JP2007250791A5 - - Google Patents

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Publication number
JP2007250791A5
JP2007250791A5 JP2006071513A JP2006071513A JP2007250791A5 JP 2007250791 A5 JP2007250791 A5 JP 2007250791A5 JP 2006071513 A JP2006071513 A JP 2006071513A JP 2006071513 A JP2006071513 A JP 2006071513A JP 2007250791 A5 JP2007250791 A5 JP 2007250791A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2006071513A
Other languages
Japanese (ja)
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JP2007250791A (en
JP4671355B2 (en
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Publication date
Application filed filed Critical
Priority to JP2006071513A priority Critical patent/JP4671355B2/en
Priority claimed from JP2006071513A external-priority patent/JP4671355B2/en
Priority to KR1020070024796A priority patent/KR100856816B1/en
Priority to US11/686,738 priority patent/US20070215180A1/en
Publication of JP2007250791A publication Critical patent/JP2007250791A/en
Publication of JP2007250791A5 publication Critical patent/JP2007250791A5/ja
Application granted granted Critical
Publication of JP4671355B2 publication Critical patent/JP4671355B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2006071513A 2006-03-15 2006-03-15 Substrate processing apparatus cleaning method, substrate processing apparatus, and recording medium recording program Active JP4671355B2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2006071513A JP4671355B2 (en) 2006-03-15 2006-03-15 Substrate processing apparatus cleaning method, substrate processing apparatus, and recording medium recording program
KR1020070024796A KR100856816B1 (en) 2006-03-15 2007-03-14 Cleaning method of substrate processing equipment, substrate processing equipment, and recording medium for recording program thereof
US11/686,738 US20070215180A1 (en) 2006-03-15 2007-03-15 Cleaning method of substrate processing equipment, substrate processing equipment, and recording medium for recording program thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006071513A JP4671355B2 (en) 2006-03-15 2006-03-15 Substrate processing apparatus cleaning method, substrate processing apparatus, and recording medium recording program

Publications (3)

Publication Number Publication Date
JP2007250791A JP2007250791A (en) 2007-09-27
JP2007250791A5 true JP2007250791A5 (en) 2009-03-12
JP4671355B2 JP4671355B2 (en) 2011-04-13

Family

ID=38594765

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006071513A Active JP4671355B2 (en) 2006-03-15 2006-03-15 Substrate processing apparatus cleaning method, substrate processing apparatus, and recording medium recording program

Country Status (2)

Country Link
JP (1) JP4671355B2 (en)
KR (1) KR100856816B1 (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5220447B2 (en) * 2008-03-17 2013-06-26 東京エレクトロン株式会社 Substrate processing system cleaning method, storage medium, and substrate processing system
JP5294681B2 (en) 2008-04-28 2013-09-18 東京エレクトロン株式会社 Substrate processing apparatus and substrate transport method
JP5463066B2 (en) 2009-04-30 2014-04-09 東京エレクトロン株式会社 Lot processing start determination method and control device
WO2013146595A1 (en) * 2012-03-30 2013-10-03 株式会社日立国際電気 Substrate processing apparatus, method for controlling substrate processing apparatus, method for maintaining substrate processing apparatus, and recording medium
JP6094148B2 (en) 2012-10-29 2017-03-15 東京エレクトロン株式会社 Substrate processing equipment
JP6877200B2 (en) * 2017-03-15 2021-05-26 東京エレクトロン株式会社 Control device of board processing device and board processing display method
JP6586443B2 (en) 2017-10-10 2019-10-02 東京エレクトロン株式会社 Method for processing an object
CN114277361B (en) * 2021-12-16 2024-03-15 华虹半导体(无锡)有限公司 Control method and device for HDP-CVD equipment and storage medium

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000173932A (en) 1998-12-08 2000-06-23 Sony Corp Method for cleaning reaction furnace
US6791692B2 (en) * 2000-11-29 2004-09-14 Lightwind Corporation Method and device utilizing plasma source for real-time gas sampling
JP2003249488A (en) * 2002-02-26 2003-09-05 Seiko Epson Corp Plasma processing system and method for fabricating semiconductor device
JP2004140096A (en) * 2002-10-16 2004-05-13 Seiko Epson Corp Plasma processing method and apparatus, and program and data storing medium
KR100602080B1 (en) * 2003-12-31 2006-07-14 동부일렉트로닉스 주식회사 Cleaning method of etching chamber
JP4423289B2 (en) * 2004-04-06 2010-03-03 東京エレクトロン株式会社 Substrate cleaning apparatus, substrate cleaning method, and medium recording program used for the method
US20050279384A1 (en) 2004-06-17 2005-12-22 Guidotti Emmanuel P Method and processing system for controlling a chamber cleaning process

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