JP2007185275A - Residual gas removal method in gas sterilization - Google Patents

Residual gas removal method in gas sterilization Download PDF

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JP2007185275A
JP2007185275A JP2006004420A JP2006004420A JP2007185275A JP 2007185275 A JP2007185275 A JP 2007185275A JP 2006004420 A JP2006004420 A JP 2006004420A JP 2006004420 A JP2006004420 A JP 2006004420A JP 2007185275 A JP2007185275 A JP 2007185275A
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gas
pressure
steam
sterilization
sterilized
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JP2007185275A5 (en
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Tetsushi Nakai
哲志 中井
Yuichi Takahashi
裕一 高橋
Kazunori Shimada
和典 島田
Takafumi Yamazaki
崇文 山崎
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Miura Co Ltd
Miura Protec Co Ltd
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Miura Co Ltd
Miura Protec Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To enable the removal of the residual gas in a shorter time concerning a residual gas removal method for removing the gas left in an object subjected to the gas sterilization treatment in the gas sterilization for sterilizing the object such as a medical tool using a sterilization gas. <P>SOLUTION: In the residual gas removal method in the gas sterilization for removing the gas left in the object subjected to the gas sterilization treatment, the object subjected to the gas sterilization treatment is placed in a closed space and undergoes the following processes: the steam soaking process for supplying the steam into the closed space under a negative pressure below the atmospheric pressure and held for a prescribed period of time to get the steam soaked into the object and the decompression exhaust process which follows the steam soaking process for exhausting the steam under a reduced pressure within the closed space. The steam soaking process and the decompression exhaust process are repeated a plurality of times. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

この発明は、この発明は、滅菌ガスを用いて医療用具等の被滅菌物を滅菌するガス滅菌において、ガス滅菌処理された被滅菌物物に残留するガスを除去する残留ガス除去方法に関する。   The present invention relates to a residual gas removal method for removing a gas remaining in an object to be sterilized in gas sterilization in which the object to be sterilized such as a medical device is sterilized using a sterilization gas.

ガス滅菌方法として、酸化エチレンガス(以下、EOGと称する。)を滅菌ガスとして用いる方法が知られている。このガス滅菌方法においては、ガス滅菌処理後に被滅菌物に残留するガスを除去する必要がある。この残留ガス除去方法としては、処理槽内への空気の供給と排出とを繰り返すことにより除去するエアレーションと称する方法が一般的である。この方法によれば、被滅菌物のガス残留濃度を10ppm以下にするにはたとえば8時間以上の長い時間を要し、滅菌運転開始から終了まで、半日以上を要する。   As a gas sterilization method, a method using ethylene oxide gas (hereinafter referred to as EOG) as a sterilization gas is known. In this gas sterilization method, it is necessary to remove the gas remaining in the article to be sterilized after the gas sterilization treatment. As a method for removing the residual gas, a method called aeration in which the removal is performed by repeatedly supplying and discharging air into the treatment tank is generally used. According to this method, it takes a long time of, for example, 8 hours or more to reduce the residual gas concentration of an object to be sterilized to 10 ppm or less, and it takes more than half a day from the start to the end of the sterilization operation.

この出願の発明者等はその原因を追及した結果、被滅菌物(主にプラスチック材)内部に吸着したEOGは内部拡散によってのみ外部へ放出されるために除去速度が遅くなることを見出し、この出願の発明を創出するに至ったものである。   As a result of pursuing the cause, the inventors of this application have found that EOG adsorbed inside the article to be sterilized (mainly plastic material) is released to the outside only by internal diffusion, and the removal rate becomes slow. This led to the creation of the invention of the application.

前記発明者等の研究とは別に、こうした残留ガス除去時間の短縮方法が、特許文献1にて提案されている。この方法は、ガス滅菌を終了した後、真空ポンプを継続して運転して処理槽内の気体を排出しつつ、給蒸ラインの途中に設けた開閉弁の開閉を繰り返し行なうことにより、残留ガス除去を行うものである。   Aside from the researches by the inventors, a method for shortening such residual gas removal time is proposed in Patent Document 1. In this method, after the gas sterilization is completed, the vacuum pump is continuously operated to discharge the gas in the treatment tank, and the open / close valve provided in the middle of the steaming line is repeatedly opened and closed, thereby remaining gas. The removal is performed.

しかしながら、この方法は、真空ポンプを連続的に運転するために、処理槽内へ供給された蒸気の多くがさほど間をおかず処理槽外へ排出されるので、被滅菌物内部への蒸気の浸透が効果的に行われないものとなっている。このため、被滅菌物内部に残留したガスを効果的に除去できない。   However, in this method, in order to continuously operate the vacuum pump, since much of the steam supplied into the processing tank is exhausted to the outside of the processing tank in a short time, the penetration of the steam into the sterilized material Is not done effectively. For this reason, the gas remaining inside the article to be sterilized cannot be removed effectively.

特開平2−63461号公報JP-A-2-63461

この発明が解決しようとする課題は、短時間で残留ガスを除去することである。   The problem to be solved by the present invention is to remove residual gas in a short time.

この発明は、前記課題を解決するためになされたもので、請求項1に記載の発明は、ガス滅菌処理を施した被滅菌物に残留するガスを除去するガス滅菌における残留ガス除去方法であって、ガス滅菌処理された被滅菌物を密閉空間におき、大気圧未満の陰圧下において前記密閉空間内へ給蒸して所定時間保持することにより蒸気を被滅菌物内へ浸透させる蒸気浸透工程と、この蒸気浸透工程後に行われ前記密閉空間内を減圧排気する減圧排気行程とを含むことを特徴としている。   The present invention has been made to solve the above-mentioned problems, and the invention according to claim 1 is a residual gas removal method in gas sterilization that removes gas remaining in an object to be sterilized after gas sterilization. A vapor infiltration step in which the sterilized material that has been subjected to gas sterilization is placed in a sealed space, steamed into the sealed space under a negative pressure less than atmospheric pressure, and held for a predetermined time to infiltrate the vapor into the sterilized material; And a reduced pressure exhaust stroke which is performed after the vapor permeation step and exhausts the inside of the sealed space under reduced pressure.

さらに、請求項2に記載の発明は、請求項1において、前記蒸気浸透工程と減圧排気行程とを複数回繰り返して行うことを特徴としている。   Furthermore, the invention described in claim 2 is characterized in that, in claim 1, the steam permeation step and the vacuum exhaust stroke are repeated a plurality of times.

この発明によれば、被滅菌物内の残留ガスを効果的に除去することができ、残留ガス除去に要する時間を短縮することができる。   According to this invention, the residual gas in the article to be sterilized can be effectively removed, and the time required for removing the residual gas can be shortened.

つぎに、この発明の実施の形態について説明する。この発明の実施の形態は、被滅菌物の残留ガスを除去するガス滅菌装置、ガス滅菌装置と別に設けられガス滅菌装置にて滅菌処理された被滅菌物の残留ガスを除去する滅菌ガス除去装置に適用される。   Next, an embodiment of the present invention will be described. Embodiments of the present invention include a gas sterilization apparatus that removes residual gas from an object to be sterilized, and a sterilization gas removal apparatus that is provided separately from the gas sterilization apparatus and removes residual gas from the object to be sterilized by the gas sterilization apparatus. Applies to

この発明の実施の形態は、EOGなどの滅菌ガスによりガス滅菌処理を施した被滅菌物に残留するガスを除去するガス滅菌における残留ガス除去方法であって、ガス滅菌処理された被滅菌物を密閉空間におき、大気圧未満の陰圧下において前記密閉空間内へ給蒸して所定時間保持することにより蒸気を被滅菌物内へ浸透させる蒸気浸透工程と、この蒸気浸透工程後に行われ前記密閉空間内を減圧排気する減圧排気行程とを含むことを特徴とするガス滅菌における残留ガス除去方法である。   An embodiment of the present invention is a residual gas removal method in gas sterilization that removes gas remaining in an object to be sterilized by sterilization gas such as EOG. A vapor infiltration step in which steam is infiltrated into an object to be sterilized by being steamed into the enclosed space under a negative pressure less than atmospheric pressure and kept for a predetermined time, and the enclosed space is performed after the vapor infiltration step. A method for removing residual gas in gas sterilization, comprising a reduced pressure exhaust process for exhausting the inside of the interior under reduced pressure.

この実施の形態においては、先ず被滅菌物をガス滅菌処理する。ついで、蒸気浸透工程を行う。この蒸気浸透工程は、ガス滅菌処理された被滅菌物を密閉空間内におき、大気圧未満の陰圧(負圧と称することもできる。)下において、前記密閉空間内へ蒸気を供給(給蒸)し、この給蒸状態を所定時間保持する。このとき前記密閉空間の減圧排気や前記密閉空間からの排蒸は行わない。この給蒸状態を所定時間保持することにより、前記密閉空間内の蒸気は、被滅菌物内へと浸透して行き、浸透した蒸気または凝縮した水に被滅菌物内の残留ガスが溶ける。ついで、減圧排気行程を行う。この減圧排気行程は、前記密閉空間内を真空ポンプなどの減圧手段により減圧して内部の気体を排出する。この減圧排気行程により、被滅菌物内に浸透し、残留ガスを吸収した凝縮水が気化され、残留ガスは、気化蒸気とともに密閉空間外へ排出される。こうして、被滅菌物に残留したガスが除去される。   In this embodiment, first, the object to be sterilized is gas sterilized. Next, a steam infiltration process is performed. In this steam infiltration process, an object to be sterilized by gas sterilization is placed in a sealed space, and steam is supplied (supplied) to the sealed space under a negative pressure (also referred to as negative pressure) below atmospheric pressure. The steaming state is maintained for a predetermined time. At this time, no vacuum exhaust from the sealed space and no exhaust from the sealed space are performed. By maintaining this steam supply state for a predetermined time, the vapor in the sealed space penetrates into the sterilized material, and the residual gas in the sterilized material dissolves in the permeated vapor or condensed water. Next, a vacuum exhaust stroke is performed. In this decompression exhaust process, the inside of the sealed space is decompressed by decompression means such as a vacuum pump, and the internal gas is discharged. By this decompression exhaust process, the condensed water that has penetrated into the object to be sterilized and absorbed the residual gas is vaporized, and the residual gas is discharged out of the sealed space together with the vaporized vapor. In this way, the gas remaining on the object to be sterilized is removed.

つぎに、この実施の形態の構成要素について説明する。被滅菌物は、医療用具などであり、特定のものに限定されないが、この発明は、プラスチック材からなる被滅菌物に好適に実施される。ガス滅菌処理は、周知のガス滅菌装置により実施され、滅菌方法は特定の方法に限定されるものではない。また、ガス滅菌処理は、前記密閉空間内を大気圧または大気圧以上の陽圧(正圧と称することができる。)にて行うように構成することができる。   Next, components of this embodiment will be described. The article to be sterilized is a medical device and the like, and is not limited to a specific one. However, the present invention is preferably implemented for an article to be sterilized made of a plastic material. The gas sterilization process is performed by a known gas sterilization apparatus, and the sterilization method is not limited to a specific method. In addition, the gas sterilization treatment can be configured to be performed in the sealed space at atmospheric pressure or positive pressure (which can be referred to as positive pressure) equal to or higher than atmospheric pressure.

前記密閉空間は、ガス滅菌装置または滅菌ガス除去装置の処理槽によって形成される。この処理槽は、被滅菌物を出し入れする扉付き開口、給蒸ライン、復圧ライン、減圧排気ラインによって外部都連通しているが、前記開口を閉じ、各ラインに設けた弁を閉じることにより、密閉空間を形成することができる。   The sealed space is formed by a treatment tank of a gas sterilization apparatus or a sterilization gas removal apparatus. This treatment tank is connected to the outside by an opening with a door for taking in and out the object to be sterilized, a steam supply line, a return pressure line, and a vacuum exhaust line, but by closing the opening and closing a valve provided in each line A sealed space can be formed.

前記蒸気浸透工程は、前記密閉空間にガス滅菌処理済みの被滅菌物を入れた状態で、前記密閉空間内を減圧して設定された陰圧(第一設定圧力)まで減圧した状態で、給蒸(加湿),すなわち前記密閉空間内へ所定量の蒸気を供給し、この蒸気供給状態を所定時間保持することで、被滅菌物内へ蒸気を浸透させる工程である。前記所定時間は、被滅菌物への蒸気の浸透度合いを実験的に測定することにより定める。   In the vapor permeation step, a gas sterilized article to be sterilized is placed in the sealed space, and the inside of the sealed space is depressurized to a set negative pressure (first set pressure). Steaming (humidification), that is, a process of supplying a predetermined amount of steam into the sealed space and maintaining the steam supply state for a predetermined time, thereby allowing the steam to penetrate into the sterilized object. The predetermined time is determined by experimentally measuring the degree of vapor penetration into the article to be sterilized.

また、減圧排気行程は、前記蒸気浸透工程の後に行われ、給蒸を停止して、前記密閉空間内を減圧して排気する工程である。この減圧は、前記密閉空間内が前記第一設定圧力よりも低い第二設定圧力となるまで行われる。この減圧排気行程は、被滅菌物内に浸透し、残留ガスを溶かした凝縮水を蒸発気化させる工程であるので、蒸発排気行程と称することができる。   Further, the reduced pressure exhaust process is a process that is performed after the vapor infiltration step, stops steaming, and exhausts the sealed space by reducing the pressure. This pressure reduction is performed until the inside of the sealed space becomes a second set pressure lower than the first set pressure. This decompression exhaust process is a process of evaporating the condensed water that has penetrated into the sterilized material and dissolved the residual gas, and can be referred to as an evaporation exhaust process.

この減圧排気行程の後、必要に応じて、前記蒸気浸透工程および減圧排気行程を1乃至
複数回実施する。
After the decompression process, the vapor permeation step and the decompression process are performed one or more times as necessary.

つぎに、この発明の残留ガス除去方法が実施される残留ガス除去装置の実施の形態について説明する。   Next, an embodiment of a residual gas removing apparatus in which the residual gas removing method of the present invention is implemented will be described.

この残留ガス除去装置は、ガス滅菌処理された被滅菌物を収容する処理槽と、この処理槽へ給蒸する(または加湿する)給蒸手段と、前記処理槽内を減圧する減圧手段と、前記処理槽内を復圧する復圧手段と、前記給蒸手段,前記減圧手段および前記復圧手段を制御する制御手段とを備え、前記制御手段は、前記処理槽の密閉状態において前記処理槽内を大気圧未満の陰圧として前記処理槽へ給蒸して所定時間保持する蒸気浸透工程とこの蒸気浸透工程後に行われ前記処理槽内を減圧排気する減圧排気行程と行うことを特徴とするものである。   The residual gas removing device includes a processing tank for storing an object to be sterilized, a steaming means for steaming (or humidifying) the processing tank, a decompression means for decompressing the inside of the processing tank, A pressure return means for returning the pressure in the treatment tank; and a control means for controlling the steam supply means, the pressure reduction means, and the pressure return means, and the control means is provided in the treatment tank in a sealed state. A vapor infiltration step in which steam is supplied to the treatment tank as a negative pressure less than atmospheric pressure and held for a predetermined time, and a reduced pressure exhaust process is performed after the vapor infiltration process to decompress and exhaust the inside of the treatment tank. is there.

この残留ガス除去装置の実施の形態によれば、前記残留ガス除去方法の実施の形態により得ることのできる効果を奏することができる。   According to the embodiment of the residual gas removing apparatus, the effects that can be obtained by the embodiment of the residual gas removing method can be achieved.

この残留ガス除去装置は、ガス滅菌装置と兼用することができ、兼用する場合は、前記処理槽内へ滅菌ガスを供給する給ガス手段を備える。   This residual gas removing device can also be used as a gas sterilizer, and in the case of using it as a gas sterilizer, is provided with a gas supply means for supplying a sterilizing gas into the treatment tank.

前記給蒸手段は、一端が蒸気発生装置と接続され、他端が前記処理槽と接続される給蒸ライン(配管)と、この給蒸ライン途中に設ける給蒸弁とを含んで構成される。前記給蒸弁は、開閉のみの電磁弁とするが、必要に応じて開度を調整可能な調整弁とすることができる。   The steaming means includes a steaming line (piping) having one end connected to the steam generator and the other end connected to the treatment tank, and a steaming valve provided in the middle of the steaming line. . The steam supply valve is an electromagnetic valve that can only be opened and closed, but can be an adjustment valve whose opening degree can be adjusted as necessary.

前記減圧手段は、前記処理槽と接続される排気ライン(配管)と、この排気ライン途中に設ける減圧器と、前記処理槽方向への逆流を防止する逆止弁と、前記処理槽の密閉状態を保持するための開閉弁とを含んで構成される。前記減圧器は、蒸気エゼクタ,真空ポンプ,水エゼクタの1乃至複数を組み合わせたものに対して、必要に応じて減圧器の上流側に設けられ蒸気を凝縮する熱交換器を組み合わせることにより構成することができる。前記開閉弁は、開度を調整可能な弁とすることができる。   The decompression means includes an exhaust line (pipe) connected to the treatment tank, a decompressor provided in the middle of the exhaust line, a check valve for preventing a back flow in the treatment tank direction, and a sealed state of the treatment tank. And an on-off valve for holding the valve. The decompressor is configured by combining a heat exchanger that condenses steam, provided on the upstream side of the decompressor, if necessary, in combination with one or more of a steam ejector, a vacuum pump, and a water ejector. be able to. The on-off valve may be a valve whose opening degree can be adjusted.

前記復圧手段は、一端が前記処理槽と接続される復圧ライン(配管)と、この復圧ライン途中に設ける空気浄化フィルターと、復圧弁と、前記処理槽から大気方向への逆流を阻止する逆止弁とを含んで構成されている。前記復圧弁は、開閉のみの電磁弁とするが、必要に応じて開度を調整可能な調整弁とすることができる。   The return pressure means has one end connected to the treatment tank, a return pressure line (pipe), an air purification filter provided in the middle of the return pressure line, a return pressure valve, and a reverse flow from the treatment tank to the atmosphere. And a check valve. The return pressure valve is an electromagnetic valve that can only be opened and closed, but can be an adjustment valve whose opening degree can be adjusted as necessary.

また、前記制御手段は、前記処理槽内の圧力を検出する圧力検出手段からの信号を入力して、前記給蒸手段および前記減圧手段を制御して、少なくとも前記蒸気浸透工程および前記減圧排気行程を含む残留ガス除去の制御手順を実行する。   The control means inputs a signal from a pressure detection means for detecting the pressure in the processing tank, controls the steam supply means and the pressure reducing means, and at least the steam permeation step and the pressure reduction exhaust stroke. A control procedure for removing residual gas is performed.

以下、この発明の残留ガス除去方法の具体的実施例を図面に基づいて詳細に説明する。図1は、同実施例を説明する処理槽内の時間−圧力特性図であり、図2は同実施例の残留ガス除去方法を実施したガス滅菌装置1の概略構成を説明する図である。   Hereinafter, specific examples of the residual gas removing method of the present invention will be described in detail with reference to the drawings. FIG. 1 is a time-pressure characteristic diagram in the treatment tank for explaining the embodiment, and FIG. 2 is a view for explaining a schematic configuration of a gas sterilization apparatus 1 that implements the residual gas removing method of the embodiment.

まず、前記ガス滅菌装置1を図1に基づいて説明する。このガス滅菌装置1は、ガス滅菌機能と被滅菌物内に残留したガスを除去する残留ガス除去機能とを備えた装置である。   First, the gas sterilizer 1 will be described with reference to FIG. This gas sterilization apparatus 1 is an apparatus having a gas sterilization function and a residual gas removal function for removing gas remaining in an object to be sterilized.

このガス滅菌装置1は、ガス滅菌処理する被滅菌物およびガス滅菌処理された被滅菌物を収容する処理槽2と、この処理槽2へ滅菌ガス(EOG)を供給する給ガス手段3と、
飽和蒸気(以下、単に蒸気と称する。)を供給する給蒸手段4と、前記処理槽2内を減圧する減圧手段5と、前記処理槽2内を復圧する復圧手段6と、前記給蒸手段4,前記減圧手段5および前記復圧手段6を制御する制御手段としての制御器7とを主要部として備えている。
The gas sterilization apparatus 1 includes a sterilization object to be sterilized and a processing tank 2 for storing the sterilized object to be sterilized, and a gas supply means 3 for supplying a sterilization gas (EOG) to the processing tank 2,
Steaming means 4 for supplying saturated steam (hereinafter simply referred to as steam), decompression means 5 for decompressing the inside of the treatment tank 2, decompression means 6 for decompressing the inside of the treatment tank 2, and the steaming Means 4 and a controller 7 as control means for controlling the decompression means 5 and the decompression means 6 are provided as main parts.

前記処理槽2は、開閉可能な扉(図示省略)を備え、この発明の密閉空間を画成する。   The said processing tank 2 is equipped with the door (illustration omitted) which can be opened and closed, and defines the sealed space of this invention.

前記給ガス手段3は、一端がボンベなどのEOG供給源(図示省略)と接続され、他端が前記処理槽2と接続される給ガスライン8と、この給ガスライン8の途中に設けた給ガス弁9とを含んで構成されている。   One end of the gas supply means 3 is connected to an EOG supply source (not shown) such as a cylinder, and the other end is connected to the processing tank 2. A gas supply line 8 is provided in the middle of the gas supply line 8. And a gas supply valve 9.

前記給蒸手段4は、一端が蒸気発生装置(図示省略)と接続され、他端が前記処理槽2と接続される給蒸ライン10とこの給蒸ライン10途中に設ける給蒸弁11とを含んで構成される。   The steam supply means 4 includes a steam supply line 10 having one end connected to a steam generator (not shown) and the other end connected to the treatment tank 2 and a steam supply valve 11 provided in the middle of the steam supply line 10. Consists of including.

前記減圧手段5は、前記処理槽2と接続される排気ライン12と、この排気ライン12途中に設ける減圧器としての真空ポンプ13と、前記処理槽2方向への逆流を防止する第一逆止弁14と、蒸気浸透工程において前記処理槽2の密閉状態を保持すべく,すなわち前記処理槽2から前記排気ライン12を介して蒸気が漏れるのを防止すべく設けた電磁弁からなる開閉弁15を含んで構成される。前記排気ライン12は、EOG処理装置16と接続されている。   The decompression means 5 includes an exhaust line 12 connected to the processing tank 2, a vacuum pump 13 as a decompressor provided in the middle of the exhaust line 12, and a first check that prevents backflow in the direction of the processing tank 2. On-off valve 15 comprising a valve 14 and an electromagnetic valve provided to keep the processing tank 2 hermetically sealed in the steam permeation step, that is, to prevent steam from leaking from the processing tank 2 through the exhaust line 12. It is comprised including. The exhaust line 12 is connected to an EOG processing device 16.

前記復圧手段6は、一端が前記処理槽2と接続される復圧ライン17と、この復圧ライン17途中に設ける空気浄化フィルター18と、復圧弁19と、前記処理槽2から大気方向への逆流を阻止する第二逆止弁20とを含んで構成されている。   The return pressure means 6 has a return pressure line 17 having one end connected to the treatment tank 2, an air purification filter 18 provided in the middle of the return pressure line 17, a return pressure valve 19, and the treatment tank 2 toward the atmosphere. And a second check valve 20 for preventing the backflow.

また、前記制御器6は、前記処理槽2内の圧力を検出する圧力検出手段としての圧力センサ21からの信号を入力して、前記給ガス手段3の給ガス弁9,前記給蒸手段4の給蒸弁11,前記減圧手段5の開閉弁15および真空ポンプ13,前記復圧手段6の復圧弁19を制御して、予め記憶した処理手順を実行する。   Further, the controller 6 inputs a signal from a pressure sensor 21 as pressure detecting means for detecting the pressure in the processing tank 2, and supplies the gas supply valve 9 of the gas supply means 3 and the steam supply means 4. The steam supply valve 11, the opening / closing valve 15 of the decompression means 5, the vacuum pump 13, and the return pressure valve 19 of the return pressure means 6 are controlled to execute a previously stored processing procedure.

この処理手順は、図1に示すように処理槽2内へ収容した被滅菌物をガス滅菌処理するガス滅菌工程と、主に処理槽2内のガスを排出する洗浄工程(エアレーション工程と称することができる。)と、主に被滅菌物内に残留した残留ガスを除去する残留ガス除去工程(加湿エアレーション工程と称することができる。)と、前記洗浄工程と、前記処理槽2の復圧工程とを順次行うように構成されている。   As shown in FIG. 1, this processing procedure includes a gas sterilization process for gas sterilizing an object to be sterilized contained in the processing tank 2, and a cleaning process (referred to as an aeration process) for mainly discharging the gas in the processing tank 2. A residual gas removal step (which can be referred to as a humidified aeration step) that mainly removes residual gas remaining in the article to be sterilized, the cleaning step, and the pressure-reducing step of the treatment tank 2 Are sequentially performed.

以下にこの実施例の動作を図1および図2に基づき説明する。   The operation of this embodiment will be described below with reference to FIGS.

(準備工程)
最初に、前記処理槽2内に被滅菌物を収容し、前記処理槽2を密閉する。その後、前記開閉弁5および前記復圧弁19を開き、前記真空ポンプ13を作動させる。これにより、前記復圧ライン17 から前記フィルター18を通して得られる無菌状態の空気(以下無菌空気と称する)を導入しつつ、前記処理槽2内の空気を前記排気ライン12ら排出する。その結果、前記処理槽2内を無菌空気で置換する。
(Preparation process)
First, an object to be sterilized is accommodated in the treatment tank 2 and the treatment tank 2 is sealed. Thereafter, the on-off valve 5 and the return pressure valve 19 are opened, and the vacuum pump 13 is operated. Thereby, the air in the processing tank 2 is discharged from the exhaust line 12 while introducing aseptic air (hereinafter referred to as sterile air) obtained from the return pressure line 17 through the filter 18. As a result, the inside of the treatment tank 2 is replaced with aseptic air.

(滅菌工程)
この状態で、前記処理槽2内を加熱手段(図示省略)により、所定の温度に昇温した後、前記処理槽2内の空気を前記排気ライン12から排出する。つぎに、この処理槽2内へ前記給蒸手段4から蒸気を供給してガス滅菌に適した適度の湿度とする。この状態で、前
記給ガス弁9を開いて前記処理槽2内へ前記給ガスライン8からEOGを供給した後、所定の時間保持して、滅菌を行なう。この滅菌工程を所定時間行った後、前記給ガス弁9および前記復圧弁19を閉じた状態で、前記開閉弁15を開いて、前記真空ポンプ13を作動させて大気圧より低い第一設定圧力P1まで減圧する減圧工程(最終真空工程)を行う。その後、洗浄工程へ移行する。
(Sterilization process)
In this state, the inside of the processing tank 2 is heated to a predetermined temperature by a heating means (not shown), and then the air in the processing tank 2 is discharged from the exhaust line 12. Next, steam is supplied from the steam supply means 4 into the treatment tank 2 to obtain an appropriate humidity suitable for gas sterilization. In this state, the gas supply valve 9 is opened to supply EOG from the gas supply line 8 into the processing tank 2, and then sterilization is performed by holding for a predetermined time. After performing this sterilization process for a predetermined time, with the gas supply valve 9 and the return pressure valve 19 closed, the open / close valve 15 is opened and the vacuum pump 13 is operated to set a first set pressure lower than atmospheric pressure. A decompression step (final vacuum step) for reducing the pressure to P1 is performed. Thereafter, the process proceeds to a cleaning process.

(洗浄工程)
洗浄工程では、前記復圧弁19を開くとともに、前記開閉弁15を開いた状態で前記真空ポンプ13を作動させて、第一設定圧力P1よりも高く、大気圧よりも低い第二設定圧力P2となるように制御することにより、前記処理槽2内のEOGを前記排気ライン12を通して前記処理槽2外へ排出する。この洗浄工程は、前記復圧手段6の作動,すなわち前記復圧弁19の開放と前記減圧手段5の作動,すなわち前記開閉弁15および前記真空ポンプ13の作動とを交互に行うことにより、前記処理槽2内のEOGを排出するように構成することができる。
(Washing process)
In the cleaning step, the return pressure valve 19 is opened and the vacuum pump 13 is operated with the open / close valve 15 open, and a second set pressure P2 higher than the first set pressure P1 and lower than the atmospheric pressure is set. By controlling so as to become, the EOG in the processing tank 2 is discharged out of the processing tank 2 through the exhaust line 12. In this cleaning step, the operation of the pressure-reducing means 6, that is, the opening of the pressure-reducing valve 19 and the operation of the pressure-reducing means 5, that is, the operations of the on-off valve 15 and the vacuum pump 13 are performed alternately. It can comprise so that EOG in the tank 2 may be discharged | emitted.

(残留ガス除去工程)
残留ガス除去工程は、蒸気浸透工程とその後に行われる減圧排気行程とを含んで構成される。
(Residual gas removal process)
The residual gas removal step includes a vapor permeation step and a vacuum exhaust stroke performed thereafter.

(蒸気浸透工程)
蒸気浸透工程は、前記処理槽2内を陰圧にするための真空工程と、前記処理槽2内を加湿する加湿工程と、前記処理槽2を密閉状態として加湿状態をキープする加湿キープ工程とを含む。
(Vapor penetration process)
The vapor infiltration step includes a vacuum step for making the inside of the treatment tank 2 a negative pressure, a humidification step for humidifying the inside of the treatment tank 2, and a humidification keeping step for keeping the humidification state with the treatment tank 2 sealed. including.

先ず、前記復圧弁19,前記給蒸弁11,前記給ガス弁9を閉じて、前記減圧手段5を作動させて、前記処理槽2内を第一設定圧力P1まで減圧する真空工程を行う。   First, a vacuum process is performed in which the return pressure valve 19, the steam supply valve 11, and the gas supply valve 9 are closed and the pressure reducing means 5 is operated to reduce the pressure in the processing tank 2 to the first set pressure P1.

ついで、前記減圧手段5の作動を停止し前記給蒸手段4を作動させて、前記処理槽2内へ所定量の蒸気を供給する加湿工程を行う。   Then, the operation of the decompression unit 5 is stopped, the steam supply unit 4 is operated, and a humidification step of supplying a predetermined amount of steam into the processing tank 2 is performed.

その後、前記給蒸弁11を閉じて、前記処理槽2内圧力を第一設定圧力よりも若干高い第三設定圧力P3でこの状態を保持(キープ)する加湿キープ工程を所定時間(たとえば10分程度)行う。この実施例では、第三設定圧力P3に保持するための制御を行っていないが、保持するための制御を行うようにすることができる。   Then, the humidification keeping step of closing the steam supply valve 11 and maintaining (maintaining) this state at the third set pressure P3 slightly higher than the first set pressure is performed for a predetermined time (for example, 10 minutes). Degree) to do. In this embodiment, control for holding at the third set pressure P3 is not performed, but control for holding can be performed.

この蒸気浸透工程においては、前記処理槽2内が密閉状態で陰圧に保持された状態で、必要とする蒸気の被滅菌物内への浸透が行われるように構成される。その結果、供給された蒸気が被滅菌物の内部まで浸透する。浸透した蒸気は、凝縮水の状態で存在し、内部に残留しているEOGを溶かして吸収する。   This steam permeation step is configured to permeate the necessary steam into the sterilized object while the inside of the treatment tank 2 is kept in a sealed state and at a negative pressure. As a result, the supplied steam penetrates to the inside of the article to be sterilized. The permeated vapor exists in the form of condensed water and dissolves and absorbs EOG remaining inside.

(減圧排気行程)
前記蒸気浸透工程後にEOGを吸収した水または蒸気を前記処理槽2外へ排出する減圧排気行程が行われる。この減圧排気行程は、前記給ガス弁9,前記給蒸弁11および前記復圧弁19を閉じ、前記減圧手段5を作動させて、前記処理槽2内圧力を第一設定圧力P1より低い第四設定圧力P4まで減圧する。この減圧によりEOGを吸収した水または蒸気は、前記排気ライン12を通して効果的に前記処理槽2外へ排出される。その結果、被滅菌物に残留したEOGが除去されることになる。除去されたEOGは、EOG処理装置16にて無害化される。
(Decompression exhaust stroke)
After the vapor permeation step, a vacuum exhaust stroke is performed in which water or vapor that has absorbed EOG is discharged out of the treatment tank 2. In this depressurization exhaust stroke, the supply gas valve 9, the steam supply valve 11 and the return pressure valve 19 are closed and the depressurization means 5 is operated, so that the pressure in the processing tank 2 is lower than the first set pressure P1. The pressure is reduced to the set pressure P4. The water or steam that has absorbed EOG by this pressure reduction is effectively discharged out of the treatment tank 2 through the exhaust line 12. As a result, EOG remaining on the sterilized material is removed. The removed EOG is rendered harmless by the EOG processing device 16.

前記残留ガス除去工程は、図1に示すように、第一残留ガス除去工程→第二残留ガス除
去工程→…のように所定回数繰り返して行われる。第二残留ガス除去工程では、第一残留ガス除去工程と同様に加湿工程,加湿キープ工程および減圧排気行程が順次行われる。この第二残留ガス除去工程において、第一残留ガス除去工程と異なるのは、つぎの2点である。まず、第二残留ガス除去工程では、第一残留ガス除去工程の最初の減圧工程が省略されている。これは、第一残留ガス除去工程の最後の減圧排気行程により前記処理槽2内が第四設定圧まで減圧されているからである。つぎに、第二残留ガス除去工程では、第一残留ガス除去工程よりも低い設定圧力にて加湿キープ工程,減圧排気行程が行われる。この第二残留ガス除去工程により第一残留ガス除去工程で除去しきれなかった被滅菌物に残留するガスが除去される。
As shown in FIG. 1, the residual gas removal step is repeatedly performed a predetermined number of times such as a first residual gas removal step → second residual gas removal step →. In the second residual gas removal step, the humidification step, the humidification keeping step, and the reduced pressure exhaust process are sequentially performed as in the first residual gas removal step. The second residual gas removal step differs from the first residual gas removal step in the following two points. First, in the second residual gas removal step, the first decompression step of the first residual gas removal step is omitted. This is because the inside of the processing tank 2 is depressurized to the fourth set pressure by the final depressurization exhaust stroke in the first residual gas removal step. Next, in the second residual gas removal step, the humidification keeping step and the reduced pressure exhaust process are performed at a lower set pressure than in the first residual gas removal step. By this second residual gas removal step, the gas remaining in the sterilized material that could not be removed in the first residual gas removal step is removed.

前記残留ガス除去工程が終了すると、前記洗浄工程と同様の洗浄工程を所定時間継続して行う。その後、前記復圧弁19を開いて、前記処理槽2内を大気圧に戻して、全処理行程を終了し、前記処理槽2から滅菌され残留EOGが除去された被滅菌物を取り出す。   When the residual gas removal step is completed, a cleaning step similar to the cleaning step is continuously performed for a predetermined time. Thereafter, the return pressure valve 19 is opened, the inside of the processing tank 2 is returned to atmospheric pressure, the entire processing process is terminated, and the sterilized material from which the residual EOG is removed from the processing tank 2 is taken out.

この発明は、前記実施例1に限定されるものではなく、図3に示す実施例2の残留ガス除去方法とすることができる。この実施例2において、前記実施例1と同じ構成はその説明を省略し、異なる構成についてのみ以下に説明する。この実施例2では、加湿キープ工程と減圧排気行程との間に復圧工程を設けた点である。この復圧工程は、前記復圧弁19を開いて、前記処理槽2内を第二設定圧力P2よりも低く、第三設定圧力よりも高い第五設定圧力P5まで復圧して、前記処理槽2内へ無菌空気を導入する。この実施例では、第五設定圧力の値を変更可能に構成している。   The present invention is not limited to the first embodiment, and can be a residual gas removal method of the second embodiment shown in FIG. In the second embodiment, the description of the same configuration as that of the first embodiment is omitted, and only a different configuration will be described below. The second embodiment is that a return pressure process is provided between the humidification keeping process and the reduced pressure exhaust process. In this return pressure step, the return pressure valve 19 is opened, the inside of the processing tank 2 is returned to the fifth set pressure P5 lower than the second set pressure P2 and higher than the third set pressure, and the process tank 2 is recovered. Introduce sterile air into it. In this embodiment, the fifth set pressure value can be changed.

この発明の実施例1を説明する時間−圧力特性図である。It is a time-pressure characteristic view explaining Example 1 of this invention. 同実施例1を実施したガス滅菌装置の概略構成を説明する図である。It is a figure explaining the schematic structure of the gas sterilizer which implemented the same Example 1. FIG. この発明の実施例2を説明する時間−圧力特性図である。It is a time-pressure characteristic view explaining Example 2 of this invention.

符号の説明Explanation of symbols

1 ガス滅菌装置
2 処理槽
3 給ガス手段
4 給蒸手段
5 減圧手段
6 復圧手段
7 制御器
DESCRIPTION OF SYMBOLS 1 Gas sterilizer 2 Processing tank 3 Gas supply means 4 Steaming means 5 Depressurization means 6 Restore pressure means 7 Controller

Claims (2)

ガス滅菌処理を施した被滅菌物に残留するガスを除去するガス滅菌における残留ガス除去方法であって、
ガス滅菌処理された被滅菌物を密閉空間におき、大気圧未満の陰圧下において前記密閉空間内へ給蒸して所定時間保持することにより蒸気を被滅菌物内へ浸透させる蒸気浸透工程と、
この蒸気浸透工程後に行われ前記密閉空間内を減圧排気する減圧排気行程とを含むことを特徴とするガス滅菌における残留ガス除去方法。
A residual gas removal method in gas sterilization for removing gas remaining in an object to be sterilized subjected to gas sterilization,
A vapor infiltration step in which an object to be sterilized after gas sterilization is placed in a sealed space, steamed into the sealed space under a negative pressure of less than atmospheric pressure and held for a predetermined time,
A method for removing residual gas in gas sterilization, comprising: a reduced pressure exhaust process that is performed after the vapor permeation step and performs reduced pressure exhaust of the sealed space.
前記蒸気浸透工程と減圧排気行程とを複数回繰り返して行うことを特徴とするガス滅菌における残留ガス除去方法。   The method for removing residual gas in gas sterilization, wherein the vapor permeation step and the vacuum exhaust stroke are repeated a plurality of times.
JP2006004420A 2006-01-12 2006-01-12 Residual gas removal method in gas sterilization Pending JP2007185275A (en)

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS573650A (en) * 1980-06-11 1982-01-09 Asahi Medical Co Method and apparatus for removing risidual pasturizing gas from pasturized article
JPH03141952A (en) * 1989-10-30 1991-06-17 Chiyoko Imashiro Residual gas removal promoting device in ethylene oxide gas sterilization
JP2001526940A (en) * 1997-12-24 2001-12-25 アライドシグナル・インコーポレイテッド Method and apparatus for aerating chemically sterilized articles

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS573650A (en) * 1980-06-11 1982-01-09 Asahi Medical Co Method and apparatus for removing risidual pasturizing gas from pasturized article
JPH03141952A (en) * 1989-10-30 1991-06-17 Chiyoko Imashiro Residual gas removal promoting device in ethylene oxide gas sterilization
JP2001526940A (en) * 1997-12-24 2001-12-25 アライドシグナル・インコーポレイテッド Method and apparatus for aerating chemically sterilized articles

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