JP2007224255A - Optical molded item - Google Patents

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JP2007224255A
JP2007224255A JP2006050390A JP2006050390A JP2007224255A JP 2007224255 A JP2007224255 A JP 2007224255A JP 2006050390 A JP2006050390 A JP 2006050390A JP 2006050390 A JP2006050390 A JP 2006050390A JP 2007224255 A JP2007224255 A JP 2007224255A
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mass
styrene
butadiene
block copolymer
optical molded
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JP2007224255A5 (en
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Atsushi Takahashi
淳 高橋
Susumu Ooka
進 大岡
Keita Ohashi
慶太 大橋
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Denka Co Ltd
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Denki Kagaku Kogyo KK
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Abstract

<P>PROBLEM TO BE SOLVED: To provide an optical molded item that exhibits good transparency, hues and impact resistance and has a small birefringence. <P>SOLUTION: The optical molded item is obtained by using a styrene-butadiene block copolymer comprised of 75-60 mass% of a styrene monomer unit and 25-40 mass% of a butadiene monomer unit, and contains 0.01-2 pts.mass of at least one heat-resistant stabilizer or 0.01-2 pts.mass of at least one light-resistant stabilizer or both of these (each based on 100 pts.mass of the styrene-butadiene block copolymer). The optical molded item is suitable for a base film for optical films. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、光学用成形体に関するものである。 The present invention relates to an optical molded body.

従来、光学用成形体にはメタクリル樹脂が広く使用されている。しかしながら、メタクリル樹脂は、透明性や低複屈折等の光学特性が良好な反面、耐衝撃性が低く、また吸湿性が高いことから、光学用成形体とした場合に吸湿による変形が課題となっていた。一方ポリスチレンは透明で成形加工性が良好で、吸湿性が低く変形が少ないが、耐衝撃性が低く、また複屈折(率)が高いため、この分野での使用には制限があった。
このような光学用成形体に関する刊行物としては以下のようなものが知られているが、複屈折や耐光性の問題は十分解決されているとは言いがたかった。
特開2002−242679号公報 特開2002−243917号公報 特開2002−284946号公報
Conventionally, methacrylic resins have been widely used for optical molded articles. However, methacrylic resin has good optical properties such as transparency and low birefringence, but has low impact resistance and high hygroscopicity, so deformation due to moisture absorption becomes a problem when it is used as an optical molded body. It was. On the other hand, polystyrene is transparent and has good moldability, low hygroscopicity and little deformation, but has low impact resistance and high birefringence (refraction), so its use in this field is limited.
The following publications relating to such optical molded articles are known, but it was difficult to say that the problems of birefringence and light resistance were sufficiently solved.
JP 2002-242679 A Japanese Patent Laid-Open No. 2002-243917 JP 2002-284946 A

本発明の目的は、透明性・色相・耐衝撃性が良好で、複屈折の小さい光学用成形体を提供するものである。 An object of the present invention is to provide an optical molded article having good transparency, hue, impact resistance and low birefringence.

即ち本発明は、スチレン系単量体単位75〜60質量%とブタジエン系単量体単位25〜40質量%とからなるスチレン−ブタジエン系ブロック共重合体を用いた光学用成形体であって、ヒンダードフェノール系化合物、ラクトン系化合物、リン系化合物及びイオウ系化合物から選ばれた1種以上の耐熱性安定剤0.01〜2質量部若しくはヒンダードアミン系化合物及びベンゾトリアゾール系化合物から選ばれた耐光安定剤1種以上の耐光安定剤0.01〜2質量部又はその両方(但し、それぞれスチレン−ブタジエン系ブロック共重合体を100質量部とする)を含有することを特徴とし、その光学用成形体が光学フィルム用ベースフィルムである。 That is, the present invention is an optical molded body using a styrene-butadiene block copolymer composed of 75 to 60% by mass of styrene monomer units and 25 to 40% by mass of butadiene monomer units, Light resistance selected from 0.01 to 2 parts by mass of one or more heat-resistant stabilizers selected from hindered phenol compounds, lactone compounds, phosphorus compounds and sulfur compounds, or hindered amine compounds and benzotriazole compounds. 1. Optical stabilizer characterized by containing 0.01 to 2 parts by weight of one or more light stabilizers or both of them (provided that each part is 100 parts by weight of a styrene-butadiene block copolymer). The body is a base film for optical films.

本発明の光学用成形体は、透明性・色相・耐衝撃性が良好で、かつ複屈折の小さことから、例えば、位相差フィルムや反射防止フィルム等の光学フィルムのベースフィルム適しており有用である。 The optical molded body of the present invention is suitable for use as a base film for optical films such as retardation films and antireflection films because it has good transparency, hue, impact resistance, and low birefringence. is there.

本発明に使用するスチレン−ブタジエン系ブロック共重合体は、スチレン系単量体とブタジエン系単量体からリビングアニオン重合で得られるものであれば、特に制限はない。ブロック部が、スチレン系単量体を主体とするブロック部とブタジエン系単量体を主体とするブロック部からなるブロック共重合体でもよく、また各ブロック部がスチレン系単量体とブタジエン系単量体の組成比がなだらかに変化するいわゆるテーパー型のブロック部であるブロック共重合体でもよく、更には各ブロックがスチレン系単量体とブタジエン系単量体の組成比が一定の比率であるいわゆるランダムブロック部であるブロック共重合体でもよい。またこれらのブロック部が同一のものが複数するブロック共重合体でも、異種のブロック部が複数存在するブロック共重合体でもよく、その分子構造が直鎖状でもいわゆるスター状でもよい。 The styrene-butadiene block copolymer used in the present invention is not particularly limited as long as it is obtained by living anionic polymerization from a styrene monomer and a butadiene monomer. The block part may be a block copolymer comprising a block part mainly composed of a styrene monomer and a block part mainly composed of a butadiene monomer, and each block part may be composed of a styrene monomer and a butadiene monomer. It may be a block copolymer which is a so-called tapered block part in which the composition ratio of the monomer gradually changes, and each block has a constant ratio of the composition ratio of the styrene monomer and the butadiene monomer. The block copolymer which is what is called a random block part may be sufficient. Further, it may be a block copolymer in which a plurality of these block portions are the same, or a block copolymer in which a plurality of different block portions exist, and the molecular structure may be linear or so-called star-shaped.

スチレン−ブタジエン系ブロック共重合樹脂のマトリックスの重量平均分子量(Mw)は、特に制限はないが5万〜30万、より好ましいのは7万〜25万である。なお、本発明の重量平均分子量(Mw)はGPCにて測定されるポリスチレン換算の重量平均分子量(Mw)であり、下記記載の測定条件で測定した。
装置名:SYSTEM−21 Shodex(昭和電工社製)
カラム:PL gel MIXED−Bを3本直列
温度:40℃
検出:示差屈折率
溶媒:テトラハイドロフラン
濃度:2質量%
検量線:標準ポリスチレン(PS)(PL社製)を用いて作製し、重量平均分子量はPS換算値で表した。
The weight average molecular weight (Mw) of the matrix of the styrene-butadiene block copolymer resin is not particularly limited, but is preferably 50,000 to 300,000, more preferably 70,000 to 250,000. In addition, the weight average molecular weight (Mw) of this invention is the weight average molecular weight (Mw) of polystyrene conversion measured by GPC, and was measured on the measurement conditions of the following description.
Device name: SYSTEM-21 Shodex (manufactured by Showa Denko)
Column: 3 series PL gel MIXED-B Temperature: 40 ° C
Detection: Differential refractive index Solvent: Tetrahydrofuran Concentration: 2% by mass
Calibration curve: produced using standard polystyrene (PS) (manufactured by PL), and the weight average molecular weight was expressed in terms of PS.

本発明で用いられるスチレン系単量体としては、スチレン、α−メチルスチレン、p−メチルスチレン、o−メチルスチレン、m−メチルスチレン、エチルスチレン、p−t−ブチルスチレン等を挙げることができるが、好ましくはスチレンである。これらのスチレン系単量体は、単独でもよいが二種以上を併用してもよい。 Examples of the styrene monomer used in the present invention include styrene, α-methylstyrene, p-methylstyrene, o-methylstyrene, m-methylstyrene, ethylstyrene, pt-butylstyrene, and the like. Is preferably styrene. These styrenic monomers may be used alone or in combination of two or more.

本発明で用いられるブタジエン系単量体としては、1,3−ブタジエン、2−メチル−1,3−ブタジエン等が挙げられるが、この中では1,3−ブタジエンが好ましい。
更に、スチレン−ブタジエンブロック系共重合体のポリマー鎖中のブタジエン系単量体に基づく1,2−ビニル不飽和結合の割合が、全ブタジエン系単量体量に対して20モル%以下が好ましく、15モル%以下がより好ましい。この1,2−ビニル不飽和結合の割合は重合溶媒の選択でコントロールすることが可能で、無極性溶媒を使用すれば少なくすることができる。
Examples of the butadiene monomer used in the present invention include 1,3-butadiene and 2-methyl-1,3-butadiene. Among these, 1,3-butadiene is preferable.
Furthermore, the proportion of 1,2-vinyl unsaturated bonds based on the butadiene monomer in the polymer chain of the styrene-butadiene block copolymer is preferably 20 mol% or less based on the total amount of the butadiene monomer. 15 mol% or less is more preferable. The proportion of the 1,2-vinyl unsaturated bond can be controlled by selecting a polymerization solvent, and can be reduced by using a nonpolar solvent.

スチレン−ブタジエンブロック系共重合体は、構成する単量体の比率がスチレン系単量体単位75〜60質量%、ブタジエン系単量体単位25〜40質量%であることを特徴とする。単量体の比率がスチレン系単量体単位73〜62質量%、ブタジエン系単量体単位27〜38質量%であると好ましく、スチレン系単量体単位71〜64質量%、ブタジエン系単量体単位29〜36質量%であるとより好ましい。共重合樹脂の組成がこのより好ましい範囲のある場合、得られる樹脂組成物は軟質の光学成形体用として特に優れている。
スチレン系単量体単位が60%未満では、得られる光学成形体が柔らかすぎて使用しづらく変形が問題となる場合があり、75質量%を超えると、複屈折が大きくなるので好ましくない。
The styrene-butadiene block copolymer is characterized in that the proportion of monomers constituting it is 75 to 60% by mass of styrene monomer units and 25 to 40% by mass of butadiene monomer units. The monomer ratio is preferably 73 to 62% by mass of styrene monomer units and 27 to 38% by mass of butadiene monomer units, 71 to 64% by mass of styrene monomer units, and a single amount of butadiene monomers. The body unit is more preferably 29 to 36% by mass. When the composition of the copolymer resin is within this more preferable range, the resulting resin composition is particularly excellent for a soft optical molded article.
If the styrenic monomer unit is less than 60%, the resulting optical molded article is too soft and difficult to use, and deformation may be a problem. If it exceeds 75% by mass, birefringence increases, which is not preferable.

スチレン−ブタジエンブロック系共重合体は、耐熱安定剤を含んでもよく、また耐光安定剤を含んでもよい。また両者を含むとより好ましい。
耐熱安定剤は、その効果を有するものであれば特に限定されるものではないが、例えば、ヒンダードフェノール系化合物、ラクトン系化合物、リン系化合物、イオウ系化合物などの耐熱安定剤が挙げられる。これらは一種のみ用いてもよく、2種以上組み合わせて用いても良い。その配合量は、共重合樹脂100質量部に対して0.01〜2質量部が好ましく、より好ましいくは0.01〜1質量部である。
The styrene-butadiene block copolymer may contain a heat-resistant stabilizer or may contain a light-resistant stabilizer. Moreover, it is more preferable when both are included.
The heat resistance stabilizer is not particularly limited as long as it has the effect, and examples thereof include heat resistance stabilizers such as hindered phenol compounds, lactone compounds, phosphorus compounds, and sulfur compounds. These may be used alone or in combination of two or more. The blending amount is preferably 0.01 to 2 parts by mass, more preferably 0.01 to 1 part by mass with respect to 100 parts by mass of the copolymer resin.

耐光安定剤は、その効果を有するものであれば特に限定されるものではないが、例えば、ヒンダードアミン系化合物、ベンゾトリアゾール系化合物が挙げられる。これらは一種のみ用いてもよく、2種以上組み合わせて用いても良い。その配合量は、共重合樹脂100質量部に対して0.01〜2質量部が好ましく、より好ましいのは0.01〜1質量部である。
なお、樹脂組成物にはこれ以外に滑剤や可塑剤、着色剤、帯電防止剤、鉱油等の添加剤を含んでも差し支えないが、透明性を阻害する可能性もあり、その添加量は少ない方が好ましい。
Although a light-resistant stabilizer will not be specifically limited if it has the effect, For example, a hindered amine type compound and a benzotriazole type compound are mentioned. These may be used alone or in combination of two or more. The blending amount is preferably 0.01 to 2 parts by mass, more preferably 0.01 to 1 part by mass with respect to 100 parts by mass of the copolymer resin.
In addition, the resin composition may contain additives such as lubricants, plasticizers, colorants, antistatic agents, mineral oil, etc., but there is a possibility that transparency may be hindered, and the amount added is small. Is preferred.

樹脂組成物の配合や造粒方法は特に制限はされず、公知の方法を採用することができる。例えば、スチレン−ブタジエンブロック系共重合体、耐熱安定剤、耐光安定剤および必要に応じて使用する添加剤をあらかじめタンブラーやヘンシェルミキサー等で均一に混合して、単軸押出機または二軸押出機等に供給して溶融混練する方法や、重合後に脱溶媒と造粒を同一ライン上で行う場合は、その最終段階で耐熱安定剤、耐光安定剤および必要に応じて使用する添加剤を系内に添加・混合後に造粒する方法がある。
The blending and granulation method of the resin composition are not particularly limited, and a known method can be employed. For example, a styrene-butadiene block copolymer, a heat stabilizer, a light stabilizer, and additives to be used as needed are uniformly mixed in advance with a tumbler or a Henschel mixer, and then a single screw extruder or a twin screw extruder. If the solvent removal and granulation are carried out on the same line after polymerization, the heat stabilizer, light stabilizer and additives used as needed are added to the system at the final stage. There is a method of granulating after adding and mixing.

以下、詳細な内容について実施例を用いて説明するが、本発明は以下の実施例に限定されるものではない。 Hereinafter, although detailed content is demonstrated using an Example, this invention is not limited to a following example.

[実施例1]
(1)内径1.0m、容積1.3mでマックスブレンド翼(住友重工社製−撹拌数は60rpm)を有する密閉可能な耐圧容器に150ppmのテトラヒドロフランを含むシクロヘキサン480kgをとり、次いでn−ブチルリチウムを10質量%含むシクロヘキサン溶液(以後開始剤と呼ぶ)1490mLを添加し、液温を外気温度(約20〜30℃)に保った。
(2)この中にスチレンモノマー16.0kgを添加後、缶内温度70℃を目標に昇温させスチレンモノマーをアニオン重合させた。その後、缶内温度を40℃まで冷却させた。
(3)次いで、スチレンモノマー96.0kgとブタジエン48.0kgを同時に添加し、再び昇温させ、反応を継続させた。なお、アニオン重合反応では水が存在すると重合活性末端が失活するため、水分を5ppm以下に保った溶剤と原料モノマーを使用した。
(4)反応終了後、缶内温度を70℃まで冷却したのち、重合液を別の容器に移して水を110g添加して失活させ参考例1の重合体を含む溶液を得た。
(5)参考例1の重合溶液に、全仕込みモノマー(即ちスチレンモノマーとブタジエン)の合計100質量部あたり耐熱安定剤としてオクタデシル−3−(3,5−ジ−t−ブチル−4−ヒドロキシフェニル)プロピオネート(チバ・スペシャリティ・ケミカルズ社製IRGANOX1076)0.2質量部を溶解させた。これらの重合溶液はそれぞれ予備濃縮し、さらに減圧ベント付き2軸押出機で脱揮押出しして、それぞれペレット状のブロック共重合体を得た。
[Example 1]
(1) Take 480 kg of cyclohexane containing 150 ppm of tetrahydrofuran in a sealable pressure-resistant container having an inner diameter of 1.0 m, a volume of 1.3 m 3 and a Max Blend blade (manufactured by Sumitomo Heavy Industries-60 rpm), and then n-butyl 1490 mL of a cyclohexane solution (hereinafter referred to as initiator) containing 10% by mass of lithium was added, and the liquid temperature was kept at the outside air temperature (about 20 to 30 ° C.).
(2) After 16.0 kg of styrene monomer was added thereto, the temperature inside the can was raised to 70 ° C. for anionic polymerization of the styrene monomer. Thereafter, the temperature inside the can was cooled to 40 ° C.
(3) Next, 96.0 kg of styrene monomer and 48.0 kg of butadiene were added simultaneously, the temperature was raised again, and the reaction was continued. In the anionic polymerization reaction, when water is present, the polymerization active terminal is deactivated. Therefore, a solvent and a raw material monomer with moisture kept at 5 ppm or less were used.
(4) After completion of the reaction, the temperature in the can was cooled to 70 ° C., and then the polymerization solution was transferred to another container and 110 g of water was added to deactivate the solution, thereby obtaining a solution containing the polymer of Reference Example 1.
(5) Octadecyl-3- (3,5-di-t-butyl-4-hydroxyphenyl) as a heat-resistant stabilizer per 100 parts by mass of the total charge of monomers (ie, styrene monomer and butadiene) in the polymerization solution of Reference Example 1 ) 0.2 parts by mass of propionate (IRGANOX1076 manufactured by Ciba Specialty Chemicals) was dissolved. Each of these polymerization solutions was pre-concentrated, and further devolatilized and extruded with a twin-screw extruder equipped with a vacuum vent to obtain pellet-shaped block copolymers.

[実施例及び比較例]
実施例1と同じ装置を用い、表1に示したスチレンとブタジエンの量になるように重合した。なお、初期のスチレンの仕込み量はいずれも実施例1と同じとした。
また、実施例1〜4及び比較例1、2には、スチレン−ブタジエンブロック系共重合体100質量部に、更に耐光安定剤としてヒンダードアミン系化合物としてビス(2,2,6,6−テトラメチル−4−ピペリジル)セバケート、ベンゾトリアゾール系化合物として2−(2H−ベンゾトリアゾール−2−イル)−4,6−ジ−t−ペンチルフェノールを各0.1質量部ヘンシェルミキサーで混合した後、二軸押出機(東芝機械(株)社製 TEM−35B)を用いシリンダー温度220℃で溶融混練して樹脂組成物を得た。
以上のように調整した樹脂を名機社製射出成形機MDM−Iにて成形温度250℃、金型温度60℃で射出成形することにより、直径180mm、センターホール15mm、厚み1.2mmの光ディスク基板を得た。次に得られた光ディスク基板の特性評価を行った。その評価結果を表1に示した。
[Examples and Comparative Examples]
Using the same apparatus as in Example 1, polymerization was performed so that the amounts of styrene and butadiene shown in Table 1 were obtained. The initial amount of styrene charged was the same as in Example 1.
In Examples 1 to 4 and Comparative Examples 1 and 2, bis (2,2,6,6-tetramethyl) was added as a hindered amine compound as a light-resistant stabilizer to 100 parts by mass of a styrene-butadiene block copolymer. -4-piperidyl) sebacate, 2- (2H-benzotriazol-2-yl) -4,6-di-t-pentylphenol as a benzotriazole-based compound was mixed with 0.1 parts by mass of each Henschel mixer, A resin composition was obtained by melt kneading at a cylinder temperature of 220 ° C. using a shaft extruder (TEM-35B manufactured by Toshiba Machine Co., Ltd.).
An optical disk having a diameter of 180 mm, a center hole of 15 mm, and a thickness of 1.2 mm is obtained by injection molding the resin prepared as described above at a molding temperature of 250 ° C. and a mold temperature of 60 ° C. with an injection molding machine MDM-I manufactured by Meiki. A substrate was obtained. Next, the characteristics of the obtained optical disk substrate were evaluated. The evaluation results are shown in Table 1.

Figure 2007224255
Figure 2007224255

なお、評価は下記の方法によった。
(1)透明性
ASTM D1003に基づき、ヘーズメーター(日本電色工業社製NDH−1001DP型)を用いてヘーズを測定し、成形品内のヘーズ(単位:%)の最大値で示した。1%以下を合格とした。
(2)色相
色差計(日本電色工業社製Σ―80)を用いてb値を測定し、成形品内のb値の最大値で示した。1以下を合格とした。
(3)複屈折
位相差測定装置(王子計測社製KOBRA−WR)を用いてリタデーション(Re)を測定し、成形品内のRe(単位:nm)の最大値で示した。50nm以下を合格とした。
The evaluation was based on the following method.
(1) Transparency Based on ASTM D1003, the haze was measured using a haze meter (NDH-1001DP type manufactured by Nippon Denshoku Industries Co., Ltd.), and indicated by the maximum value of haze (unit:%) in the molded product. 1% or less was accepted.
(2) The b value was measured using a hue color difference meter (Σ-80 manufactured by Nippon Denshoku Industries Co., Ltd.), and indicated by the maximum value of the b value in the molded product. 1 or less was accepted.
(3) Retardation (Re) was measured using a birefringence phase difference measuring apparatus (KOBRA-WR manufactured by Oji Scientific Co., Ltd.), and indicated by the maximum value of Re (unit: nm) in the molded product. 50 nm or less was regarded as acceptable.

このように、スチレン系単量体とブタジエン系単量体が特定の比率であるスチレン−ブタジエン系ブロック共重合体が好ましく、また特にスチレン系単量体/ブタジエン単量体の比(質量基準)が1.5倍から2.3倍であるとReが小さくなり特に好ましい。
Thus, a styrene-butadiene block copolymer in which a styrene monomer and a butadiene monomer are in a specific ratio is preferable, and a ratio of styrene monomer / butadiene monomer (mass basis) is particularly preferable. When the ratio is 1.5 times to 2.3 times, Re becomes small, which is particularly preferable.

Claims (4)

スチレン系単量体単位75〜60質量%とブタジエン系単量体単位25〜40質量%とからなるスチレン−ブタジエン系ブロック共重合体を用いた光学用成形体。 An optical molded article using a styrene-butadiene block copolymer composed of 75 to 60% by mass of a styrene monomer unit and 25 to 40% by mass of a butadiene monomer unit. ヒンダードフェノール系化合物、ラクトン系化合物、リン系化合物及びイオウ系化合物から選ばれた1種以上の耐熱性安定剤0.01〜2質量部(但し、スチレン−ブタジエン系ブロック共重合体を100質量部とする)を含有することを特徴とする請求項1記載の光学用成形体。 0.01 to 2 parts by mass of one or more heat-resistant stabilizers selected from hindered phenol compounds, lactone compounds, phosphorus compounds and sulfur compounds (provided that 100 parts by mass of a styrene-butadiene block copolymer) The molded article for optics according to claim 1, wherein ヒンダードアミン系化合物及びベンゾトリアゾール系化合物から選ばれた耐光安定剤1種以上の耐光安定剤0.01〜2質量部(但し、スチレン−ブタジエン系ブロック共重合体を100質量部とする)を含有することを特徴とする請求項1または請求項2に記載の光学用成形体。   Contains 0.01 to 2 parts by weight of one or more light stabilizers selected from hindered amine compounds and benzotriazole compounds (provided that the styrene-butadiene block copolymer is 100 parts by weight). The optical molded body according to claim 1 or 2, wherein 光学用成形体が、光学フィルム用ベースフィルムであることを特徴とする請求項1〜3のいずれか一項記載の光学用成形体。

The optical molded body according to any one of claims 1 to 3, wherein the optical molded body is a base film for an optical film.

JP2006050390A 2006-02-27 2006-02-27 Optical molded item Pending JP2007224255A (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012137760A (en) * 2010-12-27 2012-07-19 Skc Haas Display Films Co Ltd Method for manufacturing diffusely-reflecting polarizer substantially having amorphous nanocomposite continuous phase
JP2012141595A (en) * 2010-12-15 2012-07-26 Asahi Kasei Chemicals Corp Laminate surface protective film for optical member

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JPH107879A (en) * 1996-06-20 1998-01-13 Nippon Steel Chem Co Ltd Abrasion-resistant resin composition and coating composition for electrophotographic photosensitizer and charge transfer layer
JP2002284946A (en) * 2001-01-22 2002-10-03 Sumitomo Chem Co Ltd Resin composition and sheet for optical screen
JP2004292548A (en) * 2003-03-26 2004-10-21 Ps Japan Corp Transparent styrene-based resin composition and its molding
JP2005510612A (en) * 2001-11-28 2005-04-21 ビーエーエスエフ アクチェンゲゼルシャフト Transparent styrene-butadiene block copolymer mixture
JP2006328230A (en) * 2005-05-26 2006-12-07 Asahi Kasei Chemicals Corp Optical material comprised of polymer composition

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Publication number Priority date Publication date Assignee Title
JPH107879A (en) * 1996-06-20 1998-01-13 Nippon Steel Chem Co Ltd Abrasion-resistant resin composition and coating composition for electrophotographic photosensitizer and charge transfer layer
JP2002284946A (en) * 2001-01-22 2002-10-03 Sumitomo Chem Co Ltd Resin composition and sheet for optical screen
JP2005510612A (en) * 2001-11-28 2005-04-21 ビーエーエスエフ アクチェンゲゼルシャフト Transparent styrene-butadiene block copolymer mixture
JP2004292548A (en) * 2003-03-26 2004-10-21 Ps Japan Corp Transparent styrene-based resin composition and its molding
JP2006328230A (en) * 2005-05-26 2006-12-07 Asahi Kasei Chemicals Corp Optical material comprised of polymer composition

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012141595A (en) * 2010-12-15 2012-07-26 Asahi Kasei Chemicals Corp Laminate surface protective film for optical member
JP2012137760A (en) * 2010-12-27 2012-07-19 Skc Haas Display Films Co Ltd Method for manufacturing diffusely-reflecting polarizer substantially having amorphous nanocomposite continuous phase

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