JP2007155460A - Low-temperature type hardness meter - Google Patents

Low-temperature type hardness meter Download PDF

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JP2007155460A
JP2007155460A JP2005349975A JP2005349975A JP2007155460A JP 2007155460 A JP2007155460 A JP 2007155460A JP 2005349975 A JP2005349975 A JP 2005349975A JP 2005349975 A JP2005349975 A JP 2005349975A JP 2007155460 A JP2007155460 A JP 2007155460A
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sample
temperature
gas
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indenter
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JP4711067B2 (en
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Toyoichi Maeda
豊一 前田
Toshiyuki Kono
俊幸 河野
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Shimadzu Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a low-temperature type hardness meter capable of certainly preventing the adhesion of frost to the surface of a sample at the time of measurement of hardness at a low temperature by housing a hardness meter body in a hermetic closure using a high capacity globe box without internally evacuating the hardness meter body. <P>SOLUTION: The low-temperature type hardness meter 1 is equipped with a gas supply means (an Ar gas source 5, a nozzle 6, etc.) for blowing a high-purity gas, which has a dew point temperature lower than the sample W against the sample W fixed on a sample stand 10 and the whole of the hardness meter 1 is housed in a gas replacing simple case 4 into which the high-purity gas is supplied. Accordingly, even if a slight amount of the open air penetrates in the gas replacing simple case 4, a gas which has a dew point temperature lower than the temperature of the sample W and keeps the moisture content below the saturated steam pressure (amount) at the surface temperature of the sample W comes into contact with the surface of the sample W, so that the adhesion of frost to the surface of the sample W can be prevented. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は低温の試料の硬度を測定する低温型硬度計に関し、更に詳しくは、低温に冷却した試料の表面に圧子を押し付け、それによって生じたくぼみの大きさから、あるいは、圧子の試料表面に対する押し込み量から、その温度下における試料の硬度を求める低温型硬度計に関する。   The present invention relates to a low-temperature type hardness tester for measuring the hardness of a low-temperature sample. More specifically, the indenter is pressed against the surface of a sample cooled to a low temperature, and the size of a dent generated thereby, or the indenter against the sample surface The present invention relates to a low-temperature hardness meter that obtains the hardness of a sample at that temperature from the amount of pressing.

試料表面に圧子を押し付けることにより試料表面に生じるくぼみの大きさから、その試料の硬度を求めるビッカース硬度計などの硬度計や、同じく試料表面に圧子を押し付けたときの圧子の試料表面への押し込み量(深さ)から試料の硬度を求める硬度計においては、一般に、図5にその概略構成図を縦断面図で示すように、試料台10はその上に設けられて鉛直方向に移動するZステージ11と、そのZステージ11の上に設けられて水平面上で移動するXYステージ12を含み、そのXYステージ12の上に試料Wが固定具(図示略)により固定される。試料台10の上方には、圧子13を試料Wの表面に対して押し付ける負荷機構14を備えるとともに、XYステージ12上に固定された試料Wの表面を観察するための顕微鏡15を備えた構成を採り、この図5の例は、圧子の試料表面への押し込み量から試料の硬度を求めるタイプであり、圧子13の押し込み量は変位計20によって計測され、硬度に換算される(例えば特許文献1参照)。   From the size of the indentation that occurs on the sample surface by pressing the indenter on the sample surface, a hardness meter such as a Vickers hardness tester that calculates the hardness of the sample, or the indenter being pushed into the sample surface when the indenter is pressed against the sample surface. In a hardness meter that determines the hardness of a sample from the amount (depth), generally, as shown in a longitudinal sectional view of a schematic configuration diagram in FIG. 5, a sample stage 10 is provided on the Z and moves in the vertical direction. A stage 11 and an XY stage 12 provided on the Z stage 11 and moving on a horizontal plane are included, and the sample W is fixed on the XY stage 12 by a fixing tool (not shown). Above the sample stage 10, a load mechanism 14 that presses the indenter 13 against the surface of the sample W and a microscope 15 for observing the surface of the sample W fixed on the XY stage 12 are provided. 5 is a type in which the hardness of the sample is obtained from the amount of indentation of the indenter to the sample surface, and the amount of indentation 13 is measured by the displacement meter 20 and converted into hardness (for example, Patent Document 1). reference).

また、顕微鏡15に加えてCCDカメラ等の撮影装置を設け、試料Wの表面から顕微鏡15へと向かう光路を切り換えるか、あるいは分離することにより、その撮影装置により試料Wの表面に形成されたくぼみを撮影し、その画像データを用いてくぼみの大きさを測長する測長手段を備え、そのくぼみの大きさを硬度に換算するものも知られている(例えば特許文献2参照)。   In addition to the microscope 15, an imaging device such as a CCD camera is provided, and a recess formed on the surface of the sample W by the imaging device by switching or separating the optical path from the surface of the sample W to the microscope 15. It is also known to include a length measuring means for measuring the size of the dent using the image data and converting the size of the dent into hardness (see, for example, Patent Document 2).

試料を低温に冷却した状態での硬度を測定する場合、従来、以上のような硬度計を用意し、これに冷却装置を付加して試料を冷却した状態で圧子を押し込み、これにより形成されたくぼみの大きさを計測している。
特開平9−79963号公報 特開2005−172663号公報
Conventionally, when measuring the hardness of the sample cooled to a low temperature, a hardness tester as described above was prepared, and a cooling device was added to the sample to push the indenter in a state of cooling the sample. Measuring the size of the indentation.
JP-A-9-79963 JP 2005-172663 A

ところで、上記したように試料の低温硬度を測定する従来の手法においては、試料の表面に霜が付着し、表面の観察が不能で、くぼみの測長もできないという問題が生じる。この霜の問題を解決するためには、装置全体をグローブボックス内に入れ、その内部の露点温度が低くなるようにグローブボックス内部を純度の高い不活性ガスで十分に置換する必要がある。そのためには、グローブボックス内の真空引きが必要となったり、漏れ対応のためにグローブボックスとして高性能のものを使用する必要が生じ、高価なものとなっているのが実情である。   By the way, in the conventional method for measuring the low temperature hardness of the sample as described above, there arises a problem that frost adheres to the surface of the sample, the surface cannot be observed, and the indent cannot be measured. In order to solve the problem of frost, it is necessary to place the entire apparatus in a glove box and sufficiently replace the inside of the glove box with a high purity inert gas so that the dew point temperature inside the apparatus becomes low. To that end, it is necessary to evacuate the inside of the glove box, and it is necessary to use a high-performance glove box for dealing with leakage, which is expensive.

本発明はこのような実情に鑑みてなされたもので、高性能のグローブボックスを用いることなく、低温での硬度測定に際して試料表面に霜が付着することを確実に防止することができ、もって従来の低温硬度の測定手法に比して装置全体のコストを低下させることのできる低温型硬度計の提供をその課題としている。   The present invention has been made in view of such circumstances, and without using a high-performance glove box, it is possible to reliably prevent frost from adhering to the sample surface during hardness measurement at a low temperature. It is an object of the present invention to provide a low temperature type hardness tester that can reduce the cost of the entire apparatus as compared with the conventional low temperature hardness measurement method.

上記の課題を解決するため、請求項1に係る発明の低温型硬度計は、試料が固定具により固定される試料台と、その試料台上の試料に対して圧子を押し付ける負荷機構と、試料の表面を観察する光学顕微鏡と、上記圧子の押し付けにより試料表面に生じたくぼみを測長する測長機構を備えるとともに、上記試料台上の試料を冷却する冷却手段を備えた低温型硬度計において、上記試料台上に固定されている試料に対して、当該試料温度よりも露点温度の低いガスを吹き付けるガス供給手段と、当該硬度計全体を覆って内部に高純度ガスを充満させるためのガス置換用簡易ケースを備えていることによって特徴づけられる。   In order to solve the above problems, a low-temperature hardness tester according to a first aspect of the present invention includes a sample table on which a sample is fixed by a fixture, a load mechanism that presses an indenter against the sample on the sample table, and a sample In a low-temperature type hardness meter comprising an optical microscope for observing the surface of the sample and a length measuring mechanism for measuring a dent generated on the sample surface by pressing the indenter, and a cooling means for cooling the sample on the sample stage A gas supply means for blowing a gas having a dew point temperature lower than the sample temperature to the sample fixed on the sample stage, and a gas for covering the entire hardness meter and filling the inside with a high purity gas It is characterized by having a simple case for replacement.

また、同じ課題を解決するため、請求項2に係る発明の低温型硬度計は、同じく試料が固定具により固定される試料台と、その試料台上の試料に対して圧子を押し付ける負荷機構と、試料の表面を観察する光学顕微鏡と、上記圧子の押し付けにより試料表面に生じたくぼみを測長する測長機構を備えるとともに、上記試料台上の試料を冷却する冷却手段を備えた低温型硬度計において、当該硬度計全体を覆って内部に高純度ガスを充満させるためのガス置換用簡易ケースと、そのガス置換用簡易ケース内の雰囲気温度が、上記試料台上の試料の温度よりも低くなるように当該ガス置換用簡易ケース内に供給する高純度ガスの温度を制御するガス供給制御手段を備えていることによって特徴づけられる。   In order to solve the same problem, the low-temperature hardness meter of the invention according to claim 2 similarly includes a sample table on which a sample is fixed by a fixture, and a load mechanism that presses an indenter against the sample on the sample table. A low-temperature hardness equipped with an optical microscope for observing the surface of the sample and a length measuring mechanism for measuring the indentation generated on the surface of the sample by the pressing of the indenter, and a cooling means for cooling the sample on the sample stage The gas replacement simple case for covering the entire hardness meter and filling the inside with a high purity gas, and the ambient temperature in the gas replacement simple case is lower than the temperature of the sample on the sample stage. In this way, it is characterized by having a gas supply control means for controlling the temperature of the high purity gas supplied into the gas replacement simple case.

一方、請求項3に係る発明は、圧子の試料表面に対する押し込み量からその硬度を求めるタイプの硬度計に関するものであり、試料が固定具により固定される試料台と、その試料台上の試料に対して圧子を押し付ける負荷機構と、試料の表面を観察する光学顕微鏡と、上記圧子を所定の荷重で押し付けたときの圧子の試料表面に対する押し込み量を測定する押し込み量測定機構を備えるとともに、上記試料台上の試料を冷却する冷却部を備えた低温型硬度計において、上記試料台上に固定されている試料に対して、当該試料温度よりも露点温度の低い高純度ガスを吹き付けるガス供給手段と、当該硬度計全体を覆って内部に高純度ガスを充満させるためのガス置換用簡易ケースを備えていることによって特徴づけられる。   On the other hand, the invention according to claim 3 relates to a hardness meter of a type in which the hardness is obtained from the indentation amount of the indenter with respect to the sample surface, and the sample is fixed to the sample table by the fixture and the sample on the sample table. A load mechanism for pressing the indenter against the optical microscope for observing the surface of the sample, and an indentation amount measuring mechanism for measuring the indentation amount of the indenter against the sample surface when the indenter is pressed with a predetermined load. A gas supply means for blowing a high-purity gas having a dew point temperature lower than the sample temperature to the sample fixed on the sample table in a low-temperature hardness meter having a cooling unit for cooling the sample on the table; It is characterized by having a simple case for gas replacement for covering the entire hardness meter and filling the inside with high purity gas.

また、請求項4に係る発明は、同じく圧子の試料表面に対する押し込み量からその硬度を持ちめのタイプの硬度計において同じ課題を解決するため、同じく試料が固定具により固定される試料台と、その試料台上の試料に対して圧子を押し付ける負荷機構と、試料の表面を観察する光学顕微鏡と、上記圧子を所定の荷重で押し付けたときの圧子の試料表面に対する押し込み量を測定する押し込み量測定機構を備えるとともに、上記試料台上の試料を冷却する冷却部を備えた低温型硬度計において、当該硬度計全体を覆って内部に高純度ガスを充満させるためのガス置換用簡易ケースと、そのガス置換用簡易ケース内の雰囲気温度が、上記試料台上の試料の温度よりも低くなるように当該ガス置換用簡易ケース内に供給する高純度ガスの温度を制御するガス供給制御手段を備えていることによって特徴づけられる。   The invention according to claim 4 also solves the same problem in the hardness meter of the type that holds the hardness from the amount of indentation of the indenter against the sample surface, and similarly, a sample stage on which the sample is fixed by a fixture, A load mechanism that presses the indenter against the sample on the sample stage, an optical microscope that observes the surface of the sample, and an indentation amount measurement that measures the indentation amount of the indenter against the sample surface when the indenter is pressed with a predetermined load In a low-temperature hardness meter having a mechanism and a cooling unit for cooling the sample on the sample table, a gas replacement simple case for covering the entire hardness meter and filling the interior with a high-purity gas, The temperature of the high purity gas supplied into the gas replacement simple case is set so that the ambient temperature in the gas replacement simple case is lower than the temperature of the sample on the sample stage. It characterized by that it comprises a Gosuru gas supply control means.

本発明は、高性能のグローブボックスを用いることなく、試料表面に霜が付着する原因をなくすることによって、課題を解決しようとするものである。試料表面に霜が付着するのは、試料表面温度の飽和水蒸気圧(量)より雰囲気の水分量が多く、かつ、試料表面温度が0℃以下のときである。   The present invention intends to solve the problem by eliminating the cause of frost adhering to the sample surface without using a high-performance glove box. The frost adheres to the sample surface when the amount of moisture in the atmosphere is larger than the saturated water vapor pressure (amount) of the sample surface temperature and the sample surface temperature is 0 ° C. or less.

請求項1および3に係る発明においては、露点温度の低い高純度ガスを吹き付けることにより、ガス置換用簡易ケース内の雰囲気に代わってその高純度ガスが試料表面に接触してその少なくとも一部を覆う状態となり、低露点の高純度ガスの水分量を試料表面温度での飽和水蒸気圧(量)よりも少なくすることで、試料表面への霜の付着を防止することができる。   In the inventions according to claims 1 and 3, by spraying a high-purity gas having a low dew point temperature, the high-purity gas comes into contact with the sample surface instead of the atmosphere in the gas replacement simple case, and at least a part of the gas is contacted. When the moisture content of the high-purity gas having a low dew point is less than the saturated water vapor pressure (amount) at the sample surface temperature, it is possible to prevent frost from adhering to the sample surface.

請求項2および4に係る発明においては、高純度ガスが充満するガス置換用簡易ケース内の雰囲気温度を試料温度よりも低くすることにより、ガス置換用簡易ケース内の雰囲気は試料表面温度の飽和水蒸気圧(量)よりも少ない水蒸気しか保持できない状態とし、これにより試料表面に霜が付着することを防止することができる。   In the inventions according to claims 2 and 4, the atmosphere in the gas replacement simple case filled with high-purity gas is made lower than the sample temperature, so that the atmosphere in the gas replacement simple case is saturated with the sample surface temperature. It is possible to keep only water vapor that is less than the water vapor pressure (amount), thereby preventing frost from adhering to the sample surface.

請求項1および3に係る発明によれば、試料台上に固定された試料に対して、その試料温度よりも露点温度の低い高純度ガスを吹き付けるので、ガス置換用簡易ケース内の雰囲気中の水分量に係わらず、高純度ガスが吹き付けられている部位には試料表面への霜の付着を防止することができ、従来の低温試験を行う際の構成に比してコストを低減することができる。   According to the inventions according to claims 1 and 3, since the high-purity gas having a dew point temperature lower than the sample temperature is sprayed on the sample fixed on the sample stage, the atmosphere in the gas replacement simple case Regardless of the amount of moisture, it is possible to prevent frost from adhering to the surface of the sample where high-purity gas is sprayed, which can reduce the cost compared to the conventional low-temperature test configuration. it can.

請求項2および4に係る発明によれば、硬度計を収容し、かつ、その内部が高純度ガスで満たされるガス置換用簡易ケース内の雰囲気温度が試料温度よりも低くなるように、当該ガス置換用簡易ケースに供給する高純度ガスの温度を制御するので、その高純度ガスは試料表面温度の飽和水蒸気量よりも少ない水蒸気しか保持することができず、これにより試料表面に霜が付着することを防止することができ、上記と同様に従来の低温試験を行う際の構成に比してコストを低減することができる。   According to the second and fourth aspects of the invention, the gas is contained so that the atmosphere temperature in the simple case for gas replacement in which the hardness meter is accommodated and the inside is filled with the high purity gas is lower than the sample temperature. Since the temperature of the high-purity gas supplied to the simple case for replacement is controlled, the high-purity gas can hold less water vapor than the amount of saturated water vapor at the sample surface temperature, which causes frost to adhere to the sample surface. This can be prevented, and the cost can be reduced as compared with the configuration when performing a conventional low-temperature test in the same manner as described above.

以下、図面を参照しつつ本発明の実施の形態について説明する。
図1は請求項1に係る発明の実施の形態の要部構成図であり、機械的構成並びに配置を表す概略図と冷媒配管およびガス配管の概略を表す配管図を併記して示す図である。また、図2はこの実施の形態の正面図で、図3はその試料台10の上部構造の拡大斜視図である。
Hereinafter, embodiments of the present invention will be described with reference to the drawings.
FIG. 1 is a main part configuration diagram of an embodiment of the invention according to claim 1, and is a diagram showing a schematic diagram showing a mechanical configuration and arrangement, and a piping diagram showing an outline of refrigerant piping and gas piping. . FIG. 2 is a front view of this embodiment, and FIG. 3 is an enlarged perspective view of the upper structure of the sample table 10.

硬度計本体1は、圧子の押し付けにより試料表面に生じたくぼのみ大きさからその硬度を求めるタイプの従来の硬度計と基本構造は同じであり、そのXYステージ12上に低温炉16を固定した構造を有している。すなわち、試料台10の上にZステージ11およびXYステージ12が順に載せられているとともに、その上に低温炉16が固定されている。試料Wはその低温炉16の上に、図3に示すように固定用バンド17によって固定される。なお、低温炉16の周囲はカバー16aで囲まれている。また、図1では図示を省略しているが、図2に示すように、硬度計本体1には、試料Wの表面を観察するための顕微鏡15が設けられているとともに、この例では試料Wの表面を撮影してその画像データをくぼみの測長に供するためのCCDカメラ18も設けられている。   The hardness meter main body 1 has the same basic structure as a conventional hardness meter of the type that obtains the hardness from the size of only a depression formed on the surface of the sample by pressing an indenter, and a low temperature furnace 16 is fixed on the XY stage 12. It has a structure. That is, the Z stage 11 and the XY stage 12 are placed in order on the sample stage 10, and the low temperature furnace 16 is fixed thereon. The sample W is fixed on the low temperature furnace 16 by a fixing band 17 as shown in FIG. The periphery of the low temperature furnace 16 is surrounded by a cover 16a. Although not shown in FIG. 1, the hardness meter body 1 is provided with a microscope 15 for observing the surface of the sample W, as shown in FIG. A CCD camera 18 is also provided for photographing the surface of the image and using the image data for measurement of the indentation.

低温炉16には、低温制御装置2により所要の低温に制御された冷媒が切替バルブユニット3を介して冷媒供給管31aおよび冷媒排出管31bを通じて循環供給され、これによって試料Wが所要の温度に冷却される。   The refrigerant controlled to a required low temperature by the low-temperature controller 2 is circulated and supplied to the low-temperature furnace 16 through the switching valve unit 3 through the refrigerant supply pipe 31a and the refrigerant discharge pipe 31b, so that the sample W reaches the required temperature. To be cooled.

さて、以上の硬度計本体1は、ガス置換用簡易グローブボックス2内に収容されている。このガス置換用簡易グローブボックス4は、完全には密閉されておらず、また、内部を減圧するためのポンプ等を備えていない簡易型のグローブボックスである。このガス置換用簡易グローブボックス4には、Arガス源5からの高純度のArガスが切替バルブユニット3を介して置換ガス供給管32aを通じて供給され、その内部がArガスで置換される。   The hardness meter main body 1 described above is housed in a gas replacement simple glove box 2. This gas replacement simple glove box 4 is a simple glove box which is not completely sealed and does not include a pump or the like for decompressing the inside. The gas replacement simple glove box 4 is supplied with high-purity Ar gas from the Ar gas source 5 via the switching valve unit 3 through the replacement gas supply pipe 32a, and the inside thereof is replaced with Ar gas.

また、Arガス源5からの高純度のArガス、つまり低露点のArガスは、同じく切替バルブユニット3を介して吹き付け用ガス供給管32bを通じてガス置換用簡易グローブボックス4内に導入されている。この吹き付け用ガス供給管32bの先端にはノズル6が装着されており、そのノズル6は低温炉16上に固定された試料Wの表面に向けて開口し、試料Wの表面に低露点のArガスが吹き付けられる。   Further, high-purity Ar gas from the Ar gas source 5, that is, Ar gas having a low dew point, is introduced into the gas replacement simple glove box 4 through the blowing gas supply pipe 32b through the switching valve unit 3 as well. . A nozzle 6 is mounted at the tip of the blowing gas supply pipe 32b. The nozzle 6 opens toward the surface of the sample W fixed on the low temperature furnace 16, and a low dew point Ar is formed on the surface of the sample W. Gas is blown.

以上の本発明の実施の形態を用いた試験手順は、まず、ガス置換用簡易グローブボックス4内をArガスで充満させた後、低温炉16に冷媒を循環供給して冷却を開始すると同時に、試料Wの表面にArガスを吹き付ける。そして低温炉16の温度が設定温度に到達した後、負荷機構14を駆動して圧子13をArガスが吹き付けられている試料Wの表面に押し付けて試験を行う。   The test procedure using the above embodiment of the present invention is as follows. First, after the gas replacement simple glove box 4 is filled with Ar gas, the refrigerant is circulated and supplied to the low-temperature furnace 16 to start cooling. Ar gas is sprayed on the surface of the sample W. Then, after the temperature of the low temperature furnace 16 reaches the set temperature, the load mechanism 14 is driven to press the indenter 13 against the surface of the sample W on which Ar gas is blown, and the test is performed.

このような手順によると、ガス置換用簡易グローブボックス4内に多少の外気が侵入しても、試料Wの表面のArガスの吹き付け部位には、その高純度のArガスが冷却開始直後から接触し、このArガスの水分量(水蒸気圧)を試料Wの表面温度における飽和水蒸気量(圧)よりも少なくしておくことにより、霜が発生することがない。従って、顕微鏡15による試料Wの表面の観察やCCDカメラ18によるくぼみの撮影に霜による影響が生じることがない。   According to such a procedure, even if some outside air enters the simple gas replacement glove box 4, the Ar gas sprayed portion on the surface of the sample W comes into contact with the Ar gas of high purity immediately after the start of cooling. Then, by keeping the moisture content (water vapor pressure) of the Ar gas smaller than the saturated water vapor content (pressure) at the surface temperature of the sample W, frost is not generated. Accordingly, the observation of the surface of the sample W by the microscope 15 and the photographing of the dent by the CCD camera 18 do not cause the influence of frost.

次に、請求項2に係る発明の実施の形態について述べる。図4はその要部構成図であり、機械的構成並びに配置を表す概略図と冷媒配管およびガス配管の概略を表す配管図を併記して示す図である。   Next, an embodiment of the invention according to claim 2 will be described. FIG. 4 is a configuration diagram of the main part, and is a diagram illustrating a schematic diagram showing a mechanical configuration and arrangement, and a piping diagram showing an outline of refrigerant piping and gas piping.

この例の特徴は、先の実施の形態における吹き付けガス供給管32b並びにノズル6を備えておらず、Arガス源5と切替バルブユニット3との間にガス低温制御装置7を介在させている点、および、ガス置換用簡易グローブボックス4内の雰囲気温度を検出するための温度センサ8を設けている点にある。そして、ガス低温制御装置7により、ガス置換用簡易グローブボックス4内の雰囲気温度が、試料Wの温度よりも常に少し低くなるように、ガス置換用簡易グローブボックス4内に導入するArガスの温度を制御する。   The feature of this example is that the blowing gas supply pipe 32b and the nozzle 6 in the previous embodiment are not provided, and the gas low temperature control device 7 is interposed between the Ar gas source 5 and the switching valve unit 3. And a temperature sensor 8 for detecting the atmospheric temperature in the gas replacement simple glove box 4 is provided. The temperature of the Ar gas introduced into the gas replacement simple glove box 4 by the gas low temperature control device 7 so that the atmospheric temperature in the gas replacement simple glove box 4 is always slightly lower than the temperature of the sample W. To control.

すなわち、ガス置換用簡易グローブボックス4内にArガスを充満させた後に試料Wの冷却を開始すべく低温炉16に冷媒を循環供給する点は先の例と同じであるが、温度センサ8の出力に基づくガス置換用簡易グローブボックス4内の雰囲気の温度検出値をガス低温制御装置7に導入し、その雰囲気温度の検出値が、試料Wの温度よりも常に少し低くなるように、ガス置換用簡易グローブボックス4内に供給すべきArガスの温度を制御する。   That is, the point that the refrigerant is circulated and supplied to the low temperature furnace 16 to start cooling the sample W after the gas replacement simple glove box 4 is filled with Ar gas is the same as the previous example. The temperature detection value of the atmosphere in the gas replacement simple glove box 4 based on the output is introduced into the gas low temperature control device 7, and the gas replacement is performed so that the detection value of the atmosphere temperature is always slightly lower than the temperature of the sample W. The temperature of Ar gas to be supplied into the simple glove box 4 is controlled.

この実施の形態によると、ガス置換用簡易グローブボックス4内の雰囲気は、試料Wの表面温度における飽和水蒸気量(圧)より少ない水蒸気しか保持できないために霜が発生せず、先の例と同様に試料Wの表面の観察や撮影に霜の影響が及ぶことがない。   According to this embodiment, since the atmosphere in the gas replacement simple glove box 4 can hold only water vapor that is less than the saturated water vapor amount (pressure) at the surface temperature of the sample W, frost is not generated and is the same as the previous example. In addition, frost does not affect the observation or photographing of the surface of the sample W.

ここで、以上の各実施の形態においては、圧子の試料表面への押し付けにより生じたくぼみの大きさからその硬度を求めるタイプの硬度計に本発明を適用した例を示したが、圧子を所定の荷重で試料表面に押し付けたときに、その圧子の試料表面に対する押し込み量から試料硬度を求めるタイプの硬度計にも、本発明を等しく適用し得ることは勿論である。   Here, in each of the above-described embodiments, an example in which the present invention is applied to a hardness meter of a type that obtains the hardness from the size of a dent generated by pressing the indenter to the sample surface has been shown. Of course, the present invention is equally applicable to a type of hardness meter that obtains sample hardness from the amount of indentation of the indenter against the sample surface.

また、以上の各実施の形態において用いた硬度計本体の細部構造や、ガス置換用簡易グローブボックスの詳細構造等については、特に限定されることなく、他の公知の構造を採用し得ることは勿論である。   In addition, the detailed structure of the hardness meter body used in each of the above embodiments, the detailed structure of the gas replacement simple glove box, etc. are not particularly limited, and other known structures can be adopted. Of course.

請求項1に係る発明の実施の形態の要部構成図であり、機械的構成並びに配置を表す概略図と冷媒配管およびガス配管の概略を表す配管図を併記して示す図である。It is a principal part block diagram of embodiment of the invention which concerns on Claim 1, It is a figure which writes and shows together the schematic diagram showing mechanical structure and arrangement | positioning, and the piping diagram showing the outline of refrigerant | coolant piping and gas piping. 図1の実施の形態の正面図である。It is a front view of embodiment of FIG. 図2における試料大10の上部構造の拡大斜視図である。FIG. 3 is an enlarged perspective view of an upper structure of a sample size 10 in FIG. 2. 請求項2に係る発明の実施の形態の要部構成図であり、機械的構成並びに配置を表す概略図と冷媒配管およびガス配管の概略を表す配管図を併記して示す図である。It is a principal part block diagram of embodiment of the invention which concerns on Claim 2, Comprising: The schematic which represents mechanical structure and arrangement | positioning, and the piping diagram showing the outline of refrigerant | coolant piping and gas piping are shown together. 圧子押し込み型の硬度計の概略構成を示す断面図である。It is sectional drawing which shows schematic structure of an indenter pushing type hardness tester.

符号の説明Explanation of symbols

1 硬度計本体
10 試料台
11 Zステージ
12 XYステージ
13 圧子
14 負荷機構
15 顕微鏡
16 低温炉
17 固定用バンド
18 CCDカメラ
2 低温制御装置
3 切替バルブユニット
4 ガス置換用簡易グローブボックス
5 Arガス源
6 ノズル
7 ガス低温制御装置
8 温度センサ
W 試料
DESCRIPTION OF SYMBOLS 1 Hardness meter main body 10 Sample stand 11 Z stage 12 XY stage 13 Indenter 14 Load mechanism 15 Microscope 16 Low temperature furnace 17 Fixing band 18 CCD camera 2 Low temperature control device 3 Switching valve unit 4 Gas replacement simple glove box 5 Ar gas source 6 Nozzle 7 Low-temperature gas control device 8 Temperature sensor W Sample

Claims (4)

試料が固定具により固定される試料台と、その試料台上の試料に対して圧子を押し付ける負荷機構と、試料の表面を観察する光学顕微鏡と、上記圧子の押し付けにより試料表面に生じたくぼみを測長する測長機構を備えるとともに、上記試料台上の試料を冷却する冷却部を備えた低温型硬度計において、
上記試料台上に固定されている試料に対して、当該試料温度よりも露点温度の低い高純度ガスを吹き付けるガス供給手段と、当該硬度計全体を覆って内部に高純度ガスを充満させるためのガス置換用簡易ケースを備えていることを特徴とする低温型硬度計。
A sample table on which the sample is fixed by a fixture, a load mechanism for pressing the indenter against the sample on the sample table, an optical microscope for observing the surface of the sample, and a dent generated on the sample surface by the pressing of the indenter. In the low-temperature type hardness meter having a length measuring mechanism for measuring length and a cooling unit for cooling the sample on the sample table,
A gas supply means for blowing a high-purity gas having a dew point temperature lower than the sample temperature to the sample fixed on the sample stage, and for filling the inside with the high-purity gas covering the hardness meter A low-temperature hardness tester characterized by having a simple case for gas replacement.
試料が固定具により固定される試料台と、その試料台上の試料に対して圧子を押し付ける負荷機構と、試料の表面を観察する光学顕微鏡と、上記圧子の押し付けにより試料表面に生じたくぼみを測長する測長機構を備えるとともに、上記試料台上の試料を冷却する冷却部を備えた低温型硬度計において、
当該硬度計全体を覆って内部に高純度ガスを充満させるためのガス置換用簡易ケースと、そのガス置換用簡易ケース内の雰囲気温度が、上記試料台上の試料の温度よりも低くなるように当該ガス置換用簡易ケース内に供給する高純度ガスの温度を制御するガス供給制御手段を備えていることを特徴とする低温型硬度計。
A sample table on which the sample is fixed by a fixture, a load mechanism for pressing the indenter against the sample on the sample table, an optical microscope for observing the surface of the sample, and a dent generated on the sample surface by the pressing of the indenter. In the low-temperature type hardness meter having a length measuring mechanism for measuring length and a cooling unit for cooling the sample on the sample table,
A simple case for gas replacement for covering the entire hardness meter and filling the inside with a high purity gas, and an atmospheric temperature in the simple case for gas replacement is lower than the temperature of the sample on the sample stage. A low-temperature type hardness tester comprising gas supply control means for controlling the temperature of the high purity gas supplied into the gas replacement simple case.
試料が固定具により固定される試料台と、その試料台上の試料に対して圧子を押し付ける負荷機構と、試料の表面を観察する光学顕微鏡と、上記圧子を所定の荷重で押し付けたときの圧子の試料表面に対する押し込み量を測定する押し込み量測定機構を備えるとともに、上記試料台上の試料を冷却する冷却部を備えた低温型硬度計において、
上記試料台上に固定されている試料に対して、当該試料温度よりも露点温度の低い高純度ガスを吹き付けるガス供給手段と、当該硬度計全体を覆って内部に高純度ガスを充満させるためのガス置換用簡易ケースを備えていることを特徴とする低温型硬度計。
A sample stage on which the sample is fixed by a fixture, a load mechanism for pressing the indenter against the sample on the sample stage, an optical microscope for observing the surface of the sample, and an indenter when the indenter is pressed with a predetermined load In a low-temperature type hardness tester comprising a push-in amount measuring mechanism for measuring a push-in amount with respect to the surface of the sample and a cooling unit for cooling the sample on the sample stage,
A gas supply means for blowing a high-purity gas having a dew point temperature lower than the sample temperature to the sample fixed on the sample stage, and for filling the inside with the high-purity gas covering the hardness meter A low-temperature hardness tester characterized by having a simple case for gas replacement.
試料が固定具により固定される試料台と、その試料台上の試料に対して圧子を押し付ける負荷機構と、試料の表面を観察する光学顕微鏡と、上記圧子を所定の荷重で押し付けたときの圧子の試料表面に対する押し込み量を測定する押し込み量測定機構を備えるとともに、上記試料台上の試料を冷却する冷却部を備えた低温型硬度計において、
当該硬度計全体を覆って内部に高純度ガスを充満させるためのガス置換用簡易ケースと、そのガス置換用簡易ケース内の雰囲気温度が、上記試料台上の試料の温度よりも低くなるように当該ガス置換用簡易ケース内に供給する高純度ガスの温度を制御するガス供給制御手段を備えていることを特徴とする低温型硬度計。
A sample stage on which the sample is fixed by a fixture, a load mechanism for pressing the indenter against the sample on the sample stage, an optical microscope for observing the surface of the sample, and an indenter when the indenter is pressed with a predetermined load In a low-temperature type hardness tester comprising a push-in amount measuring mechanism for measuring a push-in amount with respect to the surface of the sample and a cooling unit for cooling the sample on the sample stage,
A simple case for gas replacement for covering the entire hardness meter and filling the inside with a high purity gas, and an atmospheric temperature in the simple case for gas replacement is lower than the temperature of the sample on the sample stage. A low-temperature type hardness tester comprising gas supply control means for controlling the temperature of the high purity gas supplied into the gas replacement simple case.
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009190163A (en) * 2008-01-18 2009-08-27 Taiyo Nippon Sanso Corp Glove box
JP2011075512A (en) * 2009-10-01 2011-04-14 Central Res Inst Of Electric Power Ind Material cooling device, hardness tester, and method of testing hardness

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0666699A (en) * 1992-05-19 1994-03-11 Akashi:Kk Method and equipment for testing hardness
JPH0743282A (en) * 1993-07-30 1995-02-14 Victor Co Of Japan Ltd Surface hardness measuring equipment
JPH0775739A (en) * 1993-09-08 1995-03-20 Fujitsu Ltd Cooling device
JPH0979963A (en) * 1995-09-14 1997-03-28 Shimadzu Corp Miniature hardness tester
JPH09210891A (en) * 1996-01-31 1997-08-15 Shimadzu Corp Microhardness measuring method
JPH10289934A (en) * 1997-02-12 1998-10-27 Tokyo Electron Ltd Probe device and proving method
JP2002014026A (en) * 2000-06-30 2002-01-18 Jeol Ltd Scanning probe microscope
JP2004257775A (en) * 2003-02-24 2004-09-16 National Institute Of Advanced Industrial & Technology Method and device for measuring indentation depth of spherical indenter
JP2005172663A (en) * 2003-12-12 2005-06-30 Shimadzu Corp Apparatus for measuring recess size, apparatus for measuring hardness, program for calculating recess size program

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0666699A (en) * 1992-05-19 1994-03-11 Akashi:Kk Method and equipment for testing hardness
JPH0743282A (en) * 1993-07-30 1995-02-14 Victor Co Of Japan Ltd Surface hardness measuring equipment
JPH0775739A (en) * 1993-09-08 1995-03-20 Fujitsu Ltd Cooling device
JPH0979963A (en) * 1995-09-14 1997-03-28 Shimadzu Corp Miniature hardness tester
JPH09210891A (en) * 1996-01-31 1997-08-15 Shimadzu Corp Microhardness measuring method
JPH10289934A (en) * 1997-02-12 1998-10-27 Tokyo Electron Ltd Probe device and proving method
JP2002014026A (en) * 2000-06-30 2002-01-18 Jeol Ltd Scanning probe microscope
JP2004257775A (en) * 2003-02-24 2004-09-16 National Institute Of Advanced Industrial & Technology Method and device for measuring indentation depth of spherical indenter
JP2005172663A (en) * 2003-12-12 2005-06-30 Shimadzu Corp Apparatus for measuring recess size, apparatus for measuring hardness, program for calculating recess size program

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009190163A (en) * 2008-01-18 2009-08-27 Taiyo Nippon Sanso Corp Glove box
JP4648444B2 (en) * 2008-01-18 2011-03-09 大陽日酸株式会社 Glove box
US8770907B2 (en) 2008-01-18 2014-07-08 Taiyo Nippon Sanso Corporation Cryopreservation device
JP2011075512A (en) * 2009-10-01 2011-04-14 Central Res Inst Of Electric Power Ind Material cooling device, hardness tester, and method of testing hardness

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