JP2007271694A - Optical wave guide element and manufacturing method therefor - Google Patents

Optical wave guide element and manufacturing method therefor Download PDF

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JP2007271694A
JP2007271694A JP2006094050A JP2006094050A JP2007271694A JP 2007271694 A JP2007271694 A JP 2007271694A JP 2006094050 A JP2006094050 A JP 2006094050A JP 2006094050 A JP2006094050 A JP 2006094050A JP 2007271694 A JP2007271694 A JP 2007271694A
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substrate
optical waveguide
block
optical
refractive index
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JP4875918B2 (en
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Mitsuru Sakuma
満 佐久間
Junichiro Ichikawa
潤一郎 市川
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Sumitomo Osaka Cement Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide an optical wave guide element and its manufacturing method which can directly connect the block to the surface of a substrate, without degrading the properties of the optical wave guide and is superior in massproductivity, at low cost. <P>SOLUTION: This optical wave guide element has a substrate 1 mounting an optical wave guide 2 on its surface to guide light wave, and a block 4 provided at an edge of this substrate to cover at least some of the optical wave guides. This substrate and the block are directly connected and the surface of the block in contact with the substrate is polished aslant, and is directed toward the end of the substrate. Preferably, the edge of the substrate is a light input or the output surface of the optical wave guide element, and the gradient δ of the polished surface of the substrate to the optical wave guides is 1/1,000 to 1/10,000. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

本発明は、光導波路素子及びその製造方法に関し、特に、表面に光波が導波される光導波路を形成した基板と、該基板の端部に少なくとも該光導波路の一部を覆うように配設したブロックとを備えた光導波路素子及びその製造方法に関する。   The present invention relates to an optical waveguide element and a method for manufacturing the same, and in particular, a substrate having an optical waveguide on which light waves are guided, and an end portion of the substrate so as to cover at least a part of the optical waveguide. The present invention relates to an optical waveguide device including a block and a manufacturing method thereof.

従来、光通信分野や光計測分野において、光変調器や光スイッチなどのように基板表面に光導波路を有する光導波路素子が実用化されている。例えば、ニオブ酸リチウム(LiNbO。以下「LN」という。)などの電気光学効果を有する強誘電体基板上に、Ti等の異種元素を熱拡散して、屈折率を局所的に上昇させ導波路を形成し、これに信号波電極を組合わせて構成した導波路型光変調器は、高速通信システムの中核を成すデバイスである。 Conventionally, in the optical communication field and the optical measurement field, an optical waveguide element having an optical waveguide on a substrate surface, such as an optical modulator and an optical switch, has been put into practical use. For example, on a ferroelectric substrate having an electro-optic effect such as lithium niobate (LiNbO 3, hereinafter referred to as “LN”), a dissimilar element such as Ti is thermally diffused to locally increase the refractive index and lead it. A waveguide-type optical modulator formed by combining a signal wave electrode with a waveguide is a device that forms the core of a high-speed communication system.

LN等の強誘電体結晶は、一般的に大きな光学異方性(屈折率の結晶軸依存性)を有するため、特定の結晶軸方向に沿って形成された導波路を伝搬する光波の偏光方向に依存して、伝搬光が感じる屈折率が異なりその伝搬速度が変わるため、結果的に、変調器の駆動電圧や消光比などの特性が大きく変化する。このため変調器の特性を安定させ、かつより高性能なものとするため、変調器の導波路に入射する光波は、一方向に揃えられていることが好ましい。   A ferroelectric crystal such as LN generally has a large optical anisotropy (dependence of refractive index on the crystal axis), and therefore the polarization direction of a light wave propagating through a waveguide formed along a specific crystal axis direction. The refractive index perceived by the propagating light differs and the propagation speed changes. As a result, characteristics such as the driving voltage and extinction ratio of the modulator greatly change. Therefore, in order to stabilize the characteristics of the modulator and achieve higher performance, it is preferable that the light waves incident on the waveguide of the modulator are aligned in one direction.

このため、以下の特許文献1のように、LN基板に形成した光導波路の一部を覆うようにZnLN基板(LN結晶にZnを添加したもの)などの光誘引部材を貼付け、光導波路を伝搬する光波から特定偏波モード光を除去することが行われている。
特開平10−68830号公報
Therefore, as in Patent Document 1 below, a light attracting member such as a ZnLN substrate (LN crystal added with Zn) or the like is attached so as to cover a part of the optical waveguide formed on the LN substrate, and propagates through the optical waveguide. The specific polarization mode light is removed from the light wave.
JP-A-10-68830

他方、光導波路素子への光ファイバの接続には、光ファイバを保持するキャピラリを光導波路素子の基板に接着している。光導波路素子の光導波路は基板表面に形成されているため、基板にキャピラリを接着しただけでは、キャピラリの端部の約半分の面積しか基板に接合していないため、十分な機械的強度を得ることができない。この問題を解消するため、光導波路素子の入射部又は出射部において、基板上に補強板を接合し、該補強板ともキャピラリが接着することで、光導波路素子と光ファイバとの接合強度を高めることが行われている。   On the other hand, for connecting the optical fiber to the optical waveguide element, a capillary for holding the optical fiber is bonded to the substrate of the optical waveguide element. Since the optical waveguide of the optical waveguide element is formed on the surface of the substrate, sufficient mechanical strength is obtained because only about half the area of the end of the capillary is bonded to the substrate by simply bonding the capillary to the substrate. I can't. In order to solve this problem, a reinforcing plate is bonded onto the substrate at the incident portion or the emitting portion of the optical waveguide element, and the capillary is bonded to the reinforcing plate, thereby increasing the bonding strength between the optical waveguide element and the optical fiber. Things have been done.

ところで、光誘引部材や補強板などのブロックをLN基板などに接合する際には、接着剤を介して両者を接合することも可能であるが、耐熱性や耐久性が低く、接着剤が光導波路を伝搬する光波に影響を与え、光損失などの原因となる場合も有る。このため、基板とブロックとを直接接合することが行なわれている。直接接合とは、接合する2つの部材を結晶構造が同一の物質で構成し、両者を接合する面内の結晶方位を合わせるように密着させ、必要に応じ加熱することで、密着界面での固相熱拡散により、結晶同士を接合させることが可能となるものである。   By the way, when a block such as a light attracting member or a reinforcing plate is joined to an LN substrate or the like, it is possible to join the two via an adhesive, but the heat resistance and durability are low, and the adhesive is light. It may affect the light wave propagating through the waveguide and cause light loss. For this reason, the substrate and the block are directly joined. In direct bonding, two members to be bonded are made of a material having the same crystal structure, closely bonded so that the crystal orientations in the plane where the two are bonded are aligned, and heated as necessary, so that they are fixed at the bonding interface. Crystals can be bonded to each other by phase thermal diffusion.

しかしながら、直接接合で基板とブロックとを接合するには、両者の接合面をサブミクロン(10〜20nm程度)の精度で平滑化することが必要であり、特に、光導波路をTi等の熱拡散により形成した光導波路素子では、10nm程度の凹凸が存在し、光導波路素子の基板表面を研磨することが不可欠である。しかも、光導波路素子は、3〜4インチ径のウェハ基板を用いて作成され、ウェハ自体にも10〜50μm程度の反りが存在している。   However, in order to join the substrate and the block by direct joining, it is necessary to smooth the joining surface of both with submicron accuracy (about 10 to 20 nm). In particular, the optical waveguide is thermally diffused by Ti or the like. The optical waveguide element formed by the above method has irregularities of about 10 nm, and it is essential to polish the substrate surface of the optical waveguide element. Moreover, the optical waveguide element is produced using a wafer substrate having a diameter of 3 to 4 inches, and the wafer itself has a warp of about 10 to 50 μm.

したがって、ウェハ基板全体をサブミクロンの精度で平坦化することは困難であり、仮に局所的に研磨加工を施した場合でも、基板上の研磨領域とそれ以外の領域との境界において段差が発生し、光導波路を伝搬する光波がそこで散乱される原因ともなる。   Therefore, it is difficult to flatten the entire wafer substrate with submicron accuracy, and even if local polishing is performed, a step occurs at the boundary between the polishing region on the substrate and other regions. In addition, the light wave propagating through the optical waveguide is also scattered there.

本発明が解決しようとする課題は、上述したような問題を解決し、光導波路の特性を劣化させること無く、基板表面にブロックを直接接合でき、しかも、低コストで量産性に優れた光導波路素子及びその製造方法を提供することである。   The problem to be solved by the present invention is to solve the above-described problems, and can directly join a block to the surface of a substrate without deteriorating the characteristics of the optical waveguide. Moreover, the optical waveguide is excellent in mass productivity at low cost. It is providing a device and a method for manufacturing the device.

請求項1に係る発明では、表面に光波が導波される光導波路を形成した基板と、該基板の端部に少なくとも該光導波路の一部を覆うように配設したブロックとを備えた光導波路素子において、該基板と該ブロックとは直接接合されており、該基板における該ブロックの接合面は、該基板の端面に向かって斜めに研磨されていることを特徴とする。   In the invention according to claim 1, an optical device comprising: a substrate on which an optical waveguide on which light waves are guided is formed; and a block disposed at an end of the substrate so as to cover at least a part of the optical waveguide. In the waveguide element, the substrate and the block are directly bonded, and a bonding surface of the block in the substrate is polished obliquely toward an end surface of the substrate.

請求項2に係る発明では、請求項1に記載の光導波路素子において、該基板の端部は、該光導波路素子の入射部又は出射部であることを特徴とする。   According to a second aspect of the present invention, in the optical waveguide element according to the first aspect, the end of the substrate is an incident part or an outgoing part of the optical waveguide element.

請求項3に係る発明では、請求項2に記載の光導波路素子において、該光導波路に対する該基板の研磨面の勾配は1/1000から1/10000であることを特徴とする。   The invention according to claim 3 is the optical waveguide element according to claim 2, wherein the gradient of the polishing surface of the substrate with respect to the optical waveguide is 1/1000 to 1/10000.

請求項4に係る発明では、請求項1乃至3のいずれかに記載の光導波路素子において、該基板は、屈折率異方性を有する結晶基板であり、該ブロックは、該基板の持つ屈折率異方性と比較して特定方向の屈折率が高く、他の方向の屈折率が同じか低く、該基板と同じ結晶構造を有する材料であることを特徴とする。   In the invention according to claim 4, in the optical waveguide device according to any one of claims 1 to 3, the substrate is a crystal substrate having refractive index anisotropy, and the block has a refractive index of the substrate. Compared with anisotropy, the refractive index in a specific direction is high, the refractive index in other directions is the same or low, and the material has the same crystal structure as the substrate.

請求項5に係る発明では、請求項4に記載の光導波路素子において、該基板はニオブ酸リチウムであり、該光導波路はTi拡散により形成され、さらに、該ブロックはZn,Ni,Co又はMgの少なくとも一つを含むニオブ酸リチウムであることを特徴とする。   In the invention according to claim 5, in the optical waveguide device according to claim 4, the substrate is lithium niobate, the optical waveguide is formed by Ti diffusion, and the block is made of Zn, Ni, Co or Mg. Lithium niobate containing at least one of the following.

請求項6に係る発明では、請求項1乃至5のいずれかに記載の光導波路素子の製造方法において、ウェハ状の基板に複数の光導波路素子の作り込みを行った後、該光導波路素子の端部を斜めに研磨し、該ブロックを該端部に直接接合し、その後、個別の光導波路素子に切断・分離することを特徴とする。   According to a sixth aspect of the present invention, in the method for manufacturing an optical waveguide element according to any one of the first to fifth aspects, after forming a plurality of optical waveguide elements on a wafer-like substrate, The end portion is polished obliquely, the block is directly joined to the end portion, and then cut and separated into individual optical waveguide elements.

請求項1に係る発明により、表面に光波が導波される光導波路を形成した基板と、該基板の端部に少なくとも該光導波路の一部を覆うように配設したブロックとを備えた光導波路素子において、該基板と該ブロックとは直接接合されており、該基板における該ブロックの接合面は、該基板の端面に向かって斜めに研磨されているため、研磨により光導波路形成時の凹凸を除去できるだけで無く、研磨される領域も局所的であり、かつ光導波路を伝搬する光波が散乱するのも抑制できるため、光導波路の特性を劣化させること無く、基板表面にブロックを直接接合でき、しかも、低コストで量産性に優れた光導波路素子を提供することが可能となる。   According to the first aspect of the present invention, an optical device comprising: a substrate having an optical waveguide on which light waves are guided; and a block disposed at an end of the substrate so as to cover at least a part of the optical waveguide. In the waveguide element, the substrate and the block are directly bonded, and the bonding surface of the block in the substrate is polished obliquely toward the end surface of the substrate. In addition to removing the light, the region to be polished is local, and the scattering of the light wave propagating through the optical waveguide can be suppressed, so that the block can be directly bonded to the substrate surface without degrading the characteristics of the optical waveguide. In addition, it is possible to provide an optical waveguide device that is low in cost and excellent in mass productivity.

請求項2に係る発明により、上記基板の端部は、光導波路素子の入射部又は出射部であるため、光ファイバとの接合時には、該ブロックを補強板として利用できるだけでなく、光導波路の光モード対称性を改善し、光ファイバとの結合効率を向上させることも可能となる。   According to the invention of claim 2, since the end of the substrate is an incident portion or an emission portion of the optical waveguide element, not only can the block be used as a reinforcing plate at the time of joining with the optical fiber, but also the light of the optical waveguide. It is also possible to improve the mode symmetry and improve the coupling efficiency with the optical fiber.

請求項3に係る発明により、光導波路に対する該基板の研磨面の勾配は1/1000から1/10000であるため、光導波路を伝搬する光波が研磨面により反射するのを防止できると共に、光導波路の伝搬損失を抑制することも可能となる。   According to the invention of claim 3, since the gradient of the polishing surface of the substrate with respect to the optical waveguide is 1/1000 to 1/10000, the light wave propagating through the optical waveguide can be prevented from being reflected by the polishing surface, and the optical waveguide It is also possible to suppress the propagation loss.

請求項4に係る発明により、基板は、屈折率異方性を有する結晶基板であり、ブロックは、該基板の持つ屈折率異方性と比較して特定方向の屈折率が高く、他の方向の屈折率が同じか低く、該基板と同じ結晶構造を有する材料であるため、ブロックは光誘引部材として機能できると共に、基板とブロックとを直接接合することも可能となる。   According to the invention of claim 4, the substrate is a crystal substrate having refractive index anisotropy, and the block has a higher refractive index in a specific direction than the refractive index anisotropy of the substrate, and other directions. Since the refractive index is a material having the same or low refractive index and the same crystal structure as that of the substrate, the block can function as a light attracting member and can directly bond the substrate and the block.

請求項5に係る発明により、基板はニオブ酸リチウムであり、光導波路はTi拡散により形成され、さらに、ブロックはZn,Ni,Co又はMgの少なくとも一つを含むニオブ酸リチウムであるため、LN基板を用いた光導波路素子においても、光導波路の特性を劣化させること無く、基板表面にブロックを直接接合でき、しかも、低コストで量産性に優れた光導波路素子を提供することが可能となる。   According to the invention of claim 5, since the substrate is lithium niobate, the optical waveguide is formed by Ti diffusion, and the block is lithium niobate containing at least one of Zn, Ni, Co, or Mg, LN Even in an optical waveguide device using a substrate, it is possible to provide an optical waveguide device that can be directly bonded to the surface of the substrate without degrading the characteristics of the optical waveguide, and that is excellent in mass production at low cost. .

請求項6に係る発明により、光導波路素子の製造方法において、ウェハ状の基板に複数の光導波路素子の作り込みを行った後、該光導波路素子の端部を斜めに研磨し、該ブロックを該端部に直接接合し、その後、個別の光導波路素子に切断・分離するため、ブロックを接合した光導波路素子を低コストで量産することが可能となる。   According to the invention of claim 6, in the method of manufacturing an optical waveguide element, after forming a plurality of optical waveguide elements on a wafer-like substrate, the end of the optical waveguide element is polished obliquely, and the block is Since it is directly bonded to the end portion and then cut and separated into individual optical waveguide elements, it is possible to mass-produce optical waveguide elements bonded with blocks at a low cost.

以下、本発明を好適例を用いて詳細に説明する。
図1は、本発明に係る光導波路素子の一部を示す図である。
本発明の光導波路素子は、表面に光波が導波される光導波路2を形成した基板1と、該基板1の端部に少なくとも該光導波路2の一部を覆うように配設したブロック4とを備えており、特に、基板1とブロック4とは直接接合されると共に、該基板1における該ブロックの接合面10は、該基板の端面に向かって斜め(勾配δ)に研磨されていることを特徴としている。
Hereinafter, the present invention will be described in detail using preferred examples.
FIG. 1 is a diagram showing a part of an optical waveguide device according to the present invention.
The optical waveguide device of the present invention includes a substrate 1 on which an optical waveguide 2 on which light waves are guided is formed on a surface, and a block 4 disposed at an end of the substrate 1 so as to cover at least a part of the optical waveguide 2. In particular, the substrate 1 and the block 4 are directly bonded, and the bonding surface 10 of the block in the substrate 1 is polished obliquely (gradient δ) toward the end surface of the substrate. It is characterized by that.

ブロック4を接合する基板1の端部は、図1に示すように、光導波路素子の入射部又は出射部であることが好ましい。これは、光導波路素子と光ファイバとの接合時には、該ブロック4を補強板として利用できるためである。また、図1の矢印Aにおける光導波路2を伝搬する光波の光モード形状20は、図2(a)に示すように基板表面に平行な方向に偏平な形状をしている。しかし、ブロックとの接合部分を伝搬することにより、光波の光モード形状は、図1の矢印Bにおける光モード形状21を示す図2(b)のように、縦方向にも延び、光モード対称性が改善したものとなる。このため、光ファイバとの結合効率が向上し、より好ましい光導波路素子を提供することが可能となる。   The end portion of the substrate 1 to which the block 4 is bonded is preferably an incident portion or an emitting portion of the optical waveguide element as shown in FIG. This is because the block 4 can be used as a reinforcing plate when the optical waveguide element and the optical fiber are joined. Further, the optical mode shape 20 of the light wave propagating through the optical waveguide 2 in the arrow A in FIG. 1 has a flat shape in a direction parallel to the substrate surface as shown in FIG. However, by propagating through the junction with the block, the optical mode shape of the light wave extends in the vertical direction as shown in FIG. 2B showing the optical mode shape 21 in the arrow B of FIG. Will be improved. For this reason, the coupling efficiency with the optical fiber is improved, and a more preferable optical waveguide element can be provided.

研磨面10の勾配δについては、1/1000から1/10000であることが好ましく、これにより、光導波路を伝搬する光波が研磨面により反射するのを防止できると共に、光導波路の伝搬損失や消光比の劣化を抑制することも可能となる。実際に試作したところ、過剰損失が約1dB以下であり、消光比が25dB以上の光導波路素子が得られている。   The gradient δ of the polished surface 10 is preferably 1/1000 to 1/10000, which can prevent light waves propagating through the optical waveguide from being reflected by the polished surface, and can also prevent propagation loss and quenching of the optical waveguide. It is also possible to suppress the deterioration of the ratio. As a result of actual trial manufacture, an optical waveguide element having an excess loss of about 1 dB or less and an extinction ratio of 25 dB or more is obtained.

基板に接合するブロックについては、単に補強板としての機能を期待する場合には、光導波路素子を構成する基板と同じ材料をブロックとして用いることも可能であるが、特許文献1に示すように、光誘引部材としての機能を期待する場合には、ブロックとして、光導波路素子の基板の持つ屈折率異方性と比較して特定方向の屈折率が高く、他の方向の屈折率が同じか低く、該基板と同じ結晶構造を有する材料を使用することが好ましい。
このような材料としては、光導波路素子の基板にLN基板を用いる場合には、LN結晶にZn,Ni,Co又はMgの少なくとも一つを含有させたものを用いることが可能である。
For the block bonded to the substrate, if the function as a reinforcing plate is simply expected, the same material as the substrate constituting the optical waveguide element can be used as the block, but as shown in Patent Document 1, When the function as a light attracting member is expected, as a block, the refractive index anisotropy of the specific direction is higher than the refractive index anisotropy of the substrate of the optical waveguide device, and the refractive index of the other direction is the same or lower. It is preferable to use a material having the same crystal structure as the substrate.
As such a material, when an LN substrate is used as the substrate of the optical waveguide device, it is possible to use a material containing at least one of Zn, Ni, Co or Mg in the LN crystal.

光導波路素子を構成する材料や構造については、特に限定されるものではないが、例えば、光変調器や光スイッチなどで多用されている電気光学効果を有する基板である、ニオブ酸リチウムやタンタル酸リチウムなどは、好適に利用可能である。
また、基板に形成する光導波路は、Tiなどを熱拡散法やプロトン交換法などで基板表面に拡散させることにより形成することができる。
The material and structure constituting the optical waveguide element are not particularly limited. For example, lithium niobate or tantalate, which is a substrate having an electrooptic effect frequently used in an optical modulator, an optical switch, or the like. Lithium or the like can be suitably used.
The optical waveguide formed on the substrate can be formed by diffusing Ti or the like on the substrate surface by a thermal diffusion method or a proton exchange method.

さらに、必要に応じて、基板表面などには、信号電極や接地電極などの制御電極3を設けることも可能であり、これらは、Ti・Auの電極パターンの形成及び金メッキ方法などにより形成することが可能である。またさらに、光導波路形成後の基板表面に誘電体SiO等のバッファ層を設けることも可能である。 Furthermore, if necessary, the control electrode 3 such as a signal electrode or a ground electrode can be provided on the surface of the substrate, etc., which are formed by forming an electrode pattern of Ti / Au, a gold plating method, or the like. Is possible. Furthermore, it is also possible to provide a buffer layer such as dielectric SiO 2 on the substrate surface after the optical waveguide is formed.

なお、LN基板は、一般の光導波路素子に多用されており、一定の品質のものが安価に入手することができ、また、LN基板にTiの熱拡散で光導波路を形成する技術も十分に確立されていることなどを総合的に考慮すると、本発明の光導波路素子としては、基板にニオブ酸リチウムを用い、光導波路はTi拡散により形成し、さらには、ブロックとしてZnを含むニオブ酸リチウム(以下、「ZnLN」という。)を使用することが、より好ましい。   Note that LN substrates are widely used in general optical waveguide elements, and those with a certain quality can be obtained at low cost. Also, a technique for forming an optical waveguide on the LN substrate by thermal diffusion of Ti is sufficient. Considering that it is established and the like, the optical waveguide element of the present invention uses lithium niobate for the substrate, the optical waveguide is formed by Ti diffusion, and further, lithium niobate containing Zn as a block (Hereinafter referred to as “ZnLN”) is more preferable.

次に、本発明の光導波路素子の製造方法について説明する。なお、以下では、LN基板を用いる例を示すが、本発明はこれに限定されるものではない。
(1)光導波路の形成
LN結晶で構成されたウェハ基板上に、光導波路のパターンでTiを基板表面に付着させ、加熱処理によりTiを基板内に熱拡散し、光導波路を形成する。
(2)電極等の形成
ウェハ基板にTi・Auの電極パターンを形成し、メッキ方法によりAu電極を形成する。電極を形成する前に、SiO膜などのバッファ層を光導波路上に形成することも可能である。バッファ層の形成方法は、スパッタリング法や蒸着法を用いることが可能である。
Next, the manufacturing method of the optical waveguide device of the present invention will be described. In the following, an example using an LN substrate is shown, but the present invention is not limited to this.
(1) Formation of optical waveguide Ti is adhered to the substrate surface in a pattern of an optical waveguide on a wafer substrate made of LN crystal, and Ti is thermally diffused into the substrate by heat treatment to form an optical waveguide.
(2) Formation of electrodes, etc. Ti / Au electrode patterns are formed on the wafer substrate, and Au electrodes are formed by a plating method. Before forming the electrode, it is possible to form a buffer layer such as a SiO 2 film on the optical waveguide. As a method for forming the buffer layer, a sputtering method or a vapor deposition method can be used.

(3)基板の研磨
ウェハ基板上の一部、特にブロックを接合させる領域を、斜めに浅く研磨する。研磨方法としては、研磨シートやラッピングモップなどを用いて研磨を行う。研磨工程は、ウェハ基板上に光導波路や電極など、光導波路素子に必要な部材を全て組み込んでから行うことも可能であるが、基本的には、光導波路の形成工程以降であれば、どの段階で行っても良い。
(3) Polishing the substrate A portion of the wafer substrate, particularly a region where the block is joined, is polished obliquely shallowly. As a polishing method, polishing is performed using a polishing sheet or a lapping mop. The polishing process can be performed after all the members required for the optical waveguide device such as the optical waveguide and the electrode are incorporated on the wafer substrate. You may go in stages.

(4)基板とブロックとの接合
ウェハ基板及びブロックとなるZnLNとを、硫酸過水などで洗浄し、乾燥後、常温で両者を直接接合する。接合後、80℃以上に加熱し、接合強度を強化することも可能である。
なお、光導波路素子を構成する基板とブロックとの接合は、ウェハ基板の段階で行うことも可能であるが、必要に応じて、ウェハ基板から切り出された光導波路素子のチップに対して、ブロックのチップを接合することも可能である。
(4) Bonding of substrate and block The wafer substrate and the ZnLN to be the block are washed with sulfuric acid / hydrogen peroxide, etc., dried, and then bonded together at room temperature. It is also possible to reinforce the bonding strength by heating to 80 ° C. or higher after bonding.
The substrate and the block constituting the optical waveguide element can be joined at the wafer substrate stage, but if necessary, the block can be applied to the chip of the optical waveguide element cut out from the wafer substrate. It is also possible to join the chips.

(5)光導波路素子の分離
ウェハ基板には、複数の光導波路素子が組み込まれているため、ウェハ基板を切断し、個別の光導波路素子に分離する。必要に応じ、光導波路素子の入射部又は出射部に相当する切断面を研磨し、光ファイバとの光結合性を向上させる研磨処理を行っても良い。
(5) Separation of optical waveguide elements Since a plurality of optical waveguide elements are incorporated in the wafer substrate, the wafer substrate is cut and separated into individual optical waveguide elements. If necessary, a cut surface corresponding to the incident portion or the emitting portion of the optical waveguide element may be polished to perform a polishing process for improving the optical coupling with the optical fiber.

以上説明したように、本発明によれば、光導波路の特性を劣化させること無く、基板表面にブロックを直接接合でき、しかも、低コストで量産性に優れた光導波路素子及びその製造方法を提供することが可能となる。   As described above, according to the present invention, an optical waveguide element capable of directly joining a block to the surface of a substrate without degrading the characteristics of the optical waveguide, and having excellent mass productivity is provided. It becomes possible to do.

本発明に係る光導波路素子の一部を示す図である。It is a figure which shows a part of optical waveguide element concerning this invention. 図1の光導波路素子を伝搬する光波の光モード形状の様子を示す図である。It is a figure which shows the mode of the optical mode shape of the light wave which propagates the optical waveguide element of FIG.

符号の説明Explanation of symbols

1 基板
2 光導波路
3 電極
4 ブロック
10 接合面(研磨面)
20,21 光モード形状
1 Substrate 2 Optical waveguide 3 Electrode 4 Block 10 Bonding surface (polished surface)
20, 21 Optical mode shape

Claims (6)

表面に光波が導波される光導波路を形成した基板と、該基板の端部に少なくとも該光導波路の一部を覆うように配設したブロックとを備えた光導波路素子において、
該基板と該ブロックとは直接接合されており、
該基板における該ブロックの接合面は、該基板の端面に向かって斜めに研磨されていることを特徴とする光導波路素子。
In an optical waveguide device comprising: a substrate on which an optical waveguide on which light waves are guided is formed; and a block disposed at an end of the substrate so as to cover at least a part of the optical waveguide.
The substrate and the block are directly bonded,
An optical waveguide device, wherein a bonding surface of the block in the substrate is polished obliquely toward an end surface of the substrate.
請求項1に記載の光導波路素子において、該基板の端部は、該光導波路素子の入射部又は出射部であることを特徴とする光導波路素子。   2. The optical waveguide device according to claim 1, wherein the end portion of the substrate is an incident portion or an emission portion of the optical waveguide device. 請求項2に記載の光導波路素子において、該光導波路に対する該基板の研磨面の勾配は1/1000から1/10000であることを特徴とする光導波路素子。   3. The optical waveguide element according to claim 2, wherein the gradient of the polishing surface of the substrate with respect to the optical waveguide is 1/1000 to 1/10000. 請求項1乃至3のいずれかに記載の光導波路素子において、該基板は、屈折率異方性を有する結晶基板であり、該ブロックは、該基板の持つ屈折率異方性と比較して特定方向の屈折率が高く、他の方向の屈折率が同じか低く、該基板と同じ結晶構造を有する材料であることを特徴とする光導波路素子。   4. The optical waveguide device according to claim 1, wherein the substrate is a crystal substrate having refractive index anisotropy, and the block is specified in comparison with the refractive index anisotropy of the substrate. An optical waveguide device characterized by being a material having a high refractive index in the direction and the same or low refractive index in the other direction and having the same crystal structure as the substrate. 請求項4に記載の光導波路素子において、該基板はニオブ酸リチウムであり、該光導波路はTi拡散により形成され、さらに、該ブロックはZn,Ni,Co又はMgの少なくとも一つを含むニオブ酸リチウムであることを特徴とする光導波路素子。   5. The optical waveguide device according to claim 4, wherein the substrate is lithium niobate, the optical waveguide is formed by Ti diffusion, and the block further includes at least one of Zn, Ni, Co, or Mg. An optical waveguide device characterized by being lithium. 請求項1乃至5のいずれかに記載の光導波路素子の製造方法において、ウェハ状の基板に複数の光導波路素子の作り込みを行った後、該光導波路素子の端部を斜めに研磨し、該ブロックを該端部に直接接合し、その後、個別の光導波路素子に切断・分離することを特徴とする光導波路素子の製造方法。
In the method for manufacturing an optical waveguide element according to any one of claims 1 to 5, after forming a plurality of optical waveguide elements on a wafer-like substrate, the end of the optical waveguide element is polished obliquely, A method of manufacturing an optical waveguide device, comprising: joining the block directly to the end, and then cutting and separating into individual optical waveguide devices.
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JP7205317B2 (en) 2019-03-13 2023-01-17 住友大阪セメント株式会社 Optical waveguide element and its manufacturing method

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