JP2007123840A5 - - Google Patents

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Publication number
JP2007123840A5
JP2007123840A5 JP2006239266A JP2006239266A JP2007123840A5 JP 2007123840 A5 JP2007123840 A5 JP 2007123840A5 JP 2006239266 A JP2006239266 A JP 2006239266A JP 2006239266 A JP2006239266 A JP 2006239266A JP 2007123840 A5 JP2007123840 A5 JP 2007123840A5
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JP
Japan
Prior art keywords
gas
gas inlet
showerhead
chamber wall
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2006239266A
Other languages
English (en)
Japanese (ja)
Other versions
JP5489390B2 (ja
JP2007123840A (ja
Filing date
Publication date
Application filed filed Critical
Publication of JP2007123840A publication Critical patent/JP2007123840A/ja
Publication of JP2007123840A5 publication Critical patent/JP2007123840A5/ja
Application granted granted Critical
Publication of JP5489390B2 publication Critical patent/JP5489390B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2006239266A 2005-09-02 2006-09-04 プロセスチャンバ内のシャワーヘッド用サスペンション Active JP5489390B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US71387505P 2005-09-02 2005-09-02
US60/713875 2005-09-02

Publications (3)

Publication Number Publication Date
JP2007123840A JP2007123840A (ja) 2007-05-17
JP2007123840A5 true JP2007123840A5 (ko) 2012-08-02
JP5489390B2 JP5489390B2 (ja) 2014-05-14

Family

ID=37816905

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006239266A Active JP5489390B2 (ja) 2005-09-02 2006-09-04 プロセスチャンバ内のシャワーヘッド用サスペンション

Country Status (4)

Country Link
JP (1) JP5489390B2 (ko)
KR (1) KR101354575B1 (ko)
CN (1) CN1924085B (ko)
TW (1) TWI306782B (ko)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7132359B2 (ja) 2019-01-07 2022-09-06 株式会社アルバック 真空処理装置、真空処理装置のクリーニング方法
JP7132358B2 (ja) 2019-01-07 2022-09-06 株式会社アルバック 真空処理装置

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101139215B1 (ko) * 2009-10-27 2012-05-14 주식회사 테스 기판 처리 장치
JP6104157B2 (ja) 2010-05-21 2017-03-29 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 大面積電極にぴったりと嵌合されたセラミックス絶縁体
US8721791B2 (en) 2010-07-28 2014-05-13 Applied Materials, Inc. Showerhead support structure for improved gas flow
SG192967A1 (en) 2011-03-04 2013-09-30 Novellus Systems Inc Hybrid ceramic showerhead
DE102015110440A1 (de) * 2014-11-20 2016-05-25 Aixtron Se CVD- oder PVD-Reaktor zum Beschichten großflächiger Substrate
DE102015118765A1 (de) * 2014-11-20 2016-06-09 Aixtron Se Vorrichtung zum Beschichten eines großflächigen Substrats
KR101590346B1 (ko) * 2015-01-30 2016-02-01 주식회사 테스 박막증착장치
JP6242933B2 (ja) 2016-03-31 2017-12-06 株式会社日立国際電気 基板処理装置、半導体装置の製造方法およびプログラム
KR102700366B1 (ko) * 2019-01-29 2024-08-30 주성엔지니어링(주) 샤워헤드 및 이를 포함하는 기판처리장치
KR102618455B1 (ko) * 2019-12-02 2023-12-27 주식회사 원익아이피에스 샤워헤드조립체 및 이를 포함하는 기판처리장치

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5670218A (en) * 1995-10-04 1997-09-23 Hyundai Electronics Industries Co., Ltd. Method for forming ferroelectric thin film and apparatus therefor
JP3480271B2 (ja) * 1997-10-07 2003-12-15 東京エレクトロン株式会社 熱処理装置のシャワーヘッド構造
US6300255B1 (en) * 1999-02-24 2001-10-09 Applied Materials, Inc. Method and apparatus for processing semiconductive wafers
US6461435B1 (en) * 2000-06-22 2002-10-08 Applied Materials, Inc. Showerhead with reduced contact area
US7131218B2 (en) * 2004-02-23 2006-11-07 Nike, Inc. Fluid-filled bladder incorporating a foam tensile member
JP4698251B2 (ja) * 2004-02-24 2011-06-08 アプライド マテリアルズ インコーポレイテッド 可動又は柔軟なシャワーヘッド取り付け

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7132359B2 (ja) 2019-01-07 2022-09-06 株式会社アルバック 真空処理装置、真空処理装置のクリーニング方法
JP7132358B2 (ja) 2019-01-07 2022-09-06 株式会社アルバック 真空処理装置

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