JP2007163181A - Structure for measurement, measuring instrument, method and program - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To advantageously handle an object under measurement measured by thereto applying an electromagnetic wave. <P>SOLUTION: A sheet 15 is disposed on a surface of a lattice 1 comprising void parts 12 arranged in an X-direction and in a Y-direction on an XY plane, with the void parts 12 surrounded by conductors forming a conductor plate 10. With an open part of a container having the open part covered with an integral-type structure 2 made by disposing the object 20 under measurement on the sheet 15, a terahertz wave is applied to the object 20. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to handling of an object to be measured that is measured by irradiation with electromagnetic waves.

  Conventionally, it is known to analyze an object to be measured based on transmittance when the object to be measured is irradiated with a terahertz wave (see, for example, Patent Document 1). Moreover, the transmittance | permeability at the time of irradiating electromagnetic waves to what opened the hole in the metal plate is also known (for example, refer nonpatent literature 1). Furthermore, it is also known to use a metal plate having a hole as a retardation plate (see, for example, Patent Document 2).

Further, referring to Fig. 1 of Non-Patent Document 3, Terahertz Time Domain Spectroscopy (Terahertz Time Domain Spectroscopy)
Spectroscopy: THz-TDS) is also known.

JP 2004-108905 A JP 2004-117703 A K.F.Renk and L. Genzel “Interference Filters and Fabry-PerotInterferometers for the Far Infrared”, APPLIED OPTICS, Vol. 1, No. 5, September 1962 Masaki Tanaka et al., “Effect of a thin dielectric layer onterahertz transmission characteristics for metal hole arrays”, Optics Letters, Vol. 30, May 2005 Sakai Kiyomi, “Terahertz Time Domain Spectroscopy”, Spectroscopic Research, 2001, Vol. 50, No. 6, p. 261-273

  However, the prior art as described above does not disclose how it is advantageous to handle a measurement object irradiated with electromagnetic waves.

  Terahertz time domain spectroscopy is a complex measurement method.

  Then, this invention makes it a subject to handle the to-be-measured object measured by irradiating electromagnetic waves advantageously (for example, performing a simple measurement).

  The measurement structure according to the present invention is a measurement structure including a container having an open portion and an integrated structure that covers the open portion, and the integrated structure irradiates electromagnetic waves. An object whose characteristics are measured, a void arrangement structure in which a void surrounded by a conductor is arranged on a predetermined plane, and an arrangement on the surface of the void arrangement structure, the measurement object being arranged And an air inside the container is sucked, and the inside of the container is configured to be a space opposite to the arrangement member when viewed from the gap arrangement structure. .

  According to the measurement structure configured as described above, the container has an open portion. The integral structure covers the opening.

  Moreover, the integrated structure includes an object to be measured whose characteristics are measured by irradiating electromagnetic waves, a void arrangement structure in which a void portion surrounded by a conductor is arranged on a predetermined plane, and the void arrangement structure. And an arrangement member on which the object to be measured is arranged.

  Furthermore, the air inside the container is sucked. However, the inside of the container is a space on the side opposite to the arrangement member when viewed from the gap arrangement structure.

  A measurement structure according to the present invention is a measurement structure used for measuring an object whose characteristics are measured by irradiating an electromagnetic wave, the container having an open portion, and the open portion And the integrated structure is disposed on the surface of the void-arranged structure in which a void portion surrounded by a conductor is disposed in a predetermined plane. An arrangement member, wherein air inside the container is sucked, and the inside of the container is configured to be a space opposite to the arrangement member when viewed from the gap arrangement structure.

  According to the invention configured as described above, a measurement structure used for measuring an object to be measured whose characteristics are measured by irradiating electromagnetic waves is provided.

  The container has an opening. The integral structure covers the opening.

  In addition, the integrated structure includes a gap arrangement structure in which a gap surrounded by a conductor is arranged on a predetermined plane, and an arrangement member arranged on the surface of the gap arrangement structure.

  Furthermore, the air inside the container is sucked. However, the inside of the container is a space on the side opposite to the arrangement member when viewed from the gap arrangement structure.

  Moreover, the measurement structure according to the present invention may include a suction device that sucks air inside the container.

  Further, in the measurement structure according to the present invention, the gap arrangement structure may be configured such that the gap portions having the same shape are arranged at a predetermined interval in a predetermined direction.

  In the measurement structure according to the present invention, the gap arrangement structure may be a two-dimensional lattice in which openings penetrating the conductor are arranged in the vertical direction and the horizontal direction.

  In the measurement structure according to the present invention, there may be two or more types of the objects to be measured arranged on the arrangement member.

  A measuring apparatus according to the present invention includes a first electromagnetic wave irradiation means for irradiating the measurement structure according to any one of claims 1 to 4 with a first electromagnetic wave, and the integrated type with respect to the irradiated first electromagnetic wave. A first electromagnetic wave detecting means for detecting a first response electromagnetic wave that is a response by the structure; a second electromagnetic wave irradiating means for irradiating the gap arrangement structure with a second electromagnetic wave; and the gap arrangement for the irradiated second electromagnetic wave. Based on the second electromagnetic wave detection means for detecting the second response electromagnetic wave, which is a response by the structure, the detection result of the first electromagnetic wave detection means and the detection result of the second electromagnetic wave detection means, the characteristics of the object to be measured are measured. And a characteristic measuring means.

  The measuring apparatus according to the present invention includes an electromagnetic wave irradiation means for irradiating each type of the object to be measured in the measurement structure according to claim 5, and a response by the integrated structure to the irradiated electromagnetic wave. The electromagnetic wave detecting means for detecting the response electromagnetic wave and the characteristic measuring means for measuring the characteristic of the object to be measured based on the detection result of the electromagnetic wave detecting means.

  In the measuring apparatus according to the present invention, the bottom portion of the container facing the open portion may transmit the first response electromagnetic wave.

  In the measuring apparatus according to the present invention, the bottom portion of the container facing the open portion may transmit the response electromagnetic wave.

  Further, the measuring device according to the present invention includes a transmittance measuring unit that measures the transmittance of the electromagnetic wave based on the detection result of the first electromagnetic wave detecting unit and the detection result of the second electromagnetic wave detecting unit. And a refractive index deriving means for deriving the refractive index of the object to be measured based on the measured transmittance.

  Further, in the measuring apparatus according to the present invention, the refractive index deriving unit includes a transmittance measured based on a detection result of the first electromagnetic wave detecting unit at a frequency A and a detection result of the second electromagnetic wave detecting unit at a frequency B. The refractive index of the object to be measured may be derived based on A and B when the transmittance measured based on

  The present invention provides a first electromagnetic wave irradiation step for irradiating a measurement structure with a first electromagnetic wave, and a first electromagnetic wave detection for detecting a first response electromagnetic wave that is a response by the integrated structure to the irradiated first electromagnetic wave. A second electromagnetic wave irradiating step for irradiating the gap arrangement structure with the second electromagnetic wave, and a second electromagnetic wave detection for detecting a second response electromagnetic wave as a response to the irradiated second electromagnetic wave by the gap arrangement structure And a characteristic measuring step of measuring a characteristic of the object to be measured based on a detection result of the first electromagnetic wave detection step and a detection result of the second electromagnetic wave detection step.

  The present invention provides an electromagnetic wave irradiation process for irradiating each type of the measurement object in the measurement structure with an electromagnetic wave, and an electromagnetic wave detection process for detecting a response electromagnetic wave that is a response by the integrated structure to the irradiated electromagnetic wave. And a characteristic measurement step of measuring the characteristic of the object to be measured based on the detection result of the electromagnetic wave detection step.

  The present invention provides a first electromagnetic wave detection means for detecting a first response electromagnetic wave that is a response by the integrated structure to the irradiated first electromagnetic wave, and a first electromagnetic wave irradiation means for irradiating the measurement structure with the first electromagnetic wave. Means, a second electromagnetic wave irradiation means for irradiating the gap arrangement structure with the second electromagnetic wave, and a second electromagnetic wave detection for detecting a second response electromagnetic wave which is a response by the gap arrangement structure to the irradiated second electromagnetic wave A program for causing a computer to execute a measurement process in a measurement apparatus comprising: a detection result of the first electromagnetic wave detection means and a detection result of the second electromagnetic wave detection means; A program for causing a computer to execute a characteristic measurement process for measuring characteristics.

  The present invention provides an electromagnetic wave irradiating means for irradiating each type of the measurement object in the measurement structure with an electromagnetic wave, and an electromagnetic wave detecting means for detecting a response electromagnetic wave that is a response by the integrated structure to the irradiated electromagnetic wave. And a program for causing a computer to execute a characteristic measurement process for measuring a characteristic of the object to be measured based on a detection result of the electromagnetic wave detection means. It is a program.

  Embodiments of the present invention will be described below with reference to the drawings.

First Embodiment FIG. 1 is a perspective view of a lattice (gap arrangement structure) 1 according to a first embodiment. The lattice (gap arrangement structure) 1 includes a conductor plate 10. The conductor plate 10 is, for example, a metal plate. The direction of the thickness of the conductor plate 10 is the Z direction. A gap (opening) 12 is opened in the conductor plate 10. The gap 12 penetrates the conductor plate 10 in the Z direction. The gap 12 opens in the XY plane. The gaps 12 are arranged in the vertical direction (Y direction) and the horizontal direction (X direction). That is, the lattice 1 is a two-dimensional lattice.

  FIG. 2 is an XY plan view of the lattice (gap arrangement structure) 1 according to the first embodiment. Referring to FIG. 2, in a lattice (gap arrangement structure) 1, gaps (openings) 12 are arranged in two directions (X direction and Y direction) on the XY plane. The gap 12 is a square opening, and the lengths of one side (aperture) in the X direction and the Y direction are equal (assuming that they are a). Further, the pitch in the X direction and the pitch in the Y direction of the gap 12 are equal (assuming that they are p). Since a and p are about several tens of microns, it can be said that the lattice 1 is a so-called mesh.

  FIGS. 3A and 3B are an XY plan view (FIG. 3A) and a bb cross-sectional view (FIG. 3B) of the integrated structure 2 in which the DUT 20 is arranged on the surface of the grating 1. FIG. The integrated structure 2 has a sheet (arrangement member) 15. The sheet 15 is placed on the surface of the grid 1. Referring to FIG. 3A, it can be seen that the sheet 15 covers the gap 12 of the lattice 1 so that it cannot be seen. 3B, the back surface of the sheet 15 is in contact with the surface of the lattice 1, and the surface of the sheet 15 is an object to be measured 20 (for example, DNA, illustrated as a Y-shaped figure). Are arranged (for example, fixed). The sheet 15 is, for example, a nylon membrane used for DNA hybridization. DNA to be measured 20 can be fixed to the sheet 15 by soaking into the sheet 15 which is a nylon film.

  FIG. 4 is a plan view showing one vicinity of the gap 12 of the lattice 1. It can be said that the gap 12 is surrounded by the conductor 14 which is a part of the conductor plate 10 in the XY plane. Such voids 12 are arranged in the X direction and the Y direction.

  FIG. 5 is a plan view of the integrated structure 4 having two or more types of objects to be measured 20.

  FIG. 5A is a plan view of the integrated structure 4 in a state where two sheets 15 a and 15 b are placed on the lattice 1. The object to be measured 20 fixed to the sheet 15a is different from the object to be measured 20 fixed to the sheet 15b.

  FIG. 5B is a plan view of the integrated structure 4 in a state where the three sheets 15 c, 15 d, and 15 e are placed on the lattice 1. The object to be measured 20 fixed to the sheet 15c, the object to be measured 20 fixed to the sheet 15d, and the object to be measured 20 fixed to the sheet 15e are different. In this way, three or more kinds of objects to be measured may be arranged in the integrated structure 4.

  FIG. 6 is an XY plan view for explaining a modified example of the grating 1. In FIG. 6A, the gaps 12 are arranged only in one direction (X direction). That is, they are arranged one-dimensionally. In FIG. 6B, the gaps 12 are arranged in the X direction, the Y1 direction, and the Y2 direction (not the Y direction). Either can be used as the grating 1. However, as shown in FIG. 6, it is necessary that the gaps 12 having the same shape (the same shape and the same size) are arranged at a predetermined pitch (or interval). Further, the gap portion 12 of the lattice 1 may not be a square, may be a circle, and may be a triangle or a rectangle. That is, it may be a two-dimensional figure. Furthermore, as shown in FIG. 7, even when there is only one gap portion 12, it can be used as the lattice 1.

  FIG. 8 is a diagram showing a configuration of a measuring apparatus for measuring the refractive index of the DUT 20 of the integrated structure 2 according to the first embodiment. The measurement apparatus includes a radiation control unit 32, an electromagnetic wave irradiation unit (first electromagnetic wave irradiation unit and second electromagnetic wave irradiation unit) 34, an electromagnetic wave detection unit (first electromagnetic wave detection unit and second electromagnetic wave detection unit) 36, a characteristic measurement unit 40, A container 50, a suction device 62, and a pipe 64 are provided. The integral structure 2 and the container 50 constitute a measurement structure. Further, the measurement structure may have a suction device 62 and a pipe 64.

  FIG. 12 is a diagram showing the configuration of the measuring apparatus when the integrated structure 2 and the container 50 are replaced with the lattice 1 in FIG.

  FIG. 9 is a perspective view of the container 50 (FIG. 9A) and a bb cross-sectional view (FIG. 9B). The container 50 is a hollow rectangular parallelepiped. However, since there is no portion corresponding to the top surface and the open portion 58 (see FIG. 9B), the bottom surface 54 can be seen from above (see FIG. 9A). It can be said that the container 50 is opened in the upper direction shown in FIG. The container 50 has a front surface 52a, a back surface 52b, and side surfaces 56a and 56b. The front surface 52a, the back surface 52b, and the side surfaces 56a and 56b are orthogonal to the bottom surface 54. The front surface 52a and the back surface 52b are parallel, and the side surface 56a and the side surface 56b are parallel. The front surface 52a and the side surface 56a are orthogonal to each other, and the back surface 52b and the side surface 56b are orthogonal to each other. The open portion 58 faces the bottom surface 54.

  FIG. 10 is a perspective view (FIG. 10A) and a bb cross-sectional view (FIG. 10B) in a state where the integrated structure 2 is attached to the container 50. However, in FIG.10 (b), the integral structure 2 has not taken the cross section. The integral structure 2 is attached to the container 50 so as to cover the opening 58 (see FIG. 9B).

  FIGS. 11A and 11B are a perspective view (FIG. 11A) and a bb cross-sectional view (FIG. 11B) in a state where the pipe 64 is attached to the container 50 in the state shown in FIG. 10. One end of the pipe 64 is connected to the inside of the container 50, and the other end of the pipe 64 is connected to a suction device 62 (not shown in FIG. 11). The suction device 62 is a pump that sucks air, for example, and sucks air inside the container 50. The inside of the container 50 is a space on the side opposite to the sheet 15 when viewed from the lattice 1, and is a space surrounded by the container 50 and the sheet 15. By sucking the air inside the container 50 by the suction device 62, the object to be measured 20 placed on the sheet 15 can be brought into close contact with the lattice 1 with a desired suction force.

  9 to 11, the container 50 is illustrated as a hollow cuboid (however, the upper surface is open). However, the container 50 may be a hollow cylinder (provided that the upper surface is open). The container 50 is not limited to a rectangular parallelepiped and a cylinder as long as it is open at the opening 58.

  Further, when the front surface 52a is directed downward from the state shown in FIG. 11, the state of the measurement structure (integrated structure 2 and container 50) in FIG. 8 is obtained.

  The radiation control unit 32 designates the electromagnetic wave power P1 and the electromagnetic wave frequency f, and causes the electromagnetic wave irradiation unit 34 to emit the electromagnetic wave. The designated power P1 and frequency f are also given to the transmittance measuring unit 42 of the characteristic measuring unit 40.

  The electromagnetic wave irradiation unit (first electromagnetic wave irradiation means and second electromagnetic wave irradiation means) 34 emits an electromagnetic wave having power P1 and frequency f. The emitted electromagnetic wave is applied to the grating 1 (see FIG. 12) or the measurement structure (integrated structure 2 and container 50).

  Here, the electromagnetic wave applied to the measurement structure is referred to as a first electromagnetic wave, and the electromagnetic wave applied to the grating 1 is referred to as a second electromagnetic wave.

  The electromagnetic wave detection unit (first electromagnetic wave detection unit and second electromagnetic wave detection unit) 36 detects an electromagnetic wave transmitted through the lattice 1 or the measurement structure, measures the power P2, and transmits the transmittance measurement unit 42 of the characteristic measurement unit 40. To give. It is also conceivable to detect reflected electromagnetic waves instead of transmitted electromagnetic waves.

  That is, the electromagnetic wave detection unit 36 responds to the first response electromagnetic wave that is a response (for example, transmission and reflection) by the integrated structure 2 with respect to the irradiated first electromagnetic wave and the response (for example, to the second electromagnetic wave to be irradiated). What is necessary is just to detect the 2nd response electromagnetic wave which is transmission and reflection.

  The characteristic measurement unit 40 measures the characteristic of the DUT 20 based on the detection result of the electromagnetic wave detection unit 36. The characteristic measuring unit 40 includes a transmittance measuring unit 42, a transmittance recording unit 44, and a refractive index deriving unit 46.

  The transmittance measuring unit 42 measures the transmittance of the electromagnetic wave based on the detection result of the electromagnetic wave detecting unit 36. That is, the electromagnetic wave transmittance of the measurement structure and the grating 1 is measured. The transmittance is obtained by P2 / P1. However, if the reflection cannot be ignored, the influence of the reflection can be canceled by measuring P2 for the same object having a different thickness. This is well known and will not be described in detail.

  The transmittance recording unit 44 records the transmittance measured by the transmittance measuring unit 42 in association with the frequency of the electromagnetic wave.

  The refractive index deriving unit 46 derives the refractive index of the DUT 20 based on the measured transmittance. That is, when the transmittance measured based on the detection result of the first response electromagnetic wave at the frequency A is equal to the transmittance measured based on the detection result of the second response electromagnetic wave at the frequency B, the refraction of the DUT 20 The rate is derived based on A and B.

  Next, the operation of the first embodiment will be described.

  FIG. 13 is a flowchart showing the operation of the measuring apparatus according to the first embodiment. FIG. 14 is a graph for explaining a method for determining the refractive index of the DUT 20.

Note that scattering and absorption of the grating 1 and the integral structure 2 are negligible. For example, the material of the lattice 1 and the integrated structure 2 satisfies such a condition. Alternatively, the thicknesses of the lattice 1 and the integral structure 2 satisfy such a condition. Further, the bottom surface 54 transmits the first response electromagnetic wave. Since the frequency of the first response electromagnetic wave is terahertz (THz: 10 ¹² Hz) similarly to the frequency of the first electromagnetic wave, the bottom surface 54 is, for example, a thin plastic film, thin quartz, or thin polyethylene.

In general, if the intensity at the point where an incident wave with an intensity of I ₀ travels through the substance by x is I (x), the attenuation (absorption) of the incident wave is I (x)
= I ₀ exp ^-αx

  Absorption is negligible when α (determined by the material) or x (thickness) in the above equation is very small.

First, the grid 1 is disposed between the electromagnetic wave irradiation unit 34 and the electromagnetic wave detection unit 36 (see FIG. 12), and the electromagnetic wave irradiation unit 34 radiates a second electromagnetic wave in a predetermined band. The electromagnetic wave detection unit 36 detects the transmitted electromagnetic wave (second response electromagnetic wave). Then, the transmittance measuring unit 42 measures the transmittance of the grating 1 (S10). The transmittance is obtained by P2 / P1. The measured transmittance is recorded in the transmittance recording unit 44 in association with the frequency of the second electromagnetic wave. However, the measuring device is used in air having a refractive index n ₀ (for example, 1).

In the example shown in FIG. 14, a graph G <b> 1 is shown in which the transmittance of the grating 1 is measured by taking a band from 0 THz to 6 THz (terahertz) as a predetermined band. This graph G1 can be expressed as T _n0 (f). That is, the transmittance T is a function of the refractive index n ₀ and frequency f.

  Next, the measurement structure (integrated structure 2 and container 50) is disposed between the electromagnetic wave irradiation unit 34 and the electromagnetic wave detection unit 36, and the first electromagnetic wave having the frequency A is radiated from the electromagnetic wave irradiation unit 34. The first electromagnetic wave passes through the integrated structure 2 (first response electromagnetic wave) and further passes through the bottom surface 54 of the container 50. The electromagnetic wave detection unit 36 detects the transmitted electromagnetic wave (first response electromagnetic wave). Then, the transmittance measuring unit 42 measures the transmittance of the integrated structure 2 (S12). The transmittance is obtained by P2 / P1.

In the example shown in FIG. 14, the transmittance A = 40% of the integral structure 2 is obtained with the frequency A = 1 THz (graph G2). This graph G2 can be expressed as T _nx (A). That is, the transmittance T _nx integral structure 2 in the frequency A is a function of the refractive index of the object to be measured 20 n _x and frequency A (= 1 THz).

  Next, the refractive index deriving unit 46 determines the corresponding frequency B based on the recorded content of the transmittance recording unit 44 and the transmittance of the integrated structure 2 measured by the transmittance measuring unit 42 (S14). That is, with reference to FIG. 8, the refractive index deriving unit 46 transmits the transmittance (= 40%) measured based on the detection result (graph G2) of the electromagnetic wave detecting unit 36 at the frequency A (= 1 THz) and the corresponding frequency. The corresponding frequency B is determined such that the transmittance measured based on the detection result of the electromagnetic wave detection unit 36 in B becomes equal. The corresponding frequency B is 3.4 THz.

This means that T _n0 (B) = T _nx (A).

Finally, the refractive index deriving unit 46 derives the refractive index of the DUT 20 (S16). That is, the refractive index = B / A of the object to be measured 20, derives the refractive indices n _x of the object to be measured 20. In the example shown in FIG. 8, the refractive index n _x = 3.4 THz / 1 THz = 3.4. This uses the fact that B = n _x · A, is obtained by deriving the refractive indices n _x of the object to be measured 20.

  According to the integrated structure 2 according to the first embodiment, the DUT 20 can be handled advantageously. For example, the characteristic (for example, refractive index) of the DUT 20 arranged on the sheet 15 placed on the surface of the integrated structure 2 can be easily measured.

  In addition, according to the measurement structure (integrated structure 2 and container 50) according to the first embodiment, the object 20 to be measured placed on the sheet 15 placed on the surface of the integrated structure 2 is desired. Can be brought into close contact with the grid 1 with the attraction force. Since the object to be measured 20 can be brought into close contact with a desired suction force, the measurement accuracy of the change in the physical quantity (such as the refractive index) of the object to be measured 20 can be improved.

  According to the measuring apparatus according to the first embodiment, the characteristics (for example, refractive index) of the DUT 20 are measured by measuring the transmittance of electromagnetic waves in the integrated structure 2 and the lattice (gap-arranged structure) 1. Can be measured easily.

  FIG. 15 is a diagram for explaining changes of the graph G1 in which the transmittance of the grating 1 is measured with respect to the aperture a and the pitch p. When a and p are small (graph G1-1), the inclination is small, and when a and p are large (graph G1-2), the inclination is large.

  The maximum value of the corresponding frequency B is the frequency F1 (graph G1-1) and the frequency F2 (graph G1-2) at which the transmittance is a maximum value. The larger the maximum value of the corresponding frequency B, the larger the refractive index can be measured. Therefore, when a and p are small (graph G1-1), a wide range of refractive indexes can be measured. Conversely, when a and p are large (graph G1-2), the refractive index can be measured with high accuracy. This is because the transmittance varies greatly even if the refractive index is slightly different.

  Therefore, if it is desired to measure the refractive index in a wide range, it is preferable to use the integrated structure 2 in which the aperture a and the pitch p are reduced. If it is desired to measure the refractive index with high accuracy, it is preferable to use the integrated structure 2 with the apertures a and the pitch p increased.

  In addition, when the pitch p is small, the frequency at which the transmittance takes a maximum value is on the high frequency side. When the pitch p is large, the frequency at which the transmittance takes a maximum value is on the low frequency side. Therefore, the pitch p may be selected according to the frequency of the first electromagnetic wave.

  Further, in order to measure the refractive index with high accuracy, the wire strip width 2α (= pa) or the thickness t of the integrated structure 2 may be changed.

  FIG. 18 is a diagram illustrating the frequency shift in which the transmittance has a maximum value due to the change in the wire strip width 2α (= pa). As shown in FIG. 18, even when the wire strip width 2α is changed, the frequency at which the transmittance reaches the maximum value does not change. However, when the wire strip width 2α is increased, the slope in the vicinity of the frequency at which the transmittance reaches a maximum value increases. Therefore, when the wire strip width 2α is increased, the refractive index can be measured with high accuracy.

  FIG. 19 is a diagram illustrating the shift of the frequency at which the transmittance reaches the maximum value due to the change in the thickness t of the integrated structure 2. As shown in FIG. 19, even when the thickness t of the integrated structure 2 changes, the frequency at which the transmittance reaches the maximum value does not change. However, when the thickness t of the integrated structure 2 is increased, the slope in the vicinity of the frequency at which the transmittance reaches a maximum value increases. Therefore, when the thickness t of the integral structure 2 is increased, the refractive index can be measured with high accuracy.

Second Embodiment The measurement apparatus according to the second embodiment is the first implementation in that two-dimensional scanning is performed by irradiating terahertz waves to the measurement structure in which the integrated structure 4 is attached to the container 50. Different from form.

  FIG. 16 is a diagram illustrating a configuration of a measuring apparatus for measuring the refractive index of the DUT 20 of the integrated structure 4 according to the second embodiment. The measurement apparatus according to the second embodiment includes an integrated structure 4, a container 50, a suction device 62, a pipe 64, an electromagnetic wave irradiation unit 30, an XY stage 100, an electromagnetic wave detection unit 60, a control / calculation unit 70, a release unit. Object mirrors 80a, 80b, 80c, 80d and a mirror 90 are provided. However, the suction device 62 and the pipe 64 are not shown.

  The electromagnetic wave irradiation unit 30 emits terahertz waves. The XY stage 100 moves the measurement structure (the integrated structure 4 and the container 50) in the X direction and the Y direction. The electromagnetic wave detection unit 60 detects a terahertz wave that has passed through the integrated structure 4 (response electromagnetic wave) and has further passed through the bottom surface 54 of the container 50. It can be said that the detected terahertz wave is a response (response electromagnetic wave) by the integrated structure 4 to the electromagnetic wave irradiated to the integrated structure 4 by the electromagnetic wave irradiation unit 30. The control / arithmetic unit 70 controls the XY stage 100 and, based on the detection result of the electromagnetic wave detection unit 60, the characteristics (for example, transmittance, refractive index, etc.) of the measured object 20 of the integrated structure 4. Is calculated.

  The parabolic mirror 80a reflects the terahertz wave given from the mirror 90 and gives it to the parabolic mirror 80b. The parabolic mirror 80b reflects the terahertz wave given from the parabolic mirror 80a and irradiates the integrated structure 4 with it. The terahertz wave is irradiated to one point (referred to as “focus”) on the integrated structure 4. The parabolic mirror 80c reflects the terahertz wave that has passed through the integrated structure 4 and gives the parabolic mirror 80d to the parabolic mirror 80d. The parabolic mirror 80d reflects the terahertz wave given from the parabolic mirror 80c and gives it to the electromagnetic wave detection unit 60. The mirror 90 reflects the terahertz wave emitted from the electromagnetic wave irradiation unit 30 and gives it to the parabolic mirror 80a.

  A display (not shown) can be connected to the control / calculation unit 70 to display the refractive index and the transmittance. Further, image processing (white as the refractive index or absorptance increases, and black as it decreases) may be displayed on the display.

Further, the integrated structure 4 and the container 50 are the same as those in the first embodiment, and a description thereof will be omitted. However, the bottom surface 54 transmits the response electromagnetic wave. Since the frequency of the response electromagnetic wave is terahertz (THz: 10 ¹² Hz) similarly to the frequency of the electromagnetic wave emitted by the electromagnetic wave irradiation unit 30, the bottom surface 54 is, for example, a thin plastic film, thin quartz, or thin polyethylene.

  Next, the operation of the second embodiment will be described.

  The terahertz wave irradiated by the electromagnetic wave irradiation unit 30 is reflected by the mirror 90 and the parabolic mirrors 80a and 80b, and is applied to the integrated structure 4 (see FIG. 5). Here, the XY stage 50 is controlled by the control / arithmetic unit 70 so that each of the sheets 15a and 15b (or the sheets 15c, 15d, and 15e) of the integrated structure 4 receives the terahertz wave, that is, It is moved in the X direction and the Y direction so that the focal point matches the sheets 15a to 15e. That is, two-dimensional scanning is performed. The terahertz waves transmitted through the sheets 15 a to 15 e of the integrated structure 4 are reflected by the parabolic mirrors 80 c and 80 d and applied to the electromagnetic wave detection unit 60. The electromagnetic wave detection unit 60 detects the terahertz wave that has passed through the integrated structure 4. The control / calculation unit 70 calculates the characteristics (for example, transmittance, refractive index, etc.) of the DUT 20 of the integrated structure 4 based on the detection result of the electromagnetic wave detection unit 60. The calculation method is the same as in the first embodiment, and a description thereof is omitted.

  When the integrated structure 4 shown in FIG. 5A is used, the characteristic measurement unit 40 transmits the transmittance of the measurement object arranged on the sheet 15a and the transmission of the measurement object arranged on the sheet 15b. The difference from the rate can be measured. When the integrated structure 4 shown in FIG. 5B is used, the characteristic measuring unit 40 transmits the transmittance of the measurement object arranged on the sheet 15c and the measurement object arranged on the sheet 15d. A difference between any two transmittances can be measured from the transmittance and the transmittance of the object to be measured arranged on the sheet 15e. According to the second embodiment, the characteristics of the DUT 20 of the integrated structure 4 can be measured in detail and precisely.

  In the above embodiment, when the transmittance of the grating 1 and the integral structure 2 is measured, it can be seen that the frequency at which the transmittance reaches a maximum value moves. FIG. 17 is a diagram showing the frequency shift in which the transmittance is a maximum value by the grating 1 and the integrated structure 2. As shown in FIG. 17, the frequency Fa (lattice 1: graph Ga) at which the transmittance reaches a maximum value moves to Fb (integrated structure 2: graph Gb). Thereby, what the device under test 20 is (which is also a kind of characteristic of the device under test 20) can be specified.

  As described with reference to FIGS. 14, 15, and 17, when the grating 1 and the integral structures 2 and 4 are irradiated with electromagnetic waves having a frequency of terahertz, the transmittance greatly changes. The transmittance of the grating 1 and the integral structures 2 and 4 is substantially constant when it is somewhat large (for example, several times larger) than the wavelength of the electromagnetic wave irradiated by the aperture a. If the aperture a is very small with respect to the wavelength of the electromagnetic wave, the irradiated electromagnetic wave hardly transmits the grating 1 and the integral structures 2 and 4. Therefore, for example, when the size of the apertures a of the grating 1 and the integrated structures 2 and 4 is adjusted and an electromagnetic wave having a frequency of terahertz is irradiated, the transmittance is changed greatly.

  In addition, said embodiment is realizable as follows. A medium in which a program for realizing each of the above-described parts (for example, the characteristic measurement unit 40) is recorded in a medium reading device of a computer having a CPU, a hard disk, and a medium (floppy (registered trademark) disk, CD-ROM, etc.) And install it on the hard disk. The above embodiment can also be realized by such a method.

  The refractive index measurement using the grating 1 and the integral structure 2 as described above can be measured at any frequency by appropriately designing the mechanical size of the grating 1. In particular, in the millimeter wave band to the terahertz band (frequency: 100 GHz to 10 THz, wavelength: 3 mm to 30 μm), the amount of the object to be measured 20 required when arranging the object to be measured 20 is small. Is advantageous.

  More specifically, when compared with a band having a frequency lower than the above band, the size of the grating 1 can be reduced, and a small amount of the object to be measured 20 is required. When compared with a band having a frequency higher than the above band (a near-infrared region having a wavelength as short as light (that is, 1 μm or less)), it is easy to arrange the DUT 20.

  From the viewpoint of industrial application, if the above measurement method is applied in the millimeter wave band to the terahertz band, a small DNA chip, protein chip, etc. can be easily manufactured, and it can be applied to biopolymer interaction measurement, etc. It seems to be. Analytical devices have been developed that use surface plasmon resonance in the near-infrared region to detect biopolymer interactions, and detect minute changes in the refractive index of the sensor. There are drawbacks that a large amount of sample is required to keep the liquid sample flowing, the apparatus is large, and expensive.

It is a perspective view of the lattice (gap arrangement structure) 1 concerning a first embodiment. It is an XY plan view of the lattice (gap arrangement structure) 1 according to the first embodiment. FIG. 3 is an XY plan view (FIG. 3A) and a bb cross-sectional view (FIG. 3B) of an integrated structure 2 in which an object to be measured 20 is arranged on the surface of a grating 1; FIG. 3 is a plan view showing one vicinity of a gap 12 of the lattice 1. It is a top view of the integrated structure 4 which has the to-be-measured object 20 of 2 or more types. FIG. 6 is an XY plan view for explaining a modification of the lattice 1. It is an XY plan view of the lattice 1 when there is only one gap portion 12. It is a figure which shows the structure of the measuring apparatus for measuring the refractive index of the to-be-measured object 20 of the integrated structure 2 concerning 1st embodiment. It is a perspective view (Drawing 9 (a)) and bb sectional view (Drawing 9 (b)) of container 50. They are a perspective view (Drawing 10 (a)) in the state where integral type structure 2 was attached to container 50, and a bb sectional view (Drawing 10 (b)). It is a perspective view (Drawing 11 (a)) in the state where pipe 64 was attached to container 50 of the state shown in Drawing 10, and bb sectional drawing (Drawing 11 (b)). It is a figure which shows the structure of the measuring apparatus when the integrated structure 2 and the container 50 are replaced by the grating | lattice 1 in FIG. It is a flowchart which shows operation | movement of the measuring apparatus concerning 1st embodiment. 4 is a graph for explaining a method of determining a refractive index of a device under test 20. It is a figure for demonstrating the change with respect to the aperture a and the pitch p of the graph G1 which measured the transmittance | permeability of the grating | lattice 1. FIG. It is a figure which shows the structure of the measuring apparatus for measuring the refractive index of the to-be-measured object 20 of the integrated structure 4 concerning 2nd embodiment. It is a figure which shows the movement of the frequency from which the transmittance | permeability takes the maximum value with the grating | lattice 1 and the integral structure 2. FIG. It is a figure which shows the movement of the frequency from which the transmittance | permeability takes the maximum value by the change of wire strip width 2 (alpha) (= pa). It is a figure which shows the movement of the frequency from which the transmittance | permeability takes the maximum value with the change of the thickness t of the integrated structure 2. FIG.

Explanation of symbols

1 Lattice (void arrangement structure)
2, 4 Integrated structure 10 Conductor plate 12 Air gap (opening)
15, 15a, 15b, 15c, 15d, 15e Sheet 20 Measured object 30 Electromagnetic wave irradiation unit 32 Radiation control unit 34 Electromagnetic wave irradiation unit (first electromagnetic wave irradiation unit and second electromagnetic wave irradiation unit)
36 Electromagnetic wave detection unit (first electromagnetic wave detection means and second electromagnetic wave detection means)
DESCRIPTION OF SYMBOLS 40 Characteristic measurement part 42 Transmittance measurement part 44 Transmittance recording part 46 Refractive index derivation part 50 Container 52a Front surface 52b Back surface 54 Bottom surface 56a, 56b Side surface 58 Opening part 60 Electromagnetic wave detection part 62 Suction device 64 Pipe 70 Control / arithmetic part

Claims (16)

A container having an opening;
An integral structure covering the open portion;
A measurement structure comprising:
The integral structure is
An object to be measured whose characteristics are measured by irradiating electromagnetic waves;
A gap arrangement structure in which a gap surrounded by a conductor is arranged in a predetermined plane;
An arrangement member arranged on the surface of the void arrangement structure and the object to be measured arranged,
With
The air inside the container is aspirated,
The inside of the container is a space on the opposite side to the arrangement member when viewed from the gap arrangement structure.
Measurement structure. A measurement structure used for measuring an object whose characteristics are measured by irradiating electromagnetic waves,
A container having an opening;
An integral structure covering the open portion;
With
The integral structure is
A gap arrangement structure in which a gap surrounded by a conductor is arranged in a predetermined plane;
An arrangement member arranged on the surface of the void arrangement structure;
With
The air inside the container is aspirated,
The inside of the container is a space on the opposite side to the arrangement member when viewed from the gap arrangement structure.
Measurement structure. The measurement structure according to claim 1 or 2,
A suction device for sucking air inside the container;
A measurement structure comprising: A measurement structure according to any one of claims 1 to 3,
In the gap arrangement structure, the gap portions having the same shape are arranged at predetermined intervals in a predetermined direction.
Measurement structure. The measurement structure according to claim 4,
The gap arrangement structure is a two-dimensional lattice in which openings penetrating a conductor are arranged in a vertical direction and a horizontal direction.
Measurement structure. A measurement structure according to any one of claims 1 to 5,
There are two or more types of the objects to be measured arranged on the arrangement member.
Measurement structure. First electromagnetic wave irradiation means for irradiating the measurement structure according to any one of claims 1 to 5 with a first electromagnetic wave;
First electromagnetic wave detection means for detecting a first response electromagnetic wave that is a response by the integrated structure to the irradiated first electromagnetic wave;
A second electromagnetic wave irradiation means for irradiating the void arrangement structure with a second electromagnetic wave;
A second electromagnetic wave detecting means for detecting a second response electromagnetic wave that is a response by the gap arrangement structure to the irradiated second electromagnetic wave;
Based on the detection result of the first electromagnetic wave detection means and the detection result of the second electromagnetic wave detection means, characteristic measurement means for measuring the characteristic of the object to be measured;
Measuring device. Electromagnetic wave irradiation means for irradiating each type of the measurement object in the measurement structure according to claim 6 with electromagnetic waves;
Electromagnetic wave detecting means for detecting a response electromagnetic wave that is a response by the integrated structure to the electromagnetic wave irradiated;
Based on the detection result of the electromagnetic wave detection means, characteristic measurement means for measuring the characteristic of the object to be measured;
Measuring device. The measuring device according to claim 7,
The bottom of the container facing the open part is one that transmits the first response electromagnetic wave.
measuring device. The measuring device according to claim 8,
The bottom of the container facing the open part is one that transmits the response electromagnetic wave.
measuring device. The measuring device according to claim 7,
The characteristic measuring means comprises:
Based on the detection result of the first electromagnetic wave detection means and the detection result of the second electromagnetic wave detection means, a transmittance measurement means for measuring the transmittance of the electromagnetic wave,
A refractive index deriving means for deriving a refractive index of the object to be measured based on the measured transmittance;
Measuring device. The measuring device according to claim 11,
In the refractive index deriving unit, the transmittance measured based on the detection result of the first electromagnetic wave detecting unit at the frequency A is equal to the transmittance measured based on the detection result of the second electromagnetic wave detecting unit at the frequency B. A refractive index of the object to be measured is derived based on A and B,
measuring device. A first electromagnetic wave irradiation step of irradiating the measurement structure according to any one of claims 1 to 5 with a first electromagnetic wave;
A first electromagnetic wave detection step of detecting a first response electromagnetic wave that is a response by the integrated structure to the irradiated first electromagnetic wave;
A second electromagnetic wave irradiation step of irradiating the void arrangement structure with a second electromagnetic wave;
A second electromagnetic wave detection step of detecting a second response electromagnetic wave that is a response by the gap arrangement structure to the irradiated second electromagnetic wave;
Based on the detection result of the first electromagnetic wave detection step and the detection result of the second electromagnetic wave detection step, a characteristic measurement step of measuring the characteristic of the object to be measured;
Measuring method. An electromagnetic wave irradiation step of irradiating each type of the object to be measured in the measurement structure according to claim 6 with an electromagnetic wave;
An electromagnetic wave detection step of detecting a response electromagnetic wave that is a response by the integrated structure to the irradiated electromagnetic wave;
Based on the detection result of the electromagnetic wave detection step, a characteristic measurement step for measuring the characteristic of the object to be measured,
Measuring method. First electromagnetic wave irradiation means for irradiating the measurement structure according to any one of claims 1 to 5 with a first electromagnetic wave;
First electromagnetic wave detection means for detecting a first response electromagnetic wave that is a response by the integrated structure to the irradiated first electromagnetic wave;
A second electromagnetic wave irradiation means for irradiating the void arrangement structure with a second electromagnetic wave;
A second electromagnetic wave detecting means for detecting a second response electromagnetic wave that is a response by the gap arrangement structure to the irradiated second electromagnetic wave;
A program for causing a computer to execute a measurement process in a measurement apparatus comprising:
A program for causing a computer to execute a characteristic measurement process for measuring the characteristic of the object to be measured based on the detection result of the first electromagnetic wave detection means and the detection result of the second electromagnetic wave detection means. Electromagnetic wave irradiation means for irradiating each type of the measurement object in the measurement structure according to claim 6 with electromagnetic waves;
Electromagnetic wave detecting means for detecting a response electromagnetic wave that is a response by the integrated structure to the electromagnetic wave irradiated;
A program for causing a computer to execute a measurement process in a measurement apparatus comprising:
A program for causing a computer to execute a characteristic measurement process for measuring the characteristic of the object to be measured based on the detection result of the electromagnetic wave detection means.

Images