. | Organic light-emitting apparatus and method of manufacturing the same |
WO2013108629A1 (en) * | 2012-01-18 | 2013-07-25 | 三井化学株式会社 | Composition, composition for display device end-face sealing agent comprising composition, and display device and method for manufacturing same |
JPWO2013108629A1 (en) * | 2012-01-18 | 2015-05-11 | 三井化学株式会社 | Composition, display device end face sealant comprising the composition, display device, and method for producing the same |
KR101623670B1 (en) | 2012-01-18 | 2016-05-23 | 미쓰이 가가쿠 가부시키가이샤 | Composition, display device end-face sealing agent comprising composition, and display device and method for manufacturing same |
CN104066788B (en) * | 2012-01-18 | 2016-11-16 | 三井化学株式会社 | Compositions, display device end face seal agent, display device and manufacture method thereof containing compositions |
KR20160111434A (en) | 2014-05-02 | 2016-09-26 | 미쯔이가가꾸가부시끼가이샤 | Sealing material and cured product thereof |
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