JP2007147761A - Color filter and liquid crystal display device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a color filter capable of satisfactorily suppressing common short-circuit, and to provide a liquid crystal display device. <P>SOLUTION: The color filter CF is provided with: a substrate 100; a transparent electrode layer 102 disposed on the substrate 100; and black matrices 103 and transparent colored layers 104R, 104G, 104B disposed on the transparent electrode layer 102. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to a color filter and a liquid crystal display device.

  Conventionally, a color filter CF for a TFT liquid crystal display device as shown in FIG. 1 is known. That is, the black matrix 103 and the transparent colored layers 104R, 104G, and 104B are formed on the transparent or opaque substrate 100 directly or via a reflector, and the black matrix 103 and the transparent colored layers 104R, 104G, A transparent overcoat layer 105 is formed on 104B, a transparent electrode layer 102 is formed on the overcoat layer 105, and a columnar spacer 106 is formed on the transparent electrode layer 102. A TFT type liquid crystal drive substrate having a TFT array is laminated on the color filter CF, and a liquid crystal is filled between the color filter CF and the TFT type liquid crystal drive substrate, thereby completing a TFT type liquid crystal display device.

In recent TFT type liquid crystal display devices, in order to improve display performance by high-speed driving of liquid crystal, a device for narrowing the gap between the color filter and the TFT type liquid crystal driving substrate as much as possible has been devised.
JP-A-5-27115 JP 2002-357828 A JP 2002-350888 A

  However, when the gap between the color filter and the liquid crystal driving substrate is narrowed, the conductive foreign matter existing between the color filter substrate and the TFT type liquid crystal driving substrate causes a gap between the color filter and the TFT type liquid crystal driving substrate. Short circuit phenomenon easily occurs. When such a short-circuit phenomenon occurs, normal display can be performed at a portion where the foreign matter exists. Such a trouble is called a common short.

  In order to prevent such troubles, thorough foreign matter removal measures have been taken at the manufacturing site. However, as the gap becomes smaller, it becomes more difficult to suppress the trouble, and a fundamental solution is desired. The present invention has been made in view of the above problems, and an object of the present invention is to provide a color filter and a liquid crystal display device capable of sufficiently suppressing common shorts.

  The color filter according to the present invention includes a substrate, a transparent electrode layer provided on the substrate, and a black matrix and a colored layer provided on the transparent electrode layer.

  According to the present invention, the transparent electrode layer is provided under the black matrix and the colored layer. Therefore, when such a color filter and a TFT type liquid crystal driving substrate are stacked with a spacer interposed therebetween, even if there is a conductive foreign matter between them, the pixel electrode of the TFT type liquid crystal driving substrate, Short circuit phenomenon with the transparent electrode layer of the color filter can be suppressed.

  Here, it is preferable to further provide an overcoat layer on the black matrix and the colored layer. According to this, the surface can be flattened, and this overcoat layer further reduces the short circuit phenomenon between the pixel electrode of the TFT type liquid crystal driving substrate and the transparent electrode layer of the color filter due to the conductive foreign matter. Can be suppressed.

  The material for the transparent electrode layer is preferably indium tin oxide or indium zinc oxide.

  The black matrix material is preferably a resin. The color filter is suitable for a TFT type liquid crystal display device.

  A liquid crystal display device according to the present invention is a liquid crystal display device including the above-described color filter for liquid crystal and a TFT type liquid crystal driving substrate.

  ADVANTAGE OF THE INVENTION According to this invention, the color filter and liquid crystal display device which can fully suppress a common short are provided.

  The color filter and liquid crystal display device according to the present invention will be described.

  As shown in FIG. 2, the color filter for TFT liquid crystal according to the present invention includes a transparent or opaque substrate 100, a transparent electrode layer 102 provided on the substrate 100, and a black provided on the transparent electrode layer 102. A matrix 103 and transparent colored layers 104R, 104G, and 104B; an overcoat layer 105 provided on the black matrix 103 and the transparent colored layers 104R, 104G, and 104B; and a spacer 106 provided on the overcoat layer 105. ing.

  The material of the transparent or opaque substrate 100 is not particularly limited, but is made of quartz glass, borosilicate glass, aluminum silicate glass, inorganic glass such as soda lime glass coated with silica on the surface, rigid material such as artificial quartz glass, or A flexible material such as a resin film or sheet and an optical resin plate is preferable, and transparent quartz glass and a transparent resin film are particularly preferable.

  The material of the transparent electrode layer 102 is not particularly limited, but indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO), tin oxide (SnO), and alloys thereof are preferable. Indium tin oxide (ITO) and indium zinc oxide (IZO) are preferable.

  Although the thickness of the transparent electrode layer 102 is not specifically limited, For example, it is 100-300 nm (preferably 150 nm).

  There is no restriction | limiting in particular in the formation method of the transparent electrode layer 102, For example, it can form by common film-forming methods, such as sputtering method, a vacuum evaporation method, CVD method, and the apply | coating method.

  Although the shape of the black matrix 103 is not particularly limited, the black matrix 103 is preferably formed on the transparent electrode layer 102 in a lattice (matrix) shape or a stripe shape.

  The material of the black matrix 103 is not particularly limited, but a resin material including light shielding particles (for example, carbon fine particles and metal oxide particles), for example, a thermosetting resin material (polyimide resin, acrylic resin, epoxy resin, etc.) Or a photosensitive resin material is preferred. Since the resin is highly insulating, the short-circuit suppressing effect described later is also high. Further, as a material of the black matrix 103, a laminate of a chromium compound layer such as chromium oxide and / or chromium nitride and a chromium layer may be used. Such a laminate can be easily formed by a sputtering method, a vacuum deposition method, or the like.

  The black matrix 103 can be formed by, for example, forming a resin layer containing light-shielding particles or a laminate in which a chromium layer and a chromium compound layer are laminated on the transparent electrode layer 102 and patterning the laminate.

  The thickness of the black matrix is not particularly limited, but in the case of the resin black matrix 103, the thickness can be set to, for example, 1.0 to 2.0 μm (preferably 1.2 μm). In the case of the black matrix 103 in which layers are stacked, the thickness can be set to, for example, 100 to 200 nm.

  The transparent colored layers 104R, 104G, and 104B are disposed in the openings of the black matrix 103, for example, in a lattice or between stripes.

  The material of the transparent colored layers 104R, 104G, and 104B is not particularly limited, but a thermosetting resin material or a photosensitive resin material that may contain a red pigment, a purple pigment, a blue pigment, a yellow pigment, a green pigment, and the like. preferable. Since the resin is highly insulating, the short-circuit suppressing effect described later is also high.

  The organic pigment for coloring used in the transparent colored layers 104R, 104G, and 104B is not particularly limited, and may be a compound classified as a pigment in the color index (published by The Society of Dyers and Colorists), Preferably, C.I. I. Pigment yellow 1, C.I. I. Pigment yellow 3, C.I. I. Pigment yellow 12, C.I. I. Pigment yellow 13, C.I. I. Pigment yellow 138, C.I. I. Pigment yellow 150, C.I. I. Pigment yellow 180, C.I. I. Yellow pigments such as C.I. Pigment Yellow 185, C.I. I. Pigment red 1, C.I. I. Pigment 2, C.I. I. Pigment red 3, C.I. I. Pigment red 254, C.I. I. Red pigments such as C.I. Pigment Red 177, C.I. I. Pigment blue 15, C.I. I. Pigment blue 15: 3, C.I. I. Pigment blue 15: 4, C.I. I. Pigment blue 15: 6 and the like, and C.I. I. Pigment violet 23:19, C.I. I. Examples thereof include CI Pigment Green 36 and the like and carbon black.

  The thickness of the transparent colored layers 104R, 104G, and 104B is not particularly limited, but is preferably 1.0 to 2.0 μm so as to provide a sufficient short circuit suppressing effect.

  The black matrix 103 may be formed by overlapping the ends of transparent colored layers having different colors.

  Specific production methods of the transparent colored layers 104R, 104G, 104B and the black matrix 103 are not particularly limited. For example, a relief dyeing method, a pigment dispersion method, an electrodeposition method, a printing method, an ink jet method, an electrophotographic method, a silver salt Laws, etc. are applicable.

  The overcoat layer 105 is formed on the transparent colored layers 104R, 104G, and 104B and the black matrix 103, and contributes to flattening the surface of the color filter CF.

  The material of the overcoat layer 105 is not particularly limited as long as it is a transparent and insulating film. For example, a resin in which a styrylpyridium group, a stilbazole group, or the like is made pendant on polyvinyl alcohol, an acrylate copolymer, or the like. A resin having a known oxygen barrier property is preferable.

  The thickness of the overcoat layer 105 is not particularly limited. For example, the thickness of the overcoat layer 105 is preferably 1.0 to 2.0 μm (preferably 1.5 μm) on the black matrix 103 and the transparent colored layers 104R, 104G, and 104B.

  The manufacturing method of the overcoat layer 105 is not specifically limited, A well-known application | coating, a drying method, etc. are applicable. Note that the present invention can be implemented without the overcoat layer 105.

  The spacer 106 is provided on the overcoat layer 105. The spacer 106 has a so-called columnar shape and can be manufactured by a photolithography method using a photosensitive resin material or the like. The height of the spacer 106 is not particularly limited, but is preferably about 2.5 to 6.0 μm.

  Next, a TFT type liquid crystal display device LCD according to the present invention will be described with reference to FIG.

  The liquid crystal display device LCD mainly includes a color filter CF and a TFT type liquid crystal driving substrate TA.

  The color filter CF has been described above, but an alignment film 108 made of a polyimide resin or the like is provided on the overcoat layer 105.

  In addition, the TFT type liquid crystal driving substrate TA is provided with a pixel electrode (TFT array) 201 on a transparent substrate 200 and an alignment film 202 such as a polyimide resin on the pixel electrode 201.

  A gap between the TFT type liquid crystal driving substrate TA and the color filter CF is defined by the spacer 106. A liquid crystal 300 is filled between the TFT type liquid crystal driving substrate TA and the color filter CF.

  According to the present invention, in the color filter CF, the transparent electrode layer 102 is under the black matrix 103 and the transparent colored layers 104R, 104G, and 104B, and further under the overcoat layer 105. Therefore, when the color filter CF and the TFT type liquid crystal drive substrate TA are overlapped, even if conductive foreign matter is mixed between the color filter CF and the liquid crystal drive substrate TA, the pixel electrode 201 of the liquid crystal drive substrate TA, etc. And the transparent electrode layer 102 of the color filter CF can be sufficiently suppressed. Therefore, it is possible to obtain a TFT type liquid crystal display device having almost no common short-circuit trouble.

  In addition, this invention is not limited to the said embodiment, A various deformation | transformation aspect is possible. For example, the pattern shape of the black matrix 103 and the transparent colored layer 104 is arbitrary, and the black matrix 103 and the transparent colored layer 104 that are arbitrarily patterned may be provided on the single transparent electrode layer 102. .

  EXAMPLES Hereinafter, although this invention is demonstrated further in detail using an Example, this invention is not limited to these Examples.

Example 1
150 nm of indium tin oxide was formed as a transparent electrode layer on an Eagle 2000 glass substrate for liquid crystal manufactured by Corning having an outer dimension of 370 mm × 470 mm and a thickness of 0.5 mm by a sputtering method. Next, a functional resin material for black matrix (CFPR-BK8000 type) manufactured by Tokyo Ohka Kogyo Co., Ltd. is uniformly applied to the glass substrate on which the transparent electrode layer has been formed by a non-spin coating method, and patterned by a photolithography method to form a black matrix. It was formed with a thickness of 1.2 μm. Further, a red color resist NF-R301, a green color resist NF-G22M, and a blue color resist NF-B016M manufactured by Sumitomo Chemical are used on a glass substrate on which a black matrix is formed, and patterning is performed by a spin coating method and a photolithography method. A patterned transparent colored layer made of a pigment-dispersed resin was formed to a thickness of 1.2 μm. Next, JSR overcoat material SS-6808 was applied to the glass substrate on which the black matrix and the transparent colored layer were formed by spin coating, and dried to form an overcoat layer with a thickness of 1.5 μm. A columnar spacer having a height of 3.5 μm was formed by photolithography using a JSR spacer material NN750G on the layer to obtain a color filter for a TFT type liquid crystal display device. A TFT liquid crystal display device was manufactured by a known method using the obtained color filter and the TFT type liquid crystal driving substrate. The liquid crystal display device had no display defects due to common shorts.

(Comparative Example 1)
Comparative Example 1 was performed in the same manner as in Example 1 except that the stacking order was changed. Specifically, a black matrix and a colored resin layer were formed on a glass substrate, then an overcoat layer was formed on the black matrix and the colored resin layer, and indium tin oxide was further formed on the overcoat layer. A TFT liquid crystal display device was manufactured by the same method as in Example 1 using the obtained color filter. The liquid crystal display device has a common short-circuit problem due to the influence of minute metals mixed as foreign matters.

(Example 2)
In Example 2, 160 nm of indium zinc oxide was formed as a transparent electrode layer on a 1737 glass substrate (370 × 470 mm) for liquid crystal manufactured by Corning by a known sputtering method. Next, a red color resist NF-R301, a green color resist NF-G22M, and a blue color resist NF-B016M manufactured by Sumitomo Chemical are used on a glass substrate on which a transparent electrode layer is formed, and by spin coating and patterning by a photolithography method. A transparent colored layer of each color was formed with a thickness of 1.2 μm, and an end portion of each transparent colored layer was overlapped with 10 μm to form a superposed black matrix. Next, JSR overcoat material SS-5808 was applied onto a glass substrate on which a transparent colored layer and a black matrix were formed, and dried to form an overcoat layer having a thickness of 1.5 μm. Further, a columnar spacer was formed with a height of 4.0 μm by photolithography using a JSR spacer material NN750G to obtain a TFT liquid crystal color filter. A TFT liquid crystal display device was manufactured by a known method using the obtained color filter. The liquid crystal display device had no display defects due to common shorts.

(Comparative Example 2)
In Comparative Example 2, the same procedure as in Example 2 was performed except that the stacking order was changed. Specifically, a patterned transparent colored layer and a superimposed black matrix were formed on a glass substrate, then an overcoat layer was formed, indium zinc oxide was further formed, and columnar spacers were formed thereon. A TFT liquid crystal display device was manufactured by the same method as in Example 2 using the obtained color filter. The liquid crystal display device has a common short-circuit problem due to the influence of minute metals mixed as foreign matters.

(Example 3)
150 nm of indium tin oxide was formed as a transparent electrode layer by CVD on a 1737 glass substrate for liquid crystal manufactured by Corning. Next, a black matrix was formed on the glass substrate on which the transparent electrode layer was formed by the same method as in Example 1. Next, C.I. I. Red ink obtained by making Pigment Red 254 into fine particles, C.I. I. Pigment green 36 atomized green ink, and C.I. I. A transparent colored layer was formed by an inkjet method using a blue ink obtained by atomizing Pigment Blue 15. Next, an overcoat layer is formed on a glass substrate on which a black matrix and a transparent colored layer are formed in the same manner as in Example 1. Further, columnar spacers are formed on the overcoat layer in the same manner as in Example 1 to provide TFT liquid crystal. A color filter was obtained. A TFT liquid crystal display device was manufactured by a known method using the obtained color filter. The liquid crystal display device had no display defects due to common shorts.

Example 4
In Example 4, instead of the ink jet method in Example 3, C.I. I. Red ink obtained by making Pigment Red 254 into fine particles, C.I. I. Pigment green 36 atomized green ink, and C.I. I. A transparent colored layer was formed by a printing method using a blue ink obtained by atomizing pigment blue 15 and a color filter for TFT liquid crystal was obtained in the same manner as in Example 3. A TFT liquid crystal display device was manufactured by a known method using the obtained color filter. The liquid crystal display device had no display defects due to common shorts.

(Example 5)
In Example 5, instead of the inkjet method in Example 3, C.I. I. Red electronic toner obtained by making Pigment Red 254 into fine particles, C.I. I. Pigment Green 36 atomized green electronic toner, and C.I. I. A transparent colored layer was formed by electrophotography using a blue electronic toner obtained by atomizing pigment blue 15, and a color filter for TFT liquid crystal was obtained in the same manner as in Example 3. A TFT liquid crystal display device was manufactured by a known method using the obtained color filter. The liquid crystal display device had no display defects due to common shorts.

(Example 6)
In Example 6, a transparent polyethylene naphthalate film was used in place of Corning's Eagle 2000 glass substrate manufactured by Corning in Example 1, and the heating temperature was maintained at 150 ° C. or lower. A color filter was obtained. A TFT liquid crystal display device was manufactured by a known method using the obtained color filter. The liquid crystal display device had no display defects due to common shorts.

FIG. 1 is a cross-sectional view showing a conventional color filter. FIG. 2 is a cross-sectional view showing a color filter according to the present invention. FIG. 3 is a cross-sectional view showing a liquid crystal display device according to the present invention.

Explanation of symbols

DESCRIPTION OF SYMBOLS 100 ... Substrate, 102 ... Transparent electrode layer, 103 ... Black matrix layer, 104R, 104G, 104B ... Transparent colored layer, 105 ... Overcoat layer, 106 ... Columnar spacer, CF ... Color filter, TA ... Liquid crystal drive substrate, LCD ... Liquid crystal display device.

Claims (6)

A substrate,
A transparent electrode layer provided on the substrate;
A black matrix and a transparent colored layer provided on the transparent electrode layer;
A color filter comprising:   The color filter according to claim 1, further comprising an overcoat layer on the black matrix and the transparent colored layer.   The color filter according to claim 1 or 2, wherein a material of the transparent electrode layer is indium tin oxide or indium zinc oxide.   The color filter according to claim 1, wherein a material of the black matrix is a resin.   The color filter according to claim 1, wherein the color filter is for a TFT type liquid crystal display device. A color filter according to any one of claims 1 to 5;
A liquid crystal display device comprising: a TFT type liquid crystal driving substrate.

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