JP2007126730A - METHOD FOR PRODUCING ZINC OXIDE FILM BY USING ZINC COMPLEX CONTAINING beta-DIKETONATE HAVING ALKOXYALKYL METHYL GROUP AS LIGAND - Google Patents

METHOD FOR PRODUCING ZINC OXIDE FILM BY USING ZINC COMPLEX CONTAINING beta-DIKETONATE HAVING ALKOXYALKYL METHYL GROUP AS LIGAND Download PDF

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JP2007126730A
JP2007126730A JP2005321801A JP2005321801A JP2007126730A JP 2007126730 A JP2007126730 A JP 2007126730A JP 2005321801 A JP2005321801 A JP 2005321801A JP 2005321801 A JP2005321801 A JP 2005321801A JP 2007126730 A JP2007126730 A JP 2007126730A
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zinc
zinc oxide
thin film
alcohol
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Takumi Tsunoda
巧 角田
Chihiro Hasegawa
千尋 長谷川
Hiroki Kaneto
広樹 金戸
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Ube Corp
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Ube Industries Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a method for forming an industrially preferable zinc oxide film on an article to be film-formed with a simple process. <P>SOLUTION: The production method is directed at forming the zinc oxide film on the article to be film-formed by using a zinc complex and alcohol with a chemical vapor-phase deposition method, and employs a zinc complex containing β-diketonate having an alkoxyalkyl methyl group as a ligand. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、亜鉛錯体とアルコールとを用いて、化学気相蒸着法(Chemical Vapor Deposition法;以下、CVD法と称する)により、成膜対象物上に酸化亜鉛薄膜を製造する方法に関する。   The present invention relates to a method for producing a zinc oxide thin film on a film formation target by a chemical vapor deposition method (hereinafter referred to as a CVD method) using a zinc complex and an alcohol.

近年、酸化亜鉛薄膜は、太陽電池、液晶表示デバイスなどの透明電極薄膜として、又、その薄膜が圧電特性を有することから、表面弾性波デバイスなどにも用いられている。このような酸化亜鉛薄膜を得る方法として、例えば、真空蒸着法、スパッタ法、CVD法などの方法が開発されているが、最近では、均一な薄膜を製造し易いCVD法による成膜方法が最も盛んに検討されている。   In recent years, zinc oxide thin films have been used as transparent electrode thin films for solar cells, liquid crystal display devices, etc., and also for surface acoustic wave devices because the thin films have piezoelectric properties. As a method for obtaining such a zinc oxide thin film, for example, a vacuum deposition method, a sputtering method, a CVD method, and the like have been developed. It has been actively studied.

CVD法による酸化亜鉛薄膜を製造する方法としては、例えば、ジエチル亜鉛と一酸化二窒素とを用いる方法(例えば、非特許文献1参照)やジエチル亜鉛と酸素とを用いる方法(例えば、非特許文献2参照)が知られている。しかしながら、これらの方法では、一酸化二窒素や酸素と激しく反応するジエチル亜鉛を使用しなければならないため、反応の制御が困難であるという問題があった。又、ビス(アセチルアセトナト)亜鉛と酸素とを用いる方法(例えば、特許文献1参照)やビス(アセチルアセトナト)亜鉛とエタノール又は水とを用いる方法(例えば、非特許文献3参照)が知られているが、これらの方法で使用するビス(アセチルアセトナト)亜鉛は、高融点の固体であるために、一定の供給量を保つことが困難である上に、配管閉塞を引き起こす恐れがあるという問題があった。それゆえ、上記いずれの方法も工業的な酸化亜鉛薄膜の製造方法としては有利ではなかった。
Jpn.J.Appl.Phys.,42,568(2003) Jpn.J.Appl.Phys.,43,1114(2004) 特開2003-31846号公報 第51回応用物理学関係連合会,講演予稿集,29p-P10-14(2004年3月)
As a method for producing a zinc oxide thin film by a CVD method, for example, a method using diethyl zinc and dinitrogen monoxide (for example, refer to Non-Patent Document 1) or a method using diethyl zinc and oxygen (for example, Non-Patent Document). 2) is known. However, in these methods, since diethyl zinc that reacts vigorously with dinitrogen monoxide and oxygen must be used, there is a problem that it is difficult to control the reaction. Also known are methods using bis (acetylacetonato) zinc and oxygen (see, for example, Patent Document 1) and methods using bis (acetylacetonato) zinc and ethanol or water (see, for example, Non-Patent Document 3). Although bis (acetylacetonato) zinc used in these methods is a high melting point solid, it is difficult to maintain a constant supply amount and may cause clogging of piping. There was a problem. Therefore, none of the above methods is advantageous as an industrial method for producing a zinc oxide thin film.
Jpn.J.Appl.Phys., 42,568 (2003) Jpn.J.Appl.Phys., 43,1114 (2004) JP 2003-31846 A The 51st Federation of Applied Physics, Proceedings of Lectures, 29p-P10-14 (March 2004)

本発明の課題は、即ち、上記問題点を解決し、簡便な方法によって、成膜対象物上に酸化亜鉛薄膜を製造する、工業的に好適な酸化亜鉛薄膜の製造方法を提供するものである。   An object of the present invention is to provide an industrially suitable method for producing a zinc oxide thin film, which solves the above-described problems and produces a zinc oxide thin film on an object to be formed by a simple method. .

本発明の課題は、亜鉛錯体とアルコールとを用いて、化学気相蒸着法により、成膜対象物上に酸化亜鉛薄膜を製造する方法において、亜鉛錯体として、アルコキシアルキルメチル基を有するβ-ジケトナトを配位子とする亜鉛錯体を使用することを特徴とする、酸化亜鉛薄膜の製造方法によって解決される。   An object of the present invention is to produce a zinc oxide thin film on an object to be deposited by chemical vapor deposition using a zinc complex and an alcohol, and a β-diketonate having an alkoxyalkylmethyl group as the zinc complex. It solves by the manufacturing method of the zinc oxide thin film characterized by using the zinc complex which uses as a ligand.

本発明により、アルコキシアルキルメチル基を有するβ-ジケトナトを配位子とする亜鉛錯体とアルコールとを用いて、化学気相蒸着法により、成膜対象物上に酸化亜鉛薄膜を製造する方法において、優れた成膜特性を有する酸化亜鉛薄膜の製造方法を提供することが出来る。   According to the present invention, in a method for producing a zinc oxide thin film on a film formation target by chemical vapor deposition using a zinc complex having an alkoxyalkylmethyl group-containing β-diketonate as a ligand and an alcohol, A method for producing a zinc oxide thin film having excellent film forming characteristics can be provided.

本発明のアルコキシアルキルメチル基を有するβ-ジケトナトを配位子とする金属錯体は、前記の一般式(1)   The metal complex having β-diketonato having an alkoxyalkylmethyl group of the present invention as a ligand is represented by the general formula (1).

Figure 2007126730
Figure 2007126730

(式中、Xは、一般式(2) (Wherein X represents the general formula (2)

Figure 2007126730
Figure 2007126730

で示されるアルコキシアルキルメチル基(R及びRは、例えば、メチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、イソブチル基、t-ブチル基、ペンチル基等の炭素原子数1〜5の直鎖又は分枝状のアルキル基を示す。)、Yは、該一般式(2)で示される基、又はメチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、イソブチル基、t-ブチル基、ペンチル基、ヘキシル基、ヘプチル基、オクチル基等の炭素原子数1〜8の直鎖又は分枝状のアルキル基、Zは、水素原子、又はメチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、イソブチル基、t-ブチル基等の炭素原子数1〜4の直鎖又は分枝状のアルキル基を示す。)
で示される。
R a and R b are, for example, carbon atoms such as methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, t-butyl group, and pentyl group. A linear or branched alkyl group of 1 to 5), Y represents a group represented by the general formula (2), or a methyl group, ethyl group, n-propyl group, isopropyl group, n- A linear or branched alkyl group having 1 to 8 carbon atoms such as butyl group, isobutyl group, t-butyl group, pentyl group, hexyl group, heptyl group, octyl group, etc., Z is a hydrogen atom or a methyl group , An ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a t-butyl group or the like, and a linear or branched alkyl group having 1 to 4 carbon atoms. )
Indicated by

本発明で使用するアルコキシアルキルメチル基を有するβ-ジケトナトを配位子とする亜鉛錯体の具体例としては、例えば、式(3)から式(10)で示される。   Specific examples of the zinc complex having a β-diketonate having an alkoxyalkylmethyl group used in the present invention as a ligand are represented by, for example, formulas (3) to (10).

Figure 2007126730
Figure 2007126730

本発明において使用するアルコールとしては、例えば、メタノール、エタノール、n-プロピルアルコール、イソプロピルアルコール、n-ブチルアルコール、イソブチルアルコール、sec-ブチルアルコール、t-ブチルアルコール、ペンチルアルコール、イソペンチルアルコール、ヘキシルアルコール、ヘプチルアルコール、オクチルアルコール、ノニルアルコール、デシルアルコール等の鎖状又は分枝上状のアルコール;シクロペンタノール、シクロヘキサノール等の環状のアルコール;エチレングリコール、プロピレングリコール等のジオール(二価のアルコール);2-メトキシエタノール等のエーテル基で置換されたアルコールが挙げられる。   Examples of the alcohol used in the present invention include methanol, ethanol, n-propyl alcohol, isopropyl alcohol, n-butyl alcohol, isobutyl alcohol, sec-butyl alcohol, t-butyl alcohol, pentyl alcohol, isopentyl alcohol, and hexyl alcohol. Chain or branched alcohols such as heptyl alcohol, octyl alcohol, nonyl alcohol and decyl alcohol; cyclic alcohols such as cyclopentanol and cyclohexanol; diols such as ethylene glycol and propylene glycol (divalent alcohols) An alcohol substituted with an ether group such as 2-methoxyethanol;

なお、CVD法においては、薄膜形成のために金属錯体を気化させる必要があるが、本発明で使用する亜鉛錯体を気化させる方法としては、例えば、亜鉛錯体自体を気化室に充填又は搬送して気化させる方法だけでなく、亜鉛錯体を適当な溶媒(例えば、ヘキサン、オクタン、メチルシクロヘキサン、エチルシクロヘキサン等の脂肪族炭化水素類;トルエン等の芳香族炭化水素類;テトラヒドロフラン、ジブチルエーテル等のエーテル類等が挙げられる。)に希釈した溶液を液体搬送用ポンプで気化室に導入して気化させる方法(溶液法)も使用出来る。   In the CVD method, it is necessary to vaporize the metal complex for thin film formation. As a method for vaporizing the zinc complex used in the present invention, for example, the zinc complex itself is filled or transported into the vaporization chamber. In addition to the method of vaporization, an appropriate solvent (for example, aliphatic hydrocarbons such as hexane, octane, methylcyclohexane and ethylcyclohexane; aromatic hydrocarbons such as toluene; ethers such as tetrahydrofuran and dibutyl ether) The method (solution method) in which the diluted solution is introduced into the vaporizing chamber with a liquid transfer pump and vaporized can also be used.

成膜対象物上への酸化亜鉛の蒸着方法としては、公知のCVD法で行うことが出来、例えば、常圧又は減圧下にて、亜鉛錯体ガスをアルコール蒸気ガスとともに加熱した成膜対象物上に送り込んで酸化亜鉛薄膜を蒸着させる方法が使用出来る。又、同様な原料供給により、プラズマCVD法で酸化亜鉛薄膜を蒸着させることも出来る。   As a vapor deposition method of zinc oxide on a film formation target, it can be performed by a known CVD method, for example, on a film formation target heated with an alcohol vapor gas at a normal pressure or a reduced pressure. Can be used to deposit a zinc oxide thin film. Also, a zinc oxide thin film can be deposited by plasma CVD using the same raw material supply.

本発明のアルコキシアルキルメチル基を有するβ-ジケトナトを配位子とする亜鉛錯体を用いて酸化亜鉛薄膜を蒸着させる場合、その蒸着条件としては、例えば、反応系内の圧力は、好ましくは1Pa〜200kPa、更に好ましくは10Pa〜110kPa、成膜対象物温度は、好ましくは50〜900℃、更に好ましくは100〜600℃、亜鉛錯体を気化させる温度は、好ましくは50〜250℃、更に好ましくは80〜200℃である。   In the case of depositing a zinc oxide thin film using a zinc complex having a β-diketonate having an alkoxyalkylmethyl group of the present invention as a ligand, as the deposition conditions, for example, the pressure in the reaction system is preferably 1 Pa to 200 kPa, more preferably 10 Pa to 110 kPa, film forming object temperature is preferably 50 to 900 ° C., more preferably 100 to 600 ° C., and the temperature for vaporizing the zinc complex is preferably 50 to 250 ° C., more preferably 80 ~ 200 ° C.

なお、酸化亜鉛錯体薄膜を蒸着させる際の全ガス量に対するアルコール蒸気ガスの含有割合としては、好ましくは5〜90容量%、更に好ましくは10〜80容量%である。   In addition, as a content rate of alcohol vapor gas with respect to the total gas amount at the time of vapor-depositing a zinc oxide complex thin film, Preferably it is 5-90 volume%, More preferably, it is 10-80 volume%.

次に、実施例を挙げて本発明を具体的に説明するが、本発明の範囲はこれらに限定されるものではない。   Next, the present invention will be specifically described with reference to examples, but the scope of the present invention is not limited thereto.

参考例1(2-メトキシプロピオン酸メチルの合成)
攪拌装置、温度計及び滴下漏斗を備えた内容積500mlのフラスコに、ナトリウムメトキシド100.6g(1862mmol)及びヘキサン300mlを加えた。次いで、氷冷下、2-ブロモプロピオン酸メチル300.3g(1798mmol)をゆるやかに滴下した後、攪拌しながら2時間反応させた。反応終了後、水冷下、水300mlを添加し、有機層を分液した。その後、有機層を水で洗浄した後、無水硫酸ナトリウムで乾燥させた。濾過後、濾液を減圧蒸留(74℃、12236Pa)し、無色液体として2-メトキシプロピオン酸メチル97.0gを得た(単離収率:46%)。
2-メトキシプロピオン酸メチルの物性値は以下の通りであった。
Reference Example 1 (Synthesis of methyl 2-methoxypropionate)
Sodium methoxide (100.6 g, 1862 mmol) and hexane (300 ml) were added to a 500 ml flask equipped with a stirrer, thermometer and dropping funnel. Next, 300.3 g (1798 mmol) of methyl 2-bromopropionate was slowly added dropwise under ice cooling, and the mixture was reacted for 2 hours with stirring. After completion of the reaction, 300 ml of water was added under water cooling, and the organic layer was separated. Thereafter, the organic layer was washed with water and then dried over anhydrous sodium sulfate. After filtration, the filtrate was distilled under reduced pressure (74 ° C., 12236 Pa) to obtain 97.0 g of methyl 2-methoxypropionate as a colorless liquid (isolation yield: 46%).
The physical properties of methyl 2-methoxypropionate were as follows.

1H-NMR(CDCl3,δ(ppm));1.41(3H,d)、3.40(3H,s)、3.77(3H,s)、3.90(1H,q)
MS(m/e);88、59、31、15
1 H-NMR (CDCl 3 , δ (ppm)); 1.41 (3H, d), 3.40 (3H, s), 3.77 (3H, s), 3.90 (1H, q)
MS (m / e); 88, 59, 31, 15

参考例2(2-メトキシ-6-メチル-3,5-ヘプタンジオン(以下、mopdと称する)の合成)
攪拌装置、温度計及び滴下漏斗を備えた内容積200mlのフラスコに、ナトリウムアミド5.15g(132mmol)を加え、反応系内をアルゴンで置換した後、トルエン80mlを加えた。次いで、水冷下、3-メチル-2-ブタノン12.0g(139.3mmol)をゆるやかに滴下して15分間攪拌した後、参考例1と同様な方法で合成した2-メトキシプロピオン酸メチル5.65g(47.8mmol)を滴下して、攪拌しながら30分間反応させた。反応終了後、氷冷下、水50mlを加えた後、水層を分液し、酢酸で中和した。水層をエーテルで抽出した後、エーテル抽出液を水で洗浄し、無水硫酸ナトリウムで乾燥させた。濾過後、濾液を濃縮した後、濃縮物を減圧蒸留(41℃、27Pa)し、無色液体として、2-メトキシ-6-メチル-3,5-ヘプタンジオン4.25gを得た(単離収率:52%)。
2-メトキシ-6-メチル-3,5-ヘプタンジオンの物性値は以下の通りであった。
Reference Example 2 (Synthesis of 2-methoxy-6-methyl-3,5-heptanedione (hereinafter referred to as mopd))
Sodium amide (5.15 g, 132 mmol) was added to a 200-ml flask equipped with a stirrer, thermometer and dropping funnel, and the reaction system was purged with argon, and then 80 ml of toluene was added. Next, under water cooling, 12.0 g (139.3 mmol) of 3-methyl-2-butanone was slowly dropped and stirred for 15 minutes, and then 5.65 g (47.8 g) of methyl 2-methoxypropionate synthesized in the same manner as in Reference Example 1. mmol) was added dropwise and allowed to react for 30 minutes with stirring. After completion of the reaction, 50 ml of water was added under ice cooling, and the aqueous layer was separated and neutralized with acetic acid. After the aqueous layer was extracted with ether, the ether extract was washed with water and dried over anhydrous sodium sulfate. After filtration, the filtrate was concentrated, and the concentrate was distilled under reduced pressure (41 ° C., 27 Pa) to obtain 4.25 g of 2-methoxy-6-methyl-3,5-heptanedione as a colorless liquid (isolation yield) : 52%).
The physical properties of 2-methoxy-6-methyl-3,5-heptanedione were as follows.

1H-NMR(CDCl3,δ(ppm));1.17(6H,d)、1.30(0.15H,d)、1.36(2.85H,d)、2.48〜2.57(0.95H,m)、2.59〜2.73(0.05H,m)、3.36(0.15H,s)、3.37(2.85H,s)、3.71〜3.78(1H,m)、3.78(0.1H,s)、5.81(0.95H,s)、15.4(0.95H,s)
IR(neat(cm-1));2976、2936、1607(br)、1462、1366、1328、1210、1120、910、805
(なお、1607cm-1のピークは、β-ジケトン特有のピークである。)
MS(m/e);142、113、59、43
1 H-NMR (CDCl 3 , δ (ppm)); 1.17 (6H, d), 1.30 (0.15H, d), 1.36 (2.85H, d), 2.48 to 2.57 (0.95H, m), 2.59 to 2.73 (0.05H, m), 3.36 (0.15H, s), 3.37 (2.85H, s), 3.71 to 3.78 (1H, m), 3.78 (0.1H, s), 5.81 (0.95H, s), 15.4 ( 0.95H, s)
IR (neat (cm -1 )); 2976, 2936, 1607 (br), 1462, 1366, 1328, 1210, 1120, 910, 805
(The peak at 1607 cm -1 is a peak peculiar to β-diketone.)
MS (m / e); 142, 113, 59, 43

参考例3(2-メトキシ-3,5-オクタンジオン(以下、moodと称する)の合成)
攪拌装置、温度計及び滴下漏斗を備えた内容積200mlのフラスコに、ナトリウムアミド10.1g(259mmol)を加え、反応系内をアルゴンで置換した後、トルエン100mlを加えた。次いで、水冷下、2-ペンタノン14.4g(167mmol)をゆるやかに滴下して15分間攪拌した後、参考例1と同様な方法で合成した2-メトキシプロピオン酸メチル15.0g(127mmol)を滴下して、攪拌しながら1時間反応させた。反応終了後、氷冷下、水50mlを加えた後、水層を分液し、2.5mol/l硫酸で酸性化した。水層をヘキサンで抽出した後、ヘキサン抽出液を水で洗浄し、無水硫酸ナトリウムで乾燥させた。濾過後、濾液を濃縮した後、濃縮物を減圧蒸留(35℃、20Pa)し、無色液体として、2-メトキシ-3,5-オクタンジオン14.3gを得た(単離収率:65%)。
2-メトキシ-3,5-オクタンジオンの物性値は以下の通りであった。
Reference Example 3 (Synthesis of 2-methoxy-3,5-octanedione (hereinafter referred to as mood))
Sodium amide 10.1 g (259 mmol) was added to a 200-ml flask equipped with a stirrer, thermometer and dropping funnel, and the reaction system was purged with argon, and then 100 ml of toluene was added. Next, 14.4 g (167 mmol) of 2-pentanone was slowly added dropwise under water cooling and stirred for 15 minutes, and then 15.0 g (127 mmol) of methyl 2-methoxypropionate synthesized in the same manner as in Reference Example 1 was added dropwise. The mixture was reacted for 1 hour with stirring. After completion of the reaction, 50 ml of water was added under ice cooling, and the aqueous layer was separated and acidified with 2.5 mol / l sulfuric acid. After the aqueous layer was extracted with hexane, the hexane extract was washed with water and dried over anhydrous sodium sulfate. After filtration, the filtrate was concentrated, and the concentrate was distilled under reduced pressure (35 ° C., 20 Pa) to obtain 14.3 g of 2-methoxy-3,5-octanedione as a colorless liquid (isolated yield: 65%) .
The physical properties of 2-methoxy-3,5-octanedione were as follows.

1H-NMR(CDCl3,δ(ppm));0.97(3H,m)、1.35(3H,d)、1.6〜1.7(2H,m)、2.29〜2.34(1.7H,m)、2.51(0.3H,m)、3.36(3H,s)、3.60(0.3H,s)、3.74(1H,q)、5.79(0.85H,s)、15.3(0.85H,s)
IR(neat(cm-1));2967、2936、1608(br)、1458、1332、1210、1110、802
(なお、1608cm-1のピークは、β-ジケトン特有のピークである。)
MS(m/e);142、113、59、28
1 H-NMR (CDCl 3 , δ (ppm)); 0.97 (3H, m), 1.35 (3H, d), 1.6 to 1.7 (2H, m), 2.29 to 2.34 (1.7H, m), 2.51 (0.3 H, m), 3.36 (3H, s), 3.60 (0.3H, s), 3.74 (1H, q), 5.79 (0.85H, s), 15.3 (0.85H, s)
IR (neat (cm -1 )); 2967, 2936, 1608 (br), 1458, 1332, 1210, 1110, 802
(The peak at 1608 cm -1 is a peak peculiar to β-diketone.)
MS (m / e); 142, 113, 59, 28

参考例4(ビス(2-メトキシ-6-メチル-3,5-ヘプタンジオナト)亜鉛(II)(以下、Zn(mopd)2と称する)の合成)
攪拌装置、温度計及び滴下漏斗を備えた内容積50mlのフラスコに、28%ナトリウムメトキシドのメタノール溶液6.56g(34.0mmol)を加え、氷冷下、参考例2と同様な方法で合成した2-メトキシ-6-メチル-3,5-ヘプタンジオン6.00g(34.8mmol)をゆるやかに滴下し、5分間攪拌させた。次いで、塩化亜鉛(II)2.26g(16.6mmol)をメタノール20mlに溶解させた溶液をゆるやかに滴下し、氷冷下、攪拌しながら30分間反応させた。反応終了後、反応液から減圧下でメタノールを留去した。その後、ヘキサン20ml及び水20mlを加え、有機層を分液した後に、無水硫酸ナトリウムで乾燥させた。濾過後、濾液を濃縮した後、濃縮物を減圧蒸留(160℃、27Pa)し、粘性のある黄色液体として、ビス(2-メトキシ-6-メチル-3,5-ヘプタンジオナト)亜鉛(II)4.91gを得た(単離収率:73%)。
Reference Example 4 (Synthesis of bis (2-methoxy-6-methyl-3,5-heptanedionato) zinc (II) (hereinafter referred to as Zn (mopd) 2 ))
To a 50 ml flask equipped with a stirrer, thermometer and dropping funnel, 6.56 g (34.0 mmol) of 28% sodium methoxide in methanol was added and synthesized in the same manner as in Reference Example 2 under ice cooling. 6.00 g (34.8 mmol) of -methoxy-6-methyl-3,5-heptanedione was gently added dropwise and stirred for 5 minutes. Next, a solution prepared by dissolving 2.26 g (16.6 mmol) of zinc (II) chloride in 20 ml of methanol was slowly added dropwise and reacted for 30 minutes with stirring under ice cooling. After completion of the reaction, methanol was distilled off from the reaction solution under reduced pressure. Thereafter, 20 ml of hexane and 20 ml of water were added, and the organic layer was separated and dried over anhydrous sodium sulfate. After filtration, the filtrate was concentrated, and the concentrate was distilled under reduced pressure (160 ° C., 27 Pa) to give bis (2-methoxy-6-methyl-3,5-heptanedionato) zinc (II) 4.91 as a viscous yellow liquid. g was obtained (isolation yield: 73%).

IR(neat(cm-1));2972、2932、1582、1513、1432、1333、1211、1118、912、805、558
元素分析(C18H30O6Zn);炭素:53.1%、水素:7.45%、亜鉛:16%
(理論値;炭素:53.0%、水素:7.41%、亜鉛:16.0%)
MS(m/e);641、406
IR (neat (cm -1 )); 2972, 2932, 1582, 1513, 1432, 1333, 1211, 1118, 912, 805, 558
Elemental analysis (C 18 H 30 O 6 Zn ); Carbon: 53.1%, hydrogen: 7.45%, zinc: 16%
(Theoretical value: Carbon: 53.0%, Hydrogen: 7.41%, Zinc: 16.0%)
MS (m / e); 641, 406

参考例5(ビス(2-メトキシ-3,5-オクタンジオナト)亜鉛(II)(以下、Zn(mood)2と称する)の合成)
攪拌装置、温度計及び滴下漏斗を備えた内容積100mlのフラスコに、28%ナトリウムメトキシドのメタノール溶液4.62g(24.0mmol)及びメタノール6mlを加え、氷冷下、参考例6と同様な方法で合成した2-メトキシ-3,5-オクタンジオン4.11g(23.9mmol)をゆるやかに滴下し、5分間攪拌させた。次いで、塩化亜鉛(II)1.60g(11.7mmol)をメタノール4mlに溶解させた溶液をゆるやかに滴下し、攪拌しながら室温にて1時間反応させた。反応終了後、反応液から減圧下でメタノールを留去した。その後、ヘキサン30ml及び水30mlを加え、有機層を分液した後に、無水硫酸ナトリウムで乾燥させた。濾過後、濾液を濃縮した後、濃縮物を減圧蒸留(160℃、17Pa)し、黄色液体として、ビス(2-メトキシ-3,5-オクタンジオナト)亜鉛(II)4.02gを得た(単離収率:84%)。
Reference Example 5 (Synthesis of bis (2-methoxy-3,5-octandionato) zinc (II) (hereinafter referred to as Zn (mood) 2 ))
To a 100-ml flask equipped with a stirrer, thermometer and dropping funnel, 4.62 g (24.0 mmol) of 28% sodium methoxide in methanol and 6 ml of methanol were added, and the same method as in Reference Example 6 was carried out under ice cooling. Synthesized 2-methoxy-3,5-octanedione (4.11 g, 23.9 mmol) was slowly added dropwise and stirred for 5 minutes. Next, a solution prepared by dissolving 1.60 g (11.7 mmol) of zinc (II) chloride in 4 ml of methanol was slowly added dropwise and reacted at room temperature for 1 hour with stirring. After completion of the reaction, methanol was distilled off from the reaction solution under reduced pressure. Thereafter, 30 ml of hexane and 30 ml of water were added, and the organic layer was separated and dried over anhydrous sodium sulfate. After filtration, the filtrate was concentrated, and the concentrate was distilled under reduced pressure (160 ° C., 17 Pa) to obtain 4.02 g of bis (2-methoxy-3,5-octandionato) zinc (II) as a yellow liquid ( Isolation yield: 84%).

IR(neat(cm-1));2963、2933、2874、2823、1598、1522、1431、1334、1211、1119、959、796、537
元素分析(C18H30O6Zn);炭素:53.1%、水素:7.45%、亜鉛:16%
(理論値;炭素:53.0%、水素:7.41%、亜鉛:16.0%)
MS(m/e);406、347、113、59
IR (neat (cm -1 )); 2963, 2933, 2874, 2823, 1598, 1522, 1431, 1334, 1211, 1119, 959, 796, 537
Elemental analysis (C 18 H 30 O 6 Zn ); Carbon: 53.1%, hydrogen: 7.45%, zinc: 16%
(Theoretical value: Carbon: 53.0%, Hydrogen: 7.41%, Zinc: 16.0%)
MS (m / e); 406, 347, 113, 59

実施例1〜3(蒸着実験;酸化亜鉛薄膜の製造)
参考例4〜5で得られた亜鉛錯体(Zn(mopd)2及びZn(mood)2)を用いて、CVD法による蒸着実験を行い、成膜特性を評価した。
評価試験には、図1に示す装置を使用した。気化器3(ガラス製アンプル)にある亜鉛錯体20は、ヒーター10Bで加熱されて気化し、マスフローコントローラー1Aを経て予熱器10Aで予熱後導入されたヘリウムガスに同伴し気化器3を出る。気化器3を出たガスは、マスフコントローラー1Bで、冷却されたアルコール(2℃)8を経て導入されたアルコール蒸気を含むヘリウムガスとともに反応器4に導入される。反応系内圧力は真空ポンプ手前のバルブ6の開閉により、所定圧力にコントロールされ、圧力計5によってモニターされる。ガラス製反応器の中央部はヒーター10Cで加熱可能な構造となっている。反応器に導入された亜鉛錯体は、反応器内中央部にセットされ、ヒータ10Cで所定の温度に加熱された被蒸着基板21の表面上で熱分解し、基板21上に酸化亜鉛膜が析出する。反応器4を出たガスは、トラップ7、真空ポンプを経て、大気中に排気される構造となっている。
Examples 1 to 3 (deposition experiment; production of zinc oxide thin film)
Using the zinc complexes (Zn (mopd) 2 and Zn (mood) 2 ) obtained in Reference Examples 4 to 5, a vapor deposition experiment by a CVD method was performed to evaluate film formation characteristics.
The apparatus shown in FIG. 1 was used for the evaluation test. The zinc complex 20 in the vaporizer 3 (glass ampoule) is heated and vaporized by the heater 10B, exits the vaporizer 3 along with the helium gas introduced after preheating by the preheater 10A via the mass flow controller 1A. The gas exiting the vaporizer 3 is introduced into the reactor 4 by the mass controller 1B together with helium gas containing alcohol vapor introduced through the cooled alcohol (2 ° C.) 8. The pressure in the reaction system is controlled to a predetermined pressure by opening and closing the valve 6 in front of the vacuum pump, and is monitored by the pressure gauge 5. The central part of the glass reactor has a structure that can be heated by the heater 10C. The zinc complex introduced into the reactor is set in the center of the reactor and thermally decomposed on the surface of the deposition substrate 21 heated to a predetermined temperature by the heater 10C, and a zinc oxide film is deposited on the substrate 21. To do. The gas exiting the reactor 4 is exhausted to the atmosphere via a trap 7 and a vacuum pump.

蒸着条件及び蒸着結果(成膜特性)を表1に示す。なお、被蒸着基盤としては、7mm×40mmサイズの矩形のものを使用した。   The deposition conditions and deposition results (film formation characteristics) are shown in Table 1. In addition, as a substrate for vapor deposition, a rectangular substrate having a size of 7 mm × 40 mm was used.

Figure 2007126730
Figure 2007126730

該結果より、本発明の亜鉛錯体(Zn(mopd)2及びZn(mood)2)とアルコールとを用いて、優れた成膜特性を有する酸化亜鉛薄膜を製造することが可能であることが分かる。 The results show that a zinc oxide thin film having excellent film forming characteristics can be produced using the zinc complex (Zn (mopd) 2 and Zn (mood) 2 ) of the present invention and alcohol. .

本発明は、アルコキシアルキルメチル基を有するβ-ジケトナトを配位子とする亜鉛錯体とアルコールとを用いて、CVD法により、成膜対象物上に酸化亜鉛薄膜を製造する方法に関する。   The present invention relates to a method for producing a zinc oxide thin film on a film formation object by a CVD method using a zinc complex having a β-diketonate having an alkoxyalkylmethyl group as a ligand and an alcohol.

亜鉛錯体とアルコールとを用いて酸化亜鉛薄膜を製造する蒸着装置の構成を示す図である。It is a figure which shows the structure of the vapor deposition apparatus which manufactures a zinc oxide thin film using a zinc complex and alcohol.

符号の説明Explanation of symbols

3 気化器
4 反応器
8 アルコール
9 冷却器
10B 気化器ヒータ
10C 反応器ヒータ
20 原料亜鉛錯体
21 基板
3 vaporizer 4 reactor 8 alcohol 9 cooler 10B vaporizer heater 10C reactor heater 20 raw material zinc complex 21 substrate

Claims (4)

亜鉛錯体とアルコールとを用いて、化学気相蒸着法により、成膜対象物上に亜鉛酸化薄膜を製造する方法において、亜鉛錯体として、アルコキシアルキルメチル基を有するβ-ジケトナトを配位子とする亜鉛錯体を使用することを特徴とする、酸化亜鉛薄膜の製造方法。   In a method for producing a zinc oxide thin film on a film formation object by chemical vapor deposition using a zinc complex and an alcohol, a β-diketonate having an alkoxyalkylmethyl group is used as a ligand as the zinc complex. A method for producing a zinc oxide thin film, characterized by using a zinc complex. 一般式(1)
Figure 2007126730
(式中、Xは、一般式(2)
Figure 2007126730
で示される基(式中、R及びRは、炭素原子数1〜5の直鎖又は分枝状のアルキル基を示す。)、Yは、一般式(2)で示される基又は炭素原子数1〜8の直鎖又は分枝状のアルキル基、Zは、水素原子又は炭素原子数1〜4のアルキル基を示す。)で示されるアルコキシアルキルメチル基を有するβ-ジケトナトを配位子とする亜鉛錯体とアルコールとを用いた、化学気相蒸着法による亜鉛酸化薄膜の製造方法。
General formula (1)
Figure 2007126730
(Wherein X represents the general formula (2)
Figure 2007126730
(Wherein R a and R b represent a linear or branched alkyl group having 1 to 5 carbon atoms), Y represents a group represented by the general formula (2) or carbon A linear or branched alkyl group having 1 to 8 atoms, Z represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms. The zinc oxide thin film is produced by chemical vapor deposition using a zinc complex having a β-diketonate having an alkoxyalkylmethyl group represented by formula (II) and an alcohol as a ligand.
請求項1に記載の亜鉛錯体の溶媒溶液を亜鉛供給源として用いた、化学気相蒸着法による酸化亜鉛薄膜の製造方法。   A method for producing a zinc oxide thin film by chemical vapor deposition using the solvent solution of the zinc complex according to claim 1 as a zinc supply source. 溶媒が、脂肪族炭化水素類、芳香族炭化水素類又はエーテル類である請求項1乃至3記載の化学気相蒸着法による酸化亜鉛薄膜の製造方法。   4. The method for producing a zinc oxide thin film by chemical vapor deposition according to claim 1, wherein the solvent is an aliphatic hydrocarbon, an aromatic hydrocarbon or an ether.
JP2005321801A 2005-11-07 2005-11-07 METHOD FOR PRODUCING ZINC OXIDE FILM BY USING ZINC COMPLEX CONTAINING beta-DIKETONATE HAVING ALKOXYALKYL METHYL GROUP AS LIGAND Withdrawn JP2007126730A (en)

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JP2010245189A (en) * 2009-04-02 2010-10-28 Institute Of National Colleges Of Technology Japan Method of manufacturing thin film solar cell

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010245189A (en) * 2009-04-02 2010-10-28 Institute Of National Colleges Of Technology Japan Method of manufacturing thin film solar cell

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