JP2007021045A - Aberration compensation device, optical device, and observation device for ocular fundus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an aberration compensation device which enables calibration of a Zernike voltage template in accordance with the working environment and the manufacturing error of an individual deformable mirror. <P>SOLUTION: The aberration compensation device is equipped with the deformable mirror which has the a reflection face generating distortion by an electrostatic voltage applied to a plurality of electrode parts, measures the voltage applied to each electrode part when a desired shape of the reflection face is formed by detecting reflection from the reflection face, takes the applied voltage to each electrode part corresponding to the reference shape of the reflection face as one set to store the prescribed number of sets corresponding to the prescribed number of the different shapes of the reflection face in advance, and deforms the reflection face into the desired shape by superposing the stored sets of the electrode part and the applied voltage. The aberration compensation device is equipped with an offset computing means which compares a stored detecting signal to the detecting signal actually detected to output the desired detecting signal by offsetting the stored detecting signal based on humidity and the condition of the use environment such as the manufacturing error. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to an aberration correction apparatus, an optical apparatus, and a fundus oculi observation apparatus that use a deformable mirror for correcting aberration of light irradiated to a subject.

  In a conventional optical apparatus, a deformable mirror (hereinafter abbreviated as a deformable mirror) is used to correct optical distortion of light irradiated on a subject (see, for example, Patent Document 1 and Patent Document 2).

  In a fundus oculi observation device or the like, the reflected light from the fundus includes aberrations because the eye optical system is incomplete, and a clear fundus image cannot be obtained. This optical distortion can be corrected by a deformable mirror (see, for example, Patent Document 3). This fundus oculi observation device irradiates a subject's eye (referred to as the subject's eye) with a light beam emitted from a photographing light source, and guides the reflected light beam reflected on the fundus as a photographing light to a recording means to cause the fundus of the subject's eye. An apparatus for recording an image.

  In general, as shown in FIGS. 6 and 7, the deformable mirror 300 is arranged in an indoor atmosphere (air), a thin film mirror (membrane) 301 stretched around a frame 302, and a predetermined thickness on the thin film mirror 301. The thin film mirror 301 is a flexible film body having a light reflecting surface as a surface, and the electrode 305 is a substrate formed of a flat substrate. A plurality (5 in this example, 305-1 to 305-5) are arranged on the upper surface of 304. In this example, a power source 306 capable of applying predetermined voltages V1 to V5 is connected to each of the electrodes 305-1 to 305-5. By applying a predetermined voltage to each electrode 305, the applied voltage V and the thin film mirror electrode are applied. The thin film mirror 301 at a portion facing the electrode 305 is pulled by an electrostatic force corresponding to the distance, and is deformed so as to generate a desired distortion. In the figure, reference numeral 307 denotes an interval holding member that holds an interval between the thin film mirror 301 and the substrate 304. As shown in FIG. 7, the deformable mirror 300 is deformed into a desired shape when predetermined voltages V1 to V5 are applied to the electrodes 305-1 to 305-5.

  In addition, as shown in Non-Patent Document 1, the reflective surface includes a plurality of electrode portions and a thin film-like reflective surface that is disposed to face these electrodes and generates distortion due to an electrostatic voltage applied to the electrode portions. In the deformation method of the deformable mirror for correcting the wavefront distortion of the light beam, the reflected light of the reflecting surface is detected, and the voltage applied to each electrode part when forming the desired reflecting surface shape is measured. The voltage applied to each electrode portion corresponding to the reflecting surface shape is set as one set, a predetermined number of sets corresponding to a predetermined different number of reflecting surface shapes is stored, and the stored electrode portion and applied voltage are stored. A deformation method of a deformable mirror that deforms a reflecting surface into a desired shape by superimposing a pair, an optical device using the method, a fundus observation device, and the like are known.

JP 2004-247947 A JP-A-9-152505 JP-A-11-137522 “Compensation of model eye ’s aberration by using deformable mirror”, Proceedings of SPIE, MEMS / MOEMSComponents and Their Applications II, Volume5717, p.219-229,2005

  By the way, in the conventional deformable mirror described above, individual differences occur in the mirror surface shape and deformation characteristics due to the manufacturing / assembly and the residual stress of the SOI wafer as the mirror material. Moreover, a difference occurs in the deformation performance of the mirror due to an assembly adjustment error of the entire apparatus including the deformable mirror. In addition, changes in the driving environment such as humidity, temperature, and atmospheric pressure of the atmosphere in which the deformable mirror is disposed change the surface shape and deformation characteristics of the mirror. Therefore, the voltage applied to each electrode part when forming a desired reflecting surface shape is measured, and the applied voltage to each electrode part corresponding to the reflecting surface shape serving as a reference is set as one set, and a predetermined different number Even if a predetermined number of sets corresponding to the shape of the reflecting surface of the mirror is stored and the method of superimposing the set of the stored electrode portion and the applied voltage is used, the surface shape and deformation characteristics of the mirror are changed. Therefore, even if the mirror is deformed based on the initial stored value, the mirror shape does not become a desired shape, and one component of the output signal is mixed with another component.

  For example, when correcting aberrations with a fundus oculi observation device or the like, the mirror shape deformed using the voltage template for each Zernike order shape does not become a desired shape, and other components are formed into a single Zernike order shape. Will be a mixed shape. When aberration correction is performed using such a Zernike voltage template, the aberration cannot be completely corrected.

  Therefore, in the present invention, in an aberration correction apparatus that includes a deformable mirror and is used in an optical apparatus such as a fundus oculi observation apparatus, a voltage template (a table for voltage correction) for each Zernike order shape is used and It is an object to calibrate according to manufacturing errors of individual deformable mirrors and to use a Zernike voltage template suitable for aberration correction.

  The invention of claim 1 includes a plurality of electrode portions, and a thin film-like reflecting surface that is arranged to face these electrodes and that is distorted by an electrostatic voltage applied to the electrode portions, and is deformed into a predetermined shape. A variable shape mirror that corrects wavefront distortion of the light beam on the reflection surface and a predetermined voltage corresponding to a predetermined different number of reflection surface shapes, with one set of voltages applied to the electrode portions corresponding to the reference reflection surface shape. A storage unit that stores the number of sets, an aberration detection unit that detects aberration of light from the object reflected by the deformable mirror, and each of the reflection surface shapes corresponding to one reference stored in the storage unit An aberration correction apparatus comprising: an arithmetic unit that corrects a predetermined number of sets corresponding to a predetermined different number of reflecting surface shapes, with a voltage applied to the electrode unit as one set.

The invention of claim 2 is provided with a plurality of electrode portions and a thin-film-like reflecting surface that is disposed to face these electrodes and that is distorted by an electrostatic voltage applied to the electrode portions, and is deformed into a predetermined shape. A deformable mirror that corrects the wavefront distortion of the light flux on the reflecting surface; and
A storage unit storing a predetermined number of sets corresponding to a predetermined different number of reflecting surface shapes, with a voltage applied to each electrode unit corresponding to a reference reflecting surface shape as one set, and a variable shape mirror The aberration detection unit for detecting the aberration of light from the reflected object, the detection signal stored in the storage unit in advance, and the detection signal actually detected thereafter are compared, and the stored detection signal is individually An aberration correction apparatus comprising correction value calculation means for calculating a correction value for obtaining a desired detection signal by correction based on the actual use conditions.

  According to a third aspect of the present invention, in the aberration correction apparatus according to the first or second aspect, the actual use condition of the individual includes an individual production error condition, an assembly adjustment error of the entire apparatus including the deformable mirror, and a use atmosphere. It is characterized in that it is at least one of use conditions including humidity, temperature, and atmospheric pressure.

According to a fourth aspect of the present invention, in the aberration correction apparatus of the optical device according to the first or second aspect, the reference reflecting surface shape of the reflecting surface is provided corresponding to an element of a predetermined dimension of the Zernike polynomial. .

  According to a fifth aspect of the present invention, there is provided an optical apparatus comprising the aberration correction apparatus according to any one of the first to fourth aspects.

  A sixth aspect of the present invention is a fundus oculi observation device comprising the aberration correction device according to any one of the first to fourth aspects.

  According to the present invention, in the aberration correction apparatus, individual differences occur in the mirror surface shape and deformation characteristics due to the stress of the SOI wafer, which is a mirror material, during manufacturing and assembly of the deformable mirror, humidity, temperature, Even if changes in the surface shape and deformation characteristics of the mirror occur due to changes in the driving environment such as atmospheric pressure, the effects of individual differences in the deformable mirror can be eliminated, and the deformable mirror is included. The effects of assembly adjustment errors of the entire device on the deformation performance of the mirror can be eliminated, and the desired mirror deformation can be realized without being affected by environmental changes such as humidity, temperature, and atmospheric pressure, and the deformable mirror can be evacuated. It can be manufactured at low cost without sealing.

  In addition, in an optical device such as a fundus oculi observation device, a voltage template (a table for voltage correction) for each Zernike order is calibrated (corrected) according to the use environment and each deformable mirror, and aberration correction is performed. A Zernike voltage template suitable for can be used, and accurate aberration correction can be obtained.

  Embodiments of the fundus oculi observation device according to the present invention will be described below. FIG. 1 is a cross-sectional view showing an example of a fundus oculi observation device to which a deformation method for a deformable mirror according to an embodiment is applied. FIG. 2 is another view of the fundus observation device to which the deformation method for a deformable mirror according to the embodiment is applied. FIG. 3 is a flowchart showing a voltage template calibration method in the fundus oculi observation device according to the embodiment, and FIG. 4 is a diagram showing a voltage template (a table for voltage correction) together with the shape of each Zernike order. FIG. 5 is a diagram illustrating an example in which the measured Zernike coefficient value is corrected (calibrated) to the target Zernike coefficient value.

  In this example, the deformable mirror has the same structure as that shown in FIG. 6 as a conventional example. In other words, the deformable mirror 10 is arranged with a thin film mirror formed by forming an aluminum reflective film on a flexible Si thin film obtained by etching an SOI wafer, and a spacer between the thin film mirror and a predetermined interval. And a substrate disposed on the substrate. In this example, the electrode is configured by arranging 85 electrode members.

  In this example, the same power source (not shown) as in the conventional example is connected to each electrode member, and by applying a predetermined voltage to each electrode member, the static voltage corresponding to the applied voltage V and the distance between the thin film mirror electrodes is applied. The thin film mirror at the portion facing each electrode member is pulled by electric power and deformed so that a desired distortion is generated. Note that an arbitrary voltage can be applied to each electrode member of the power source.

  This deformable mirror is made of, for example, the following materials. The thin film mirror is manufactured by processing an SOI wafer having a thickness of about 0.5 mm by etching. The thin film mirror preferably has a thickness of about several μm, and aluminum (Al), gold (Au), or the like is deposited on the upper surface to form a reflection portion. In this example, the thin film mirror is electrically grounded. The substrate can be formed by adhering a thin metal plate such as glass, glass epoxy, Si, and gold (Au), and the electrode member can be formed by vapor deposition of Au or the like.

  Next, a fundus oculi observation device using the deformable mirror according to the present case will be described. A fundus oculi observation device according to this example is shown in FIG. The fundus oculi observation device 100 is an adaptive optics system including a deformable mirror 10 and an aberration measurement device. The optical system of the fundus oculi observation device according to this example includes a deformable mirror 10, a Shack-Hartmann wavefront sensor 20 that is an aberration measurement device that measures aberration generated in an eye optical system such as a crystalline lens or cornea, and a beam propagation optical system 30. Become.

  When observing the fundus of the human eye with such an apparatus, the aberration of the eye deteriorates the fundus image. Therefore, by correcting the aberration with the deformable mirror 10, a good fundus image is obtained. In such an apparatus, in this example, the voltage template (table for voltage correction) for each Zernike order is calibrated (corrected) according to the usage environment and the individual deformable mirrors. The aberration-free model eye 40 is used at the position where the human eye comes. That is, the aberration-free model eye 40 is attached only during calibration. The beam propagation optical system 30 includes beam splitters 31 and 34, a movable prism 32, a dichroic mirror 33, a laser diode 35 (wavelength λ2) for fundus illumination, a high-sensitivity CCD 36 for fundus photography, and a Shack-Hartmann wavefront sensor 20 for aberration measurement. A super luminescent diode (SLD) 37 (wavelength λ1) is provided as a light source. The dichroic mirror 33 separates the light from the laser diode 35 (wavelength λ2) and the light from the super luminescent diode (SLD) 37 (wavelength λ1).

  In this example, the fundus oculi observation device 100 includes a driver 52 that drives the deformable mirror 10. In this example, an arithmetic control unit 51 (PC) that receives a signal from the Shack-Hartmann wavefront sensor 20 and controls a driver 52 of the deformable mirror 10 and a movable prism 32 described later is provided.

  In such a fundus oculi observation device 100, the defocus amount is automatically corrected by adjusting the optical path length using the movable prism 32. In this example, the effective diameter of the deformable mirror 10 is 7.5 mm. The incident angle of the deformable mirror 10 is 15 degrees.

  The Shack-Hartmann wavefront sensor 20 is known and includes a Hartmann plate 21 (that is, a microlens array) and a CCD 22. The CCD 22 is disposed at the focal position of the microlens. The deformable mirror 10 and the Hartmann plate 21 are optically conjugate positions. An SLD 37 having a wavelength of 840 nm is used as a light source of the Shack-Hartmann wavefront sensor 20 in order to avoid unnecessary interference noise. The super luminescent diode 37, the fundus of the model eye 40, and the CCD 22 are in a conjugate position.

  The light (wavelength λ 1) from the super luminescent diode 37 passes through the model eye 40 through the beam splitter 34, some lenses (not shown), the dichroic mirror 33, the deformable mirror 10, and the beam splitter 31. Illuminate.

Reflected light from the fundus of the model eye 40 returns in the reverse direction along this optical path and is applied to the Shack-Hartmann wavefront sensor 20. The Shack-Hartmann wavefront sensor 20 outputs wavefront information to the calculation control unit 51. Based on this wavefront information, the arithmetic control unit 51 outputs a control signal for the deformable mirror to deform the deformable mirror 10.

  FIG. 2 shows a voltage template (a table for voltage correction) for each Zernike order, with the same function in the apparatus without attaching / detaching the aberration-free model eye for each template calibration as shown in FIG. The fundus oculi observation device 200 is calibrated (corrected) according to the use environment and individual deformable mirrors. The optical system of this example is obtained by adding a fixed mirror 61, a moving mirror 62, and a lens 63 to the optical system of the fundus oculi observation device 100.

The moving mirror 62 is removed from the optical path during fundus observation, and placed in the optical path during voltage template calibration. The movement of the mirror is controlled by the calculation control unit 51. A lens 63 is disposed in the optical path toward the fixed mirror 61, and this lens is for inverting the image toward the Shack-Hartmann wavefront sensor 20. Thereby, the same relationship as the fundus image at the time of fundus observation is satisfied. The lens 63 and the fixed mirror 61 are equivalent to an aberration model eye.
The lens 63, the deformable mirror 10, and the Hartmann plate 21 of the Shack-Hartmann wavefront sensor 20 are arranged at optically conjugate positions.

Next, a procedure for deforming the deformable mirror in the fundus oculi observation device according to this example will be described. In this example, the voltage template (table for voltage correction) for each Zernike order shape is calibrated (modified) according to the operating environment and manufacturing errors of each deformable mirror, etc., and suitable for aberration correction The Zernike voltage template is used. FIG. 3 is a flowchart showing a voltage template calibration method in the fundus oculi observation device according to the embodiment.
The aberration is expanded by the Zernike polynomial and expressed by the following equation.
Total aberration = Σz _ij × Z (i, j)
Here, Z (i, j) represents each Zernike order, and z _ij represents its coefficient.
An ideal voltage template of a certain order Z (i, j) is a variable shape mirror so that the coefficient of Z (i, j) is a certain value z _ij and all other Zernike order coefficients are zero. This is the voltage arrangement applied to the.

In this example, the correction value calculation means performs calibration according to the following procedure. It is a precondition that all Zernike order templates are stored in the storage unit of the arithmetic control unit PC as initial values.
First, in the fundus oculi observation device 100 shown in FIG. 1 or the fundus oculi observation device 200 shown in FIG. 2, measurement of the aberration to be referred (reference) is started (S1 in FIG. 3). This is a measurement of the initial shape of the deformable mirror 10 and the aberration generated in the beam propagation optical system 30. Next, the voltage template (table for voltage correction) for the shape of the Zernike order stored in the storage unit of the calculation control unit PC in advance is read from the storage unit of the calculation control unit PC, and the electrode unit of the variable shape mirror Each voltage is applied to 1 to 85 to deform the deformable mirror (S2).

  Then, the aberration at this time is measured (S3), and the coefficient of each Zernike order is calculated (S4). Here, the reference aberration first measured is subtracted from the newly measured aberration. Then, the movable prism is moved to correct the optical path length (S5).

  Next, the voltage arrangement of the electrode portions 1 to 85 is calculated from the voltage template (table for voltage correction) (S6). And each voltage is applied to the electrode parts 1-85 of a deformable mirror, and a deformable mirror is deformed (S7). The aberration at this time is measured (S8), and the coefficient of each Zernike order is calculated (S9). Again, the first measured reference aberration is subtracted from the newly measured aberration. Then, the movable prism is moved to correct the optical path length (S10).

  Then, it is compared whether or not it matches the shape of the target Zernike order (S11), and the processing from S6 to S10 is performed until it substantially matches the shape of the target Zernike order. Further, this is performed for all Zernike orders Z (i, j).

At this time, when calculating the voltage array to be applied to each electrode of the deformable mirror, an operation represented by the following equation is performed.
V _n = sqrt (Σ (z _ij / z _0ij * V _ij ² ) + V _n-1 ² )
here,
z _ij = z _m -z _target
V _n : n-th correction applied voltage z _ij : Zernike coefficient value to be corrected z _m : measured Zernike coefficient value z _target : target Zernike coefficient value z _0ij : coefficient value in Zernike voltage template V _ij : template voltage

This is all calculated for electrode numbers 1 to 85, and the voltage array applied to each electrode is obtained.
Although explanation is omitted in this mathematical expression, it is necessary to consider the polarity of the coefficient of the order other than the Zernike order of the template to be calibrated (that is, an unnecessary order here). For example, as a result of the aberration measurement, if the coefficient of the unnecessary Zernike order is negative, it is supplemented that it is necessary to use a template having the same order and a positive coefficient (FIG. 4 has positive and negative templates). See).

In this way, the difference between the measured Zernike coefficient value z _m and the target Zernike coefficient value z _target is obtained to obtain the Zernike coefficient value z _ij to be _corrected, and the ratio with the coefficient value z _0ij in the Zernike voltage template is determined. A new template voltage value can be determined by multiplying the square value of the voltage V _ij and calculating the sum.

  An example in which the measured Zernike coefficient value is corrected (calibrated) to the target Zernike coefficient value will be described using the template graph shown in FIG.

As shown in FIG. 5A (the graph on the left side of the drawing), when the target is a template of Zernike degree Z (3, 1) and the coefficient is −0.4 μm,
Measurement Zernike order values are -0.4 μm for Z (2, −2), +0.2 μm for Z (2,2), +0.02 μm for Z (3, −3), +0 for Z (3, −1) .02 μm, −0.45 μm for Z (3,1), +0.01 μm for Z (3,3), +0.03 μm for Z (4,4), +0.02 μm for Z (4, −2), Z (4,0) indicates +0.02 μm, Z (4,2) indicates 0 μm, and Z (4,4) indicates −0.02 μm.

  By performing the above correction, the corrected (calibrated) voltage template has a Zernike coefficient value of −0.05 μm for Z (2, −2), +0.05 μm for Z (2,2), Z (3, -3) is +0.01 μm, Z (3, -1) is +0.01 μm, Z (3,1) is −0.35 μm, Z (3,3) is +0.02 μm, Z (4 4) −0.02 μm, Z (4, −2) +0.01 μm, Z (4,0) +0.01 μm, Z (4,2) +0.02 μm, Z (4,4) 0 μm And corrected (calibrated) to the target Zernike coefficient value. It can be seen that the unnecessary Zernike order coefficient can be corrected to a greatly reduced form.

As shown in FIG. 5B (graph on the right side of the drawing), when the target is a template of Zernike degree Z (4, 4) and the coefficient is +0.4 μm,
Measurement Zernike coefficient values are -0.02 μm for Z (2, −2), +0.1 μm for Z (2,2), −0.1 μm for Z (3, −3), and Z (3, −1). +0.02 μm, Z (3,1) 0 μm, Z (3,3) +0.2 μm, Z (4,4) +0.55 μm, Z (4, −2) 0 μm, Z (4,0 ) Indicates +0.02 μm, Z (4,2) indicates −0.01 μm, and Z (4,4) indicates −0.02 μm.

  By performing the correction described above, the corrected (calibrated) voltage template has a Zernike coefficient value of −0.01 μm for Z (2, −2), +0.03 μm for Z (2,2), Z (3, -3) is -0.02 μm, Z (3, -1) is −0.01 μm, Z (3,1) is +0.03 μm, Z (3,3) is +0.03 μm, Z (4 4) +0.4 μm, Z (4, −2) 0 μm, Z (4,0) +0.02 μm, Z (4,2) 0 μm, Z (4,4) −0.01 μm It was possible to correct (calibrate) the target Zernike coefficient value. It can be seen that the unnecessary Zernike order coefficient can be corrected to a greatly reduced form.

As described above, the correction method described above can bring the target Zernike coefficient closer to the target, and the accuracy of aberration correction by the deformable mirror can be improved.
In addition, by performing template calibration, even if individual differences occur in the mirror surface shape and deformation characteristics due to the manufacturing and assembly of the deformable mirror and the stress of the SOI wafer that is the mirror material, It is possible to approach the Zernike order desired, and the accuracy of aberration correction by the deformable mirror can be improved.

  FIG. 4 shows a voltage template (table for voltage correction) for a Zernike order shape. Although templates up to the fourth order are shown, the present invention is not limited to this, and a voltage template for a Zernike degree shape having a dimension of 5, 6 or more may be created. Further, as described above, since defocus can be corrected by a moving prism, a template of order Z (2, 0) is not necessary. Also, the first-order Zernike order, which is the wavefront inclination component, can be corrected by a normal optical system not shown in FIGS. 1 and 2, and is unnecessary.

  For example, a computer program may be configured so that template calibration is automatically performed when the fundus oculi observation device is powered on. In the configuration of FIG. 1, it is necessary to first attach the aberration-free model eye 40, but in the configuration of FIG. 2, since the function of the aberration-free model eye is provided in the apparatus, template calibration can be performed fully automatically. is there. In addition, by providing a sensor for detecting humidity, temperature, atmospheric pressure, etc. in the fundus oculi observation device, particularly near the deformable mirror 10, the template may be calibrated when the environment changes significantly. Is possible. The influence of the environment dependency of the deformable mirror 10 can also be eliminated. This eliminates the need to take measures such as vacuum-sealing the deformable mirror 10 to eliminate the influence of the environment dependence, and an expensive package for that purpose is not required. be able to.

  In the above embodiment, the fundus oculi observation device is described as an example of the optical device using the aberration correction device. However, as a device to which the aberration correction device is attached, a head-up display, an astronomical telescope, a laser irradiation device, etc. It can be used for various optical instruments.

It is sectional drawing which shows the example of the fundus observation apparatus to which the deformation | transformation method of the deformable mirror which concerns on embodiment is applied. It is sectional drawing which shows the other example of the fundus observation apparatus which applies the deformation | transformation method of the deformable mirror which concerns on embodiment. It is a flowchart which shows the calibration method of a voltage template in the fundus oculi observation device concerning an embodiment. It is a figure which shows a voltage template (table for voltage correction) with the shape of each Zernike order. It is a figure which shows an example by which the measurement Zernike coefficient value is correct | amended (calibration) to the target Zernike coefficient value. It is sectional drawing which shows the structure of the conventional variable shape mirror. It is sectional drawing which shows the state of an action | operation of the deformable mirror shown in FIG.

Explanation of symbols

DESCRIPTION OF SYMBOLS 10 ... Deformable mirror 20 ... Shack-Hartmann wavefront sensor 21 ... Hartmann plate 30 ... Beam propagation optical system 31, 34 ... Beam splitter 32 ... Movable prism 33 ... Dichroic mirror 34 ... Beam splitter 35 ... Laser diode 36 ... Fundus observation camera 37 ... Super luminescent diode 40 ... Model eye 51 ... Calculation control unit (PC)
52 ... Driver 61 ... Fixed mirror 62 ... Moving mirror 63 ... Lens 100 ... Fundus observation device 200 ... Fundus observation device

Claims (6)

A plurality of electrode portions and a thin film-like reflecting surface that is disposed opposite to these electrodes and that is distorted by an electrostatic voltage applied to the electrode portions, and is deformed into a predetermined shape to reduce the wavefront distortion of the reflected surface light flux. A deformable mirror to be corrected,
A storage unit storing a predetermined number of sets corresponding to a predetermined different number of reflecting surface shapes, with a voltage applied to each electrode unit corresponding to a reference reflecting surface shape as one set,
An aberration detector for detecting the aberration of light from the object reflected by the deformable mirror;
Arithmetic means for correcting a predetermined number of sets corresponding to a predetermined different number of reflecting surface shapes, with a voltage applied to each electrode unit corresponding to a reference reflecting surface shape stored in the storage unit as one set And an aberration correction apparatus. A plurality of electrode portions and a thin film-like reflecting surface that is disposed opposite to these electrodes and that is distorted by an electrostatic voltage applied to the electrode portions, and is deformed into a predetermined shape to reduce the wavefront distortion of the reflected surface light flux. A deformable mirror to be corrected,
A storage unit storing a predetermined number of sets corresponding to a predetermined different number of reflecting surface shapes, with a voltage applied to each electrode unit corresponding to a reference reflecting surface shape as one set,
An aberration detector for detecting the aberration of light from the object reflected by the deformable mirror;
The detection signal stored in the storage unit in advance is compared with the detection signal actually detected thereafter, and the stored detection signal is corrected based on the actual use condition of the individual to obtain a desired detection signal. An aberration correction apparatus comprising correction value calculation means for calculating a correction value to be calculated.   The actual use condition of the individual is at least one of an individual production error condition, an assembly adjustment error of the entire apparatus including the deformable mirror, and a use condition including humidity, temperature, and atmospheric pressure of the use atmosphere. The aberration correction apparatus according to claim 1 or 2, wherein 4. The aberration correction apparatus according to claim 1, wherein a reference reflection surface shape of the reflection surface is provided corresponding to an element of a predetermined dimension of a zernik polynomial. An optical apparatus comprising the aberration correction apparatus according to claim 1. A fundus oculi observation device comprising the aberration correction device according to claim 1.