JP2007098564A - Polishing device - Google Patents

Polishing device Download PDF

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Publication number
JP2007098564A
JP2007098564A JP2006214811A JP2006214811A JP2007098564A JP 2007098564 A JP2007098564 A JP 2007098564A JP 2006214811 A JP2006214811 A JP 2006214811A JP 2006214811 A JP2006214811 A JP 2006214811A JP 2007098564 A JP2007098564 A JP 2007098564A
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Prior art keywords
glass substrate
traveling body
traveling
stages
polishing
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Japanese (ja)
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Akira Shirai
明 白井
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Shirai Tech Ltd
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Shirai Tech Ltd
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Priority to JP2006214811A priority Critical patent/JP2007098564A/en
Priority to KR1020060077141A priority patent/KR20060095920A/en
Priority to TW95148955A priority patent/TW200808493A/en
Publication of JP2007098564A publication Critical patent/JP2007098564A/en
Pending legal-status Critical Current

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B9/00Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
    • B24B9/02Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground
    • B24B9/06Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain
    • B24B9/08Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of glass
    • B24B9/10Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of glass of plate glass
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
    • B24B49/02Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation according to the instantaneous size and required size of the workpiece acted upon, the measuring or gauging being continuous or intermittent

Abstract

<P>PROBLEM TO BE SOLVED: To provide a polishing device for polishing the edges of a glass base board, capable of simply changing a load receptacle in accordance with the size of the glass base board. <P>SOLUTION: The polishing device is composed of a runner 1 to run advancing and retreating with an advance/retreat running means A, a table 7 equipped with a function to attract and hold the load receiving glass base board X installed in the center part of the runner in such a way as revolving with a revolving means B, two base board receiving stages 13 arranged parallel at two confronting edges of the table in such a way as running as approaching and going apart from each other with a guide means, a slide running means E to run the two stages approaching and going apart from each other, and circuit whetstones 21 installed on both sides of the runway for the runner for polishing the peripheral edges of the base board, wherein either of the table and the stages is/are elevated and sunk by an elevating/sinking means. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

この発明は、ガラス基板の辺縁を研磨する研磨装置に関する。   The present invention relates to a polishing apparatus for polishing the edge of a glass substrate.

ガラス基板の辺縁を研磨するには、まず前後方向に走行する走行体の保持台上にガラス基板を載置すると共に、吸引方式によってガラス基板を保持する。   In order to polish the edge of the glass substrate, first, the glass substrate is placed on a holding base of a traveling body that runs in the front-rear direction, and the glass substrate is held by a suction method.

次に、保持台を前方に走行させながら、走行路の両側に配置してある回転砥石によりガラス基板の二辺の辺縁を研磨する。   Next, the edges of the two sides of the glass substrate are polished with a rotating grindstone disposed on both sides of the traveling path while the holding table is traveling forward.

研磨後に前進した走行体が停止すると、保持台と共にガラス基板を90度旋回させたのち、後方に保持台と共に後方にガラス基板を走行させる。   When the traveling body moved forward after polishing stops, the glass substrate is turned 90 degrees together with the holding base, and then the glass substrate is moved rearward together with the holding base.

このとき、走行路の両側の回転砥石によりガラス基板の残る二辺の辺縁を研磨する(特許文献1)。   At this time, the remaining two edges of the glass substrate are polished by a rotating grindstone on both sides of the traveling path (Patent Document 1).

ところで、特許文献1の構造によると、ガラス基板を載置(荷受け)するステージのサイズ(平面積)は、ガラス基板のサイズ(板面積)よりも小さくして、ガラス基板の研磨辺縁をステージの辺縁から突出するようになっている。   By the way, according to the structure of Patent Document 1, the size (plane area) of the stage on which the glass substrate is placed (load receiving) is made smaller than the size (plate area) of the glass substrate, and the polishing edge of the glass substrate is set to the stage. It protrudes from the edge of the.

この要因は、研磨回転砥石とステージの辺縁との衝突を回避することにある。   This factor is to avoid collision between the grinding wheel and the edge of the stage.

すると、ガラス基板のサイズにより前記サイズに応じてステージが必要になると共に、ステージの取り替えが必要になる問題が発生した。   Then, depending on the size of the glass substrate, a stage is required according to the size, and there is a problem that the stage needs to be replaced.

そこで、ガラス基板のサイズ載置(荷受け)が最小から最大迄1台のテーブルで行なうようにしたテーブルがある(特許文献2)。
特許第3470057号公報 特開2004−243411号公報
Therefore, there is a table in which the size placement (load receiving) of the glass substrate is performed from one table to the maximum (Patent Document 2).
Japanese Patent No. 3470057 Japanese Patent Laid-Open No. 2004-243411

ところで、特許文献2の構造によると、ガラス基板のサイズに応じて最小主テーブルのみ、或いは主テーブルの各辺から伸びるアームに副テーブルブロックを取付けて、小さいサイズから大きいサイズ迄の加工に1台で対応できるようにしてある。   By the way, according to the structure of Patent Document 2, only a minimum main table or a sub table block is attached to an arm extending from each side of the main table according to the size of the glass substrate, and one unit for processing from a small size to a large size. It can be supported by.

すると、サイズの変更にともない副テーブルブロックを撤去し、又副テーブルブロックを一々取付けるので、段取り替えに手数がかかると共に、長時間かかって大幅な能率の低下になる問題があった。   Then, since the sub table block is removed and the sub table block is attached one by one as the size is changed, there is a problem that the setup change takes time, and it takes a long time to significantly reduce the efficiency.

そこで、この発明は、ガラス基板のサイズに応じて荷受けの変更が極めて簡単に行なえるようにしたものである。   In view of this, the present invention makes it very easy to change the load receiving according to the size of the glass substrate.

そして、ガラス基板の辺縁研磨の面取り幅(量)に誤差が発生しないようにする。   Then, an error is prevented from occurring in the chamfering width (amount) of edge polishing of the glass substrate.

上記の課題を解決するために、この発明は、進退走行手段により進退走行する走行体と、この走行体のセンタ部分に旋回手段により旋回するように設けた荷受けガラス基板の吸引保持機能付のテーブルと、このテーブルの対向二辺側にガイド手段により接近、離反走行するように設けた二本の並列するガラス基板受けステージと、この両ステージを接近、離反走行させるスライド走行手段と、上記走行体の走行路の両側に設けたガラス基板の辺縁研磨用の回路砥石とからなり、上記のテーブル或いはステージのいずれか片方を昇降手段により昇降させるようにした構成を採用する。   In order to solve the above-described problems, the present invention provides a traveling body that advances and retreats by advancing and retreating means, and a table with a suction holding function of a load receiving glass substrate that is provided at the center portion of the traveling body so as to be turned by a turning means. Two parallel glass substrate receiving stages provided so as to approach and separate from the opposite two sides of the table by guide means, slide traveling means for causing both stages to approach and separate, and the traveling body And a circuit grindstone for polishing the edge of the glass substrate provided on both sides of the traveling path, and adopts a configuration in which either one of the table or the stage is moved up and down by the lifting means.

また、走行体と吸引保持機能付のテーブルとの間に上記吸収保持機能付のテーブルのθ軸補正手段を介在し、カメラによってガラス基板のアライメントマークを読み取って辺縁面取り幅の誤差の修正を行なうように上記θ軸補正手段を運転するように連動させた構成を採用する。   In addition, the θ axis correction means of the table with the absorption holding function is interposed between the traveling body and the table with the suction holding function, and the error of the edge chamfering width is corrected by reading the alignment mark of the glass substrate with the camera. A configuration in which the θ-axis correcting means is operated so as to operate is adopted.

さらに、進退走行手段により進退走行する走行体と、この走行体上にθ軸補正手段を介し設けた荷受けガラス基板の吸引保持機能付のテーブルと、このテーブル上の対向二辺側にガイド手段により接近離反走行するように設けた二本の並列するガラス基板受けステージと、この両ステージを接近、離反走行させるように設けたスライド走行手段と、上記走行体の走行路の両側に設けたガラス基板の辺縁研磨用の回転砥石と、上記走行体の前進停止位置の走行路の直上と前記走行路から外れる退避位置との間で移動手段により移動するように設けた移動体と、この移動体に昇降手段により昇降して上記テーブル上のガラス基板を吸引保持するように設けた吸引保持手段と、この吸収保持手段を旋回させるように設けた旋回手段とからなり、カメラによってガラス基板のアライメントマークを読み取って辺縁面取り幅の誤差の修正を行なうように上記θ軸補正手段を運転するように連動させた構成を採用する。 Furthermore, a traveling body that travels forward and backward by the advancing and retreating means, a table with a suction holding function of the load receiving glass substrate provided on the traveling body via the θ-axis correcting means, and guide means on the opposite two sides on the table Two parallel glass substrate receiving stages provided so as to move closer to and away from each other, slide traveling means provided so as to move both stages closer to and away from each other, and glass substrates provided on both sides of the traveling path of the traveling body A rotating grindstone for edge polishing, a moving body provided so as to be moved by a moving means between a position directly above the traveling path of the traveling stop position of the traveling body and a retracted position deviating from the traveling path, and the moving body A suction holding means provided so that the glass substrate on the table is sucked and held by a lifting means, and a turning means provided so as to turn the absorption holding means. To adopt a configuration in which in conjunction to operate the θ-axis correction means so as to read the alignment marks of the glass substrate performs error correction of the edge chamfer width by.

以上のように、この発明の研磨装置によれば、走行体の前進走行の途中でステージ上に荷受けし、かつテーブル上に吸引保持してあるガラス基板の二辺縁を回転砥石により研磨し、走行体の前進後テーブルを上昇させ、かつ90度旋回によってガラス基板を旋回させたのち、テーブルを降下させてステージ上にガラス基板を荷受けし、或いはステージを上昇させてテーブル上のガラス基板を荷受けしてステージを降下した後、走行体の後退走行の途中でガラス基板の残る二辺縁を回転砥石により研磨するので、ガラス基板の四辺縁の研磨を能率よく行なうと共に、ガラス基板のサイズに応じて平行するステージを接近或いは離反させて、ガラス基板のサイズに応じた荷受けが可能になる。   As described above, according to the polishing apparatus of the present invention, the two edges of the glass substrate that is loaded on the stage and sucked and held on the table in the middle of the forward traveling of the traveling body are polished by the rotating grindstone, After the traveling body moves forward, the table is raised and the glass substrate is turned by turning 90 degrees, and then the table is lowered to receive the glass substrate on the stage, or the stage is raised to receive the glass substrate on the table. After lowering the stage, the remaining two edges of the glass substrate are polished with a rotating grindstone while the traveling body is moving backward, so that the four edges of the glass substrate are efficiently polished and according to the size of the glass substrate. By moving the parallel stages closer to or away from each other, it becomes possible to receive goods according to the size of the glass substrate.

このため、ガラス基板のサイズに応じたテーブルの交換が不要になる。   For this reason, the exchange of the table according to the size of the glass substrate becomes unnecessary.

特にガラス基板が長方形の場合、走行体の前進時と後退時との研磨に際し、一方で短辺縁の研磨を、他方で長辺縁の研磨を行なうことができると共に、ガラス基板の旋回にともなう移動辺縁(例えば、短辺から長辺の研磨位置の変更による)の位置変更に際してもステージの位置変更によりガラス基板を荷受けできる。   In particular, when the glass substrate is rectangular, it is possible to polish the short edge on the one hand and the long edge on the other hand when the traveling body is advanced and retracted, and with the rotation of the glass substrate. Even when the position of the moving edge (for example, by changing the polishing position from the short side to the long side) is changed, the glass substrate can be received by changing the position of the stage.

また、ガラス基板のアライメントマークをカメラにより読み取って、θ軸補正手段によりガラス基板の吸引保持機能付のテーブルを時計、反時計方向に回転させながら面取り幅(量)に誤差が発生しないような修正を行なう。   Also, the glass substrate alignment mark is read by the camera, and the table with suction holding function of the glass substrate is rotated clockwise or counterclockwise by the θ-axis correction means so that no error occurs in the chamfer width (amount). To do.

このため、幅の均一な面取り加工(精度の良い)ができると共に、角度誤差の自動修正が可能になり、従来のような誤差の修正を、まず吸引による吸引保持を解いてガラス基板の旋回補正後、角度吸引保持する手間のかかる工程が不要になり、かつ完全な誤差修正ができないための精度の悪い面取り加工になるなどの問題をなくすることができる。   This enables chamfering with a uniform width (high accuracy) and automatic correction of angular errors. First, correction of errors as in the past is performed by first removing the suction hold by suction and correcting the rotation of the glass substrate. Thereafter, the troublesome process of holding the angle by suction is not necessary, and problems such as inaccurate chamfering because the error cannot be completely corrected can be eliminated.

さらに、走行体のテーブル上に保持させてあるガラス基板のアライメントマークをカメラにより読み取ってガラス基板の角度補正を必要とする場合、θ軸補正手段によりテーブルと共に吸引保持ガラス基板を旋回させて補正し、又、二辺縁の研磨後前進走行停止時のガラス基板の直上に移動体を移動させたのち、テーブル上の吸引保持の解除されたガラス基板を昇降手段により降下させた吸引保持手段により吸引保持して荷受けし、次いで昇降手段によりガラス基板と共に吸引保持手段と共に荷受けしたガラス基板を上昇させたのち、旋回手段により吸引保持手段と共にガラス基板を90度旋回させ、その後にテーブル上にガラス基板を荷受けさせて吸引保持させたのち、走行体を後退走行させ、次いで走行体を前進させながら前進走行途中にカメラによるアライメントマークの読み取り、補正を必要とする場合の補正手段によるテーブルの旋回、回転砥石による残る二辺の研磨をするので、幅の均一な(精度の良い)面取り加工ができ、又移動体の移動を利用してガラス基板のテーブル上への供給や、面取り加工ずみガラス基板の取り下ろしもできる。   In addition, when it is necessary to correct the angle of the glass substrate by reading the alignment mark of the glass substrate held on the table of the traveling body with a camera, the suction holding glass substrate is swung with the table by the θ-axis correcting means to correct it. In addition, after moving the moving body directly above the glass substrate at the time of stopping forward traveling after polishing the two edges, the glass substrate released from suction holding on the table is sucked by the suction holding means lowered by the lifting means After holding and receiving the cargo, the glass substrate received together with the suction holding means together with the glass substrate is raised by the lifting means, and then the glass substrate is turned 90 degrees together with the suction holding means by the turning means, and then the glass substrate is placed on the table. After receiving and sucking and holding, the traveling body is moved backward, and then the traveling body is moved forward while traveling forward. When the alignment mark is read by the camera and the correction is required, the table is swiveled and the remaining two sides are polished by the rotating grindstone, so that the chamfering process can be performed with a uniform width (high accuracy) and the moving body. It is also possible to supply the glass substrate onto the table and to remove the chamfered glass substrate by using the movement of.

この発明の第1の実施形態を添付図面に基づいて説明する。   A first embodiment of the present invention will be described with reference to the accompanying drawings.

この発明の第1の実施形態では、図1から図6に示すように、進退走行手段Aにより走行体1が進退走行するようになっている。   In the first embodiment of the present invention, as shown in FIGS. 1 to 6, the traveling body 1 moves forward and backward by the forward / backward traveling means A.

上記の進退走行手段Aは、図示の場合、前後方向に敷設したレール2と、走行体1の下面両側に設けてレール2にスライド自在に係合したスライダ3と、レール2に平行して定位置で回転するように設けた雄ネジ4と、走行体1の下面に取付けて雄ネジ4にねじ込んだ雌ネジ5と、雄ネジ4を可逆駆動する第1モーター6とで構成され、第1モーター6の正転、逆転運転により走行体1を前進、後退させるようにしたが、限定されず、その構成によって走行体1を進退走行させることもある。   In the illustrated case, the advancing / retreating means A includes a rail 2 laid in the front-rear direction, a slider 3 provided on both sides of the lower surface of the traveling body 1 and slidably engaged with the rail 2, and fixed in parallel with the rail 2. The male screw 4 provided to rotate at the position, the female screw 5 attached to the lower surface of the traveling body 1 and screwed into the male screw 4, and the first motor 6 that reversibly drives the male screw 4, Although the traveling body 1 is moved forward and backward by forward rotation and reverse rotation operation of the motor 6, it is not limited, and the traveling body 1 may be moved forward and backward depending on the configuration.

また、走行体1上のセンタには、昇降手段Bにより昇降し、かつ旋回手段Cにより旋回する荷受けガラス基板Xの吸引保持機能付のテーブル7が設けてある。   Further, a table 7 having a suction holding function for the load receiving glass substrate X which is moved up and down by the lifting means B and turned by the turning means C is provided at the center on the traveling body 1.

上記のテーブル7は、図示の場合頂壁に無数の吸引小孔8を有するボックスにより形成され、テーブル7内を吸引して、テーブル7上に載置したガラス基板Xを吸引保持するようにしてあり、昇降手段Bは、図示の場合走行体1上にシリンダ9を介しテーブル7を据え付けて、シリンダ9の伸長、収縮により昇降するようにしてあり、旋回装置Cは、図示の場合、テーブル7の下部外周に設けてある歯部10に第2モーター11により駆動する歯車12を噛み合わせ、第2モーター11の運転によりテーブル7を旋回させるようにしたが、その他の方式で昇降、旋回させることもある。   In the illustrated case, the table 7 is formed by a box having an infinite number of suction holes 8 on the top wall, and the table 7 is sucked to hold the glass substrate X placed on the table 7 by suction. In the illustrated case, the lifting / lowering means B is installed on the traveling body 1 via the cylinder 9 via the cylinder 9 so as to be lifted / lowered by the expansion / contraction of the cylinder 9. The gear 12 driven by the second motor 11 is meshed with the tooth portion 10 provided on the outer periphery of the lower part, and the table 7 is turned by the operation of the second motor 11, but it is raised and lowered by other methods. There is also.

さらに、テーブル7の対向二辺側には、ガイド手段Dにより接近、離反走行する二本の並列するガラス基板Xの荷受けステージ13、13が設けてある。   Further, on the opposite two sides of the table 7 are provided two load receiving stages 13 and 13 for the glass substrates X arranged in parallel, which are moved closer to and away from each other by the guide means D.

上記のステージ13、13は、荷受け上面が水平な角材を用い、走行体1上に走行方向に対し直角に交差する二条のガイドレール14を設けて、このガイドレール14、14にステージ13、13の両端部下面に設けてあるスライダ15をスライド自在に係合させてある。   The above-described stages 13 and 13 are made of square bars having a horizontal load receiving upper surface, and provided with two guide rails 14 that intersect at right angles to the traveling direction on the traveling body 1, and the stages 13 and 13 are provided on the guide rails 14 and 14. The sliders 15 provided on the lower surfaces of the both end portions are slidably engaged.

また並列する両ステージ13、13は、スライド走行手段Eにより接近、離反スライドさせるようにしてある。   Both stages 13 and 13 arranged in parallel are made to slide toward and away from each other by the slide travel means E.

上記のスライド走行手段Eは、図示の場合、第3モーター16により定位置で可逆駆動する雄ネジ17と、この雄ネジ17にねじ込んでステージ13、13に取付けた雌ネジ18とで構成され、第3モーター16の可逆運転により面ステージ13、13を接近、離反方向にスライドさせるようにしたが、その他の方式によってスライドさせてもよい。   In the illustrated case, the slide travel means E is composed of a male screw 17 that is reversibly driven at a fixed position by a third motor 16 and a female screw 18 that is screwed into the male screw 17 and attached to the stages 13 and 13. Although the surface stages 13 and 13 are slid in the approach and separation directions by the reversible operation of the third motor 16, they may be slid by other methods.

さらに、走行体1の走行路の両側には、ガラス基板Xの二辺の上角のみ、或いは上角と下角を研磨する回転砥石21、21が設けてある。   Further, on both sides of the traveling path of the traveling body 1, there are provided rotating grindstones 21 and 21 for polishing only the upper corners of the two sides of the glass substrate X or the upper and lower corners.

勿論、回転砥石21、21の左右の対向間隔は、周知のようにガラス基板Xの二辺(研磨縁)間の寸法に応じて数値制御により調整するようになっている。例えば、特許文献1の方式を採用する。   Of course, the distance between the left and right rotating grindstones 21 and 21 is adjusted by numerical control according to the dimension between the two sides (polishing edges) of the glass substrate X as is well known. For example, the method of Patent Document 1 is adopted.

図中22は、走行体1上のステージ13、13間に上面がステージ13の上面と面一になるように設けた補正ステージで、この補正ステージ22により荷受けしたガラス基板Xの自量による歪の発生を防止する。   In the figure, reference numeral 22 denotes a correction stage provided between the stages 13 and 13 on the traveling body 1 so that the upper surface is flush with the upper surface of the stage 13. The distortion caused by the own amount of the glass substrate X received by the correction stage 22. Preventing the occurrence of

上記のように構成すると、図7に示すように後退停止している走行体1のステージ13上にガラス基板Xを載置して荷受け(図3に示す)する。   If comprised as mentioned above, as shown in FIG. 7, the glass substrate X will be mounted on the stage 13 of the traveling body 1 which has stopped retreating, and will be received (shown in FIG. 3).

このとき、面ステージ13、13は、ガラス基板Xのサイズによって第3モーター16の運転により接近又は離反方向にスライドさせて、荷受けに最適な位置に移動させて調整しておく。   At this time, the surface stages 13 and 13 are slid in the approach or separation direction by the operation of the third motor 16 depending on the size of the glass substrate X, and are moved to an optimum position for receiving the cargo.

また、図4に示すようにテーブル7内を吸引して、テーブル7上にガラス基板Xを吸引保持する。   Further, as shown in FIG. 4, the inside of the table 7 is sucked and the glass substrate X is sucked and held on the table 7.

次に第1モーター6の正転運転により雄ネジ4をドライブして、前方に向け走行体1と共にガラス基板Xを走行させながら、図4に示すように回転砥石21、21によってガラス基板Xの走行方向に沿う二辺縁を研磨する。   Next, the male screw 4 is driven by the forward rotation operation of the first motor 6, and the glass substrate X is moved forward together with the traveling body 1 while moving the glass substrate X by the rotating grindstones 21 and 21 as shown in FIG. Polish two edges along the running direction.

そして、走行体1が前方で停止すると、テーブル7による吸引を維持しながら、まず昇降手段Bによりテーブル7と共にガラス基板Xを図5に示すように上昇させ、次いで旋回手段Cによりテーブル7と共にガラス基板Xを90度旋回させたのち、昇降手段Bによりテーブル7と共にガラス基板Xを降下させて、図6に示すようにステージ13、13上にガラス基板Xを荷受けする。   When the traveling body 1 stops in front, the glass substrate X is first lifted together with the table 7 by the lifting means B as shown in FIG. After the substrate X is turned 90 degrees, the glass substrate X is lowered together with the table 7 by the lifting means B, and the glass substrate X is received on the stages 13 and 13 as shown in FIG.

このとき、両ステージ13、13は、ガラス基板Xの辺縁の長さに応じて(例えば、走行体1の前進時の長辺受架に対し、旋回後の受架辺縁が短辺になると)、両ステージ13、13を接近方向にスライドさせて、最適な荷受け位置に調整する。   At this time, according to the length of the edge of the glass substrate X, both the stages 13 and 13 (for example, with respect to the long side support at the time of advancement of the traveling body 1, the support edge after turning is set to the short side). Then, both stages 13 and 13 are slid in the approaching direction and adjusted to the optimum load receiving position.

しかして、旋回後に第1モーター6の逆転運転により走行体1を後方に向け走行させながら、図6に示すように走行途中に、回転砥石21、21によりガラス基板Xの残る二辺縁を研磨する。   Then, while the traveling body 1 is traveling backward by the reverse operation of the first motor 6 after turning, the remaining two edges of the glass substrate X are polished by the rotating grindstones 21 and 21 while traveling as shown in FIG. To do.

研磨したガラス基板は、テーブル7により吸引保持を解除して取り下ろす。   The polished glass substrate is removed from the suction holding state by the table 7.

なお、前述の実施例(図示の場合)では、テーブル7を昇降手段Bにより昇降させるようにしたが、テーブル7には、旋回手段Cにより旋回機能のみを付与し、ステージ13に昇降機能(例えばステージ13と雌ネジ18との間にシリンダを介在するなどの方法で)を付与して、同目的を達成するようにしてもよい。   In the above-described embodiment (in the case of illustration), the table 7 is raised and lowered by the raising / lowering means B. However, the table 7 is given only the turning function by the turning means C, and the stage 13 has the raising / lowering function (for example, For example, a cylinder may be interposed between the stage 13 and the female screw 18 to achieve the same purpose.

また、回転砥石21は、V溝砥石、カップ砥石、マルチ砥石などを使用する。   The rotary grindstone 21 uses a V-groove grindstone, a cup grindstone, a multi grindstone or the like.

この発明の第2の実施形態では、図8、9、10に示すように、第1の実施形態の走行体1と吸引保持機能付のテーブル7との間には、テーブル7のθ軸補正手段Kが介在してある。   In the second embodiment of the present invention, as shown in FIGS. 8, 9, and 10, between the traveling body 1 of the first embodiment and the table 7 with a suction holding function, the θ axis correction of the table 7 is performed. Means K are interposed.

上記のθ軸補正手段Kとしては、可逆運転する第4モーター31が用いられ、図示の場合走行体1とシリンダ9との間に介在して、シリンダ9と共にテーブル7を時計、反時計方向に修正に必要な角度旋回させるようにしたが、限定されず、例えばシリンダ9とテーブル7との間に配置してもよい。要するに修正に必要な角度、ガラス基板Xを旋回させればよい。   As the θ-axis correcting means K, a fourth motor 31 that performs a reversible operation is used. In the illustrated case, the fourth motor 31 is interposed between the traveling body 1 and the cylinder 9 and the table 7 together with the cylinder 9 is turned clockwise or counterclockwise. Although it was made to turn at an angle required for correction, it is not limited, For example, you may arrange | position between the cylinder 9 and the table 7. FIG. In short, the glass substrate X may be rotated by an angle necessary for correction.

また、θ軸補正手段Kとしての第4モーター31の運転は、走行体1の走行路の上側左右に配置してある対のカメラP1、P2によって走行途中のガラス基板Xの両側コーナーのアライメントマークYを読み取って、この読み取りにともなうガラス基板Xの走行方向前後のアライメントマークYのずれ量を接続された演算装置によって計算し、その計算にもとづいて制御装置によって第4モーター31を可逆運転して、ガラス基板Xの吸引保持ずみのテーブル7を時計、反時計方向に旋回させる。 The fourth motor 31 as the θ-axis correcting means K is operated at the corners on both sides of the glass substrate X in the middle of traveling by the pair of cameras P 1 and P 2 arranged on the upper left and right of the traveling path of the traveling body 1. The alignment mark Y is read, and the displacement amount of the alignment mark Y before and after the traveling direction of the glass substrate X accompanying this reading is calculated by a connected arithmetic device, and the control device reversibly operates the fourth motor 31 based on the calculation. Then, the suction-holding table 7 of the glass substrate X is turned clockwise and counterclockwise.

この旋回させる要因は、旋回角度誤差の修正にともない回転砥石21による面取り加工幅が、面取り加工開始側と面取り終了側とで差異がない均一な加工を行なって、精度の悪い加工による不良品の発生をなくすることにある。   The cause of this turning is that the chamfering width by the rotating grindstone 21 with the correction of the turning angle error is uniform so that there is no difference between the chamfering start side and the chamfering end side. It is to eliminate the occurrence.

上記のカメラP1、P2は、ガラス基板Xの幅、すなわち、左右のアライメントマークYの対向(左右)距離によって位置調整ができるようにしてある。 The cameras P 1 and P 2 can be adjusted in position according to the width of the glass substrate X, that is, the opposing (left and right) distance of the left and right alignment marks Y.

上記の位置調整は、図8、9、10に示すように、走行体1の走行路の上を横切るフレーム32を設けて、このフレーム32の全長に設けてあるガイドレール33に左右面ベース34のスライダ35をスライド自在に係合すると共に、フレーム32の全長に沿わせて定位置でフリーに回転するように軸承した中間から片端に右ネジを、中間からもう片端に左ネジを設けた雄ネジ36に左右両ベース34にそれぞれ保持させた一方の雌ネジ37を雄ネジ36の右ネジに、他方の雌ネジ37を雄ネジ36の左ネジにそれぞれはじ込み、両ベース34にカメラP1、P2を据え付けておく。 As shown in FIGS. 8, 9, and 10, the position adjustment is performed by providing a frame 32 that crosses over the traveling path of the traveling body 1, and a guide rail 33 that is provided along the entire length of the frame 32. The slider 35 is slidably engaged, and a male screw provided with a right-handed screw from the middle to one end and a left-handed screw from the middle to the other end is supported so as to freely rotate at a fixed position along the entire length of the frame 32. one female screw 37 of which is held on left and right both base 34 to the right thread of the male screw 36 into the screw 36, the other female screw 37 narrowing Haji respectively to the left screw of the male screw 36, the camera P 1 to the bases 34 , P 2 is installed.

そして、第5モーター37によって雄ネジ36を可逆駆動して、ベース34と共にカメラP1、P2をアライメントマークYの位置に見合う(合致するように)ように接近、離反に移動させるようにしてある。 Then, the male screw 36 is reversibly driven by the fifth motor 37 so that the cameras P 1 and P 2 together with the base 34 are moved toward and away from each other so as to match (match) the position of the alignment mark Y. is there.

この発明の第3の実施形態では、図11、12に示すように、進退走行手段Aによって走行体1が進退走行するようになっている。   In the third embodiment of the present invention, as shown in FIGS. 11 and 12, the traveling body 1 is advanced and retracted by the advance / retreat means A.

上記の進退走行手段Aは、第1の実施形態と同様につき構成、進退走行方法の説明を省略する。   The advancing / retreating means A is the same as in the first embodiment, and a description of the advancing / retreating method is omitted.

また、走行体1上には、荷受けするガラス基板Xの吸引保持機能付のテーブル7が設けてあり、テーブル7の対向二辺側には、ガイド手段Dにより接近、離反走行する二本の並列するガラス基板Xの荷受けステージ13、13が設けてあり、両ステージ13、13は、スライド走行手段Eにより接近、離反スライドするようにしてある。   Further, on the traveling body 1, a table 7 having a suction holding function for the glass substrate X to be received is provided, and two parallel sides that are moved closer to and away from each other by the guide means D on the opposite two sides of the table 7. The receiving stages 13 and 13 of the glass substrate X to be provided are provided, and both stages 13 and 13 are slid toward and away by the slide travel means E.

上記の吸引保持機能付のテーブル7、上記のステージ13、13のスライドのガイド手段D及びスライド走行手段Eは、第1の実施形態と同様につき構成や作用の説明を省略する。   The table 7 with the suction holding function, the slide guide means D and the slide travel means E of the stages 13 and 13 are the same as those in the first embodiment, and the description of the configuration and operation is omitted.

さらに、走行体1の走行路の両側には、ガラス基板Xの二辺の上角のみ、或いは上角と下角を研磨する回転砥石21、21が設けてある。   Further, on both sides of the traveling path of the traveling body 1, there are provided rotating grindstones 21 and 21 for polishing only the upper corners of the two sides of the glass substrate X or the upper and lower corners.

勿論、回転砥石21、21の左右の対向間隔は、周知のようにガラス基板Xの二辺(研磨縁)間の寸法に応じて数値制御により調整するようになっている。例えば、特許文献1の方式を採用する。   Of course, the distance between the left and right rotating grindstones 21 and 21 is adjusted by numerical control according to the dimension between the two sides (polishing edges) of the glass substrate X as is well known. For example, the method of Patent Document 1 is adopted.

そして、回転砥石21は、V滑砥石、カップ砥石、マルチ砥石などを使用する。   The rotating grindstone 21 uses a V grindstone, a cup grindstone, a multi grindstone, or the like.

なお、第1の実施形態と同様に補正ステージ22を設けて、荷受けしたガラス基板Xの自重による歪の発生を防止する。   In addition, the correction stage 22 is provided similarly to 1st Embodiment, and generation | occurrence | production of the distortion by the dead weight of the glass substrate X which received the load is prevented.

また、走行体1の前進停止した走行路の直上と走行路から外れる退避位置との間で移動手段Fにより移動する移動体Gを設ける。   In addition, a moving body G is provided that moves by the moving means F between a position directly above the traveling path where the traveling body 1 has stopped moving forward and a retracted position that deviates from the traveling path.

上記の移動手段Fは、図示の場合移動体Gのベース41に設けてあるスライダ42をスライド自在に係合した水平なレール43と、このレール43の両端に両端がフリーに回転するように軸承した雄ネジ44と、ベース41に支持させて雄ネジ44にねじ込んだ雌ネジ45と、雄ネジ44を可逆駆動する第6モーター46とで構成され、第6モーター46の可逆運転で移動体Gを前進停止したテーブル7の直上と、直上から外れる退避位置との間で進退走行させるようにしたが、その他の構成、例えばドライブ機能付のピニオンとラックとの噛み合いや、伸縮アームなどによって同目的を達成するようにしてもよい。   In the illustrated case, the moving means F includes a horizontal rail 43 slidably engaged with a slider 42 provided on the base 41 of the moving body G, and a bearing so that both ends of the rail 43 rotate freely at both ends. And the sixth motor 46 that reversibly drives the male screw 44. The movable body G is reversibly operated by the sixth motor 46. Is moved forward and backward between the position immediately above the table 7 that has stopped moving forward and the retracted position that is removed from the position directly above, but the same purpose is achieved by other configurations, for example, the engagement between the pinion with a drive function and the rack, the telescopic arm, etc. May be achieved.

さらに、移動体Gには、昇降手段Bによって昇降し、かつ回転軸線が垂直な90度の旋回手段Cによって旋回すると共に、テーブル7上のガラス基板Xを荷受けする吸引保持機能付のパット47が設けてある。   Further, the moving body G has a pad 47 with a suction holding function for lifting and lowering by the lifting means B and turning by the turning means C having a vertical rotation axis of 90 degrees and receiving the glass substrate X on the table 7. It is provided.

上記の旋回手段Cは、図示の場合ベース41の下面に旋回モーター48を据え付け、昇降手段Bは、図示の場合旋回モーター48とパット47との間にシリンダ49を介在して設けたが、旋回モーター48とシリンダ49の上下の配置に逆にすることもあり、図示のように対向側をスライド自在に嵌装した筒体と軸材とからなるガイド部材50の相反する両面をベース41とパット47とに固定して、パット47のフリーな回転を止めるようになっている。   In the illustrated case, the turning means C has a turning motor 48 mounted on the lower surface of the base 41, and the lifting means B is provided with a cylinder 49 interposed between the turning motor 48 and the pad 47 in the illustrated case. The upper and lower arrangements of the motor 48 and the cylinder 49 may be reversed. As shown in the figure, the opposite surfaces of the guide member 50 made of a cylindrical body and a shaft member that are slidably fitted on the opposite sides are placed on the base 41 and the pad. 47, and the rotation of the pad 47 is stopped.

なお、パット47の吸引保持機能は、パット47の底壁に無数の小孔(図示省略)を有するボックスを使用し、ボックス内を吸引してパット47の下面にガラス基板Xを吸引して保持するようになっている。   The suction holding function of the pad 47 uses a box having numerous small holes (not shown) on the bottom wall of the pad 47, sucks the inside of the box, and sucks and holds the glass substrate X on the lower surface of the pad 47. It is supposed to be.

また、走行体1の走行路の上側左右に対のカメラP1、P2を配置して、このカメラP1、P2によってテーブル7上の吸引保持ガラス基板Xの上面のコーナーのアライメントマークYを読み取るようになっている。 Also, a pair of cameras P 1 and P 2 are arranged on the upper left and right sides of the traveling path of the traveling body 1, and the alignment marks Y at the corners on the upper surface of the suction holding glass substrate X on the table 7 by these cameras P 1 and P 2 . Is supposed to read.

上記カメラP1、P2及び左右のアライメントマークYの直上にカメラP1、P2を合致させる接近離反方向の移動は、第2の実施形態と同様につき図示及び構成、作用の説明を省略する。 The movement in the approaching / separating direction to match the cameras P 1 and P 2 directly above the cameras P 1 and P 2 and the left and right alignment marks Y is the same as in the second embodiment, and the illustration, configuration, and description of the operation are omitted. .

上記読み取りにともなうガラス基板Xの走行方向前後のアライメントマークYのずれ量を接続された演算装置によって計算し、計算にもとづいて修正する。   The shift amount of the alignment mark Y before and after the glass substrate X in the traveling direction accompanying the reading is calculated by a connected arithmetic unit, and is corrected based on the calculation.

上記の修正は、走行体1のテーブル7の下側に据え付けてある第2の実施形態と同様のθ軸補正手段Kとしてのモーター31を時計、反時計方向にずれ量に応じた角度運転して、テーブル7と共に吸引保持のガラス基板Xを旋回させて行なう。   In the above correction, the motor 31 as the θ-axis correcting means K, which is installed on the lower side of the table 7 of the traveling body 1, is operated in the clockwise and counterclockwise directions according to the deviation amount. Then, the suction and holding glass substrate X together with the table 7 is rotated.

研磨後のガラス基板Xと共にテーブル7が前進位置で停止すると、ガラス基板Xの直上で停止している移動体Gのパット47を昇降手段Bの運転により降下させて、テーブル7上のガラス基板Xにパット47を当接すると共に、まずテーブル7側の吸引を解除し、次いでパット47側を吸引して、マット47にガラス基板Xを吸引保持させたのち、昇降手段Bの運転によってテーブル7上からガラス基板Xを浮上させる。   When the table 7 is stopped at the forward movement position together with the polished glass substrate X, the pad 47 of the moving body G stopped immediately above the glass substrate X is lowered by the operation of the elevating means B, and the glass substrate X on the table 7 is lowered. First, the suction on the table 7 side is released, then the pad 47 side is sucked, the glass substrate X is sucked and held on the mat 47, and then the table B is moved from above the table 7 by the operation of the lifting means B. The glass substrate X is levitated.

その後に、旋回手段Cのモーター48の90度運転によりガラス基板Xを旋回させ、旋回後に昇降手段Bの運転によってパット47と共にガラス基板Xを降下させて、テーブル7上にガラス基板Xを載置したのち、テーブル7にガラス基板Xを吸収保持し、次いでパット47によるガラス基板Xの吸引を解除したのち、昇降手段Bの運転によってパット47を上昇させる。   Thereafter, the glass substrate X is turned by the 90-degree operation of the motor 48 of the turning means C, and after turning, the glass substrate X is lowered together with the pad 47 by the operation of the lifting means B, and the glass substrate X is placed on the table 7. After that, the glass substrate X is absorbed and held on the table 7, and then the suction of the glass substrate X by the pad 47 is released, and then the pad 47 is raised by the operation of the elevating means B.

しかるのち、テーブル7を後退させ、後退後前進させる。   After that, the table 7 is moved backward and moved forward after moving backward.

この前進時に前述のようにカメラP1、P2によってアライメントマークYを読み取り、読み取りにともなうずれ量を、上述のようにθ軸補正手段Kのモーター31を運転して修正し、そして回転砥石21によって残る二辺縁を面取り加工する。すると、各辺縁の面取り幅を均一化する。 During this advancement, the alignment mark Y is read by the cameras P 1 and P 2 as described above, and the shift amount accompanying the reading is corrected by operating the motor 31 of the θ-axis correction means K as described above, and the rotating grindstone 21 Chamfer the two remaining edges. Then, the chamfer width of each edge is made uniform.

走行体1の前進が終了すると、ガラス基板X上にパット47を昇降手段Bにより降送して、パット47にガラス基板Xを吸引保持させ、テーブル7によるガラス基板Xの吸引保持を解除する。   When the forward movement of the traveling body 1 is completed, the pad 47 is moved down on the glass substrate X by the lifting means B, the glass substrate X is sucked and held by the pad 47, and the suction holding of the glass substrate X by the table 7 is released.

その後に昇降手段Bによってガラス基板Xと共にパット47を上昇させたのち、移動手段Fの運転によって搬出コンベヤS上にガラス基板Xを移送し、移送後に昇降手段Bにより搬出コンベヤS上にガラス基板Xを吸引(パット47側の)を解除して移載する。なお、テーブル7上へのガラス基板Xの供給もパット47を利用して行うこともできる。   Thereafter, the pad 47 is raised together with the glass substrate X by the lifting means B, and then the glass substrate X is transferred onto the carry-out conveyor S by the operation of the moving means F. After the transfer, the glass substrate X is transferred onto the carry-out conveyor S by the lift means B. Release the suction (on the side of the pad 47) and transfer. The glass substrate X can be supplied onto the table 7 using the pad 47.

なお、前記第2、第3の実施形態のエッジ面取り量(面取り幅)の均一なθ軸旋回補正を行なうためのカメラP1、P2によるアライメントマークYの読み取りは、例えば特願2002−379505号や特願2005−223593号の方式を採用して行なう。 Incidentally, the reading of the alignment mark Y by the cameras P 1 and P 2 for performing the uniform θ-axis turning correction of the edge chamfering amount (chamfering width) of the second and third embodiments is, for example, Japanese Patent Application No. 2002-379505. No. or Japanese Patent Application No. 2005-223593.

この発明の第1の実施形態を示す平面図である。It is a top view which shows 1st Embodiment of this invention. 同上の縦断正面図である。It is a longitudinal front view same as the above. 同縦断側面図である。It is the longitudinal section side view. ガラス基板の吸引保持を示す縦断正面図である。It is a vertical front view which shows suction holding | maintenance of a glass substrate. ガラス基板の旋回を示す縦断正面図である。It is a vertical front view which shows turning of a glass substrate. ガラス基板の残る二辺の研磨を示す縦断正面図である。It is a vertical front view which shows grinding | polishing of the two sides with which a glass substrate remains. 作用工程図である。FIG. 第2の実施形態を示す平面図である。It is a top view which shows 2nd Embodiment. 同上の縦断拡大正面図である。It is a vertical expansion front view same as the above. 同一部切欠大側面図である。It is the same part notch large side view. 第3の実施形態を示す縦断拡大側面図である。It is a vertical expansion side view which shows 3rd Embodiment. 同縦断正面図である。It is the longitudinal section front view.

符号の説明Explanation of symbols

A 進退走行手段
B 昇降手段
C 旋回手段
D ガイド手段
E スライド走行手段
X ガラス基板
Y アライメントマーク
1 走行体
2 レール
3 スライダ
4 雄ネジ
5 雌ネジ
6 第1モーター
7 テーブル
8 小孔
9 シリンダ
10 歯部
11 第2モーター
12 歯車
13 ステージ
14 ガイドレール
15 スライダ
16 第3モーター
17 雄ネジ
18 雌ネジ
21 回転砥石
K θ軸補正手段
1、P2 カメラ
31 第4モーター
32 フレーム
33 ガイドレール
34 ベース
35 スライダ
36 雄ネジ
37 第5モーター
F 移動手段
G 移動体
41 ベース
42 スライダ
43 レール
44 雄ネジ
45 雌ネジ
46 第6モーター
47 パット
48 旋回モーター
49 シリンダ
50 ガイド部材
A Advancing / retreating means B Lifting means C Turning means D Guide means E Slide traveling means X Glass substrate Y Alignment mark 1 Traveling body 2 Rail 3 Slider 4 Male screw 5 Female screw 6 First motor 7 Table 8 Small hole 9 Cylinder 10 Tooth part 11 Second motor 12 Gear 13 Stage 14 Guide rail 15 Slider 16 Third motor 17 Male screw 18 Female screw 21 Rotary grindstone K θ-axis correction means P 1 , P 2 Camera 31 Fourth motor 32 Frame 33 Guide rail 34 Base 35 Slider 36 male screw 37 fifth motor F moving means G moving body 41 base 42 slider 43 rail 44 male screw 45 female screw 46 sixth motor 47 pad 48 turning motor 49 cylinder 50 guide member

Claims (3)

進退走行手段により進退走行する走行体と、この走行体のセンタ部分に旋回手段により旋回するように設けた荷受けガラス基板の吸引保持機能付のテーブルと、このテーブルの対向二辺側にガイド手段により接近、離反走行するように設けた二本の並列するガラス基板受けステージと、この両ステージを接近、離反走行させるスライド走行手段と、上記走行体の走行路の両側に設けたガラス基板の辺縁研磨用の回路砥石とからなり、上記のテーブル或いはステージのいずれか片方を昇降手段により昇降させるようにしたことを特徴とする研磨装置。   A traveling body that advances and retreats by the advancing and retreating means, a table with a suction holding function of a load receiving glass substrate that is provided at the center portion of the traveling body by the turning means, and guide means on opposite two sides of the table. Two side-by-side glass substrate receiving stages provided so as to move toward and away from each other, slide traveling means for causing both stages to move toward and away from each other, and edges of the glass substrate provided on both sides of the traveling path of the traveling body A polishing apparatus comprising a circuit grindstone for polishing, wherein either one of the table or the stage is moved up and down by a lifting means. 前記走行体と吸引保持機能付のテーブルとの間に上記吸収保持機能付のテーブルのθ軸補正手段を介在し、カメラによってガラス基板のアライメントマークを読み取って辺縁面取り幅の誤差の修正を行なうように上記θ軸補正手段を運転するように連動させたことを特徴とする請求項1に記載の研磨装置。   The θ-axis correcting means of the table with the absorption holding function is interposed between the traveling body and the table with the suction holding function, and the error of the edge chamfering width is corrected by reading the alignment mark of the glass substrate with a camera. The polishing apparatus according to claim 1, wherein the θ-axis correction unit is interlocked to operate. 進退走行手段により進退走行する走行体と、この走行体上にθ軸補正手段を介し設けた荷受けガラス基板の吸引保持機能付のテーブルと、このテーブルの対向二辺側にガイド手段により接近離反走行するように設けた二本の並列するガラス基板受けステージと、この両ステージを接近、離反走行させるように設けたスライド走行手段と、上記走行体の走行路の両側に設けたガラス基板の辺縁研磨用の回転砥石と、上記走行体の前進停止位置の走行路の直上と前記走行路から外れる退避位置との間で移動手段により移動するように設けた移動体と、この移動体に昇降手段により昇降して上記テーブル上のガラス基板を吸引保持するように設けた吸引保持手段と、この吸収保持手段を旋回させるように設けた旋回手段とからなり、カメラによってガラス基板のアライメントマークを読み取って辺縁面取り幅の誤差の修正を行なうように上記θ軸補正手段を運転するように連動させたことを特徴とする研磨装置。   A traveling body that advances and retreats by the advancing and retreating means, a table with a suction holding function of the load receiving glass substrate provided on the traveling body via the θ-axis correcting means, and a guide means on the opposite two sides of the table by approaching and moving away from each other Two glass substrate receiving stages arranged side by side, slide running means provided to move both stages closer to and away from each other, and edges of the glass substrates provided on both sides of the running path of the traveling body A grinding wheel for polishing, a moving body provided so as to be moved by a moving means between a position directly above the traveling path of the forward stop position of the traveling body and a retracted position deviating from the traveling path, and an elevating means on the moving body And a suction holding means provided to suck and hold the glass substrate on the table, and a turning means provided to turn the absorption holding means. Polishing apparatus is characterized in that interlocked allowed to operate the θ-axis correction means so as to correct the error of the edge chamfer width by reading the alignment marks of the glass substrate.
JP2006214811A 2005-09-08 2006-08-07 Polishing device Pending JP2007098564A (en)

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TW95148955A TW200808493A (en) 2006-08-07 2006-12-26 Polishing device

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