JP2007069169A - Supply system, continuous or semi-continuous treatment apparatus and continuous treatment method - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a supply system which has a simple structure, can send even a solid-liquid mixture and can stand long and continuous use and to provide a continuous or semi-continuous treatment apparatus and a continuous or semi-continuous treatment method in each of which the supply system is used. <P>SOLUTION: The supply system is provided with: a solid-liquid mixture tank for storing the solid-liquid mixture; a highly-compressed gas supplying means for supplying a highly-compressed gas to the solid-liquid mixture tank; a supply line for supplying the solid-liquid mixture; and a valve unit arranged on the supply line and supplies the solid-liquid mixture of high pressure continuously or semi-continuously. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to a feeding apparatus capable of continuously or semi-continuously supplying a solid-liquid mixture, a continuous or semi-continuous processing apparatus using the same, and a continuous or semi-continuous processing method.

  In recent years, it has become an important problem to treat organic-containing objects such as pulp, waste plastic, livestock waste, and marine waste. These organic matter-containing objects to be processed often contain solid matter. As a method of hydrolyzing such an organic substance-containing workpiece, there are a case where a batch type processing apparatus is used and a case where a continuous processing apparatus is used.

  In the case of using a batch type processing apparatus, the solid matter contained in the object to be processed does not need to be pretreated such as pulverization, and can be decomposed (for example, see Patent Document 1). However, when a batch type processing apparatus is used, a large amount of processing cannot be performed at once.

  On the other hand, when a continuous reaction apparatus is used for an organic substance-containing treatment object including a solid substance, a large amount of the treatment object can be processed continuously. In this case, it is necessary to pulverize the solid material into a slurry. However, some solid materials are technically difficult to grind. Even if it can be crushed, it costs money. Further, even when the slurry is formed, the pulverized solid matter settles and separates in the liquid or floats and separates, so that there is a problem that a uniform slurry cannot be supplied to the processing apparatus. In order to solve such a problem, it has been proposed that a slurry supply device is provided with two plunger pumps and four forcing valves to control the driving of the plunger pump and the opening and closing of the forcing valve. (For example, refer to Patent Document 2).

  Furthermore, a Mono pump is usually used for feeding a liquid containing a slurry or solid matter having a high viscosity.

In recent years, attention has been focused on hydrothermal reaction treatment in which organic matter-containing materials such as pulp, waste plastic, livestock waste, and marine waste are reacted with water in the supercritical or subcritical state of water and decomposed. ing.
JP 2001-120987 A (Claims, paragraph 0012) Japanese Patent Laying-Open No. 2005-34808 (Claims, paragraph 0020)

  However, the apparatus described in Patent Document 2 has a problem that the apparatus configuration in the liquid feeding part of the slurry becomes complicated. Moreover, even if it is a small particle | grain, when a processed material contains a solid substance, there exists a problem that the plunger pump used with the apparatus of patent document 2 will be crushed immediately, and cannot be used.

  On the other hand, when using a MONO pump, the particle diameter must be 100 μm or less. For this reason, there exists a problem that it cannot be used when it is technically difficult to grind | pulverize or when the solid substance which requires a grinding | pulverization cost is included. In addition, the MONO pump has a problem that the discharge pressure is about 7 MPa at the maximum, and the solid matter cannot be completely transferred when it contains the solid matter.

  Furthermore, a pump is provided between the slurry supply device and the processing device in both cases where the slurry is fed using the apparatus described in Patent Document 2 or the slurry is fed using a mono pump. For this reason, when sending the slurry containing solid substance to a processing apparatus, this solid substance damages packing of a pump. That is, the packing must be frequently replaced.

  That is, the present invention has been made in view of the above problems, and its object is to have a simple structure, and even a solid-liquid mixture can be sent to a processing apparatus, and can withstand long-term continuous use. It is to provide a feeding device, a continuous or semi-continuous processing apparatus using the same, and a continuous or semi-continuous processing method.

  Another object of the present invention is to provide a continuous processing apparatus and a continuous processing method that further facilitate control of the processing speed.

  In order to achieve the above object, the supply device of the present invention comprises a solid-liquid mixture tank for storing a solid-liquid mixture, a high-compressed gas supply means for supplying high-compressed gas to the solid-liquid mixture tank, And a valve device provided in the supply path, and continuously or semi-continuously supplies the mixture at a high pressure.

  In the supply device of the present invention, first, the solid-liquid mixture is supplied by supplying the high-compressed gas into the solid-liquid mixture tank storing the solid-liquid mixture using the high-compressed gas supply means with the valve device closed. Pressurize inside the tank. In this state, the gas pushes down the surface of the solid-liquid mixture. Next, when the valve device is opened, the pressurized solid-liquid mixture is supplied to the processing device via the supply path. Thus, in the supply apparatus of this invention, even if it does not provide a pump between a solid-liquid mixture tank and a processing apparatus, a solid-liquid mixture can be supplied to a processing apparatus. In addition, since no special supply means is used for supplying the solid-liquid mixture, the apparatus configuration is simplified. Note that the supply of the high-compressed gas may be a semi-continuous supply that stops the supply of the high-compressed gas if the inside of the solid-liquid mixture tank reaches a constant pressure, or even after the supply of the solid-liquid mixture has started. The continuous supply may be performed so that a constant pressure can be maintained in the solid-liquid mixture tank. Moreover, in the supply apparatus of this invention, the solid-liquid mixture tank may be comprised by the 1 or 2 or more solid-liquid mixture tank. Moreover, the supply apparatus of this invention may be comprised from the several supply apparatus.

  Moreover, in this invention, liquid feeding of a solid-liquid mixture is performed by opening a valve apparatus in principle. As a result, even when a solid material that is technically difficult to pulverize is contained, the solid-liquid mixture is extruded with a highly compressed gas, so that the solid-liquid mixture can be sent to the processing apparatus. Furthermore, since no motor is used between the supply device and the processing device, the packing is not damaged even if solid matter is contained. As a result, a supply device that can withstand long-term continuous use can be provided.

  Moreover, in the supply apparatus of this invention, the supply path from which an internal diameter differs can be suitably selected and used according to the kind of solid-liquid mixture to supply. As a result, a continuous processing apparatus according to the type of the solid-liquid mixture can be provided. For example, even if the solid-liquid mixture contains a solid having a particle size of more than 5 mm, the solid-liquid mixture can be supplied to the processing apparatus. As a result, plastics, fish long bones, bones, and the like that are difficult to be slurried and contain solid matter that is not flexible can be supplied.

  In the present invention, continuous processing and semi-continuous processing are also included.

  The continuous or semi-continuous processing apparatus of the present invention includes a solid-liquid mixture tank for storing a solid-liquid mixture, a high-compressed gas supply means for supplying high-compressed gas to the solid-liquid mixture tank, and a supply for supplying the mixture. A supply device having a path, a processing device for processing the solid-liquid mixture continuously or semi-continuously, and a back pressure of the processing liquid discharged from the processing device connected to a discharge port side of the processing device. It may have a flow rate control device that controls and controls the supply speed of the solid-liquid mixture supplied to the processing device.

  In the supply device of the present invention, the solid-liquid mixture is supplied in a state where pressure is applied. For this reason, compared with the case where a pump is used, control of the supply rate of a solid-liquid mixture is not easy. Therefore, by providing the flow rate control device as in this configuration, the supply speed of the solid-liquid mixture can be easily controlled, and the processing speed in the processing apparatus can be controlled.

  In the supply device, the supply device includes two or more supply devices, and the supply of the solid-liquid mixture from one supply device and the solid-liquid mixture and the highly compressed gas to the other supply device. The supply may be performed in parallel.

  According to this configuration, continuous processing can be performed more efficiently.

  The supply device constituted by the two or more supply devices is configured such that when at least one supply device supplies a solid-liquid mixture, the other supply device is in a highly compressed gas supply process or a fluid delivery standby state. You may control opening and closing of an apparatus.

  Thus, the solid-liquid mixture can be smoothly supplied by controlling the opening and closing of the valve device.

  In the continuous or semi-continuous processing apparatus of the present invention, the flow rate control device only needs to control the back pressure so as to be smaller than the internal pressure of the solid-liquid mixture tank.

  According to this configuration, since the back pressure is smaller than the supply pressure of the solid-liquid mixture, the solid-liquid mixture and the processing liquid flow from the larger pressure to the smaller pressure. That is, the flow rate of the solid-liquid mixture and the processing liquid can be controlled by controlling the magnitude of the back pressure.

  As such a flow rate control device, for example, an inflow line into which the processing liquid from the processing apparatus flows, two or more connected tanks, an outflow line, and a back pressure adjusting valve provided on the outflow line are provided. In addition, at least the tank provided on the inflow line side is filled with a gas having a lower pressure than in the solid-liquid mixture tank, and the tank provided on the outflow line side is further filled with liquid. is there.

  In the continuous or semi-continuous processing apparatus of the present invention, the major axis of the solid contained in the solid-liquid mixture may be less than the inner diameter of the supply path.

  This is because if the major axis of the solid contained in the solid-liquid mixture is less than the inner diameter of the supply path, the solid can easily move through the supply path without blocking the supply path. For example, even in the case of a solid-liquid mixture containing wood chips having a diameter of 10 cm, the child liquid mixture can be supplied to the processing apparatus if the wood chips are less than the inner diameter of the supply path.

  The continuous or semi-continuous processing apparatus of the present invention includes a heating apparatus and / or a decompression apparatus connected to the processing apparatus, and the processing is performed continuously under any conditions of high temperature and high pressure, normal temperature and normal pressure, or normal temperature and high pressure. Alternatively, semi-continuous processing is possible. According to this configuration, the pressure and temperature in the processing apparatus can be adjusted according to the processing of the solid-liquid mixture supplied under pressure.

  In the continuous or semi-continuous processing apparatus of the present invention, the continuous processing may be performed by processing the solid-liquid mixture in a supercritical or subcritical state of water. Organic matter-containing materials such as pulp, waste plastic, livestock waste, and marine waste contain solids that are difficult to be slurried. When these are decomposed by a hydrothermal reaction using the continuous processing apparatus of the present invention, continuous or semi-continuous processing can be easily performed even if solids are contained.

  The continuous or semi-continuous processing method of the present invention includes a high-compressed gas supply step of continuously or semi-continuously supplying a high-compressed gas to a solid-liquid mixture tank that stores the solid-liquid mixture, And a supply step of supplying continuously or semi-continuously.

  The continuous or semi-continuous processing method of the present invention is a continuous or semi-continuous processing method for supplying a solid-liquid mixture to a processing device continuously or semi-continuously, and stores the solid-liquid mixture. A high-compressed gas supply step for continuously or semi-continuously supplying the high-compressed gas, a supply step for supplying the mixture to the processing device at a high pressure, and a flow rate control connected to the discharge port side of the processing device. And a flow rate control step of controlling the back pressure of the processing liquid discharged from the processing apparatus using the means to control the supply speed of the solid-liquid mixture supplied to the processing apparatus.

  In the continuous or semi-continuous treatment method, the continuous or semi-continuous treatment can be performed under any conditions of high temperature and high pressure, normal temperature and normal pressure, or normal temperature and high pressure.

  The continuous or semi-continuous processing method may be one in which a solid-liquid mixture is subjected to a hydrothermal reaction in a supercritical or subcritical state of water.

  In the continuous or semi-continuous processing method, the solid-liquid mixture is a food, livestock product, agricultural product, marine product, wood, natural organic matter, plastic, organochlorine compound, rubber, fiber, and wastes thereof, sewage treatment wastes. And wastewater treatment waste. In particular, it may be at least one selected from wood, plastic, fish iliac bone, bone, and animal remains.

  In the supply device of the present invention, the solid-liquid mixture in the pressurized supply section can be supplied at normal temperature using the force of gas pressure. As a result, the solid-liquid mixture can be supplied without using a special liquid feeding means. Moreover, the continuous or semi-continuous processing of a solid-liquid mixture becomes easy by connecting such a supply apparatus to a processing apparatus.

  Moreover, in the supply apparatus of this invention, a solid-liquid mixture is sent by controlling opening and closing of a valve apparatus. As a result, even if it contains a solid material that is technically difficult to grind, the solid-liquid mixture can be sent to the processing apparatus. Further, since no motor is used between the supply device and the processing device, the packing is not damaged even if solid matter is contained. As a result, a continuous or semi-continuous processing apparatus that can withstand long-term continuous use can be provided.

  The best mode for carrying out the present invention will be described below with reference to the drawings. In addition, this invention is not limited by these.

In the continuous or semi-continuous processing apparatus of the present invention, the supply apparatus of the present invention is connected to the processing apparatus. In the following description, the supply device is described as being connected to a continuous or semi-continuous processing device. However, the supply device of the present invention may be used alone without being connected to the continuous or semi-continuous processing device. Good.
[Embodiment 1-1]

  FIG. 1 is a block diagram showing a schematic configuration for explaining a state in which the supply apparatus of the present invention is connected to a processing apparatus. FIG. 2 is a block diagram showing an example of an embodiment of the supply device shown in FIG.

  As shown in FIG. 1, the continuous or semi-continuous processing apparatus 10 of the present invention includes a supply apparatus 12 and a processing apparatus 13. As shown in FIG. 2, the supply device 12 includes a solid-liquid mixture tank 20 that stores a solid-liquid mixture, a high-compressed gas supply unit 22 that supplies high-compressed gas to the solid-liquid mixture, and the solid-liquid mixture. Is supplied to the processing apparatus 13 at a high pressure, and a valve device 24 provided in the supply path 23 is included. Moreover, as shown in the example of this figure, the solid-liquid mixture tank 20 may include a mixing means 21 for mixing the solid-liquid mixture. The mixing means 21 may be a known mixing means such as mixing by a stirring blade or mixing by stirring ultrasonic wave. The solid-liquid mixture tank 20 is loaded into the solid-liquid mixture tank 20 from a solid-liquid mixture carry-in port (not shown).

  When the valve of the valve device 24 is closed, the solid-liquid mixture is stored in the solid-liquid mixture tank 20 at room temperature. The solid-liquid mixture is maintained in a substantially uniform dispersion state using the mixing means 21. In this state, the highly compressed gas is supplied from the highly compressed gas supply means 22 to the solid-liquid mixture tank 20. When the valve device 24 is opened after the inside of the solid-liquid mixture tank 20 is brought to a desired pressure with highly compressed gas, the pressurized solid-liquid mixture is supplied to the processing device 13 via the supply path 23. Since the solid-liquid mixture is supplied to the processing apparatus 13 by opening and closing the valve, any solid substance having a major axis smaller than the inner diameter of the supply path can be supplied to the processing apparatus. As a result, even if the solid-liquid mixture contains solid matter, problems such as damage to the packing of the pump do not occur.

  As the highly compressed gas supply means 22, known pressurizing means such as a compressor and a cylinder can be used. Examples of the compressed gas to be used include an inert gas such as an argon gas, a heated gas such as air, oxygen, nitrogen, or water vapor. These gases may be used alone, or two or more of these gases may be mixed and used.

  The high compressed gas is supplied by loading the high compressed gas supply means 22 and filling the tank with the high compressed gas until the upper limit of a pressure gauge (not shown) provided in the solid-liquid mixture tank is reached. Further, such a high compressed gas supply means 22 may control the pressure in the solid-liquid mixture tank 20 by adjusting the supply of the high compressed gas by providing a valve device or the like.

  The pressure to pressurize is not particularly limited as long as the solid-liquid mixture can be supplied to the processing apparatus and a pressure suitable for the processing conditions can be obtained in the processing apparatus. In general, the pressure can be 0.2 to 15 MPa, preferably 0.5 to 10 MPa higher than the processing pressure of the processing apparatus.

  The inside of the supply apparatus is usually pressurized to 0.2 MPa to 110 MPa, preferably 1 MPa to 100 MPa with the highly compressed gas.

  In FIG. 1, a heating unit or a cooling unit, a storage tank for storing a catalyst for promoting hydrolysis, and a pump for introducing the catalyst into the processing apparatus may be further included. Examples of the heating means include an electric heater, induction heating device, microwave, heating medium oil, heating with molten salt or steam, an oil bath, a salt bath, a sand bath, and the like. Moreover, you may provide the preheating apparatus which preheats a solid-liquid mixture between a supply apparatus and a processing apparatus. For example, a connector is provided in the supply path, and the solid-liquid mixture and heated water are mixed. Moreover, you may include the decompression device which decompresses the inside of a processing apparatus. If the apparatus of this invention is used, a continuous process can be performed on any conditions of high temperature high pressure, normal temperature normal pressure, or normal temperature high pressure by including a heating means, a cooling means, and a decompression device.

  In FIG. 1, reference numeral 13 denotes a processing apparatus. The processing apparatus that can be used is not particularly limited as long as it is a processing apparatus used for continuously processing a solid-liquid mixture. For example, the solid-liquid mixture may be processed in a supercritical or subcritical state of water, or may be processed under conditions other than the supercritical or subcritical state of water. For example, heat treatment such as sterilization may be performed. What is necessary is just to adjust the temperature and pressure in a reaction apparatus suitably in the conditions of the target process.

  For example, when a solid-liquid mixture is reacted in the supercritical or subcritical state of water, the temperature and pressure in the processing apparatus may be set to the temperature and pressure in the supercritical or subcritical state of water. Here, the supercritical state of water means that the temperature and pressure are in a state of a critical point (374 ° C., 22 MPa) or higher, and the subcritical state of water is a temperature of 115 ° C. or higher and 374 ° C. or lower. A state showing a pressure obtained from a saturated vapor pressure curve corresponding to a certain temperature or a pressure higher than that.

The processed product processed using the continuous processing apparatus of the present invention can be recovered from the processed product, for example. This processed product is a mixture containing any one of an aqueous phase, an oil phase, and a solid phase. These phases can be separated by natural separation, centrifugation or the like. The type of the processed product obtained varies depending on the processing method, temperature, pressure, processing time, or type of the processing object.
[Embodiment 1-2]

In the example of FIG. 2, the number of the solid-liquid mixture tank 20 constituting the supply device is one. For example, as shown in FIG. 3, two or more solid-liquid mixture tanks 20a, 20b,. It may be what you did. In this way, when two or more solid-liquid mixture tanks 20a, 20b,... 20n are connected in parallel, each solid-liquid mixture tank can be connected to any number of solid-liquid mixtures using a connecting means such as a joint. The tanks should be connectable. If an arbitrary number of tanks can be connected, the number of solid-liquid mixture tanks to be used can be adjusted according to the amount of the solid-liquid mixture to be processed.
[Embodiment 1-3]

  In this embodiment, two or more supply devices are connected in series to the processing device.

  FIG. 4 is a diagram illustrating a supply device according to another embodiment of the present invention. As shown in FIG. 4, in the present embodiment, two or more of the supply devices 12a, 12b,... Are connected by supply paths 23a, 23b,. Are joined to one supply path and connected to the processing apparatus. Also in this example, valve devices 24a, 24b,... Are provided in the supply passages 23a, 23b,.

  In the example of this figure, since the plurality of high compressed gas supply means 22a, 22b,... And the solid-liquid mixture tanks 20a, 20b,. As a result, there are few restrictions on the material and thickness of the tank, and handling becomes easy. .. And the solid-liquid mixture tanks 20a, 20b,... Are preferably connected so that one tank corresponds to one high compressed gas supply means. However, it is not always necessary to have a one-to-one correspondence.

  The high compressed gas is supplied until the high pressure gas supply means 22a, 22b,... Are loaded and the upper limit of the pressure gauge provided in each solid-liquid mixture tank 20a, 20b,. Is carried out by filling the tanks 20a, 20b,. Moreover, you may provide the control apparatus which controls the load / unload of several high compression gas supply means 22a, 22b, ....

The solid-liquid mixture is supplied to the processing apparatus as follows. First, the valve device 24a provided in the supply path connected to the first solid-liquid mixture tank 20a is opened, and the solid-liquid mixture stored in the first solid-liquid mixture tank 20a is moved to the processing device 13. . At this time, the other solid-liquid mixture tank 20b,... Is in a highly compressed gas supply process or a fluid delivery standby state during filling of the solid-liquid mixture. When the first solid-liquid mixture tank 20a becomes empty, the valve device 24a provided in the supply path 23a connected to the first solid-liquid mixture tank 20a is closed. Next, the valve device 24b provided in the supply path 23b connected to the second solid-liquid mixture tank 20b is opened, and the solid-liquid mixture stored in the second solid-liquid mixture tank 20b is transferred to the processing device 13. Move. During this time, the first solid-liquid mixture tank 20a stores the solid-liquid mixture and supplies a highly compressed gas. When this operation is repeated in order, the solid-liquid mixture can be continuously supplied to perform continuous processing. Although an example in which two supply devices are used has been described here, the same operation may be performed even if three or more supply devices are used. If it comprises three or more supply devices, storage of the solid-liquid mixture, supply of highly compressed gas, and fluid delivery can be performed more smoothly.
[Embodiment 1-4]

  FIG. 5 is a diagram illustrating a supply device according to another embodiment of the present invention. As shown in FIG. 5, in the present embodiment, two or more supply devices 12 a, 12 b,. In this example, each of the supply devices 12a, 12b,... Is connected to the processing device by supply passages 23a, 23b,..., And each supply passage 23a, 23b,. Devices 24a, 24b,... Are provided. Further, the supply paths 23a, 23b,... Are directly connected to the processing apparatus.

This configuration also functions in the same manner as in Embodiment 2-1. By changing the number of supply devices connected to the treatment device, the number of tanks to be used can be adjusted according to the amount of the solid-liquid mixture to be processed.
[Embodiment 1-5]

  FIG. 6 is a diagram illustrating a supply device according to another embodiment of the present invention. The present embodiment is a modification of the embodiment 1-3. As shown in FIG. 6, in this Embodiment, it is comprised by the two or more said supply apparatuses 12a, 12b, .... In the example of this figure, two or more supply devices 12a, 12b,... Are connected by supply paths 23a, 23b,..., And each supply path 23a, 23b,. It joins the supply path and is connected to the processing device. Also in this example, valve devices 24a, 24b,... Are provided in the supply passages 23a, 23b,.

Between the highly compressed gas supply means 22 and the solid-liquid mixture tanks 20a, 20b,..., A joint portion and a valve device are provided. The high compressed gas is supplied by loading the common high compressed gas supply means 22 and opening and closing the valve devices provided in the respective tanks 20a, 20b,. This is done by filling the tanks 20a, 20b,. The number of tanks connected to the joint portion can be arbitrarily changed. Thus, the number of tanks to be used can be adjusted according to the amount of the solid-liquid mixture to be processed by arbitrarily changing the number of tanks connected to the joint portion.
[Embodiment 2]

  FIG. 7 is a block diagram showing a schematic configuration of the continuous or semi-continuous processing apparatus of the present invention. FIG. 8 is a block diagram showing an example of the embodiment shown in FIG.

  As shown in FIG. 7, the continuous or semi-continuous processing apparatus 10 of the present invention includes a supply device 12, a processing device 13, and a flow rate adjusting device 14. The supply device and the processing device are the same as in Embodiments 1-1 to 1-5. As shown in FIG. 7, the flow rate adjusting device 14 includes an inflow line 30 into which the processing liquid flows from the processing apparatus 13, two tanks 31 and 32, and an outflow line 33 through which the liquid flowing out from the tank 32 flows. And a back pressure regulating valve 34 provided in the outflow line. A pressure gauge (not shown) may be provided in the vicinity of the back pressure adjustment valve.

  Of the two tanks, the tank 31 on the inflow line 30 side is filled with a gas having a pressure (P2 MPa) smaller than the pressure (P1 MPa) of the high-pressure gas in the solid-liquid mixture tank 20. Liquid and gas are sealed in the tank 32 on the outflow line side. When the back pressure regulating valve 34 is opened, the processing liquid pushed out at the pressure of P1 MPa flows through the inflow line 30 into the tank 31 maintained at the pressure of P2 MPa. Therefore, at this time, if the back pressure at the time of the outflow of the liquid is adjusted using the back pressure adjusting valve 34, the speed at which the processing liquid flows into the tank 31 (the discharging speed from the processing apparatus) can be adjusted. In particular, when the treatment liquid contains a solid substance, when a back pressure valve conventionally used in the treatment apparatus is used, the solid substance damages the inside of the valve, so that it is not suitable for use in adjusting the treatment speed. On the other hand, in the configuration of the present embodiment, the liquid that does not contain solid matter passes through the back pressure valve. As a result, even if large particles are present in the processing liquid, the processing speed in the continuous or semi-continuous processing apparatus can be adjusted using the current back pressure valve. This simultaneously controls the supply rate of the solid-liquid mixture supplied to the processing apparatus.

  The liquid to be used should just be an optimal liquid with respect to a process raw material and the reaction material after a process. For example, in the case of a hydrothermal reaction, it is preferable to use water as the liquid.

  When the processing liquid (volume: V1) flows into the tank 31 from the processing apparatus, the liquid (volume: V2) flows out from the tank 32 through the outflow line 33. That is, the relationship V1 = V2 is established. Therefore, by measuring the liquid outflow amount (V2), the amount of the processing liquid accumulated in the tank 31 can be determined. As a result, the amount of the treated solid-liquid mixture and the degree of progress of the treatment are known.

  Furthermore, it is preferable to use a flow rate adjusting valve and a pressure adjusting valve in combination as the back pressure adjusting valve. According to this configuration, the processing speed in the continuous or semi-continuous processing apparatus can be adjusted using the flow rate adjustment valve, and the processing pressure in the continuous or semi-continuous processing apparatus can be adjusted using the pressure adjustment valve. Therefore, processing can be performed under more strict processing conditions.

  In the example of FIG. 8, there are two tanks. The number of tanks is not particularly limited and may be two or more. When the amount of the solid-liquid mixture is large, it is possible to increase the number of tanks into which the processing liquid provided on the inflow line side flows. Each tank may be connected to any number of tanks using a joint or the like. If an arbitrary number of tanks can be connected, the number of tanks to be used can be adjusted according to the amount of processing liquid flowing in.

  Moreover, in the supply apparatus used for this Embodiment, the valve apparatus 24 provided in the supply apparatus is not necessarily required. This is because the inside of the solid-liquid mixture tank can be pressurized if the back pressure regulating valve 34 is closed before the processing is started and a highly compressed gas is supplied to the solid-liquid mixture tank. In this case, the solid-liquid mixture gradually moves to the processing apparatus side.

FIG. 1 is a block diagram showing a schematic configuration for explaining a state in which the supply apparatus of the present invention is connected to a processing apparatus. FIG. 2 is a block diagram showing an example of an embodiment of the supply device shown in FIG. FIG. 3 is a diagram illustrating a supply device according to another embodiment of the present invention. FIG. 4 is a diagram illustrating a supply device according to another embodiment of the present invention. FIG. 5 is a diagram illustrating a supply device according to another embodiment of the present invention. FIG. 6 is a diagram illustrating a supply device according to another embodiment of the present invention. FIG. 7 is a block diagram showing a schematic configuration of another continuous processing apparatus of the present invention. FIG. 8 is a block diagram showing an example of the embodiment shown in FIG.

Explanation of symbols

DESCRIPTION OF SYMBOLS 10 Continuous or semi-continuous processing apparatus 12 Supply apparatus 13 Processing apparatus 14 Flow velocity adjustment apparatus 20 Solid-liquid mixture tank 21 Mixing means 22 High compression gas supply means 23 Supply path 24 Valve apparatus 30 Inflow line 31, 32 Tank 33 Outflow tank 34 Back pressure tuning valve

Claims (14)

A solid-liquid mixture tank for storing the solid-liquid mixture;
A highly compressed gas supply means for supplying a highly compressed gas to the solid-liquid mixture tank;
A supply path for supplying the mixture;
A valve device provided in the supply path,
A supply device for supplying the mixture continuously or semi-continuously at high pressure. A supply device having a solid-liquid mixture tank for storing the solid-liquid mixture, a high-compressed gas supply means for supplying high-compressed gas to the solid-liquid mixture tank, and a supply path for supplying the mixture;
A processing apparatus for continuously or semi-continuously processing the solid-liquid mixture;
A flow rate controller connected to the discharge port side of the processing apparatus and controlling the back pressure of the processing liquid discharged from the processing apparatus to control the supply speed of the solid-liquid mixture supplied to the processing apparatus, or Semi-continuous processing equipment. A supply device used in the supply device according to claim 1 or the continuous or semi-continuous processing device according to claim 2,
The supply device is composed of two or more supply devices,
The supply apparatus which performs supply of the solid-liquid mixture from one supply apparatus, and supply of the solid-liquid mixture and highly compressed gas to another supply apparatus in parallel. The supply device according to claim 3,
A supply device that controls opening and closing of the valve device so that when at least one supply device supplies a solid-liquid mixture, the other supply device enters a high-compression gas supply process or a fluid delivery standby state. A continuous or semi-continuous processing apparatus according to claim 2,
The flow rate control device is a continuous or semi-continuous processing device that controls the back pressure to be smaller than the pressure in the solid-liquid mixture tank. The continuous or semi-continuous processing apparatus according to claim 5,
The flow rate control device includes an inflow line into which a processing liquid from the processing apparatus flows, two or more connected tanks, an outflow line, and a back pressure adjusting valve provided on the outflow line,
At least the tank connected to the inflow line side is filled with a gas having a pressure lower than that in the solid-liquid mixture tank,
A continuous or semi-continuous processing apparatus in which a liquid connected to the tank connected to the outflow line side is further sealed. A supply device used in the supply device according to claim 1 or the continuous or semi-continuous processing device according to any one of claims 2 to 6,
The supply apparatus whose major axis of the solid contained in a solid-liquid mixture is less than the internal diameter of the said supply path. A continuous or semi-continuous processing apparatus according to any one of claims 2 to 7,
The continuous processing device includes a heating device and / or a decompression device connected to the processing device,
The treatment is a continuous treatment apparatus capable of continuous or semi-continuous treatment under any conditions of high temperature and high pressure, normal temperature and normal pressure, or normal temperature and high pressure. A continuous or semi-continuous processing apparatus according to any one of claims 2 to 7,
The continuous or semi-continuous processing is a continuous processing apparatus for processing an organic substance-containing workpiece in a supercritical or subcritical state of water. A continuous or semi-continuous processing method in which a solid-liquid mixture is fed continuously or semi-continuously,
A highly compressed gas supply step of continuously or semi-continuously supplying the highly compressed gas to the solid-liquid mixture tank storing the solid-liquid mixture;
A supply step including supplying the solid-liquid mixture continuously or semi-continuously at high pressure. A continuous or semi-continuous processing method in which a solid-liquid mixture is fed continuously or semi-continuously to a processing apparatus,
A highly compressed gas supply step of continuously or semi-continuously supplying the highly compressed gas to the solid-liquid mixture tank storing the solid-liquid mixture;
A supplying step of supplying the mixture to the processing apparatus at a high pressure;
A flow rate for controlling the supply pressure of the solid-liquid mixture supplied to the processing apparatus by controlling the back pressure of the processing liquid discharged from the processing apparatus using the flow rate control means connected to the discharge port side of the processing apparatus. A continuous or semi-continuous processing method including a control step. A continuous or semi-continuous processing method according to claim 11,
The continuous processing apparatus is capable of performing the continuous or semi-continuous processing under any conditions of high temperature and pressure, normal temperature and normal pressure, or normal temperature and pressure. The continuous or semi-continuous processing method according to claim 11,
The continuous treatment is a continuous treatment method in which a solid-liquid mixture is subjected to a hydrothermal reaction in a supercritical or subcritical state of water. It is a continuous processing method of Claim 13, Comprising:
Examples of the solid-liquid mixture include foods, livestock products, agricultural products, marine products, wood, natural organic matter, plastics, organochlorine compounds, rubber, fibers, and wastes thereof, sewage treatment wastes, wastewater treatment wastes. In particular, a continuous processing method which is at least one selected from wood, plastic, fish iliac bones, bones and animal bodies.

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