JP2007010366A - Monolithic structure, measuring instrument and method, and program - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To advantageously handle a measuring target measured by irradiation with an electromagnetic wave. <P>SOLUTION: In a filled lattice 2, the measuring target 20 of which the characteristics are measured by the irradiation with the electromagnetic wave is arranged (charged) in the gap parts 12 of a lattice 1 wherein the gap parts (openings) 12 surrounded by a conductor plate 10 are arranged in X- and Y-directions of an XY plane. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to handling of an object to be measured that is measured by irradiation with electromagnetic waves.

  Conventionally, it is known to analyze an object to be measured based on transmittance when the object to be measured is irradiated with a terahertz wave (see, for example, Patent Document 1). Moreover, the transmittance | permeability at the time of irradiating electromagnetic waves to what opened the hole in the metal plate is also known (for example, refer nonpatent literature 1). Furthermore, it is also known to use a metal plate having a hole as a retardation plate (see, for example, Patent Document 2).

JP 2004-108905 A JP 2004-117703 A K.F.Renk and L. Genzel “Interference Filters and Fabry-PerotInterferometers for the Far Infrared”, APPLIED OPTICS, Vol. 1, No. 5, September 1962

  However, the prior art as described above does not disclose how it is advantageous to handle a measurement object irradiated with electromagnetic waves.

  Then, this invention makes it a subject to handle the to-be-measured object measured by irradiating electromagnetic waves advantageously.

  An integrated structure according to the present invention includes an object to be measured whose characteristics are measured by irradiating an electromagnetic wave, and a void arrangement structure in which a void surrounded by a conductor is arranged on a predetermined plane. Composed.

  According to the integrated structure configured as described above, the characteristic is measured when the object to be measured is irradiated with electromagnetic waves. The space | gap part which the space | gap arrangement structure body was enclosed with the conductor in the predetermined plane is arrange | positioned.

  In the integrated structure according to the present invention, the object to be measured may be arranged inside the gap.

  The integrated structure according to the present invention may include an arrangement member on which the object to be measured is arranged, and the arrangement member may be arranged on the surface of the gap arrangement structure.

  Moreover, the integrated structure concerning this invention WHEREIN: The said space | gap arrangement structure body may make it the said same-shaped said space | gap part arrange | positioned at a fixed space | interval in the predetermined direction.

  In the integrated structure according to the present invention, the gap arrangement structure may be a two-dimensional lattice in which openings penetrating the conductors are arranged in the vertical direction and the horizontal direction.

  Moreover, as for the integrated structure concerning this invention, you may make it the said space | gap arrangement structure have a base part by which the said conductor is arrange | positioned.

  In the integrated structure according to the present invention, the conductor may be printed on the base.

  In addition, the integrated structure according to the present invention has an arrangement portion in which the object to be measured is arranged in the gap and a non-arrangement portion in which the object to be measured is not arranged in the gap. May be.

  In the integrated structure according to the present invention, there may be two or more types of the objects to be measured arranged in the gap.

  A measuring apparatus according to the present invention detects a first electromagnetic wave irradiating means for irradiating an integrated structure with a first electromagnetic wave, and a first response electromagnetic wave that is a response by the integrated structure to the irradiated first electromagnetic wave. A first electromagnetic wave detecting means; a second electromagnetic wave irradiating means for irradiating the gap arrangement structure in which the measured object is not arranged in the gap portion; and the gap arrangement for the irradiated second electromagnetic wave. Based on the second electromagnetic wave detection means for detecting the second response electromagnetic wave, which is a response by the structure, the detection result of the first electromagnetic wave detection means and the detection result of the second electromagnetic wave detection means, the characteristics of the object to be measured are measured. And a characteristic measuring means.

  According to the measuring apparatus configured as described above, the first electromagnetic wave irradiation means irradiates the integrated electromagnetic wave with the first electromagnetic wave. The first electromagnetic wave detection means detects a first response electromagnetic wave that is a response by the integrated structure to the irradiated first electromagnetic wave. The second electromagnetic wave irradiation means irradiates the second electromagnetic wave to the gap arrangement structure in which the object to be measured is not arranged in the gap. The second electromagnetic wave detection means detects a second response electromagnetic wave that is a response by the gap arrangement structure to the irradiated second electromagnetic wave. The characteristic measurement unit measures the characteristic of the object to be measured based on the detection result of the first electromagnetic wave detection unit and the detection result of the second electromagnetic wave detection unit.

  The measuring apparatus according to the present invention detects a first electromagnetic wave irradiation means that irradiates a first electromagnetic wave to an arrangement part in an integrated structure, and a first response electromagnetic wave that is a response by the arrangement part to the irradiated first electromagnetic wave. First electromagnetic wave detecting means, second electromagnetic wave irradiating means for irradiating the non-arranged portion with the second electromagnetic wave, and second response electromagnetic wave that is a response by the non-arranged portion to the irradiated second electromagnetic wave. Two electromagnetic wave detection means, and a characteristic measurement means for measuring the characteristic of the object to be measured based on the detection result of the first electromagnetic wave detection means and the detection result of the second electromagnetic wave detection means.

  According to the measuring apparatus configured as described above, the first electromagnetic wave irradiation means irradiates the first electromagnetic wave to the arrangement portion in the integrated structure. The first electromagnetic wave detecting means detects a first response electromagnetic wave that is a response by the arrangement portion to the irradiated first electromagnetic wave. The second electromagnetic wave irradiation means irradiates the non-arranged portion with the second electromagnetic wave. The second electromagnetic wave detection means detects a second response electromagnetic wave that is a response by the non-arranged portion to the irradiated second electromagnetic wave. The characteristic measurement unit measures the characteristic of the object to be measured based on the detection result of the first electromagnetic wave detection unit and the detection result of the second electromagnetic wave detection unit.

  The measuring apparatus according to the present invention detects an electromagnetic wave irradiation means for irradiating each type of the measurement object in the integrated structure with an electromagnetic wave, and a response electromagnetic wave that is a response by the integrated structure to the irradiated electromagnetic wave. Electromagnetic wave detecting means for performing measurement, and characteristic measuring means for measuring the characteristic of the object to be measured based on the detection result of the electromagnetic wave detecting means.

  According to the measuring apparatus configured as described above, the electromagnetic wave irradiation means irradiates each type of the measurement object in the integrated structure with electromagnetic waves. The electromagnetic wave detecting means detects a response electromagnetic wave that is a response by the integrated structure to the irradiated electromagnetic wave. The characteristic measuring unit measures the characteristic of the object to be measured based on the detection result of the electromagnetic wave detecting unit.

  Further, the measuring device according to the present invention includes a transmittance measuring unit that measures the transmittance of the electromagnetic wave based on the detection result of the first electromagnetic wave detecting unit and the detection result of the second electromagnetic wave detecting unit. And a refractive index deriving means for deriving the refractive index of the object to be measured based on the measured transmittance.

  Further, in the measuring apparatus according to the present invention, the refractive index deriving unit measures the transmittance measured based on the detection result of the first electromagnetic wave detecting unit at the frequency A and the detection result of the second electromagnetic wave detecting unit at the frequency B. The refractive index of the object to be measured may be derived based on A and B when the transmittance measured based on

  Moreover, the measuring apparatus according to the present invention may include a frequency characteristic adjusting member, and in the vicinity of the frequency B, the slope of the transmittance with respect to the frequency may be larger than that without the frequency characteristic adjusting member. .

  The present invention provides a first electromagnetic wave in an integrated structure having an object to be measured whose characteristics are measured by irradiating an electromagnetic wave, and a void arrangement structure in which a void surrounded by a conductor is arranged in a predetermined plane. A first electromagnetic wave irradiation step of irradiating the first electromagnetic wave, a first electromagnetic wave detection step of detecting a first response electromagnetic wave that is a response by the integrated structure to the irradiated first electromagnetic wave, and the object to be measured in the gap A second electromagnetic wave irradiation step of irradiating the second electromagnetic wave to the void arrangement structure that is not arranged, and a second electromagnetic wave that detects a second response electromagnetic wave that is a response by the gap arrangement structure to the irradiated second electromagnetic wave A measurement method comprising: a detection step; and a characteristic measurement step of measuring a characteristic of the object to be measured based on a detection result of the first electromagnetic wave detection step and a detection result of the second electromagnetic wave detection step.

  The present invention provides the void portion in an integrated structure having an object to be measured whose characteristics are measured by irradiating electromagnetic waves and a void arrangement structure in which a void portion surrounded by a conductor is arranged in a predetermined plane. A first electromagnetic wave irradiation step of irradiating a first electromagnetic wave to an arrangement portion where the object to be measured is arranged, and a first response electromagnetic wave that is a response by the arrangement portion to the irradiated first electromagnetic wave An electromagnetic wave detecting step, a second electromagnetic wave irradiating step of irradiating a second electromagnetic wave to a non-arranged portion in which the object to be measured is not arranged in the gap portion in the integrated structure, and the second electromagnetic wave irradiating the second electromagnetic wave Based on the second electromagnetic wave detection step of detecting a second response electromagnetic wave that is a response by the non-arranged portion, the detection result of the first electromagnetic wave detection step, and the detection result of the second electromagnetic wave detection step, It is a measuring method and a characteristic measuring step of measuring a characteristic of the object to be measured.

  The present invention is an integrated structure having an object to be measured whose characteristics are measured by irradiating an electromagnetic wave, and a void arrangement structure in which a void surrounded by a conductor is arranged in a predetermined plane, An electromagnetic wave irradiating step of irradiating each type of the measurement object in the integrated structure having two or more types of the measurement object arranged in the gap, and the integrated structure for the irradiated electromagnetic wave An electromagnetic wave detection step for detecting a response electromagnetic wave, which is a response by, and a characteristic measurement step for measuring the characteristic of the object to be measured based on the detection result of the electromagnetic wave detection step.

  The present invention provides a first electromagnetic wave in an integrated structure having an object to be measured whose characteristics are measured by irradiating an electromagnetic wave, and a void arrangement structure in which a void surrounded by a conductor is arranged in a predetermined plane. A first electromagnetic wave irradiating means for irradiating the first electromagnetic wave, a first electromagnetic wave detecting means for detecting a first response electromagnetic wave that is a response by the integrated structure to the irradiated first electromagnetic wave, and the object to be measured in the gap. Second electromagnetic wave irradiation means for irradiating the second electromagnetic wave to the void arrangement structure that is not arranged, and a second electromagnetic wave for detecting a second response electromagnetic wave that is a response by the gap arrangement structure to the irradiated second electromagnetic wave A program for causing a computer to execute a measurement process in a measuring device including a detection unit, the detection result of the first electromagnetic wave detection unit, and the second electromagnetic wave detection unit Out based on the result, the a program for executing a characteristic measurement process of measuring the characteristics of the object to be measured to the computer.

  The present invention provides the void portion in an integrated structure having an object to be measured whose characteristics are measured by irradiating electromagnetic waves and a void arrangement structure in which a void portion surrounded by a conductor is arranged in a predetermined plane. A first electromagnetic wave irradiation means for irradiating a first electromagnetic wave to an arrangement portion where the object to be measured is arranged, and a first response electromagnetic wave that is a response by the arrangement portion to the irradiated first electromagnetic wave An electromagnetic wave detecting means; a second electromagnetic wave irradiating means for irradiating a second electromagnetic wave to a non-arranged portion in which the object to be measured is not arranged in the gap portion of the integrated structure; and the second electromagnetic wave irradiating means. A second electromagnetic wave detecting means for detecting a second response electromagnetic wave that is a response by a non-arranged part, and a program for causing a computer to execute a measurement process in a measuring device Wherein based on the detection result of the detection result and the second electromagnetic wave detection means of the first electromagnetic wave detecting means, wherein a program for executing a characteristic measurement process of measuring the characteristics of the object to be measured to the computer.

  The present invention is an integrated structure having an object to be measured whose characteristics are measured by irradiating an electromagnetic wave, and a void arrangement structure in which a void surrounded by a conductor is arranged in a predetermined plane, Electromagnetic wave irradiation means for irradiating each type of the measurement object in the integrated structure having two or more types of the measurement object arranged in the gap, and the integrated structure for the irradiated electromagnetic wave A program for causing a computer to execute a measurement process in a measuring device including a response electromagnetic wave that is a response electromagnetic wave, and a characteristic of the object to be measured based on a detection result of the electromagnetic wave detection unit This is a program for causing a computer to execute a characteristic measurement process for measuring.

  Embodiments of the present invention will be described below with reference to the drawings.

First Embodiment FIG. 1 is a perspective view of a lattice (gap arrangement structure) 1 according to a first embodiment of the present invention. The lattice (gap arrangement structure) 1 includes a conductor plate 10. The conductor plate 10 is, for example, a metal plate. The direction of the thickness of the conductor plate 10 is the Z direction. A gap (opening) 12 is opened in the conductor plate 10. The gap 12 penetrates the conductor plate 10 in the Z direction. The gap 12 opens in the XY plane. The gaps 12 are arranged in the vertical direction (Y direction) and the horizontal direction (X direction). That is, the lattice 1 is a two-dimensional lattice.

  2A and 2B are an XY plan view of the lattice (gap arrangement structure) 1 according to the first embodiment (FIG. 2A) and an XY plan view of the filling lattice 2 (integrated structure) 2 (FIG. 2B). ).

  Referring to FIG. 2A, in the lattice (gap arrangement structure) 1, the gaps (openings) 12 are arranged in two directions (X direction and Y direction) on the XY plane. The gap 12 is a square opening, and the lengths of one side (aperture) in the X direction and the Y direction are equal (assuming that they are a). Further, the pitch in the X direction and the pitch in the Y direction of the gap 12 are equal (assuming that they are p). Since a and p are about several tens of microns, it can be said that the lattice 1 is a so-called mesh.

  With reference to FIG. 2 (b), the filling grid (integrated structure) 2 is configured such that the DUT 20 is disposed inside the gap 12 of the grid 1. The object to be measured 20 has characteristics (for example, electromagnetic wave transmittance, refractive index, etc.) measured by irradiating with electromagnetic waves. The object to be measured 20 is, for example, oil or fat, biomolecule (DNA or the like). If the object to be measured 20 is oil or fat, the object to be measured 20 is disposed in the gap 12 if the gap 12 is filled with the object to be measured 20 (a gap may be formed in the gap 12). It will be done.

  FIG. 3 is a plan view showing one vicinity of the gap 12 of the lattice 1. It can be said that the gap 12 is surrounded by the conductor 14 which is a part of the conductor plate 10 in the XY plane. Such voids 12 are arranged in the X direction and the Y direction.

  FIG. 4 is an XY plan view of the filling grid (integrated structure) 4. The packed lattice 4 includes a non-arranged portion 4 a where the object to be measured 20 is not disposed in the gap portion 12 of the lattice 1 and an arrangement portion 4 b where the object to be measured 20 is disposed in the gap portion 12 of the lattice 1.

  In addition, as shown in FIG. 17, it is also conceivable to arrange another measurement object different from the measurement object arranged in the arrangement part 4b in the non-arrangement part 4a. FIG. 17A is an XY plan view of the packed grating 4 when another object to be measured is arranged in the non-arranged portion 4a. An object to be measured 20a is arranged in the non-arranged portion 4a, and an object to be measured 20b is arranged in the arranged portion 4b.

  Further, as shown in FIG. 17B, three kinds of objects to be measured may be arranged on the filling grid 4. FIG. 17B is an XY plan view of the packed grating 4 in which three types of objects to be measured are arranged. That is, the DUT 20a is arranged in the first arrangement portion 4c, the DUT 20b is arranged in the second arrangement portion 4d, and the DUT 20c is arranged in the third arrangement portion 4e. In this way, three or more kinds of objects to be measured may be arranged on the filling grid 4.

  FIG. 5 is an XY plan view for explaining a modification of the grating 1. In FIG. 5A, the gaps 12 are arranged only in one direction (X direction). That is, they are arranged one-dimensionally. In FIG. 5B, the gaps 12 are arranged in the X direction, the Y1 direction, and the Y2 direction (not the Y direction). Either can be used as the grating 1. However, as shown in FIG. 5, it is necessary that the gaps 12 having the same shape (the same shape and the same size) are arranged at a predetermined pitch (or interval). Further, the gap portion 12 of the lattice 1 may not be a square, may be a circle, and may be a triangle or a rectangle. That is, it may be a two-dimensional figure. Furthermore, as shown in FIG. 14, even when there is only one gap 12, it can be used as the lattice 1.

  Heretofore, an example in which the device under test 20 is arranged in the gap portion 12 of the lattice 1 has been described as an example of arranging the device under test 20 in the grid 1. However, the method of arranging the DUT 20 on the grid 1 is not limited to this. For example, it is conceivable to arrange the object 20 to be measured on the surface of the grating 1.

  18A and 18B are an XY plan view (FIG. 18A) and a bb cross-sectional view (FIG. 18B) of the integrated structure 7 in which the DUT 20 is arranged on the surface of the grating 1. FIG. The integrated structure 7 has a sheet (arrangement member) 15. The sheet 15 is placed on the surface of the grid 1. Referring to FIG. 18A, it can be seen that the sheet 15 covers the gap 12 of the lattice 1 so that it cannot be seen. Referring to FIG. 18B, the back surface of the sheet 15 is in contact with the surface of the grid 1, and the object to be measured 20 (for example, DNA, which is illustrated as a Y-shaped figure on the surface of the sheet 15). Are arranged (for example, fixed). The sheet 15 is, for example, a nylon membrane used for DNA hybridization. DNA to be measured 20 can be fixed to the sheet 15 by soaking into the sheet 15 which is a nylon film.

  FIG. 6 is a diagram illustrating a configuration of a measuring apparatus for measuring the refractive index of the object 20 to be measured of the packed grating (integrated structure) 2 according to the first embodiment. The measurement apparatus includes a radiation control unit 32, an electromagnetic wave irradiation unit (first electromagnetic wave irradiation unit and second electromagnetic wave irradiation unit) 34, an electromagnetic wave detection unit (first electromagnetic wave detection unit and second electromagnetic wave detection unit) 36, and a characteristic measurement unit 40. Prepare.

  The radiation control unit 32 designates the electromagnetic wave power P1 and the electromagnetic wave frequency f, and causes the electromagnetic wave irradiation unit 34 to emit the electromagnetic wave. The designated power P1 and frequency f are also given to the transmittance measuring unit 42 of the characteristic measuring unit 40.

  The electromagnetic wave irradiation unit (first electromagnetic wave irradiation means and second electromagnetic wave irradiation means) 34 emits an electromagnetic wave having power P1 and frequency f. The emitted electromagnetic wave is applied to the grating 1 or the filling grating 2. Alternatively, the radiated electromagnetic wave is applied to the non-arranged portion 4 a or the arranged portion 4 b of the filling grid 4.

  Here, the electromagnetic wave irradiated to the filling grid 2 is referred to as a first electromagnetic wave, and the electromagnetic wave irradiated to the grid 1 is referred to as a second electromagnetic wave. Moreover, the electromagnetic wave irradiated to the arrangement | positioning part 4b is called 1st electromagnetic wave, and the electromagnetic wave irradiated to the non-arrangement part 4a is called 2nd electromagnetic wave.

  The electromagnetic wave detection unit (first electromagnetic wave detection unit and second electromagnetic wave detection unit) 36 detects an electromagnetic wave that has passed through the grid 1, the filled grid 2, or the filled grid 4, measures the power P 2, and transmits the transmittance of the characteristic measurement unit 40. It gives to the measurement part 42. It is also conceivable to detect reflected electromagnetic waves instead of transmitted electromagnetic waves.

  In other words, the first response electromagnetic wave that is a response (for example, transmission and reflection) by the filled grating 2 to the irradiated first electromagnetic wave and the second response (for example, transmission and reflection) by the grating 1 to the irradiated second electromagnetic wave. What is necessary is just to detect a response electromagnetic wave. Or it is the response (for example, transmission, reflection) by the non-arrangement part 4a with respect to the 1st response electromagnetic wave which is the response (for example, permeation, reflection) by the arrangement part 4b with respect to the irradiated first electromagnetic wave. What is necessary is just to detect a 2nd response electromagnetic wave.

  The characteristic measurement unit 40 measures the characteristic of the DUT 20 based on the detection result of the electromagnetic wave detection unit 36. The characteristic measuring unit 40 includes a transmittance measuring unit 42, a transmittance recording unit 44, and a refractive index deriving unit 46.

  The transmittance measuring unit 42 measures the transmittance of the electromagnetic wave based on the detection result of the electromagnetic wave detecting unit 36. That is, the electromagnetic wave transmittance of the filling grating 2 and the grating 1 is measured. Or the transmittance | permeability of the electromagnetic waves of the arrangement | positioning part 4b and the non-arrangement | positioning part 4a is measured. The transmittance is obtained by P2 / P1. However, if the reflection cannot be ignored, the influence of the reflection can be canceled by measuring P2 for the same object having a different thickness. This is well known and will not be described in detail.

  The transmittance recording unit 44 records the transmittance measured by the transmittance measuring unit 42 in association with the frequency of the electromagnetic wave.

  The refractive index deriving unit 46 derives the refractive index of the DUT 20 based on the measured transmittance. That is, when the transmittance measured based on the detection result of the first response electromagnetic wave at the frequency A is equal to the transmittance measured based on the detection result of the second response electromagnetic wave at the frequency B, the refraction of the DUT 20 The rate is derived based on A and B.

  Next, the operation of the first embodiment will be described.

  FIG. 7 is a flowchart showing the operation of the measuring apparatus according to the first embodiment. FIG. 8 is a graph for explaining a method for determining the refractive index of the DUT 20.

  Note that the scattering and absorption of the grating 1 and the packed grating 2 are negligible. For example, the materials of the lattice 1 and the filling lattice 2 satisfy such a condition. Or the thickness of the grating | lattice 1 and the filling grating | lattice 2 satisfy | fills such conditions.

In general, if the intensity at the point where an incident wave with an intensity of I ₀ travels through the substance by x is I (x), the attenuation (absorption) of the incident wave is I (x)
= I ₀ exp ^-αx

  Absorption is negligible when α (determined by the material) or x (thickness) in the above equation is very small.

First, the grid 1 (or the non-arranged portion 4a) is disposed between the electromagnetic wave irradiation unit 34 and the electromagnetic wave detection unit 36, and the second electromagnetic wave in a predetermined band is radiated from the electromagnetic wave irradiation unit 34. The electromagnetic wave detection unit 36 detects the transmitted electromagnetic wave (second response electromagnetic wave). Then, the transmittance measuring unit 42 measures the transmittance of the grating 1 (or the non-arranged portion 4a) (S10). The transmittance is obtained by P2 / P1. The measured transmittance is recorded in the transmittance recording unit 44 in association with the frequency of the second electromagnetic wave. However, the measuring device is used in air having a refractive index n ₀ (for example, 1).

In the example shown in FIG. 8, a graph G1 is illustrated in which the predetermined band is a band exceeding 0 THz and reaching 6 THz (terahertz), and the transmittance of the grating 1 (or the non-arranged portion 4a) is measured. This graph G1 can be expressed as T _n0 (f). That is, the transmittance T is a function of the refractive index n ₀ and frequency f.

  Next, the packed grid 2 (or the arrangement portion 4 b) is arranged between the electromagnetic wave irradiation unit 34 and the electromagnetic wave detection unit 36, and the first electromagnetic wave with the frequency A is emitted from the electromagnetic wave irradiation unit 34. The electromagnetic wave detection unit 36 detects the transmitted electromagnetic wave (first response electromagnetic wave). And the transmittance | permeability measurement part 42 measures the transmittance | permeability of the filling grating | lattice 2 (or arrangement | positioning part 4b) (S12). The transmittance is obtained by P2 / P1.

In the example shown in FIG. 8, the transmittance A = 40% of the filling grating 2 (or the arrangement portion 4b) is obtained with the frequency A = 1 THz (graph G2). This graph G2 can be expressed as T _nx (A). That is, the transmittance T _nx filling grating 2 (or placement portion 4b) in the frequency A is a function of the refractive indices n _x and frequency A of the object to be measured 20 (= 1 THz).

  Next, the refractive index deriving unit 46 determines the corresponding frequency B based on the recorded content of the transmittance recording unit 44 and the transmittance of the filled grating 2 (or the arrangement portion 4b) measured by the transmittance measuring unit 42 (S14). ). That is, with reference to FIG. 8, the refractive index deriving unit 46 transmits the transmittance (= 40%) measured based on the detection result (graph G2) of the electromagnetic wave detecting unit 36 at the frequency A (= 1 THz) and the corresponding frequency. The corresponding frequency B is determined such that the transmittance measured based on the detection result of the electromagnetic wave detection unit 36 in B becomes equal. The corresponding frequency B is 3.4 THz.

This means that T _n0 (B) = T _nx (A).

Finally, the refractive index deriving unit 46 derives the refractive index of the DUT 20 (S16). That is, the refractive index = B / A of the object to be measured 20, derives the refractive indices n _x of the object to be measured 20. In the example shown in FIG. 8, the refractive index n _x = 3.4 THz / 1 THz = 3.4. This uses the fact that B = n _x · A, is obtained by deriving the refractive indices n _x of the object to be measured 20.

  In the case of using the packed grid 4 shown in FIG. 17A, similarly, the transmittance of the non-arranged part 4a and the arranged part 4b is measured by irradiating electromagnetic waves. In this case, the characteristic measurement unit 40 can measure the difference in transmittance between the device under test 20a and the device under test 20b. When the packed grid 4 shown in FIG. 17B is used, electromagnetic waves are applied to measure the transmittance of the first arrangement portion 4c, measure the transmittance of the second arrangement portion 4d, and third. The transmittance of the arrangement portion 4e is measured. In this case, the characteristic measurement unit 40 can measure the difference in transmittance between the objects to be measured 20a, 20b, and 20c.

  According to the packed grid (integrated structure) 2 according to the first embodiment, the DUT 20 can be handled with advantage. For example, it is possible to easily measure the characteristics (for example, the refractive index) of the object 20 to be measured disposed inside the gap portion 12 of the packed grid 2.

  According to the measuring apparatus according to the first embodiment, by measuring the transmittance of electromagnetic waves in the filling grid (integrated structure) 2 and the grid (gap-arranged structure) 1, the characteristics of the object to be measured 20 (for example, , Refractive index) can be easily measured.

  According to the packed grid (integrated structure) 4 according to the first embodiment, the characteristics (for example, the measured object 20) can be obtained without using the grid 1 (without replacing the filled grid 2 with the grid 1). , Refractive index).

  FIG. 9 is a diagram for explaining changes of the graph G1 in which the transmittance of the grating 1 (or the non-arranged portion 4a) is measured with respect to the aperture a and the pitch p. When a and p are small (graph G1-1), the inclination is small, and when a and p are large (graph G1-2), the inclination is large.

  The maximum value of the corresponding frequency B is the frequency F1 (graph G1-1) and the frequency F2 (graph G1-2) at which the transmittance is a maximum value. The larger the maximum value of the corresponding frequency B, the larger the refractive index can be measured. Therefore, when a and p are small (graph G1-1), a wide range of refractive indexes can be measured. Conversely, when a and p are large (graph G1-2), the refractive index can be measured with high accuracy. This is because the transmittance varies greatly even if the refractive index is slightly different.

  Therefore, if it is desired to measure the refractive index in a wide range, it is preferable to use the filled gratings 2 and 4 with the apertures a and the pitch p made small. If it is desired to measure the refractive index with high accuracy, it is preferable to use the packed gratings 2 and 4 with the larger apertures a and pitches p.

Second Embodiment In the second embodiment, the grating (frequency characteristic adjusting member) 6 is used in parallel with the grating 1 and the filling grating 2 (or used in parallel with the filling grating 4). The point is different from the first embodiment.

  FIG. 10 is a diagram showing a configuration of a measuring apparatus for measuring the refractive index of the object 20 to be measured of the packed grating (integrated structure) 2 according to the second embodiment. The measuring apparatus according to the second embodiment is different from the first embodiment only in the grating (frequency characteristic adjusting member) 6. Other parts are the same as those in the first embodiment, and a description thereof will be omitted.

  The grating (frequency characteristic adjusting member) 6 may be the same as the grating 1. However, it is necessary that the object to be measured 20 of the packed grid 2 (or the arrangement portion 4b of the packed grid 4) and the grid 6 overlap each other. In addition, the distance between the grating 6 and the grating 1, the filling grating 2, and the filling grating 4 needs to be d = (λ / 2) · n (where n is a natural number). Note that λ is the wavelength of the electromagnetic wave corresponding to the corresponding frequency B. The grating 6 may have the same shape as the grating 1, but may have another shape as long as the above requirements are satisfied and the electromagnetic wave is partially transmitted and partially reflected.

  FIG. 11 is a diagram showing a transmittance graph G1 when the grating 6 is arranged in parallel to the grating 1 (or the non-arranged portion 4a of the filled grating 4) and a transmittance graph G1 ′ when the grating 6 is not arranged. is there. When the grating 6 is arranged parallel to the grating 1, resonance is established at the corresponding frequency B, so that the slope of the transmittance with respect to the frequency in the vicinity of the corresponding frequency B becomes larger than when the grating 6 is not arranged.

  That is, the transmittance graph G1 when the grating 6 is arranged in parallel to the grating 1 is a wavy line. In other words, since the configuration in which the grating 6 is arranged in parallel to the grating 1 has a structure equivalent to that of a Fabry-Perot etalon resonator, the transmittance graph G1 periodically has a peak of the transmission amount. Here, a sample having a slightly different refractive index, for example, a single-stranded DNA, a double-stranded DNA, and several types of proteins having different structures are considered as the DUT 20. The transmittance of the object to be measured 20 is measured. Since the refractive indexes are only slightly different, the transmittance is only slightly different if the grating 6 is not arranged. However, if the grating 6 is arranged, the transmittance varies greatly even with a slight difference in refractive index. Therefore, different transmittances can be obtained for each of the objects 20 to be measured, so that a difference in DNA binding state and protein structure can be determined. Here, a single strand of DNA is arranged as the measured object 20a in the non-arranged portion 4a shown in FIG. 17 (a), and a double strand of DNA is arranged as the measured object 20b in the arranged portion 4b shown in FIG. 17 (a). Then, the single-strand transmittance and double-strand transmittance of DNA can be obtained.

  The operation of the second embodiment is the same as that of the first embodiment. However, instead of disposing the grid 1 (or the non-arranged portion 4a) between the electromagnetic wave irradiation unit 34 and the electromagnetic wave detection unit 36, the grid 1 and the grid 6 (or the non-arranged portion 4a and the grid 6) are disposed in the electromagnetic wave irradiation unit 34 and It arrange | positions between the electromagnetic wave detection parts 36. Further, instead of arranging the filling grid 2 (or the arrangement part 4b) between the electromagnetic wave irradiation unit 34 and the electromagnetic wave detection unit 36, the filling grid 2 and the grid 6 (or the arrangement part 4b and the grating 6) are arranged in the electromagnetic wave irradiation unit 34 and It arrange | positions between the electromagnetic wave detection parts 36.

  According to the second embodiment, the refractive index of the DUT 20 can be measured with higher accuracy than in the first embodiment. Therefore, even if a sample having a slightly different refractive index is used as the object to be measured 20, such as DNA single-stranded or double-stranded or several types of proteins having different structures, the difference in DNA binding state and protein structure can be detected. Can be determined.

Third Embodiment A third embodiment is different from the first embodiment in that a filling grid (integrated structure) 8 has a base 11 and a conductor 14 is printed on the base 11.

  FIG. 12 is a plan view of the filling grid (integrated structure) 8 according to the third embodiment. The packed grid 8 includes a base portion 11, a conductor 14, and a device under test 20. The base 11 needs to have high electromagnetic wave transmittance and substantially constant in the frequency band of the electromagnetic wave to be irradiated. The base 11 is preferably paper or thin plastic (for example, an OHP sheet). The conductor 14 is printed on the base 11. An object to be measured 20 is arranged (or filled) in the gap 12 formed by the conductor 14.

  FIG. 13 is an enlarged perspective view of the conductor 14 of the filling grid 8. For convenience of illustration, the DUT 20 is omitted from the illustration. A gap 12 is formed by the conductor 14. More specifically, the gap portion 12 is surrounded by the conductor 14 in the XY plane. When the object to be measured 20 is arranged (or filled) in the gap portion 12, the object to be measured 20 is surrounded by the conductor 14 in the XY plane. In addition, it is the same as that of 1st embodiment that the space | gap part 12 is arranged in the vertical direction (Y direction) and the horizontal direction (X direction). Moreover, as long as the space | gap part 12 is arrange | positioned (for example, refer FIG. 5 and FIG. 14), it does not need to be arranged in the vertical direction (Y direction) and the horizontal direction (X direction).

  The measuring device and its operation according to the third embodiment are the same as those of the first embodiment.

  According to the packed grid 8 according to the third embodiment, the DUT 20 can be handled with advantage. For example, the refractive index of the device under test 20 can be easily measured.

Fourth Embodiment A measurement apparatus according to the fourth embodiment is different from the first embodiment in that a terahertz wave is irradiated onto the packed grating 4 and two-dimensional scanning is performed.

  FIG. 15 is a diagram illustrating a configuration of a measurement apparatus for measuring the refractive index of the DUT 20 of the packed grating 4 according to the fourth embodiment. The measurement apparatus according to the fourth embodiment includes a packed grating 4, an electromagnetic wave irradiation unit 30, an XY stage 50, an electromagnetic wave detection unit 60, a control / calculation unit 70, parabolic mirrors 80a, 80b, 80c, 80d, and a mirror. 90.

  The electromagnetic wave irradiation unit 30 emits terahertz waves. The XY stage 50 moves the filling grid 4 in the X direction and the Y direction. The electromagnetic wave detection unit 60 detects the terahertz wave that has passed through the filling grating 4. The control / calculation unit 70 controls the XY stage 50 and calculates the characteristics (for example, transmittance, refractive index, etc.) of the DUT 20 of the packed grating 4 based on the detection result of the electromagnetic wave detection unit 60. To do.

  The parabolic mirror 80a reflects the terahertz wave given from the mirror 90 and gives it to the parabolic mirror 80b. The parabolic mirror 80b reflects the terahertz wave given from the parabolic mirror 80a and irradiates the filling grating 4 with it. The terahertz wave is irradiated to one point (referred to as “focus”) on the filling grating 4. The parabolic mirror 80c reflects the terahertz wave that has passed through the filling grating 4 and supplies the reflected wave to the parabolic mirror 80d. The parabolic mirror 80d reflects the terahertz wave given from the parabolic mirror 80c and gives it to the electromagnetic wave detection unit 60. The mirror 90 reflects the terahertz wave emitted from the electromagnetic wave irradiation unit 30 and gives it to the parabolic mirror 80a.

  A display (not shown) can be connected to the control / calculation unit 70 to display the refractive index and the transmittance. Further, image processing (white as the refractive index or absorptance increases, and black as it decreases) may be displayed on the display.

  Next, the operation of the fourth embodiment will be described.

  The terahertz wave radiated from the electromagnetic wave irradiation unit 30 is reflected by the mirror 90 and the parabolic mirrors 80a and 80b, and is applied to the filling grating 4. Here, the XY stage 50 is controlled by the control / arithmetic unit 70, and each of the gaps 12 of the filling grating 4 (some of which the object to be measured 20 is arranged and some of which are not) are terahertz waves. Is moved in the X direction and the Y direction so that the focal point matches the gap 12. That is, two-dimensional scanning is performed. The terahertz wave that has passed through the gap 12 of the packed grating 4 is reflected by the parabolic mirrors 80 c and 80 d and applied to the electromagnetic wave detection unit 60. The electromagnetic wave detection unit 60 detects the terahertz wave that has passed through the filling grating 4. The control / calculation unit 70 calculates the characteristics (for example, transmittance, refractive index, etc.) of the DUT 20 of the packed grating 4 based on the detection result of the electromagnetic wave detection unit 60. The calculation method is the same as in the first, second, and third embodiments, and a description thereof is omitted.

  According to the fourth embodiment, since the transmittance and the refractive index of each of the gap portions 12 of the packed grating 4 can be measured, the characteristics of the object 20 to be measured of the packed grating 4 can be measured in detail and precisely.

  In the above embodiment, when the transmittance of the grating 1 (non-arranged portion 4a) and the filled grating 2 (arranged portion 4b) is measured, it can be seen that the frequency at which the transmittance reaches a maximum value moves. FIG. 16 is a diagram showing the shift of the frequency at which the transmittance reaches the maximum value by the grating 1 and the filling grating 2. As shown in FIG. 16, the frequency Fa (grid 1: graph Ga) at which the transmittance reaches a maximum value moves to Fb (filled lattice 2: graph Gb). Thereby, what the device under test 20 is (which is also a kind of characteristic of the device under test 20) can be specified. Further, the transmittance characteristic changes depending on the filling state of the object to be measured 20 into the gap portion 12. Thereby, it is possible to specify the degree of filling (that is, whether it is too much).

  In addition, said embodiment is realizable as follows. A medium in which a program for realizing each of the above-described parts (for example, the characteristic measurement unit 40) is recorded in a medium reading device of a computer having a CPU, a hard disk, and a medium (floppy (registered trademark) disk, CD-ROM, etc.) And install it on the hard disk. The above embodiment can also be realized by such a method.

  Note that the refractive index measurement using the grating 1 and the filling grating 2 as described above can be measured at any frequency by appropriately designing the mechanical size of the grating 1. In particular, when the frequency is in the millimeter wave band to the terahertz band (frequency: 100 GHz to 10 THz, wavelength: 3 mm to 30 μm), the amount of the object to be measured 20 required when arranging (for example, filling) the object to be measured 20 is It is advantageous that only a small amount is required.

  More specifically, when compared with a band having a frequency lower than the above band, the size of the grating 1 can be reduced, and a small amount of the object to be measured 20 is required. When compared with a band having a higher frequency than the above band (a near-infrared region having a wavelength as short as light (that is, 1 μm or less)), it is easy to place or fill the DUT 20.

  From the viewpoint of industrial application, if the above measurement method is applied in the millimeter wave band to the terahertz band, a small DNA chip, protein chip, etc. can be easily manufactured, and it can be applied to biopolymer interaction measurement, etc. It seems to be. Analytical devices have been developed that use surface plasmon resonance in the near-infrared region to detect biopolymer interactions, and detect minute changes in the refractive index of the sensor. There are drawbacks that a large amount of sample is required to keep the liquid sample flowing, the apparatus is large, and expensive.

1 is a perspective view of a lattice (gap arrangement structure) 1 according to a first embodiment of the present invention. FIG. 2 is an XY plan view (FIG. 2A) of a lattice (gap arrangement structure) 1 according to the first embodiment and an XY plan view (FIG. 2B) of a filling lattice (integrated structure) 2. FIG. FIG. 3 is a plan view showing one vicinity of a gap 12 of the lattice 1. FIG. 6 is an XY plan view of a filling grid (integrated structure) 4. 4 is an XY plan view for explaining the definition of the lattice 1; FIG. It is a figure which shows the structure of the measuring apparatus for measuring the refractive index of the to-be-measured object 20 of the filling grating | lattice (integral structure) 2 concerning 1st embodiment. It is a flowchart which shows operation | movement of the measuring apparatus concerning 1st embodiment. 4 is a graph for explaining a method of determining a refractive index of a device under test 20. It is a figure for demonstrating the change with respect to the aperture a and the pitch p of the graph G1 which measured the transmittance | permeability of the grating | lattice 1 (or non-arranged part 4a). It is a figure which shows the structure of the measuring apparatus for measuring the refractive index of the to-be-measured object 20 of the filling grating | lattice (integral structure) 2 concerning 2nd embodiment. It is a figure which shows the transmittance | permeability graph G1 'when not arrange | positioning the transmittance | permeability graph G1 when the grating | lattice 6 is arrange | positioned in parallel with the grating | lattice 1 (or the non-arranged part 4a of the filling grating | lattice 4). It is a top view of the filling grid | lattice (integral structure) 8 concerning 3rd embodiment. FIG. 6 is an enlarged perspective view of a conductor 14 of a filling grid 8. It is an XY plan view of the lattice 1 when there is only one gap portion 12. It is a figure which shows the structure of the measuring apparatus for measuring the refractive index of the to-be-measured object 20 of the filling grating | lattice 4 concerning 4th embodiment. It is a figure which shows the movement of the frequency from which the transmittance | permeability takes the maximum value with the grating | lattice 1 and the filling grating | lattice 2. FIG. An XY plan view of the filling grid 4 when another object to be measured is arranged in the non-arranged portion 4a (FIG. 17A) and an XY plan view of the filling grid 4 in which three kinds of objects to be measured are arranged (FIG. 17). (B)). FIG. 3 is an XY plan view of the object to be measured 20 disposed on the surface of the grating 1.

Explanation of symbols

1 Lattice (void arrangement structure)
10 conductive plate 11 base 12 gap (opening)
14 Conductor 2 Filling grid (integrated structure)
20 DUT 4 Packing grid (integrated structure)
4a Non-arranged part 4b Arranged part 6 Lattice (frequency characteristic adjusting member)
8 Filling grid (integrated structure)
32 radiation control part 34 electromagnetic wave irradiation part (first electromagnetic wave irradiation means and second electromagnetic wave irradiation means)
36 Electromagnetic wave detection unit (first electromagnetic wave detection means and second electromagnetic wave detection means)
40 Characteristic Measuring Unit 42 Transmittance Measuring Unit 44 Transmittance Recording Unit 46 Refractive Index Deriving Unit

Claims (21)

An object to be measured whose characteristics are measured by irradiating electromagnetic waves;
A gap arrangement structure in which a gap surrounded by a conductor is arranged in a predetermined plane;
Integrated structure with An integrated structure according to claim 1,
The object to be measured is disposed inside the gap,
Integrated structure. An integrated structure according to claim 1,
An arrangement member in which the object to be measured is arranged;
The arrangement member is arranged on the surface of the gap arrangement structure.
Integrated structure. An integrated structure according to any one of claims 1 to 3,
In the gap arrangement structure, the gap portions having the same shape are arranged at predetermined intervals in a predetermined direction.
Integrated structure. An integrated structure according to claim 4, wherein
The gap arrangement structure is a two-dimensional lattice in which openings penetrating a conductor are arranged in a vertical direction and a horizontal direction.
Integrated structure. An integrated structure according to any one of claims 1 to 3,
The gap arrangement structure has a base on which the conductor is arranged.
Integrated structure. An integrated structure according to claim 6,
The conductor is printed on the base;
Integrated structure. An integrated structure according to any one of claims 1 to 7,
An arrangement part in which the object to be measured is arranged in the gap; and
A non-arranged part in which the object to be measured is not arranged in the gap,
Integrated structure having An integrated structure according to any one of claims 1 to 7,
There are two or more objects to be measured arranged in the gap,
Integrated structure. First electromagnetic wave irradiation means for irradiating the integrated structure according to any one of claims 1 to 7 with a first electromagnetic wave;
First electromagnetic wave detection means for detecting a first response electromagnetic wave that is a response by the integrated structure to the irradiated first electromagnetic wave;
A second electromagnetic wave irradiation means for irradiating the gap arrangement structure body in which the measurement object is not arranged in the gap portion with a second electromagnetic wave;
A second electromagnetic wave detecting means for detecting a second response electromagnetic wave that is a response by the gap arrangement structure to the irradiated second electromagnetic wave;
Based on the detection result of the first electromagnetic wave detection means and the detection result of the second electromagnetic wave detection means, characteristic measurement means for measuring the characteristic of the object to be measured;
Measuring device. First electromagnetic wave irradiation means for irradiating the first electromagnetic wave to the arrangement portion in the integrated structure according to claim 8;
First electromagnetic wave detection means for detecting a first response electromagnetic wave that is a response by the arrangement portion to the irradiated first electromagnetic wave;
A second electromagnetic wave irradiation means for irradiating the non-arranged portion with a second electromagnetic wave;
A second electromagnetic wave detecting means for detecting a second response electromagnetic wave that is a response by the non-arranged portion to the irradiated second electromagnetic wave;
Based on the detection result of the first electromagnetic wave detection means and the detection result of the second electromagnetic wave detection means, characteristic measurement means for measuring the characteristic of the object to be measured;
Measuring device. Electromagnetic wave irradiation means for irradiating each type of the measurement object in the integrated structure according to claim 9 with electromagnetic waves;
Electromagnetic wave detecting means for detecting a response electromagnetic wave that is a response by the integrated structure to the electromagnetic wave irradiated;
Based on the detection result of the electromagnetic wave detection means, characteristic measurement means for measuring the characteristic of the object to be measured;
Measuring device. A measuring device according to any one of claims 10 to 12,
The characteristic measuring means comprises:
Based on the detection result of the first electromagnetic wave detection means and the detection result of the second electromagnetic wave detection means, a transmittance measurement means for measuring the transmittance of the electromagnetic wave,
A refractive index deriving means for deriving a refractive index of the object to be measured based on the measured transmittance;
Measuring device. The measuring device according to claim 13,
In the refractive index deriving unit, the transmittance measured based on the detection result of the first electromagnetic wave detecting unit at the frequency A is equal to the transmittance measured based on the detection result of the second electromagnetic wave detecting unit at the frequency B. A refractive index of the object to be measured is derived based on A and B,
measuring device. 15. The measuring device according to claim 14, wherein
With a frequency characteristic adjustment member,
In the vicinity of the frequency B, the measurement apparatus in which the slope of the transmittance with respect to the frequency is larger than when the frequency characteristic adjusting member is not provided. A first electromagnetic wave is irradiated to an integrated structure having an object to be measured whose characteristics are measured by irradiating an electromagnetic wave and a void arrangement structure in which a void surrounded by a conductor is arranged on a predetermined plane. One electromagnetic wave irradiation process;
A first electromagnetic wave detection step of detecting a first response electromagnetic wave that is a response by the integrated structure to the irradiated first electromagnetic wave;
A second electromagnetic wave irradiation step of irradiating a second electromagnetic wave to the gap arrangement structure in which the object to be measured is not arranged in the gap;
A second electromagnetic wave detection step of detecting a second response electromagnetic wave that is a response by the gap arrangement structure to the irradiated second electromagnetic wave;
Based on the detection result of the first electromagnetic wave detection step and the detection result of the second electromagnetic wave detection step, a characteristic measurement step of measuring the characteristic of the object to be measured;
Measuring method. The object to be measured in the void portion in an integral structure having an object to be measured whose characteristics are measured by irradiating electromagnetic waves and a void arrangement structure in which a void portion surrounded by a conductor is arranged on a predetermined plane A first electromagnetic wave irradiation step of irradiating a first electromagnetic wave to an arrangement part where an object is arranged;
A first electromagnetic wave detection step of detecting a first response electromagnetic wave that is a response by the arrangement portion to the irradiated first electromagnetic wave;
A second electromagnetic wave irradiation step of irradiating a second electromagnetic wave to a non-arranged portion in which the object to be measured is not arranged in the gap in the integrated structure;
A second electromagnetic wave detection step of detecting a second response electromagnetic wave that is a response by the non-arranged portion to the irradiated second electromagnetic wave;
Based on the detection result of the first electromagnetic wave detection step and the detection result of the second electromagnetic wave detection step, a characteristic measurement step of measuring the characteristic of the object to be measured;
Measuring method. An integrated structure having an object to be measured whose characteristics are measured by irradiating an electromagnetic wave, and a void arrangement structure in which a void surrounded by a conductor is arranged in a predetermined plane, An electromagnetic wave irradiation step of irradiating each type of the measurement object in the integrated structure having two or more types of the measurement object arranged; and
An electromagnetic wave detection step of detecting a response electromagnetic wave that is a response by the integrated structure to the irradiated electromagnetic wave;
Based on the detection result of the electromagnetic wave detection step, a characteristic measurement step for measuring the characteristic of the object to be measured,
Measuring method. A first electromagnetic wave is irradiated to an integrated structure having an object to be measured whose characteristics are measured by irradiating an electromagnetic wave and a void arrangement structure in which a void surrounded by a conductor is arranged on a predetermined plane. One electromagnetic wave irradiation means;
First electromagnetic wave detection means for detecting a first response electromagnetic wave that is a response by the integrated structure to the irradiated first electromagnetic wave;
A second electromagnetic wave irradiation means for irradiating the gap arrangement structure body in which the measurement object is not arranged in the gap portion with a second electromagnetic wave;
A second electromagnetic wave detecting means for detecting a second response electromagnetic wave that is a response by the gap arrangement structure to the irradiated second electromagnetic wave;
A program for causing a computer to execute a measurement process in a measurement apparatus comprising:
A program for causing a computer to execute a characteristic measurement process for measuring the characteristic of the object to be measured based on the detection result of the first electromagnetic wave detection means and the detection result of the second electromagnetic wave detection means. The object to be measured in the void portion in an integral structure having an object to be measured whose characteristics are measured by irradiating electromagnetic waves and a void arrangement structure in which a void portion surrounded by a conductor is arranged on a predetermined plane A first electromagnetic wave irradiation means for irradiating the first electromagnetic wave to the arrangement part where the object is arranged;
First electromagnetic wave detection means for detecting a first response electromagnetic wave that is a response by the arrangement portion to the irradiated first electromagnetic wave;
A second electromagnetic wave irradiation means for irradiating a second electromagnetic wave to a non-arranged portion in which the object to be measured is not arranged in the gap in the integrated structure;
A second electromagnetic wave detecting means for detecting a second response electromagnetic wave that is a response by the non-arranged portion to the irradiated second electromagnetic wave;
A program for causing a computer to execute a measurement process in a measurement apparatus comprising:
A program for causing a computer to execute a characteristic measurement process for measuring the characteristic of the object to be measured based on the detection result of the first electromagnetic wave detection means and the detection result of the second electromagnetic wave detection means. An integrated structure having an object to be measured whose characteristics are measured by irradiating an electromagnetic wave, and a void arrangement structure in which a void surrounded by a conductor is arranged in a predetermined plane, Electromagnetic wave irradiation means for irradiating electromagnetic waves to each type of the measurement object in an integrated structure having two or more types of the measurement object arranged; and
Electromagnetic wave detecting means for detecting a response electromagnetic wave that is a response by the integrated structure to the electromagnetic wave irradiated;
A program for causing a computer to execute a measurement process in a measurement apparatus comprising:
A program for causing a computer to execute a characteristic measurement process for measuring the characteristic of the object to be measured based on the detection result of the electromagnetic wave detection means.

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