JP2007141645A - Organic el display panel and manufacturing method of the same - Google Patents

Organic el display panel and manufacturing method of the same Download PDF

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JP2007141645A
JP2007141645A JP2005333827A JP2005333827A JP2007141645A JP 2007141645 A JP2007141645 A JP 2007141645A JP 2005333827 A JP2005333827 A JP 2005333827A JP 2005333827 A JP2005333827 A JP 2005333827A JP 2007141645 A JP2007141645 A JP 2007141645A
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light emitting
organic light
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Satoshi Takato
聡 高藤
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Kyocera Display Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide an organic EL display panel preventing an organic light emitting layer from intrusion of moisture, not damaging light emitting property of pixels and life, and a manufacturing method of the same. <P>SOLUTION: An organic light emitting layer 7 and a cathode 8 are arranged so as to run on an end part of an insulation layer 6. A coating film layer 12 is formed in large size so as to cover the organic light emitting layer 7 and the cathode 8 up to outside thereof, and end part of the film layer contacts the side face of barrier ribs 9. By the above, end part of the organic light emitting layer 7 and the cathode 8 are completely covered by the coating film layer 12 made of metallic material or the like, and end face or the like is not exposed. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、有機EL表示パネルおよびその製造方法に関するものである。   The present invention relates to an organic EL display panel and a manufacturing method thereof.

有機EL(エレクトロルミネッセンス)表示パネルとは、陽極電極と陰極電極の間に有機発光層を挟持してなる有機EL素子基板と、この有機EL素子基板に対向する封止基板とを、封止基板の外周部に配設した紫外線硬化型樹脂などのシール材により封止したものである。   An organic EL (electroluminescence) display panel includes an organic EL element substrate having an organic light emitting layer sandwiched between an anode electrode and a cathode electrode, and a sealing substrate facing the organic EL element substrate. It is sealed with a sealing material such as an ultraviolet curable resin disposed on the outer periphery of the resin.

この有機EL表示パネルを構成する有機EL素子基板は、陽極電極の一面に、例えば画素に相当する矩形領域が複数配列された格子状に区画する絶縁層を形成し、このそれぞれの矩形領域ごとに、陽極電極の一面と絶縁層の一部とを覆う有機発光層と陰極電極とを順次積層することによって形成されている。   In the organic EL element substrate constituting the organic EL display panel, on one surface of the anode electrode, for example, an insulating layer partitioned in a lattice shape in which a plurality of rectangular regions corresponding to pixels are arranged is formed. The organic light-emitting layer covering one surface of the anode electrode and a part of the insulating layer and the cathode electrode are sequentially laminated.

ところで、この有機発光層は、水分が僅かに浸透しただけでも特性劣化を起こし、ダークフレームと称される非発光部分の拡大による輝度低下や画素の縮小、あるいは有機EL表示パネルの寿命低下などを生じさせる原因となる。このため、有機発光層に水分を浸透させないような構造にすることが求められている。
特開2001−296819号公報
By the way, this organic light emitting layer causes deterioration of characteristics even when water penetrates slightly, and causes a decrease in luminance, a reduction in pixels due to enlargement of a non-light emitting portion called a dark frame, or a decrease in the life of an organic EL display panel. Cause it to occur. For this reason, it is required to have a structure that does not allow moisture to penetrate into the organic light emitting layer.
JP 2001-296819 A

従来の有機EL素子基板では、絶縁層によって区画された陽極電極上のそれぞれの矩形領域に、蒸着などによって有機発光層を積層した後、水の浸透しない材質からなる陰極電極を積層して有機発光層を覆うことによって、有機発光層に水分が浸透することを防止する構造であった。   In a conventional organic EL element substrate, an organic light emitting layer is laminated on each rectangular area on an anode electrode partitioned by an insulating layer by vapor deposition or the like, and then a cathode electrode made of a material that does not penetrate water is laminated to produce organic light emission. By covering the layer, the organic light emitting layer was prevented from penetrating moisture.

しかしながら、従来の有機EL素子基板では、有機発光層と陰極電極とは、ほぼ同じ大きさに形成されていた。このため、有機発光層の側端(エッジ部分)は陰極電極に完全には覆われずに露出する部分が生じてしまい、この有機発光層の側端から絶縁層と有機発光層との接合部分に沿って、水分が毛管現象あるいは拡散によって有機発光層の内部まで浸透してしまうという不具合が生じていた。   However, in the conventional organic EL element substrate, the organic light emitting layer and the cathode electrode are formed in substantially the same size. For this reason, the side edge (edge part) of the organic light emitting layer is not completely covered with the cathode electrode, but an exposed part is generated, and the junction between the insulating layer and the organic light emitting layer is formed from the side edge of the organic light emitting layer. In this case, there is a problem that moisture penetrates into the organic light emitting layer by capillary action or diffusion.

本発明は上記事情に鑑みてなされたもので、有機発光層に水分が浸透することを防止して、画素の発光特性や寿命などを損なうことがない有機EL表示パネルおよびその製造方法を提供することを目的とする。   The present invention has been made in view of the above circumstances, and provides an organic EL display panel that prevents moisture from penetrating into the organic light emitting layer and does not impair the light emission characteristics and life of the pixel, and a method for manufacturing the same. For the purpose.

上記の目的を達成するために、本発明によれば、陽極電極の一面を複数の矩形領域に区画する絶縁層を形成する工程と、前記陽極電極の一面と前記絶縁層の一部とを覆うように複数の有機発光層を形成する工程と、前記有機発光層の少なくとも一部を覆うように陰極電極を形成する工程と、前記有機発光層および前記陰極電極の周縁よりも外側まで延び、前記有機発光層および前記陰極電極を端部まで覆うような皮膜層を形成する工程とを備え、前記陰極電極を形成する工程を蒸着法によって行い、前記皮膜層を形成する工程をスパッタリング法によって行うことを特徴とする有機EL表示パネルの製造方法が提供される。   In order to achieve the above object, according to the present invention, a step of forming an insulating layer that divides one surface of an anode electrode into a plurality of rectangular regions, and a surface of the anode electrode and a part of the insulating layer are covered. Forming a plurality of organic light emitting layers as described above, forming a cathode electrode so as to cover at least a part of the organic light emitting layer, and extending outside the peripheral edges of the organic light emitting layer and the cathode electrode, Forming a coating layer that covers the organic light emitting layer and the cathode electrode to the end, and performing the step of forming the cathode electrode by a vapor deposition method and performing the step of forming the coating layer by a sputtering method. An organic EL display panel manufacturing method is provided.

前記皮膜層を形成するスパッタリング法は、200〜1×10−2Paの圧力範囲で、希ガスをスパッタリングガスとして用いればよい。 The sputtering method for forming the coating layer may use a rare gas as a sputtering gas in a pressure range of 200 to 1 × 10 −2 Pa.

また、本発明によれば、陽極電極の一面を複数の矩形領域に区画する絶縁層と、前記陽極電極の一面と前記絶縁層の一部とを覆う複数の有機発光層と、前記有機発光層の少なくとも一部を覆う複数の陰極電極と、前記有機発光層および前記陰極電極の周縁よりも外側まで延び、前記有機発光層および前記陰極電極を端部まで覆う皮膜層とを備えたことを特徴とする有機EL表示パネルが提供される。   According to the present invention, an insulating layer that divides one surface of the anode electrode into a plurality of rectangular regions, a plurality of organic light emitting layers that cover one surface of the anode electrode and a part of the insulating layer, and the organic light emitting layer A plurality of cathode electrodes covering at least a part of the organic light-emitting layer, and a coating layer extending to the outside of the organic light-emitting layer and the periphery of the cathode electrode and covering the organic light-emitting layer and the cathode electrode to the end. An organic EL display panel is provided.

互いに隣接する前記陰極電極どうしの間には、前記絶縁層から立ち上がる隔壁がさらに形成されていればよい。また、前記皮膜層の端部は前記隔壁に接していればよい。   A partition wall rising from the insulating layer may be further formed between the cathode electrodes adjacent to each other. Moreover, the edge part of the said film layer should just be in contact with the said partition.

本発明の有機EL表示パネルの製造方法によれば、蒸着によって形成した有機発光層および陰極電極の上に、スパッタリングによって皮膜層を形成することで、例えば逆三角形状の隔壁の根元部分など、蒸着法では積層が難しい部分まで皮膜層が形成され、有機発光層の端面を露出させずに、有機発光層への水分の浸透を完全に防止することが可能になる。これにより、従来課題であった、有機発光層の端面から絶縁層との界面に沿って水分が有機発光層の奥まで浸透してしまうといったことを確実に防止することが可能になる。   According to the method for producing an organic EL display panel of the present invention, a film layer is formed by sputtering on an organic light-emitting layer and a cathode electrode formed by vapor deposition, for example, the root portion of an inverted triangular partition. In this method, the coating layer is formed up to a portion that is difficult to stack, and it is possible to completely prevent the penetration of moisture into the organic light emitting layer without exposing the end face of the organic light emitting layer. Thereby, it is possible to reliably prevent moisture from penetrating from the end face of the organic light emitting layer to the back of the organic light emitting layer along the interface with the insulating layer, which has been a conventional problem.

捕水材などで完全に捕捉しきれずに残留している水分があったとしても、有機発光層に浸透することが無く、有機発光層が水分の浸透によって特性劣化を起こし、ダークフレームなどの非発光部分の拡大による輝度低下や画素の縮小、あるいは有機EL表示パネルの寿命低下などの不具合の発生を効果的に防止することが可能になる。   Even if there is moisture that could not be completely captured by the water trapping material, etc., it would not penetrate the organic light-emitting layer, and the organic light-emitting layer would deteriorate characteristics due to the penetration of water, and non- It is possible to effectively prevent the occurrence of problems such as a decrease in luminance, a reduction in pixels, or a decrease in the lifetime of the organic EL display panel due to the enlargement of the light emitting portion.

以下、本発明に係る有機EL表示パネルについて、図面を参照して説明する。図1は、本実施形態に係る有機EL表示パネルの一例を示す概略断面図である。有機EL表示パネル1は、有機EL素子基板2と、有機EL素子基板2に対向する封止基板3と、これら基板を接合して有機EL素子を封止するシール材4と、有機EL素子基板2と封止基板3とシール材4とから形成される密封空間に設けた捕水材5とから概略構成されている。   Hereinafter, an organic EL display panel according to the present invention will be described with reference to the drawings. FIG. 1 is a schematic cross-sectional view showing an example of an organic EL display panel according to this embodiment. An organic EL display panel 1 includes an organic EL element substrate 2, a sealing substrate 3 facing the organic EL element substrate 2, a sealing material 4 for sealing the organic EL elements by bonding these substrates, and an organic EL element substrate 2, a water catching material 5 provided in a sealed space formed by the sealing substrate 3 and the sealing material 4.

有機EL素子基板2は、例えば厚さ0.4〜1.1mmの透明なガラス基板からなり、その上には、ITO等の透明な帯状の陽極電極11が複数形成されている。有機EL素子基板2の下部側10は、いわゆる視認側に当たる。   The organic EL element substrate 2 is made of, for example, a transparent glass substrate having a thickness of 0.4 to 1.1 mm, and a plurality of transparent strip-like anode electrodes 11 such as ITO are formed thereon. The lower side 10 of the organic EL element substrate 2 corresponds to a so-called viewing side.

そして、陽極電極11上には、光源となる有機発光層7,7・・・、アルミニウム等の金属材料からなる陰極電極8,8・・・、ポリイミド樹脂等からなる絶縁層6,6・・・が形成され、陽極電極11と陰極電極8とで有機発光層7を挟み込んで電流を印加できるようになっている。また、陰極電極8の上には、例えば陰極電極8と同様の金属材料からなる皮膜層12,12・・・が形成されている。絶縁層6,6・・・上には、ノボラック樹脂等からなる隔壁9,9・・・が立ち上がるように形成されている。   On the anode electrode 11, organic light emitting layers 7, 7... Serving as a light source, cathode electrodes 8, 8... Made of a metal material such as aluminum, insulating layers 6, 6. The organic light emitting layer 7 is sandwiched between the anode electrode 11 and the cathode electrode 8 so that a current can be applied. On the cathode electrode 8, for example, coating layers 12, 12,... Made of the same metal material as the cathode electrode 8 are formed. On the insulating layers 6, 6..., Partition walls 9, 9.

封止基板3は、例えばガラス、アクリル系樹脂などからなり、有機EL素子基板2を覆うように設けられている。また、封止基板3の形状は、平板上の基板の外周部に凸部が設けられたものとなっており、この凸部が、シール材4を介して有機EL素子基板2と接合されることにより、有機EL素子が封止されている。   The sealing substrate 3 is made of, for example, glass or acrylic resin, and is provided so as to cover the organic EL element substrate 2. Further, the shape of the sealing substrate 3 is such that a convex portion is provided on the outer peripheral portion of the substrate on the flat plate, and this convex portion is joined to the organic EL element substrate 2 via the sealing material 4. As a result, the organic EL element is sealed.

シール材4は、例えばエポキシ系、アクリル系等の紫外線硬化型樹脂からなるものである。これらのなかでも、外部からの水分の浸入を防止する点から、透水性の低い樹脂であることが好ましい。   The sealing material 4 is made of, for example, an epoxy-based or acrylic-based ultraviolet curable resin. Among these, a resin having low water permeability is preferable from the viewpoint of preventing moisture from entering from the outside.

凸部で囲まれた封止基板3の表面上には、全面に渡って捕水材5が設けられている。捕水材5は、凸部で囲まれた封止基板3の表面全面ではなく、一部に設けても良いが、パネル内における捕水効率を上げるために、全面に渡って設けることが好ましい。なお、捕水材とは、捕水機能を有する物質を粘性のある不活性溶媒に混合したものや樹脂中に混合したものであり、捕水機能を有する物質としては、例えば、ゼオライト、アルミナ、シリカゲル、モレキュラーシーブなどの物理吸着型のものや、酸化カルシウム、酸化バリウム、酸化マグネシウム、硫酸ナトリウム、硫酸カルシウム、硫酸チタンなどの化学吸着型のものを挙げることができる。   A water catching material 5 is provided over the entire surface of the sealing substrate 3 surrounded by the convex portions. The water catching material 5 may be provided not on the entire surface of the sealing substrate 3 surrounded by the convex portions but on a part thereof. However, in order to increase the water catching efficiency in the panel, it is preferably provided over the entire surface. . The water catching material is a material having a water catching function mixed with a viscous inert solvent or a resin, and examples of the material having a water catching function include zeolite, alumina, Examples include physical adsorption type such as silica gel and molecular sieve, and chemical adsorption type such as calcium oxide, barium oxide, magnesium oxide, sodium sulfate, calcium sulfate, and titanium sulfate.

図2は、有機EL素子基板の部分拡大断面図である。有機EL表示パネル1は、互いに隣接する絶縁層6,6・・・どうしの間が、例えば1つの画素領域Pとされる。この画素領域Pにおいて、陽極電極11と陰極電極8に挟まれた有機発光層7に電流を印加することで、有機発光層7を発光させる。画素領域Pは絶縁層6によって区画されており、格子状の矩形領域となる。すなわち、絶縁層6は陽極電極11の上に積層形成され、画素領域Pに対応する位置に矩形状の開口が形成されている。この開口に有機発光層7および陰極電極8が積層される。   FIG. 2 is a partial enlarged cross-sectional view of the organic EL element substrate. In the organic EL display panel 1, for example, one pixel region P is formed between the insulating layers 6, 6. In the pixel region P, the organic light emitting layer 7 is caused to emit light by applying a current to the organic light emitting layer 7 sandwiched between the anode electrode 11 and the cathode electrode 8. The pixel region P is partitioned by the insulating layer 6 and becomes a grid-like rectangular region. That is, the insulating layer 6 is laminated on the anode electrode 11, and a rectangular opening is formed at a position corresponding to the pixel region P. The organic light emitting layer 7 and the cathode electrode 8 are laminated in this opening.

こうした画素領域Pの外側で、それぞれの有機発光層7や陰極電極8は、絶縁層6の端部に乗り上げるように形成される。そして、皮膜層12は、有機発光層7や陰極電極8よりも外側まで大きく形成され、端部が隔壁9の側面に接する。すなわち、有機発光層7や陰極電極8の端部は、金属材料などで形成された皮膜層12によって完全に覆われ、端面などが露出することがない。   Outside the pixel region P, the organic light emitting layer 7 and the cathode electrode 8 are formed so as to run over the end of the insulating layer 6. The coating layer 12 is formed to be larger than the organic light emitting layer 7 and the cathode electrode 8, and the end portion is in contact with the side surface of the partition wall 9. That is, the end portions of the organic light emitting layer 7 and the cathode electrode 8 are completely covered with the coating layer 12 formed of a metal material or the like, and the end surfaces are not exposed.

このように、金属膜など透水性の無い材料で形成された皮膜層12によって有機発光層7と陰極電極8とを端部まで完全に覆うことによって、従来課題であった、有機発光層の端面から絶縁層6との界面に沿って水分が有機発光層の奥まで浸透してしまうといったことを確実に防止することが可能になる。   As described above, the organic light emitting layer 7 and the cathode electrode 8 are completely covered up to the end portions by the coating layer 12 formed of a material having no water permeability such as a metal film. Thus, it is possible to reliably prevent moisture from penetrating into the organic light emitting layer along the interface with the insulating layer 6.

これにより、捕水材5で完全に捕捉しきれずに残留している水分があったとしても、皮膜層12の作用によって、有機発光層7に浸透することが無く、有機発光層7が水分の浸透によって特性劣化を起こし、ダークフレームなどの非発光部分の拡大による輝度低下や画素の縮小、あるいは有機EL表示パネルの寿命低下などの不具合の発生を効果的に防止することが可能になる。なお、皮膜層12を構成する材料は、陰極電極8と同様の金属材料以外にも、陰極電極8とは異なる金属材料、水を透過させないSiN材料、あるいは捕水性のあるCa酸化物などが好ましく挙げられる。   As a result, even if there is moisture that cannot be completely captured by the water catching material 5, it does not penetrate into the organic light emitting layer 7 due to the action of the coating layer 12, and the organic light emitting layer 7 It is possible to effectively prevent the occurrence of defects such as a decrease in luminance, a reduction in pixels due to enlargement of a non-light-emitting portion such as a dark frame, or a reduction in the lifetime of an organic EL display panel due to the deterioration of characteristics due to penetration. The material constituting the coating layer 12 is preferably a metal material different from the cathode electrode 8, a SiN material that does not allow water to permeate, or a Ca oxide that absorbs water, in addition to the metal material similar to the cathode electrode 8. Can be mentioned.

次に、本発明の有機EL表示パネルの製造方法について説明する。図3は、本発明の有機EL表示パネルを製造するにあたって、有機EL素子基板に有機発光層や電極などを形成する工程を示した説明図である。まず、図3(a)に示すように、例えば透明なガラスからなる基板有機EL素子基板2の一面上に、ITOからなる透明な陽極電極11を形成する。   Next, the manufacturing method of the organic EL display panel of the present invention will be described. FIG. 3 is an explanatory view showing a process of forming an organic light emitting layer, an electrode, and the like on the organic EL element substrate in manufacturing the organic EL display panel of the present invention. First, as shown in FIG. 3A, a transparent anode electrode 11 made of ITO is formed on one surface of a substrate organic EL element substrate 2 made of, for example, transparent glass.

そして、この陽極電極11の一面11a上に、例えばポリイミド樹脂等からなる絶縁層6を格子状に形成し、陽極電極11を画素に相当する矩形領域ごと区画する。こうした絶縁層6を格子状に形成するには、例えば、絶縁材料を陽極電極11の一面11a全体に形成した後、フォトレジスト等によって絶縁材料のエッチングを行うことで形成すればよい。あるいは、格子状のマスクを用いて蒸着する方法で形成されればよい。   Then, an insulating layer 6 made of, for example, polyimide resin or the like is formed in a lattice shape on one surface 11a of the anode electrode 11, and the anode electrode 11 is partitioned for each rectangular region corresponding to a pixel. In order to form the insulating layer 6 in a lattice shape, for example, an insulating material may be formed on the entire surface 11a of the anode electrode 11 and then etched by using a photoresist or the like. Or what is necessary is just to form by the method of vapor-depositing using a lattice-like mask.

次に、必要に応じて、図3(b)に示すように、絶縁層6の上面から立ち上がる隔壁9を、例えばノボラック樹脂等から形成する。隔壁9は、絶縁層6の上面から上に向かって幅が広がる逆三角形状に形成されればよい。こうした隔壁9は、例えばポジ型感光性樹脂を露光・現像することによって形成されればよい。   Next, as necessary, as shown in FIG. 3B, a partition wall 9 rising from the upper surface of the insulating layer 6 is formed of, for example, a novolac resin or the like. The partition wall 9 may be formed in an inverted triangle shape whose width increases upward from the upper surface of the insulating layer 6. Such partition walls 9 may be formed, for example, by exposing and developing a positive photosensitive resin.

続いて、図3(c)に示すように、互いに隣接する絶縁層6どうしの間から、絶縁層6の端部に至る部分に、陽極電極11の露出部分と絶縁層6の端部とを覆う有機発光層7が形成される。こうした有機発光層7の形成は、開口21を形成したマスク22を用いて、蒸着によって有機発光層7の形成材料を積層することにより、マスク22の開口21の部分だけ、すなわち、陽極電極11の露出部分と絶縁層6の端部を覆う有機発光層7が形成される。なお、マスク22は、隔壁9の頂部と接する程度に接近させて蒸着を行えばよい。   Subsequently, as shown in FIG. 3C, the exposed portion of the anode electrode 11 and the end portion of the insulating layer 6 are provided between the adjacent insulating layers 6 to the end portion of the insulating layer 6. A covering organic light emitting layer 7 is formed. The organic light emitting layer 7 is formed by laminating the material for forming the organic light emitting layer 7 by vapor deposition using the mask 22 having the opening 21, so that only the portion of the opening 21 of the mask 22, that is, the anode electrode 11. An organic light emitting layer 7 is formed to cover the exposed portion and the end of the insulating layer 6. Note that the mask 22 may be vapor-deposited so as to be close to the top of the partition wall 9.

図4(a)に示すように、有機発光層7の上には陰極電極8が形成される。この陰極電極8の形成にあたっては、前工程で用いたものと同様のマスク22を用いて、蒸着によって陰極電極8の形成材料を積層すればよい。   As shown in FIG. 4A, a cathode electrode 8 is formed on the organic light emitting layer 7. In forming the cathode electrode 8, a material for forming the cathode electrode 8 may be laminated by vapor deposition using the same mask 22 used in the previous step.

そして、図4(b)に示すように、有機発光層7や陰極電極8の端部よりも外側まで皮膜層12を積層する。皮膜層12は、有機発光層7や陰極電極8を端部まで完全に覆うとともに、側端が隔壁9に接する位置まで形成すればよい。この皮膜層12の形成にあたっては、皮膜層12の構成材料をターゲット13としたスパッタリングによって行えばよい。   And as shown in FIG.4 (b), the membrane | film | coat layer 12 is laminated | stacked to the outer side rather than the edge part of the organic light emitting layer 7 or the cathode electrode 8. FIG. The coating layer 12 may be formed up to a position where the side end is in contact with the partition wall 9 while completely covering the organic light emitting layer 7 and the cathode electrode 8 to the end. The formation of the coating layer 12 may be performed by sputtering using the constituent material of the coating layer 12 as a target 13.

こうしたスパッタリングの際の好ましい条件としては、低真空環境、例えば200〜1×10−2Paの圧力範囲が良く、ターゲットガスとしては希ガスを用いればよい。特に、隔壁9の形状が逆三角形状の時には、この隔壁9の根元部分まで皮膜層12を形成して有機発光層7の端部まで完全に覆うために、通常のスパッタリングでよく用いられるArよりも質量数が大きい(重い)Kr,Xeなどを用いるのが好ましい。質量数が大きい希ガスを用いることによって、スパッタリング時のターゲット粒子(皮膜材料)の拡散性が増加して乱反射しやすくなり、逆三角形状の隔壁9の根元部分など、蒸着法では積層が難しい部分に有機発光層7を端部まで覆う皮膜層12を積層させることが可能になる。 Preferred conditions for such sputtering include a low vacuum environment, for example, a pressure range of 200 to 1 × 10 −2 Pa, and a rare gas may be used as the target gas. In particular, when the shape of the partition wall 9 is an inverted triangle, in order to form the coating layer 12 up to the base portion of the partition wall 9 and completely cover the end portion of the organic light emitting layer 7, it is preferable to use Ar which is often used in normal sputtering. Also, it is preferable to use Kr, Xe or the like having a large mass number (heavy). By using a rare gas having a large mass number, the diffusibility of the target particles (coating material) during sputtering increases and diffuse reflection easily occurs, and it is difficult to stack by vapor deposition, such as the root portion of the inverted triangular partition wall 9. It becomes possible to laminate | stack the membrane | film | coat layer 12 which covers the organic light emitting layer 7 to an edge part.

このように、蒸着によって形成した有機発光層7および陰極電極8の上に、スパッタリングによって皮膜層12を形成することで、逆三角形状の隔壁9の根元部分など、蒸着法では積層が難しい部分まで皮膜層12が形成され、有機発光層7の端面を露出させずに、有機発光層7への水分の浸透を完全に防止することが可能になる。   In this way, by forming the coating layer 12 on the organic light emitting layer 7 and the cathode electrode 8 formed by vapor deposition, it is possible to obtain a portion that is difficult to be laminated by vapor deposition, such as the base portion of the inverted triangular partition wall 9. The coating layer 12 is formed, and it becomes possible to completely prevent the penetration of moisture into the organic light emitting layer 7 without exposing the end face of the organic light emitting layer 7.

なお、本発明の実施形態では、有機発光層7および陰極電極8の形成に開口21を有するマスク22を用いたが、これに限定されず、隣接する有機発光層7や隣接する陰極電極8を分離するのに隔壁を用いてもよい。蒸着において形成される有機発光層7や陰極電極8は隔壁9の根元部分まで延在できないが、本発明のスパッタリング法で形成される皮膜層12は隔壁9の根元部分まで被覆することができ、有機発光層7や陰極電極8の形成方法によらず、有機発光層7の端面を露出させない。すなわち、有機発光層7への水分の浸透を完全に防止することができる。   In the embodiment of the present invention, the mask 22 having the opening 21 is used for forming the organic light emitting layer 7 and the cathode electrode 8. However, the present invention is not limited to this, and the adjacent organic light emitting layer 7 and the adjacent cathode electrode 8 are formed. A partition may be used for separation. The organic light emitting layer 7 and the cathode electrode 8 formed in the vapor deposition cannot extend to the base portion of the partition wall 9, but the coating layer 12 formed by the sputtering method of the present invention can cover the base portion of the partition wall 9, Regardless of the method of forming the organic light emitting layer 7 and the cathode electrode 8, the end face of the organic light emitting layer 7 is not exposed. That is, the penetration of moisture into the organic light emitting layer 7 can be completely prevented.

本発明の有機EL表示パネルの一例を示す断面図である。It is sectional drawing which shows an example of the organic electroluminescent display panel of this invention. 図1の部分拡大図である。It is the elements on larger scale of FIG. 本発明の有機EL表示パネルの製造方法を示す説明図である。It is explanatory drawing which shows the manufacturing method of the organic electroluminescence display panel of this invention. 本発明の有機EL表示パネルの製造方法を示す説明図である。It is explanatory drawing which shows the manufacturing method of the organic electroluminescence display panel of this invention.

符号の説明Explanation of symbols

1…有機EL表示パネル、2…有機EL素子基板、3…封止基板、6…絶縁層、7…有機発光層、8…陰極電極、9…隔壁、12…皮膜層、13…ターゲット、21…開口、22…マスク。


DESCRIPTION OF SYMBOLS 1 ... Organic EL display panel, 2 ... Organic EL element substrate, 3 ... Sealing substrate, 6 ... Insulating layer, 7 ... Organic light emitting layer, 8 ... Cathode electrode, 9 ... Partition, 12 ... Film layer, 13 ... Target, 21 ... opening, 22 ... mask.


Claims (5)

陽極電極の一面を複数の矩形領域に区画する絶縁層を形成する工程と、前記陽極電極の一面と前記絶縁層の一部とを覆うように複数の有機発光層を形成する工程と、前記有機発光層の少なくとも一部を覆うように陰極電極を形成する工程と、前記有機発光層および前記陰極電極の周縁よりも外側まで延び、前記有機発光層および前記陰極電極を端部まで覆うような皮膜層を形成する工程とを備え、前記陰極電極を形成する工程を蒸着法によって行い、前記皮膜層を形成する工程をスパッタリング法によって行うことを特徴とする有機EL表示パネルの製造方法。   Forming an insulating layer dividing one surface of the anode electrode into a plurality of rectangular regions, forming a plurality of organic light emitting layers so as to cover one surface of the anode electrode and a part of the insulating layer, and the organic A step of forming a cathode electrode so as to cover at least a part of the light emitting layer, and a coating extending outside the periphery of the organic light emitting layer and the cathode electrode and covering the organic light emitting layer and the cathode electrode to the end A method of forming an organic EL display panel, wherein the step of forming the cathode electrode is performed by a vapor deposition method, and the step of forming the coating layer is performed by a sputtering method. 前記皮膜層を形成するスパッタリング法は、200〜1×10−2Paの圧力範囲で、希ガスをスパッタリングガスとして用いることを特徴とする請求項1に記載の有機EL表示パネルの製造方法。 2. The method of manufacturing an organic EL display panel according to claim 1, wherein the sputtering method for forming the coating layer uses a rare gas as a sputtering gas in a pressure range of 200 to 1 × 10 −2 Pa. 3. 陽極電極の一面を複数の矩形領域に区画する絶縁層と、前記陽極電極の一面と前記絶縁層の一部とを覆う複数の有機発光層と、前記有機発光層の少なくとも一部を覆う複数の陰極電極と、前記有機発光層および前記陰極電極の周縁よりも外側まで延び、前記有機発光層および前記陰極電極を端部まで覆う皮膜層とを備えたことを特徴とする有機EL表示パネル。   An insulating layer that divides one surface of the anode electrode into a plurality of rectangular regions, a plurality of organic light emitting layers that cover one surface of the anode electrode and a part of the insulating layer, and a plurality of layers that cover at least a part of the organic light emitting layer An organic EL display panel, comprising: a cathode electrode; and a coating layer extending to the outside of the organic light emitting layer and a periphery of the cathode electrode and covering the organic light emitting layer and the cathode electrode to the end. 互いに隣接する前記陰極電極どうしの間には、前記絶縁層から立ち上がる隔壁がさらに形成されていることを特徴とする請求項3に記載の有機EL表示パネル。   4. The organic EL display panel according to claim 3, further comprising a partition wall rising from the insulating layer between the cathode electrodes adjacent to each other. 前記皮膜層の端部は、前記隔壁に接していることを特徴とする請求項4に記載の有機EL表示パネル。

The organic EL display panel according to claim 4, wherein an end portion of the coating layer is in contact with the partition wall.

JP2005333827A 2005-11-18 2005-11-18 Organic el display panel and manufacturing method of the same Withdrawn JP2007141645A (en)

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20100067426A (en) * 2008-12-11 2010-06-21 엘지디스플레이 주식회사 Dual plate type organic electro-luminescent device and the method for fabricating thereof
WO2010089687A1 (en) * 2009-02-05 2010-08-12 Philips Intellectual Property & Standards Gmbh Encapsulated electroluminescent device
KR101573006B1 (en) 2008-12-15 2015-11-30 엘지디스플레이 주식회사 Dual Plate Type Organic Electro-luminescent Device and the method for fabricating thereof
KR101578703B1 (en) 2008-12-08 2015-12-18 엘지디스플레이 주식회사 Dual panel type organic electro luminescent device and method of fabricating the same

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101578703B1 (en) 2008-12-08 2015-12-18 엘지디스플레이 주식회사 Dual panel type organic electro luminescent device and method of fabricating the same
KR20100067426A (en) * 2008-12-11 2010-06-21 엘지디스플레이 주식회사 Dual plate type organic electro-luminescent device and the method for fabricating thereof
KR101579127B1 (en) 2008-12-11 2015-12-21 엘지디스플레이 주식회사 Dual Plate Type Organic Electro-luminescent Device and the method for fabricating thereof
KR101573006B1 (en) 2008-12-15 2015-11-30 엘지디스플레이 주식회사 Dual Plate Type Organic Electro-luminescent Device and the method for fabricating thereof
WO2010089687A1 (en) * 2009-02-05 2010-08-12 Philips Intellectual Property & Standards Gmbh Encapsulated electroluminescent device
US8471467B2 (en) 2009-02-05 2013-06-25 Koninklijke Philips Electronics N.V. Encapsulated electroluminescent device
RU2530785C2 (en) * 2009-02-05 2014-10-10 Конинклейке Филипс Электроникс Н.В. Sealed electroluminescent device
TWI508611B (en) * 2009-02-05 2015-11-11 Koninkl Philips Electronics Nv Encapsulated electroluminescent device

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