JP2007012954A5 - - Google Patents

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Publication number
JP2007012954A5
JP2007012954A5 JP2005193326A JP2005193326A JP2007012954A5 JP 2007012954 A5 JP2007012954 A5 JP 2007012954A5 JP 2005193326 A JP2005193326 A JP 2005193326A JP 2005193326 A JP2005193326 A JP 2005193326A JP 2007012954 A5 JP2007012954 A5 JP 2007012954A5
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JP
Japan
Prior art keywords
exposed
liquid
contact angle
body side
exposure apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2005193326A
Other languages
English (en)
Japanese (ja)
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JP2007012954A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2005193326A priority Critical patent/JP2007012954A/ja
Priority claimed from JP2005193326A external-priority patent/JP2007012954A/ja
Publication of JP2007012954A publication Critical patent/JP2007012954A/ja
Publication of JP2007012954A5 publication Critical patent/JP2007012954A5/ja
Pending legal-status Critical Current

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JP2005193326A 2005-07-01 2005-07-01 露光装置 Pending JP2007012954A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005193326A JP2007012954A (ja) 2005-07-01 2005-07-01 露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005193326A JP2007012954A (ja) 2005-07-01 2005-07-01 露光装置

Publications (2)

Publication Number Publication Date
JP2007012954A JP2007012954A (ja) 2007-01-18
JP2007012954A5 true JP2007012954A5 (https=) 2008-08-14

Family

ID=37751040

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005193326A Pending JP2007012954A (ja) 2005-07-01 2005-07-01 露光装置

Country Status (1)

Country Link
JP (1) JP2007012954A (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011081062A1 (ja) * 2009-12-28 2011-07-07 株式会社ニコン 液浸部材、液浸部材の製造方法、露光装置、及びデバイス製造方法
EP2381310B1 (en) 2010-04-22 2015-05-06 ASML Netherlands BV Fluid handling structure and lithographic apparatus
NL2009472A (en) * 2011-10-24 2013-04-25 Asml Netherlands Bv A fluid handling structure, a lithographic apparatus and a device manufacturing method.

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4595320B2 (ja) * 2002-12-10 2010-12-08 株式会社ニコン 露光装置、及びデバイス製造方法
JP4352930B2 (ja) * 2003-02-26 2009-10-28 株式会社ニコン 露光装置、露光方法及びデバイス製造方法
DE60308161T2 (de) * 2003-06-27 2007-08-09 Asml Netherlands B.V. Lithographischer Apparat und Verfahren zur Herstellung eines Artikels
JP4729876B2 (ja) * 2003-07-09 2011-07-20 株式会社ニコン 露光装置、露光方法、並びにデバイス製造方法
EP2264531B1 (en) * 2003-07-09 2013-01-16 Nikon Corporation Exposure apparatus and device manufacturing method
US7528929B2 (en) * 2003-11-14 2009-05-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4797984B2 (ja) * 2004-02-19 2011-10-19 株式会社ニコン 露光装置及びデバイス製造方法
JP4622340B2 (ja) * 2004-03-04 2011-02-02 株式会社ニコン 露光装置、デバイス製造方法
KR101250155B1 (ko) * 2004-03-25 2013-04-05 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
JP4543767B2 (ja) * 2004-06-10 2010-09-15 株式会社ニコン 露光装置及びデバイス製造方法
JP2006310827A (ja) * 2005-03-31 2006-11-09 Nikon Corp 露光装置、露光方法、及びデバイス製造方法

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