JP2007123840A5 - - Google Patents
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- Publication number
- JP2007123840A5 JP2007123840A5 JP2006239266A JP2006239266A JP2007123840A5 JP 2007123840 A5 JP2007123840 A5 JP 2007123840A5 JP 2006239266 A JP2006239266 A JP 2006239266A JP 2006239266 A JP2006239266 A JP 2006239266A JP 2007123840 A5 JP2007123840 A5 JP 2007123840A5
- Authority
- JP
- Japan
- Prior art keywords
- gas
- gas inlet
- showerhead
- chamber wall
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US71387505P | 2005-09-02 | 2005-09-02 | |
US60/713875 | 2005-09-02 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2007123840A JP2007123840A (ja) | 2007-05-17 |
JP2007123840A5 true JP2007123840A5 (fr) | 2012-08-02 |
JP5489390B2 JP5489390B2 (ja) | 2014-05-14 |
Family
ID=37816905
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006239266A Active JP5489390B2 (ja) | 2005-09-02 | 2006-09-04 | プロセスチャンバ内のシャワーヘッド用サスペンション |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP5489390B2 (fr) |
KR (1) | KR101354575B1 (fr) |
CN (1) | CN1924085B (fr) |
TW (1) | TWI306782B (fr) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7132359B2 (ja) | 2019-01-07 | 2022-09-06 | 株式会社アルバック | 真空処理装置、真空処理装置のクリーニング方法 |
JP7132358B2 (ja) | 2019-01-07 | 2022-09-06 | 株式会社アルバック | 真空処理装置 |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101139215B1 (ko) * | 2009-10-27 | 2012-05-14 | 주식회사 테스 | 기판 처리 장치 |
KR101810065B1 (ko) * | 2010-05-21 | 2017-12-18 | 어플라이드 머티어리얼스, 인코포레이티드 | 대면적 전극 상에 억지 끼워맞춤된 세라믹 절연체 |
US8721791B2 (en) | 2010-07-28 | 2014-05-13 | Applied Materials, Inc. | Showerhead support structure for improved gas flow |
CN103403843B (zh) | 2011-03-04 | 2016-12-14 | 诺发系统公司 | 混合型陶瓷喷淋头 |
DE102015110440A1 (de) * | 2014-11-20 | 2016-05-25 | Aixtron Se | CVD- oder PVD-Reaktor zum Beschichten großflächiger Substrate |
DE102015118765A1 (de) * | 2014-11-20 | 2016-06-09 | Aixtron Se | Vorrichtung zum Beschichten eines großflächigen Substrats |
KR101590346B1 (ko) * | 2015-01-30 | 2016-02-01 | 주식회사 테스 | 박막증착장치 |
JP6242933B2 (ja) | 2016-03-31 | 2017-12-06 | 株式会社日立国際電気 | 基板処理装置、半導体装置の製造方法およびプログラム |
KR102700366B1 (ko) * | 2019-01-29 | 2024-08-30 | 주성엔지니어링(주) | 샤워헤드 및 이를 포함하는 기판처리장치 |
KR102618455B1 (ko) * | 2019-12-02 | 2023-12-27 | 주식회사 원익아이피에스 | 샤워헤드조립체 및 이를 포함하는 기판처리장치 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5670218A (en) * | 1995-10-04 | 1997-09-23 | Hyundai Electronics Industries Co., Ltd. | Method for forming ferroelectric thin film and apparatus therefor |
JP3480271B2 (ja) * | 1997-10-07 | 2003-12-15 | 東京エレクトロン株式会社 | 熱処理装置のシャワーヘッド構造 |
US6300255B1 (en) * | 1999-02-24 | 2001-10-09 | Applied Materials, Inc. | Method and apparatus for processing semiconductive wafers |
US6461435B1 (en) * | 2000-06-22 | 2002-10-08 | Applied Materials, Inc. | Showerhead with reduced contact area |
US7131218B2 (en) * | 2004-02-23 | 2006-11-07 | Nike, Inc. | Fluid-filled bladder incorporating a foam tensile member |
JP4698251B2 (ja) * | 2004-02-24 | 2011-06-08 | アプライド マテリアルズ インコーポレイテッド | 可動又は柔軟なシャワーヘッド取り付け |
-
2006
- 2006-08-07 TW TW095128932A patent/TWI306782B/zh active
- 2006-08-31 KR KR1020060083734A patent/KR101354575B1/ko active IP Right Grant
- 2006-09-01 CN CN2006101267890A patent/CN1924085B/zh active Active
- 2006-09-04 JP JP2006239266A patent/JP5489390B2/ja active Active
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7132359B2 (ja) | 2019-01-07 | 2022-09-06 | 株式会社アルバック | 真空処理装置、真空処理装置のクリーニング方法 |
JP7132358B2 (ja) | 2019-01-07 | 2022-09-06 | 株式会社アルバック | 真空処理装置 |
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