JP2007154310A - Vacuum deposition method for forming alloy film on surface of piece by vapor deposition - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method for easily forming an alloy film having various metallic compositions on the surface of a piece such as a rare earth based permanent magnet by vapor deposition. <P>SOLUTION: Regarding the vacuum deposition method, an alloy film at least containing two kinds of metals, a metal A and a metal B (wherein, the vapor pressure of the metal B is higher than that of the metal A) is formed on the surface of a piece as the object to be treated by vapor deposition. In a film raw material melting-evaporating part at the inside of a vacuum treatment chamber, electron beams are emitted to a solid of the metal A in a crucible and an alloy wire comprising the metal A and the metal B and guided to the direct upper part of the crucible at a prescribed feed rate, and the solid of the metal A and the alloy wire are simultaneously melted and evaporated, thus the alloy film having a metallic composition in accordance with the feed rate of the alloy wire is formed on the surface of the piece located in the upper part of the film raw material melting-evaporating part by vapor deposition. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to a vacuum deposition method useful for depositing an alloy film containing Al as a main component on the surface of an individual piece such as a rare earth permanent magnet.

Conventionally, as a method for imparting salt water resistance to a rare earth-based permanent magnet, a method of vapor-depositing an alloy film mainly composed of Al on its surface is known, and Patent Document 1 discloses Al as a main component. As a method for vapor-depositing an alloy film on the surface of a rare earth-based permanent magnet, a method is described in which a wire-like Al vapor-deposited material containing Mg is evaporated while being continuously supplied to a heated melt evaporation part.
Japanese Patent Laying-Open No. 2005-191276

However, in the method described in Patent Document 1, the metal composition of the alloy film formed by vapor deposition on the surface of the magnet is similar to the metal composition of the alloy wire. In some cases, there is a problem that a plurality of alloy wires corresponding to the metal composition must be prepared.
Accordingly, an object of the present invention is to provide a method for easily vapor-depositing an alloy film having various metal compositions on the surface of an individual piece such as a rare earth permanent magnet.

  As a result of intensive studies in view of the above points, the present inventor has housed a low vapor pressure metal solid in a crucible inside the vacuum processing chamber, and a low vapor pressure metal and a high vapor pressure directly above the crucible. When the alloy wire containing metal is guided at a predetermined feed rate and the solid vapor of the low vapor pressure metal and the alloy wire are irradiated with an electron beam and both are melted and evaporated simultaneously, the feed rate of the alloy wire should be adjusted. Thus, it was found that the metal composition of the alloy coating formed on the surface of the individual piece can be easily adjusted. In JP 2001-59158 A, a low vapor pressure metal material in a crucible is irradiated with an electron beam to melt and evaporate it, and an alloy wire mainly composed of a high vapor pressure metal is supplied into the crucible. Thus, it is described that an alloy film having a uniform composition can be deposited on the surface of a strip-shaped thin film. However, the method described in this patent document is not for depositing an alloy film on the surface of an individual piece. Further, this patent document neither describes nor suggests that the metal composition of the alloy coating formed on the surface of the individual piece can be adjusted by adjusting the feeding speed of the alloy wire.

The vacuum vapor deposition method of the present invention made based on the above knowledge is an alloy film containing at least two kinds of metals, metal A and metal B (wherein metal B is higher in vapor pressure than metal A). Is formed on the surface of an individual piece to be processed, in a coating material melting and evaporating section inside the vacuum processing chamber, and the metal A solid in the crucible and the crucible directly According to the feed rate of the alloy wire, the alloy wire including the metal A and the metal B guided upward at a predetermined feed rate is irradiated with an electron beam, and the solid of the metal A and the alloy wire are simultaneously melted and evaporated. An alloy film having a metal composition is formed by vapor deposition on the surface of an individual piece located above the coating material melting and evaporating part.
The vacuum deposition method according to claim 2 is characterized in that in the vacuum deposition method according to claim 1, the temperature of the individual piece is controlled to 150 ° C. or lower.
The vacuum deposition method according to claim 3 is characterized in that in the vacuum deposition method according to claim 1 or 2, the driving power of an electron gun for generating an electron beam is controlled to 50 kW or less.
In addition, the vacuum vapor deposition method according to claim 4 is the vacuum vapor deposition method according to any one of claims 1 to 3, wherein the feeding speed of the alloy wire is controlled within a range of 0.1 g / min to 10 g / min. Features.
The vacuum deposition method according to claim 5 is characterized in that, in the vacuum deposition method according to any one of claims 1 to 4, the metal composition of the alloy wire includes 90 mass% to 99 mass% of metal A.
A vacuum vapor deposition method according to claim 6 is the vacuum vapor deposition method according to any one of claims 1 to 5, wherein the alloy wire contains hydrogen.
A vacuum deposition method according to claim 7 is the vacuum deposition method according to claim 6, wherein the hydrogen content is 0.5 ppm to 20 ppm.
The vacuum deposition method according to claim 8 is the vacuum deposition method according to any one of claims 1 to 7, wherein the individual pieces are housed in a cylindrical barrel having a mesh structure that can revolve around a horizontal axis. In the coating material melting and evaporating part disposed on or near the revolution axis while revolving the cylindrical barrel, the metal A solid and the alloy wire are simultaneously melted and evaporated, and the cylindrical shape located above the coating material melting and evaporating part. An alloy film is formed by vapor deposition on the surface of the individual piece accommodated in the barrel.
The vacuum deposition method according to claim 9 is characterized in that, in the vacuum deposition method according to any one of claims 1 to 8, the metal composition of the alloy coating contains 85 mass% or more of metal A.
The vacuum vapor deposition method according to claim 10 is the vacuum vapor deposition method according to any one of claims 1 to 9, wherein the metal A is at least one selected from Al and the metal B is selected from Mg, Mn, and Zn. It is characterized by that.
The vacuum vapor deposition method according to claim 11 is the vacuum vapor deposition method according to any one of claims 1 to 10, wherein each piece is a rare earth permanent magnet.
A vacuum deposition method according to claim 12 is the vacuum deposition method according to any one of claims 1 to 11, wherein vapor deposition is formed on the surface of an individual piece by changing a feeding speed of an alloy wire during the deposition process. The alloy coating is provided with a composition gradient in the thickness direction.
Further, the vacuum vapor deposition method according to claim 13 is the vacuum vapor deposition method according to claim 12, wherein the feeding speed of the alloy wire is changed so as to be slower at the end time than at the start time of the vapor deposition treatment. The metal composition of the alloy film formed by vapor deposition on the surface of the piece is characterized in that the ratio of the metal A is higher on the outer surface side than on the interface side with the piece.
Moreover, the rare earth-based permanent magnet of the present invention is characterized in that, as described in claim 14, an alloy film having a predetermined metal composition is deposited on the surface by the vacuum evaporation method according to claim 1.
The rare earth permanent magnet according to claim 15 is the rare earth permanent magnet according to claim 14, wherein the alloy film has a composition gradient in the thickness direction.
In addition, the vacuum deposition apparatus of the present invention, as described in claim 16, treats an alloy film containing at least two kinds of metals, metal A and metal B (where metal B has a higher vapor pressure than metal A). A vacuum deposition apparatus for forming a vapor deposition on the surface of an individual piece that is a product, wherein a coating material melting and evaporating part inside a vacuum processing chamber is fed at a predetermined feed rate directly above the solid of metal A in the crucible and the crucible The alloy wire including the metal A and the metal B guided in step 1 is irradiated with an electron beam, and the solid of the metal A and the alloy wire are melted and evaporated at the same time.

  ADVANTAGE OF THE INVENTION According to this invention, the method for carrying out the vapor deposition formation of the alloy film of various metal compositions on the surface of individual pieces, such as rare earth type permanent magnets, can be provided.

  The vacuum deposition method of the present invention deposits an alloy film containing at least two kinds of metals, metal A and metal B (however, metal B has a higher vapor pressure than metal A) on the surface of a piece to be processed. A vacuum deposition method for forming a metal material A and a metal B, which is guided at a predetermined feed rate immediately above the solid of the metal A in the crucible and directly above the crucible in the coating material melting and evaporating part inside the vacuum processing chamber. By irradiating an alloy wire containing an electron beam and simultaneously melting and evaporating the solid of metal A and the alloy wire, an alloy film having a metal composition corresponding to the feeding speed of the alloy wire is formed above the coating material melting and evaporating part. Vapor deposition is performed on the surface of the individual pieces located.

  FIG. 1 is a schematic front view of the inside of a vacuum processing chamber as an example of a vacuum deposition apparatus suitable for carrying out the vacuum deposition method of the present invention. Inside the vacuum processing chamber 1 connected to an unillustrated evacuation system, twelve cylindrical barrels 2 having a mesh structure that can revolve around a horizontal axis are annularly arranged outward in the circumferential direction of the axis. In addition, a coating material melting and evaporating part constituted around the crucible 3 is arranged on the revolution axis. The crucible 3 contains a solid X of metal A (such as ingots and pellets, but is not limited thereto). The metal A and the metal A are directly above the crucible 3. The alloy wire Y containing the metal B having a high vapor pressure is guided from the bobbin 4 by the feeding gear 5 as indicated by an arrow at a predetermined feed rate. An electron beam E emitted from an unillustrated electron gun is applied to the solid X of the metal A and the alloy wire Y in the coating material melting and evaporating part while revolving as indicated by the arrow of the cylindrical barrel 2 around the horizontal axis. When these are simultaneously melted and evaporated by irradiation, the metal B contained in the wire Y evaporates preferentially over the metal A, while the metal A contained in the wire Y is melted and dropped into the crucible 3 (one The metal A also evaporates), and vapors of the metal A and metal B having a constant composition are generated by evaporating together with the solid X melt of the metal A in the crucible 3. An alloy film is deposited on the surface of the piece 11 accommodated in the cylindrical barrel 2 located above the part. At this time, if the feeding speed of the alloy wire Y is increased, the ratio of the metal B in the generated steam can be increased. On the other hand, if the feeding speed is decreased, the ratio of the metal A in the generated steam is increased. (The ratio of metal B can be reduced). Therefore, by adjusting the feeding speed of the alloy wire Y, the metal composition of the alloy coating formed on the surface of the piece 11 can be easily adjusted. Further, if the feeding speed of the alloy wire is changed during the vapor deposition process, a composition gradient can be provided in the thickness direction with respect to the alloy film deposited on the surface of the piece. For example, if the feeding speed of the alloy wire is gradually slowed from the start to the end of the vapor deposition process, the metal composition of the alloy film deposited on the surface of the individual piece is spread from the interface side to the outer surface side of the individual piece. The ratio of the metal A can be gradually increased (the ratio of the metal B is gradually decreased). Up to now, when it is desired that the alloy coating formed on the surface of the individual piece is composed of a plurality of metal compositions (for example, the metal composition required on the interface side with the individual piece is different from the metal composition required on the outer surface side) In some cases, a method of laminating and forming alloy coatings having individual metal compositions has been adopted. However, the method of laminating and forming a plurality of alloy coatings has a problem that the number of processes is increased, and the alloy coating and the alloy coating. There is a problem that the adhesiveness at the interface is inferior. However, according to this method, it is possible to give a composition gradient in the thickness direction of the alloy film, so that it is formed on the surface of an individual piece without causing the problems of the method of laminating a plurality of alloy films. The alloy film to be formed can be composed of a plurality of metal compositions.

  The temperature of the individual pieces 11 accommodated in the cylindrical barrel 2 is preferably controlled to 150 ° C. or lower. The reason for this is that when the temperature of the piece 11 exceeds 150 ° C., the alloy film deposited on the surface is easily damaged due to collision between pieces, and the cut film becomes granular and other films are formed. This is because protrusions are easily generated on the coating film. If the driving power of the electron gun for generating the electron beam E exceeds 50 kW, the temperature inside the vacuum processing chamber 1 becomes too high, and the temperature of the individual piece 11 accommodated in the cylindrical barrel 2 exceeds 150 ° C. Protrusions are likely to be formed on the alloy film formed by evaporation. Therefore, the driving power of the electron gun is preferably controlled to 50 kW or less. The lower limit value of the driving power of the electron gun is desirably 10 kW in order to efficiently deposit an alloy film on the surface of the piece 11. The feeding speed of the alloy wire Y is preferably controlled in the range of 0.1 g / min to 10 g / min. By adopting such a feed rate, an alloy film having a metal composition corresponding to the feed rate of the alloy wire Y can be efficiently deposited on the surface of the piece 11.

  As for the alloy wire containing the metal A and the metal B used in the vapor deposition film forming method of this invention, it is desirable for the metal composition to contain the metal A 90 mass%-99 mass%. By setting the metal composition of the alloy wire as described above, an alloy film having a metal composition corresponding to the feeding speed of the alloy wire can be efficiently deposited on the surface of the piece. The alloy wire desirably contains hydrogen. When the alloy wire is melted and evaporated, hydrogen can be supplied to the inside of the vacuum processing chamber, so that the inside of the vacuum processing chamber can be reduced without supplying hydrogen from the outside of the vacuum processing chamber by a separate means. This is because it is possible to prevent oxidation of the vapor deposition material at the melted stage or the evaporated stage in the atmosphere. The hydrogen content of the alloy wire is preferably 0.5 ppm to 20 ppm, and more preferably 1 ppm to 10 ppm. If it is less than 0.5 ppm, hydrogen may not be sufficiently supplied to the inside of the vacuum processing chamber, whereas if it exceeds 20 ppm, splashing may occur when the alloy wire melt drops on the crucible. It is.

  The vapor deposition film forming method of the present invention is suitable when vapor-depositing an alloy film containing 85% by mass or more of metal A on the surface of a piece (the upper limit of metal A is about 99.5% by mass, The lower limit of B is about 0.5 mass%). The metal A is exemplified by Al, and the metal B having a higher vapor pressure than Al is exemplified by Mg, Mn, Zn. The metal A is a low vapor pressure metal and the metal is a high vapor pressure metal. The combination of B is not limited to these. Moreover, although the rare earth permanent magnet (which may be a sintered magnet or a bonded magnet) is exemplified as the individual piece to be processed, the individual piece is limited to the rare earth permanent magnet. It is not a thing.

  EXAMPLES Hereinafter, although an Example demonstrates this invention further in detail, this invention is limited to this and is not interpreted. In the following examples, as described in, for example, US Pat. No. 4,770,723 and US Pat. No. 4,792,368, a known cast ingot is pulverized, and after fine pulverization, molding, sintering, heat treatment, surface processing This was performed using a sintered magnet (hereinafter referred to as a magnet test piece) having a size of 23 mm × 10 mm × 6 mm having a composition (at%) of 14Nd-79Fe-6B-1Co obtained by performing the above. Moreover, what was equipped with the mechanism shown in FIG. 1 was used for the vacuum evaporation system.

Example 1 to Example 4:
Shot blasting was performed on the magnet test piece, and the oxide layer on the surface of the test piece generated by the surface processing in the previous step was removed. A plurality of magnet test specimens from which the oxide layer has been removed are accommodated in one cylindrical barrel, and the vacuum processing chamber is evacuated until the inside of the vacuum processing chamber reaches 2 × 10 ⁻³ Pa, and then the Ar gas is vacuum processed. It supplied so that the pressure inside a chamber might be set to 1.0 Pa. Thereafter, glow discharge was performed for 15 minutes under the condition of a bias voltage of −0.3 kV while revolving the cylindrical barrel at 1.5 rpm to clean the surface of the magnet specimen. Subsequently, after evacuating the inside of the vacuum processing chamber to 5 × 10 ⁻⁴ Pa, the driving power of the electron gun was set to 16 kW (10 kV, 1.6 A), and 99.99% high housed in the crucible. After melting and evaporating the purity Al pellets (manufactured by Sumika Alchem Co., Ltd.), an alloy wire having the metal composition described in Table 1 is used, and the alloy wire is placed immediately above the crucible for 100 minutes at the feed rate shown in Table 1. By guiding, the alloy wire was melted and evaporated simultaneously with the Al pellets to form an alloy film on the surface of the magnet specimen. In addition, in order to investigate how much the temperature of the magnet specimen rises during processing, aluminum foil wrapped with a plurality of thermocrayons (manufactured by NOF Corporation) showing each indicated temperature The magnet test piece wound with was stored in a cylindrical barrel, and it was confirmed after processing that the thermocrayon corresponding to the temperature was melted.

Comparative Example 1:
An alloy wire having the metal composition shown in Table 1 was guided into the crucible at the feed rate shown in Table 1, and only the alloy wire was melted and evaporated in the crucible. An alloy film was deposited on the surface.

Reference example 1:
Same as Example except that alloy pellets having the same metal composition as the alloy wires shown in Table 1 are accommodated in a crucible and melted and evaporated, and the alloy wire is not guided directly above the crucible. Then, an alloy film was deposited on the surface of the magnet specimen.

  Table 1 shows the metal composition, film thickness, and hydrogen content of the alloy coating deposited on the surface of the magnet test piece in Examples 1 to 4, Comparative Example 1, and Reference Example 1. In addition, the metal composition of the alloy wire was measured with an atomic emission spectrometer (ICP-AES: ICPS-7500 manufactured by Shimadzu Corporation). The metal composition of the alloy coating was determined by measuring the metal composition of the alloy coating deposited on the surface of the glass plate accommodated in the cylindrical barrel together with the magnet specimen by the above atomic emission spectrometer. The film thickness of the alloy film was measured with a fluorescent X-ray film thickness meter (SFT-7000: manufactured by Seiko Electronics Co., Ltd.). The hydrogen content of the alloy wire and the alloy coating was measured with a hydrogen analyzer (EMGA-11: manufactured by Horiba, Ltd.).

  As is apparent from Table 1, according to Examples 1 to 4, the metal composition of the alloy coating can be easily adjusted by adjusting the feeding speed of the alloy wire, the feeding speed of the alloy wire and the Mg of the alloy coating. It was found that there is a proportional relationship with the content. In Example 1 to Example 4, the in-film composition distribution of the alloy coating deposited on the surface of the magnet body test piece was measured with an electron beam microanalyzer (EPMA-1610: manufactured by Shimadzu Corporation). It was confirmed that the alloy coating also has a uniform in-film composition distribution. Further, in visual observation, no conspicuous damage or protrusions could be confirmed on the surface of any alloy coating. The maximum temperature of the magnetic specimen during the treatment was about 70 ° C.

Example 5:
In Example 1 to Example 4 above, the alloy film was deposited on the surface of the magnet test piece while keeping the feeding speed of the alloy wire constant from the start to the end of the 100 minute deposition process. Then, the feed rate of the alloy wire is gradually decreased gradually from the start to the end of the vapor deposition process (4.0 g / min × 10 minutes → 3.5 g / min × 10 minutes → 3.0 g / min × 10 min → 2.5 g / min × 10 min → 2.0 g / min × 10 min → 1.5 g / min × 10 min → 1.0 g / min × 10 min → 0.5 g / min × 10 min → 0 g / (Minute x 20 minutes) An alloy film was formed by vapor deposition on the surface of the magnet body test piece (experimental conditions other than changing the feeding speed of the alloy wire were the same as those in Examples 1 to 4). The composition distribution in the film of the alloy film (film thickness 11.9 μm, hydrogen content 0.8 ppm) formed by vapor deposition on the surface of the magnet body test piece was measured with an electron beam microanalyzer (EPMA-1610: manufactured by Shimadzu Corporation). The results are shown in FIG.
As can be seen from FIG. 2, the Mg ratio of the alloy coating formed on the surface of the magnet specimen was about 9 mass% immediately after the start of the deposition, but gradually decreased gradually over time. At the end of the deposition, it was about 5 mass% (the alloy wire feed rate was finally 0 g / min × 20 minutes, that is, the Mg ratio was completed even though the alloy wire was not guided directly above the crucible. Sometimes it does not become 0 mass% because Mg in the alloy wire melted into the crucible at the stage where the alloy wire was being guided continues to evaporate from the crucible, and further vapor deposition without guiding the alloy wire. If the treatment is continued, the ratio of Mg becomes 0 mass%).
From the above results, according to this method, the metal composition of the alloy film containing Mg as a main component deposited on the surface of the magnet body test piece and containing Mg is more on the outer surface side than the interface side with the magnet body test piece. Since the ratio of Al can be higher (the ratio of Mg is lower), the alloy film inherently has excellent film hardness and smoothness compared to an alloy film containing Al as a main component and containing Mg. In addition to the characteristics that there are few film defects, it has been found that high adhesion reliability of Al can be imparted on the outer surface side.

Example 6:
Contrary to Example 5, when the deposition speed of the alloy wire was continuously increased gradually from the start to the end of the deposition process to form an alloy film on the surface of the magnet test piece, the alloy composition was a magnet. An alloy film in which the Al ratio gradually decreased gradually from the interface side to the outer surface side with the body test piece could be deposited on the surface of the magnet body test piece.

  INDUSTRIAL APPLICABILITY The present invention has industrial applicability in that it can provide a method for easily depositing an alloy film having various metal compositions on the surface of an individual piece such as a rare earth permanent magnet.

It is a typical front view inside the vacuum processing chamber of an example of the vacuum evaporation apparatus suitable for enforcing the vacuum evaporation method of this invention. It is the result of having measured the composition distribution in the film | membrane of the alloy film formed by vapor deposition on the surface of the magnet body test piece of Example 5 with the electron beam microanalyzer.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Vacuum processing chamber of vacuum evaporation apparatus 2 Cylindrical barrel 3 Crucible 4 Bobbin 5 Feeding gear 11 Pieces (object to be processed)
E Electron beam X Metal A solid Y Alloy wire

Claims (16)

  A vacuum deposition method for depositing an alloy film containing at least two kinds of metals, metal A and metal B (wherein metal B has a higher vapor pressure than metal A) on the surface of an individual piece to be processed. In the coating material melting and evaporating section inside the vacuum processing chamber, electrons are applied to the alloy wire including the solid of metal A in the crucible and the metal A and metal B guided at a predetermined feed rate directly above the crucible. By irradiating the wire and simultaneously evaporating and evaporating the solid of metal A and the alloy wire, an alloy film with a metal composition corresponding to the feeding speed of the alloy wire is deposited on the surface of the piece located above the coating material melting and evaporating part A vacuum evaporation method characterized by forming.   The vacuum deposition method according to claim 1, wherein the temperature of the piece is controlled to 150 ° C or lower.   3. The vacuum vapor deposition method according to claim 1, wherein the driving power of an electron gun for generating an electron beam is controlled to 50 kW or less.   The vacuum evaporation method according to any one of claims 1 to 3, wherein a feeding speed of the alloy wire is controlled in a range of 0.1 g / min to 10 g / min.   The vacuum vapor deposition method according to any one of claims 1 to 4, wherein the metal composition of the alloy wire contains 90 mass% to 99 mass% of metal A.   The vacuum evaporation method according to any one of claims 1 to 5, wherein the alloy wire contains hydrogen.   The vacuum deposition method according to claim 6, wherein the hydrogen content is 0.5 ppm to 20 ppm.   The individual pieces are housed in a cylindrical barrel having a mesh structure that can revolve around a horizontal axis, and the metal barrel A is made of metal A in the coating material melting and evaporating section disposed on or near the revolution axis while revolving the cylindrical barrel. The solid and the alloy wire are simultaneously melted and evaporated, and the alloy film is deposited on the surface of the individual piece accommodated in the cylindrical barrel located above the coating material melting and evaporating part. A vacuum deposition method according to claim 1.   The vacuum deposition method according to claim 1, wherein the metal composition of the alloy coating contains 85 mass% or more of metal A.   The vacuum deposition method according to claim 1, wherein the metal A is Al and the metal B is at least one selected from Mg, Mn, and Zn.   The vacuum vapor deposition method according to claim 1, wherein the piece is a rare earth permanent magnet.   The compositional gradient in the thickness direction is given to the alloy film formed by vapor deposition on the surface of the individual piece by changing the feeding speed of the alloy wire during the vapor deposition process. A vacuum deposition method according to claim 1.   By changing the feeding speed of the alloy wire so that it is slower at the end than the start of the vapor deposition process, the metal composition of the alloy film formed on the surface of the piece is more than the interface with the piece. The vacuum deposition method according to claim 12, wherein the ratio of the metal A is higher on the outer surface side.   2. A rare earth-based permanent magnet comprising an alloy film having a predetermined metal composition deposited on the surface by the vacuum deposition method according to claim 1.   15. The rare earth permanent magnet according to claim 14, wherein the alloy film has a composition gradient in the thickness direction.   A vacuum deposition apparatus for depositing and forming an alloy film containing at least two kinds of metals, metal A and metal B (where metal B has a higher vapor pressure than metal A) on the surface of an individual piece to be processed. Then, the coating material melting and evaporating part inside the vacuum processing chamber has electrons with respect to the alloy wire including the solid of the metal A in the crucible and the metal A and the metal B guided at a predetermined feed rate directly above the crucible. A vacuum deposition apparatus characterized by being configured to irradiate a wire and simultaneously melt and evaporate a solid of metal A and an alloy wire.