JP2007165830A - Mounting structure of electronic component - Google Patents

Mounting structure of electronic component Download PDF

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Publication number
JP2007165830A
JP2007165830A JP2006172746A JP2006172746A JP2007165830A JP 2007165830 A JP2007165830 A JP 2007165830A JP 2006172746 A JP2006172746 A JP 2006172746A JP 2006172746 A JP2006172746 A JP 2006172746A JP 2007165830 A JP2007165830 A JP 2007165830A
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Japan
Prior art keywords
underfill
electronic component
film
insulating film
mounting structure
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JP2006172746A
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JP4203513B2 (en
Inventor
Kazuo Chihiro
和夫 千尋
Tomoyuki Honma
友幸 本間
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Alps Alpine Co Ltd
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Alps Electric Co Ltd
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Priority to JP2006172746A priority Critical patent/JP4203513B2/en
Priority to TW096117637A priority patent/TW200805613A/en
Priority to CNB2007101121287A priority patent/CN100511663C/en
Priority to KR1020070060900A priority patent/KR100884038B1/en
Publication of JP2007165830A publication Critical patent/JP2007165830A/en
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Publication of JP4203513B2 publication Critical patent/JP4203513B2/en
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73201Location after the connecting process on the same surface
    • H01L2224/73203Bump and layer connectors
    • H01L2224/73204Bump and layer connectors the bump connector being embedded into the layer connector

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  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Die Bonding (AREA)
  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a low-cost mounting structure of electronic component with a small size where the spreading of underfill on an insulating coat is suppressed by a film removing portion. <P>SOLUTION: In the mounting structure of the electronic components, spreading of the underfill 8, prepared on the insulating coat 3, is controlled by the coat exception portion 6, and the spreading of the underfill 8 beyond it does not exist. Since the suppression effects of the spreading of the underfill 8 is not relevant to the thickness, the depth and the width of the film removing portion 6, the film removing portion 6 can be made thin, shallow and narrow, and low cost, and thus miniaturization and thinning of an insulating substrate 1 can be facilitated. <P>COPYRIGHT: (C)2007,JPO&amp;INPIT

Description

本発明は、種々の電気機器や電子回路ユニット等に使用して好適な電子部品の実装構造に関するものである。 The present invention relates to an electronic component mounting structure suitable for use in various electrical devices, electronic circuit units, and the like.

従来の電子部品の実装構造に係る図面を説明すると、図16は従来の電子部品の実装構造を示す説明図であり、次に、従来の電子部品の実装構造の構成を図16に基づいて説明すると、絶縁基板51上に設けられた配線パターン52には、バンプ53によって電子部品54が取り付けられる。   FIG. 16 is an explanatory view showing a mounting structure of a conventional electronic component. Next, the configuration of the mounting structure of the conventional electronic component will be described with reference to FIG. Then, the electronic component 54 is attached to the wiring pattern 52 provided on the insulating substrate 51 by the bumps 53.

また、電子部品54の領域を除く絶縁基板51上と配線パターン52上には、絶縁皮膜55が設けられ、この絶縁皮膜55は、電子部品54の領域を含む箇所に皮膜除去部55aが設けられ、この皮膜除去部55aの絶縁基板51と電子部品54との間には、樹脂からなるアンダーフィル56が設けられて、このアンダーフィル56は、皮膜除去部55aの縁部によって流出が防止された構成となっている(例えば、特許文献1参照)。
特開平11−214586号公報
An insulating film 55 is provided on the insulating substrate 51 and the wiring pattern 52 except for the area of the electronic component 54, and the insulating film 55 is provided with a film removing portion 55 a at a location including the area of the electronic component 54. An underfill 56 made of resin is provided between the insulating substrate 51 and the electronic component 54 of the film removing portion 55a, and the underfill 56 is prevented from flowing out by the edge of the film removing portion 55a. It has a configuration (see, for example, Patent Document 1).
Japanese Patent Laid-Open No. 11-214586

しかし、従来の電子部品の実装構造において、アンダーフィル56は、皮膜除去部55aの縁部によって流出が防止されるため、アンダーフィル56の広がりを防止するために絶縁皮膜55を厚膜にする必要があり、この場合、厚膜の絶縁皮膜55の形成が面倒で、コスト高になり、また、アンダーフィル56の広がりを防止するために絶縁皮膜55を薄膜にすると、皮膜除去部55aを広くする必要があり、この場合、絶縁基板51が大型になるという問題がある。   However, in the conventional electronic component mounting structure, the underfill 56 is prevented from flowing out by the edge of the film removal portion 55a, so that the insulating film 55 needs to be thick to prevent the underfill 56 from spreading. In this case, the formation of the thick insulating film 55 is cumbersome and expensive, and if the insulating film 55 is made thin in order to prevent the underfill 56 from spreading, the film removal portion 55a is widened. In this case, there is a problem that the insulating substrate 51 becomes large.

本発明は、このような従来技術の実情に鑑みてなされたもので、その目的は、絶縁皮膜上のアンダーフィルが皮膜除去部によって広がりを抑制されて、小型で、安価な電子部品の実装構造を提供することにある。   The present invention has been made in view of such a state of the art, and the object thereof is to achieve a compact and inexpensive electronic component mounting structure in which the underfill on the insulating film is suppressed from being spread by the film removing portion. Is to provide.

上記の目的を達成するために、本発明は、複数の端子が設けられた絶縁基板と、端子を避けた状態で絶縁基板上に設けられた絶縁皮膜と、本体部の下面に設けられた電極が端子に接続された電子部品と、絶縁皮膜と電子部品との間、及び絶縁基板と電子部品との間に設けられた樹脂からなるアンダーフィルとを備え、絶縁皮膜は、本体部の近傍に設けられた皮膜除去部を有し、絶縁皮膜上に設けられたアンダーフィルが皮膜除去部によって広がりを抑制されたことを特徴としている。   To achieve the above object, the present invention provides an insulating substrate provided with a plurality of terminals, an insulating film provided on the insulating substrate while avoiding the terminals, and an electrode provided on the lower surface of the main body. And an underfill made of a resin provided between the insulating film and the electronic component and between the insulating substrate and the electronic component, and the insulating film is disposed in the vicinity of the main body. It has the film removal part provided, The underfill provided on the insulating film was suppressed by the film removal part.

このように構成した本発明は、絶縁皮膜上に設けられたアンダーフィルの広がりが皮膜除去部によって抑制されて、それ以上のアンダーフィルの広がりが無くなり、アンダーフィルの広がりの抑制効果は、皮膜除去部の厚さ、深さ、幅に拘わらないため、皮膜除去部を薄く、浅く、幅狭にでき、安価で、絶縁基板の小型化や薄型化が容易にできる。   In the present invention configured as described above, the spread of the underfill provided on the insulating film is suppressed by the film removal unit, and no further underfill spread is eliminated. Since the thickness, depth, and width of the portion are not concerned, the film removal portion can be made thin, shallow, narrow, inexpensive, and the insulating substrate can be easily reduced in size and thickness.

また、本発明は、上記発明において、皮膜除去部は、本体部を囲むように設けられ、アンダーフィルが皮膜除去部の縁部で止まったことを特徴としている。このように構成した本発明は、本体部を囲む皮膜除去部によって、アンダーフィルの広がりの防止を一層確実にできる。   Further, the present invention is characterized in that, in the above-mentioned invention, the film removal portion is provided so as to surround the main body portion, and the underfill stops at the edge of the film removal portion. In the present invention configured as described above, it is possible to more reliably prevent the underfill from spreading due to the film removal portion surrounding the main body portion.

また、本発明は、上記発明において、電子部品が半導体チップで形成されたことを特徴としている。このように構成した本発明は、アンダーフィルによって取付補強が必要な半導体チップにおいて好適である。   According to the present invention, in the above invention, the electronic component is formed of a semiconductor chip. The present invention configured as described above is suitable for a semiconductor chip that requires mounting reinforcement by underfill.

また、本発明は、上記発明において、皮膜除去部に位置する絶縁皮膜の側面と絶縁基板の表面との間の角度が80度〜90度の範囲で形成されたことを特徴としている。このように構成した本発明は、絶縁皮膜の表面端部でのアンダーフィルの止まりを良好にできて、絶縁皮膜とアンダーフィルとで作られる接触角を大きくできる。   Moreover, the present invention is characterized in that, in the above-mentioned invention, the angle between the side surface of the insulating film located at the film removing portion and the surface of the insulating substrate is formed in the range of 80 degrees to 90 degrees. The present invention configured as described above can satisfactorily stop the underfill at the surface edge portion of the insulating film, and can increase the contact angle formed by the insulating film and the underfill.

また、本発明は、上記発明において、アンダーフィルが液状である時、絶縁皮膜とアンダーフィルとで作られる接触角が90度〜135度にしたことを特徴としている。このように構成した本発明は、この液状のアンダーフィルの接触角が90度未満になると、アンダーフィル8の流動性が高くなって、アンダーフィル8が広く流れ出る状態となり、また、液状のアンダーフィルの接触角が135度を越えると、アンダーフィルの流動性が低くなって、アンダーフィル8の流れが悪くなることから、接触角が90度〜135度の範囲にすると、アンダーフィルの流動性が低くもなく、高くもない範囲にできて、絶縁皮膜とアンダーフィルとが濡れにくい状態となる。   Moreover, the present invention is characterized in that, in the above invention, when the underfill is in a liquid state, the contact angle formed by the insulating film and the underfill is 90 degrees to 135 degrees. In the present invention configured as described above, when the contact angle of the liquid underfill is less than 90 degrees, the fluidity of the underfill 8 becomes high and the underfill 8 flows out widely. If the contact angle exceeds 135 degrees, the fluidity of the underfill decreases and the flow of the underfill 8 deteriorates. Therefore, when the contact angle is in the range of 90 to 135 degrees, the fluidity of the underfill is low. It can be in a range that is neither low nor high, and the insulating film and the underfill are not easily wetted.

また、本発明は、上記発明において、絶縁被膜とアンダーフィルがエポキシ系の樹脂で形成されたことを特徴としている。このように構成した本発明は、アンダーフィルの流動性が低くもなく、高くもない状態の接触角が90度〜135度の範囲のものが容易に得られる。   Further, the present invention is characterized in that, in the above invention, the insulating coating and the underfill are formed of an epoxy resin. According to the present invention configured as described above, a fluid having a contact angle in the range of 90 degrees to 135 degrees in a state where the fluidity of the underfill is neither low nor high is easily obtained.

本発明は、絶縁皮膜上に設けられたアンダーフィルの広がりが皮膜除去部によって抑制されて、それ以上のアンダーフィルの広がりが無くなり、アンダーフィルの広がりの抑制効果は、皮膜除去部の厚さ、深さ、幅に拘わらないため、皮膜除去部を薄く、浅く、幅狭にでき、安価で、絶縁基板の小型化や薄型化が容易にできる。   In the present invention, the spread of the underfill provided on the insulating film is suppressed by the film removal portion, and there is no further spread of the underfill, and the effect of suppressing the spread of the underfill is the thickness of the film removal portion, Since the depth and width are not concerned, the film removal portion can be made thin, shallow and narrow, inexpensive, and the insulating substrate can be easily reduced in size and thickness.

発明の実施の形態について図面を参照して説明すると、図1は本発明の電子部品の実装構造に係る要部断面図、図2は本発明の電子部品の実装構造に係る絶縁基板の平面図、図3は図1のA部分の拡大図、図4は本発明の電子部品の実装方法を示す正面図、図5は本発明の電子部品の実装方法を示す平面図、図6は本発明の電子部品の実装方法に係り、液状のアンダーフィルの第1の流れ状態を示す説明図、図7は本発明の電子部品の実装方法に係り、液状のアンダーフィルの第2の流れ状態を示す説明図、図8は本発明の電子部品の実装方法に係り、液状のアンダーフィルの第3の流れ状態を示す説明図、図9は本発明の電子部品の実装方法に係り、液状のアンダーフィルの第4の流れ状態を示す説明図である。   An embodiment of the invention will be described with reference to the drawings. FIG. 1 is a cross-sectional view of a main part according to the electronic component mounting structure of the present invention, and FIG. 2 is a plan view of an insulating substrate according to the electronic component mounting structure of the present invention. 3 is an enlarged view of a portion A in FIG. 1, FIG. 4 is a front view showing the electronic component mounting method of the present invention, FIG. 5 is a plan view showing the electronic component mounting method of the present invention, and FIG. FIG. 7 shows a second flow state of the liquid underfill according to the electronic component mounting method of the present invention. FIG. 8 is an explanatory diagram showing a third flow state of the liquid underfill according to the electronic component mounting method of the present invention, and FIG. 9 is a liquid underfill according to the electronic component mounting method of the present invention. It is explanatory drawing which shows the 4th flow state.

また、図10は本発明の電子部品の実装構造に係り、絶縁皮膜における皮膜除去部の形成方法に係る第1工程を示す説明図、図11は本発明の電子部品の実装構造に係り、絶縁皮膜における皮膜除去部の形成方法に係る第2工程を示す説明図、図12は本発明の電子部品の実装構造の他の実施形態に係る要部断面図、図13は図12のB部分の拡大図、図14は本発明の電子部品の実装構造の他の実施形態に係り、絶縁皮膜における皮膜除去部の形成方法に係る第1工程を示す説明図、図15は本発明の電子部品の実装構造の他の実施形態に係り、絶縁皮膜における皮膜除去部の形成方法に係る第2工程を示す説明図である。   FIG. 10 relates to the electronic component mounting structure of the present invention, and is an explanatory view showing a first step relating to the method of forming the film removal portion in the insulating film, and FIG. 11 relates to the electronic component mounting structure of the present invention, insulating. FIG. 12 is an explanatory view showing a second step according to the method for forming the film removal portion in the film, FIG. 12 is a cross-sectional view of the main part according to another embodiment of the electronic component mounting structure of the present invention, and FIG. FIG. 14 is an enlarged view, FIG. 14 relates to another embodiment of the electronic component mounting structure of the present invention, and is an explanatory view showing a first step relating to a method of forming a film removal portion in an insulating film, and FIG. It is explanatory drawing which concerns on other embodiment of a mounting structure and shows the 2nd process which concerns on the formation method of the film removal part in an insulating film.

次に、本発明の電子部品の実装構造に係る構成を図1〜図3に基づいて説明すると、積層基板等からなる絶縁基板1上には、配線パターンの一部である複数の端子2が設けられ、この端子2は、四角線に沿って四角状(ロ字状)に2列に配列されている。   Next, the configuration of the electronic component mounting structure according to the present invention will be described with reference to FIGS. 1 to 3. On the insulating substrate 1 made of a laminated substrate or the like, a plurality of terminals 2 that are part of a wiring pattern are provided. The terminals 2 are arranged in two rows in a square shape (b-shaped) along the square line.

また、この絶縁基板1上には、端子2を避けた状態で、エポキシ系の樹脂からなる半田レジスト等の絶縁皮膜3が設けられ、この絶縁皮膜3は、端子2の配列に沿って設けられた帯状の第1の皮膜除去部4を有し、この第1の皮膜除去部4は、四角状(ロ字状)をなし、四角状の互いに平行な第1の線に位置する第1の削除部4aと、この第1の削除部4aに繋がり、四角状の互いに平行な第2の線に位置する第2の削除部4bを有する。   An insulating film 3 such as a solder resist made of an epoxy resin is provided on the insulating substrate 1 while avoiding the terminals 2, and the insulating film 3 is provided along the arrangement of the terminals 2. The first film removing unit 4 has a rectangular shape (b-shaped), and the first film removing unit 4 has a first shape located on a first line parallel to each other. It has the deletion part 4a and the 2nd deletion part 4b which is connected to this 1st deletion part 4a, and is located in a square-shaped 2nd mutually parallel line.

更に、絶縁皮膜3は、第1の皮膜除去部4で囲まれた位置に設けられた島状の皮膜部3aを有すると共に、第1の削除部4aの端部から第1の削除部4aと一直線状に延びる第2の皮膜削除部5,及び一方の第1の削除部4aの中央近傍から直角に外方に延びる第2の皮膜除去部5と、この第2の皮膜除去部5に繋がる環状の第3の皮膜除去部6を有する。   Furthermore, the insulating film 3 has an island-shaped film portion 3a provided at a position surrounded by the first film removal portion 4, and the first deletion portion 4a and the first deletion portion 4a from the end of the first deletion portion 4a. The second film removal section 5 extending in a straight line and the second film removal section 5 extending outward at right angles from the vicinity of the center of the first deletion section 4a are connected to the second film removal section 5. An annular third film removal unit 6 is provided.

そして、絶縁皮膜3は、25μ程度の厚さを有し、端子2の厚さ(10μm)よりも厚く、また、第1,第2の皮膜除去部4,5の幅は、10μm以上で形成されている。   The insulating film 3 has a thickness of about 25 μm, which is thicker than the thickness of the terminal 2 (10 μm), and the widths of the first and second film removing portions 4 and 5 are 10 μm or more. Has been.

半導体チップ等からなる直方体状の電子部品7は、本体部7aと、本体部7aの下面に設けられ、四角状(ロ字状)に配列された複数の電極7bを有し、この電子部品7は、電極7bが半田やボールグリッドアレイ等によって端子2に接続して取り付けられている。   A rectangular parallelepiped electronic component 7 made of a semiconductor chip or the like has a main body portion 7a and a plurality of electrodes 7b provided on the lower surface of the main body portion 7a and arranged in a square shape (in a square shape). The electrode 7b is attached to the terminal 2 by soldering or ball grid array.

この時、皮膜部3aは、本体部7aの中央部に位置し、第2の皮膜除去部5は、本体部7aの周縁から外側に突出し、第3の皮膜除去部6は、本体部7aの近傍を囲むように配置されると共に、絶縁基板1と本体部7aの下面間は、50〜80μm程度の寸法となっていると共に、第1,第2,第3の皮膜除去部4,5,6における絶縁皮膜3の側面と絶縁基板1の表面との間の角度K1は、特に図3に示すように、90度で形成されている。   At this time, the film part 3a is located at the center of the main body part 7a, the second film removal part 5 protrudes outward from the peripheral edge of the main body part 7a, and the third film removal part 6 is formed of the main body part 7a. It is arranged so as to surround the vicinity, and the space between the lower surface of the insulating substrate 1 and the main body portion 7a is about 50 to 80 μm, and the first, second and third film removing portions 4, 5, 6, the angle K1 between the side surface of the insulating film 3 and the surface of the insulating substrate 1 is 90 degrees as shown in FIG.

エポキシ系の樹脂からなるアンダーフィル8は、絶縁皮膜3と本体部7aの下面間、絶縁基板1と本体部7aの下面間、及び本体部7aの周縁部に設けられて、電子部品7の取付を強固にするようになっており、そして、本体部7aの周縁部からはみ出し、はみ出したアンダーフィル8は、広がり抑制用の第3の皮膜除去部6によってその縁部で広がりが抑制されていて、第3の皮膜除去部6の縁部における液状のアンダーフィル8は、図3に示すように、絶縁皮膜3とアンダーフィル8とで作られる接触角が90度〜135度の範囲になっている。   The underfill 8 made of epoxy resin is provided between the insulating film 3 and the lower surface of the main body portion 7a, between the insulating substrate 1 and the lower surface of the main body portion 7a, and at the peripheral edge portion of the main body portion 7a. The underfill 8 that protrudes and protrudes from the peripheral edge of the main body portion 7a is suppressed from spreading at the edge by the third film removal portion 6 for suppressing spread. As shown in FIG. 3, the liquid underfill 8 at the edge of the third film removal portion 6 has a contact angle formed by the insulating film 3 and the underfill 8 in the range of 90 to 135 degrees. Yes.

この液状のアンダーフィル8の接触角が90度未満になると、アンダーフィル8の流動性が高くなって、アンダーフィル8が広く流れ出る状態となり、また、液状のアンダーフィル8の接触角が135度を越えると、アンダーフィル8の流動性が低くなって、アンダーフィル8の流れが悪くなり、そして、接触角が90度〜135度の範囲にすると、絶縁皮膜3とアンダーフィル8とが濡れにくい状態となる。   When the contact angle of the liquid underfill 8 is less than 90 degrees, the fluidity of the underfill 8 becomes high and the underfill 8 flows out widely, and the contact angle of the liquid underfill 8 increases to 135 degrees. If it exceeds, the fluidity of the underfill 8 becomes low, the flow of the underfill 8 becomes poor, and when the contact angle is in the range of 90 to 135 degrees, the insulating film 3 and the underfill 8 are difficult to wet. It becomes.

次に、本発明の電子部品の実装方法について図4〜図9に基づいて説明すると、先ず、図4,図5に示すように、液状のアンダーフィル8を注入するためのディスペンサ9が電子部品7の周縁で、中央近傍に第2の皮膜除去部5が設けられた第1の削除部4aと対向するもう一つの第1の削除部4aと直交する位置に配置される。   Next, the electronic component mounting method of the present invention will be described with reference to FIGS. 4 to 9. First, as shown in FIGS. 4 and 5, the dispenser 9 for injecting the liquid underfill 8 is an electronic component. 7 is arranged at a position orthogonal to another first deletion portion 4a opposite to the first deletion portion 4a provided with the second film removal portion 5 in the vicinity of the center.

この状態で、ディスペンサ9によって液状のアンダーフィル8が注入されると、図6に示すように、アンダーフィル8は、絶縁皮膜3と本体部7a間のギャップが小さいため、その間に毛細管現象によって流れ込み、次に、この絶縁皮膜3と本体部7a間で溢れたアンダーフィル8がディスペンサ9に近い第1の削除部4aに毛細管現象によって流れ込む。   In this state, when the liquid underfill 8 is injected by the dispenser 9, as shown in FIG. 6, since the gap between the insulating film 3 and the main body portion 7a is small, the underfill 8 flows in by capillary action therebetween. Next, the underfill 8 overflowing between the insulating film 3 and the main body portion 7 a flows into the first deletion portion 4 a close to the dispenser 9 by capillary action.

そして、第1の削除部4aから溢れたアンダーフィル8は、ギャップの小さい皮膜部3aと本体部7a間に流れ込むようになると共に、第2の皮膜除去部5の縁部に位置したアンダーフィル8は、その量が少ないために、アンダーフィル8の粘性によって第2の皮膜除去部5の縁部に止まって、第2の皮膜除去部5内に流入しない状態にある。   The underfill 8 overflowing from the first deletion portion 4a flows between the coating portion 3a having a small gap and the main body portion 7a, and is located at the edge of the second coating removal portion 5. Since the amount thereof is small, it stops at the edge of the second film removing portion 5 due to the viscosity of the underfill 8 and does not flow into the second film removing portion 5.

更に、液状のアンダーフィル8を注入すると、図7に示すように、ギャップの小さい絶縁皮膜3と本体部7a間でアンダーフィル8の流入が先行しながら、漸次ギャップの大きな第2の削除部4bがアンダーフィル8によって埋められるようになって、ディスペンサ9に遠い位置にある第1の削除部4aと第2の削除部4の一部が残された状態になると共に、この間では、空気が第2の皮膜除去部5から排出されるようになる。   Further, when the liquid underfill 8 is injected, as shown in FIG. 7, the second deleted portion 4b having a gradually larger gap is introduced while the inflow of the underfill 8 precedes between the insulating film 3 having a small gap and the main body portion 7a. Is filled with the underfill 8, and a part of the first deletion portion 4a and the second deletion portion 4 which are far from the dispenser 9 is left, and during this time, air is 2 is discharged from the film removal section 5.

更に、液状のアンダーフィル8を注入すると、図8に示すように、ディスペンサ9に遠い位置にある第1の削除部4aの一部と第2の皮膜除去部5が残された状態になり、続いて、液状のアンダーフィル8を注入すると、ディスペンサ9に遠い位置にある第1の削除部4aの一部に存在する空気が第2の皮膜除去部5から排出されて、図9に示すような状態となる。   Furthermore, when the liquid underfill 8 is injected, as shown in FIG. 8, a part of the first deletion portion 4a and the second film removal portion 5 which are located far from the dispenser 9 are left, Subsequently, when the liquid underfill 8 is injected, the air present in a part of the first deletion portion 4a located far from the dispenser 9 is discharged from the second film removal portion 5 as shown in FIG. It becomes a state.

そして、図9の状態では、本体部7aの下面から溢れたアンダーフィル8は、本体部7aの周縁を埋めると共に、一部は第3の皮膜除去部6側に流出するが、この第3の皮膜除去部6がアンダーフィル8の堰となり、図3に示すような接触角を持って、アンダーフィル8のそれ以上の流出が阻止され、電子部品の実装が完了する。   In the state of FIG. 9, the underfill 8 overflowing from the lower surface of the main body portion 7a fills the periphery of the main body portion 7a and partly flows out to the third film removal portion 6 side. The film removal unit 6 becomes a weir for the underfill 8, has a contact angle as shown in FIG. 3, and further outflow of the underfill 8 is prevented, and the mounting of the electronic component is completed.

次に、本発明の絶縁皮膜における皮膜除去部の形成方法の一例を図10,図11に基づいて説明すると、先ず、図10に示すように、端子2を形成した絶縁基板1上には、端子2を覆った状態で、印刷等によって感光性の絶縁皮膜3を形成したものを用意する。   Next, an example of a method for forming the film removal portion in the insulating film of the present invention will be described with reference to FIGS. 10 and 11. First, as shown in FIG. 10, on the insulating substrate 1 on which the terminals 2 are formed, In a state where the terminal 2 is covered, a photosensitive insulating film 3 is prepared by printing or the like.

次に、図10に示す第1工程として、第1,第2,第3の皮膜除去部4,5,6の位置に光透過部11aを有したマスク11を用意し、このマスク11が絶縁皮膜3上に載置された後、光源12による平行光線によって、絶縁被膜3を露光する。   Next, as a first step shown in FIG. 10, a mask 11 having a light transmitting portion 11a is prepared at the positions of the first, second, and third film removing portions 4, 5, and 6, and this mask 11 is insulated. After being placed on the film 3, the insulating film 3 is exposed by parallel light rays from the light source 12.

次に、図11に示す第2工程として、マスク11を取り除いた状態で、絶縁皮膜3を現像すると、図11や図3に示すように、光透過部11aによって光が当たった部分が除去されて、第1,第2,第3の皮膜除去部4,5,6が形成されると共に、第1,第2,第3の皮膜除去部4,5,6における絶縁皮膜3の側面と絶縁基板1の表面との間の角度K1は、90度で形成されるようになって、皮膜除去部の形成が完了する。   Next, as a second step shown in FIG. 11, when the insulating film 3 is developed in a state where the mask 11 is removed, as shown in FIG. 11 and FIG. Thus, the first, second, and third film removing portions 4, 5, and 6 are formed, and the side surfaces of the insulating film 3 in the first, second, and third film removing portions 4, 5, and 6 are insulated. The angle K1 with the surface of the substrate 1 is formed at 90 degrees, and the formation of the film removal portion is completed.

また、図12,図13は本発明の電子部品の実装構造の他の実施形態を示し、この他の実施形態を説明すると、第1,第2,第3の皮膜除去部4,5,6における絶縁皮膜3の側面と絶縁基板1の表面との間の角度K2が80度程度で形成されたものであり、その他の構成は、上記実施例と同様の構成を有し、同一部品に同一番号を付し、ここではその説明を省略する。   FIGS. 12 and 13 show other embodiments of the electronic component mounting structure of the present invention. The other embodiments will be described. First, second, and third film removing portions 4, 5, and 6 are described. The angle K2 between the side surface of the insulating film 3 and the surface of the insulating substrate 1 is formed at about 80 degrees, and the other configurations are the same as those in the above embodiment and are the same as the same parts. A number is assigned and description thereof is omitted here.

そして、角度K2が80度程度で形成されると、特に、図13で示す第3の被膜除去部6の位置にあっては、絶縁被膜3の表面端部からのアンダーフィル8の絶縁基板1の表面(第3の被膜除去部6)への落ち込みを極力抑えることができて、絶縁皮膜3の表面端部でのアンダーフィル8の止まりを良好にでき、絶縁皮膜3とアンダーフィル8とで作られる接触角を大きくできる。   When the angle K2 is formed at about 80 degrees, the insulating substrate 1 of the underfill 8 from the surface end portion of the insulating coating 3 particularly at the position of the third coating removal portion 6 shown in FIG. Can be suppressed as much as possible to the surface (third coating removal portion 6), and the underfill 8 can be satisfactorily stopped at the surface edge of the insulating coating 3, and the insulating coating 3 and the underfill 8 The contact angle made can be increased.

また、本発明の他の実施形態における電子部品の実装方法は、前記実施例と同様の方法に行われるため、ここではその説明を省略する。   In addition, since the electronic component mounting method according to another embodiment of the present invention is performed in the same manner as in the above-described example, the description thereof is omitted here.

次に、本発明の他の実施形態に係る絶縁皮膜における皮膜除去部の形成方法の一例を図14,図15に基づいて説明すると、先ず、図14に示すように、端子2を形成した絶縁基板1上には、端子2を覆った状態で、印刷等によって感光性の絶縁皮膜3を形成したものを用意すると共に、第1,第2,第3の皮膜除去部4,5,6の位置に光透過部11aを有したマスク11を用意する。   Next, an example of a method for forming a film removal portion in an insulating film according to another embodiment of the present invention will be described with reference to FIGS. 14 and 15. First, as shown in FIG. On the substrate 1, there is prepared a photosensitive insulating film 3 formed by printing or the like with the terminal 2 covered, and the first, second and third film removing portions 4, 5, 6. A mask 11 having a light transmission part 11a at a position is prepared.

次に、図14に示す第1工程として、マスク11を絶縁皮膜3上に載置すると共に、マスク11と光源12との間には、区画壁13aによって格子状に区画された光透過孔13bを有した光散乱部材13を配置し、光源12の移動によって、光透過孔13bから絶縁被膜3を露光する。   Next, as a first step shown in FIG. 14, the mask 11 is placed on the insulating film 3, and the light transmission holes 13 b partitioned in a lattice pattern by the partition walls 13 a between the mask 11 and the light source 12. The light-scattering member 13 having the above is disposed, and the insulating coating 3 is exposed from the light transmission hole 13 b by the movement of the light source 12.

すると、光透過孔13bを通った光は、マスク11に対して垂直光と傾斜光となり、この垂直光と傾斜光が光透過部11aを通って絶縁被膜3を露光するようになっている。   Then, the light passing through the light transmission hole 13b becomes vertical light and inclined light with respect to the mask 11, and the vertical light and the inclined light pass through the light transmitting portion 11a to expose the insulating coating 3.

次に、図15に示す第2工程として、マスク11を取り除いた状態で、絶縁皮膜3を現像すると、図15や図13に示すように、光透過部11aによって光が当たった部分が除去されて、第1,第2,第3の皮膜除去部4,5,6が形成されると共に、第1,第2,第3の皮膜除去部4,5,6における絶縁皮膜3の側面と絶縁基板1の表面との間の角度K2は、80度程度(鋭角)で形成されるようになって、皮膜除去部の形成が完了する。   Next, as a second step shown in FIG. 15, when the insulating film 3 is developed in a state where the mask 11 is removed, as shown in FIG. 15 and FIG. Thus, the first, second, and third film removing portions 4, 5, and 6 are formed, and the side surfaces of the insulating film 3 in the first, second, and third film removing portions 4, 5, and 6 are insulated. The angle K2 between the substrate 1 and the surface of the substrate 1 is formed at about 80 degrees (acute angle), and the formation of the film removal portion is completed.

なお、この実施形態において、光散乱部材13の光透過孔13bの開口部の大きさや長さを変えることによって、鋭角の角度K2の度合いを変更することができる。   In this embodiment, the degree of the acute angle K2 can be changed by changing the size or length of the opening of the light transmission hole 13b of the light scattering member 13.

本発明の電子部品の実装構造に係る要部断面図である。It is principal part sectional drawing which concerns on the mounting structure of the electronic component of this invention. 本発明の電子部品の実装構造に係る絶縁基板の平面図である。It is a top view of the insulated substrate which concerns on the mounting structure of the electronic component of this invention. 図1のA部分の拡大図である。It is an enlarged view of the A part of FIG. 本発明の電子部品の実装方法を示す正面図である。It is a front view which shows the mounting method of the electronic component of this invention. 本発明の電子部品の実装方法を示す平面図であるIt is a top view which shows the mounting method of the electronic component of this invention. 本発明の電子部品の実装方法に係り、液状のアンダーフィルの第1の流れ状態を示す説明図である。It is explanatory drawing which shows the 1st flow state of a liquid underfill regarding the mounting method of the electronic component of this invention. 本発明の電子部品の実装方法に係り、液状のアンダーフィルの第2の流れ状態を示す説明図である。It is explanatory drawing which shows the 2nd flow state of a liquid underfill regarding the mounting method of the electronic component of this invention. 本発明の電子部品の実装方法に係り、液状のアンダーフィルの第3の流れ状態を示す説明図である。It is explanatory drawing which shows the 3rd flow state of a liquid underfill regarding the mounting method of the electronic component of this invention. 本発明の電子部品の実装方法に係り、液状のアンダーフィルの第4の流れ状態を示す説明図である。It is explanatory drawing which shows the 4th flow state of a liquid underfill regarding the mounting method of the electronic component of this invention. 本発明の電子部品の実装構造に係り、絶縁皮膜における皮膜除去部の形成方法に係る第1工程を示す説明図である。It is explanatory drawing which shows the 1st process which concerns on the mounting structure of the electronic component of this invention, and forms the film removal part in an insulating film. 本発明の電子部品の実装構造に係り、絶縁皮膜における皮膜除去部の形成方法に係る第2工程を示す説明図である。It is explanatory drawing which shows the 2nd process which concerns on the mounting structure of the electronic component of this invention, and forms the film removal part in an insulating film. 本発明の電子部品の実装構造の他の実施形態に係る要部断面図である。It is principal part sectional drawing which concerns on other embodiment of the mounting structure of the electronic component of this invention. 図12のB部分の拡大図である。It is an enlarged view of B part of FIG. 本発明の電子部品の実装構造の他の実施形態に係り、絶縁皮膜における皮膜除去部の形成方法に係る第1工程を示す説明図である。It is explanatory drawing which concerns on other embodiment of the mounting structure of the electronic component of this invention, and shows the 1st process which concerns on the formation method of the film removal part in an insulating film. 本発明の電子部品の実装構造の他の実施形態に係り、絶縁皮膜における皮膜除去部の形成方法に係る第2工程を示す説明図である。It is explanatory drawing which concerns on other embodiment of the mounting structure of the electronic component of this invention, and shows the 2nd process which concerns on the formation method of the film removal part in an insulating film. 従来の電子部品の実装構造、及びその実装方法を示す説明図である。It is explanatory drawing which shows the mounting structure of the conventional electronic component, and its mounting method.

符号の説明Explanation of symbols

1 絶縁基板
2 端子
3 絶縁皮膜
3a 皮膜部
4 第1の皮膜除去部
4a 第1の削除部
4b 第2の削除部
5 第2の皮膜除去部
6 第3の皮膜除去部
7 電子部品
7a 本体部
7b 電極
8 アンダーフィル
9 ディスペンサ
K1,K2 角度
11 マスク
11a 光透過部
12 光源
13 光散乱部材
13a 区画壁
13b 光透過孔
DESCRIPTION OF SYMBOLS 1 Insulating substrate 2 Terminal 3 Insulating film 3a Film part 4 1st film removal part 4a 1st deletion part 4b 2nd deletion part 5 2nd film removal part 6 3rd film removal part 7 Electronic component 7a Main body part 7b Electrode 8 Underfill 9 Dispenser K1, K2 Angle 11 Mask 11a Light transmission part 12 Light source 13 Light scattering member 13a Partition wall 13b Light transmission hole

Claims (6)

複数の端子が設けられた絶縁基板と、前記端子を避けた状態で前記絶縁基板上に設けられた絶縁皮膜と、本体部の下面に設けられた電極が前記端子に接続された電子部品と、前記絶縁皮膜と前記電子部品との間、及び前記絶縁基板と前記電子部品との間に設けられた樹脂からなるアンダーフィルとを備え、前記絶縁皮膜は、前記本体部の近傍に設けられた皮膜除去部を有し、前記絶縁皮膜上に設けられた前記アンダーフィルが前記皮膜除去部によって広がりを抑制されたことを特徴とする電子部品の実装構造。 An insulating substrate provided with a plurality of terminals, an insulating film provided on the insulating substrate in a state avoiding the terminals, an electronic component in which an electrode provided on the lower surface of the main body is connected to the terminals, An underfill made of a resin provided between the insulating film and the electronic component and between the insulating substrate and the electronic component, the insulating film being a film provided in the vicinity of the main body portion A mounting structure for an electronic component, comprising: a removal portion, wherein the underfill provided on the insulating film is suppressed from spreading by the film removal portion. 前記皮膜除去部は、前記本体部を囲むように設けられ、前記アンダーフィルが前記皮膜除去部の縁部で止まったことを特徴とする請求項1記載の電子部品の実装構造。 2. The electronic component mounting structure according to claim 1, wherein the film removal portion is provided so as to surround the main body portion, and the underfill stops at an edge of the film removal portion. 前記電子部品が半導体チップで形成されたことを特徴とする請求項1、又は2記載の電子部品の実装構造。 3. The electronic component mounting structure according to claim 1, wherein the electronic component is formed of a semiconductor chip. 前記皮膜除去部に位置する前記絶縁皮膜の側面と前記絶縁基板の表面との間の角度が80度〜90度の範囲で形成されたことを特徴とする請求項1から3の何れか1項に記載の電子部品の実装構造。 The angle between the side surface of the insulating film located at the film removing portion and the surface of the insulating substrate is formed in the range of 80 degrees to 90 degrees. Mounting structure for electronic components as described in 1. 前記アンダーフィルが液状である時、前記絶縁皮膜と前記アンダーフィルとで作られる接触角が90度〜135度にしたことを特徴とする請求項1から4の何れか1項に記載の電子部品の実装構造。 5. The electronic component according to claim 1, wherein when the underfill is in a liquid state, a contact angle formed by the insulating film and the underfill is set to 90 degrees to 135 degrees. Implementation structure. 前記絶縁被膜と前記アンダーフィルがエポキシ系の樹脂で形成されたことを特徴とする請求項5記載の電子部品の実装構造。 6. The electronic component mounting structure according to claim 5, wherein the insulating film and the underfill are formed of an epoxy-based resin.
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WO2009048097A1 (en) * 2007-10-10 2009-04-16 Nec Corporation Semiconductor device
JP2015177098A (en) * 2014-03-17 2015-10-05 株式会社デンソー semiconductor device

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CN102593016A (en) * 2012-03-20 2012-07-18 中国科学院微电子研究所 Method for mounting thin chip on flexible baseplate

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Publication number Priority date Publication date Assignee Title
WO2009048097A1 (en) * 2007-10-10 2009-04-16 Nec Corporation Semiconductor device
US8373284B2 (en) 2007-10-10 2013-02-12 Nec Corporation Semiconductor device
JP5446867B2 (en) * 2007-10-10 2014-03-19 日本電気株式会社 Semiconductor device
JP2015177098A (en) * 2014-03-17 2015-10-05 株式会社デンソー semiconductor device

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