JP2007248493A - Electrooptic device and electronic apparatus having same - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To raise transmissivity while maintaining size of a non-aperture area in an electrooptic device such as a liquid crystal. <P>SOLUTION: The electrooptic device includes: a microlens array plate 20; a plurality of microlenses 500 arranged on the microlens array plate 20 with predetermined pixel pitch; a TFT array substrate 10 arranged facing the microlens array plate 20; a plurality of pixel electrodes 9a arranged on the TFT array substrate 20 with the predetermined pixel pitch; and data line 6a, scanning line 3a, a TFT 30 and storage capacitor 71 which are formed on the TFT array substrate 20, specify at least part of aperture areas by every pixel electrode 9a and are electrically connected with the plurality of pixel electrodes 9a. The aperture areas 910 are almost equal to condensation areas in which intensity of light condensed by every pixel electrode 9a by each of the plurality of microlenses 500 is specified as an area of ≥1% of the maximum value of the intensity by every pixel electrode 9a. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to a technical field of an electro-optical device such as a liquid crystal device, and an electronic apparatus such as a liquid crystal projector including the electro-optical device.

In this type of electro-optical device, a pixel electrode, a scanning line for selectively driving the pixel electrode, a data line, and a TFT (Thin Film Transistor) as a pixel switching element are formed on a substrate. The active matrix driving is possible. In general, a storage capacitor is provided between the TFT and the pixel electrode for the purpose of increasing the contrast.
As a technique for forming such a storage capacitor larger without causing a substantial decrease in the aperture ratio, for example, a technique in which corners of the pixel electrode are rounded is disclosed. (See Patent Document 1).

  On the other hand, in this type of electro-optical device, for example, a microlens corresponding to each pixel is formed on the counter substrate, or a microlens array plate in which such a plurality of microlenses are formed is attached. To do. With such a microlens, the light that travels toward the non-opening area excluding the opening area in each pixel as it is is condensed in units of pixels and transmitted through the electro-optic material layer. It is guided in the opening area. As a result, bright display is possible in the electro-optical device.

JP 2005-148766 A

  The light collected by such a microlens is distributed in a substantially circular shape in each pixel on the substrate, whereas the shape of the opening region is often rectangular. For this reason, there is a problem in that the area where the light is condensed and the non-opening area are increased, and the light cannot be sufficiently transmitted. On the other hand, if the light collection efficiency is increased in order to reduce such an overlap, there is a risk that the heat of the collected light may damage an electro-optical material such as a liquid crystal or an alignment film. There is also a point. Alternatively, in order to reduce such an overlap, if the opening region is widened, it is necessary to reduce the storage capacitor or the like arranged in the non-opening region, and the pixel potential holding capability may be reduced. There is also a point.

  The present invention has been made in view of the above-described problems, for example, and includes an electro-optical device that can improve the transmittance while maintaining the size of the non-opening region, and the electro-optical device. It is an object to provide an electronic device.

  In order to solve the above problems, an electro-optical device according to an aspect of the invention is arranged to face a first substrate, a plurality of microlenses arranged on the first substrate at a predetermined pixel pitch, and the first substrate. A second substrate, a plurality of pixel electrodes arranged on the second substrate at the predetermined pixel pitch, and formed on the second substrate, defining at least a part of an opening region for each pixel electrode; Wiring and electronic elements electrically connected to a plurality of pixel electrodes, and the opening region has an intensity of light collected by each of the plurality of microlenses for each pixel electrode. Is substantially equal to a light collection region defined as a region that is 1% or more of the maximum value of the intensity.

  In the electro-optical device of the present invention, a plurality of microlenses are formed at a predetermined pixel pitch on a first substrate made of, for example, a glass substrate. That is, a microlens corresponding to each pixel is formed on the first substrate, or a microlens array plate on which such a plurality of microlenses are formed is attached. As a result, the light incident from the first substrate side is collected by the microlens in units of pixels. On the other hand, on a second substrate made of, for example, a glass substrate or a quartz substrate, a plurality of pixel electrodes made of a transparent conductive film such as ITO (Indium Tin Oxide) are arranged in a matrix at a predetermined pixel pitch. For example, wirings such as scanning lines and data lines and electronic elements such as pixel switching TFTs (Thin Film Transistors) are electrically connected to the plurality of pixel electrodes. Thereby, active matrix driving by a plurality of pixels is possible. Note that by forming the storage capacitor connected to the pixel electrode, the potential holding characteristic of the pixel electrode is improved.

  The wiring and the electronic element that are electrically connected to the plurality of pixel electrodes formed on the second substrate define at least a part of the opening region for each pixel electrode. Here, the “opening area” according to the present invention is an area in the pixel through which light is substantially transmitted. For example, light condensed on the pixel is blocked by a wiring, a light-shielding film, an electronic element, or the like. It means the area without. Conversely, a region in which wiring, a light-shielding film, an electronic element, and the like are formed in a pixel and light that contributes to display is not transmitted can be referred to as a “non-opening region”, and is electrically connected to a plurality of pixel electrodes. In other words, the connected wiring and the electronic element define at least a part of the non-opening region or are formed in the non-opening region.

  In the present invention, the light incident from the first substrate side is condensed by each of the plurality of microlenses so as to go to the opening region for each pixel. The region where the light thus collected passes through the second substrate is typically centered on a point that coincides with the center of the pixel (or the point on the second substrate facing the center of the microlens). The intensity of light is, for example, the maximum at the center, and the intensity gradually decreases with increasing distance from the center along the radial direction.

  In the present invention, in particular, the aperture region is a light condensing that is defined as a region in which the intensity of the light collected for each pixel electrode by each of the plurality of microlenses is 1% or more of the maximum intensity value for each pixel electrode. It is almost equal to the area. Here, the “condensing region” according to the present invention means a region on the second substrate through which light substantially condensed by the microlens is transmitted for each pixel, and specifically, for each pixel. Of the region where the light collected by the microlens is transmitted through the second substrate, the region is typically a circular region where the light intensity is 1% or more of the maximum value. In the present invention, “the aperture region is substantially equal to the light collection region” means that the aperture region and the light collection region are substantially the same as the case where the aperture region and the light collection region are substantially equal. For the light region, the aperture region is substantially the same as the circle formed by the condensing region (that is, the center and the radius are substantially equal), or the aperture region is formed by the condensing region. This is intended to include the case of forming a polygon such as an octagon or a dodecagon that substantially circumscribes a circle. In other words, in the present invention, in particular, the wiring and the electronic element that define the opening region are formed along the contour line of the condensing region. That is, these wirings and electronic elements are arranged according to the light condensing state by the microlens. Therefore, the transmittance of each pixel can be improved while maintaining or increasing the area of the non-opening region for forming the wiring and the electronic element. If no countermeasures are taken, typically, the opening area is defined as a rectangle by wiring formed vertically and horizontally, and partially overlaps the condensing area that forms a circle, so that light is blocked by the wiring. It is difficult to improve the transmittance. Or, in order to avoid the overlapping of the aperture region and the condensing region, the efficiency of condensing light by the microlens is increased, and when the condensing region is reduced, the light is condensed. The heat of the light may damage, for example, an electro-optical material such as liquid crystal, an alignment film, and the like, which may adversely affect image display. However, according to the present invention, since the aperture region is substantially equal to the light collection region, it is possible to almost or completely avoid the non-aperture region and the light collection region from partially overlapping, thereby improving the transmittance. it can. Furthermore, since the aperture region is substantially equal to the light collection region, the portion of the aperture region that does not overlap the light collection region can be reduced or eliminated, and the area of the non-open region can be maintained or increased. Therefore, for example, it is possible to reduce the resistance of the wiring and increase the capacity of, for example, a storage capacitor.

  As described above, according to the electro-optical device of the present invention, the aperture area is almost equal to the light collection area, so that the transmittance can be improved, and for example, the storage capacity can be increased and the wiring can be reduced. Resistance can be achieved. Thereby, high-quality image display is possible.

In one aspect of the electro-optical device of the present invention, the electronic element is provided with a storage capacitor. According to this aspect, during operation of the electro-optical device, the charge held in the pixel electrode leaks due to the storage capacitor. Can be reduced or prevented. Furthermore, the capacity can be increased without reducing the transmittance by forming the storage capacity larger so that the opening area is substantially equal to the light collection area. Therefore, high-quality image display is possible.

  3. The electro-optical device according to claim 1, wherein the opening region is a polygon circumscribing the condensing region.

  According to this aspect, the opening region includes the condensing region when viewed in plan on the second substrate. The polygon formed by the outline of the opening area is a circumscribed polygon circumscribing, for example, a circle formed by the outline of the light collection area. Therefore, it is possible to easily make the aperture region substantially equal to the light collection region that forms a circle, an ellipse, or the like. In other words, it is possible to arrange or form the wiring and the electronic element so that the opening region is substantially equal to the condensing region as compared with the case where the wiring and the electronic device are formed to have a curved surface or a curve. it can. Therefore, it is possible to easily improve the transmittance and increase the size of an electronic element such as a storage capacitor or the resistance of a wiring.

  In another aspect of the electro-optical device according to the aspect of the invention, the condensing region may be a circle, and the opening region may have a distance from the center of the circle to each side that is 0.9 times the radius of the circle and Form a polygon that is 1.1 times or less.

  According to this aspect, the opening area can be easily made substantially equal to the condensing area forming a circle. In other words, it is possible to arrange or form the wiring and the electronic element so that the opening region is substantially equal to the condensing region as compared with the case where the wiring and the electronic device are formed to have a curved surface or a curve. Easy to do. Therefore, it is possible to easily improve the transmittance and increase the size of the electronic element such as the storage capacitor and the resistance of the wiring.

  In order to solve the above-described problems, an electronic apparatus according to the present invention includes the above-described electro-optical device according to the present invention (including various aspects thereof).

  According to the electronic apparatus of the present invention, since the electro-optical device of the present invention described above is provided, a projection display device, a television, a mobile phone, an electronic notebook, and a word processor capable of performing high-quality image display. Various electronic devices such as a viewfinder type or a monitor direct view type video tape recorder, a workstation, a videophone, a POS terminal, and a touch panel can be realized. In addition, as an electronic apparatus of the present invention, for example, an electrophoretic device such as electronic paper, an electron emission device (Field Emission Display and Conduction Electron-Emitter Display), and a display device using these electrophoretic device and electron emission device are realized. Is also possible.

  The operation and other advantages of the present invention will become apparent from the best mode for carrying out the invention described below.

Hereinafter, embodiments of the present invention will be described with reference to the drawings. In the following embodiments, a driving circuit built-in type TFT active matrix driving type liquid crystal device, which is an example of the electro-optical device of the present invention, is taken as an example.
<First Embodiment>
The liquid crystal device according to the first embodiment will be described with reference to FIGS.

  First, the overall configuration of the liquid crystal device according to the present embodiment will be described with reference to FIGS. 1 and 2. FIG. 1 is a plan view showing the configuration of the liquid crystal device according to this embodiment, and FIG. 2 is a cross-sectional view taken along the line H-H 'in FIG.

  1 and 2, in the liquid crystal device according to the present embodiment, a TFT array substrate 10 and a microlens array plate 20 used as a counter substrate are arranged to face each other. The microlens array plate 20 is an example of a “first substrate” according to the present invention, and the TFT array substrate 10 is an example of a “second substrate” according to the present invention. A liquid crystal layer 50 is sealed between the TFT array substrate 10 and the microlens array plate 20, and the TFT array substrate 10 and the microlens array plate 20 are provided in a seal region positioned around the image display region 10a. They are bonded to each other by a sealing material 52.

  The sealing material 52 is made of, for example, an ultraviolet curable resin, a thermosetting resin, or the like for bonding the two substrates, and is applied on the TFT array substrate 10 in the manufacturing process and then cured by ultraviolet irradiation, heating, or the like. It is. Further, a gap material such as glass fiber or glass bead is dispersed in the sealing material 52 to set the distance between the TFT array substrate 10 and the microlens array plate 20 (inter-substrate gap) to a predetermined value. In other words, the liquid crystal device according to the present embodiment is small and suitable for performing enlarged display for a projector light valve.

  A light-shielding frame light-shielding film 53 that defines the frame area of the image display region 10a is provided on the microlens array plate 20 side in parallel with the inside of the seal region where the sealing material 52 is disposed. Of the peripheral regions located around the image display region 10 a, the data line driving circuit 101 and the external circuit connection terminal 102 are arranged on one side of the TFT array substrate 10 in the region located outside the seal region where the sealing material 52 is disposed. It is provided along. The sampling circuit 7 is provided so as to be covered with the frame light shielding film 53 on the inner side of the seal region along the one side. Further, the scanning line driving circuit 104 is provided so as to be covered with the frame light-shielding film 53 inside the seal region along two sides adjacent to the one side. On the TFT array substrate 10, vertical conduction terminals 106 for connecting the two substrates with the vertical conduction material 107 are disposed in regions facing the four corner portions of the microlens array plate 20. Thus, electrical conduction can be established between the TFT array substrate 10 and the counter substrate 20.

  On the TFT array substrate 10, a lead wiring 90 is formed for electrically connecting the external circuit connection terminal 102 to the data line driving circuit 101, the scanning line driving circuit 104, the vertical conduction terminal 106, and the like. .

  In FIG. 2, on the TFT array substrate 10, a laminated structure in which wirings such as pixel switching TFTs as electronic elements, scanning lines, and data lines are formed. In the image display area 10a, a pixel electrode 9a is provided in an upper layer of wiring such as a pixel switching TFT, a scanning line, and a data line. On the other hand, although a detailed configuration will be described later, a light shielding film 23 is formed on the surface of the microlens array plate 20 facing the TFT array substrate 10. A counter electrode 21 made of a transparent material such as ITO is formed on the light shielding film 23 so as to face the plurality of pixel electrodes 9a. Further, the liquid crystal layer 50 is made of, for example, a liquid crystal in which one or several types of nematic liquid crystals are mixed, and takes a predetermined alignment state between the pair of alignment films.

  Although not shown here, on the TFT array substrate 10, in addition to the data line driving circuit 101 and the scanning line driving circuit 104, a precharge signal having a predetermined voltage level is preceded by an image signal for a plurality of data lines. In addition, a precharge circuit to be supplied, an inspection circuit for inspecting the quality, defects, etc. of the liquid crystal device during manufacture or at the time of shipment may be formed.

  Next, the circuit configuration and operation of the liquid crystal device according to this embodiment configured as described above will be described with reference to FIG. FIG. 3 is an equivalent circuit diagram of various elements, wirings, and the like in a plurality of pixels formed in a matrix that forms an image display area of the liquid crystal device.

  In FIG. 3, switching control is performed on the pixel electrode 9 a and the pixel electrode 9 a for a plurality of pixels formed in a matrix that forms the image display region 10 a (see FIG. 1) of the liquid crystal device according to the present embodiment. The data line 6 a to which an image signal is supplied is electrically connected to the source of the TFT 30. The image signals S1, S2,..., Sn written to the data lines 6a may be supplied line-sequentially in this order, or may be supplied for each group to a plurality of adjacent data lines 6a. Good.

  Further, the scanning line 3a is electrically connected to the gate of the TFT 30, and the scanning signals G1, G2,..., Gm are applied to the scanning line 3a in a pulse-sequential manner in this order at a predetermined timing. It is configured. The pixel electrode 9a is electrically connected to the drain of the TFT 30, and the image signal S1, S2,..., Sn supplied from the data line 6a is obtained by closing the switch of the TFT 30 as a switching element for a certain period. Write at a predetermined timing.

  A predetermined level of image signals S1, S2,..., Sn written to the liquid crystal layer 50 (see FIG. 2) via the pixel electrode 9a is between the counter electrode 21 formed on the microlens array plate 20 for a certain period. Retained. The liquid crystal modulates light and enables gradation display by changing the orientation and order of the molecular assembly depending on the applied voltage level. In the normally white mode, the transmittance for incident light is reduced according to the voltage applied in units of each pixel, and in the normally black mode, the light is incident according to the voltage applied in units of each pixel. The light transmittance is increased, and light having a contrast corresponding to an image signal is emitted from the liquid crystal device as a whole.

  In order to prevent the image signal held here from leaking, a storage capacitor 70 is added in parallel with the liquid crystal capacitor formed between the pixel electrode 9a and the counter electrode. The storage capacitor 70 is provided side by side with the scanning line 3a, and includes a capacitor line 300 including a fixed potential side capacitor electrode and fixed at a predetermined potential. The storage capacitor 70 improves the charge retention characteristics of each pixel electrode. Note that the potential of the capacitor line 300 may be constantly fixed to one voltage value, or may be fixed while being swung to a plurality of voltage values at a predetermined period.

  Next, a specific configuration of the pixel portion that realizes the above-described operation will be described with reference to FIGS. FIG. 4 is a plan view of a plurality of pixel groups adjacent to each other on the TFT array substrate on which the data lines, scanning lines, pixel electrodes and the like are formed in the liquid crystal device according to this embodiment. FIG. It is sectional drawing in the AA 'line.

  In FIG. 4, a plurality of pixel electrodes 9 a are provided in a matrix pattern on the TFT array substrate 10 (the outline is indicated by a dotted line portion 9 a ′), and the pixel electrodes 9 a extend along the vertical and horizontal boundaries of the pixel electrode 9 a. A data line 6a and a scanning line 3a are provided. The data line 6a is made of, for example, an aluminum film, and the scanning line 3a is made of, for example, a conductive polysilicon film. The scanning line 3a is disposed so as to face the channel region 1a ′ in the semiconductor layer 1a, and the scanning line 3a functions as a gate electrode. In other words, each of the intersections of the scanning line 3a and the data line 6a is provided with a pixel switching TFT 30 in which the main line portion of the scanning line 3a is opposed to the channel region 1a ′ as a gate electrode.

  As shown in FIG. 5, the liquid crystal device according to the present embodiment includes a TFT array substrate 10 made of, for example, a glass substrate, and a microlens array plate 20 disposed to face the TFT array substrate 10. The configuration of the microlens array plate will be described later. A pixel electrode 9a is provided on the TFT array substrate 10, and an alignment film 16 that has been subjected to a predetermined alignment process such as a rubbing process is provided above the pixel electrode 9a. Among these, the pixel electrode 9a is made of, for example, an ITO film. On the other hand, the microlens plate 20 is provided with a counter electrode 21 over the entire surface thereof, and an alignment film 22 subjected to a predetermined alignment process such as a rubbing process is provided below the counter electrode 21. Among these, the counter electrode 21 is made of a transparent conductive film such as an ITO film, for example, and the alignment films 16 and 22 are made of a transparent organic film such as a polyimide film, for example, in the same manner as the pixel electrode 9a. The liquid crystal layer 50 takes a predetermined alignment state by the alignment films 16 and 22 in a state where an electric field from the pixel electrode 9a is not applied.

  As shown in FIG. 5, the TFT 30 has an LDD (Lightly Doped Drain) structure, and as its constituent elements, the scanning line 3a functioning as a gate electrode as described above, for example, a scanning line made of a polysilicon film. The channel region 1a ′ of the semiconductor layer 1a in which a channel is formed by the electric field from 3a, the insulating film 2 including the gate insulating film that insulates the scanning line 3a from the semiconductor layer 1a, the low-concentration source region 1b in the semiconductor layer 1a, and the low A concentration drain region 1c, a high concentration source region 1d, and a high concentration drain region 1e are provided.

  On the other hand, in FIG. 5, the storage capacitor 70 includes a lower electrode 71 connected to the high-concentration drain region 1 e of the TFT 30 and the pixel electrode 9 a and a part of the capacitor line 300 as the upper electrode. It is formed by arrange | positioning through.

  The lower electrode 71 is made of, for example, a conductive polysilicon film, and is electrically connected to the high-concentration drain region 1 e of the TFT 30 through the contact hole 83. That is, the lower electrode 71 functions as a pixel potential side capacitance electrode that is set to the pixel potential. Further, the lower electrode 71 has a function of electrically connecting the pixel electrode 9 a and the high-concentration drain region 1 e of the TFT 30 through the contact holes 83 and 85. When viewed in a plan view, the lower electrode 71 has a portion along the scanning line 3a in the intersection region where the data line 6a and the scanning line 3a cross each other as shown in FIG. 6a, and a portion along the data line 6a from each portion intersecting with 6a. Furthermore, in particular, in the present embodiment, the lower electrode 71 includes an overhanging portion 71a that protrudes toward the center of each pixel in an intersection region where the data line 6a and the scanning line 3a intersect each other. Yes. The configuration and operational effects relating to the overhanging portion 71a will be described in detail later.

  The dielectric film 75 is made of, for example, a silicon oxide film.

  The capacitor line 300 is made of a metal film such as an aluminum film, for example, and functions as a fixed potential side capacitor electrode disposed to face the lower electrode 71. When seen in a plan view, the capacitor line 300 is formed so as to overlap the region where the scanning line 3a is formed, as shown in FIG. More specifically, the capacitor line 300 includes a main line portion that extends along the scanning line 3a, a protruding portion that protrudes upward along the data line 6a from each location that intersects the data line 6a, and a contact hole. A portion corresponding to 85 is provided with a constricted portion slightly constricted. Further, in the present embodiment, in particular, the capacitor line 300 protrudes toward the center of each pixel in the intersection region where the data line 6a and the scanning line 3a intersect each other, like the lower electrode 71 described above. An overhanging portion 300a is provided. The configuration and operational effects relating to the overhanging portion 300a will be described in detail later. The capacitor line 300 is electrically connected to a constant potential source and has a fixed potential. As the constant potential source, for example, a constant potential source supplied to the data line driving circuit 101 or a counter electrode potential supplied to the counter electrode 21 may be used.

  4 and 5, a lower light shielding film 11 a is provided below the TFT 30. The lower light-shielding film 11a is patterned in a lattice pattern, thereby defining an opening area of each pixel. Further, the lower light-shielding film 11a against back-light reflected from the lower layer side such as back-surface reflection on the TFT array substrate 10 or light emitted from another liquid crystal device by a multi-plate projector or the like and penetrating the composite optical system. Thus, the channel region 1a of the TFT 30 is shielded from light. The lower light-shielding film 11a is composed of a single layer film or a multilayer film containing a metal or an alloy. The opening area is also defined by the data line 6a in FIG. 4 and the capacitor line 300 formed so as to intersect with the data line 6a. Similarly to the case of the capacitance line 300 described above, the lower light-shielding film 11a is also extended from the image display region to the periphery thereof in order to avoid the potential fluctuation from adversely affecting the TFT 30. Connected to potential source.

  On the scanning line 3a, a first interlayer insulating film 41 is formed in which a contact hole 81 leading to the high concentration source region 1d and a contact hole 83 leading to the high concentration drain region 1e are opened.

  A lower electrode 71, a dielectric film 75, and a capacitor line 300 are formed on the first interlayer insulating film 41. A contact hole 81 and a lower electrode 71 leading to the high-concentration source region 1d are formed thereon. A second interlayer insulating film 42 is formed in which contact holes 85 leading to each other are opened.

  A data line 6 a is formed on the second interlayer insulating film 42, and a third interlayer insulating film 43 in which a contact hole 85 leading to the lower electrode 71 is formed is formed thereon.

  Next, the microlens array plate of the liquid crystal device according to the present embodiment will be described with reference to FIGS. FIG. 6A is a schematic perspective view of the microlens array plate, and FIG. 6B is a schematic perspective view showing the configuration of the BB ′ cross section of FIG. FIG. 7A is a partial enlarged cross-sectional view of a microlens array plate, and FIG. 7B is a partial enlarged plan view showing an enlarged portion related to four microlenses in the microlens array plate. FIG. 7C is an enlarged perspective view schematically showing the three-dimensional shape of the lens surface of the microlens.

  As shown in FIG. 6A, the microlens array plate 20 includes a transparent substrate 210 made of, for example, a quartz plate, and a cover glass 200 bonded to the transparent substrate 210 with an adhesive 230.

  In the lens forming region 20a of the microlens array plate 20, a large number of microlenses 500 arranged in a matrix in the following manner are formed. In FIG. 6B, the transparent substrate 210 has a large number of concave depressions, that is, depressions, formed in a matrix. In each recess, a transparent adhesive layer 230 having a higher refractive index than that of the transparent plate member 210 is formed by curing an adhesive made of, for example, a photosensitive resin material, which bonds the cover glass 200 and the transparent plate member 210 to each other. Is filled. The microlens 500 is formed by the adhesive layer 230 filled in each recess.

  As shown in FIG. 7A, the curved surface of each microlens 500 is generally defined by a transparent substrate 210 and an adhesive layer 230 having different refractive indexes. More specifically, each concave portion has a lens curved surface of the microlens 500. Each microlens 500 is constructed as a plano-convex lens having a lens curved surface defined by a recess.

  As shown in FIG. 7B, the planar shape of each microlens 500 is preferably rectangular. The planar shape of each microlens 500 is defined by the edge of the recess. And the recessed part in which one microlens 500 shown in FIG.7 (b) is formed is adjacent to the recessed part in which the other microlens 500 was formed, sharing an edge. FIG. 7C schematically shows the three-dimensional shape of the microlens 500 viewed from the lens curved surface side. In FIG. 7C, the four microlenses 500 adjacent to each other are formed by connecting lens curved surfaces to each other. Therefore, compared with the case where a column is provided between adjacent microlenses, each microlens 500 can have a wide effective area as a lens.

  Next, the function of the microlens array plate 20 described above will be described with reference to FIG. FIG. 8 is a cross-sectional view for explaining the function of each microlens.

  As shown in FIG. 8, in the microlens array plate 20, a light shielding film 23 having, for example, a lattice-like planar pattern is formed on a transparent substrate 210. Each microlens 500 is arranged so as to correspond to each pixel. That is, the microlenses 500 are arranged in a matrix at a pitch equal to a predetermined pixel pitch at which pixels are arranged.

  On the transparent substrate 210, the counter electrode 21 is formed so as to cover the light shielding film 23. Further, an alignment film 22 is formed on the counter electrode 21.

  On the other hand, a pixel electrode 9 a is formed on the TFT array substrate 10. Although not shown in FIG. 8, on the TFT array substrate 10, as described above with reference to FIGS. 4 and 5, the pixel switching TFT 30 and the scanning line for driving the pixel electrode 9a are provided. Various wirings such as 11a and data line 6a, electronic elements such as storage capacitor 70, and light shielding film 11a are formed. These together with the light shielding film 23 define an opening region through which light in each pixel transmits, in other words, a non-opening region through which light in each pixel does not transmit.

  In FIG. 8, light such as projection light incident on the microlens array plate 20 is collected by each microlens 500. In FIG. 8, the appearance of the light collected by the microlens 500 by the alternate long and short dash line is schematically shown corresponding to the light collection region described later. Then, the light collected by each microlens 500 is transmitted through the liquid crystal layer 50 to be applied to the pixel electrode 9a, passes through the pixel electrode 9a, and is emitted from the TFT array substrate 10 as display light.

  FIG. 8 shows a configuration in which a curved surface in which each microlens 500 protrudes in a convex shape is arranged in a downward direction in the figure in the liquid crystal device, but each microlens 500 protrudes in a convex shape. You may make it arrange | position a curved surface toward the upper side in the figure.

  Next, the arrangement of wiring elements such as data lines and scanning lines, and electronic elements such as storage capacitors in the liquid crystal device according to this embodiment will be described with reference to FIGS. 9 to 11 in addition to FIG. FIG. 9 is an explanatory diagram showing the relationship between the aperture region, the non-aperture region, and the light collection region. FIG. 10 is an explanatory diagram showing the relationship between the light collection region and the light intensity. FIG. 11 is an explanatory diagram having the same concept as in FIG. 9 in the comparative example.

  FIG. 9 shows the relationship between an opening region 910, a non-opening region 920, and a condensing region 710 for any four adjacent pixels among a plurality of pixels arranged in a matrix in the image display region 10a. Yes.

  4 and 9, an opening region 910 is a region in the pixel that substantially transmits light, such as a wiring that blocks light such as the scanning line 3a, the data line 6a, the light shielding film 11a, the TFT 30, and the storage capacitor 70. This is a region where no electronic element is formed. On the contrary, the non-opening region 920 is formed with wirings and electronic elements that block light such as the scanning lines 3a, the data lines 6a, the light shielding film 11a, the TFT 30, and the storage capacitor 70 (see FIG. 4), and contribute to display. This is a region where light is not transmitted.

  As described above with reference to FIG. 8, the light incident from the microlens array plate 20 side is collected for each pixel by each microlens 500. The region where the condensed light passes through the TFT array substrate 10 has a circular shape centered on a point coincident with the center C1 of the pixel. As shown in FIG. 10, the intensity d1 of the light collected for each pixel becomes maximum near the center, and the intensity gradually decreases with increasing distance from the center along the radial direction.

  The condensing area 710 is an area on the TFT array substrate 10 through which light substantially condensed by the microlens 500 is transmitted for each pixel.

  As shown in FIG. 10, in the present embodiment, the light condensing region 710 has a light intensity d <b> 1 having a maximum value in a region where light collected by the microlens 500 for each pixel is transmitted through the TFT array substrate 10. It means an area that is 1% or more. Therefore, the light transmitted through the condensing region 710 substantially contributes to the image display, and the light traveling to the region other than the condensing region 710 hardly contributes to the image display. The radius L2 of the light condensing region 710 can be adjusted by changing the shape of the curved surface of the microlens 500, the distance between the microlens array plate 20 and the TFT array substrate 10, and the like. Depending on the specifications required for the apparatus, for example, the pixel pitch L1 and the width L3 of the non-opening region required between the pixels, the radius L2 of the condensing region 710 is, for example, 0.18 to 0.42 times the pixel pitch L1. It is adjusted to be in the range.

  As shown in FIG. 9, particularly in the present embodiment, the opening region 910 is substantially equal to the light collection region 710. More specifically, the outline of the opening area 910 is an octagon circumscribing a circle formed by the outline of the light collection area 710. In other words, the non-opening region 920 projects toward the center C1 of the pixel in a lattice-shaped region along the scanning line 3a and the data line 6a and an intersecting region where the data line 6a and the scanning line 3a intersect each other. And an overhang region 920a.

  As shown in FIG. 11A as a first comparative example, no measures are taken, and the opening region 950 is formed as a data line 6a and a scanning line 3a (or a grid-like light shielding film along each of them). , The non-opening region 960 partially overlaps the condensing region 750 that forms a circle. Since light is blocked in the overlapping region 751 in this way, it is difficult to improve the transmittance.

  Alternatively, as shown in FIG. 11B as a second comparative example, light is collected by the microlens 500 in order to avoid the overlap between the aperture region and the light collection region. If the efficiency is increased and the light collection region 770 is made small so as to be completely included in the opening region 950, light can be prevented from being blocked in the non-opening region 960, but the heat of the collected light The liquid crystal layer 50, the alignment film 16 and the like may be damaged, and the image display may be adversely affected.

  However, in this embodiment, in particular, as described above with reference to FIG. 9, since the opening region 910 is substantially equal to the light collection region 710, the non-opening region 920 and the light collection region 710 partially overlap each other. Can be avoided almost or completely, and the transmittance can be improved. Further, since the aperture region 910 is substantially the same as the condensing region 710, a portion of the aperture region 910 that does not overlap with the condensing region 710 (that is, a portion of the aperture region 910 that does not substantially contribute to improvement in transmittance). The area of the non-opening region 920 can be increased while maintaining the transmittance. That is, the overhanging portion 300a of the capacitor line 300 and the overhanging portion 71a of the lower electrode 71 can be formed in correspondence with the overhanging region 920a of the non-opening region 920 as described above with reference to FIG. . That is, the storage capacitor 71 can be formed large and the capacity can be increased. In other words, light transmittance can be obtained by using, as non-opening areas, the portions located at the four corners of the rectangular opening area as in the comparative example shown in FIG. The storage capacitor 71 can be formed large while maintaining the above. The data line 6a and the scanning line 3a may be formed corresponding to the overhanging area 920 in the same manner. In this case, the resistance of the wiring can be reduced.

  In FIG. 9, the distance from the center of the condensing region 710 that coincides with the center C1 of the pixel to each side of the opening region 910 is 0.9 times or more and 1.1 times the radius L2 of the condensing region 710. You may comprise so that it may become the following polygon. Also in this case, since the opening area 910 and the light condensing area 710 are substantially equal, the same effect as in the present embodiment can be obtained.

  As described above, according to the liquid crystal device of the present embodiment, the aperture region 910 is substantially equal to the light condensing region 710, so that the transmittance can be improved and, for example, the storage capacitor 71 can be increased in capacity. be able to. Thereby, high-quality image display is possible.

  Next, the arrangement of wiring elements such as data lines and scanning lines and electronic elements such as storage capacitors in a modification of the liquid crystal device according to this embodiment will be described with reference to FIG. 12 in addition to FIG. FIG. 12 is an explanatory diagram showing the relationship between the aperture region and the light collection region in the modification.

  As shown in FIG. 12A as a first modification, in each pixel, the opening region 910 may be a dodecagon circumscribing the light condensing region 710. In this case, the opening area 910 can be made to coincide with the light collection area 710 even more reliably.

  As shown in FIG. 12B as a second modified example, in each pixel, the opening region 910 may be a regular hexagon circumscribing the condensing region 710. Also in this case, for example, the storage capacitor 70 can be formed large in the non-opening region 920 while improving the transmittance, and manufacturing is also easy.

As shown in FIG. 12C as the third modified example, when the condensing region 710 is an elliptical region, the opening region 910 is circumscribed by the ellipse formed by the condensing region 710 in each pixel. It may be square. Also in this case, for example, the storage capacitor 70 can be formed larger in the non-opening region 920 while improving the transmittance.
<Electronic equipment>
Next, an overall configuration, particularly an optical configuration, of an embodiment of a projection color display device as an example of an electronic apparatus using the above-described electro-optical device as a light valve will be described. FIG. 13 is a schematic cross-sectional view of the projection type color display device.

  In FIG. 13, a liquid crystal projector 1100, which is an example of a projection type color display device, prepares three liquid crystal modules including a liquid crystal device having a drive circuit mounted on a TFT array substrate, and RGB light valves 100R, 100G, and The projector is configured as 100B. In the liquid crystal projector 1100, when projection light is emitted from a lamp unit 1102 of a white light source such as a metal halide lamp, light components R, G, and R corresponding to the three primary colors of RGB are obtained by three mirrors 1106 and two dichroic mirrors 1108. The light is divided into B and led to the light valves 100R, 100G and 100B corresponding to the respective colors. In particular, the B light is guided through a relay lens system 1121 including an incident lens 1122, a relay lens 1123, and an exit lens 1124 in order to prevent light loss due to a long optical path. Light components corresponding to the three primary colors modulated by the light valves 100R, 100G, and 100B are synthesized again by the dichroic prism 1112 and then projected as a color image on the screen via the projection lens 1114.

  The present invention is not limited to the above-described embodiment, and can be appropriately changed without departing from the spirit or idea of the invention that can be read from the claims and the entire specification, and an electro-optical device with such a change, In addition, an electronic apparatus including the electro-optical device is also included in the technical scope of the present invention.

It is a top view which shows the whole structure of the liquid crystal device which concerns on 1st Embodiment. It is the HH 'sectional view taken on the line of FIG. 3 is an equivalent circuit diagram of a plurality of pixels of the liquid crystal device according to the first embodiment. FIG. 3 is a plan view of a plurality of pixels in the liquid crystal device according to the first embodiment. FIG. It is sectional drawing in the AA 'line of FIG. FIG. 6A is a schematic perspective view of the microlens array plate, and FIG. 6B is a schematic perspective view showing the configuration of the BB ′ cross section of FIG. 6A. FIG. 7A is a partial enlarged cross-sectional view of a microlens array plate, and FIG. 7B is a partial enlarged plan view showing an enlarged portion related to four microlenses in the microlens array plate. FIG. 7C is an enlarged perspective view schematically showing the three-dimensional shape of the lens surface of the microlens. It is sectional drawing for demonstrating the function of each micro lens. It is explanatory drawing which shows the relationship between an opening area | region, a non-opening area | region, and a condensing area | region. It is explanatory drawing which shows the relationship between a condensing area | region and light intensity. It is explanatory drawing of the same meaning as FIG. 9 in a comparative example. It is explanatory drawing which shows the relationship between the opening area | region and condensing area | region in a modification. 1 is a schematic cross-sectional view showing a color liquid crystal projector as an example of a projection type color display device which is an embodiment of an electronic apparatus of the present invention.

Explanation of symbols

  9a ... pixel electrode, 3a ... scanning line, 6a ... data line, 7 ... sampling circuit, 10 ... TFT array substrate, 10a ... image display area, 20 ... microlens array plate, 21 ... counter electrode, 23 ... light shielding film, 50 ... Liquid crystal layer, 52 ... Sealing material, 53 ... Frame light shielding film, 101 ... Data line driving circuit, 102 ... External circuit connection terminal, 104 ... Scanning line driving circuit, 106 ... Vertical conduction terminal, 107 ... Vertical conduction material, 500 ... Microlens, 710 ... Condensing region, 910 ... Opening region,

Claims (5)

A first substrate;
A plurality of microlenses arranged at a predetermined pixel pitch on the first substrate;
A second substrate disposed opposite the first substrate;
A plurality of pixel electrodes arranged at the predetermined pixel pitch on the second substrate;
A wiring and an electronic element that are formed on the second substrate, define at least a part of an opening region for each pixel electrode, and are electrically connected to the plurality of pixel electrodes;
The aperture region is a light condensing that is defined as a region in which the intensity of light collected for each pixel electrode by each of the plurality of microlenses is 1% or more of the maximum value of the intensity for each pixel electrode. An electro-optical device characterized by being substantially equal to a region.   The electro-optical device according to claim 1, further comprising a storage capacitor as the electronic element.   The electro-optical device according to claim 1, wherein the opening area has a polygon circumscribing the condensing area. The condensing region is a circle,
The said opening area | region makes the polygon whose distance from the center of the said circle to each edge | side is 0.9 times or more and 1.1 times or less of the radius of the said circle. The electro-optical device according to any one of the above.   An electronic apparatus comprising the electro-optical device according to claim 1.

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