JP2007234821A5 - - Google Patents
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- JP2007234821A5 JP2007234821A5 JP2006053800A JP2006053800A JP2007234821A5 JP 2007234821 A5 JP2007234821 A5 JP 2007234821A5 JP 2006053800 A JP2006053800 A JP 2006053800A JP 2006053800 A JP2006053800 A JP 2006053800A JP 2007234821 A5 JP2007234821 A5 JP 2007234821A5
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- liquid
- unit
- amount
- recovery
- recovery unit
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- 239000007788 liquid Substances 0.000 claims 30
- 238000011084 recovery Methods 0.000 claims 19
- 238000007654 immersion Methods 0.000 claims 9
- 238000001514 detection method Methods 0.000 claims 6
- 239000000758 substrate Substances 0.000 claims 4
- 239000003795 chemical substances by application Substances 0.000 claims 2
- 238000007599 discharging Methods 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 2
- 230000003287 optical effect Effects 0.000 claims 2
Claims (8)
前記投影光学系と前記基板との間に液体を供給する供給部と、
前記供給部により供給された液体を回収する回収部と、
前記回収部による液体の回収量を検知する検知部を含む制御部とを備え、
前記回収部により液体を回収する際に、液体と共に気体も回収され、
前記回収部は、前記回収部により回収された液体が入れられる容器と、前記容器内の液体の量を計測する液量センサとを含み、
前記検知部は、前記液量センサの出力に基づいて前記回収部による液体の回収量を検知することを特徴とする液浸露光装置。 A liquid immersion exposure apparatus for exposing a substrate with a liquid being filled between the projection optical system and the substrate,
A supply unit for supplying a liquid between the projection optical system and the substrate ;
A recovery unit for recovering the liquid supplied by the supply unit ;
A control unit including a detection unit for detecting the amount of liquid recovered by the recovery unit ;
When recovering the liquid by the recovery unit , the gas is recovered together with the liquid,
The recovery unit includes a container in which the liquid recovered by the recovery unit is placed, and a liquid amount sensor that measures the amount of liquid in the container,
The liquid immersion exposure apparatus, wherein the detection unit detects a recovery amount of the liquid by the recovery unit based on an output of the liquid amount sensor.
前記検知部は、前記液量センサの出力の他、前記流量センサの出力に基づいて前記回収部による液体の回収量を検知することを特徴とする請求項１に記載の液浸露光装置。 The recovery unit further includes a discharge path for discharging the liquid in the container , and a flow rate sensor for measuring a flow rate of the liquid discharged through the discharge path,
The immersion exposure apparatus according to claim 1, wherein the detection unit detects a recovery amount of the liquid by the recovery unit based on an output of the flow rate sensor in addition to an output of the liquid amount sensor.
前記制御部は、前記容器内の液体の量が一定に維持されるように、前記液量センサの出力に基づいて前記調整バルブを制御することを特徴とする請求項２に記載の液浸露光装置。 The recovery unit further includes an adjustment valve that adjusts the flow rate of the liquid discharged through the discharge path,
3. The immersion exposure according to claim 2, wherein the control unit controls the adjustment valve based on an output of the liquid amount sensor so that an amount of the liquid in the container is maintained constant. apparatus.
前記制御部は、露光動作中は、前記容器から液体が排出されないように前記バルブを閉じ、前記検知部は、前記バルブが閉じられた状態で前記液量センサの出力に基づいて前記回収部による液体の回収量を検知することを特徴とする請求項１に記載の液浸露光装置。 The recovery unit further includes a discharge path for discharging the liquid in the container , and a valve provided in the discharge path,
The control unit closes the valve so that liquid is not discharged from the container during an exposure operation, and the detection unit is operated by the recovery unit based on an output of the liquid amount sensor in a state where the valve is closed. The immersion exposure apparatus according to claim 1, wherein a liquid recovery amount is detected.
感光剤が塗布された基板を請求項１乃至７のいずれか１項に記載の液浸露光装置によって露光する工程と、
前記感光剤を現像する工程と、
を含むことを特徴とするデバイス製造方法。 A device manufacturing method comprising:
A step of exposing a substrate coated with a photosensitive agent by the immersion exposure apparatus according to any one of claims 1 to 7 ;
Developing the photosensitive agent;
A device manufacturing method comprising:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006053800A JP2007234821A (en) | 2006-02-28 | 2006-02-28 | Liquid immersion exposure apparatus and device manufacturing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006053800A JP2007234821A (en) | 2006-02-28 | 2006-02-28 | Liquid immersion exposure apparatus and device manufacturing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2007234821A JP2007234821A (en) | 2007-09-13 |
| JP2007234821A5 true JP2007234821A5 (en) | 2009-04-16 |
Family
ID=38555114
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006053800A Withdrawn JP2007234821A (en) | 2006-02-28 | 2006-02-28 | Liquid immersion exposure apparatus and device manufacturing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2007234821A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8629970B2 (en) | 2008-01-23 | 2014-01-14 | Asml Netherlands B.V. | Immersion lithographic apparatus with immersion fluid re-circulating system |
| NL2004820A (en) * | 2009-06-30 | 2011-01-04 | Asml Netherlands Bv | Lithographic apparatus and a method of measuring flow rate in a two phase flow. |
| CN112666799B (en) * | 2020-12-30 | 2024-06-25 | 浙江启尔机电技术有限公司 | Immersion liquid supply and recovery system and control method thereof |
-
2006
- 2006-02-28 JP JP2006053800A patent/JP2007234821A/en not_active Withdrawn
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