KR20090066459A - Color filter substrate of liquid crystal display device and method for manufacturing the same - Google Patents

Color filter substrate of liquid crystal display device and method for manufacturing the same Download PDF

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Publication number
KR20090066459A
KR20090066459A KR1020070133990A KR20070133990A KR20090066459A KR 20090066459 A KR20090066459 A KR 20090066459A KR 1020070133990 A KR1020070133990 A KR 1020070133990A KR 20070133990 A KR20070133990 A KR 20070133990A KR 20090066459 A KR20090066459 A KR 20090066459A
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KR
South Korea
Prior art keywords
color filter
color
black matrix
method
formed
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Application number
KR1020070133990A
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Korean (ko)
Inventor
백주현
이응규
정지영
조우식
한창수
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삼성전자주식회사
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Priority to KR1020070133990A priority Critical patent/KR20090066459A/en
Publication of KR20090066459A publication Critical patent/KR20090066459A/en

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    • GPHYSICS
    • G02OPTICS
    • G02FDEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133514Colour filters
    • G02F1/133516Methods of making thereof, e.g. printing, electro-deposition, photolithography
    • GPHYSICS
    • G02OPTICS
    • G02FDEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133512Light shielding layers, e.g. black matrix
    • GPHYSICS
    • G02OPTICS
    • G02FDEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133514Colour filters
    • G02F2001/133519Colour filters overcoating

Abstract

A color filter substrate for an LCD device and a manufacturing method thereof are provided to laminate color resist use for forming a color filter on a black matrix, thereby reducing the amount used of black matrix resin. A color filter substrate for an LCD(Liquid Crystal Display) includes a substrate(110), a black matrix(120), an optical cut-off color filter(132), and a color embodiment color filter(130). The substrate is segmented by a-pixel region and a pixel region. The black matrix and the optical cut-off color filter are deposited in the non-pixel region. The color embodiment color filter is formed on the pixel region.

Description

Color filter substrate for liquid crystal display device and manufacturing method therefor {COLOR FILTER SUBSTRATE OF LIQUID CRYSTAL DISPLAY DEVICE AND METHOD FOR MANUFACTURING THE SAME}

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device, and more particularly, to a color filter substrate for a liquid crystal display device and a method of manufacturing the same, which can reduce manufacturing cost.

In general, a liquid crystal display (LCD) displays an image by adjusting the light transmittance of the liquid crystal using an electric field. To this end, the liquid crystal display includes a liquid crystal panel in which liquid crystal cells are arranged in a matrix and a driving circuit for driving the liquid crystal panel. In addition, the liquid crystal panel includes a pixel electrode and a common electrode for applying an electric field to each of the liquid crystal cells.

The pixel electrode is formed for each liquid crystal cell on the lower substrate, while the common electrode is integrally formed on the front surface of the upper substrate. Each of the pixel electrodes is connected to a thin film transistor used as a switching element, and the pixel electrode drives the liquid crystal cell together with the common electrode according to a data signal supplied through the thin film transistor.

Meanwhile, the active matrix type liquid crystal display includes a color filter including sub pixels of red (R), green (G), and blue (B) to implement color. The color filter expresses color by applying a color signal corresponding to each color filter to control brightness.

In addition, the liquid crystal display includes a black matrix for preventing light leakage between each sub-pixel. The black matrix is typically formed using a metal film such as chromium (Cr) or a carbon-based organic material, and prevents light leakage between subpixels of red (R), green (G), and blue (B). It must be formed to have a sufficient thickness in order to.

However, such materials are expensive and require improvement of the structure for cost reduction.

SUMMARY OF THE INVENTION The present invention has been made in an effort to provide a color filter substrate for a liquid crystal display device and a method of manufacturing the same, which can reduce a material cost when forming a black matrix and reduce costs.

In order to achieve the above technical problem, the color filter substrate for a liquid crystal display device of the present invention is divided into a non-pixel region and a pixel region; A black matrix and a light blocking color filter stacked on the non-pixel region; And a color implementation color filter formed on the pixel region.

The color implementation color filter includes red, green, and blue color filters formed at predetermined positions of the pixel area.

The light blocking color filter may include at least one of red, green, and blue color filters formed on the black matrix.

The light blocking color filter may include red and blue color filters formed on the black matrix.

The black matrix is preferably formed to have a thickness of 0.5 to 1.0㎛.

The light blocking color filter is preferably formed to have a thickness of 0.5 to 1.05㎛.

The display device may further include a common electrode formed on the color implementation color filter and the light blocking color filter.

An overcoat layer formed on the color implementation color filter and the light blocking color filter; And a common electrode formed on the overcoat layer.

In order to achieve the above technical problem, a method of manufacturing a color filter substrate for a liquid crystal display device of the present invention (S1) comprising the steps of providing a substrate divided into a non-pixel region and a pixel region; (S2) forming a black matrix in the non-pixel region of the substrate; And (S3) forming a color implementation color filter in the pixel region and forming a light blocking color filter on the black matrix of the non-pixel region.

The color implementation color filter includes red, green, and blue color filters formed at predetermined positions of the pixel area.

The light blocking color filter may include at least one of red, green, and blue color filters formed on the black matrix.

The light blocking color filter may include red and blue color filters formed on the black matrix.

The black matrix is preferably formed to have a thickness of 0.5 to 1.0㎛.

The light blocking color filter is preferably formed to have a thickness of 0.5 to 1.05㎛.

The step (S3) may be performed by applying and patterning red, blue and green color resists to the substrate on which the black matrix is formed in any order.

The patterning can be performed by using photolithography.

The method may further include forming a common electrode on the color implementing color filter and the light blocking color filter.

Forming an overcoat layer on the color implementation color filter and the light blocking color filter; And forming a common electrode on the overcoat layer.

It may be formed by further comprising a common electrode formed on the overcoat layer.

As described above, the color filter substrate for a liquid crystal display according to the present invention and a method for manufacturing the same reduce the use of materials by reducing the thickness of the black matrix when forming the black matrix, and the color resist used for forming the color filter onto the black matrix By stacking for blocking and thickness flattening, the amount of black matrix resin used can be reduced, thereby greatly reducing manufacturing costs.

Other technical problems and advantages of the present invention in addition to the above technical problem will become apparent from the description of the preferred embodiment of the present invention with reference to the accompanying drawings.

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to FIGS. 1 to 4C.

1 is an exploded perspective view illustrating a liquid crystal display panel including a color filter substrate according to an exemplary embodiment of the present invention.

As shown in FIG. 1, the liquid crystal display panel 150 according to an exemplary embodiment of the present invention may include a liquid crystal 30 interposed between the thin film transistor substrate 40 and the color filter substrate 100 and the two substrates 40 and 100. Include.

The liquid crystal 30 is made of a material having dielectric anisotropy and refractive index anisotropy, and has a common pixel voltage from the pixel electrode 90 of the thin film transistor substrate 40 and the common electrode 140 of the color filter substrate 100. The light transmittance is adjusted by rotating by the difference of voltage.

The thin film transistor substrate 40 is formed on the lower substrate 10 on the gate line 60 and the data line 70 formed to cross each other, the thin film transistor 80 adjacent to the intersection portion, and the pixel region provided with the crossing structure. The formed pixel electrode 90 and the like.

The thin film transistor 80 supplies the data voltage supplied from the data line 70 to the pixel electrode 90 in response to a scan signal supplied from the gate line 60. The thin film transistor 80 includes a gate electrode, a source electrode, a drain electrode, an active layer, an ohmic contact layer, and the like.

The pixel electrode 90 charges the pixel voltage according to the data voltage supplied from the thin film transistor 80 to generate a potential difference with the common electrode 140 formed on the color filter substrate 100. Due to the potential difference, the liquid crystal 30 positioned between the thin film transistor substrate 40 and the color filter substrate 100 is rotated by the dielectric anisotropy, and the amount of light incident from the backlight assembly via the pixel electrode 90 is adjusted. The light is transmitted toward the color filter substrate 100.

The color filter substrate 100 includes a black matrix 120, a color filter 130, and a common electrode 140 formed on the upper substrate 110.

The color filter substrate 100 is divided into a pixel region P and a non-pixel region Q.

The non-pixel region Q includes a black matrix 120 and a light blocking color filter 132 stacked on the black matrix 120. Here, the light blocking color filter 132 may be formed by stacking a blue light blocking color filter formed of a blue color resist and a red light blocking color filter formed of a red color register. However, the light blocking color filter 132 is formed by stacking blue and red light blocking color filters, and does not limit the order and the material thereof. The light blocking color filters 132 include red, green, and blue (R, G, and B) filters. At least one light blocking color filter 132 of the 132 may be included.

The pixel region P includes the color implementation color filters 130 of red, green, and blue (R, G, B) formed in each sub-pixel unit. The color implementation color filter 130 is formed to be divided into red (R), green (G), and blue (B) in the cell region divided by the black matrix 120 and the light blocking color filter 132, and thus red and green. And blue light are respectively transmitted.

The light blocking color filter 132 stacked on the black matrix 120 may function as a black matrix. The black matrix 120 and the light blocking color filter 132 divide the upper substrate 110 on which the color implementing color filter 130 is formed into a plurality of cell regions, and reduce light interference and external light reflection between adjacent cells. prevent. To this end, the black matrix 120 and the light blocking color filter 132 may overlap the at least one of the data line 70, the gate line 60, and the thin film transistor 80 formed on the lower substrate 10. Formed on 110.

The common electrode 140 supplies a common voltage as a reference when driving the liquid crystal 30 to the transparent conductive layer.

In general, the liquid crystal display panel 150 attaches polarizing plates to the outer surfaces of the thin film transistor substrate 40 and the color filter substrate 100 to represent pixels through polarization.

FIG. 2A is a plan view illustrating a color filter substrate for a liquid crystal display according to an exemplary embodiment of the present invention, and FIG. 2B is a cross-sectional view taken along the line II ′ of FIG. 1.

As shown in FIGS. 2A and 2B, the color filter substrate 100 for a liquid crystal display according to the exemplary embodiment may include a substrate 110, a black matrix 120, a color implementation color filter 130, and light blocking. The color filter 132 and the common electrode 140 are included. The color filter substrate 100 may be divided into a pixel region P and a non-pixel region Q. FIG. In the pixel region P, red, green, and blue color implementing color filters 130a, 130b, and 130c are formed for each sub-pixel unit of red (R), green (G), and blue (B). The non-pixel region Q includes a light blocking color filter 132 in which a black matrix 120, a blue light blocking color filter 132a, and a red light blocking color filter 132b are sequentially stacked.

Here, the black matrix 120 may be formed to a thickness of 0.5㎛ ~ 1.0㎛. When the black matrix 120 is formed to a thickness of less than 0.5㎛, the light blocking properties are reduced, when formed to a thickness exceeding 1.0㎛, the black matrix 120 material ratio is increased, so the thickness of the black matrix 120 It is preferable to form 0.5 micrometer-1.0 micrometer. The black matrix 120 formed to the above thickness has an effect of reducing the material cost. The light blocking color filter 132 stacked on the black matrix 120 may be formed to a thickness of 0.5 μm to 1.05 μm. When the light blocking color filter 132 is formed to have a thickness of less than 0.5 μm, the light blocking property may be degraded as in the case of the black matrix, and when the light blocking color filter 132 is formed to a thickness exceeding 1.05 μm, the black matrix 120 may be relatively formed. Since the thickness of the thin film should be reduced, the light blocking characteristic can be reduced. Therefore, the thickness of the light blocking color filter 132 is preferably formed to 0.5㎛ ~ 1.05㎛. The light blocking color filter 132 formed to the thickness as described above does not add a separate material cost, and has the effect of serving as a black matrix.

Compared with the conventional black matrix, the amount of resin used to prepare the black matrix is reduced by 50% or more, and the remaining area is replaced by the color resist used to prepare the color filter.

As shown in FIG. 3, the blue (B) spectrum of the red (R), green (G), and blue (B) spectrums has a high transmittance characteristic in a relatively short wavelength band of 400 nm to 500 nm, and red (R) spectrum. The spectrum shows high transmittance characteristics in a relatively long wavelength band of 600 nm to 700 nm or more.

Therefore, in the embodiment of the present invention, by using a blue (B) color resist having a characteristic of transmitting only short wavelengths and absorbing the rest, and a red (R) color resist having a characteristic of transmitting only the long wavelength and absorbing the remaining wavelengths, Since it can absorb light, the same light blocking effect as that of the black matrix can be obtained.

In addition, the light blocking color filter 132 may further include a green light blocking color filter using a green (G) color resist. The green (G) spectrum shows high transmittance characteristics in the intermediate wavelength band of 450 nm to 650 nm, as shown in FIG. 3. Therefore, by further providing a green light blocking color filter, the black matrix 120 may further enhance the wavelength range of the light absorbed light. An overcoat layer may be further included on the color implementing color filter 130 and the light blocking color filter 132 to planarize the surface of the color implementing color filter 130 and the light blocking color filter 132.

Here, the color resist has a negative type, and in the photoresist process using a mask, an unexposed region is developed with respect to light, and the pattern of the exposed region remains. Therefore, the filling of the black matrix region with color resist does not increase the cost of the raw material and can simplify the process.

4A to 4H are cross-sectional views illustrating a method of manufacturing a color filter substrate for a liquid crystal display according to a first embodiment of the present invention.

Referring to FIG. 4A, a black matrix 120 is formed on the substrate 110. The black matrix 120 can be formed by depositing using a mask. The black matrix 120 may be formed to be spaced apart by a predetermined interval by the color implementation color filter region where each sub-pixel is formed.

4B and 4C, a blue (B) color implementation color filter 130a and a blue light blocking color filter 132a are formed. As shown in FIG. 4B, a blue color resist 210a is applied to the entire surface of the substrate 110 on which the black matrix 120 is formed. Here, the method of applying the blue color resist 210a may be a method using spin coating or roll coating.

First, the spin coating method is a method of spreading the color resist evenly across the substrate by flowing a predetermined amount of color resist on the substrate and rotating the substrate at a high speed. On the other hand, the roll coating method is a method of transferring and printing the color resist developed on the roll onto a substrate.

The main component of the blue color resist 210a may be composed of a photopolymerization initiator, a monomer, a binder, and the like, an organic pigment that implements color, such as a general photoresist.

Next, a halftone mask including a transmissive portion A through which light is transmitted, a light shielding portion X through which light is not transmitted, and a transflective portion H through which only a predetermined amount of light is transmitted, on the blue color resist 210a. After masking using 220, ultraviolet light (UV) or the like is irradiated to selectively expose the blue color resist 210a.

In this case, the exposure method may include a proximity method for exposing the original light to daylight, a stepper method for repeatedly exposing a reduced pattern, and a mirror projection method for projecting and exposing a mask pattern.

The blue color resist 210a having the photochemical structure changed by the exposure is cured at a high temperature of about 230 ° C., and then developed to form a blue color implementing color filter 130a as shown in FIG. 4C. The blue light blocking color filter 132a is formed on the black matrix 120.

In the present embodiment, since the blue color resist 210a is a negative type, an unexposed area is developed so that no pattern remains, and the exposed area remains a pattern. Therefore, the material cost for the color resist is not added.

When the blue color resist 210a is developed to form the blue color implementing color filter 130a, a portion corresponding to the transflective portion H is partially exposed to the black matrix 120 to a predetermined thickness without being completely removed during development. ) And the blue light blocking color filter 132a is formed.

4D and 4E, a red (R) color implementation color filter 130b and a red light blocking color filter 132b are formed. As shown in FIG. 4D, the red color resist 210b is entirely coated on the substrate 110 on which the blue color implementing color filter 130a and the blue light blocking color filter 132a are formed.

Next, a halftone mask including a transmissive portion A through which light is transmitted, a light shielding portion X through which light is not transmitted, and a transflective portion H through which only a predetermined amount of light is transmitted, on the red color resist 210b. After masking using 220, the red color resist 210b is selectively exposed by irradiating ultraviolet (UV) light or the like.

The red color resist 210b having the photochemical structure changed by the exposure is cured at a high temperature of about 230 ° C., and then developed to form a red color implementing color filter 130b as shown in FIG. 4E. A red light blocking color filter 132b is formed on the blue light blocking color filter 132a.

When the red color resist 210b is developed to form the red color implementing color filter 130b, the portion corresponding to the transflective portion H is partially exposed to light and the blue light blocking color is not completely removed when developing. Since it remains on the filter 132a, a red light blocking color filter 132b is formed.

4F and 4G, a green (G) color implementation color filter 130c is formed. As shown in FIG. 4F, the green color resist 210c is completely coated on the substrate 110 on which the red color implementing color filter 130b and the red light blocking color filter 132b are formed.

Next, after masking using a mask 220 including a light transmitting portion A and a light transmitting portion A through which the light is transmitted through the green color resist 210c, ultraviolet (UV) light or the like. Is irradiated to selectively expose the green color resist 210c.

The green color resist 210c having the photochemical structure changed by the exposure is cured at a high temperature of about 230 ° C., and then developed to form a green color implementing color filter 130c as shown in FIG. 4G.

The light blocking color filter 132 having the blue light blocking color filter 132a and the red light blocking color filter 132b stacked on the black matrix 120 absorbs light having short wavelength and long wavelength, respectively. It can function as a black matrix.

In consideration of light blocking characteristics and cost aspects of the black matrix 120, the black matrix 120 may be formed to a thickness of 0.5 μm to 1.0 μm, and the thickness of the light blocking color filter 132 may be 0.5 μm to 1.05. It is preferably formed in 탆.

Meanwhile, when the green color implementing color filter 130c is formed, the green light blocking color filter may be simultaneously formed on the red light blocking color filter 132b.

5A to 5C are cross-sectional views illustrating a method of manufacturing a color filter substrate for a liquid crystal display according to a second exemplary embodiment of the present invention. Since the remaining steps except for forming the green color implementing color filter 130c are the same, only the forming part of the green color implementing color filter 130c will be described.

5A to 5C, the forming of the green (G) color implementing color filter 130c in the method of manufacturing the color filter substrate for the liquid crystal display according to the second exemplary embodiment of the present invention is illustrated in FIG. 5A. The green color resist 210c is completely coated on the substrate 110 on which the blue and red color implementing color filters 130a and 130b and the red light blocking color filter 132b are formed. Then, the green color resist 210c is selectively exposed using the halftone mask 220 including the transmissive portion A, the light shielding portion X, and the transflective portion H.

When the green color resist 210c is developed to form the green color implementing color filter 130c, a part corresponding to the transflective portion H is partially exposed, so that the green color resist is not completely removed when developing. As shown in FIG. 5B, the green light blocking color filter 132c is formed.

In addition, as illustrated in FIG. 5C, the overcoat layer 230 may be formed to planarize surfaces of the color implementing color filter 130 and the light blocking color filter 132. In this case, since the wavelength region capable of absorbing light is further enlarged, the function as a black matrix can be improved.

Referring to FIG. 4H, the common electrode 140 is formed.

The common electrode 140 is an indium tin oxide, which is a transparent electrode material having good permeability and conductivity and excellent chemical and thermal stability on the substrate 110 on which the color implementing color filter 130 and the light blocking color filter 132 are formed. It may be formed by depositing Oxide (ITO) or Indium Zinc Oxide (IZO) or the like by sputtering.

The common electrode 140 serves to operate the liquid crystal cell together with the pixel electrode formed on the thin film transistor substrate.

In the present exemplary embodiment, a case in which a part that receives light is cured and a part that does not receive light is developed by using a negative type for each color filter resist, but on the contrary, a positive type You can also use the method to harden the unlighted part and develop the lighted part.

In the present embodiment, the case where the color implementation color filters of blue, red, and green are formed in order is described as an example, but the order of color filter formation is not limited thereto.

Although the detailed description of the present invention described above has been described with reference to a preferred embodiment of the present invention, those skilled in the art or those skilled in the art, those skilled in the art will be described in the claims to be described later It is apparent that the present invention can be modified and modified in various ways without departing from the technical scope.

1 is an exploded perspective view illustrating a liquid crystal display panel including a color filter substrate according to an exemplary embodiment of the present invention.

2A is a plan view illustrating a color filter substrate for a liquid crystal display according to an exemplary embodiment of the present invention.

FIG. 2B is a cross-sectional view illustrating a cross section taken along the line II ′ of FIG. 1.

3 is a graph showing spectrums of red, green, and blue.

4A to 4H are cross-sectional views illustrating a method of manufacturing a color filter substrate for a liquid crystal display according to a first embodiment of the present invention.

5A to 5C are cross-sectional views illustrating a method of manufacturing a color filter substrate for a liquid crystal display according to a second exemplary embodiment of the present invention.

<Explanation of symbols for the main parts of the drawings>

10,110 substrate 30 liquid crystal

40: thin film transistor substrate 80: thin film transistor

90 pixel electrode 100 color filter substrate

120: black matrix 130,130a, 130b, 130c: color implementation color filter

132,132a, 132b, 132c: Light Blocking Color Filter

140: common electrode 150: liquid crystal display panel

210a, 210b, 210c: color resist 220: mask

230: overcoat layer

Claims (18)

  1. A substrate partitioned into a non-pixel region and a pixel region;
    A black matrix and a light blocking color filter stacked on the non-pixel region; And
    And a color implementation color filter formed on the pixel region.
  2. The method of claim 1,
    And the color implementing color filter comprises red, green, and blue color filters formed at predetermined positions of the pixel region.
  3. The method according to claim 1 or 2,
    And the light blocking color filter comprises at least one of red, green and blue color filters formed on the black matrix.
  4. The method of claim 3, wherein
    And the light blocking color filter comprises a red and a blue color filter formed on the black matrix.
  5. The method of claim 1,
    The black matrix has a thickness of 0.5 to 1.0㎛ the color filter substrate for a liquid crystal display device.
  6. The method of claim 1,
    The light blocking color filter has a thickness of 0.5 to 1.05㎛ color filter substrate for a liquid crystal display device.
  7. The method of claim 1,
    And a common electrode formed on the color-implementing color filter and the light-blocking color filter.
  8. The method of claim 1,
    An overcoat layer formed on the color implementation color filter and the light blocking color filter; And
    The color filter substrate for a liquid crystal display device, further comprising a common electrode formed on the overcoat layer.
  9. (S1) preparing a substrate partitioned into a non-pixel region and a pixel region;
    (S2) forming a black matrix in the non-pixel region of the substrate; And
    (S3) forming a color implementing color filter in the pixel region and forming a light blocking color filter on the black matrix of the non-pixel region.
  10. The method of claim 9,
    The color realization color filter includes a red, green and blue color filter formed at a predetermined position of the pixel region.
  11. The method according to claim 9 or 10,
    And said light blocking color filter comprises at least one of red, green and blue color filters formed on said black matrix.
  12. The method of claim 11,
    The light blocking color filter includes a red and blue color filter formed on the black matrix.
  13. The method of claim 9,
    The black matrix has a thickness of 0.5 to 1.0㎛ method of manufacturing a color filter substrate.
  14. The method of claim 9,
    The light blocking color filter has a thickness of 0.5 to 1.05㎛ method of manufacturing a color filter substrate.
  15. The method of claim 11,
    Step (S3) is
    A method of manufacturing a color filter substrate, characterized by applying red, blue and green color resists in any order to the substrate on which the black matrix is formed and patterning.
  16. The method of claim 15,
    And said patterning is performed by using photolithography.
  17. The method of claim 9,
    And forming a common electrode on the color-implementing color filter and the light-blocking color filter.
  18. The method of claim 9,
    Forming an overcoat layer on the color implementation color filter and the light blocking color filter; And
    And forming a common electrode on the overcoat layer.
KR1020070133990A 2007-12-20 2007-12-20 Color filter substrate of liquid crystal display device and method for manufacturing the same KR20090066459A (en)

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KR1020070133990A KR20090066459A (en) 2007-12-20 2007-12-20 Color filter substrate of liquid crystal display device and method for manufacturing the same

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