JP2007012957A - Coil component and manufacturing method thereof - Google Patents

Coil component and manufacturing method thereof Download PDF

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JP2007012957A
JP2007012957A JP2005193372A JP2005193372A JP2007012957A JP 2007012957 A JP2007012957 A JP 2007012957A JP 2005193372 A JP2005193372 A JP 2005193372A JP 2005193372 A JP2005193372 A JP 2005193372A JP 2007012957 A JP2007012957 A JP 2007012957A
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metal film
coil
coil component
conductivity
support
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Akihiko Ibata
昭彦 井端
Hiroshi Tomita
浩史 冨田
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Panasonic Holdings Corp
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Matsushita Electric Industrial Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To improve a Q value of a coil component to be used for various electronic equipment such as a cellular phone. <P>SOLUTION: In order to achieve this purpose, this component is provided with a columnar supporter 3, a coil provided on the surface of an intermediate portion 3B of this supporter 3, and electrodes 6 provided on the surfaces of both ends 3A of the supporter 3. The coil component is formed so that the conductivity of the electrode 6 is lower than that of the coil 5A. This component has an effect of suppressing an eddy current to improve the Q value. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、携帯電話等の各種電子機器に用いられるコイル部品に関するものである。   The present invention relates to a coil component used in various electronic devices such as a mobile phone.

従来この種のコイル部品は、図7((a)は上面図、(b)は側面図、(c)は下面図)に示されるようなセラミックなどからなる支持体1に、図8((a)は上面図、(b)は側面図、(c)は下面図)に示されるように金属膜2を全体に形成し、その後図9((a)は上面図、(b)は側面図、(c)は下面図)に示されるように中部1Aに形成した金属膜2をらせん形状にカットしてコイル2Aが形成されていた。   Conventionally, this type of coil component is formed on a support 1 made of ceramic as shown in FIG. 7 ((a) is a top view, (b) is a side view, (c) is a bottom view), and FIG. a) is a top view, (b) is a side view, and (c) is a bottom view), a metal film 2 is formed over the entire surface, and then FIG. 9 ((a) is a top view and (b) is a side view). As shown in the figure, (c) is a bottom view), the coil 2A was formed by cutting the metal film 2 formed on the central portion 1A into a spiral shape.

なお、この出願に関する先行技術文献情報としては、例えば、特許文献1が知られている。
特開平10−270252号公報
As prior art document information relating to this application, for example, Patent Document 1 is known.
JP-A-10-270252

このような従来のコイル部品はQ値が低いことが問題となっていた。   Such a conventional coil component has a problem that the Q value is low.

すなわち、上記従来の構成のコイル部品に電流を流すと、支持体1の両端部1Aに形成された金属膜2において大きな渦電流が発生し、コイル2Aで発生させる磁界が遮断されてしまい、Q値が悪くなっていた。   That is, when a current is passed through the coil component having the above-described conventional configuration, a large eddy current is generated in the metal film 2 formed on both ends 1A of the support 1, and the magnetic field generated by the coil 2A is interrupted. The value was getting worse.

そこで本発明は、このようなコイル部品において、Q値を向上させることを目的とする。   SUMMARY OF THE INVENTION Accordingly, an object of the present invention is to improve the Q value in such a coil component.

そして、この目的を達成するために本発明は、柱状の支持体と、この支持体の中部表面に設けたコイルと、前記支持体の両端部表面に設けた電極とを備え、この電極の導電率が前記コイルの導電率よりも低いコイル部品としたものである。   In order to achieve this object, the present invention includes a columnar support, a coil provided on the middle surface of the support, and electrodes provided on both end surfaces of the support. The coil component has a rate lower than the conductivity of the coil.

本発明のコイル部品は、渦電流の原因となる電極の導電率がコイルよりも低くなっているため、渦電流を抑制し、Q値を向上させることができるという効果を有する。   The coil component of the present invention has an effect of suppressing the eddy current and improving the Q value because the conductivity of the electrode causing the eddy current is lower than that of the coil.

さらに、コイルの導電率が高いためQ値を高くすることができる。   Further, since the coil has a high conductivity, the Q value can be increased.

(実施の形態1)
以下、本発明の実施の形態1におけるコイル部品について図面を参照しながら説明する。
(Embodiment 1)
Hereinafter, the coil component in Embodiment 1 of this invention is demonstrated, referring drawings.

まず、図1((a)は上面図、(b)は側面図、(c)は下面図)に示すように、両端部3Aと、両端部3Aよりも細い中部3Bを有する柱状の支持体3を形成する。両端部3Aと中部3Bとは同じ太さでも構わないが、中部3Bを細くしておいた方が、P板等への実装時において有利である。   First, as shown in FIG. 1 ((a) is a top view, (b) is a side view, and (c) is a bottom view), a columnar support having both end portions 3A and a middle portion 3B narrower than both end portions 3A. 3 is formed. Both end portions 3A and middle portion 3B may have the same thickness, but it is advantageous to make middle portion 3B thinner when mounted on a P plate or the like.

支持体3の形成方法としては、例えばセラミック粉末を造粒して20〜30μm程度の粒子にし、それを金型に入れて焼成する等して形成することができる。   As a method for forming the support 3, for example, it can be formed by granulating ceramic powder into particles of about 20 to 30 μm, placing them in a mold and firing them.

この支持体3は、非磁性体であっても磁性体であってもいずれでもよいが、高い周波数帯域(GHz帯域)で高いQが必要な場合は、周波数に追従できない磁性体は損失となるため、周波数とは関係のない非磁性体を用いることが望ましく、それほど高くない周波数帯域(MHz帯域)で高いQ特性やL特性などを必要とする場合は、支持体3の磁性分も利用すべく磁性体を用いることが望ましい。   The support 3 may be either a non-magnetic material or a magnetic material, but when a high Q is required in a high frequency band (GHz band), the magnetic material that cannot follow the frequency is lost. Therefore, it is desirable to use a non-magnetic material unrelated to the frequency, and when high Q characteristics, L characteristics, etc. are required in a not so high frequency band (MHz band), the magnetic content of the support 3 is also used. Therefore, it is desirable to use a magnetic material.

非磁性体としては、エポキシ、ポリイミドなどの有機系の絶縁材料、各種のガラス材料、さらにはガラスとセラミックを混合したガラスセラミックス、CuZn系フェライトあるいはアルミナに代表されるようなセラミックなどの無機系の絶縁材料などがあるが、有機系の絶縁材料を用いると軽量化が可能といったメリットがあり、セラミック系を用いると、熱プロセスに強いといった効果がある。   Nonmagnetic materials include inorganic insulating materials such as organic insulating materials such as epoxy and polyimide, various glass materials, glass ceramics mixed with glass and ceramics, ceramics such as CuZn ferrite and alumina. Although there are insulating materials, there is an advantage that the weight can be reduced if an organic insulating material is used, and the use of a ceramic system has an effect that it is resistant to a thermal process.

磁性体としては、NiZn系やNiZnCu系、MnZn系などのスピネル系や六方晶系などのフェライト材料や、Fe系、Co基やセンダストやパーマロイなどの金属系材料を用いることができ、その中でもNiZn系やNiZnCu系を用いると絶縁性が高いというメリットがあり望ましい。   As magnetic materials, ferrite materials such as NiZn-based, NiZnCu-based, and MnZn-based spinel-based materials and hexagonal-based materials, and metal-based materials such as Fe-based materials, Co-based materials, sendust, and permalloy can be used. Using a NiZnCu system or a NiZnCu system is preferable because of its merit of high insulation.

ここで、この支持体3には誘電率の低いものを用いることにより、コイル間の浮遊容量を低減することができ、コイルの自己共振周波数を高めることやコイルの高周波特性を改善することが可能になる。逆に、誘電率の高い材料を用いた場合は、浮遊容量とコイルの共振周波数を適宜調整することにより、様々な電気特性のコイル部品を得ることが可能となる。即ち、インピーダンスが大きくなる周波数帯域を、L値や支持体3の誘電率の変更により調整が可能となる。また、浮遊容量を調整することにより、等価回路的に複合部品的な電気特性を確保することができる。   Here, by using the support 3 having a low dielectric constant, the stray capacitance between the coils can be reduced, the self-resonance frequency of the coil can be increased, and the high-frequency characteristics of the coil can be improved. become. Conversely, when a material having a high dielectric constant is used, coil components having various electrical characteristics can be obtained by appropriately adjusting the stray capacitance and the resonance frequency of the coil. That is, the frequency band in which the impedance increases can be adjusted by changing the L value or the dielectric constant of the support 3. Further, by adjusting the stray capacitance, it is possible to ensure the electrical characteristics of a composite part in terms of an equivalent circuit.

次に、図2((a)は上面図、(b)は側面図、(c)は下面図)に示すように、図1における支持体3の中部3Bの表面に金属膜4を形成する。   Next, as shown in FIG. 2 ((a) is a top view, (b) is a side view, and (c) is a bottom view), a metal film 4 is formed on the surface of the middle part 3B of the support 3 in FIG. .

この金属膜4の形成方法としては、銅、銅合金、銀、銀とパラジウムの合金や銀と白金の合金あるいは白金のような電気伝導率が高い金属のペーストを塗布し、焼成して形成する。特に純銀、純銅が導電率が高く望ましい。なお、銅、銅合金などの酸化しやすい金属を用いる場合の焼成は窒素雰囲気中で行い、金属膜4を酸化させないことが望ましい。   The metal film 4 is formed by applying a copper, copper alloy, silver, silver-palladium alloy, silver-platinum alloy, or a metal paste having a high electrical conductivity such as platinum and baking it. . In particular, pure silver and pure copper are desirable because of their high conductivity. In addition, it is desirable that the firing in the case of using an easily oxidizable metal such as copper or copper alloy is performed in a nitrogen atmosphere and the metal film 4 is not oxidized.

ここで、この金属膜4はペーストを塗布し焼成して形成するため、必然的に空隙やガラスフリットを含む。このようにして、あえてこの金属膜4の導電率を低くしておく。   Here, since the metal film 4 is formed by applying and baking a paste, it necessarily includes voids and glass frit. In this way, the conductivity of the metal film 4 is intentionally lowered.

その後、図3((a)は上面図、(b)は側面図、(c)は下面図)に示すように、図2における金属膜4をめっき用の電極として、電気めっきにより金属膜5を形成する。この金属膜5は金属膜4が有する空隙やガラスフリットのかけらなどを有さないため導電率が高い。この金属膜5を金属膜4に比べて十分厚くしておくと、コイル(後の工程で示す)の導電率を高くすることができ、Q値を高くすることができる。   Thereafter, as shown in FIG. 3 ((a) is a top view, (b) is a side view, and (c) is a bottom view), the metal film 5 is formed by electroplating using the metal film 4 in FIG. 2 as an electrode for plating. Form. The metal film 5 has high conductivity because it does not have voids or pieces of glass frit that the metal film 4 has. If the metal film 5 is sufficiently thicker than the metal film 4, the conductivity of the coil (shown in a later step) can be increased and the Q value can be increased.

次に、図4((a)は上面図、(b)は側面図、(c)は下面図)に示すように、支持体3の両端部3Aに電極6を形成する。この時、電極6に金属膜5と同じ元素の金属を用いたとしても、空隙やガラスフリットを有する分、電極6の導電率は金属膜5の導電率に比べて低くなっているためコイル(後の工程で示す)で発生した磁束を妨げることがなくQ値を下げない。ここで、電極6と金属膜4を同元素で構成した場合は、コイル(後の工程で示す)において合金を形成しないというメリットがある。合金を形成してしまうと、導電率が下がるという問題と、融点が下がることで耐熱性が悪く、正確なコイル形状を保てないという問題を有する。よって、同元素で構成した場合、これらの問題点を回避することができる。一方、金属膜4よりも高抵抗のものを用いた場合、両端部3A上における渦電流の発生量をより減らすことができ、コイル(後の工程で示す)で発生した磁束を妨げることがなくQ値を下げないという効果を有する。   Next, as shown in FIG. 4 ((a) is a top view, (b) is a side view, and (c) is a bottom view), electrodes 6 are formed on both end portions 3A of the support 3. At this time, even if the metal of the same element as that of the metal film 5 is used for the electrode 6, the conductivity of the electrode 6 is lower than the conductivity of the metal film 5 because of the gap and the glass frit. The Q value is not lowered without hindering the magnetic flux generated in the subsequent process). Here, when the electrode 6 and the metal film 4 are made of the same element, there is an advantage that an alloy is not formed in the coil (shown in a later step). If an alloy is formed, there is a problem that the electrical conductivity is lowered and a problem that the heat resistance is poor because the melting point is lowered, and an accurate coil shape cannot be maintained. Therefore, when composed of the same element, these problems can be avoided. On the other hand, when a material having a higher resistance than that of the metal film 4 is used, the amount of eddy current generated on both ends 3A can be further reduced, and the magnetic flux generated in the coil (shown in a later process) is not hindered. This has the effect of not lowering the Q value.

また、この電極6を両端部3Aの全体ではなく、引出電極(後の工程で示す)との接続部分であり且つP板(図示せず)への実装部分のみに形成することにより、渦電流の発生をさらに減らすことができる。   Further, by forming this electrode 6 not only on the whole end portions 3A but on the connection portion with the extraction electrode (shown in a later step) and only on the mounting portion on the P plate (not shown), an eddy current Can be further reduced.

ここで、この電極6はペーストにより形成する。一般にペーストを用いた場合は、空隙やガラスフリットのかけらが残存するため、同種の材料を用いてめっきした場合に比べて高抵抗となり、渦電流を発生しにくくするため、Q値の向上を可能にしている。さらに、ペーストを用いた場合、めっき工法に比べて支持体3と電極6との密着性を向上させることができるという効果を有する。   Here, the electrode 6 is formed of a paste. In general, when paste is used, voids and fragments of glass frit remain, so the resistance is higher than when plating using the same type of material, and eddy currents are less likely to occur, so the Q value can be improved. I have to. Furthermore, when a paste is used, it has the effect that the adhesiveness of the support body 3 and the electrode 6 can be improved compared with the plating method.

また、この電極6の厚さを薄くしておくことにより、さらに高抵抗とすることができる。   In addition, the resistance can be further increased by reducing the thickness of the electrode 6.

次に、図5((a)は上面図、(b)は側面図、(c)は下面図)に示すように、図2における金属膜4と図4における金属膜5とからなる2層から、らせん状のコイル5Aと、その両端の引出電極5Bとを形成する。形成方法としては、全面にレジストを塗り、らせん状に紫外線を照射した後、アルカリ溶液などに浸してエッチングする方法や、レーザー照射によりカットする方法があるが、YAGレーザーを用いて形成する方法が細い加工を可能にするためコイル5Aの巻き数を多くすることができ、大きなL値を取ることができて好ましい。   Next, as shown in FIG. 5 ((a) is a top view, (b) is a side view, and (c) is a bottom view), two layers comprising a metal film 4 in FIG. 2 and a metal film 5 in FIG. From this, a spiral coil 5A and lead electrodes 5B at both ends thereof are formed. As a formation method, there are a method in which a resist is applied to the entire surface, and ultraviolet rays are irradiated in a spiral shape, followed by etching by immersion in an alkaline solution, and a method of cutting by laser irradiation, but a method of forming using a YAG laser is available. In order to enable fine processing, the number of turns of the coil 5A can be increased, and a large L value can be obtained.

さらに、図2における金属膜4と図4における金属膜5とからなる2層をらせん状のコイル5A及び引出電極5Bにパターン化した後に、コイル5A、引出電極5Bなどをエッチングすることによりバリ等を取り除き、電極表面を滑らかにすることで、絶縁層(後の工程で示す)でバリ等を覆う必要が無い分、その絶縁層(後の工程で示す)を薄く形成することを可能にしている。特に、レーザー照射によりコイル5Aを形成した場合、バリが多くなるため、この効果は顕著となる。   Further, after the two layers of the metal film 4 in FIG. 2 and the metal film 5 in FIG. 4 are patterned into the spiral coil 5A and the extraction electrode 5B, the coil 5A, the extraction electrode 5B, and the like are etched to form burrs and the like. By smoothing the electrode surface, the insulating layer (shown in a later process) need not be covered with an insulating layer (shown in a later process), so that the insulating layer (shown in a later process) can be made thin. Yes. In particular, when the coil 5 </ b> A is formed by laser irradiation, this effect becomes significant because burrs increase.

また、支持体3の表面に付着した金属などを除去しておくことで渦電流の発生を防ぎ、コイル5Aの磁束を妨げることがなく、Q値を向上させることができる。特に、レーザー照射によりコイル5Aを形成した場合、飛散物が多いため、この効果は顕著となる。   Further, by removing the metal adhering to the surface of the support 3, generation of eddy current can be prevented, and the Q value can be improved without disturbing the magnetic flux of the coil 5 </ b> A. In particular, when the coil 5A is formed by laser irradiation, this effect becomes significant because there are many scattered objects.

その後、図6((a)は上面図、(b)は側面図、(c)は下面図)に示すように、図5における中部3Bに形成したコイル5A、引出電極5Bの表面を絶縁層7で覆うことにより、コイル5Aや引出電極5Bを被覆絶縁化することができる。そうすることにより実装時に他の部品に影響を与えないため高密度実装を可能にしており、その他、特性の安定化、コイル5Aの保護などを可能にしている。さらに、電極6にニッケル層(図示せず)と錫層(図示せず)を形成する場合などにおいても、そのニッケル層(図示せず)や錫層(図示せず)をコイル5Aに付着させる心配がないという効果がある。   Then, as shown in FIG. 6 ((a) is a top view, (b) is a side view, and (c) is a bottom view), the surface of the coil 5A and the extraction electrode 5B formed in the middle part 3B in FIG. By covering with 7, the coil 5 </ b> A and the extraction electrode 5 </ b> B can be insulated. By doing so, other components are not affected during mounting, so that high-density mounting is possible. In addition, stabilization of characteristics, protection of the coil 5A, and the like are possible. Further, even when a nickel layer (not shown) and a tin layer (not shown) are formed on the electrode 6, the nickel layer (not shown) and the tin layer (not shown) are attached to the coil 5A. There is an effect that there is no worry.

この様な構成により、電極6はペーストを塗布して焼成して形成し、空隙やガラスフリットを含ませることにより、抵抗を高くすることで渦電流を減らし、Q値を向上させることができる。   With such a configuration, the electrode 6 is formed by applying paste and baking, and by including voids and glass frit, the eddy current can be reduced and the Q value can be improved by increasing the resistance.

一方、コイル5Aを構成する金属膜5は電気めっきで形成することにより、空隙やガラスフリットを含ませず、高い導電率を得ることで、Q値の向上を図ることができる。   On the other hand, the metal film 5 constituting the coil 5A is formed by electroplating, so that the Q value can be improved by obtaining high conductivity without including voids and glass frit.

さらに、電極6の形成箇所を両端部3Aの全体ではなく、引出電極5Bとの接続部のみにすることで、さらにQ値を向上させることができる。   Furthermore, the Q value can be further improved by forming the electrode 6 only at the connection portion with the extraction electrode 5B, not the entire end portions 3A.

さらに、電極6の厚みを薄く形成することにより、さらに渦電流を減らしQ値を向上させることができる。   Furthermore, by forming the electrode 6 thin, the eddy current can be further reduced and the Q value can be improved.

さらに、金属膜4は金属膜5に比べて導電率が低いため、金属膜5の厚みを金属膜4の厚みよりも厚くしておくことにより、コイル5A全体の抵抗を下げ、よりQ値を向上させることができる。   Furthermore, since the metal film 4 has a lower conductivity than the metal film 5, by setting the thickness of the metal film 5 to be greater than the thickness of the metal film 4, the overall resistance of the coil 5 </ b> A is lowered, and the Q value is further increased. Can be improved.

本発明のコイル部品は、電極の導電率を前記コイルの導電率よりも低くしておくことにより、渦電流を抑制し、Q値を向上させることができるという効果を有し、各種電気機器において有用である。   The coil component of the present invention has the effect of suppressing the eddy current and improving the Q value by keeping the conductivity of the electrode lower than the conductivity of the coil. Useful.

(a)本発明の実施の形態1における一製造工程のコイル部品の上面図、(b)同側面図、(c)同下面図(A) Top view of coil component in one manufacturing process according to Embodiment 1 of the present invention, (b) Side view, (c) Bottom view (a)本発明の実施の形態1における一製造工程のコイル部品の上面図、(b)同側面図、(c)同下面図(A) Top view of coil component in one manufacturing process according to Embodiment 1 of the present invention, (b) Side view, (c) Bottom view (a)本発明の実施の形態1における一製造工程のコイル部品の上面図、(b)同側面図、(c)同下面図(A) Top view of coil component in one manufacturing process according to Embodiment 1 of the present invention, (b) Side view, (c) Bottom view (a)本発明の実施の形態1における一製造工程のコイル部品の上面図、(b)同側面図、(c)同下面図(A) Top view of coil component in one manufacturing process according to Embodiment 1 of the present invention, (b) Side view, (c) Bottom view (a)本発明の実施の形態1における一製造工程のコイル部品の上面図、(b)同側面図、(c)同下面図(A) Top view of coil component in one manufacturing process according to Embodiment 1 of the present invention, (b) Side view, (c) Bottom view (a)本発明の実施の形態1における一製造工程のコイル部品の上面図、(b)同側面図、(c)同下面図(A) Top view of coil component in one manufacturing process according to Embodiment 1 of the present invention, (b) Side view, (c) Bottom view (a)従来のコイル部品における一製造工程の上面図、(b)同側面図、(c)同下面図(A) Top view of one manufacturing process in a conventional coil component, (b) Side view, (c) Bottom view (a)従来のコイル部品における一製造工程の上面図、(b)同側面図、(c)同下面図(A) Top view of one manufacturing process in a conventional coil component, (b) Side view, (c) Bottom view (a)従来のコイル部品における一製造工程の上面図、(b)同側面図、(c)同下面図(A) Top view of one manufacturing process in a conventional coil component, (b) Side view, (c) Bottom view

符号の説明Explanation of symbols

3 支持体
3A 両端部
3B 中部
5A コイル
5B 引出電極
6 電極
3 Support 3A Both Ends 3B Middle 5A Coil 5B Lead Electrode 6 Electrode

Claims (12)

柱状の支持体と、この支持体の中部表面に設けたコイルと、前記支持体の両端部表面に設けた電極とを備え、この電極の導電率を前記コイルの導電率よりも低くしたコイル部品。 A coil component comprising a columnar support, a coil provided on the middle surface of the support, and electrodes provided on both end surfaces of the support, the conductivity of which is lower than the conductivity of the coil . 電極が空隙を有する請求項1に記載のコイル部品。 The coil component according to claim 1, wherein the electrode has a gap. コイルは下層と上層とを有し、この下層を構成する金属と前記上層を構成する金属とが同元素である請求項1に記載のコイル部品。 The coil component according to claim 1, wherein the coil has a lower layer and an upper layer, and a metal constituting the lower layer and a metal constituting the upper layer are the same element. コイルは下層と上層とを有し、この上層の導電率が前記下層の導電率よりも高い請求項1に記載のコイル部品。 The coil component according to claim 1, wherein the coil has a lower layer and an upper layer, and the conductivity of the upper layer is higher than the conductivity of the lower layer. コイルの上層の厚みが下層の厚みよりも厚い請求項4に記載のコイル部品。 The coil component according to claim 4, wherein the upper layer of the coil is thicker than the lower layer. コイルの下層には空隙を有する請求項4に記載のコイル部品。 The coil component according to claim 4, wherein a gap is formed in a lower layer of the coil. 柱状の支持体を形成し、次にこの支持体の中部表面にペースト状の第1の金属膜を塗布して焼成し、その後電気めっきにより前記第1の金属膜の表面に第2の金属膜を形成し、次に前記支持体の両端部表面にペースト状の第3の金属膜を塗布して焼成し、その後前記第1の金属膜及び第2の金属膜を螺旋形状に成形するコイル部品の製造方法。 A columnar support is formed, then a paste-like first metal film is applied to the middle surface of the support and fired, and then a second metal film is formed on the surface of the first metal film by electroplating. And then baking a paste-like third metal film on both end surfaces of the support, and then forming the first metal film and the second metal film into a spiral shape Manufacturing method. 第1の金属膜及び第2の金属膜及び第3の金属膜とが同元素である請求項7に記載のコイル部品の製造方法。 The method for manufacturing a coil component according to claim 7, wherein the first metal film, the second metal film, and the third metal film are the same element. 第3の金属膜の導電率が第2の金属膜の導電率よりも低い請求項7に記載のコイル部品の製造方法。 The method for manufacturing a coil component according to claim 7, wherein the conductivity of the third metal film is lower than the conductivity of the second metal film. 第1の金属膜の導電率が第2の金属膜の導電率よりも低い請求項7に記載のコイル部品の製造方法。 The method for manufacturing a coil component according to claim 7, wherein the conductivity of the first metal film is lower than the conductivity of the second metal film. 第1の金属膜の厚みを第2の金属膜の厚みよりも薄く形成する請求項7に記載のコイル部品の製造方法。 The method for manufacturing a coil component according to claim 7, wherein the first metal film is thinner than the second metal film. 第3の金属膜の厚みを第2の金属膜の厚みよりも薄く形成する請求項7に記載のコイル部品の製造方法。 The method for manufacturing a coil component according to claim 7, wherein the third metal film is formed thinner than the second metal film.
JP2005193372A 2005-07-01 2005-07-01 Coil component and manufacturing method thereof Pending JP2007012957A (en)

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