JP2007179561A - Input device - Google Patents

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JP2007179561A
JP2007179561A JP2007034320A JP2007034320A JP2007179561A JP 2007179561 A JP2007179561 A JP 2007179561A JP 2007034320 A JP2007034320 A JP 2007034320A JP 2007034320 A JP2007034320 A JP 2007034320A JP 2007179561 A JP2007179561 A JP 2007179561A
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electrode layer
electrode
input device
electrodes
control circuit
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JP4153009B2 (en
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Hiroshi Shigetaka
寛 重高
Ryuichi Hagitani
隆一 萩谷
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Alps Alpine Co Ltd
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Alps Electric Co Ltd
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<P>PROBLEM TO BE SOLVED: To provide an input device whose thickness dimension can be made much thinner and whose costs can be reduced, and its manufacturing method. <P>SOLUTION: An X electrode layer 20X and a Y electrode layer 20Y are formed like a matrix through an insulating film 12 at one face side of a film substrate 10, and the end part of the X electrode layer 20X is guided to the end part of the film substrate 10. The Y electrode layer 20Y is guided through a through-hole formed in the insulating film 12 to the end part of the same face side of the X electrode layer 20X. The electrodes of the electrode layers 20X and 20Y guided to the end parts are connected to a conductive part 5 formed in a control circuit board 4. In this case, the electrodes and the conductive part 5 are heated and pressurized so as to be bonded to each other by insulating adhesive which does not include any conductive particle. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、例えばパーソナルコンピュータのポインティングデバイスとして使用される静電容量方式の入力装置に関する。   The present invention relates to a capacitance type input device used as a pointing device of a personal computer, for example.

図11は従来の入力装置を簡略化して示した断面図である。この入力装置100は、ノートブック型のパーソナルコンピュータに搭載されるポインティングデバイスの一種であるパッド型のものである。   FIG. 11 is a cross-sectional view schematically showing a conventional input device. The input device 100 is a pad type which is a kind of pointing device mounted on a notebook type personal computer.

図11に示す入力装置100は、合成樹脂製のフィルム基板101(検出基板)の上面に複数本のX電極102からなるX電極層103が積層され、前記フィルム基板101の下面に複数本のY電極104からなるY電極層105が積層され、前記X電極102と前記Y電極104がマトリックス状に配置されている。また前記X電極層103と前記Y電極層105の表面がそれぞれ絶縁膜106,107で覆われている。そして、操作面側となるX電極層103側に表面シート108が設けられている。前記電極層103,105、絶縁膜106,107および表面シート108の外形寸法がいずれも同一な四角形状となっている。   In the input device 100 shown in FIG. 11, an X electrode layer 103 composed of a plurality of X electrodes 102 is laminated on the upper surface of a synthetic resin film substrate 101 (detection substrate), and a plurality of Y electrodes are arranged on the lower surface of the film substrate 101. A Y electrode layer 105 composed of electrodes 104 is laminated, and the X electrode 102 and the Y electrode 104 are arranged in a matrix. The surfaces of the X electrode layer 103 and the Y electrode layer 105 are covered with insulating films 106 and 107, respectively. And the surface sheet 108 is provided in the X electrode layer 103 side used as the operation surface side. The electrode layers 103 and 105, the insulating films 106 and 107, and the surface sheet 108 have the same rectangular shape.

前記入力装置100では、さらに前記表面シート108とは反対側の最下層に制御回路基板110が設けられるが、この制御回路基板110も前記フィルム基板101と同様の外形寸法で形成されている。また前記制御回路基板110には、前記フィルム基板101とは逆側の面に制御回路111が設けられている。   In the input device 100, a control circuit board 110 is further provided in the lowermost layer opposite to the top sheet 108, and the control circuit board 110 is also formed with the same external dimensions as the film substrate 101. The control circuit board 110 is provided with a control circuit 111 on the surface opposite to the film board 101.

また前記入力装置100では、フィルム基板101、絶縁膜107および制御回路基板110にそれぞれスルーホール(図示せず)を形成し、前記X電極層103と前記Y電極層105を電気的に導通させて、X電極層103とY電極層105で検出された静電容量に基づく信号を制御回路111に送るようになっている。
特表平09−511086号公報 特開平11−135925号公報 特開平10−242210号公報 特開平04−323714号公報 特開2000−151114号公報
In the input device 100, through holes (not shown) are formed in the film substrate 101, the insulating film 107, and the control circuit substrate 110, respectively, and the X electrode layer 103 and the Y electrode layer 105 are electrically connected. A signal based on the capacitance detected by the X electrode layer 103 and the Y electrode layer 105 is sent to the control circuit 111.
Japanese Translation of National Publication No. 09-51086 Japanese Patent Laid-Open No. 11-135925 JP-A-10-242210 Japanese Patent Laid-Open No. 04-323714 JP 2000-151114 A

しかしながら、上記従来の入力装置100では制御回路基板110の上にフィルム基板101を含む電極層103,105のすべてが設けられている構成であるため、入力装置全体の厚み寸法が大きくなり、ノートブック型のパーソナルコンピュータ(PC)に搭載したときに、PCの厚み寸法をさらに薄型化することができない。また制御回路基板110がフィルム基板101と同じ大きさ(面積)となるため、コスト高となる。   However, since the conventional input device 100 has a configuration in which all of the electrode layers 103 and 105 including the film substrate 101 are provided on the control circuit substrate 110, the thickness of the entire input device is increased, and the notebook is increased. When mounted on a personal computer (PC), the thickness dimension of the PC cannot be further reduced. Further, since the control circuit board 110 has the same size (area) as the film board 101, the cost increases.

本発明は、上記従来の課題を解決するものであり、さらに薄型化が可能でしかもコストダウンを図ることができる入力装置を提供することを目的とする。   The present invention solves the above-described conventional problems, and an object of the present invention is to provide an input device that can be further reduced in thickness and can reduce costs.

本発明は、静電容量を検出するX電極層とY電極層とが検出基板上に設けられている入力装置において、
前記検出基板の一方の面に、前記X電極層と前記Y電極層とが絶縁膜を介して積層されていることを特徴とするものである。
The present invention provides an input device in which an X electrode layer and a Y electrode layer for detecting capacitance are provided on a detection substrate.
The X electrode layer and the Y electrode layer are laminated on one surface of the detection substrate via an insulating film.

この場合、前記絶縁膜にスルーホールが形成され、一方の電極層の端部が前記スルーホールを介して他方の電極層の端部と同じ面上に導かれており、前記両電極層の端部と、制御回路基板の導電部とが対面して接続されている構成にできる。   In this case, a through hole is formed in the insulating film, and an end portion of one electrode layer is led to the same surface as an end portion of the other electrode layer through the through hole. The part and the conductive part of the control circuit board may be connected to face each other.

上記本発明では、検出基板の真下に制御回路基板を設ける必要がないので、装置を薄型化ができ、しかも制御回路基板に小さくできるので、コストダウンが図れる。   In the present invention, since it is not necessary to provide a control circuit board directly under the detection board, the apparatus can be thinned and the control circuit board can be made small, so that the cost can be reduced.

また、前記スルーホールは、前記X電極層または前記Y電極層の一部に対して形成されていることが好ましい。これにより、一方の電極層を他方の電極層の同じ面に導く際に、検出基板の側方への突出形状を小さく抑えることができる。   Further, it is preferable that the through hole is formed in a part of the X electrode layer or the Y electrode layer. Thereby, when one electrode layer is led to the same surface of the other electrode layer, the protruding shape of the detection substrate to the side can be kept small.

また、隣接する前記X電極層の間、および隣接する前記Y電極層の間にダミー電極が前記電極層と平行に設けられている構成にしてもよい。   In addition, a dummy electrode may be provided in parallel with the electrode layer between the adjacent X electrode layers and between the adjacent Y electrode layers.

また、前記検出基板は、フィルム基板である構成にすると、装置の厚み寸法を薄くできる。   Further, if the detection substrate is a film substrate, the thickness dimension of the apparatus can be reduced.

また、前記制御回路基板の導電部と、前記検出基板の電極層の端部とが接触した状態で、前記検出基板と前記制御回路基板とが、熱硬化性の接着剤を介して加熱圧着されて接続されることが好ましい。   In addition, the detection substrate and the control circuit board are thermocompression bonded via a thermosetting adhesive in a state where the conductive portion of the control circuit board and the end portion of the electrode layer of the detection board are in contact with each other. Are preferably connected.

この場合、前記制御回路基板の導電部には、前記制御回路基板の一面側から他面側に貫通して電気的に接続される貫通穴が形成され、この貫通穴の部分に前記接着剤が位置している構成にしてもよい。このように接着する構成にすることで、接合強度を向上できる。   In this case, the conductive portion of the control circuit board is formed with a through hole that penetrates and is electrically connected from one side of the control circuit board to the other side, and the adhesive is placed in the through hole portion. You may make it the structure which is located. By adopting such a configuration of bonding, the bonding strength can be improved.

本発明では、装置の厚み寸法を従来よりも薄くできるので、ノートブック型のコンピュータに搭載したときにさらに薄型化が可能になる。しかも制御回路基板を従来の制御回路基板よりも小さく形成することができ、さらに4層等の多層基板を用いる必要がないので、コストダウンを図ることができる。   In the present invention, since the thickness dimension of the apparatus can be made thinner than before, it can be made thinner when mounted on a notebook computer. In addition, the control circuit board can be formed smaller than the conventional control circuit board, and it is not necessary to use a multi-layer board such as four layers, so that the cost can be reduced.

図1は本発明の入力装置を示す分解斜視図、図2はX電極層の電極を示す回路配線図、図3は絶縁膜に形成されたスルーホールを示す平面図、図4はY電極層を示す回路配線図、図5はX方向に切断したときの一部分を示す断面図、図6はY方向に切断したときの一部分を示す断面図、図7はX電極層とY電極層との接続部分で切断したときの一部分を示す断面図である。   1 is an exploded perspective view showing an input device according to the present invention, FIG. 2 is a circuit wiring diagram showing electrodes of an X electrode layer, FIG. 3 is a plan view showing through holes formed in an insulating film, and FIG. 4 is a Y electrode layer. 5 is a cross-sectional view showing a part when cut in the X direction, FIG. 6 is a cross-sectional view showing a part when cut in the Y direction, and FIG. 7 is a cross-sectional view of the X electrode layer and the Y electrode layer. It is sectional drawing which shows a part when cut | disconnecting in a connection part.

図1に示す入力装置1には、本発明の検出基板としてのフィルム基板10が設けられている。フィルム基板10は、PET(ポリエチレンテレフタレート)などの絶縁性を有する合成樹脂製シートで形成されている。このフィルム基板10には、図1に示すように、その長手方向の一辺が側方に突出した延長部11が形成されている。   The input device 1 shown in FIG. 1 is provided with a film substrate 10 as a detection substrate of the present invention. The film substrate 10 is formed of an insulating synthetic resin sheet such as PET (polyethylene terephthalate). As shown in FIG. 1, the film substrate 10 is formed with an extension 11 in which one side in the longitudinal direction protrudes laterally.

前記フィルム基板10の下面には、X電極層20Xが設けられている。X電極層20Xには、図2に示すように、X方向に複数本(16本)のX電極x1,x2,…,x15,x16が所定の間隔を置いて互いに平行に形成されたX方向駆動電極20Xdが形成されている。これらX電極x1,x2,…,x15,x16の一端が前記延長部11まで延びて形成されている。   An X electrode layer 20 </ b> X is provided on the lower surface of the film substrate 10. In the X electrode layer 20X, as shown in FIG. 2, a plurality of (16) X electrodes x1, x2,..., X15, x16 are formed in parallel to each other at a predetermined interval in the X direction. A drive electrode 20Xd is formed. One end of each of these X electrodes x1, x2,..., X15, x16 extends to the extension portion 11.

前記フィルム基板10に形成されるX電極層20Xでは、前記X電極x1,x2,…,x15,x16の各電極間にダミー電極xd(合計で15本)が交互に形成されている。ダミー電極xdを設けることで、例えば入力装置1の表面に水滴が付着したときの影響を分散させることができる。   In the X electrode layer 20X formed on the film substrate 10, dummy electrodes xd (15 in total) are alternately formed between the X electrodes x1, x2,..., X15, x16. By providing the dummy electrode xd, it is possible to disperse the influence when water droplets adhere to the surface of the input device 1, for example.

また前記フィルム基板10には、前記X方向駆動電極20Xdと同一面に、前記フィルム基板10の周縁部に沿って前記延長部11まで延びるグランド電極21が形成されている。また前記フィルム基板10の前記X方向駆動電極20Xdと前記グランド電極21との間に形成されたスペースには、複数本の電極で構成されるX切り替え電極22,23,24が形成されている。これらX方向駆動電極20Xd、グランド電極21およびX切り替え電極22,23,24は、いずれも銀ペーストまたは銀系ペーストを用いてスクリーン印刷法によって形成されている。   In addition, a ground electrode 21 is formed on the film substrate 10 on the same surface as the X-direction drive electrode 20Xd, extending to the extension 11 along the peripheral edge of the film substrate 10. In the space formed between the X-direction drive electrode 20Xd and the ground electrode 21 of the film substrate 10, X switching electrodes 22, 23, 24 composed of a plurality of electrodes are formed. These X direction drive electrode 20Xd, ground electrode 21, and X switching electrodes 22, 23, 24 are all formed by screen printing using silver paste or silver paste.

前記各電極20X,21,22,23,24の表面は、絶縁性樹脂(レジスト)を塗布または印刷して形成された絶縁膜12が設けられている。このレジストとしては、例えばポリアミド系、エポキシ樹脂系、ポリウレタン系やポリエステル系のものなどから選択できる。このとき、前記絶縁膜12には、図3に示すように複数個のスルーホールh1,h2,…,h12,k2,k4,…,k10,m2,m4,…,m10,s2が形成されている。これらのスルーホールは、前記X切り替え電極22,23,24の一方の端部と一致する位置に形成されている。なお、図3に対応するスルーホールが形成されていない図2に示す電極は検査用電極である。   An insulating film 12 formed by applying or printing an insulating resin (resist) is provided on the surface of each electrode 20X, 21, 22, 23, 24. This resist can be selected from, for example, polyamide, epoxy resin, polyurethane and polyester. At this time, a plurality of through holes h1, h2,..., H12, k2, k4,..., K10, m2, m4,. Yes. These through holes are formed at positions that coincide with one end of the X switching electrodes 22, 23, 24. In addition, the electrode shown in FIG. 2 in which the through hole corresponding to FIG. 3 is not formed is an inspection electrode.

図4に示すように、前記絶縁膜12の表面(下面)にはY電極層20Yが設けられている。Y電極層20Yでは、前記X方向駆動電極20Xdと直交する方向に複数(12本)のY電極y1,y2,…,y11,y12からなるY方向駆動電極20Ydが形成されている。また前記Y電極y1,y2,…,y11,y12のうちの一部の電極y1,y3,y5,y7,y9,y11の一端が、左右(X方向)両側から図3に示す所定のスルーホールの位置まで延びて形成されている。   As shown in FIG. 4, a Y electrode layer 20 </ b> Y is provided on the surface (lower surface) of the insulating film 12. In the Y electrode layer 20Y, a Y direction drive electrode 20Yd composed of a plurality (12) of Y electrodes y1, y2,..., Y11, y12 is formed in a direction orthogonal to the X direction drive electrode 20Xd. Further, one end of the electrodes y1, y3, y5, y7, y9, y11 of the Y electrodes y1, y2,..., Y11, y12 has predetermined through holes shown in FIG. It extends to the position of.

前記絶縁膜12の表面(下面)には、前記Y方向駆動電極20Ydと同一層に検出電極Sが設けられている。検出電極Sは、くし歯状電極sa,sbで構成され、くし歯状電極sa,sbの各電極ysが前記Y電極y1,y2,…,y11,y12と交互に形成されている。また前記くし歯状電極saとsbでは、くし歯の先端が互いに左右逆向きに形成されて、Y方向の中央に前記くし歯状電極saとsbが1本の電極にまとめられて、図3に示す所定のスルーホールの位置まで延びている。   On the surface (lower surface) of the insulating film 12, a detection electrode S is provided in the same layer as the Y-direction drive electrode 20Yd. The detection electrode S is composed of comb-like electrodes sa and sb, and the electrodes ys of the comb-like electrodes sa and sb are alternately formed with the Y electrodes y1, y2,. Further, in the comb-shaped electrodes sa and sb, the tips of the comb teeth are formed in opposite directions, and the comb-shaped electrodes sa and sb are combined into one electrode at the center in the Y direction. It extends to the position of a predetermined through hole shown in FIG.

なお、図3ではX電極層20Xを白抜きの太い線で示し、図4ではY電極層20Yを細い実線で示しているが、双方の電極ともほぼ同一幅の電極で形成されている。   In FIG. 3, the X electrode layer 20 </ b> X is indicated by a thick white line, and in FIG. 4, the Y electrode layer 20 </ b> Y is indicated by a thin solid line, but both electrodes are formed by electrodes having substantially the same width.

そして、図1に示すように、前記Y方向駆動電極20Ydを含む表面全体に前記絶縁膜12と同様な絶縁性樹脂からなる絶縁膜13が印刷によって形成されている。前記フィルム基板10の上面には、操作者が操作する際に指やペンが触れる部分となる表面シート14が粘着剤等で固定される。   As shown in FIG. 1, an insulating film 13 made of an insulating resin similar to the insulating film 12 is formed on the entire surface including the Y-direction drive electrode 20Yd by printing. On the upper surface of the film substrate 10, a surface sheet 14 is fixed with an adhesive or the like, which is a portion that a finger or pen touches when operated by an operator.

このようにフィルム基板10の片面にX電極層20XとY電極層20Yを形成すると、前記Y電極層20Yの各電極を前記X電極層20Xが形成される面に導く必要がある。そこで、本実施の形態での電極の形成手段について図2ないし図4を参照して以下で説明する。   Thus, when the X electrode layer 20X and the Y electrode layer 20Y are formed on one surface of the film substrate 10, it is necessary to guide each electrode of the Y electrode layer 20Y to the surface on which the X electrode layer 20X is formed. Therefore, the electrode forming means in this embodiment will be described below with reference to FIGS.

前記Y電極層20Yでは、Y電極y1,y3,y5,y7,y9,y11の一端が延長して形成され、各電極の端部が接点b1,b3,b5,b7,b9,b11まで延びている。前記Y電極y1,y3,y5,y7,y9,y11は、前記絶縁膜12に形成されたスルーホールh1,h3,h5,h7,h9,h11を介して前記X切り替え電極24の接点a1,a3,a5,a7,a9,a11と接続されている。   In the Y electrode layer 20Y, one end of each of the Y electrodes y1, y3, y5, y7, y9, y11 is formed to extend, and the end of each electrode extends to the contacts b1, b3, b5, b7, b9, b11. Yes. The Y electrodes y1, y3, y5, y7, y9, y11 are connected to the contacts a1, a3 of the X switching electrode 24 through through holes h1, h3, h5, h7, h9, h11 formed in the insulating film 12, respectively. , A5, a7, a9, a11.

また前記Y電極y2,y4,y6,y8,y10,y12の端部b2,b4,b6,b8,b10,b12が、前記絶縁膜12に形成されたスルーホールh2,h4,h6,h8,h10,h12を介して前記X切り替え電極22,23の端部の接点a2,a4,a6,a8,a10,a12と接続されている。ここで、接点a12のみがそのまま延長部11の端部まで延びて形成されている。さらに前記X切り替え電極22,23の接点a2,a4,a6,a8,a10とは逆側に形成された接点c2,c4,c6,c8,c10が前記絶縁膜12に形成されたスルーホールk2,k4,k6,k8,k10を通じて前記Y切り替え電極26の接点d2,d4,d6,d8,d10に接続されている。そして、前記接点d2,d4,d6,d8,d10とは逆の端部に形成された接点e2,e4,e6,e8,e10が前記絶縁膜12のスルーホールm2,m4,m6,m8,m10を介してX切り替え電極24に形成された接点f2,f4,f6,f8,f10と接続されている。このようにして前記Y電極y2,y4,y6,y8,y10,y12は、Y電極層20YからX電極層20Xと同じ面上に導かれる。   The end portions b2, b4, b6, b8, b10, b12 of the Y electrodes y2, y4, y6, y8, y10, y12 are through holes h2, h4, h6, h8, h10 formed in the insulating film 12. , H12 are connected to contacts a2, a4, a6, a8, a10, a12 at the ends of the X switching electrodes 22, 23, respectively. Here, only the contact a <b> 12 is formed so as to extend to the end of the extension portion 11 as it is. Further, contacts c2, c4, c6, c8, c10 formed on the opposite side of the contacts a2, a4, a6, a8, a10 of the X switching electrodes 22, 23 are through holes k2, formed in the insulating film 12. It is connected to the contacts d2, d4, d6, d8, d10 of the Y switching electrode 26 through k4, k6, k8, k10. The contacts e2, e4, e6, e8, e10 formed at the end opposite to the contacts d2, d4, d6, d8, d10 are through holes m2, m4, m6, m8, m10 of the insulating film 12. Are connected to contacts f2, f4, f6, f8, f10 formed on the X switching electrode 24. In this way, the Y electrodes y2, y4, y6, y8, y10, y12 are guided from the Y electrode layer 20Y to the same surface as the X electrode layer 20X.

またY電極層20Yに形成された前記検出電極Sから延びて形成された接点s1が前記絶縁膜12のスルーホールs2を介して前記X切り替え電極24の接点s3に接続されている。   Further, a contact s1 formed extending from the detection electrode S formed on the Y electrode layer 20Y is connected to a contact s3 of the X switching electrode 24 through a through hole s2 of the insulating film 12.

上記のように回路が形成されることで、X電極層20XとY電極層20Yの全ての電極をフィルム基板10の延長部11の端部Dsに集めることができる。   By forming the circuit as described above, all the electrodes of the X electrode layer 20 </ b> X and the Y electrode layer 20 </ b> Y can be collected at the end portion Ds of the extension portion 11 of the film substrate 10.

図5に示すように、前記入力装置1では、フィルム基板10が前記表面シート14のX方向の左右両側から若干突出した状態で重ねられ、さらに図6に示すように、表面シート14の長手方向の一方の縁部がフィルム基板10の縁部と一致するように重ねられる。よって、入力装置1を表面シート14の上側から見たときに、フィルム基板10が表面シート14の左右両側と前記延長部11において突出した状態で重ねられる。   As shown in FIG. 5, in the input device 1, the film substrate 10 is overlapped with the surface sheet 14 slightly protruding from both left and right sides in the X direction, and further, as shown in FIG. 6, the longitudinal direction of the surface sheet 14. Are overlapped so that one edge of the film coincides with the edge of the film substrate 10. Therefore, when the input device 1 is viewed from the upper side of the top sheet 14, the film substrate 10 is overlapped with the left and right sides of the top sheet 14 protruding in the extension portion 11.

前記X電極層20XとY電極層20Yとがスルーホールを介して接続される部分では、図7に示すように、前記Y電極y2,y4,…が印刷形成される際に、絶縁膜12に形成されたスルーホールh2,h4,…内に銀または銀系ペーストが充填されてX切り替え電極22の接点a2,a4,…と電気的な接続状態が形成される。一方、Y電極y1,y3,…では、前記絶縁膜12の表面を通って別の位置でスルーホールを介してX電極層20X側のX切り替え電極24と接続される。   In the portion where the X electrode layer 20X and the Y electrode layer 20Y are connected via a through hole, as shown in FIG. 7, when the Y electrodes y2, y4,. The formed through holes h2, h4,... Are filled with silver or a silver-based paste to form an electrical connection state with the contacts a2, a4,. On the other hand, the Y electrodes y1, y3,... Are connected to the X switching electrode 24 on the X electrode layer 20X side through a through hole at another position through the surface of the insulating film 12.

前記のように、Y電極y1,y2,…,y11,y12の回路パターンを絶縁膜12の上面と下面に分けて引き回すことで、電極間のピッチを狭く形成することができる。よって、絶縁膜12の上面側の電極と下面側の電極とが重なったとしても互いに導通することがないので、フィルム基板10の表面シート14から突出する寸法を小さくできる。その結果、入力装置1の外形寸法を小さくできる。   As described above, the circuit pattern of the Y electrodes y1, y2,..., Y11, y12 is divided into the upper surface and the lower surface of the insulating film 12, whereby the pitch between the electrodes can be narrowed. Therefore, even if the electrode on the upper surface side and the electrode on the lower surface side of the insulating film 12 are overlapped with each other, they do not conduct each other. As a result, the external dimensions of the input device 1 can be reduced.

図2に示すように、本実施の形態の入力装置1では、前記X電極層20Xの全電極と前記Y電極層20Yの全電極の端部Dsがフィルム基板10に形成された延長部11の端まで導かれる。なお、前記フィルム基板10の表面(下面)側では、延長部11の突出寸法(L1+L2)よりも絶縁膜12,13の前記延長部11と重なる突出寸法(L2)が短く形成されているので、フィルム基板10に絶縁膜12,13を積層して形成したときに、前記フィルム基板10の表面に形成された電極層の端部Dsが表面に露出する(図1参照)。   As shown in FIG. 2, in the input device 1 according to the present embodiment, all the electrodes of the X electrode layer 20X and the ends Ds of all the electrodes of the Y electrode layer 20Y Guided to the end. In addition, since the protrusion dimension (L2) which overlaps with the extension part 11 of the insulating films 12 and 13 is formed shorter than the protrusion dimension (L1 + L2) of the extension part 11 on the surface (lower surface) side of the film substrate 10, When the insulating films 12 and 13 are laminated on the film substrate 10, the end Ds of the electrode layer formed on the surface of the film substrate 10 is exposed on the surface (see FIG. 1).

そして、前記X電極層20XとY電極層20Yの端部Dsが制御回路基板4に形成された導電部5と接続される。この制御回路基板4は、前記フィルム基板10よりも十分に小さい外形寸法で形成されている。このとき露出する寸法Lの部分が前記導電部5と接続される領域となっている。   The end portions Ds of the X electrode layer 20X and the Y electrode layer 20Y are connected to the conductive portion 5 formed on the control circuit board 4. The control circuit board 4 is formed with an outer dimension that is sufficiently smaller than the film board 10. A portion of the dimension L exposed at this time is a region connected to the conductive portion 5.

前記制御回路基板4は、紙フェノール、紙エポキシ、ガラスエポキシ製などの基板4aで形成され、前記基板4aの一面側に前記電極層の端部Dsと接続される導電部5が形成されている。前記導電部5は、複数個のランド5aがX方向に所定間隔を置いて形成されている。前記導電部5は、銅箔または銅などの金属表面に金メッキやカーボンを施したものなどで形成できるが、抵抗や接合強度の点を考慮すると金メッキを施したものを使用することが好ましい。   The control circuit board 4 is formed of a board 4a made of paper phenol, paper epoxy, glass epoxy, or the like, and a conductive part 5 connected to the end Ds of the electrode layer is formed on one side of the board 4a. . The conductive portion 5 has a plurality of lands 5a formed at predetermined intervals in the X direction. The conductive portion 5 can be formed of a copper foil or a metal surface such as copper plated with gold or carbon, but it is preferable to use a gold plated one in consideration of resistance and bonding strength.

また前記制御回路基板4の各ランド5aは、微小な間隔のギャップ5bによってランド部5a1と5a2に分割されている。また前記制御回路基板4の裏面側にも前記導電部5と同様なパターンのランド部7a1,7a2が形成されている(図10参照)。前記ランド部5a1,5a2には、前記ランド部7a1,7a2を貫通する貫通穴6a,6bが形成され、前記貫通穴6a,6b内に前記銅箔等の前記と同様な素材の導電材が被覆されて、前記ランド部5a1,5a2と前記ランド部7a1,7a2とが電気的に接続されている。また前記ランド部7a1は、前記制御回路基板4の周囲へ回路パターンが延びて形成されており、前記基板4a上に実装された制御回路8などに接続されている。なお、前記ランド部5a2,7a2は検査用の回路である。   Each land 5a of the control circuit board 4 is divided into land portions 5a1 and 5a2 by a gap 5b with a minute interval. Also, land portions 7a1 and 7a2 having the same pattern as the conductive portion 5 are formed on the back surface side of the control circuit board 4 (see FIG. 10). The land portions 5a1 and 5a2 are formed with through holes 6a and 6b penetrating the land portions 7a1 and 7a2, and the through holes 6a and 6b are covered with a conductive material of the same material as the copper foil or the like. Thus, the land portions 5a1 and 5a2 and the land portions 7a1 and 7a2 are electrically connected. The land portion 7a1 is formed by extending a circuit pattern around the control circuit board 4, and is connected to the control circuit 8 mounted on the board 4a. The land portions 5a2 and 7a2 are inspection circuits.

図8に示すように、本実施の形態の入力装置1では、前記両電極層20X,20Yの端部Dsと制御回路基板4とを接続する際に、前記導電部5に形成された各ギャップ5bに一文字状に熱硬化性の接着剤30(図8の斜線部分)が塗布される。前記接着剤30は導電性粒子を含まない絶縁性を有する流動性のあるものであり、例えばエポキシ樹脂などを使用できる。   As shown in FIG. 8, in the input device 1 according to the present embodiment, each gap formed in the conductive portion 5 when the end portions Ds of the electrode layers 20X and 20Y and the control circuit board 4 are connected. A thermosetting adhesive 30 (shaded portion in FIG. 8) is applied to 5b in a single character form. The adhesive 30 is fluid having insulating properties that do not contain conductive particles. For example, an epoxy resin can be used.

前記接着剤30を前記ギャップ5bを含む領域に一文字状に塗布した後に、前記端部Dsを導電部5に対して位置決めし、加熱及び加圧することにより接合する。図9は接合後の状態を示し、図10は図9の10−10線で切断したときの断面図を示している。前記接着剤30を加熱及び加圧することによって、前記接着剤30がギャップ5bから前記ランド部5a1と5a1との間の隙間5c、また前記ランド部5a2と5a2との間の隙間5dを通って周囲へと拡散する。このように接着剤30が流動することで、前記隙間5c,5dが形成されている上下において、フィルム基板10と制御回路基板4とが接合される。また加圧することで、端部Dsの各電極と導電部5の各ランド部5a1,5a2との接合面Tから前記接着剤30を除去できるので、端部Dsと導電部5とを電気的に接合できる。   After the adhesive 30 is applied to the region including the gap 5b in a single character, the end portion Ds is positioned with respect to the conductive portion 5 and bonded by heating and pressing. FIG. 9 shows a state after joining, and FIG. 10 shows a cross-sectional view taken along line 10-10 in FIG. By heating and pressing the adhesive 30, the adhesive 30 passes through the gap 5 c from the gap 5 b through the gap 5 c between the land portions 5 a 1 and 5 a 1 and the gap 5 d between the land portions 5 a 2 and 5 a 2. Spreads to. As the adhesive 30 flows in this manner, the film substrate 10 and the control circuit substrate 4 are bonded to each other at the upper and lower sides where the gaps 5c and 5d are formed. Further, by applying pressure, the adhesive 30 can be removed from the joint surface T between each electrode of the end portion Ds and each of the land portions 5a1 and 5a2 of the conductive portion 5, so that the end portion Ds and the conductive portion 5 are electrically connected. Can be joined.

また、ランド部5a1,5a2の表面に塗布された接着剤30が、ランド部5a1,5a2の表面から前記貫通穴6a,6b内に伝わって逃げ込み、前記接着剤30が前記貫通穴6a,6b内に位置した状態で硬化することで、制御回路基板4と端部Dsとの接合強度を向上できる。また前記制御回路基板4の導電部5の近傍にダミーの導電部を設け、前記フィルム基板10の前記ダミーの導電部と重なる位置にダミーの電極を設けることで、さらに前記接合強度を向上できる。   Further, the adhesive 30 applied to the surfaces of the land portions 5a1 and 5a2 is transferred from the surfaces of the land portions 5a1 and 5a2 into the through holes 6a and 6b and escapes, so that the adhesive 30 enters the through holes 6a and 6b. By curing in a state where the control circuit board 4 is positioned, the bonding strength between the control circuit board 4 and the end Ds can be improved. Further, by providing a dummy conductive part in the vicinity of the conductive part 5 of the control circuit board 4 and providing a dummy electrode at a position overlapping the dummy conductive part of the film substrate 10, the bonding strength can be further improved.

本実施の形態の入力装置1では、X方向駆動電極20XdとY方向駆動電極20Yd、そして検出電極Sによって検出されるようになっている。   In the input device 1 of the present embodiment, detection is performed by the X-direction drive electrode 20Xd, the Y-direction drive electrode 20Yd, and the detection electrode S.

すなわち、全てのX方向駆動電極20Xd(X電極x1…x16)とY方向駆動電極20Yd(Y電極y1…y12)の間に所定の電位の電界が与えられた状態で、表面シート14に指などの導電体が触れると、その触れた位置においてX方向駆動電極20XdとY方向駆動電極20Ydとの間の静電容量が変化する。   That is, a finger or the like is applied to the top sheet 14 with an electric field having a predetermined potential between all the X direction drive electrodes 20Xd (X electrodes x1... X16) and the Y direction drive electrodes 20Yd (Y electrodes y1... Y12). When the conductor is touched, the capacitance between the X-direction drive electrode 20Xd and the Y-direction drive electrode 20Yd changes at the touched position.

X座標データを得るときには、X方向駆動電極20Xdが2本を1束として選択され、X方向駆動電極20Xdと検出電極Sとの間での静電容量の変化に対応する検出出力を得る。またY座標データを得るときには、Y方向駆動電極20Ydが2本を1束として選択され、Y方向駆動電極20Ydと検出電極Soとの間での静電容量の変化に対応する検出出力を得る。そして、X方向検出電極20Xdの全ての電極からの検出出力と、Y方向検出電極20Ydの全ての電極からの検出出力が、時分割にて交互に行われる。   When obtaining the X coordinate data, two X direction drive electrodes 20Xd are selected as one bundle, and a detection output corresponding to a change in capacitance between the X direction drive electrode 20Xd and the detection electrode S is obtained. Further, when obtaining the Y coordinate data, two Y direction drive electrodes 20Yd are selected as one bundle, and a detection output corresponding to a change in electrostatic capacitance between the Y direction drive electrode 20Yd and the detection electrode So is obtained. Then, detection outputs from all electrodes of the X direction detection electrode 20Xd and detection outputs from all electrodes of the Y direction detection electrode 20Yd are alternately performed in a time division manner.

このようにして得られた検出出力を、アンプで増幅し、A/D変換部でデジタル信号に変換し、そして制御部で所定の演算を行ってPC本体に送ることで、PC本体側で前記演算結果に基づく制御が行われる。   The detection output obtained in this way is amplified by an amplifier, converted to a digital signal by an A / D converter, and subjected to a predetermined calculation by a control unit and sent to the PC main unit. Control based on the calculation result is performed.

本発明の入力装置を示す分解斜視図、An exploded perspective view showing the input device of the present invention, X電極層を示す回路配線図、Circuit wiring diagram showing the X electrode layer, 絶縁膜に形成されたスルーホールを示す平面図、A plan view showing a through hole formed in the insulating film, Y電極層を示す回路配線図、Circuit wiring diagram showing the Y electrode layer, X方向で切断したときの一部分を示す断面図、Sectional drawing which shows a part when cut | disconnecting by a X direction, Y方向で切断したときの一部分を示す断面図、Sectional drawing which shows a part when cut | disconnecting in a Y direction, X電極層とY電極層の接続部で切断したときの一部断面図、Partial cross-sectional view when cut at the connection portion of the X electrode layer and the Y electrode layer, 制御回路基板の導電部を示す平面図、A plan view showing a conductive portion of the control circuit board, 制御回路基板と電極層とが接合された状態を示す平面図、The top view which shows the state with which the control circuit board and the electrode layer were joined, 図9の10−10線での切断断面図、FIG. 10 is a cross-sectional view taken along line 10-10 in FIG. 従来の入力装置の簡略化した状態を示す断面図、Sectional drawing which shows the simplified state of the conventional input device,

符号の説明Explanation of symbols

Ds 電極層の端部
S 検出電極
sa,sb くし歯電極
x1…x16 X電極
y1…y12 Y電極
1 入力装置
4 制御回路基板
5 導電部
5a ランド
5a1,5a2,7a1,7a2 ランド部
5b ギャップ
5c,5d 隙間
6a,6b 貫通穴
8 制御回路
10 フィルム基板(検出基板)
11 延長部
12,13 絶縁膜
14 表面シート
20X X電極層
20Y Y電極層
20Xd X方向駆動電極
20Yd Y方向駆動電極
21 グランド電極
22,23,24 X切り替え電極
26 Y切り替え電極
30 熱硬化性の接着剤
Ds End of electrode layer S Detection electrode sa, sb Comb electrode x1 ... x16 X electrode y1 ... y12 Y electrode 1 Input device 4 Control circuit board 5 Conductive part 5a Land 5a1, 5a2, 7a1, 7a2 Land part 5b Gap 5c, 5d Clearance 6a, 6b Through hole 8 Control circuit 10 Film substrate (detection substrate)
11 Extension parts 12, 13 Insulating film 14 Top sheet 20X X electrode layer 20Y Y electrode layer 20Xd X direction drive electrode 20Yd Y direction drive electrode 21 Ground electrodes 22, 23, 24 X switching electrode 26 Y switching electrode 30 Thermosetting adhesion Agent

Claims (7)

静電容量を検出するX電極層とY電極層とが検出基板上に設けられている入力装置において、
前記検出基板の一方の面に、前記X電極層と前記Y電極層とが絶縁膜を介して積層されていることを特徴とする入力装置。
In an input device in which an X electrode layer and a Y electrode layer for detecting capacitance are provided on a detection substrate,
The input device, wherein the X electrode layer and the Y electrode layer are laminated on one surface of the detection substrate via an insulating film.
前記絶縁膜にスルーホールが形成され、一方の電極層の端部が前記スルーホールを介して他方の電極層の端部と同じ面上に導かれており、前記両電極層の端部と、制御回路基板の導電部とが対面して接続されている請求項1記載の入力装置。   Through holes are formed in the insulating film, and the end portions of one electrode layer are led to the same surface as the end portions of the other electrode layer through the through holes, the end portions of the two electrode layers, The input device according to claim 1, wherein the conductive portion of the control circuit board is connected to face to face. 前記スルーホールは、前記X電極層または前記Y電極層の一部に対して形成されている請求項2記載の入力装置。   The input device according to claim 2, wherein the through hole is formed in a part of the X electrode layer or the Y electrode layer. 隣接する前記X電極層の間、および隣接する前記Y電極層の間にダミー電極が前記電極層と平行に設けられている請求項1ないし3のいずれかに記載の入力装置。   The input device according to claim 1, wherein dummy electrodes are provided in parallel with the electrode layers between the adjacent X electrode layers and between the adjacent Y electrode layers. 前記検出基板は、フィルム基板である請求項1ないし4のいずれかに記載の入力装置。   The input device according to claim 1, wherein the detection substrate is a film substrate. 前記制御回路基板の導電部と、前記検出基板の電極層の端部とが接触した状態で、前記検出基板と前記制御回路基板とが、熱硬化性の接着剤を介して加熱圧着されて接続される請求項2または3記載の入力装置。   With the conductive portion of the control circuit board and the end of the electrode layer of the detection board in contact, the detection board and the control circuit board are connected by thermocompression bonding via a thermosetting adhesive. The input device according to claim 2 or 3. 前記制御回路基板の導電部には、前記制御回路基板の一面側から他面側に貫通して電気的に接続される貫通穴が形成され、この貫通穴の部分に前記接着剤が位置している請求項6記載の入力装置。   The conductive portion of the control circuit board is formed with a through hole that penetrates and is electrically connected from one side of the control circuit board to the other side, and the adhesive is located in the through hole portion. The input device according to claim 6.
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JP2013251343A (en) * 2012-05-30 2013-12-12 Alps Electric Co Ltd Mounting structure of electronic component, input device, and manufacturing method of mounting structure
JP5442012B2 (en) * 2009-06-30 2014-03-12 京セラ株式会社 Coordinate input device and display device with coordinate input function
US8717332B2 (en) 2008-07-31 2014-05-06 Gunze Limited Planar element, and touch switch

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* Cited by examiner, † Cited by third party
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JP2009271923A (en) * 2008-04-30 2009-11-19 Toppoly Optoelectronics Corp Display device
JP2014032707A (en) * 2008-04-30 2014-02-20 Toppoly Optoelectronics Corp Display device
US10042451B2 (en) 2008-04-30 2018-08-07 Innolux Corporation Touch display device comprising sense electrode with sub-electrodes extending along a first direction defining a pitch between sub-electrodes
JP2010039537A (en) * 2008-07-31 2010-02-18 Gunze Ltd Touch panel
US8717332B2 (en) 2008-07-31 2014-05-06 Gunze Limited Planar element, and touch switch
JP2010282471A (en) * 2009-06-05 2010-12-16 Sanyo Electric Co Ltd Signal processing circuit for electrostatic capacity type touch panel
JP5442012B2 (en) * 2009-06-30 2014-03-12 京セラ株式会社 Coordinate input device and display device with coordinate input function
JP2013251343A (en) * 2012-05-30 2013-12-12 Alps Electric Co Ltd Mounting structure of electronic component, input device, and manufacturing method of mounting structure

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