JP2007284468A - Resin composition and film-forming material comprising the same - Google Patents

Resin composition and film-forming material comprising the same Download PDF

Info

Publication number
JP2007284468A
JP2007284468A JP2006109689A JP2006109689A JP2007284468A JP 2007284468 A JP2007284468 A JP 2007284468A JP 2006109689 A JP2006109689 A JP 2006109689A JP 2006109689 A JP2006109689 A JP 2006109689A JP 2007284468 A JP2007284468 A JP 2007284468A
Authority
JP
Japan
Prior art keywords
resin
resin composition
average particle
film
polyamide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2006109689A
Other languages
Japanese (ja)
Inventor
Katsuhiro Onose
勝博 小野瀬
Tomohiro Hirata
知広 平田
Susumu Kaneko
進 金子
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Denko Materials Co Ltd
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP2006109689A priority Critical patent/JP2007284468A/en
Publication of JP2007284468A publication Critical patent/JP2007284468A/en
Pending legal-status Critical Current

Links

Landscapes

  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a resin composition improving fluidity by mixing a resin solution of a polyimide resin, a polyamide-imide resin or a polyamide resin and a modified polyimide resin, polyamide-imide resin or polyamide resin with inorganic fillers having different average particle diameters and further improving the printing operation efficiency without producing defoamed marks or pinholes when bubbles included during screen printing are defoamed and to provide a film-forming material comprising the resin composition. <P>SOLUTION: The resin composition is obtained by combining the resin solution with the two or more kinds of inorganic fillers having the different average particle diameters. The film-forming material comprises the resin composition. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

本発明は、スクリーン印刷機、ディスペンサ、スピンコータ等の塗布方法に適したチクソトロピー性を有する樹脂組成物及びそれを含む被膜形成材料に関する。   The present invention relates to a resin composition having thixotropy suitable for a coating method such as a screen printer, a dispenser, and a spin coater, and a film forming material including the same.

近年、電子部品の分野においては、小型化、薄型化、高速化への対応から、耐熱性、電気特性及び耐湿性に優れる樹脂としてエポキシ樹脂に代わり、ポリイミド樹脂、ポリアミドイミド樹脂、ポリアミド樹脂が使用されている。これらの樹脂は、樹脂構造が剛直であり薄膜基材に用いた場合、硬化後の基材が大きく反り、硬化膜は柔軟性に欠け、屈曲性に劣る間題がある。   In recent years, in the field of electronic parts, polyimide resin, polyamideimide resin, and polyamide resin have been used instead of epoxy resin as a resin that excels in heat resistance, electrical properties, and moisture resistance in order to respond to miniaturization, thinning, and high speed. Has been. These resins have a rigid resin structure, and when used as a thin film substrate, the cured substrate is greatly warped, and the cured film lacks flexibility and has poor flexibility.

そこで、低反り性、柔軟性を改善するために、樹脂を可とう化及び低弾性率化した変性されたポリアミドイミド樹脂が、特許文献1、2、3等に提案されている。
特願昭60−244066号公報 特開平08−012763号公報 特開平07−196798号公報
Therefore, in order to improve low warpage and flexibility, modified polyamideimide resins in which the resin is made flexible and have a low elastic modulus have been proposed in Patent Documents 1, 2, 3 and the like.
Japanese Patent Application No. 60-244066 Japanese Patent Laid-Open No. 08-012763 JP 07-196798 A

これらの樹脂に、印刷性や作業性を向上させるために無機フィラーや有機フィラー等を樹脂溶液に分散させている。また、電気特性向上のために大量の無機フィラー、有機フィラー等が使用されているが、大量のフィラーのため揺変性が増大し流動性が低下する。   In these resins, an inorganic filler, an organic filler or the like is dispersed in a resin solution in order to improve printability and workability. Moreover, although a large amount of inorganic fillers, organic fillers, and the like are used for improving electrical characteristics, thixotropic property increases and fluidity decreases due to the large amount of fillers.

揺変性が増大し流動性が低下するとスクリーン印刷時に巻き込まれた気泡が抜けづらくなり樹脂硬化後に膜中に気泡が残留し、耐湿試験等の長期信頼性が低下する。また、スクリーン印刷時に巻き込まれた気泡が消泡した場合、流動性が低下しているため消泡跡が発生し、場合によってはピンホールとなり長期信頼性や膜形成後の工程に悪影響を及ぼす問題が発生する。   When thixotropy increases and fluidity decreases, bubbles entrained during screen printing are difficult to escape, and bubbles remain in the film after the resin is cured, thereby reducing long-term reliability such as a moisture resistance test. In addition, when bubbles entrained during screen printing are defoamed, the flowability is reduced and defoaming traces are generated. Occurs.

本発明は、分子量の異なるポリイミド樹脂、ポリアミドイミド樹脂、ポリアミド樹脂及び変性されたポリイミド樹脂、ポリアミドイミド樹脂、ポリアミド樹脂の樹脂溶液に平均粒子径の異なった無機フィラーを混合させることにより、流動性を向上させ、さらにスクリーン印刷時に巻き込まれた気泡が消泡した場合、消泡跡やピンホールを発生することなく、印刷作業性を向上させた樹脂組成物及びこれを含む被膜形成材料を提供することを目的とするものである。   The present invention provides fluidity by mixing polyimide resins, polyamideimide resins, polyamide resins and modified polyimide resins, polyamideimide resins, and polyamide resin resin solutions having different average molecular diameters with different molecular weights. To provide a resin composition with improved printing workability and a film-forming material containing the same, without generating defoaming traces or pinholes when bubbles are removed during screen printing. It is intended.

本発明は、樹脂溶液に、2種類以上の平均粒子径の異なる無機フィラーを組み合わせてなる樹脂組成物に関する。
また、本発明は、樹脂溶液が、ポリイミド樹脂、ポリアミドイミド樹脂、ポリアミド樹脂及び変性されたポリイミド樹脂、ポリアミドイミド樹脂、ポリアミド樹脂である前記の樹脂組成物に関する。
The present invention relates to a resin composition comprising a resin solution combined with two or more inorganic fillers having different average particle diameters.
The present invention also relates to the resin composition, wherein the resin solution is a polyimide resin, a polyamideimide resin, a polyamide resin and a modified polyimide resin, a polyamideimide resin, or a polyamide resin.

また、本発明は、無機フィラーの平均粒子径が、10μm以下である前記の樹脂組成物に関する。
また、本発明は、平均粒子径の異なる無機フィラーの1種類以上が、タルクである前記の樹脂組成物に関する。
Moreover, this invention relates to the said resin composition whose average particle diameter of an inorganic filler is 10 micrometers or less.
Moreover, this invention relates to the said resin composition whose 1 or more types of the inorganic filler from which an average particle diameter differs is a talc.

また、本発明は、無機フィラーのタルクの分散後の平均粒子径の低下率が、30%以内である前記の樹脂組成物に関する。
また、本発明は、無機フィラーの合計添加量が、樹脂溶液固形分100重量部に対して50〜300重量部である前記の樹脂組成物に関する。
さらに、本発明は、前記の樹脂組成物を含む被膜形成材料に関する。
Moreover, this invention relates to the said resin composition whose fall rate of the average particle diameter after dispersion | distribution of the talc of an inorganic filler is less than 30%.
Moreover, this invention relates to the said resin composition whose total addition amount of an inorganic filler is 50-300 weight part with respect to 100 weight part of resin solution solid content.
Furthermore, this invention relates to the film forming material containing the said resin composition.

本発明の樹脂組成物及びこれを含む被膜形成材料は、タルクの分散時に分散状態を制御することにより、電気特性を向上させ、更にスクリーン印刷時の流動性を向上させ、巻き込まれた気泡が破泡した際に発生する消泡跡やピンホールを発生することなく耐湿性や印刷作業性に優れる。   The resin composition of the present invention and the film-forming material containing the resin composition improve the electrical characteristics by controlling the dispersion state when talc is dispersed, and further improve the fluidity during screen printing. Excellent moisture resistance and printing workability without generating defoaming traces and pinholes generated when foaming.

本発明の樹脂溶液としては、熱硬化性、熱可塑性の樹脂等があり、熱可塑性樹脂としては、フェノキシ樹脂、アクリル樹脂等が好適に用いられる。熱硬化性樹脂としては、エポキシ樹脂、フェノール樹脂、ポリイミド樹脂、ポリアミドイミド樹脂、ポリアミド樹脂等が好適に用いられる。好ましくは、耐熱性や電気的特性を考慮してポリイミド樹脂、ポリアミドイミド樹脂、ポリアミド樹脂及び変性されたポリイミド樹脂、ポリアミドイミド樹脂、ポリアミド樹脂が好適に用いられる。   Examples of the resin solution of the present invention include thermosetting and thermoplastic resins, and phenoxy resin, acrylic resin, and the like are preferably used as the thermoplastic resin. As the thermosetting resin, an epoxy resin, a phenol resin, a polyimide resin, a polyamideimide resin, a polyamide resin, or the like is preferably used. Preferably, polyimide resin, polyamideimide resin, polyamide resin, modified polyimide resin, polyamideimide resin, and polyamide resin are preferably used in consideration of heat resistance and electrical characteristics.

変性された樹脂としては各種公知の変性がされたものであれば特に制限はなく、例えば、シリコーン樹脂で変性されたもの、ポリカーボネート樹脂で変性されたもの、ポリブタジエンで変性されたものなどを挙げることができる。中でも、ポリカーボネート樹脂で変性されたポリアミドイミド樹脂が好ましいものとして挙げられる。   The modified resin is not particularly limited as long as various known modifications are made, and examples thereof include those modified with a silicone resin, those modified with a polycarbonate resin, and those modified with a polybutadiene. Can do. Among them, a polyamideimide resin modified with a polycarbonate resin is preferable.

可とう化及び低弾性率化成分変性された樹脂は、例えば、ポリカーボネート樹脂で変性されたポリアミドイミド樹脂の場合、通常、可とう化及び低弾性率化成分である1,6−ヘキサンジオール系ポリカーボネートジオール等をカルボン酸とを反応させて得られたジカルボン酸と、ポリイソシアネート及び酸無水物基を有する3価のカルボン酸又はその誘導体とを反応させて得られる。   For example, in the case of a polyamideimide resin modified with a polycarbonate resin, a 1,6-hexanediol-based polycarbonate which is a flexible and low elastic modulus component is used as the resin modified with a flexible and low elastic modulus component. It can be obtained by reacting a dicarboxylic acid obtained by reacting a diol or the like with a carboxylic acid, a polyisocyanate and a trivalent carboxylic acid having an acid anhydride group or a derivative thereof.

本発明に用いられる無機フィラーの合計添加量は、樹脂溶液固形分100重量部に対して50〜300重量部が好ましい。無機フィラーの合計添加量が300重量部を超えると、樹脂皮膜の柔軟性が低下し反り性が大きくなる傾向があり好ましくない。無機フィラーの合計添加量が50重量部未満であると、流動性の向上効果が得られにくくなり好ましくない。   The total amount of the inorganic filler used in the present invention is preferably 50 to 300 parts by weight with respect to 100 parts by weight of the resin solution solid content. When the total addition amount of the inorganic filler exceeds 300 parts by weight, the flexibility of the resin film tends to decrease and the warpage tends to increase, such being undesirable. If the total added amount of the inorganic filler is less than 50 parts by weight, it is difficult to obtain an improvement in fluidity, which is not preferable.

本発明に用いられる無機フィラーは特に制約はなく、例えば、炭酸カルシウム、アルミナ、酸化チタン、マイカ、タルク、炭酸アルミニウム、ホウ酸アルミニウム、水酸化アルミニウム、水酸化マグネシウム、ケイ酸マグネシウム、ケイ酸アルミニウム、溶融シリカ、破砕シリカ、ヒュームドシリカ、硫酸バリウム、ガラス短繊維やホウ酸アルミニウムや炭化ケイ素等の各種ウィスカなどが用いられる。また、これらを数種類併用しても良く、特に限定するものではない。   The inorganic filler used in the present invention is not particularly limited. For example, calcium carbonate, alumina, titanium oxide, mica, talc, aluminum carbonate, aluminum borate, aluminum hydroxide, magnesium hydroxide, magnesium silicate, aluminum silicate, Fused silica, crushed silica, fumed silica, barium sulfate, short glass fibers, various whiskers such as aluminum borate and silicon carbide are used. Moreover, several types of these may be used in combination, and are not particularly limited.

本発明に用いられる無機フィラーの平均粒子径は10μm以下が好ましく、平均粒子径が10μm以下であれば数種類併用しても良く、フィラーの形状等、特に制限はない。無機フィラー平均粒子径が10μmを超えると回路間に無機フィラーがまたがり電気特性が低下し好ましくない。   The average particle size of the inorganic filler used in the present invention is preferably 10 μm or less, and several types may be used in combination as long as the average particle size is 10 μm or less, and the shape of the filler is not particularly limited. If the average particle diameter of the inorganic filler exceeds 10 μm, it is not preferable because the inorganic filler straddles between the circuits and the electrical characteristics deteriorate.

また、無機フィラーの平均粒子径が10μm超えると、揺変性が小さくなりスクリーン印刷時の流動性が大きくなり、回路間の流れ出しが大きくなり、その後のIC実装工程等の位置あわせに悪影響を及ぼし好ましくない。   In addition, if the average particle size of the inorganic filler exceeds 10 μm, thixotropic properties are reduced, the fluidity during screen printing is increased, the flow between circuits is increased, and the subsequent IC mounting process and the like are adversely affected. Absent.

本発明に用いられる無機フィラーの1種類以上にタルクを用いることが好ましく、タルクを用いないとスクリーン印刷時の流動性や消泡性が低下し好ましくない。
タルクの添加量は、無機フィラー100重量部に対して、10重量部以上が好ましく、10重量部以上50重量部以下がより好ましく、10重量部以上30重量部以下が特に好ましい。
It is preferable to use talc for one or more of the inorganic fillers used in the present invention. If talc is not used, fluidity and defoaming properties during screen printing are undesirably reduced.
The amount of talc added is preferably 10 parts by weight or more, more preferably 10 parts by weight to 50 parts by weight, and particularly preferably 10 parts by weight to 30 parts by weight with respect to 100 parts by weight of the inorganic filler.

本発明に用いられる無機フィラーのタルクの分散後の平均粒子径の変化率は30%以内が好ましく、5%以上20%以下が特に好ましい。タルクの分散後の平均粒子径の変化率が30%を超えると電気特性やスクリーン印刷後の外観が低下し好ましくない。タルクの分散後の平均粒子径の変化率が5%未満であるとタルクの2次凝集物が分散させず電気特性に悪影響をおよぼす。   The change rate of the average particle diameter after dispersion of talc of the inorganic filler used in the present invention is preferably within 30%, particularly preferably from 5% to 20%. If the change rate of the average particle diameter after dispersion of talc exceeds 30%, the electrical characteristics and the appearance after screen printing are undesirably lowered. When the rate of change of the average particle diameter after dispersion of talc is less than 5%, the secondary aggregates of talc are not dispersed and the electrical characteristics are adversely affected.

本発明の樹脂組成物は、各々、被膜形成材料として好適に用いられる。この樹脂組成物には、塗工時の作業性及び被膜形成前後の膜特性を向上させるため、エポキシ樹脂類、レベリング剤等の界面活性剤類、染料、顔料等の着色剤類、熱安定剤、酸化防止剤、難燃剤、消泡剤、滑剤を添加することもできる。   Each of the resin compositions of the present invention is suitably used as a film forming material. In order to improve the workability at the time of coating and the film properties before and after the film formation, this resin composition includes epoxy resins, surfactants such as leveling agents, colorants such as dyes and pigments, and heat stabilizers. Antioxidants, flame retardants, antifoaming agents, and lubricants can also be added.

本発明になる樹脂組成物及びそれを含む皮膜形成材料は、上記の優れた特性を有し、電子部品用オーバーコート材、液状封止材、エナメル線用ワニス電気絶縁用含浸ワニス、積層板用ワニス、摩擦材料用ワニス、プリント基板分野等における層間絶縁膜、表面保護膜、ソルダレジスト膜、接着層等や、半導体素子などの電子部品に好適に用いられる。   The resin composition and the film-forming material containing the resin composition according to the present invention have the above-described excellent characteristics, and include an overcoat material for electronic parts, a liquid sealing material, an varnish for enameled wire varnish, an insulating varnish for laminates, It is suitably used for electronic components such as varnishes, varnishes for friction materials, interlayer insulating films, surface protective films, solder resist films, adhesive layers and the like in the field of printed circuit boards, and semiconductor elements.

本発明になる樹脂組成物をペースト化した樹脂ペーストは、各種電気製品や電子部品の皮膜形成材料としてスクリーン印刷、ディスペンサ、スピンコートなどの塗布方法に好適に用いられる。特にスクリーン印刷に好適に用いられる。
また、樹脂ペーストは、例えば、半導体素子、プリント基板分野などの電子部品用オーバーコート材、液状封止材、層間絶縁膜、表面保護膜、ソルダレジスト層、接着層などとして好適に用いられる。
The resin paste obtained by pasting the resin composition according to the present invention is suitably used for coating methods such as screen printing, dispenser and spin coating as film forming materials for various electric products and electronic parts. It is particularly suitable for screen printing.
The resin paste is suitably used as, for example, an overcoat material for electronic parts such as semiconductor elements and printed circuit boards, a liquid sealing material, an interlayer insulating film, a surface protective film, a solder resist layer, an adhesive layer, and the like.

さらに、エナメル線用ワニス、電気絶縁用含浸ワニス、注型ワニス、マイカ、ガラスクロス等の基材と組み合わせたシート用ワニス、MCL積層板用ワニス、摩擦材料用ワニス等にも使用できる。   Furthermore, it can also be used for varnish for enameled wire, impregnated varnish for electrical insulation, cast varnish, mica, glass varnish, varnish for MCL laminate, friction material varnish, and the like.

以下、本発明を実施例により詳細に説明するが本発明はこれらに制限するものではない。
実施例1
攪拌機、油分分離機付冷却管、窒素導入管及び温度計を備えた3リットルの四つ口フラスコに、プラクセルCD−220(ダイセル化学工業(株)製、1,6−ヘキサンジオール系ポリカーボネートジオールの商品名)2000.0g(100モル)、アジピン酸292.0g(2.00モル)及びキシレン114.6gを仕込み、途中、副生してくる縮合水を除去しながら200℃まで昇温した。200℃で2時間反応させ、酸価49.7KOHmg/gのジカルボン酸Aを得た。
EXAMPLES Hereinafter, although an Example demonstrates this invention in detail, this invention is not restrict | limited to these.
Example 1
Plaxel CD-220 (manufactured by Daicel Chemical Industries, Ltd., 1,6-hexanediol-based polycarbonate diol) was added to a 3 liter four-necked flask equipped with a stirrer, a condenser with an oil separator, a nitrogen inlet tube and a thermometer. Product name) 2000.0 g (100 mol), adipic acid 292.0 g (2.00 mol) and xylene 114.6 g were charged, and the temperature was raised to 200 ° C. while removing by-product condensed water. The mixture was reacted at 200 ° C. for 2 hours to obtain dicarboxylic acid A having an acid value of 49.7 KOH mg / g.

ついで、攪拌機、冷却管、窒素導入管及び温度計を備えた2リットルの四つ口フラスコに、4,4’−ジフェ二ルメタンジイソシアネート150.0g(0.60モル)、無水トリメリット酸69.12g(0.36モル)、前記合成で得られたジカルボン酸A541.44g(0.24モル)及びγ―ブチロラクトン760.56gを仕込み、160℃まで昇温し反応させて、得られた樹脂をγ―ブチロラクトンで希釈し、不揮発分40重量%のポリカーボネート変性ポリアミドイミド樹脂溶液を得た。   Subsequently, 150.0 g (0.60 mol) of 4,4′-diphenylmethane diisocyanate and trimellitic anhydride 69 were added to a 2 liter four-necked flask equipped with a stirrer, a condenser tube, a nitrogen inlet tube and a thermometer. .12 g (0.36 mol), 541.44 g (0.24 mol) of dicarboxylic acid A obtained in the above synthesis and 760.56 g of γ-butyrolactone were charged, the temperature was raised to 160 ° C., and the resulting resin was reacted. Was diluted with γ-butyrolactone to obtain a polycarbonate-modified polyamideimide resin solution having a nonvolatile content of 40% by weight.

得られたポリカーボネート変性ポリアミドイミド樹脂溶液の固形分100重量部に対して、シリコーン系消泡剤(信越化学工業株式会社製 商品名:KS−603)を0.3重量部を配合し20℃で10分間攪拌し、さらにタルク(富士タルク株式会社製、商品名:LMS−300)を80重量部を配合し、ビーズミル(ターボ工業株式会社製、商品名:OBミル0.5N1型)を用いて1.0mmのジルコニアビーズを80%充填して、ロータ速度:2000min−1、流速:毎分0.5Lで処理を2回行ってポリカーボネート変性ポリアミドイミド樹脂タルク分散溶液Aを得た。 A silicone-based antifoaming agent (trade name: KS-603, manufactured by Shin-Etsu Chemical Co., Ltd.) is blended in an amount of 0.3 parts by weight with respect to 100 parts by weight of the solid content of the obtained polycarbonate-modified polyamideimide resin solution. The mixture was stirred for 10 minutes, and further 80 parts by weight of talc (manufactured by Fuji Talc Co., Ltd., trade name: LMS-300) was blended, and using a bead mill (trade name: OB mill 0.5N1 type, manufactured by Turbo Industry Co., Ltd.). 80% of 1.0 mm zirconia beads were filled, and the treatment was performed twice at a rotor speed of 2000 min −1 and a flow rate of 0.5 L per minute to obtain a polycarbonate-modified polyamideimide resin talc dispersion solution A.

得られたポリカーボネート変性ポリアミドイミド樹脂溶液の固形分100重量部に対して、シリコーン系消泡剤(信越化学工業株式会社製、商品名:KS−603)を0.3重量部を配合し20℃で10分間攪拌し、さらに硫酸バリウム(堺化学工業株式会社製、商品名:B−30)を220重量部を配合し、ビーズミル(ターボ工業株式会社製、商品名:OBミル0.5N1型)を用いて1.0mmのジルコニアビーズを80%充填して、ロータ速度:2000rpm、流速:毎分0.5Lで処理を1回行ってポリカーボネート変性ポリアミドイミド樹脂硫酸バリウム分散溶液Bを得た。 A silicone-based antifoaming agent (manufactured by Shin-Etsu Chemical Co., Ltd., trade name: KS-603) is blended in an amount of 0.3 parts by weight with respect to 100 parts by weight of the obtained polycarbonate-modified polyamideimide resin solution at 20 ° C. For 10 minutes, and further 220 parts by weight of barium sulfate (manufactured by Sakai Chemical Industry Co., Ltd., trade name: B-30), and a bead mill (trade name: OB mill 0.5N1 type, manufactured by Turbo Industry Co., Ltd.) Was filled with 80% of 1.0 mm zirconia beads, and the treatment was performed once at a rotor speed of 2000 rpm and a flow rate of 0.5 L per minute to obtain a polycarbonate-modified polyamideimide resin barium sulfate dispersion solution B.

得られた分散溶液をA液:100とB液:100を配合し、必要に応じてγ―ブチロラクトン等の溶剤を加えて50℃で1時間攪拌し、さらにビスフェノールA型エポキシ樹脂(油化シェルエポキシ株式会社製、商品名Ep−1004)を20重量部を加え、20℃で1時間攪拌し、ポリカーボネート変性ポリアミドイミド樹脂ペーストを得た。   The obtained dispersion solution was blended with liquid A: 100 and liquid B: 100, a solvent such as γ-butyrolactone was added as necessary, and the mixture was stirred at 50 ° C. for 1 hour, and further bisphenol A type epoxy resin (oiled shell) 20 parts by weight of Epoxy Corporation trade name Ep-1004) was added and stirred at 20 ° C. for 1 hour to obtain a polycarbonate-modified polyamideimide resin paste.

実施例2
実施例1のポリカーボネート変性ポリアミドイミド樹脂タルク分散溶液Aのビーズミル処理回数を3回とした以外は、実施例1と全く同様の操作を行い、ポリカーボネート変性ポリアミドイミド樹脂ペーストを得た。
Example 2
Except for changing the number of times of bead milling of the polycarbonate-modified polyamideimide resin talc dispersion solution A of Example 1 to 3, the same operation as in Example 1 was performed to obtain a polycarbonate-modified polyamideimide resin paste.

比較例1
実施例1のポリカーボネート変性ポリアミドイミド樹脂タルク分散溶液Aのビーズミル処理回数を4回とした以外は、実施例1と全く同様の操作を行い、ポリカーボネート変性ポリアミドイミド樹脂ペーストを得た。
Comparative Example 1
Except for changing the number of times of bead milling of the polycarbonate-modified polyamideimide resin talc dispersion solution A of Example 1 to 4, the same operation as in Example 1 was performed to obtain a polycarbonate-modified polyamideimide resin paste.

比較例2
実施例1のポリカーボネート変性ポリアミドイミド樹脂タルク分散溶液Aのビーズミル処理回数を8回とした以外は、実施例1と全く同様の操作を行い、ポリカーボネート変性ポリアミドイミド樹脂ペーストを得た。
Comparative Example 2
Except that the number of bead mill treatments of the polycarbonate-modified polyamideimide resin talc dispersion solution A in Example 1 was changed to 8, the same operation as in Example 1 was performed to obtain a polycarbonate-modified polyamideimide resin paste.

上記の各実施例及び各比較例で得られたポリカーボネート変性ポリアミドイミド樹脂ペースト及びポリアミドイミド樹脂組成物の特性を下記の方法で測定し、その結果を表1に示す。   The characteristics of the polycarbonate-modified polyamideimide resin paste and the polyamideimide resin composition obtained in each of the above Examples and Comparative Examples were measured by the following methods, and the results are shown in Table 1.

(1)平均粒子径低下率
得られたポリカーボネート変性ポリアミドイミド樹脂タルク分散ペーストを粒度分布測定機(セイシン企業製 商品名:LMS−350)を用いて測定し、正規分布50%の値を平均粒子径とし分散前の無機フィラー単体の平均粒子径を100%としてその比率とした。使用したタルク(富士タルク株式会社製 商品名:LMS−300)の平均粒子径は5.5μmを標準品平均粒子径とした。
(1) Average particle size reduction rate The obtained polycarbonate-modified polyamide-imide resin talc dispersion paste was measured using a particle size distribution analyzer (trade name: LMS-350, manufactured by Seishin Enterprise Co., Ltd.), and the value of normal distribution 50% was the average particle The average particle diameter of the inorganic filler before dispersion was 100%, and the ratio was taken as the ratio. The average particle diameter of the used talc (trade name: LMS-300, manufactured by Fuji Talc Co., Ltd.) was 5.5 μm as the standard product average particle diameter.

(2)電気特性
ポリイミド基材上にライン幅15μm、スペース幅15μmでくし型状にスズメッキされた銅電極を覆う様に、得られたポリカーボネート変性ポリアミドイミド樹脂組成物を印刷機(ニューロング株式会社製、商品名:LS−34GX)とメッシュ版(株式会社ムラカミ製、150メッシュ)で印刷速度100mm/secで印刷し、空気雰囲気下で120℃で60分間加熱硬化してポリカーボネート変性ポリアミドイミド樹脂皮膜付ポリイミド基材くし型電極を得た。
(2) Electrical properties The resulting polycarbonate-modified polyamideimide resin composition was printed on a polyimide substrate so as to cover a copper electrode tin-plated in a comb shape with a line width of 15 μm and a space width of 15 μm. Product, product name: LS-34GX) and a mesh plate (Murakami Co., Ltd., 150 mesh), printed at a printing speed of 100 mm / sec, and heat-cured at 120 ° C. for 60 minutes in an air atmosphere to be a polycarbonate-modified polyamideimide resin film A polyimide base comb electrode was obtained.

得られたポリカーボネート変性ポリアミドイミド樹脂皮膜付ポリイミド基材くし型電極を連続抵抗測定機(IMV株式会社製、商品名:Ion Migratuin Tester MIG−8600)と不飽和型プレッシャークッカ(株式会社平山製作所製、商品名:HASTPC−422R8D)を用いて温度110℃、湿度85%、印加電圧40V、印加時間100時間の条件で抵抗を測定した。得られたポリカーボネート変性ポリアミドイミド樹脂組成物に対して各3個測定し、抵抗値1×10−6Ω以下になった時点で導通として、電圧印加後100時間後を歩留まり比とした。 The resulting polyimide base comb-shaped electrode with a polycarbonate-modified polyamideimide resin film was subjected to a continuous resistance measuring machine (product name: Ion Migrator Tester MIG-8600) and an unsaturated pressure cooker (manufactured by Hirayama Manufacturing Co., Ltd.). Using a product name: HASTPC-422R8D), resistance was measured under conditions of a temperature of 110 ° C., a humidity of 85%, an applied voltage of 40 V, and an applied time of 100 hours. Three each of the obtained polycarbonate-modified polyamideimide resin compositions were measured, and when the resistance value became 1 × 10 −6 Ω or less, conduction was defined as a yield ratio 100 hours after voltage application.

(3)印刷作業性
2mmのガラス板上に、得られたポリカーボネート変性ポリアミドイミド樹脂ペーストを印刷機(ニューロング株式会社製、商品名:LS−34GX)とメッシュ版(株式会社ムラカミ製、150メッシュ)で印刷速度100mm/secで100mm角を印刷し、空気雰囲気下で120℃で60分間加熱硬化してポリカーボネート変性ポリアミドイミド樹脂被膜を得た。
(3) Printing workability On a 2 mm glass plate, the obtained polycarbonate-modified polyamide-imide resin paste is printed on a printing machine (Neurong Co., Ltd., trade name: LS-34GX) and a mesh plate (Murakami Co., Ltd., 150 mesh). ) Was printed at a printing speed of 100 mm / sec, and cured by heating at 120 ° C. for 60 minutes in an air atmosphere to obtain a polycarbonate-modified polyamideimide resin film.

得られたポリカーボネート変性ポリアミドイミド樹脂皮膜を万能投影機(ニコン株式会社製、倍率100倍)で観察して、樹脂皮膜の表面の観察をした。泡抜け跡、ピンホール、気泡がない樹脂皮膜を○とし、泡抜け跡、ピンホール、気泡があるものを×とした。   The obtained polycarbonate-modified polyamide-imide resin film was observed with a universal projector (Nikon Corporation, magnification: 100 times) to observe the surface of the resin film. Resin film without bubble traces, pinholes and bubbles was marked with ◯, and those with bubble traces, pinholes and bubbles were marked with x.

Figure 2007284468
Figure 2007284468

以上の結果から、次のことが分かった。
実施例1〜2は、タルク平均粒子径低下率を30%以内で分散させることにより電気特性を向上させ、さらに流動性が向上しスクリーン印刷作業が改善し、消泡時に発生する消泡跡およびピンホールを発生させることなく印刷作業性に優れる。
From the above results, the following was found.
Examples 1 and 2 improve the electrical characteristics by dispersing the talc average particle size reduction rate within 30%, further improve the fluidity, improve the screen printing operation, and defoaming traces generated during defoaming and Excellent printing workability without generating pinholes.

本発明のスクリーン印刷用樹脂組成物及びこれを含む被膜形成材料は、上記の優れた特性を有し、電子部品用オーバーコート材、液状封止材、エナメル線用ワニス電気絶縁用含浸ワニス、積層板用ワニス、摩擦材料用ワニス、プリント基板分野などにおける層間絶縁膜、表面保護膜、ソルダレジスト膜、接着層等や半導体素子などの電子部品にも適用できる。

The resin composition for screen printing of the present invention and the film-forming material containing the resin composition have the above-mentioned excellent characteristics, such as an overcoat material for electronic parts, a liquid sealing material, an varnish for varnish electrical insulation for enameled wire, and a laminate. It can also be applied to electronic parts such as varnishes for plates, varnishes for friction materials, interlayer insulating films, surface protective films, solder resist films, adhesive layers and semiconductor elements in the printed circuit board field.

Claims (7)

樹脂溶液に、2種類以上の平均粒子径の異なる無機フィラーを組み合わせてなる樹脂組成物。   A resin composition comprising a resin solution combined with two or more inorganic fillers having different average particle diameters. 樹脂溶液が、ポリイミド樹脂、ポリアミドイミド樹脂、ポリアミド樹脂及び変性されたポリイミド樹脂、ポリアミドイミド樹脂、ポリアミド樹脂である請求項1記載の樹脂組成物。   The resin composition according to claim 1, wherein the resin solution is a polyimide resin, a polyamideimide resin, a polyamide resin, a modified polyimide resin, a polyamideimide resin, or a polyamide resin. 無機フィラーの平均粒子径が、10μm以下である請求項1又は2記載の樹脂組成物。   The resin composition according to claim 1 or 2, wherein the average particle size of the inorganic filler is 10 µm or less. 平均粒子径の異なる無機フィラーの1種類以上が、タルクである請求項1〜3のいずれかに記載の樹脂組成物   The resin composition according to any one of claims 1 to 3, wherein one or more inorganic fillers having different average particle sizes are talc. 無機フィラーのタルクの分散後の平均粒子径の低下率が、30%以内である請求項1〜4のいずれかに記載の樹脂組成物   The resin composition according to any one of claims 1 to 4, wherein a decrease rate of the average particle diameter after dispersion of talc of the inorganic filler is within 30%. 無機フィラーの合計添加量が、樹脂溶液固形分100重量部に対して50〜300重量部である請求項1〜5のいずれかに記載の樹脂組成物。   The resin composition according to any one of claims 1 to 5, wherein the total amount of the inorganic filler added is 50 to 300 parts by weight with respect to 100 parts by weight of the resin solution solid content. 請求項1〜6のいずれかに記載の樹脂組成物を含む被膜形成材料。


The film forming material containing the resin composition in any one of Claims 1-6.


JP2006109689A 2006-04-12 2006-04-12 Resin composition and film-forming material comprising the same Pending JP2007284468A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2006109689A JP2007284468A (en) 2006-04-12 2006-04-12 Resin composition and film-forming material comprising the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006109689A JP2007284468A (en) 2006-04-12 2006-04-12 Resin composition and film-forming material comprising the same

Publications (1)

Publication Number Publication Date
JP2007284468A true JP2007284468A (en) 2007-11-01

Family

ID=38756560

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006109689A Pending JP2007284468A (en) 2006-04-12 2006-04-12 Resin composition and film-forming material comprising the same

Country Status (1)

Country Link
JP (1) JP2007284468A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5462631B2 (en) * 2007-11-30 2014-04-02 三井化学株式会社 Polyimide composite material and film thereof
JP2020158560A (en) * 2019-03-25 2020-10-01 株式会社Tbm Thermoplastic resin composition containing inorganic substance powder and compact

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63270773A (en) * 1987-04-30 1988-11-08 Showa Electric Wire & Cable Co Ltd Heat-resistant anticorrosive coating composition
JPH07331068A (en) * 1994-06-03 1995-12-19 Toyobo Co Ltd Heat-resistant and flame-retardant pasty composition
JPH10265571A (en) * 1997-01-24 1998-10-06 Ube Ind Ltd Photosensitive polyimidesiloxane, composition and insulating film
JPH11310754A (en) * 1998-04-28 1999-11-09 Ube Ind Ltd One-color-coating polyimidesiloxane coating material and cured film
JP2001302807A (en) * 2000-04-18 2001-10-31 Hitachi Chem Co Ltd Method for producing resin paste, and resin paste
JP2002012664A (en) * 2000-06-29 2002-01-15 Ube Ind Ltd Method for producing polyimide polymer, composition for polyimide-based insulation film
JP2006152017A (en) * 2004-11-25 2006-06-15 Ube Ind Ltd Composition for polyimide siloxane insulating film, insulating film and method for forming insulating film
JP2006348178A (en) * 2005-06-16 2006-12-28 Hitachi Chem Co Ltd Resin composition and film forming material comprising the same

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63270773A (en) * 1987-04-30 1988-11-08 Showa Electric Wire & Cable Co Ltd Heat-resistant anticorrosive coating composition
JPH07331068A (en) * 1994-06-03 1995-12-19 Toyobo Co Ltd Heat-resistant and flame-retardant pasty composition
JPH10265571A (en) * 1997-01-24 1998-10-06 Ube Ind Ltd Photosensitive polyimidesiloxane, composition and insulating film
JPH11310754A (en) * 1998-04-28 1999-11-09 Ube Ind Ltd One-color-coating polyimidesiloxane coating material and cured film
JP2001302807A (en) * 2000-04-18 2001-10-31 Hitachi Chem Co Ltd Method for producing resin paste, and resin paste
JP2002012664A (en) * 2000-06-29 2002-01-15 Ube Ind Ltd Method for producing polyimide polymer, composition for polyimide-based insulation film
JP2006152017A (en) * 2004-11-25 2006-06-15 Ube Ind Ltd Composition for polyimide siloxane insulating film, insulating film and method for forming insulating film
JP2006348178A (en) * 2005-06-16 2006-12-28 Hitachi Chem Co Ltd Resin composition and film forming material comprising the same

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5462631B2 (en) * 2007-11-30 2014-04-02 三井化学株式会社 Polyimide composite material and film thereof
US9540487B2 (en) 2007-11-30 2017-01-10 Mitsui Chemicals, Inc. Polyimide composite material and film thereof
JP2020158560A (en) * 2019-03-25 2020-10-01 株式会社Tbm Thermoplastic resin composition containing inorganic substance powder and compact
WO2020195429A1 (en) * 2019-03-25 2020-10-01 株式会社Tbm Thermoplastic resin composition with inorganic substance powder blended therein, and molded article
CN113490713A (en) * 2019-03-25 2021-10-08 株式会社Tbm Thermoplastic resin composition containing inorganic substance powder and molded article
US11549005B2 (en) 2019-03-25 2023-01-10 Tbm Co., Ltd. Inorganic substance powder-containing thermoplastic resin composition and formed article

Similar Documents

Publication Publication Date Title
JP5738274B2 (en) Heat-resistant adhesive
KR101635659B1 (en) Adhesive composition, adhesive sheet, circuit board and semiconductor device both produced using these, and processes for producing these
JP6854505B2 (en) Resin composition, thermosetting film using it
JP6040935B2 (en) Resin composition, resin composition sheet, semiconductor device and manufacturing method thereof
JP3539633B2 (en) Alkoxy-containing silane-modified polyamic acid resin composition and polyimide-silica hybrid cured product
JPWO2018173945A1 (en) Resin composition for circuit board and metal-based circuit board using the same
WO2014199843A1 (en) Resin composition, resin sheet, and production method for semiconductor device
JP2013197441A (en) Method of manufacturing circuit board with cured material layer
JP5157938B2 (en) Resin paste for die bonding, semiconductor device manufacturing method using the resin paste, and semiconductor device obtained by the manufacturing method
JP2007284468A (en) Resin composition and film-forming material comprising the same
JP5011893B2 (en) Resin composition, method for producing the resin composition, and film-forming material containing the resin composition
JP4095381B2 (en) Aromatic polyamide resin, resin composition containing the same, coating material for electronic component, and adhesive for electronic component
JP2006348178A (en) Resin composition and film forming material comprising the same
JP4591730B2 (en) Manufacturing method of resin paste
JP4482951B2 (en) Resin composition and film-forming material containing the same
JP2007099852A (en) Resin composition and film-forming material containing the same
TW201137024A (en) Thermosetting resin composition, cured material thereof, and printed wiring board using cured material
JP2005162905A (en) Composition of pigment-dispersed resin solution, and resin paste
JP2010235638A (en) Resin composition and method for producing protective film of flexible wiring board using the composition
JP2006169352A (en) Resin composition, and film-forming material containing it
JP2001031865A (en) Resin paste, its manufacture and electronic parts
JP2005255936A (en) Resin paste and method for producing the same
JP2002363424A (en) Resin paste and method for producing the same
JP2001123066A (en) Resin paste and its production method
JP2004124015A (en) Resin composition and film forming material containing the same

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20090130

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20111021

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20111117

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20120308