JP2007217721A - Facility for forming silver-mirror thin film - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To inhibit some articles to be treated from degrading the product quality according to the shape. <P>SOLUTION: A facility for forming a silver-mirror thin film has chemical-solution-spouting means 3A and 3B for spouting a chemical solution for forming the silver-mirror film on the surface of the article 2 to be treated toward the article 2, and a rotating means 5 for rotating the article 2, wherein the rotating means 5 is structured so as to spread the chemical solution from the article 2, which has been spouted by the chemical-solution-spouting means 3A and 3B and bonding to the article, by using the centrifugal action of the rotating article. The facility also has: a chemical solution receiver 10A that is located in a region P1 to which the chemical solution is spread and receives the spread chemical solution; and a receiver transportation means 10 for moving the chemical solution receiver 10A selectably to a working position at which the spread chemical solution is received, and a waiting position apart from a path of the article 2 and a space right above the path. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to a silver mirror thin film forming facility, and more specifically, a chemical liquid ejecting means for ejecting a chemical liquid for performing silver mirror processing on the surface of the object to be processed, and a rotating means for rotating the object to be processed. The present invention relates to a silver mirror thin film forming facility.

  This type of silver mirror thin film forming equipment forms a silver mirror thin film on the surface of the object to be treated by adhering silver deposited by reduction of silver ions contained in an aqueous ammoniacal silver salt solution to the surface of the object to be treated. As a chemical solution for applying a silver mirror treatment to the surface of the object to be processed, for example, ammonia such as an active agent aqueous solution, an ammoniacal silver nitrate aqueous solution or an ammoniacal silver carbonate aqueous solution. A chemical solution such as a mixed solution of a basic silver salt aqueous solution, a caustic soda aqueous solution and a carbohydrate-based reducing agent aqueous solution such as glucose and fructose, and a cleaning solution for cleaning the object to be processed is sequentially ejected to the object to be processed.

By the way, conventionally, in this type of equipment, a work area for performing silver mirror treatment is formed on the surface of the object to be processed, and a partition plate capable of moving up and down to partition the work areas is provided, and the surface of the object to be processed An ejection nozzle as a chemical solution ejecting means for ejecting a chemical solution for performing silver mirror processing toward the object to be processed in the work area and a rotating means for rotating the object to be processed in the work area are provided. By changing the facing surface of the object to be processed with respect to the ejection nozzle by the rotation of the object, the chemical liquid is ejected without any leakage to each surface of the object to be processed.
(See Patent Document 1 below)

JP 2005-152827 A

  However, in the conventional equipment as described above, the chemical liquid is ejected to each surface of the object to be processed by the rotation of the object to be processed. For example, this chemical solution pool prevents the chemical solution ejected in the next process from uniformly adhering to the surface of the object to be processed, or causes a silver mirror reaction by mixing. When reacting multiple types of chemicals on the surface of the object to be processed or in the vicinity thereof, the amount of deposited silver on the object to be processed varies depending on the part of the object to be treated where the liquid chemical pools and other parts. As a result, the silver mirror thin film formed on the surface of the object to be processed has defects such as thickness unevenness and color unevenness, which may cause deterioration of product quality.

  In view of this situation, the main problem of the present invention is to effectively solve the above problems by rational improvements.

The first characteristic configuration of the present invention relates to a silver mirror thin film forming facility,
A silver mirror thin film forming facility provided with a chemical solution ejecting means for ejecting a chemical solution for performing silver mirror treatment on the surface of the object to be treated, and a rotating means for rotating the object to be treated,
The chemical solution adhering to the object to be processed by the chemical liquid ejecting by the chemical liquid ejecting means is configured to be scattered from the object to be processed by the centrifugal action in the object rotating by the rotating means,
A chemical solution receiving body for receiving the scattered chemical solution is provided in the splashing region of the scattered chemical solution, and the chemical solution receiving body deviates from the action position for receiving the scattered chemical solution, the movement path of the object to be processed, and the position immediately above the route. A receiving body moving means for switching to the retracted position is provided.

  In other words, with the first feature configuration, the chemical liquid adhering to the object to be processed by the chemical liquid ejecting means by the chemical liquid ejecting means is scattered from the object to be processed by the centrifugal action caused by the rotation of the processing object by the rotating means. It is possible to suppress the occurrence of a chemical liquid pool on the surface of the object to be processed by the chemical liquid ejection, and it is possible to effectively suppress defects such as thickness unevenness and color unevenness of the silver mirror thin film caused by the chemical liquid pool as described above. .

  In addition, since the scattered chemical liquid that is scattered from the processed object by the centrifugal action caused by the rotation of the processed object is received by the chemical receiver, the scattered chemical liquid adheres to another processed object different from the processed object to be ejected, Problems such as leakage to the outside can also be suppressed.

  In addition, as described above, the chemical solution adhering to the chemical receiver is moved by receiving the scattered chemical solution by the chemical solution receiver as the chemical solution receiving body receives the scattered chemical solution from the workpiece. It is conceivable that the silver mirror thin film may be defective in thickness unevenness or color unevenness due to falling and adhering to the workpiece being moved from above, but when moving the workpiece, Since the chemical solution receiving body can be switched and moved from the working position where the scattered chemical solution is received by the stationary body moving means to the movement path of the object to be processed and the retracted position off from directly above the path, the adhesion to the chemical solution receiving body is possible. The chemical solution can be prevented from dropping and adhering to the workpiece to be moved from above, so that the above-mentioned problems caused by the falling chemical solution adhering to the chemical receiver on the workpiece are dropped. Surely It is possible to stop.

  That is, the chemical solution adhering to the object to be processed is ejected from the object to be treated by the chemical solution ejected by the chemical solution ejecting means, so that defects such as thickness unevenness and color unevenness of the silver mirror thin film can be suppressed, and the scattered chemical solution is covered. Defects such as thickness unevenness and color unevenness of the silver mirror thin film caused by re-adhering to the processed material can be suppressed, and these can greatly improve product quality and greatly increase product yield. Can be improved.

The second feature configuration of the present invention specifies an embodiment suitable for the implementation of the first feature configuration.
The chemical solution jetting means is configured to jet a plurality of types of chemical solutions that express a silver mirror reaction by mixing in a state of reacting on or near the surface of the object to be processed.
The rotating means is configured to rotate the object to be processed in parallel with the chemical liquid ejection directed toward the object to be processed by the chemical liquid ejecting means.

  That is, when a plurality of types of chemicals that develop a silver mirror reaction by mixing are reacted on or near the surface of the object to be processed, the reacted chemicals dispersed and attached to the surface of the object to be processed are the subsequent unreacted chemicals. The concentration of the subsequent unreacted chemical solution changes indefinitely, or the reacted chemical solution dispersed and attached to the surface of the object to be processed is separated from the precipitated silver and the surface of the object to be processed. In other words, defects such as thickness unevenness and color unevenness of the silver mirror thin film appear remarkably.

  On the other hand, if it is the said 2nd characteristic structure, the reacted chemical solution adhering to the surface of the to-be-processed object is scattered from a to-be-processed object in parallel with a chemical-solution ejection by the chemical-solution ejection toward the to-be-processed object by a chemical-solution ejection means. Therefore, it is possible to disperse the reacted chemical attached to the object to be processed from the object to be processed with little time delay from adhering to the object to be processed, and the silver mirror thin film caused by the reacted chemical as described above Defects such as thickness unevenness and color unevenness can be effectively suppressed.

The third feature configuration of the present invention specifies a preferred embodiment in the implementation of the first or second feature configuration.
In addition to providing a partition that partitions the work areas for silver mirror treatment on the surface of the workpiece,
The chemical liquid receiving body is configured such that the action position is located inside the partition and above the entrance / exit part through which the workpiece is taken in and out of the work area.

  That is, if it is the said 3rd characteristic structure, mixing of a jetting chemical | medical solution, air in an area, etc. between work areas can be suppressed with the partition body which partitions work areas, and the work precision in a work area is kept high. In addition, it is possible to prevent the sprayed chemical liquid from adhering to the portion located above the inlet / outlet portion on the inner surface of the partition by the chemical receiver in the working position. It is also possible to suppress the occurrence of defects such as thickness unevenness and color unevenness in the silver mirror thin film due to falling and adhering to the object to be processed passing through the part from above.

The fourth feature configuration of the present invention specifies a preferred embodiment in the implementation of the first or second feature configuration.
The said chemical | medical solution receiving body exists in the point which has the structure which partitions off the work area for performing the silver mirror process on the surface of a to-be-processed object, when it exists in the said action position.

  In other words, with the fourth feature configuration, the chemical solution receiving body that receives the scattered chemical solution from the object to be processed is used not only for the reception of the scattered chemical solution but also as a partition for partitioning the work areas. However, the partition function can prevent mixing of ejected chemicals and air in the work area, which increases work accuracy in the work area. Can keep.

The fifth feature configuration of the present invention specifies an embodiment suitable for the implementation of the fourth feature configuration.
The said chemical | medical solution receiving body exists in the point which is set as the structure which obstruct | occludes the to-be-processed object entrance / exit part of the said work areas partitioned off by the partition, when it exists in the said action position.

  In other words, with the fifth feature configuration, the chemical solution receiving bodies are used as a door that opens and closes the workpiece entry / exit portion between the work areas, and the work areas are partitioned by the chemical solution receiving bodies and the partitioning bodies. Therefore, for example, the chemical solution receiving body can be made smaller compared to the case where the chemical solution receiving body alone partitions the work areas, and thereby the chemical solution receiving body that switches and moves the chemical solution receiving body. The driving power of the stop moving means can be reduced, and the equipment can be made advantageous in terms of cost. This cost effect is particularly effective when the partition area between the work areas is large.

The sixth characteristic configuration of the present invention specifies a preferred embodiment in the implementation of any one of the first to fifth characteristic configurations,
While having a configuration in which each of the chemical liquid receivers is provided for a plurality of the work areas,
The receiving body moving means is configured such that a plurality of the chemical liquid receiving bodies are switched and moved by a common driving means.

  In other words, with the sixth feature configuration, it is possible to simplify the equipment and make the equipment more advantageous in terms of maintenance compared to the case where the driving means is provided for each chemical liquid receiver. .

  FIG. 1 shows an overall configuration of a silver mirror thin film forming facility. In this facility, for example, silver mirror processing is performed in which a silver mirror thin film is formed on the surface of an object to be processed using ceramic, metal, synthetic resin, or the like. Reference numeral 1 denotes a tunnel-shaped silver mirror processing booth. This silver mirror processing booth 1 is an activation chamber U1 for performing an activation process on the workpiece 2 by ejecting an activator E toward the workpiece 2; , A standing chamber U2 for standing the workpiece 2 and an activator cleaning chamber for removing the surplus activator E adhering to the workpiece 2 by spraying the cleaning liquid D toward the workpiece 2 after standing U3, chemical solution A (for example, ammoniacal silver salt aqueous solution) that develops a silver mirror reaction by mixing toward the workpiece 2 that has been washed after standing, and chemical solution B (for example, mixed solution of caustic soda aqueous solution and reducing agent aqueous solution) The excess chemicals A and B adhering to the workpiece 2 are removed by jetting the cleaning liquid C toward the workpiece 2 after the silver mirror treatment. Silver mirror solution cleaning chamber U5, processed object 2 cleaned following silver mirror processing The object to be treated 2 draining chamber U6 to blow the cleaning liquid C adhered to by ejecting draining air A1 toward, are the structure in which are arranged side by side from the upstream side of the object conveying direction in this order.

  In each of the activation chamber U1, the activator cleaning chamber U3, the silver mirror chamber U4, and the silver mirror chemical solution cleaning chamber U5, the pumps P from the pressure tanks Ta to Te for the chemicals A to E disposed outside the silver mirror processing booth 1 are used. The chemical solution ejection unit 3A for ejecting the predetermined chemical solution individually guided through the chemical solution supply paths Ra to Re from the upper side of the object to be processed 2 toward the object to be processed 2 is disposed, and the predetermined chemical solution guided in the same manner is provided. An auxiliary chemical liquid ejection unit 3B (see FIGS. 2 and 3) that ejects from the side of the workpiece 2 toward the workpiece 2 is disposed. In addition, after the fresh air Ao is generated by adjusting the temperature and humidity with the air conditioner SA1 disposed outside the silver mirror processing booth 1, the draining air A1 guided through the air supply path RA1 by the fan d is supplied to the draining chamber U6. An air jetting tool 4 that is jetted toward the workpiece 2 from above the workpiece 2 is disposed.

  6 is a workpiece supply unit that feeds a substantially disk-shaped mounting table T on which the workpiece 2 is mounted to the activation chamber U1, and 7 is a workpiece receiving unit that receives the mounting table T from the draining chamber U6. is there. Reference numeral 8 denotes a transfer means for sequentially transferring a plurality of mounting tables T from the workpiece supply unit 6 to the workpiece receiving unit 7 through the chambers U1 to U6.

  Reference numeral 5 denotes a rotation support device serving as a rotation means disposed in each of the chambers U1 to U6. The rotation support device 5 supports the mounting table T conveyed into the room by the conveyance means 8 and also includes a chemical solution. In parallel with the ejection of the chemical liquid onto the workpiece 2 by the ejection unit 3A and the auxiliary chemical liquid ejection unit 3B, the workpiece 2 is appropriately rotated around the longitudinal axis X together with the mounting table T, whereby the chemical ejection unit 3A and the auxiliary The chemical liquids A to E attached to the workpiece 2 by the chemical jetting by the chemical jet unit 3B are scattered from the workpiece 2 by the centrifugal action of the rotation of the workpiece 2.

  9 is a translucent partition wall as a partition body that hangs down from the ceiling of the room and partitions the upper areas of the rooms U1 to U6 to prevent mixing of the ejected drug solution and the indoor air Au between adjacent rooms. Yes, between the chambers U1 to U6, between the workpiece supply unit 6 and the activation chamber U1, and between the draining chamber U6 and the workpiece receiving unit 7, respectively.

  10A (refer to FIG. 2 and FIG. 3) is a chemical solution receiving plate as a chemical solution receiving body that is located in the splashing region P1 of the scattered chemical solution scattered from the workpiece 2 in each chamber U1 to U6 and receives the scattered chemical solution. Yes, 10 is a receiving body moving means for switching the chemical liquid receiving plate 10A to an action position for receiving the scattered chemical liquid from the workpiece 2 and a retracted position to be described later. This chemical solution receiving plate 10A is also used as a partition door for opening and closing a chamber entrance / exit for forming and removing the object to be processed formed under the partition wall 9 in each of the chambers U1 to U6. The chamber entrance / exit is opened and closed by switching movement between the operating position and the retracted position of the stop plate 10A.

  In other words, this silver mirror thin film forming facility sequentially conveys a plurality of objects to be processed 2 to the respective chambers U1 to U6 by the conveying means 8 in cooperation with the receiving body moving means 10, and conveys them in the respective chambers U1 to U6. A silver mirror process for forming a silver mirror thin film on the surface of the object to be processed 2 is performed by appropriately rotating the object to be processed 2 by the rotation support device 5 in cooperation with the means 8. In contrast, the system is configured to automatically and sequentially implement. In addition, after each chemical | medical solution AE ejected in the silver mirror processing booth 1 is stored in the exclusive collection tank 15 for every chemical | medical solution of the silver mirror processing booth 1 lower part, it is discarded or reused through the exclusive drainage channel 16. FIG.

  11 is for detecting a type such as a shape type or a material type of the object to be processed 2 according to a preset production schedule stored in advance or by the object detector 17 as a detecting means equipped in the object receiving unit 6. This is a control panel that performs each control described below.

  SA2 is an air conditioner that adjusts the temperature and humidity of fresh air Ao supplied from the air supply unit to generate ventilation air A2, and 13 is an air conditioner SA2 that feeds air from the air conditioner SA2 through the air supply path RA2. It is an air chamber which ejects the air A2 for ventilation led to the room ceiling part of U1-U6 from the substantially whole surface of the room ceiling part into the room in a downward laminar flow. Reference numeral 14 denotes a discharge port for discharging the indoor air Au of each of the chambers U1 to U6 from below and exhausting the discharged air to the outside through the exhaust passage 14a by the fan d. In addition to adjusting the temperature and humidity of the indoor air Au in the room, the mist-like floating chemical solution in the room by the laminar downward indoor airflow and gravity generated by the air blowing from the air chamber 13 and the downward discharge of the indoor air Au (In other words, a chemical solution that has become mist accompanying ejection, or a chemical solution that has become mist due to detachment and scattering from the object 2 due to rotation of the object 2 described later) is efficiently discharged from the room.

  2 to 5 show a silver mirror chamber U4. As representatively, the rotation support device 5 includes a vertical case portion projecting upward at a central portion in a plan view of the room, and a lower end portion of the vertical case portion. It has a mounting table support case 5A having a L-shape in front view and a horizontal case portion extending laterally to the booth side. A fitting hole t formed in the center of the mounting table T is provided at the upper end of the vertical case portion. On the other hand, a mounting base receiving seat 5d provided with a fitting convex portion 5e as a positioning means for fitting from below is provided to be rotatable around the vertical axis X.

  In addition, the mounting table support case 5A includes rotating shafts 5a and 5c and a bevel gear 5b that transmit the rotational force of the motor 5B installed on the outer surface of the booth to the mounting table receiving seat 5d. In a state where the mounting table T is inserted into the fitting hole t and received and supported by the mounting table receiving seat 5d, the mounting table receiving seat 5d is rotated by the rotation of the motor 5B, so that the mounting table T is subjected to processing. It is configured to rotate around the vertical axis X along with the object 2.

  In the activation chamber U1, the cleaning chambers U3 and U5, and the draining chamber U6, the rotary motor 5B ejects the chemical solution 2 toward the workpiece 2 by the chemical solution ejection unit 3A and the auxiliary chemical solution ejection unit 3B. The chemical solution adhering to the substrate is scattered from the object to be processed 2 by centrifugal action, and the speed is adjusted so that the object to be processed 2 is rotated at a relatively low predetermined rotational speed (for example, about 30 rotations / minute). In U4, in parallel with the chemical solution jetting toward the workpiece 2 by the chemical jet unit 3A and the auxiliary chemical jet unit 3B, the reacted chemical solution adhering to the workpiece 2 by the chemical jetting is attached by centrifugal action. The speed of the workpiece 2 is adjusted so that the workpiece 2 is rotated at a relatively high rotational speed (for example, about 120 rpm) at which the workpiece 2 is separated and scattered from the workpiece 2 with little time delay.

  In the stationary chamber U2, the workpiece 2 to be placed is placed on the placing table T without rotating the placing table T.

  The chemical liquid ejection unit 3A is attached to a state where the chemical liquid ejection gun 3b is driven to swing in the workpiece conveyance direction at each of the lower end portions of the substantially downwardly four-pronged support member 3a, and via the drive chain 3c. The drive motor 3d connected to the upper part of the support member 3a is configured to reciprocate in a lateral direction (hereinafter sometimes referred to as a conveyance orthogonal direction) perpendicular to the workpiece conveyance direction by forward and reverse rotation of the drive motor 3d. The chemical solutions A to E are uniformly ejected while changing the ejection angle and the ejection position with respect to the workpiece 2 by the swinging operation and the reciprocating movement.

  Further, the auxiliary chemical liquid ejection unit 3B is configured by attaching a pair of chemical liquid ejection guns 3b to the tip of a substantially laterally bifurcated support portion disposed on the indoor wall, and the auxiliary chemical liquid ejection unit 3B is to be processed. The chemicals A to E are also ejected to the side of the object 2.

  Although not shown, the chemical solution ejection units 3A and the auxiliary chemical solution ejection unit 3B of the chemical solution ejection unit 3B are connected to the chemical solution supply paths Ra to Re and the air supply path RA3 for supplying the corresponding chemical solutions A to E, respectively. Yes, fresh air Ao adjusted in temperature and humidity by the air conditioner SA3 is individually supplied to the chemical liquid ejection gun 3b together with the chemical liquids A to E from the chemical liquid supply paths Ra to Re through the air supply path RA3 as the chemical liquid ejection air A3. It is.

  That is, the chemical liquid ejection air A3 supplied to the chemical liquid ejection gun 3b through the air supply path RA3 is ejected from the chemical liquid ejection gun 3b toward the workpiece 2 together with the chemical liquids A to E, whereby the chemical liquids A to E are discharged. It sprays toward the to-be-processed object 2 in a spraying state (namely, spray state).

  As shown in FIG. 6, the chemical liquid ejection gun 3b in the silver mirror chamber U4 has a pair of chemical liquid ejection guns 3b as one set, and connects the chemical liquid supply path Ra for supplying the chemical liquid A to one chemical liquid ejection gun 3b. The chemical solution supply path Rb for supplying the chemical solution B is connected to the chemical solution ejection gun 3b, and the set of the chemical solution ejection guns 3b is inclined at a predetermined angle toward the side where the tip portions approach each other, A silver mirror is produced by mixing the chemical liquid A ejected from one chemical liquid ejection gun 3b and the chemical liquid B ejected from the other chemical liquid ejection gun 3b in an overlapping region P2 extending from the vicinity of the workpiece 2 to the surface of the workpiece 2 The reaction is expressed.

  That is, in this silver mirror thin film forming facility, the chemical liquid adhering to the object to be processed 2 by the chemical liquid ejection by the chemical liquid ejection unit 3A and the auxiliary chemical liquid ejection unit 3B is removed from the object to be processed 2 by the centrifugal action by the rotation of the above-mentioned object 2 to be processed. By scattering, it is possible to prevent the chemical liquid pool from being generated on the surface of the workpiece 2 due to the shape of the workpiece 2, and to effectively prevent defects such as thickness unevenness and color unevenness of the silver mirror thin film caused by the chemical liquid pool. In particular, in the silver mirror chamber U4, the chemical liquids A and B ejected from the chemical liquid ejection unit 3A and the auxiliary chemical liquid ejection unit 3B toward the object 2 are immediately after reaching the object 2 or in the process of arrival. Since the silver mirror reaction is manifested in the overlapping region P2 that is, both the precipitated silver and the reacted chemical solution due to the silver mirror reaction are dispersed and attached to the surface of the object 2 to be processed. By quickly detaching and scattering the reacted chemical solution from the object 2, the adhered and reacted chemical solution is mixed with the subsequent unreacted chemical solutions A and B, and the concentration of the subsequent unreacted chemical solutions A and B changes indefinitely. In addition, the unevenness in thickness and color of the silver mirror thin film caused by the fact that the chemical solution after the adhesion reaction is interposed between the deposited silver due to the reaction of the subsequent chemicals A and B and the surface of the workpiece 2 To effectively prevent defects.

  Further, as represented by the chemical solution ejection gun 3b in the silver mirror chamber U4 shown in FIG. 6, the chemical solution at the tip of the chemical solution passage from the connecting portion of the chemical solution supply paths Ra to Re to the chemical solution discharge port 3e in the chemical solution ejection gun 3b is provided. An on-off valve 3f for opening and closing the chemical liquid passage is provided as close as possible to the discharge port 3e, whereby the chemical liquid discharge port when the on-off valve 3f is closed and the chemical liquid ejection is stopped from the state in which the on-off valve 3f is opened. The chemical solution is prevented from dropping from 3e, and the quality of the product is prevented from being deteriorated due to the falling chemical solution from the chemical solution discharge port 3e adhering to the workpiece 2 after the chemical solution is ejected.

  Furthermore, the chemical spray gun 3b in the silver mirror chamber U4 is positioned above the reacted chemical spray area P1 formed around the workpiece 2 by the rotation of the workpiece 2 by the rotation support device 5, as shown in FIG. The chemical liquids A and B are ejected from a position deviated from the splash area P1, and thereby the chemical liquids A and B ejected from the chemical liquid ejection gun 3b and the splash area P1 are scattered. The probability of collision with the reacted chemical solution is reduced.

  An air conditioner 18 that individually adjusts the temperature and humidity of the ventilation air A2 supplied to the silver mirror chamber U4 is interposed in the branch channel portion of the air supply path RA2 with respect to the silver mirror chamber U4. The air conditioner 18 individually adjusts the temperature and humidity of the ventilation air A2 for the silver mirror chamber U4 based on the indoor temperature and the indoor humidity of the silver mirror chamber U4 detected by the temperature and humidity detector 19 disposed in the silver mirror chamber U4. Thus, the room temperature or room humidity of the silver mirror room U4 is adjusted to a set value.

  On the other hand, the control panel 11 changes the set value of the room temperature and humidity of the silver mirror chamber U4 in accordance with the set production schedule or based on the detection of the type of the workpiece 2 by the workpiece detector 17. It is set as the structure which changes automatically according to the classification of the to-be-processed object 2 carried in to the chamber U4, and, thereby, the indoor temperature and humidity of the silver mirror room U4 on the silver mirror reaction according to the classification of each to-be-processed object 2 The temperature is automatically changed to a suitable temperature and humidity.

  Further, the pressure feeding tanks Ta and Tb of the silver mirror processing chemicals A and B used in the silver mirror chamber U4 are ejected from the chemical jet gun 3b in the silver mirror chamber U4 (that is, the temperature of the chemicals A and B in the pressure feeding tanks Ta and Tb). Are provided with chemical temperature controllers S1 and S2 for adjusting the temperature of the chemicals A and B to be set to a set value. On the other hand, the control unit 11 is controlled by the processing object detector 17 according to the production schedule. Based on the detection of the type of the processing object 2, the temperature setting values of the chemicals A and B are automatically changed according to the type of the processing object 2 carried into the silver mirror chamber U4. In the silver mirror chamber U4, the temperature of the chemicals A and B ejected from the chemical jet gun 3b is automatically changed to a suitable temperature for the silver mirror reaction according to the type of the object 2 to be processed.

  Furthermore, an air conditioner 20 that adjusts the temperature and humidity of the chemical liquid ejection air A3 supplied to the silver mirror chamber U4 to a set value is interposed in the branch flow path portion of the air supply path RA3 with respect to the silver mirror chamber U4. The control panel 11 sets the set value of the chemical jet air A3 supplied to the silver mirror chamber U4 according to the production schedule or based on the detection of the type of the object 2 to be processed by the object detector 17 in the silver mirror chamber. It is configured to automatically change according to the type of the object 2 to be carried into U4, whereby the temperature and humidity of the chemical liquid ejection air A3 ejected in the silver mirror chamber U4 is set to the type of each object 2 to be processed. The temperature and humidity are automatically changed to a suitable one for the silver mirror reaction.

  Further, the control panel 11 sets the rotational speed of the rotary motor 5B of the silver mirror chamber U4 according to the set production schedule or based on the detection of the type of the workpiece 2 by the workpiece detector 17 in the silver mirror chamber U4. The rotational speed of the workpiece 2 in the silver mirror chamber U4 is appropriately adjusted according to the type of each workpiece 2. The reaction speed is automatically changed to an optimum rotational speed that can effectively detach and scatter the reacted chemical solution as much as possible while ensuring a sufficient reaction time.

  In addition, the control panel 11 determines the rotation direction of the rotation motor 5B of the silver mirror chamber U4 and the rotation direction based on the production schedule or based on the detection of the type of the workpiece 2 by the workpiece detector 17. The time-dependent switching pattern of the workpiece 2 is automatically changed, whereby the rotational direction of the workpiece 2 in the silver mirror chamber U4 and the temporal switching pattern of the rotational direction according to the type of the workpiece 2 are determined. Thus, the processed chemical solution is automatically changed from the object to be processed 2 to an optimum one that can effectively and reliably detach and scatter.

  That is, in this silver mirror thin film forming facility, the type of the workpiece 2 conveyed into the silver mirror chamber U4 based on the set production schedule or the detection of the type of the workpiece 2 from the workpiece detector 17 is set. Accordingly, the rotational speed of the workpiece 2, the rotation direction of the workpiece 2, and the temporal switching pattern of the rotation direction are automatically changed to an optimum one according to the workpiece 2, and the temperature of the chemical solution ejection air A <b> 3 is changed. By automatically changing the humidity, the temperature of the chemicals A and B for silver mirror processing, and the room temperature and humidity of the silver mirror chamber U4 to a suitable one according to each of the objects to be processed 2, a plurality of objects to be processed 2 are automatically and sequentially In this case, defects such as thickness unevenness and color unevenness of the silver mirror thin film are more effectively and reliably prevented.

  As shown in FIG. 3, the chemical solution receiving plate 10 </ b> A is seen from the adjacent chamber when viewed from the adjacent chamber in the transporting direction of the treatment object 2 at the above-mentioned operation position located in the splashing region P <b> 1 of the scattering chemical liquid splashing from the treatment object 2. The processing object 2 and its surroundings are sufficiently covered and the upper edge has a lateral dimension L1 and a longitudinal dimension L2 that wraps with the lower edge part of the partition wall 9 (in this example, the object 2 and its The horizontal dimension L1 is larger than the maximum diameter R in the lateral direction with respect to the mounting table T on which the mounting table T is mounted, and the vertical dimension is larger than the length L from the lower edge of the partition wall 9 to the lower end of the mounting table T. L2), and receives the chemical solution (reacted chemical solution in the silver mirror chamber U4) scattered from the workpiece 2 in a state of closing the chamber entrance / exit, and in particular, splashes toward the workpiece 2 on the adjacent chamber side. The chemical solution is surely received.

  As shown in FIGS. 2 to 5, the receiving body moving means 10 includes a common rotating shaft 10 </ b> B for each chamber U <b> 1 to U <b> 6 connected to an air cylinder 10 </ b> C disposed near the workpiece receiving portion 7. The chemical liquid receiving plate 10A is attached to the chambers U1 to U6, and the common rotating shaft 10B is rotated about 90 degrees around the shaft axis by the air cylinder 10C as the common driving means in cooperation with the conveying means 8. By rotating within the range, the chemical solution receiving plate 10A is swung around the shaft axis of the common rotation shaft 10B, and the operation position shown in FIGS. ) And the retracted position shown in FIGS. 2 and 4 (a state where the chamber entrance / exit is opened). At the retracted position, the chemical receiving plate 10A passes through the path of movement of the workpiece 2 and the position immediately above the path, more specifically, the workpiece 2 passes through the workpiece by the conveying means 8. The workpiece passage area as the movement path and the movement path just above the workpiece passage area in the room are located at positions that are laterally deviated from the area h.

  In other words, when the chemical solution is ejected from the chemical solution ejection unit 3A and the auxiliary chemical solution ejection unit 3B by the receiving body moving means 10, the chemical solution receiving plate 10A is positioned at the operation position so that the operation through the chamber entrance / exit portion is performed. The mixing of the ejected drug solution and the intra-region air Au between the regions is suppressed, and the chemical solution (reacted chemical solution in the silver mirror chamber U4) is scattered to the adjacent chamber by the rotational centrifugal force by the rotation support device 5. This effectively suppresses inconveniences such as the scattered chemical solution adhering to the workpiece 2 in the adjacent room.

  Further, when the workpiece 2 is transported, the chemical solution receiving plate 10A is positioned at a retreat position that is laterally disengaged from the movement path and the area h immediately above the movement path, so that the chemical solution receiving plate 10A is separated from the treatment object 2 by the rotational centrifugal force. Thus, the chemical solution adhering to the chemical receiving plate 10A at the working position is prevented from dropping and adhering to the workpiece 2 passing through the chamber entrance / exit, and the silver mirror thin film thickness unevenness and color unevenness caused by the falling adhesion of the scattered chemical solution Defects such as are effectively and reliably prevented.

  As shown in FIGS. 7 and 8, the transfer means 8 places the mounting table T on the rotation support device 5 in the lower adjacent chamber from the mounting table seat 5d of the rotation support device 5 in the upper chamber in the workpiece transfer direction. A transfer device 8A for transferring substantially horizontally to the table receiving seat 5d, and raising and lowering the transfer device 8A, the mounting table T is detached from the mounting table receiving seat 5d of the rotation support device 5 in each chamber U1 to U6. And a lifting device 8B that lifts the transfer device 8A by the lifting device 8B and lifts the mounting table T upward from the mounting table receiving seat 5d, and a transfer device that moves the mounted mounting table T away from the mounting table receiving seat 5d. The forward movement process (see FIGS. 7A to 7B) for transferring to the lower adjacent chamber by 8A and the lowering of the transfer device 8A by the elevating device 8B causes the mounting table T to be placed in the lower adjacent chamber 5d. Descent process (Fig. 8 (a) ~ (b) And the return step of returning the transfer device 8A in the lowered state to the upper side while leaving the mounting table T in the lower-side adjacent chamber, in this order, the mounting table T and the workpiece 2 to be mounted on it. The paper is sequentially sent to the lower side in the transport direction.

  The transfer device 8A supports a pair of transport rails 8a for mounting and supporting the mounting table T to be transported in a booth longitudinal direction so as to be slidable in the workpiece transport direction by a plurality of rail receiving members 8b. At the same time, a rail driving portion 8c that pushes and pulls the transport rail 8a in the workpiece transport direction is fixed to a lower portion of the rail receiving member 8b, and the transport rail 8a is pushed and pulled by the rail drive portion 8c. Is moved back and forth in the workpiece conveyance direction, so that the forward movement process is performed with the forward movement, and the backward movement process is performed with the backward movement.

  The rail drive unit 8c is configured such that the ball screw 8e is connected and fixed to the rail receiving member 8b in a rotatable state, and the upper end of the slider 8f screwed to the ball screw 8e is connected to the transport rail 8a. As the push-pull operation of the transport rail 8a, the slider 8f is reciprocated in the workpiece transport direction by forward / reverse rotation driving of the ball screw 8e by the drive motor 8d, so that the transport rail 8a is brought into the state shown in FIG. It is configured to reciprocate at room intervals over the state of FIG.

  The elevating device 8B has a pair of long rectangular bar-like support frames 8g fixed to the workpiece supply section 6 and the workpiece receiving section 7, and an air cylinder 8h with the support frame 8g as a base. A plurality of link units 8D for raising and lowering the rail receiving member 8b of the transfer device 8A by pushing and pulling the common operation rod 8i are provided at intervals of one for every two chambers.

  The link unit 8D includes a first link member 8j having an upper end pivotally connected to the rail receiving member 8b, an upper end pivotally connected to a central portion of the first link member 8j, and a lower end pivotally supported to the support frame 8g. The first and second link members 8j and 8k are connected to the support frame 8g and the second link member in a side view when the first and second link members 8j and 8k are pivotally supported by the rail receiving member 8b and the first link member 8j. It is assembled in a state located directly above the pivot point of 8k.

  Further, a rolling wheel 8m that rolls on the support frame 8g in the workpiece conveyance direction is attached to the lower end of the first link member 8j, and the rolling wheel 8m of each first link member 8j is connected to the common operation rod 8i. In this manner, the wheel 8m of each first link member 8j is synchronized and rolled on the support frame 8g by pushing and pulling the common operating rod 8i by the air cylinder 8h.

  That is, the wheel 8m of each first link member 8j is moved to the second link member 8k side by pushing and pulling the common operation rod 8i, and the inclination angle of each first link member 8j is changed from K2 to K1 (FIG. 8). (B) (see (b)), the above-described ascending step of raising the rail receiving member 8b to raise the conveying rail 8a is performed, and the first link member 8j is rotated by pushing and pulling the common operating rod 8i. The lowering step of lowering the rail receiving member 8b and lowering the transport rail 8a by moving the wheel 8m away from the second link member and changing the inclination angle of each first link member 8j from K1 to K2. To do.

  The chemical liquid ejection unit 3 </ b> A and the auxiliary chemical liquid ejection unit 3 </ b> B correspond to chemical liquid ejection means for ejecting the chemical liquids A to E for performing silver mirror processing on the surface of the workpiece 2 toward the workpiece 2. U <b> 1 to U <b> 6 correspond to a work area for performing silver mirror processing on the surface of the workpiece 2.

[Another embodiment]
Next, other embodiments of the present invention will be listed.
In the above-mentioned embodiment, while providing the partition which partitions off the upper area of each chamber U1-U6, and partitioning the chamber entrance / exit part formed under the partition wall 9 with a chemical | medical solution receiving body, a partition and chemical | medical solution Although the chambers are separated from each other by the receiving body, the portions extending from the upper area of each of the chambers U1 to U6 to the chamber inlet / outlet portions are partitioned by the chemical liquid receiving body 10A without providing the partition wall 9, or the chamber For example, the chemical solution receiving body may be used as a partitioning body, such as completely partitioning each other.

  In the above-described embodiment, the partition wall 9 for partitioning the upper regions of the chambers U1 to U6 is provided, and the chamber inlet / outlet portion formed below the partition wall 9 is used as the action position of the chemical solution receiving plate 10A. However, the upper portion of the chamber inlet / outlet portion inside the partition wall 9 is configured to be the operating position of the chemical solution receiving plate 10A, and the chemical solution receiving body 10A is used above the chamber inlet / outlet portion on the inner surface of the partition wall 9. You may make it suppress that an ejected chemical | medical solution or a scattered chemical | medical solution adheres to the located part.

  In the above-described embodiment, the treatment object 2 is rotated in parallel with the chemical liquid ejection to the workpiece 2 by the chemical liquid ejection unit 3A and the auxiliary chemical liquid ejection unit 3B. You may make it the structure which rotates the to-be-processed object 2 after the chemical | medical solution ejection to the to-be-processed object 2 by the chemical | medical solution ejection unit 3B.

  In the above-described embodiment, the movement path of the workpiece 2 and the position deviated from right above the movement path to the side are the retracted positions of the chemical solution receiving plate 10A. The position deviated from directly above the path downward may be used as the retracted position of the chemical solution receiving plate 10A, and the movement path of the workpiece 2 and another member that covers the position immediately above the movement path are disposed, The upper position of the other member may be a retracted position of the chemical liquid receiving plate 10A.

  In the above-described embodiment, the plate-shaped chemical liquid receiving plate 10A is shown as an example of the chemical liquid receiving body that receives the scattered chemical liquid scattered from the workpiece 2. However, the shape of the chemical liquid receiving body is a dome shape or a box. Various shapes such as a mold shape and a ring shape may be used.

  Further, when the shape of the chemical liquid receiving body is a dome shape, a box shape, a ring shape, or the like, the position where the chemical liquid receiving body surrounds the workpiece 2 is defined as an action position, and the workpiece 2 is A position where the enclosing state is removed may be a retreat position so that the movement path of the workpiece 2 can be set as appropriate.

  In the above-described embodiment, the silver mirror processing booth 1 and the partition wall 9 that hangs down from the ceiling of the silver mirror processing booth 1 are provided, and the chemical solution using the chamber entrance / exit portion formed below the partition wall 9 as the chemical liquid receiving body. Each chamber U1 to U6 as a work area for silver mirror processing was formed on the surface of the workpiece 2 by partitioning with the receiving plate 10A, but the shape of the chemical liquid receiving body was a dome shape, a box shape In addition to the shape, the position where the chemical liquid receiver surrounds the workpiece 2 may be configured as the action position, and the working area may be formed by the chemical liquid receiver alone at the action position.

  In the above-described embodiment, the activation chamber U1, the activator cleaning chamber U2, the silver mirror chamber U4, and the silver mirror chemical solution cleaning chamber U5 are provided one by one. However, these chambers may be divided as necessary. .

  Further, when the chamber is divided as described above, the rotation speed, the rotation direction, and the rotation direction switching pattern by the rotation support device 5 may be changed as necessary between the front stage and the rear stage of the divided chamber, You may change the density | concentration of chemical | medical solution AE ejected from a chemical | medical agent ejection means, the amount of ejection, the mixing ratio of the chemical | medical solutions A and B for silver mirror processing, etc. as needed.

Explanatory drawing showing the overall structure of the silver mirror thin film forming equipment Cross-sectional view of the silver mirror chamber during conveyance of workpieces in the direction perpendicular to workpiece conveyance Cross-sectional view of the silver mirror room during the chemical jet Cross-sectional view of workpiece transfer direction in silver mirror chamber during transfer of workpiece Cross section of workpiece in the silver mirror room during chemical ejection Explanatory drawing which shows the ejection state of the chemical | medical solution which expresses a silver mirror reaction by mixing Explanatory drawing of transfer device Explanatory drawing of transfer device

Explanation of symbols

2 To-be-processed object 3A Chemical solution ejection means (chemical solution ejection unit)
3B Chemical liquid ejection means (auxiliary liquid ejection unit)
5 Rotating means (rotating support device)
9 Partition (partition wall)
10 Receiving body moving means 10A Chemical liquid receiving body (chemical liquid receiving plate)
10C Common drive means (air cylinder)
A to E Chemical solution P1 Spattering area U1 to U6 Working area (active room, stationary room, activator cleaning room, silver mirror room, silver mirror chemical cleaning room, draining room)

Claims (6)

A silver mirror thin film forming facility provided with a chemical solution ejecting means for ejecting a chemical solution for performing silver mirror treatment on the surface of the object to be treated, and a rotating means for rotating the object to be treated,
The chemical solution adhering to the object to be processed by the chemical liquid ejecting by the chemical liquid ejecting means is configured to be scattered from the object to be processed by the centrifugal action in the object rotating by the rotating means,
A chemical solution receiving body for receiving the scattered chemical solution is provided in the splashing region of the scattered chemical solution, and the chemical solution receiving body deviates from the action position for receiving the scattered chemical solution, the movement path of the object to be processed, and the position immediately above the route. Silver mirror thin film forming equipment provided with a receiving body moving means for switching to a retracted position. The chemical solution jetting means is configured to jet a plurality of types of chemical solutions that express a silver mirror reaction by mixing in a state of reacting on or near the surface of the object to be processed.
The silver mirror thin film forming facility according to claim 1, wherein the rotating means is configured to rotate the object to be processed in parallel with the chemical liquid ejection toward the object to be processed by the chemical liquid ejecting means. In addition to providing a partition that partitions the work areas for silver mirror treatment on the surface of the workpiece,
3. The silver mirror according to claim 1, wherein the chemical solution receiving body is configured such that the working position is an inside of the partition and above an entrance / exit part through which a workpiece is taken in and out of the work area. Thin film forming equipment.   3. The silver mirror thin film forming facility according to claim 1, wherein the chemical solution receiver is configured to partition work areas for performing silver mirror processing on a surface of an object to be processed when it is in the working position.   5. The silver mirror thin film forming facility according to claim 4, wherein when the chemical solution receiving body is in the working position, the chemical liquid receiving body is configured to close a workpiece entrance / exit between the work areas partitioned by the partitioning body. While having a configuration in which each of the chemical liquid receivers is provided for a plurality of the work areas,
The silver mirror thin film forming facility according to any one of claims 1 to 5, wherein the receiving body moving means is configured to switch and move a plurality of the chemical liquid receiving bodies by a common driving means.

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