JP2007142366A5 - - Google Patents

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Publication number
JP2007142366A5
JP2007142366A5 JP2006219032A JP2006219032A JP2007142366A5 JP 2007142366 A5 JP2007142366 A5 JP 2007142366A5 JP 2006219032 A JP2006219032 A JP 2006219032A JP 2006219032 A JP2006219032 A JP 2006219032A JP 2007142366 A5 JP2007142366 A5 JP 2007142366A5
Authority
JP
Japan
Prior art keywords
gas
supply port
exposure apparatus
gas supply
vapor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2006219032A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007142366A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2006219032A priority Critical patent/JP2007142366A/ja
Priority claimed from JP2006219032A external-priority patent/JP2007142366A/ja
Priority to PCT/JP2006/321001 priority patent/WO2007046523A1/en
Priority to US11/994,240 priority patent/US7907251B2/en
Priority to KR1020087001419A priority patent/KR20080022201A/ko
Priority to TW095138405A priority patent/TW200731335A/zh
Publication of JP2007142366A publication Critical patent/JP2007142366A/ja
Publication of JP2007142366A5 publication Critical patent/JP2007142366A5/ja
Withdrawn legal-status Critical Current

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JP2006219032A 2005-10-18 2006-08-10 露光装置及びデバイス製造方法 Withdrawn JP2007142366A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2006219032A JP2007142366A (ja) 2005-10-18 2006-08-10 露光装置及びデバイス製造方法
PCT/JP2006/321001 WO2007046523A1 (en) 2005-10-18 2006-10-17 Exposure apparatus and device manufacturing method
US11/994,240 US7907251B2 (en) 2005-10-18 2006-10-17 Exposure apparatus and device manufacturing method
KR1020087001419A KR20080022201A (ko) 2005-10-18 2006-10-17 노광장치 및 디바이스의 제조방법
TW095138405A TW200731335A (en) 2005-10-18 2006-10-18 Exposure apparatus and device manufacturing method

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005302577 2005-10-18
JP2006219032A JP2007142366A (ja) 2005-10-18 2006-08-10 露光装置及びデバイス製造方法

Publications (2)

Publication Number Publication Date
JP2007142366A JP2007142366A (ja) 2007-06-07
JP2007142366A5 true JP2007142366A5 (cg-RX-API-DMAC10.html) 2008-02-28

Family

ID=37962610

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006219032A Withdrawn JP2007142366A (ja) 2005-10-18 2006-08-10 露光装置及びデバイス製造方法

Country Status (5)

Country Link
US (1) US7907251B2 (cg-RX-API-DMAC10.html)
JP (1) JP2007142366A (cg-RX-API-DMAC10.html)
KR (1) KR20080022201A (cg-RX-API-DMAC10.html)
TW (1) TW200731335A (cg-RX-API-DMAC10.html)
WO (1) WO2007046523A1 (cg-RX-API-DMAC10.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9256136B2 (en) 2010-04-22 2016-02-09 Asml Netherlands B.V. Fluid handling structure, lithographic apparatus and device manufacturing method involving gas supply

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101330370B1 (ko) 2004-04-19 2013-11-15 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
TWI439813B (zh) * 2006-05-10 2014-06-01 尼康股份有限公司 A method of manufacturing an exposure apparatus and an element
US8289497B2 (en) * 2008-03-18 2012-10-16 Nikon Corporation Apparatus and methods for recovering fluid in immersion lithography
NL1036631A1 (nl) 2008-03-24 2009-09-25 Asml Netherlands Bv Immersion Lithographic Apparatus and Device Manufacturing Method.
KR101712219B1 (ko) * 2009-03-10 2017-03-03 가부시키가이샤 니콘 노광 장치, 노광 방법, 및 디바이스 제조 방법
JP5016705B2 (ja) 2009-06-09 2012-09-05 エーエスエムエル ネザーランズ ビー．ブイ． 流体ハンドリング構造
NL2005089A (nl) * 2009-09-23 2011-03-28 Asml Netherlands Bv Fluid handling structure, lithographic apparatus and device manufacturing method.
NL2005655A (en) * 2009-12-09 2011-06-14 Asml Netherlands Bv A lithographic apparatus and a device manufacturing method.
NL2006054A (en) * 2010-02-09 2011-08-10 Asml Netherlands Bv Fluid handling structure, lithographic apparatus and device manufacturing method.
NL2007182A (en) * 2010-08-23 2012-02-27 Asml Netherlands Bv Fluid handling structure, module for an immersion lithographic apparatus, lithographic apparatus and device manufacturing method.
EP2423749B1 (en) 2010-08-24 2013-09-11 ASML Netherlands BV A lithographic apparatus and device manufacturing method
NL2007453A (en) * 2010-10-18 2012-04-19 Asml Netherlands Bv A fluid handling structure, a lithographic apparatus and a device manufacturing method.
NL2008199A (en) 2011-02-28 2012-08-29 Asml Netherlands Bv A fluid handling structure, a lithographic apparatus and a device manufacturing method.
NL2008979A (en) 2011-07-11 2013-01-14 Asml Netherlands Bv A fluid handling structure, a lithographic apparatus and a device manufacturing method.
US9256137B2 (en) * 2011-08-25 2016-02-09 Nikon Corporation Exposure apparatus, liquid holding method, and device manufacturing method
US20130050666A1 (en) * 2011-08-26 2013-02-28 Nikon Corporation Exposure apparatus, liquid holding method, and device manufacturing method
NL2009271A (en) * 2011-09-15 2013-03-18 Asml Netherlands Bv A fluid handling structure, a lithographic apparatus and a device manufacturing method.
NL2009378A (en) * 2011-10-07 2013-04-09 Asml Netherlands Bv Lithographic apparatus and method of cooling a component in a lithographic apparatus.
NL2009899A (en) * 2011-12-20 2013-06-24 Asml Netherlands Bv A pump system, a carbon dioxide supply system, an extraction system, a lithographic apparatus and a device manufacturing method.
KR102288916B1 (ko) 2014-12-19 2021-08-12 에이에스엠엘 네델란즈 비.브이. 유체 핸들링 구조체, 리소그래피 장치 및 디바이스 제조 방법
US10562223B2 (en) * 2015-10-29 2020-02-18 National Institute Of Advanced Industrial Science And Technology Imprint device
CN113960889A (zh) 2016-12-14 2022-01-21 Asml荷兰有限公司 光刻设备及器件制造方法
US10503085B2 (en) * 2017-11-16 2019-12-10 Taiwan Semiconductor Manufacturing Co., Ltd. Lithography apparatus and method
JP7166089B2 (ja) * 2018-06-29 2022-11-07 東京エレクトロン株式会社 基板処理装置、基板処理システムおよび基板処理方法
US12072636B2 (en) 2019-09-13 2024-08-27 Asml Netherlands B.V. Fluid handling system and lithographic apparatus
CN112684665B (zh) * 2020-12-25 2024-06-25 浙江启尔机电技术有限公司 一种浸液供给回收装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU2747999A (en) 1998-03-26 1999-10-18 Nikon Corporation Projection exposure method and system
SG135052A1 (en) * 2002-11-12 2007-09-28 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
EP1573730B1 (en) 2002-12-13 2009-02-25 Koninklijke Philips Electronics N.V. Liquid removal in a method and device for irradiating spots on a layer
WO2004086470A1 (ja) * 2003-03-25 2004-10-07 Nikon Corporation 露光装置及びデバイス製造方法
KR101177331B1 (ko) * 2003-04-09 2012-08-30 가부시키가이샤 니콘 액침 리소그래피 유체 제어 시스템
EP1498778A1 (en) * 2003-06-27 2005-01-19 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
US7352433B2 (en) 2003-10-28 2008-04-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2005183744A (ja) * 2003-12-22 2005-07-07 Nikon Corp 露光装置及びデバイス製造方法
WO2005071491A2 (en) * 2004-01-20 2005-08-04 Carl Zeiss Smt Ag Exposure apparatus and measuring device for a projection lens
WO2006101120A1 (ja) * 2005-03-23 2006-09-28 Nikon Corporation 露光装置及び露光方法、並びにデバイス製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9256136B2 (en) 2010-04-22 2016-02-09 Asml Netherlands B.V. Fluid handling structure, lithographic apparatus and device manufacturing method involving gas supply

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