JP2007173585A - Electronic apparatus case - Google Patents

Electronic apparatus case Download PDF

Info

Publication number
JP2007173585A
JP2007173585A JP2005370179A JP2005370179A JP2007173585A JP 2007173585 A JP2007173585 A JP 2007173585A JP 2005370179 A JP2005370179 A JP 2005370179A JP 2005370179 A JP2005370179 A JP 2005370179A JP 2007173585 A JP2007173585 A JP 2007173585A
Authority
JP
Japan
Prior art keywords
waviness
case
scratch
pitch
electronic apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2005370179A
Other languages
Japanese (ja)
Other versions
JP4684099B2 (en
Inventor
Hiroshi Hamashima
浩 浜島
Kazuhide Kusano
一英 草野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP2005370179A priority Critical patent/JP4684099B2/en
Publication of JP2007173585A publication Critical patent/JP2007173585A/en
Application granted granted Critical
Publication of JP4684099B2 publication Critical patent/JP4684099B2/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Casings For Electric Apparatus (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide an electronic apparatus case having high scratch resistance and high decorativeness. <P>SOLUTION: An electronic apparatus case 1 is formed from ceramics. At least the front surface is a mirror surface on which waves periodically appear. The front surface of electronic apparatus case 1 has high scratch resistance even when coming into contact with an object, because the electronic apparatus case 1 is formed from hard ceramics. A higher scratch-resistance effect can be achieved as a result of an effect of the periodic waves causing the traveling direction of the object coming into contact with the electronic apparatus case 1 to curve at the peak of the wave. Even when a scratch is made, the scratch is only made on the peaks of the waves on the front surface. Therefore, the scratch is difficult to visually recognize and is unnoticeable. Although there are waves, a diffused reflected light can be generated because the front surface is a mirror surface. Therefore, the electronic apparatus case 1 is highly decorative with a soft appearance. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、例えばノートパソコンや携帯電話、デシタルカメラ等の電子機器用のセラミックスからなるケースに関する。   The present invention relates to a case made of ceramics for electronic devices such as notebook computers, mobile phones, and digital cameras.

ノートパソコンや携帯電話、デシタルカメラに代表されるような電子機器のケースは一般的にポリカーボネイト樹脂やABS樹脂などが用いられている。これは、複雑な形状も一体成形できる成形性や、また、軽量化が可能であることや多色化が可能なことから広く採用されている。   Generally, polycarbonate resin, ABS resin, and the like are used for cases of electronic devices such as notebook computers, mobile phones, and digital cameras. This is widely adopted because of the formability capable of integrally molding complex shapes, the ability to reduce weight, and the possibility of multiple colors.

特に近年、金属光沢を持たせた装飾性の高い樹脂製のケースが主流となりつつあり、その一例を紹介すると、携帯電話機のケースが合成樹脂の成形品でありながら、その表面にアルミ又はニッケル等の光輝性金属の粒子を混入した透明または半透明の樹脂膜を一体成形することにより、光輝度金属のような質感と高級感があって、さらに耐久性を向上させたケースを提供することが開示されている(特許文献1参照)。   In recent years, in particular, highly decorative resin cases with a metallic luster are becoming mainstream. For example, the case of a cellular phone is a molded product of synthetic resin, but the surface thereof is made of aluminum or nickel. By forming a transparent or translucent resin film mixed with particles of glittering metal, it is possible to provide a case that has a texture and high-class feeling like a brightness metal and further improves durability. It is disclosed (see Patent Document 1).

しかしながら前述した樹脂製のケースは、強度、硬度、耐熱性、耐薬品性に劣り、強度面においては、電子機器のケースに圧力を加えると歪むことにより装着されている液晶表示部や内部の回路に損傷を及ぼすという問題があった。   However, the resin case described above is inferior in strength, hardness, heat resistance, and chemical resistance, and in terms of strength, the liquid crystal display part and internal circuits that are mounted by distorting when pressure is applied to the case of the electronic device. There was a problem of damage.

これらの問題を解決する方法として、金属板の上に透明樹脂層を被覆することにより、樹脂の強度不足を補うと共に、金属的な輝きと艶を備えることが出来、携帯機器、デジタルカメラ、PDA(PersonalDigital Assistant)のケースとして好適であることが開示されている(特許文献2参照)。   As a method for solving these problems, by covering a metal plate with a transparent resin layer, it is possible to make up for the lack of strength of the resin and to provide a metallic shine and gloss. It is disclosed that it is suitable as a case of (Personal Digital Assistant) (see Patent Document 2).

同様に、金属部材の表面に二酸化チタン粒子やアルミナ粒子を含有する塗装被膜を形成した電子機器のケースもあり、吸熱性、放熱性、抗菌作用の効果をもたらすことが開示されている(特許文献3参照)。   Similarly, there is a case of an electronic device in which a coating film containing titanium dioxide particles or alumina particles is formed on the surface of a metal member, and it is disclosed that heat absorption, heat dissipation, and antibacterial effect are brought about (Patent Document) 3).

また、このような樹脂材や金属材を用いず、携帯通信端末のケースにセラミックスを用いることにより、エンジン部分の入れ替えを可能とし数世代にわたって使用可能なケースも開示されている(特許文献4参照)。
特開2000−349874号公報 特開2004−228238号公報 特開平11−340639号公報 特表2005−501434号公報
In addition, a case is disclosed in which the engine portion can be replaced and used for several generations by using ceramics for the case of the mobile communication terminal without using such a resin material or metal material (see Patent Document 4). ).
JP 2000-349874 A JP 2004-228238 A JP 11-340639 A JP-T-2005-501434

しかしながら、特許文献1、2、3で提案されたケースは、耐熱性や耐薬品性に劣ることは言うまでもなく、特に問題となるのが耐傷性であり、特許文献2,3のケースは、初期の段階では金属光沢の質感が得られるものの、電子機器特に携帯用電子機器として使用した場合においては、落下や接触により傷が付くことは免れず、装飾性に劣るという課題があった。   However, it is needless to say that the cases proposed in Patent Documents 1, 2, and 3 are inferior in heat resistance and chemical resistance, and the problem in particular is the scratch resistance. Although a metallic luster texture is obtained at this stage, when used as an electronic device, particularly a portable electronic device, there is a problem that it is inevitable to be damaged by dropping or touching, resulting in poor decorativeness.

また、特許文献4は、携帯電話機等の通信携帯端末のケース材料として、セラミックスを用いることが提示されており、表面の加工は通常ラップ加工が用いられており、この場合表面には圧力がかかるため、砥粒が表面の結晶粒子に食い込んだまま移動して研磨するため、様々な方向に微細な傷が付きやすくなる。さらに、ラップ加工は主に装飾性を高めるために鏡面状態を得ることが目的となるが、鏡面が極めて平滑な仕上がりとなり、眩しく反射光のきつい光沢面にしかできないという問題を有していた。   In addition, Patent Document 4 proposes using ceramics as a case material for a communication portable terminal such as a mobile phone, and the surface processing is usually performed by lapping, and in this case, pressure is applied to the surface. For this reason, since the abrasive grains move and polish while biting into the crystal grains on the surface, fine scratches are easily attached in various directions. Further, the lapping process is mainly intended to obtain a mirror surface state in order to enhance the decorativeness, but has a problem that the mirror surface has a very smooth finish and can only be a dazzling and glossy surface with reflected light.

本発明は、上記課題に鑑み、柔らかみのある光沢を備え、耐傷性に富み、装飾性の高い電子機器用ケースを提供することを目的とする。   In view of the above problems, an object of the present invention is to provide an electronic device case having a soft gloss, high scratch resistance, and high decorativeness.

本発明の電子機器用ケースは、表面が周期的なうねりを有する鏡面であるセラミックスからなることを特徴とする。   The electronic device case of the present invention is characterized in that the surface is made of ceramics having a mirror surface having periodic waviness.

また、前記うねりは、ピッチが20μm以上、500μm以下であり、かつ同一面におけるピッチの最大値、最小値の差が30μm以下であることを特徴とする。   The waviness is characterized in that the pitch is 20 μm or more and 500 μm or less, and the difference between the maximum value and the minimum value of the pitch on the same surface is 30 μm or less.

さらに、前記うねりは、平均うねりが0.07μm以上、10μm以下であり、かつ同一面におけるうねりの最大値、最小値の差が0.4μm以上、2μm以下であることを特徴とする。   Further, the waviness is characterized in that the average waviness is 0.07 μm or more and 10 μm or less, and the difference between the maximum value and the minimum value of waviness on the same surface is 0.4 μm or more and 2 μm or less.

またさらに、前記セラミックスは、ジルコニアを主成分とすることを特徴とする。   Still further, the ceramic is characterized by containing zirconia as a main component.

本発明の電子機器用ケースは、セラミックスからなり、表面におけるうねりが所定のピッチで周期的に現れるとともに、鏡面を有するものとしたことから、ケースの表面に物体が接触しても、高硬度を有するセラミックスからなることから金属材の高硬度処理された物体と接触しても耐傷性効果を備えたケースとすることができる。加えて接触した物体の進行方向を前記うねりの山で曲回させる作用が働くことからさらなる耐傷性効果を有することができる。また、たとえ傷が生じても、その傷は表面のうねりの山のみに生じることから視認し難くなり目立つことなく、またうねりがあっても鏡面であるため、拡散反射光線を生じさせることができることから、柔らかみのある鏡面となり、装飾性の高い電子機器用ケースを提供できる。   The case for an electronic device of the present invention is made of ceramics, and the undulations on the surface periodically appear at a predetermined pitch and have a mirror surface. Therefore, even if an object contacts the surface of the case, it has high hardness. Since it is made of ceramics, it is possible to obtain a case having a scratch resistance effect even when it comes into contact with a metal material subjected to high hardness treatment. In addition, since the action of turning the traveling direction of the object in contact with the undulation peak works, it can have a further scratch resistance effect. In addition, even if scratches occur, the scratches are generated only on the undulations of the surface, making it difficult to see and conspicuous, and even if there are undulations, it is a mirror surface and can produce diffuse reflected light. Therefore, it is possible to provide a case for an electronic device with a soft mirror surface and a high decorative property.

また、前記うねりは、ピッチが20μm以上、500μm以下であり、かつ同一面におけるピッチの最大値、最小値の差が30μm以下であることから、傷の原因となる接触物体の進行方向を曲回させる作用が得られやすく、高い耐傷性効果が得られるとともに、色むらを防止できる。   Further, since the undulation has a pitch of 20 μm or more and 500 μm or less, and the difference between the maximum value and the minimum value of the pitch on the same surface is 30 μm or less, the swell is bent in the traveling direction of the contact object causing the scratch. It is easy to obtain the effect of the above, and a high scratch resistance effect can be obtained, and color unevenness can be prevented.

さらに、前記うねりは、平均うねりが0.07μm以上、10μm以下であり、かつ同一面におけるうねりの最大値、最小値の差が0.4μm以上、2μm以下であることから、うねりの高さを一定範囲とすることで傷の原因となる接触物体の進行方向を曲回させる作用が得られやすく、より耐傷性効果が得られやすくなるとともに、鏡面を呈することができる。   Further, the undulation has an average undulation of 0.07 μm or more and 10 μm or less, and the difference between the maximum value and the minimum value of undulation on the same surface is 0.4 μm or more and 2 μm or less. By making it into a certain range, it is easy to obtain the action of turning the traveling direction of the contact object causing the scratch, and it becomes easier to obtain the scratch resistance effect and can exhibit a mirror surface.

さらに、前記セラミックスがジルコニアを主成分とすることにより、高硬度を確保できるとともに、添加剤を適宜選択することにより多色化が実現できる。また、携帯用電子機器のケースとして使用した場合の多少の落下に於いても簡単に割れること無く十分に使用可能とすることができる。   Furthermore, when the ceramic is mainly composed of zirconia, high hardness can be secured, and multicolorization can be realized by appropriately selecting additives. In addition, even when used as a case of a portable electronic device, it can be used sufficiently without being easily broken.

以下、本発明の実施形態について図面を用いて説明する。   Hereinafter, embodiments of the present invention will be described with reference to the drawings.

図1(a)は本発明の電子機器用ケース(以下、単にケース1と称す)1の一部を示す拡大斜視図であり、(b)はそのA−A線における断面図である。   FIG. 1A is an enlarged perspective view showing a part of an electronic device case (hereinafter simply referred to as case 1) 1 of the present invention, and FIG. 1B is a cross-sectional view taken along the line AA.

図1に示すように、ケース1の表面はうねりWを有しており、うねりWは、そのピッチをWp、うねりWのピッチWpの最大値をWpmax、最小値をWpmin、WpmaxとWpminの差をWprとし、うねりWの高低方向の高さの平均うねりをWa、この平均うねりWaを基準とした高さをうねりWとし、その最大値をWmax、最小値をWmin、その差をWrとし、うねりWの山をWyとして示すものである。   As shown in FIG. 1, the surface of the case 1 has waviness W, and the waviness W has a pitch Wp, a maximum value Wpmax of the waviness W, a minimum value Wpmin, and a difference between Wpmax and Wpmin. Wpr, the average waviness in the height direction of the waviness W is Wa, the height based on this average waviness Wa is the waviness W, the maximum value is Wmax, the minimum value is Wmin, and the difference is Wr, The peak of the swell W is shown as Wy.

なお、これらうねりWの各値の測定方法は、JIS B 0610に基づき、カットオフ値はfl8、fh0.8、測定長30mm、測定スピード0.5mm/sec、縦倍率10000、横倍率2として測定した。   In addition, the measuring method of each value of these waviness W is based on JIS B 0610, and the cut-off value is measured as fl8, fh0.8, measurement length 30 mm, measurement speed 0.5 mm / sec, vertical magnification 10000, and horizontal magnification 2. did.

ここで、本発明のケース1は、セラミックスからなり、少なくとも表面が所定ピッチの周期的なうねりを有する鏡面であることが重要である。   Here, it is important that the case 1 of the present invention is a mirror surface made of ceramics and having at least a surface having periodic waviness with a predetermined pitch.

ケース1を成すセラミックスは、ジルコニア、アルミナを主成分とするセラミックスや、炭化チタン、窒化チタン系のサーメットからなるセラミックス等、種々のものを用いることができる。   As the ceramics constituting the case 1, various types such as ceramics mainly composed of zirconia and alumina, ceramics composed of titanium carbide and titanium nitride cermets, and the like can be used.

特に、ジルコニアを主成分としたセラミックスを用いることが好ましく、金属材よりも硬度が高いため、耐傷性が高く、さらに、ニッケルやコバルト、セレン、クロム、チタン、鉄等の酸化物を添加剤として加えることにより、緑色、青色、黄色、赤色、黒色等の色調の選択肢が増え、加えて塗装にはない質感が出せるためである。詳細には、ジルコニアを主成分とし安定化剤を含む総量で90質量%以上含有してなるセラミックス、より詳細にはジルコニア(ZrO)が86〜95質量%、安定化剤であるイットリア(Y)が4〜6質量%含有してなるものが好ましい。 In particular, it is preferable to use ceramics mainly composed of zirconia, and since it has higher hardness than metal materials, it has high scratch resistance. Furthermore, oxides such as nickel, cobalt, selenium, chromium, titanium, and iron are used as additives. This is because the choices of color tones such as green, blue, yellow, red, and black increase, and in addition, a texture not found in paint can be produced. Specifically, ceramics containing 90% by mass or more of zirconia as a main component and including a stabilizer, more specifically, zirconia (ZrO 2 ) is 86 to 95% by mass, yttria (Y 2 O 3) which is comprising 4-6% by mass.

また、本発明のケース1を得るためのセラミック原料の成分とその含有率の範囲並びに粉体の好ましい粒径範囲は、それぞれジルコニア(ZrO)が86〜93.5質量%、安定化剤である酸化イットリウム(Y)が4〜6質量%含有してなるジルコニアセラミックスであり、それぞれの粉体粒径はジルコニアは0.2〜0.4μm、イットリアは0.3〜0.6μm、その他の安定化剤としてセリアは0.5〜0.8μm、ディスプロは0.8〜1.3μm、炭化チタンは0.8〜2.5μmであり、これらを適宜選択するとともに、顔料として、粉体粒径が1.3〜3μmのニッケル、1.5〜4μmのコバルト、0.3〜0.8μmの酸化ニッケル、0.4〜1.0μmの酸化コバルト、0.5〜1.2μmの酸化セリウム、0.3〜0.8μmの酸化クロム、0.2〜0.6μmの酸化チタン、0.4〜0.9μmの酸化鉄等の酸化物を選択することにより発色を決定する。 Further, the components of the ceramic raw material for obtaining case 1 of the present invention, the range of the content thereof, and the preferable particle size range of the powder are 86 to 93.5% by mass of zirconia (ZrO 2 ), respectively, and a stabilizer. It is zirconia ceramics containing 4 to 6% by mass of a certain yttrium oxide (Y 2 O 3 ), and the particle size of each powder is 0.2 to 0.4 μm for zirconia and 0.3 to 0.6 μm for yttria. As other stabilizers, ceria is 0.5 to 0.8 μm, displo is 0.8 to 1.3 μm, and titanium carbide is 0.8 to 2.5 μm. Nickel having a particle size of 1.3 to 3 μm, cobalt of 1.5 to 4 μm, nickel oxide of 0.3 to 0.8 μm, cobalt oxide of 0.4 to 1.0 μm, 0.5 to 1.2 μm Cerium oxide, 0 Chromium oxide 3~0.8Myuemu, titanium oxide 0.2 to 0.6 [mu] m, to determine the color by selecting the oxide such as iron oxide 0.4~0.9Myuemu.

ここで、本発明のケースは、図1に示すように表面が、周期的なうねりWを有する鏡面に特定される。   Here, in the case of the present invention, the surface is specified as a mirror surface having periodic waviness W as shown in FIG.

うねりとは、セラミックスの結晶粒子による凹凸やピンホール、気孔等の表面欠陥による凹凸を示すものではなく、これら凹凸を除いた表面状態を示すものであり、表面に滑らかな曲面状からなる凹凸が連続的に現れることを示す。周期的なうねりとは、ケース1の同一表面のいかなる箇所においても表面形状測定装置で測定したときの凹凸のパターンが略同一であって規則性をもって並んだ状態を指すものであり、凹凸のパターンが規則性を有するとは、同一面内のいかなる箇所で測定したうねりWのピッチWpの最大値Wpmax、最小値Wpminの差Wprが45μm以下であり、うねりWの高低方向であるうねりWの最大値Wpmax、最小値Wpminの差Wrが0.3μm以上、2.5μm以下の範囲にあるものを言う。また、ここでいう鏡面とはケース1の表面に対物造影が視認できる面であり、JIS B0601にて測定した算術平均粗さRaが0.5μm以下で各位置で測定したRaの値の最大値、最小値の差が0.1μm以下であることを言う。   Waviness does not indicate irregularities due to ceramic crystal particles or irregularities due to surface defects such as pinholes and pores, but indicates surface conditions excluding these irregularities, and the surface has irregularities consisting of a smooth curved surface. Indicates that it appears continuously. Periodic waviness refers to a state in which the uneven pattern when measured by the surface shape measuring device is substantially the same at any location on the same surface of the case 1 and is arranged with regularity. Has the regularity, the difference Wpr between the maximum value Wpmax and the minimum value Wpmin of the pitch Wp of the undulation W measured at any location in the same plane is 45 μm or less, and the maximum of the undulation W in the height direction of the undulation W The difference Wr between the value Wpmax and the minimum value Wpmin is in the range of 0.3 μm to 2.5 μm. Further, the mirror surface here is a surface on which the objective contrast can be visually recognized on the surface of the case 1, and the maximum value of the Ra value measured at each position when the arithmetic average roughness Ra measured by JIS B0601 is 0.5 μm or less. The minimum value difference is 0.1 μm or less.

これにより、材質からも十分な硬度を有するため高い耐傷性があることに加え、ケース1の表面におけるうねりWが所定のピッチWpで周期的に現れることから、図2に示すようにケース1の表面に物体3が矢印x方向に接触し進行したとしても、うねりWの山Wyで進行方向が表面から乖離する方向に曲回させることができるため、本来生じる傷4の長さを大幅に抑制でき、より高い耐傷性効果を備えるものである。また、たとえ傷4が生じても、うねりWの谷Wzには付きにくいことから、山Wyに生じた傷4は、ミシン目状の傷4となり視認し難くすることができる。さらには、所定ピッチWpの周期的なうねりWがあることから、図3の断面図に示すように入射光線5に対する正反射光線6を適度に抑えられることから、金属的な眩しい光沢面とは異なる柔らかみのある装飾性の高い光沢面が得られ、拡散反射光線を生じることから、柔らかみのある鏡面となり、装飾性の高いケースとすることができる。   Accordingly, since the material has sufficient hardness and has high scratch resistance, the waviness W on the surface of the case 1 appears periodically at a predetermined pitch Wp. Therefore, as shown in FIG. Even if the object 3 touches the surface in the direction of the arrow x and travels, the undulation Wy can be turned in a direction in which the traveling direction deviates from the surface. And has a higher scratch resistance effect. Further, even if the scratch 4 is generated, it is difficult to attach to the valley Wz of the swell W. Therefore, the scratch 4 generated on the mountain Wy becomes a perforated scratch 4 and can be hardly recognized. Furthermore, since there is a periodic swell W with a predetermined pitch Wp, the specularly reflected light beam 6 with respect to the incident light beam 5 can be moderately suppressed as shown in the sectional view of FIG. Since a glossy surface with different softness and high decorativeness is obtained and diffuse reflection light rays are generated, it becomes a soft mirror surface and can be made into a case with high decorativeness.

また、前記うねりWは、そのピッチWpが20〜500μmであり、かつ同一面におけるピッチWpの最大値Wpmax、最小値Wpminの差Wprを30μm以下とすることが好ましい。   The waviness W preferably has a pitch Wp of 20 to 500 μm, and a difference Wpr between the maximum value Wpmax and the minimum value Wpmin of the pitch Wp on the same surface is preferably 30 μm or less.

これにより、耐傷性がより高くなり、色むらのない美しい表面を得ることができる。うねりWのピッチWpが20μm未満であると、図2に示すように物体3がケース1の表面に接触し進行したときにうねりWのピッチWpが狭くなり当接する物体3はうねりWの山Wyの頂点のみしか接触しないために進行方向を表面から乖離する方向に曲回させる作用が小さくなるため、傷4の長さを抑制する効果が少なく、大きな傷4が付きやすくなってしまう。一方、うねりWのピッチWpが500μmを超えると、うねりWのピッチWpにそった反射光のムラが生じ人の目で色むらを判別できるようになるため美観上好ましくない。同時に、うねりWのピッチWpの同一表面における最大値Wpmax、最小値Wpminの差Wprが30μmを超えると、うねりWのピッチWpが20〜500μmの範囲内であっても、同一表面で接近してうねりWのピッチWpが異なることによる反射光の違いを人が認識することから色むらとして感じてしまう。また、より好ましくは、うねりWのピッチWpが30〜200μm、最大値Wpmax、最小値Wpminの差Wprが20μm以下である。   Thereby, scratch resistance becomes higher and a beautiful surface without color unevenness can be obtained. When the pitch Wp of the undulations W is less than 20 μm, as shown in FIG. 2, the pitch 3 of the undulations Wp becomes narrower when the object 3 comes into contact with the surface of the case 1, and the object 3 that comes into contact with the ridges Wy of the undulations W Since only the apex of the contact is made, the action of turning the traveling direction in a direction deviating from the surface is reduced, so that the effect of suppressing the length of the scratch 4 is small and the large scratch 4 is likely to be attached. On the other hand, if the pitch Wp of the undulations W exceeds 500 μm, unevenness of reflected light along the pitches Wp of the undulations W will occur, and color irregularities can be discerned by human eyes, which is not aesthetically pleasing. At the same time, when the difference Wpr between the maximum value Wpmax and the minimum value Wpmin on the same surface of the pitch Wp of the undulation W exceeds 30 μm, even if the pitch Wp of the undulation W is within the range of 20 to 500 μm, Since the person recognizes the difference in the reflected light due to the difference in the pitch Wp of the undulations W, it feels as color unevenness. More preferably, the pitch Wp of the undulation W is 30 to 200 μm, the difference Wpr between the maximum value Wpmax and the minimum value Wpmin is 20 μm or less.

さらに、前記うねりWは、その平均うねりWaが0.07μm以上、10μm以下であり、かつ同一面におけるうねりWの最大値Wmax、最小値Wminの差Wrが0.4μm以上、2μm以下であることが好ましい。   Further, the waviness W has an average waviness Wa of 0.07 μm or more and 10 μm or less, and a difference Wr between the maximum value Wmax and the minimum value Wmin of the waviness W on the same surface is 0.4 μm or more and 2 μm or less. Is preferred.

ここで、平均うねりWaとは、図1(b)に示すうねりWの断面曲線において、上下の面積が同一となる平均線を平均うねりWaとし、JIS B 0610に準じて規定される。平均うねりWaを0.07μm以上としたことから、所定のうねりWのピッチWpの範囲内において、適度の起伏を有し、物体3がケース1の表面に接触しても谷Wzに接触しにくいことから耐傷性をより向上させることができ、また平均うねりWaが10μm以下としたことから、表面粗さを小さなものとして鏡面を得ることができる。   Here, the average waviness Wa is defined according to JIS B 0610, with the average waviness Wa having the same upper and lower areas in the cross-sectional curve of the waviness W shown in FIG. Since the average waviness Wa is 0.07 μm or more, it has moderate undulations within the range of the pitch Wp of the predetermined waviness W, and even if the object 3 contacts the surface of the case 1, it does not easily contact the valley Wz. Therefore, the scratch resistance can be further improved, and since the average waviness Wa is 10 μm or less, a mirror surface can be obtained with a small surface roughness.

前記平均うねりWaが0.07μm未満であると、前述したうねりWのピッチWpが20〜500μmの範囲内であっても、うねりWの起伏が小さいことから、傷4の原因となる接触する物体3の進行方向を表面から乖離、曲回させる作用が十分ではない。また、平均うねりWaが10μmを超えると光沢度が劣るため装飾性が低下してしまう。さらに、平均うねりWaが0.07μm以上、10μm以下の範囲内であっても、同一表面におけるうねりWの最大値Wmaxと最小値Wminの差Wrが2μmを超えると鏡面のムラとして感じることから同一表面におけるうねりWの最大値Wmaxと最小値Wminの差Wrが2μm以下とする。また、うねりWの最大値Wmaxと最小値Wminの差Wrが0.4μm未満となると、うねりWの高低が小さすぎてしまい、図2に示すように物体3がケース1の表面に接触し進行したときにうねりWの谷Wzにも傷4が付きやすくなり、物体3の進行方向を表面から乖離する方向に曲回させる作用が小さくなり、大きな傷4がつきやすくなってしまう。これにより、表面がムラのある鏡面として感じやすくなるため、うねりWの最大値Wmaxと最小値Wminの差Wrは0.4μm以上、2μm以下であることが好ましい。より好ましくは、平均うねりWa0.1〜6μm、うねりWの最大値Wmaxと最小値Wminの差Wrは0.5μm以上、0.7μm以下である。   When the average waviness Wa is less than 0.07 μm, even if the pitch Wp of the waviness W is in the range of 20 to 500 μm, the undulation of the waviness W is small. The action of moving the direction of travel 3 away from the surface and turning is not sufficient. On the other hand, if the average waviness Wa exceeds 10 μm, the glossiness is inferior and the decorativeness is lowered. Furthermore, even if the average waviness Wa is in the range of 0.07 μm or more and 10 μm or less, if the difference Wr between the maximum value Wmax and the minimum value Wmin of the waviness W on the same surface exceeds 2 μm, it is the same because it is perceived as unevenness on the mirror surface. The difference Wr between the maximum value Wmax and the minimum value Wmin of the waviness W on the surface is 2 μm or less. Further, when the difference Wr between the maximum value Wmax and the minimum value Wmin of the undulation W is less than 0.4 μm, the level of the undulation W is too small, and the object 3 is in contact with the surface of the case 1 as shown in FIG. In this case, the scratches 4 are easily attached to the valleys Wz of the swells W, and the action of turning the traveling direction of the object 3 in a direction deviating from the surface is reduced, so that the large scratches 4 are easily attached. Accordingly, since the surface can be easily felt as an uneven mirror surface, the difference Wr between the maximum value Wmax and the minimum value Wmin of the waviness W is preferably 0.4 μm or more and 2 μm or less. More preferably, the average waviness Wa is 0.1 to 6 μm, and the difference Wr between the maximum value Wmax and the minimum value Wmin of the waviness W is 0.5 μm or more and 0.7 μm or less.

次いで、本発明のケース1の製造方法について説明する。   Next, a method for manufacturing the case 1 of the present invention will be described.

例えば、先ず主成分となるジルコニアに、安定化剤としてイットリア(Y)を含有してなる原料粉末を公知の粉末乾式プレスや粉末ラバープレスまたは押し出し成形によりケース1となる成形体を得る。 For example, first, a raw material powder containing yttria (Y 2 O 3 ) as a stabilizer in zirconia as a main component is obtained as a case 1 by a known powder dry press, powder rubber press or extrusion molding. .

次に、成形体をバッチ炉や連続トンネル炉による大気雰囲気にて約1300〜1450℃で焼成し焼結体を作製する。なお、サーメットにおいては真空炉を使用し約1400〜1550℃の温度で焼成する。   Next, the compact is fired at about 1300 to 1450 ° C. in an air atmosphere using a batch furnace or a continuous tunnel furnace to produce a sintered body. The cermet is fired at a temperature of about 1400 to 1550 ° C. using a vacuum furnace.

次に、焼結体の表面を回転バレルで荒仕上げ処理し、次に遠心バレルで鏡面仕上げ処理することにより本発明のケース1が得られる。また、前処理として、ブラスト処理等を組み合わせてもよい。   Next, the case 1 of this invention is obtained by carrying out rough finishing process of the surface of a sintered compact with a rotation barrel, and then mirror-finishing processing with a centrifugal barrel. Further, blasting or the like may be combined as preprocessing.

ジルコニアセラミックスからなるケース1が鏡面であって、所望のうねりWのピッチWp、平均うねりWaとするためには、バレル処理のメディアの粒径で制御する方法を用いることができる。   The case 1 made of zirconia ceramics has a mirror surface, and in order to obtain a desired pitch Wp of the waviness W and an average waviness Wa, a method of controlling by the particle diameter of the barrel processing media can be used.

回転バレルによる荒仕上げは、公知の回転バレル装置を用い、水、メディア、製品の投入比を1:1:1程度としメディアは5〜10φ程度のGC砥粒を用い回転数50〜100rpmで20〜50時間処理を行う。その後、公知の遠心バレルにより、水、製品、メディアの投入量を1:0.8:0.5程度としメディアは0.5〜3φのGC砥粒を用い回転数50〜100rpmで10〜30時間仕上げ処理を行う。ケース1のうねりWのピッチWpはメディアの径を大きくすると大きくなる。また、平均うねりWaは回転数を早くして処理時間を短くすることにより大きくできるのである。   For rough finishing with a rotating barrel, a known rotating barrel device is used, and the water, media, and product input ratio is about 1: 1: 1, and the media is GC abrasive grains of about 5 to 10φ and the rotational speed is 50 to 100 rpm and 20 Process for ~ 50 hours. Thereafter, with a known centrifugal barrel, the amount of water, product, and media is set to about 1: 0.8: 0.5, and the media uses GC abrasive grains of 0.5 to 3φ at a rotational speed of 50 to 100 rpm and 10 to 30. Perform time finishing. The pitch Wp of the swell W of the case 1 increases as the media diameter increases. The average waviness Wa can be increased by increasing the number of revolutions and shortening the processing time.

より具体的には、うねりWのピッチWpを20μm程度とするためには、荒仕上げの条件を回転バレル装置による場合、メディア径を約5μmのGC砥粒を用い回転数を約100rpmで約20時間処理を行い、その後、鏡面仕上げ処理を遠心バレルによる場合、メディア径約0.5μmのGC砥粒を用い回転数約100rpmで約10時間処理を行えばよい。また、うねりWのピッチWpを500μm程度とするためには、回転バレル装置による場合、メディア径を約10φのGC砥粒を用い回転数を約50rpmで約50時間処理を行い、その後、鏡面仕上げ処理を遠心バレルによる場合、メディア径約3μmのGC砥粒を用い回転数約50rpmで約30時間処理を行えばよい。   More specifically, in order to set the pitch Wp of the waviness W to about 20 μm, when the rough finishing condition is a rotating barrel apparatus, GC abrasive grains having a media diameter of about 5 μm are used, and the rotational speed is about 20 at about 100 rpm. When the time processing is performed, and then the mirror finish processing is performed by a centrifugal barrel, the processing may be performed for about 10 hours at a rotational speed of about 100 rpm using GC abrasive grains having a media diameter of about 0.5 μm. In addition, in order to set the pitch Wp of the undulation W to about 500 μm, in the case of a rotating barrel device, a GC abrasive grain having a media diameter of about 10φ is used, and the rotational speed is about 50 rpm for about 50 hours. When processing is performed by a centrifugal barrel, GC abrasive grains having a media diameter of about 3 μm are used, and the processing may be performed at a rotation speed of about 50 rpm for about 30 hours.

また、平均うねりWaを0.07μm程度、うねりWの最大値Wmax、最小値Wminの差Wrを0.4μm以上とするには、前記荒仕上げの回転バレルの水、メディア、製品の投入比を1:0.8:1程度とし、鏡面仕上げ処理の延伸バレルの水、メディア、製品の投入比を1:0.5:0.5程度で行えばよい。また、平均うねりWaを10μm程度、うねりWの最大値Wmax、最小値Wminの差Wrを2μm以下とするには、前記荒仕上げの回転バレルの水、メディア、製品の投入比を1:1.1:1程度とし、鏡面仕上げ処理の延伸バレルの水、メディア、製品の投入比を1:1:0.5程度で行えばよい。   In addition, in order to set the average waviness Wa to about 0.07 μm and the difference Wr between the maximum value Wmax and the minimum value Wmin of the waviness W to 0.4 μm or more, the ratio of water, media and product to the rough-finished rotating barrel should be set. The ratio of water, media, and product in the drawing barrel for mirror finishing may be about 1: 0.5: 0.5. In addition, in order to set the average waviness Wa to about 10 μm and the difference Wr between the maximum value Wmax and the minimum value Wmin of the waviness W to 2 μm or less, the ratio of water, media, and product in the rough finishing rotary barrel is 1: 1. The ratio of water, media, and product in the drawing barrel for mirror finishing may be about 1: 1: 0.5.

なお、前記表面処理の方法、条件は一例に過ぎず、これに限るものではないが、このようにバレル研磨の条件を種々組合せることにより、上述したピッチWp、うねりWを得ることができる。   The method and conditions for the surface treatment are merely examples, and the present invention is not limited to this. However, the pitch Wp and the swell W described above can be obtained by variously combining the conditions for barrel polishing in this way.

このようにして作製されたケース1は、耐傷性、装飾性に富むことから落下や物当たりなどの衝撃を受けやすい携帯用に適し、その用途の一例として、携帯電話機、デジタルカメラ、携帯音楽再生機器、電子ペン、ノートパソコン、モバイルパソコンなどの携帯電子機器2がある。   The case 1 produced in this manner is suitable for portable use that is susceptible to impacts such as falling or hitting because of its excellent scratch resistance and decorativeness. As an example of its use, a cellular phone, a digital camera, portable music playback There are portable electronic devices 2 such as devices, electronic pens, notebook personal computers, and mobile personal computers.

また、例えば、一例として、携帯電子機器用ケース2として用いる場合において、ケースを構成するフロント面2b、側面2c、背面2dの全てに本発明のケース1で構成してもよいが、その一部分にのみ用い他の部分は従来の樹脂製或いは金属製のケースによる組み合わせでも良く適宜選択すればよい。   Further, for example, when used as a case 2 for a portable electronic device, for example, the front surface 2b, the side surface 2c, and the back surface 2d constituting the case may be configured by the case 1 of the present invention, but a part thereof The other parts used only may be a combination of a conventional resin or metal case and may be appropriately selected.

以下本発明の実施例を具体的に説明するが、本発明はこれらの実施例に限定されるものではない。   Examples of the present invention will be specifically described below, but the present invention is not limited to these examples.

本発明の試料として、原料粉体としてジルコニア(ZrO)を94.8質量%、安定化剤である酸化イットリウム(Y)を5.2質量%、他に顔料添加剤として緑色系は酸化クロム、黒色系は酸化鉄や酸化チタンや酸化ニッケル、青色系は酸化コバルト等を組み合わせて添加し、溶媒とともに粉砕混合してスラリーを作製する。 As a sample of the present invention, 94.8% by mass of zirconia (ZrO 2 ) as a raw material powder, 5.2% by mass of yttrium oxide (Y 2 O 3 ) as a stabilizer, and green as a pigment additive Is added in combination with chromium oxide, black is combined with iron oxide, titanium oxide, nickel oxide, blue is combined with cobalt oxide, and pulverized and mixed with a solvent to prepare a slurry.

そして、これらのスラリーを粉末乾式プレスによりケース1となる成形体を作製する。   And the compact | molding | casting which becomes the case 1 is produced by powder dry press of these slurries.

次に、前記成形体をバッチ炉により大気雰囲気にて約1450℃で焼成し焼結体を作製した。   Next, the compact was fired at about 1450 ° C. in an air atmosphere in a batch furnace to produce a sintered body.

次に焼結体の表面を回転バレルにより荒仕上げ処理し、次に遠心バレルで鏡面仕上げ処理を行った。回転バレルおよび遠心バレルの条件は前述したように回転バレルによる荒仕上げは、公知の回転バレル装置を用い、水、メディア、製品の投入比を1:1:1程度としメディアは5〜10φ程度のGC砥粒を用い回転数50〜100rpmで20〜50時間処理を行う。その後、公知の遠心バレルにより、水、製品、メディアの投入量を1:0.8:0.5程度としメディアは0.5〜3φのGC砥粒を用い回転数50〜100rpmで10〜30時間仕上げ処理の範囲とし、ケースのうねりWのピッチWpはメディアの径を大きくすると大きくなる。また、平均うねりWaは回転数を早くして処理時間を短くすることにより大きくなることから、うねりWのピッチWpを7〜500μm、平均うねりWaを0.04〜12μmの範囲で各々のうねりWの組み合わせとなるように試料を作製した。   Next, the surface of the sintered body was rough-finished with a rotating barrel, and then mirror-finished with a centrifugal barrel. As described above, the conditions of the rotating barrel and the centrifugal barrel are as follows. Rough finishing with the rotating barrel uses a known rotating barrel device, the ratio of water, media, and product is about 1: 1: 1, and the media is about 5 to 10φ. Processing is performed for 20 to 50 hours at a rotational speed of 50 to 100 rpm using GC abrasive grains. Thereafter, with a known centrifugal barrel, the amount of water, product, and media is set to about 1: 0.8: 0.5, and the media uses GC abrasive grains of 0.5 to 3φ at a rotational speed of 50 to 100 rpm and 10 to 30. In the time finishing process range, the pitch Wp of the swell W of the case increases as the diameter of the media increases. Further, since the average waviness Wa is increased by increasing the number of revolutions and shortening the processing time, the waviness W has a pitch Wp of 7 to 500 μm and the average waviness Wa is 0.04 to 12 μm. Samples were prepared so as to have a combination of

また、バレル処理による鏡面加工以外にラップ処理、バフ処理の試料も追加した。ラップ処理の条件は遊離ダイヤモンド砥粒(#3000)1gをオリーブ油500ccに溶かし、銅盤上に点滴し、回転数20rpmにて10時間、公知のラップ研磨装置で処理した。また、バフ処理は遊離ダイヤモンド砥粒(#3000)1gをオリーブ油500ccに溶かしバフ盤上に点滴し、回転数1000rpmにて1時間バフ研磨処理を実施した。   In addition to mirror finishing by barrel processing, samples for lapping and buffing were also added. The lapping treatment was performed by dissolving 1 g of free diamond abrasive grains (# 3000) in 500 cc of olive oil, instilling it on a copper disk, and treating with a known lapping apparatus at a rotation speed of 20 rpm for 10 hours. In addition, 1 g of free diamond abrasive grains (# 3000) was dissolved in 500 cc of olive oil and dropped on a buffing machine, and buffing was performed at a rotation speed of 1000 rpm for 1 hour.

また、比較例としてSUS304で作製したものを試料番号40とした。   Moreover, what was produced with SUS304 as a comparative example was made into sample number 40. FIG.

以上のようにして作製した実施例の各試料について、表面のうねりWを測定し、うねりWのピッチWp、ピッチWpの最大値Wpmax、最小値Wpminの差Wpr並びに、平均うねりWa、うねりの最大値Wmax、最小値Wminの差Wrを求めた。その測定方法はJISB0610に基づき、カットオフ値はfl8、fh0.8、測定長30mm、測定スピード0.5mm/sec、縦倍率10000、横倍率2とした。(使用測定器は小坂研究所製の表面粗さ計ET4000Aを用い非接触式レーザ触針により測定した。)
うねりWの測定は、バレル処理で鏡面加工を行ったものについては、いずれの方向に測定しても同様のうねりWの断面曲線が得られることから、任意の方向で測定した。しかし、ラップ処理、バフ処理で鏡面加工したものは、その加工傷が一方向に視認されることから、加工傷に対して直交する方向でうねりWの測定を実施した。
The surface waviness W is measured for each sample of the example manufactured as described above, the pitch Wp of the waviness W, the maximum value Wpmax of the pitch Wp, the difference Wpr of the minimum value Wpmin, the average waviness Wa, the maximum waviness. A difference Wr between the value Wmax and the minimum value Wmin was obtained. The measurement method was based on JISB0610, and the cutoff values were fl8, fh0.8, measurement length 30 mm, measurement speed 0.5 mm / sec, vertical magnification 10,000, and horizontal magnification 2. (The measuring instrument used was a surface roughness meter ET4000A manufactured by Kosaka Laboratory, which was measured with a non-contact laser stylus.)
The waviness W was measured in an arbitrary direction because the same waviness W cross-section curve was obtained for any mirror-finished barrel process. However, in the case of mirror finishing by lapping and buffing, since the processing flaw is visually recognized in one direction, the waviness W was measured in a direction orthogonal to the processing flaw.

また、前記各試料のビッカース硬度の測定も実施した。ビッカース硬度の測定は、JIS−R1610により明石製作所製AVK−A型硬度計を用い、HvLoad10kgにて実施した。   The Vickers hardness of each sample was also measured. Vickers hardness was measured according to JIS-R1610 using an AVK-A type hardness meter manufactured by Akashi Seisakusho and HvLoad of 10 kg.

次に前記各試料について、耐傷性のテストを実施した。そのテスト方法はHEIDON社製スクラッチテスターを使用し、垂直加重500g、先端曲率半径2μmRのダイヤモンド針にて測定スピード5mm/sec.で、長さ30mmの引っ掻き状の傷4を付ける方法である。そして、この傷4の最大となる幅を工具顕微鏡で倍率10倍で測定した。スクラッチテスターの針の進行方向は、鏡面加工がバレル処理のものに対しては、任意の方向とし、ラップ処理、バフ処理のものに対しては、加工傷に直交する方向と並行する方向の二通りで実施した。   Next, a scratch resistance test was performed on each sample. The test method uses a scratch tester manufactured by HEIDON, and the measurement speed is 5 mm / sec. With a diamond needle having a vertical load of 500 g and a tip curvature radius of 2 μmR. In this method, a scratch-like scratch 4 having a length of 30 mm is applied. And the width | variety used as the maximum of this damage | wound 4 was measured by 10 time magnification with the tool microscope. The advancing direction of the scratch tester needle can be any direction when the mirror finish is barrel-processed, and the direction parallel to the direction perpendicular to the processing flaw is for lapping and buffing. Carried out on the street.

そして、傷4の測定値は、図4(a)、(b)に示すように、測定長Lが30mmmの傷4にたいして、針のスタート点から約5mmの位置L1、約15mmの位置L2、約30mmの位置L3の箇所の幅D1、D2、D3を測定しその平均値をデータとした。傷4がミシン目状である場合、前記測定位置L1、L2、L3にかかる傷4の直近の最大値をデータとし、また、ミシン目状の傷4から外れる位置となる場合は、その直近の傷4の最大値をデータとした。   Then, as shown in FIGS. 4 (a) and 4 (b), the measurement value of the wound 4 is about a position L1 of about 5 mm from the start point of the needle, a position L2 of about 15 mm, with respect to the wound 4 having a measurement length L of 30 mm. The widths D1, D2, and D3 of the position L3 of about 30 mm were measured, and the average value was used as data. When the scratch 4 is perforated, the maximum value of the latest scratch 4 applied to the measurement positions L1, L2, and L3 is used as data, and when the position is outside the perforated scratch 4, the nearest The maximum value of wound 4 was used as data.

また、前記引っ掻き状の傷4の視認性について、3人の人に10cmの距離から目視にて視認できるかどうか視認性評価を行った。照明はハロゲン光を用い、視認不可で有れば◎、僅かに視認されるものは○、視認できるものは△、容易に視認できるものを×とし、曖昧評価であるために3人の評価のメジアン値をデータとした。   Moreover, about the visibility of the said scratch-like wound 4, visibility evaluation was performed whether three people can visually recognize from a distance of 10 cm. Illumination uses halogen light, ◎ if it is invisible, ○ if it is slightly visible, △ if it is visible, × if it is easily visible, and because it is an ambiguous evaluation, The median value was used as data.

次に、前記各試料の表面の光沢度の測定を実施した。その方法はJISZ8741により、スガ試験機製UGV5Dデジタル偏角光沢度計を用い60度で測定した。   Next, the glossiness of the surface of each sample was measured. The method was measured according to JISZ8741 at 60 degrees using a UGV5D digital declination glossiness meter manufactured by Suga Test Instruments.

また、鏡面の人が感じる感覚的評価も併せて実施した。その方法は、3人の人の目視感覚によるもので、白熱光下に試料を置き、同一距離から視認したときに、柔らかみのある鏡面を◎、問題としない鏡面を○、やや曇りがかんじられるものを△、鏡面でないもの或いは眩しさを感じるものを×とした。これも曖昧な評価であるために3人の評価のメジアン値をデータとした。   In addition, the sensory evaluation felt by people on the mirror surface was also performed. The method is based on the visual sense of three people. When a sample is placed under incandescent light and viewed from the same distance, the soft mirror surface is ◎, the non-problematic mirror surface is ○, and the cloud is slightly cloudy. What was obtained was indicated by Δ, and what was not specular or dazzled was indicated by ×. Since this is also an ambiguous evaluation, the median value of three evaluations was used as data.

以上の測定結果並びに人の感覚的評価結果を表1に示す。

Figure 2007173585
The above measurement results and human sensory evaluation results are shown in Table 1.
Figure 2007173585

表1の結果から明らかなように、本発明実施例の試料番号1〜6、8、10、11、13〜16、18〜23、25〜33、35、36、38は、セラミックスからなり、所定ピッチの周期的なうねりW(うねりWのピッチWpが45μm以下、うねりの差Wrが0.3〜2.5μm)有する鏡面からなることから、ビッカース硬度がHV12GPa以上と高いことに加え、前記うねりWが耐傷性効果を生み出すとともに、金属光沢とは異なる柔らかみのある光沢面を得られている。   As apparent from the results in Table 1, sample numbers 1 to 6, 8, 10, 11, 13 to 16, 18 to 23, 25 to 33, 35, 36, and 38 of the examples of the present invention are made of ceramics. In addition to having a Vickers hardness as high as HV12 GPa or more because it is made of a mirror surface having periodic waviness W of a predetermined pitch (pitch Wp of waviness W is 45 μm or less, waviness difference Wr is 0.3 to 2.5 μm), The waviness W produces a scratch resistance effect, and a glossy surface having a softness different from the metallic luster is obtained.

これら試料のうち、うねりWのピッチWpが20〜500μmの範囲内のものは耐傷性に優れ、さらにピッチWpが30〜200μmの範囲内にある試料番号10、11、13、14、15、16、18はスクラッチテスターによる傷4の幅が5μm以下に抑えられ耐傷性が高い結果となっている。   Among these samples, those in which the pitch Wp of the undulation W is in the range of 20 to 500 μm are excellent in scratch resistance, and further, sample numbers 10, 11, 13, 14, 15, 16 having a pitch Wp in the range of 30 to 200 μm. No. 18 has a high scratch resistance because the width of the scratch 4 by the scratch tester is suppressed to 5 μm or less.

また、平均うねりWaが0.07〜10μmであって、うねりの最大値Wmax、最小値Wminの差Wrが0.4〜2.0μmのものは、鏡面に曇りを感じるものはなく、前記平均うねりWaが0.1〜6μmの範囲内である試料番号4〜6、10、11、18〜21、25、26、29〜31は光沢度が80〜90%であり人の感覚的評価も柔らかみのある鏡面であった。   In addition, when the average waviness Wa is 0.07 to 10 μm and the difference Wr between the maximum value Wmax and the minimum value Wmin of the waviness is 0.4 to 2.0 μm, the mirror surface has no cloudiness, and the average Sample numbers 4-6, 10, 11, 18-21, 25, 26, 29-31, in which the waviness Wa is in the range of 0.1-6 μm, have a glossiness of 80-90% and human sensory evaluation The mirror surface was soft.

これに対して、本発明の範囲外の試料は、SUS材で作製した試料番号40は、ビッカース硬度がHV2.8と低く、うねりの差Wrが6μmと大きいため、耐傷性に劣り、さらに光沢度が高く眩しさを感じることから鏡面の感覚的評価も良くない。   On the other hand, a sample outside the scope of the present invention, sample number 40 made of SUS material, has a low Vickers hardness of HV2.8 and a large swell difference Wr of 6 μm. The sensory evaluation of the mirror surface is not good due to the high degree of glare.

また、試料番号7は鏡面加工がラップ処理によるものであり、所定ピッチWpの周期的なうねりWが一方向にのみであることから、うねりの差Wrが0.1μmと小さく、ラップ処理の加工傷に並行する方向にスクラッチテスターの針を走らせると傷4の幅Dの平均値が55μmと大きく耐傷性に劣ることが判った。また、試料番号9もうねりの差Wrが0.2μmと小さいため、傷の幅は小さいものの傷が目立ち耐傷性に劣ることが判った。   In sample No. 7, the mirror surface processing is performed by lapping, and the periodic waviness W with a predetermined pitch Wp is only in one direction. Therefore, the waviness difference Wr is as small as 0.1 μm, and lapping processing is performed. It was found that when the scratch tester needle was run in the direction parallel to the scratch, the average value of the width D of the scratch 4 was as large as 55 μm and the scratch resistance was poor. Further, since the difference Wr of the waviness of Sample No. 9 was as small as 0.2 μm, it was found that although the width of the scratch was small, the scratch was conspicuous and inferior in scratch resistance.

試料番号12は、鏡面加工がバフ処理によるものであり、試料番号7と同様に所定ピッチWpの周期的なうねりWが一方向にのみであることから、加工傷に並行する方向にスクラッチテスターの針を走らせると傷4の幅Dの平均値が40μmと大きく耐傷性に劣る。また、平均うねりWaが12μmとやや大きいことと、また、ピッチWpの差Wprが36μmと大きいことの双方から鏡面に曇りを感じるものとなった。   Sample No. 12 is mirror-finished by buffing and, like Sample No. 7, the periodic waviness W with a predetermined pitch Wp is only in one direction. When the needle is run, the average value of the width D of the scratch 4 is as large as 40 μm, and the scratch resistance is poor. Further, both the average waviness Wa was as large as 12 μm and the difference Wpr in the pitch Wp was as large as 36 μm.

また、試料番号17、24、34は、うねりWの最大値Wmaxと最小値Wminの差Wrが2.8μm以上と大きいことから、鏡面に曇りを感じる結果となった。試料番号34は、平均うねりWaが12μmと大きいことから鏡面に曇りを感じる結果となった。また、試料番号37は、ピッチWpの差Wprが50μmと大きく光沢のムラがあることから鏡面に曇りを感じる結果となった。   In Sample Nos. 17, 24, and 34, the difference Wr between the maximum value Wmax and the minimum value Wmin of the swell W was as large as 2.8 μm or more, and thus the mirror surface was clouded. In Sample No. 34, the average waviness Wa was as large as 12 μm, so that the mirror surface was clouded. Sample No. 37 had a large difference in pitch Wp Wpr of 50 μm and uneven gloss, resulting in the mirror surface being cloudy.

さらに、SUS材からなる試料番号39は、うねりWの最大値Wmaxと最小値Wminの差Wrが6μmと大きく、ビッカース硬度も小さいことから、傷が大きく、光沢も劣ることが判った。   Furthermore, it was found that Sample No. 39 made of SUS material has large scratches and poor gloss because the difference Wr between the maximum value Wmax and the minimum value Wmin of the swell W is as large as 6 μm and the Vickers hardness is small.

以上のように、本発明のケースは、高硬度を有するセラミックスからなることに加え、所定ピッチの周期的なうねりWを有する鏡面としたことから、耐傷性があり、かつ、柔らかみのある独特の光沢面が得られ、装飾性の高いケースを提供できるのである。   As described above, the case of the present invention is made of a ceramic having high hardness, and has a mirror surface having a periodic waviness W having a predetermined pitch. A glossy surface can be obtained, and a highly decorative case can be provided.

本発明の電子機器用ケースの表面のうねり断面曲線の模式図であり、(a)は表面の部分拡大斜視図、(b)はそのA−A線における断面図である。It is a schematic diagram of the waviness cross-sectional curve of the surface of the case for electronic equipment of the present invention, (a) is a partially enlarged perspective view of the surface, (b) is a cross-sectional view along the AA line. 本発明の電子機器用ケースの表面に物体が接触したときの断面模式図である。It is a cross-sectional schematic diagram when an object contacts the surface of the case for electronic devices of this invention. 本発明の電子機器用ケースの表面における入射光と反射光の断面模式図である。It is a cross-sectional schematic diagram of the incident light and reflected light in the surface of the case for electronic devices of this invention. (a)、(b)は電子機器用ケースの表面における傷の拡大上面図である。(A), (b) is an enlarged top view of the damage | wound in the surface of the case for electronic devices.

符号の説明Explanation of symbols

1:ケース
2:携帯電子機器用ケース 2a:表面 2b:フロント面 2c:側面 2d:背面
2e:表示部 2f:操作部
3:物体
4:傷
5:入射光線
6:正反射光線
7:拡散反射光線
1: Case 2: Case for portable electronic device 2a: Front surface 2b: Front surface 2c: Side surface 2d: Back surface 2e: Display unit 2f: Operation unit 3: Object 4: Scratch 5: Incident light beam 6: Regular reflection light beam 7: Diffuse reflection Rays

Claims (4)

表面が周期的なうねりを有する鏡面であるセラミックスからなることを特徴とする電子機器用ケース。 A case for electronic equipment, characterized in that the surface is made of a ceramic which is a mirror surface having periodic undulations. 前記うねりは、ピッチが20μm以上、500μm以下であり、かつ同一面におけるピッチの最大値、最小値の差が30μm以下であることを特徴とする請求項1に記載の電子機器用ケース。 2. The electronic device case according to claim 1, wherein the swell has a pitch of 20 μm or more and 500 μm or less, and a difference between a maximum value and a minimum value of the pitch on the same surface is 30 μm or less. 前記うねりは、平均うねりが0.07μm以上、10μm以下であり、かつ同一面におけるうねりの最大値、最小値の差が0.4μm以上、2.0μm以下であることを特徴とする請求項1または2に記載の電子機器用ケース。 2. The undulation is characterized in that the average undulation is 0.07 μm or more and 10 μm or less, and the difference between the maximum value and the minimum value of undulation on the same surface is 0.4 μm or more and 2.0 μm or less. Or the case for electronic devices of 2. 前記セラミックスは、ジルコニアを主成分とすることを特徴とする請求項1〜3の何れかに記載の電子機器用ケース。 The case for electronic equipment according to claim 1, wherein the ceramic is mainly composed of zirconia.
JP2005370179A 2005-12-22 2005-12-22 Case for electronic equipment Expired - Fee Related JP4684099B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005370179A JP4684099B2 (en) 2005-12-22 2005-12-22 Case for electronic equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005370179A JP4684099B2 (en) 2005-12-22 2005-12-22 Case for electronic equipment

Publications (2)

Publication Number Publication Date
JP2007173585A true JP2007173585A (en) 2007-07-05
JP4684099B2 JP4684099B2 (en) 2011-05-18

Family

ID=38299720

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005370179A Expired - Fee Related JP4684099B2 (en) 2005-12-22 2005-12-22 Case for electronic equipment

Country Status (1)

Country Link
JP (1) JP4684099B2 (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009131970A (en) * 2007-11-28 2009-06-18 Mitsubishi Engineering Plastics Corp Front panel of flat panel display and injection molding method thereof
JP2009131969A (en) * 2007-11-28 2009-06-18 Mitsubishi Engineering Plastics Corp Molded article of polycarbonate resin composition and injection molding method thereof
JP2018506851A (en) * 2015-01-19 2018-03-08 コーニング インコーポレイテッド Housing with anti-fingerprint surface
US10399905B2 (en) 2017-08-31 2019-09-03 Corning Incorporated Ceramic housing with texture
WO2020091399A1 (en) * 2018-10-30 2020-05-07 Lg Electronics Inc. Laundry treating apparatus
WO2023068568A1 (en) * 2021-10-18 2023-04-27 삼성전자 주식회사 Electronic device comprising housing, and method for manufacturing same

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6438562B1 (en) 2017-06-13 2018-12-12 東洋鋼鈑株式会社 Rolled joined body and manufacturing method thereof

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004047669A (en) * 2002-07-11 2004-02-12 Mitsubishi Engineering Plastics Corp Resin vessel
JP2005501434A (en) * 2000-12-29 2005-01-13 ベルツ リミテッド Case

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005501434A (en) * 2000-12-29 2005-01-13 ベルツ リミテッド Case
JP2004047669A (en) * 2002-07-11 2004-02-12 Mitsubishi Engineering Plastics Corp Resin vessel

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009131970A (en) * 2007-11-28 2009-06-18 Mitsubishi Engineering Plastics Corp Front panel of flat panel display and injection molding method thereof
JP2009131969A (en) * 2007-11-28 2009-06-18 Mitsubishi Engineering Plastics Corp Molded article of polycarbonate resin composition and injection molding method thereof
JP2018506851A (en) * 2015-01-19 2018-03-08 コーニング インコーポレイテッド Housing with anti-fingerprint surface
US11229131B2 (en) 2015-01-19 2022-01-18 Corning Incorporated Enclosures having an anti-fingerprint surface
US10399905B2 (en) 2017-08-31 2019-09-03 Corning Incorporated Ceramic housing with texture
WO2020091399A1 (en) * 2018-10-30 2020-05-07 Lg Electronics Inc. Laundry treating apparatus
WO2023068568A1 (en) * 2021-10-18 2023-04-27 삼성전자 주식회사 Electronic device comprising housing, and method for manufacturing same

Also Published As

Publication number Publication date
JP4684099B2 (en) 2011-05-18

Similar Documents

Publication Publication Date Title
JP4684099B2 (en) Case for electronic equipment
TWI229061B (en) Translucent polycrystalline ceramic and method for making same
TWI747814B (en) Enclosures having an anti-fingerprint surface
CN111108464B (en) Cover member for input device and input device
JP5076334B2 (en) Mold having fine irregularities on its surface, method for producing the die, and method for producing an antiglare film using the die
JP5135871B2 (en) Anti-glare film, anti-glare polarizing plate and image display device
CN111788161A (en) Coated article with light altering features and method of producing same
KR101138264B1 (en) White ceramic
CN113165964B (en) High hardness article comprising an optical layer and method of making the same
JP2006210546A (en) Substrate holding board for exposure process and manufacturing method thereof
TW201119827A (en) Method for making an anti-glare film, and method for making a mold for manufacture of anti-glare film
WO2007108416A1 (en) Colored zirconia sintered body, method for producing the same, and decoration member
WO2018198983A1 (en) Decorative component
FR2893608A1 (en) Marking of a glass substrate surface using mechanical marking in the viscous state by contact and pressure against a marking material, notably for the provision of decorative effects
CN109752912B (en) Light-proof curtain cloth with hairline and preparation method thereof
JP2016005904A (en) Projection and communication board and method for manufacturing the same
JP2001348271A (en) Polishing compact and polishing surface plate using the same
KR101914861B1 (en) Cover glass with color coating
JP2021077033A (en) Glass film for input device
JP6491472B2 (en) Pellicle frame and method for manufacturing pellicle frame
JPH09120705A (en) Reflection mirror for illumination and its manufacture
JPH09207485A (en) Manufacture of composite ceramic ball for ball-point pen
JP3219361B2 (en) 58-hedron round brilliant cut diamond proportions
JP2011163815A (en) Timepiece component, manufacturing method thereof, and aesthetic treatment method of timepiece component
JPWO2020184415A1 (en) Articles with a glaze layer

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20080616

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20100908

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20100921

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20101122

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20110111

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20110208

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20140218

Year of fee payment: 3

R150 Certificate of patent or registration of utility model

Ref document number: 4684099

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

LAPS Cancellation because of no payment of annual fees