JP2007250791A5 - - Google Patents
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- Publication number
- JP2007250791A5 JP2007250791A5 JP2006071513A JP2006071513A JP2007250791A5 JP 2007250791 A5 JP2007250791 A5 JP 2007250791A5 JP 2006071513 A JP2006071513 A JP 2006071513A JP 2006071513 A JP2006071513 A JP 2006071513A JP 2007250791 A5 JP2007250791 A5 JP 2007250791A5
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- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006071513A JP4671355B2 (en) | 2006-03-15 | 2006-03-15 | Substrate processing apparatus cleaning method, substrate processing apparatus, and recording medium recording program |
KR1020070024796A KR100856816B1 (en) | 2006-03-15 | 2007-03-14 | Cleaning method of substrate processing equipment, substrate processing equipment, and recording medium for recording program thereof |
US11/686,738 US20070215180A1 (en) | 2006-03-15 | 2007-03-15 | Cleaning method of substrate processing equipment, substrate processing equipment, and recording medium for recording program thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006071513A JP4671355B2 (en) | 2006-03-15 | 2006-03-15 | Substrate processing apparatus cleaning method, substrate processing apparatus, and recording medium recording program |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2007250791A JP2007250791A (en) | 2007-09-27 |
JP2007250791A5 true JP2007250791A5 (en) | 2009-03-12 |
JP4671355B2 JP4671355B2 (en) | 2011-04-13 |
Family
ID=38594765
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006071513A Active JP4671355B2 (en) | 2006-03-15 | 2006-03-15 | Substrate processing apparatus cleaning method, substrate processing apparatus, and recording medium recording program |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP4671355B2 (en) |
KR (1) | KR100856816B1 (en) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5220447B2 (en) * | 2008-03-17 | 2013-06-26 | 東京エレクトロン株式会社 | Substrate processing system cleaning method, storage medium, and substrate processing system |
JP5294681B2 (en) | 2008-04-28 | 2013-09-18 | 東京エレクトロン株式会社 | Substrate processing apparatus and substrate transport method |
JP5463066B2 (en) | 2009-04-30 | 2014-04-09 | 東京エレクトロン株式会社 | Lot processing start determination method and control device |
WO2013146595A1 (en) * | 2012-03-30 | 2013-10-03 | 株式会社日立国際電気 | Substrate processing apparatus, method for controlling substrate processing apparatus, method for maintaining substrate processing apparatus, and recording medium |
JP6094148B2 (en) | 2012-10-29 | 2017-03-15 | 東京エレクトロン株式会社 | Substrate processing equipment |
JP6877200B2 (en) * | 2017-03-15 | 2021-05-26 | 東京エレクトロン株式会社 | Control device of board processing device and board processing display method |
JP6586443B2 (en) | 2017-10-10 | 2019-10-02 | 東京エレクトロン株式会社 | Method for processing an object |
CN114277361B (en) * | 2021-12-16 | 2024-03-15 | 华虹半导体(无锡)有限公司 | Control method and device for HDP-CVD equipment and storage medium |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000173932A (en) | 1998-12-08 | 2000-06-23 | Sony Corp | Method for cleaning reaction furnace |
US6791692B2 (en) * | 2000-11-29 | 2004-09-14 | Lightwind Corporation | Method and device utilizing plasma source for real-time gas sampling |
JP2003249488A (en) * | 2002-02-26 | 2003-09-05 | Seiko Epson Corp | Plasma processing system and method for fabricating semiconductor device |
JP2004140096A (en) * | 2002-10-16 | 2004-05-13 | Seiko Epson Corp | Plasma processing method and apparatus, and program and data storing medium |
KR100602080B1 (en) * | 2003-12-31 | 2006-07-14 | 동부일렉트로닉스 주식회사 | Cleaning method of etching chamber |
JP4423289B2 (en) * | 2004-04-06 | 2010-03-03 | 東京エレクトロン株式会社 | Substrate cleaning apparatus, substrate cleaning method, and medium recording program used for the method |
US20050279384A1 (en) | 2004-06-17 | 2005-12-22 | Guidotti Emmanuel P | Method and processing system for controlling a chamber cleaning process |
-
2006
- 2006-03-15 JP JP2006071513A patent/JP4671355B2/en active Active
-
2007
- 2007-03-14 KR KR1020070024796A patent/KR100856816B1/en active IP Right Grant
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