JP2007231997A - 圧縮ガス供給設備及び方法 - Google Patents
圧縮ガス供給設備及び方法 Download PDFInfo
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- JP2007231997A JP2007231997A JP2006051564A JP2006051564A JP2007231997A JP 2007231997 A JP2007231997 A JP 2007231997A JP 2006051564 A JP2006051564 A JP 2006051564A JP 2006051564 A JP2006051564 A JP 2006051564A JP 2007231997 A JP2007231997 A JP 2007231997A
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- Prior art keywords
- gas supply
- gas
- compressed gas
- valve
- sealing material
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- Granted
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- 238000000034 method Methods 0.000 title claims abstract description 15
- 239000007789 gas Substances 0.000 claims description 208
- 239000003566 sealing material Substances 0.000 claims description 64
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims description 23
- 229910001882 dioxygen Inorganic materials 0.000 claims description 23
- -1 polytetrafluoroethylene Polymers 0.000 claims description 16
- 238000001514 detection method Methods 0.000 claims description 14
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 11
- 229920002493 poly(chlorotrifluoroethylene) Polymers 0.000 claims description 9
- 239000005023 polychlorotrifluoroethylene (PCTFE) polymer Substances 0.000 claims description 9
- 229920001343 polytetrafluoroethylene Polymers 0.000 claims description 9
- 239000004810 polytetrafluoroethylene Substances 0.000 claims description 9
- SYNPRNNJJLRHTI-UHFFFAOYSA-N 2-(hydroxymethyl)butane-1,4-diol Chemical compound OCCC(CO)CO SYNPRNNJJLRHTI-UHFFFAOYSA-N 0.000 claims description 8
- 229910052736 halogen Inorganic materials 0.000 claims description 8
- 150000002367 halogens Chemical class 0.000 claims description 8
- 229910002092 carbon dioxide Inorganic materials 0.000 claims description 6
- 239000001569 carbon dioxide Substances 0.000 claims description 6
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical group FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 claims description 6
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 claims description 4
- YGYAWVDWMABLBF-UHFFFAOYSA-N Phosgene Chemical compound ClC(Cl)=O YGYAWVDWMABLBF-UHFFFAOYSA-N 0.000 claims description 3
- 238000012544 monitoring process Methods 0.000 claims description 2
- 230000006866 deterioration Effects 0.000 abstract description 3
- 230000002265 prevention Effects 0.000 abstract 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 11
- 239000001301 oxygen Substances 0.000 description 11
- 229910052760 oxygen Inorganic materials 0.000 description 11
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 6
- 238000004458 analytical method Methods 0.000 description 6
- 238000011109 contamination Methods 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 4
- 239000011368 organic material Substances 0.000 description 4
- 230000005856 abnormality Effects 0.000 description 3
- 230000006835 compression Effects 0.000 description 3
- 238000007906 compression Methods 0.000 description 3
- 239000000565 sealant Substances 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 238000001784 detoxification Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- PYVHTIWHNXTVPF-UHFFFAOYSA-N F.F.F.F.C=C Chemical compound F.F.F.F.C=C PYVHTIWHNXTVPF-UHFFFAOYSA-N 0.000 description 1
- 208000034809 Product contamination Diseases 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- OXVVNXMNLYYMOL-UHFFFAOYSA-N carbonyl chloride fluoride Chemical compound FC(Cl)=O OXVVNXMNLYYMOL-UHFFFAOYSA-N 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- UUAGAQFQZIEFAH-UHFFFAOYSA-N chlorotrifluoroethylene Chemical group FC(F)=C(F)Cl UUAGAQFQZIEFAH-UHFFFAOYSA-N 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- QKCGXXHCELUCKW-UHFFFAOYSA-N n-[4-[4-(dinaphthalen-2-ylamino)phenyl]phenyl]-n-naphthalen-2-ylnaphthalen-2-amine Chemical compound C1=CC=CC2=CC(N(C=3C=CC(=CC=3)C=3C=CC(=CC=3)N(C=3C=C4C=CC=CC4=CC=3)C=3C=C4C=CC=CC4=CC=3)C3=CC4=CC=CC=C4C=C3)=CC=C21 QKCGXXHCELUCKW-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 230000009897 systematic effect Effects 0.000 description 1
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- Filling Or Discharging Of Gas Storage Vessels (AREA)
Abstract
【解決手段】圧縮ガス供給源11から小型ガス容器12へのガス供給を制御するガス供給弁14の二次側の経路に分析計18を備えた分岐経路19を設け、分析計18がガス供給弁14のシール材から発生するガス成分を検知したときに圧縮ガス供給源11からのガス供給を停止する。
【選択図】図1
Description
Claims (7)
- 圧縮ガス供給源から圧縮ガスを供給する圧縮ガス供給設備において、前記圧縮ガス供給源からのガス供給を制御するガス供給弁の二次側の経路から該経路内を流れるガスの一部を取り出す分岐経路を設けるとともに、該分岐経路に、前記ガス供給弁のシール材から発生するガス成分を検知する検知手段を設けたことを特徴とする圧縮ガス供給設備。
- 前記シール材がハロゲン成分を含む材料により形成され、前記ガス成分がハロゲン系ガスであることを特徴とする請求項1記載の圧縮ガス供給設備。
- 前記圧縮ガスが酸素ガスであり、前記シール材がポリテトラフルオロエチレン製で前記ガス成分が四フッ化メタン、フッ化カルボニル又は二酸化炭素、あるいは、前記シール材がポリクロロトリフルオロエチレン製で前記ガス成分が四フッ化メタン、四フッ化エチレン、フッ化カルボニル、ホスゲン、フロロカルボニルクロライド又は二酸化炭素であることを特徴とする請求項1記載の圧縮ガス供給設備。
- 前記検知手段が前記ガス成分を検知したときに、前記圧縮ガス供給源からのガス供給を停止する遮断弁を備えるとともに、前記ガス成分を含むガスを経路内から排出して除害手段に導入する排気弁を備えていることを特徴とする請求項1乃至3いずれか1項記載の圧縮ガス供給設備。
- 前記シール材の使用開始から前記検知手段が前記ガス成分を検知するまでの間の弁開閉操作回数と、検知したガス成分濃度及び日時を記録する記録手段を備えていることを特徴とする請求項1乃至4いずれか1項記載の圧縮ガス供給設備。
- 圧縮ガス供給源から圧縮ガスを供給する方法であって、前記圧縮ガス供給源からのガス供給を制御するガス供給弁の二次側の経路を流れるガスの成分を監視し、前記ガス供給弁のシール材から発生するガス成分を検知したときに、前記圧縮ガス供給源からのガス供給を停止することを特徴とする圧縮ガス供給方法。
- 前記ガス成分を検知したときに、前記ガス供給弁のシール材が劣化又は損傷したと判定することを特徴とする請求項6記載の圧縮ガス供給方法。
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JP2006051564A JP4716898B2 (ja) | 2006-02-28 | 2006-02-28 | 圧縮ガス供給設備及び方法 |
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JP2006051564A JP4716898B2 (ja) | 2006-02-28 | 2006-02-28 | 圧縮ガス供給設備及び方法 |
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JP2007231997A true JP2007231997A (ja) | 2007-09-13 |
JP4716898B2 JP4716898B2 (ja) | 2011-07-06 |
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009109226A (ja) * | 2007-10-26 | 2009-05-21 | Taiyo Nippon Sanso Corp | 校正ガスの製造方法、容器入り校正ガス、検出器の校正方法 |
JP2011208712A (ja) * | 2010-03-29 | 2011-10-20 | Taiyo Nippon Sanso Corp | 圧縮ガス充填方法、及び圧縮ガス充填装置 |
CN107726042A (zh) * | 2017-09-06 | 2018-02-23 | 武汉钢铁集团气体有限责任公司 | 一种气体连续填充系统及其方法 |
JP7231779B1 (ja) | 2022-06-01 | 2023-03-01 | 大陽日酸株式会社 | ガス供給設備管理システム、管理サーバ及びガス供給設備管理方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08200600A (ja) * | 1995-01-20 | 1996-08-06 | Nippon Steel Corp | 半導体製造用ガス配管 |
JPH11270792A (ja) * | 1998-02-03 | 1999-10-05 | Praxair Technol Inc | 極低温流体シリンダ充填システム |
JP2000180342A (ja) * | 1998-12-14 | 2000-06-30 | L'air Liquide | ガス容器及び容器弁の評価方法 |
-
2006
- 2006-02-28 JP JP2006051564A patent/JP4716898B2/ja active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08200600A (ja) * | 1995-01-20 | 1996-08-06 | Nippon Steel Corp | 半導体製造用ガス配管 |
JPH11270792A (ja) * | 1998-02-03 | 1999-10-05 | Praxair Technol Inc | 極低温流体シリンダ充填システム |
JP2000180342A (ja) * | 1998-12-14 | 2000-06-30 | L'air Liquide | ガス容器及び容器弁の評価方法 |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009109226A (ja) * | 2007-10-26 | 2009-05-21 | Taiyo Nippon Sanso Corp | 校正ガスの製造方法、容器入り校正ガス、検出器の校正方法 |
JP2011208712A (ja) * | 2010-03-29 | 2011-10-20 | Taiyo Nippon Sanso Corp | 圧縮ガス充填方法、及び圧縮ガス充填装置 |
CN107726042A (zh) * | 2017-09-06 | 2018-02-23 | 武汉钢铁集团气体有限责任公司 | 一种气体连续填充系统及其方法 |
JP7231779B1 (ja) | 2022-06-01 | 2023-03-01 | 大陽日酸株式会社 | ガス供給設備管理システム、管理サーバ及びガス供給設備管理方法 |
JP2023176989A (ja) * | 2022-06-01 | 2023-12-13 | 大陽日酸株式会社 | ガス供給設備管理システム、管理サーバ及びガス供給設備管理方法 |
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