JP2007001831A - Spacer for image display device and image display device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a dimensionally accurate spacer for an image display device. <P>SOLUTION: A glass base material comprising the following A-E components, having ≥550°C glass transition temperature, 74-94×10<SP>-7</SP>/°C coefficient of thermal expansion and ≥50°C difference of temperature between a yield point and glass transition point is used as the spacer. The components are: A component: 30-60 wt.% SiO<SB>2</SB>, B component: 2-20 wt.% B<SB>2</SB>O<SB>3</SB>, C component: 20-60 wt.% in total of one or more kinds selected from 0-20 wt.% MgO, 0-30 wt.% CaO and 5-50 wt.% each of SrO and BaO, D component: 0.6-15 wt.% in total of one or more kinds selected from 0-10 wt.% each of Li<SB>2</SB>O, Na<SB>2</SB>O, K<SB>2</SB>O and Cs<SB>2</SB>O and E component: one or more kinds selected from 0-15 wt.% Al<SB>2</SB>O<SB>3</SB>, 0-15 wt.% ZnO, 0-10 wt.% ZrO<SB>2</SB>and 0-30 wt.% Ln<SB>2</SB>O<SB>3</SB>(where Ln expresses Y, La, Gd and Yb). <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to a spacer used to hold an airtight space, and more particularly to a spacer disposed in an airtight container of an image display device.

  Image display devices include various displays such as an electron beam excitation display, a plasma display, a liquid crystal display, and an EL display. In recent years, research and development have been progressed toward the enlargement of the screen. In these image display devices, the larger the display screen, the greater the strength of the hermetic container constituting the envelope of the image display device. A spacer for holding the airtight space is arranged.

As an example of such a spacer, Patent Document 1 discloses a line equivalent to soda-lime silica glass or a high strain point glass for a display substrate that is usually used for a front plate and a rear plate constituting an airtight container of an electron beam excitation display. A spacer having an expansion coefficient and made of alkali-free glass is described. More specifically, SiO ₂ is 10 to 35 wt%, RO (where R represents an alkaline earth metal) 20 to 60 wt%, B ₂ O ₃ is 9 to 30 wt%, and Al ₂ O ₃ is 0 to 0 wt%. The spacer of the electron beam excitation display is a spacer composed of non-alkali glass having a glass composition containing 10 wt% and substantially not containing an alkali metal and having a linear expansion coefficient of 76 to 92 × 10 ⁻⁷ / ° C. As a result, it does not cause problems such as electric field breakdown due to alkali components, and its linear expansion coefficient is almost equal to the linear expansion coefficient of soda lime silica glass or high strain point glass for display substrates. Therefore, it is described that there is no problem such as destruction due to the difference in thermal expansion.

JP 2002-104839 A

  However, when the spacer is formed from the glass having the above composition, there is a problem that the processing accuracy does not increase so much. In particular, in an image display device having a large display area in which a large number of spacers are arranged, a spacer with high dimensional accuracy is required, but glass having the above composition may not be able to meet this requirement sufficiently. there were.

  An object of the present invention is to provide a spacer for an image display device with higher dimensional accuracy and an image display device including the same.

The present invention
30-60 wt% SiO ₂ (A component);
_{2 to 20} wt% B ₂ O ₃ (B component);
Selected from 0 to 20 wt% MgO, 0 to 30 wt% CaO, and 0 to 50 wt% SrO and BaO, respectively, one or more of 20 wt% or more, or two or more of the total amount of 20 to 60 wt% (component C) )When,
0-10 wt% of Li ₂ O, respectively, Na ₂ O, is selected from K ₂ O and Cs ₂ O, either one or the total amount of more than 0.6 wt% is 0.6～15Wt% of two or more ( D component)
When,
From 0 to 15 wt% Al ₂ O ₃ , 0 to 15 wt% ZnO, 0 to 10 wt% ZrO ₂ and 0 to 30 wt% Ln ₂ O ₃ (where Ln represents Y, La, Gd, Yb) It has a composition containing one or more selected (E component), has a glass transition temperature of 550 ° C. or higher, and a thermal expansion coefficient at 100 to 300 ° C. of 74 to 94 × 10 ^−7. The present invention provides a spacer for an image display device, which has a glass substrate that is / ° C and has a difference between a bending point temperature and a glass transition temperature of 50 ° C or more.

  Further, the present invention is an image display device comprising an image display member and a spacer for holding an airtight space in the airtight container in the airtight container, wherein the spacer is the spacer. It also provides an image display device.

  ADVANTAGE OF THE INVENTION According to this invention, the spacer for image display apparatuses with high dimensional accuracy and an image display apparatus provided with the same can be provided.

  The spacer of the present invention and an image display device using the same will be described below.

  The spacer for an image display device of the present invention includes an insulating spacer made of a glass substrate and a conductive spacer having a resistor or a resistance film on the surface of the glass substrate.

The glass substrate of the spacer for an image display device of the present invention has 30 to 60 wt% of SiO ₂ (A component), _{2 to 20} wt% of B ₂ O ₃ (B component), 0 to 20 wt% of MgO, 0 ˜30 wt% CaO and 0 to 50 wt% SrO and BaO, respectively, 20 wt% or more, or two or more (C component) with a total amount of 20 to 60 wt%, and 0 to 10 wt. % Li ₂ O, Na ₂ O, K ₂ O and Cs ₂ O, 0.6 wt% or more, or two or more (D component) with a total amount of 0.6 to 15 wt%, From 0 to 15 wt% Al ₂ O ₃ , 0 to 15 wt% ZnO, 0 to 10 wt% ZrO ₂ and 0 to 30 wt% Ln ₂ O ₃ (where Ln represents Y, La, Gd, Yb) One or more selected (E component) Having a composition with.

The content of SiO ₂ is a component A, 30 to 60 wt%, preferably 36~50wt%. If the SiO ₂ content is less than 30 wt%, the viscosity change with respect to the glass temperature will be abrupt, which will adversely affect the drawing accuracy. If it exceeds 60 wt%, the melting temperature will be high, making the drawing work difficult, and the necessary expansion. The coefficient cannot be maintained.

The content of B ₂ O ₃ is a component B, 2 to 20 wt%, preferably 5 to 15 wt%. B ₂ O ₃ is a component that lowers the glass melting temperature and stabilizes the glass, but if it is less than 2 wt%, the effect cannot be sufficiently obtained, and if it exceeds 20 wt%, conversely, While decreasing stability, the viscosity change with respect to temperature becomes abrupt, which adversely affects the drawing processing accuracy.

  C component is 1 type, or 2 or more types selected from MgO, CaO, SrO, and BaO. MgO, CaO, SrO and BaO are all components that lower the melting temperature of glass and make it easier to vitrify.

  However, when MgO exceeds 20 wt%, the stability of the glass is impaired. Therefore, when MgO is contained, the range is 20 wt% or less, preferably 15 wt% or less. When CaO exceeds 30 wt%, the stability of the glass is impaired, and stable hot drawing cannot be performed. Therefore, when CaO is contained, the content is 30 wt% or less. Preferably it is 25 wt% or less. If SrO and BaO each exceed 50 wt%, the expansion coefficient becomes too large, and the required glass transition temperature cannot be maintained. For this reason, when it contains SrO or BaO, it is 50 wt% or less respectively, Preferably it is 45 wt% or less.

  If the amount of MgO, CaO, SrO and BaO selected as the C component or the total amount of two or more is less than 20 wt%, the glass melting temperature becomes high and glass production becomes difficult. In the case of two or more kinds, vitrification becomes difficult if the total amount exceeds 60 wt%, the required coefficient of thermal expansion cannot be maintained, and the viscosity change with temperature becomes abrupt, which adversely affects the drawing processing accuracy. . For this reason, the amount in the case of one type is 20 wt% or more, preferably 24 wt% or more, with the upper limit of the above range being limited, and the total amount in the case of two or more types is 20 to 60 wt%, preferably 24 to 50 wt% is there.

D ingredients are Li ₂ O, Na ₂ O, one or two or more selected from K ₂ O and Cs ₂ O. Li ₂ O, Na ₂ O, K ₂ O, and Cs ₂ O all provide necessary drawing accuracy.

However, if each exceeds 10 wt% alone, the expansion coefficient becomes too large and significant deterioration occurs when voltage is applied. Therefore, Li ₂ O, Na ₂ O, K ₂ O and Cs ₂ O are each 10 wt% or less. Preferably, it is 6 wt% or less.

Further, if the amount of one kind of Li ₂ O, Na ₂ O, K ₂ O and Cs ₂ O selected as the D component or the total amount of two or more kinds is less than 0.6 wt%, the required drawing accuracy can be obtained. Absent. Further, in the case of two or more types, if the total amount exceeds 15 wt%, the expansion coefficient becomes too large, and significant deterioration occurs during voltage application. For this reason, the amount in the case of one type is 0.6 wt% or more with the upper limit of the above range as the limit, and the total amount in the case of two or more types is 0.6 to 15 wt%, preferably 0.6 to 10 wt% is there.

The content of Al ₂ O ₃ in the E component is 0 to 15 wt%, preferably 0 to 10 wt%. Al ₂ O ₃ is an optional component that has an effect of increasing the glass transition point, slowing the viscosity change with respect to temperature, and improving the environmental resistance, but if its content exceeds 15 wt%, the melting temperature As a result, vitrification becomes difficult.

  The content of ZnO in the E component is 0 to 15 wt%, preferably 0 to 10 wt%. ZnO is an optional component that lowers the melting temperature of glass and makes it easier to vitrify, but if it exceeds 15 wt%, the thermal expansion coefficient becomes too small.

The content of ZrO _{2 in} the E component is 0 to 10 wt%, preferably 0 to 7 wt%. ZrO ₂ is an optional component that contributes to improving the environmental resistance of the glass. However, if it exceeds 10 wt%, the melting temperature becomes high, and at the same time, the stability of the glass is impaired, making vitrification difficult.

The content of Ln ₂ O ₃ (wherein Ln represents Y, La, Gd, Yb) in the E component is 0-30 wt%, preferably 0-20 wt%. Ln ₂ O ₃ is an optional component that raises the glass transition temperature, but if it exceeds 30 wt%, the melting temperature becomes high, and as a result, vitrification becomes difficult.

Note that a rare earth oxide other than the above _{(CeO 2, Pr 6 O 11} , Nd 2 O 3, Sm 2 O 3, Eu 2 O 3, Tb 4 O 7, Dy 2 O 3, Ho 2 O 3, Er 2 O ₃ , Tm ₂ O ₃ , Lu ₂ O _3, etc.) are components that easily cause coloration in the glass, but are in the same amount as the above four kinds of rare earth oxides within a range that does not greatly affect the properties. Can be used arbitrarily.

  The glass substrate having the above composition is excellent in stability of glass and excellent in mechanical and chemical strength.

The glass substrate having the above composition can have a glass transition temperature (Tg) of 550 ° C. or higher, and has sufficient resistance to heat treatment in an assembly process of an image display device mounted as a spacer. The coefficient of thermal expansion (α) can be in the range of 74 to 94 × 10 ⁻⁷ / ° C. at 100 ° C. to 300 ° C., and matching with the coefficient of thermal expansion of the members constituting the airtight container described later of the image display device. Is also good.

  Furthermore, since the glass having the above composition can set the difference between the glass bending point temperature (At) and the glass transition temperature (Tg) to 50 ° C. or higher, Its dimensional accuracy is excellent. In particular, when the amount of the C component is within the above-mentioned preferable range, the difference between the glass bending point temperature (At) and the glass transition temperature (Tg) can be 55 ° C. or higher, and the glass is thermoformed. The resulting glass substrate is further excellent in dimensional accuracy.

  The manufacturing method of the spacer for an image display device of the present invention is not particularly limited, and various conventional methods are used as appropriate.

  That is, a glass substrate having a predetermined size is cut out from the glass base material having the composition according to the present invention, or is heat-formed to a desired size from the glass base material having the composition according to the present invention. The In particular, among the thermoforming methods, the glass is stretched while being heated to a temperature at which the glass is substantially softened and deformed, and a glass substrate having a desired shape is produced by cutting the stretched glass member into a predetermined length. The so-called heating drawing method is suitable for the glass having the composition according to the present invention, and enables the production of a highly accurate spacer.

  The shape of the spacer for an image display device of the present invention is not particularly limited, such as a plate shape, a columnar shape, or a spherical shape, and is appropriately selected according to the requirements of the applied image display device.

  In addition, the size, the number of arrangement, the arrangement pitch, and the like of the spacer for the image display device according to the present invention are appropriately set according to the requirements of the applied image display device to such an extent that sufficient maintenance of the airtight space can be achieved. However, the size is preferably in the range of 0.05 mm to 3 mm in thickness and in the range of 1 mm to 5 mm in height.

  FIG. 1 is a schematic perspective view with a part cut away when the spacer of the present invention is applied to an image display device.

  In FIG. 1, on the inner surface of the face plate 1 on the image display surface side, a color filter or the like is disposed in a liquid crystal display or a plasma display, and an anode electrode and a phosphor are disposed in an electron beam excitation display. On the rear plate 2, an electron source or the like is disposed in the electron beam excitation display, and an EL element or the like is disposed in the EL display.

In FIG. 1, a face plate 1 and a rear plate 2 are sealed by a sealing member 3, and the inside of the face plate 1 and the rear plate 2 is an airtight atmosphere. Further, this airtight atmosphere is a reduced pressure atmosphere of about 10 ⁻⁴ Pa to 10 ⁻⁶ Pa in the electron beam excitation display, an excitation gas is enclosed in the plasma display, and a liquid crystal compound is enclosed in the liquid crystal display.

  In FIG. 1, a spacer 4 according to the present invention has a glass base material having the glass composition described above, and is configured by joining a face plate 1 and a rear plate 2 with a sealing member 3 via an outer frame 9. It arrange | positions in the airtight container made in order to hold | maintain the airtight space, and hold | maintains the said airtight space from the inside of the said airtight container.

  The image display device shown in FIG. 1 includes the spacer 4 of the present invention, and therefore has a sufficiently held airtight space, particularly without distortion of the display image and buckling of the spacer 4, and is excellent. Present a display image.

  Hereinafter, the present invention will be described more specifically with reference to Examples and Comparative Examples.

[Examples 1 to 12, Comparative Examples 1 to 4]
Glass base materials having compositions as shown in Table 1 and Table 2 were prepared.

  Each glass base material having the above composition is stretched while being heated at the stretching temperatures in Tables 1 and 2, and the stretched glass member is cut into a predetermined length, as shown in FIG. 50 glass substrates each having a thickness t of 0.2 mm, a height h of 1.6 mm, and a length l of 850 mm were prepared for each of the glass base materials.

(Verification 1)
Verification regarding the dimensional accuracy was performed on all the glass substrates prepared as described above. In this verification, the height and thickness of 50 glass substrates obtained from the same glass base material are measured, the respective average values are obtained, and the maximum amount of thickness deviation tΔ (μm from this average value) ) And the maximum amount of deviation hΔ (μm).

(Verification 2)
Verification about a pressure | voltage resistance was performed with respect to all the glass base materials created above. In this verification, as shown in FIG. 3, the same glass is contained in an airtight container composed of a pair of glass substrates 7, 8 and an outer frame 9 disposed between the pair of glass substrates 7, 8. 50 glass substrates 5 obtained from the base material are arranged, and the inside of the airtight container is depressurized to about 10 ⁻⁴ Pa by a vacuum pump (not shown) connected to the exhaust pipe 10, and then the glass substrates 7, 8. A potential difference of 10 kV is applied for about 30 min between electrodes (not shown) formed on the entire surface of each hermetic container. Then, the airtight container was disassembled, each glass substrate 5 was taken out, and the presence or absence of discharge was verified.

  The above results are shown in Table 3.

  As is clear from the results of Table 3, the glass substrate of this example has extremely high dimensional accuracy, while the glass substrates of Comparative Examples 1 to 4 have a dimensional accuracy of Low. Moreover, in the glass base material of the comparative example, the discoloration part which seems to be a discharge trace clearly was confirmed by the base material except the comparative example 3, but it was not confirmed by the glass base material of a present Example.

(Verification 3)
In addition, a plurality of stripe-shaped grooves were formed in advance on each glass base material having the composition shown in Table 1 and Table 2 by grinding. The glass base material with the groove is stretched in the length direction of the groove while being heated to 760 ° C., and the stretched glass member is cut into a predetermined length to obtain a thickness t as shown in FIG. 0.2 mm, height h is 1.6 mm, length l is 850 mm, groove depth d is 8 μm, groove width x is 15 μm, and groove pitch p is 30 μm. 50 sheets were prepared for each material. For all of these glass substrates, in the same manner as in verification 1, verification regarding dimensional accuracy was performed. In this verification, the groove depth d and the groove width x of 50 glass substrates obtained from the same glass base material are measured, the respective average values are obtained, and the depth from this average value is obtained. The maximum deviation amount dΔ (μm) and the maximum deviation amount xΔ (μm) of width were calculated.
The results are shown in Table 4.

  As is clear from the results in Table 4, the glass substrate of this example has a very high dimensional accuracy, while the glass substrate of the comparative example has a lower dimensional accuracy than this example.

(Verification 4)
Furthermore, a W-Ge-N resistive film having a thickness of 200 nm was formed on the entire surface of the glass substrate prepared as described above. Such a resistive film was formed by simultaneously sputtering a W targetter and a Ge target with a high frequency power source. The sputtering gas is a mixed gas of Ar: N ₂ = 1: 2, and the total pressure is 1 mTorr. The resistance film formed under the above conditions had a sheet resistance of 1 × 10 ¹² Ω / □.

With respect to all the glass substrates coated with the above-described resistance film, verification regarding withstand voltage was performed. In this verification, similarly to the above-described verification 2, 50 glass substrates 5 obtained from the same glass base material are arranged in an airtight container shown in FIG. After the pressure inside the hermetic container is reduced to about 10 ⁻⁴ Pa with a pump (not shown), a potential difference of 10 kV is applied between the electrodes (not shown) formed on the entire surface of each hermetic container of the glass substrates 7 and 8. Apply for 30 min. Then, the airtight container was disassembled, each glass substrate was taken out, and the presence or absence of discharge was verified.

  The results are shown in Table 5.

  As is clear from the results in Table 5, in the glass substrate of the comparative example, a discolored portion that was clearly considered to be a discharge mark was confirmed in the substrate except for the comparative example 3, but in the glass substrate of this example, It was not confirmed. In particular, in Comparative Example 4 (Comparative Example with a large amount of alkali metal), it was confirmed that a part of the resistance film was peeled off from the glass substrate.

Example 12
Below, the example of the image display apparatus provided with the spacer using the glass substrate of Examples 1-11 is given.

The glass substrate surfaces of Examples 1 to 11 described above are coated with a resistance film by the following method. The resistance film preferably has a sheet resistance of 10 ¹⁰ Ω / □ to 10 ¹⁴ Ω / □, and the material used is appropriately selected from metals, semiconductors, and the like suitable for obtaining a desired sheet resistance.

A W-Ge-N resistive film is formed to a thickness of 200 nm on the surface of the glass substrate of each of the above examples by simultaneously sputtering a W targetter and a Ge target with a high frequency power source as an antistatic resistive film. Formed. The sputtering gas is a mixed gas of Ar: N ₂ = 1: 2, and the total pressure is 1 mTorr. The resistance film formed under the above conditions had a sheet resistance of 1 × 10 ¹² Ω / □.

  Further, a low resistance film having a resistance lower than that of the resistance film was formed on end faces (corresponding to Z in FIG. 2) which are in contact with a face plate side and a rear plate side which will be described later. In the end face region, a 10 nm thick Ti film and a 200 nm thick Pt film were both formed in a vapor phase by sputtering in a 200 μm band. At this time, the Ti film is a base layer that reinforces the film adhesion of the Pt film. Thus, a spacer further provided with a low resistance film was obtained. The film thickness of the low resistance film at this time was 210 nm, and the sheet resistance was 10Ω / □.

  As shown in FIG. 4, a plurality of spacers prepared as described above are arranged in an airtight container that is an envelope of the image display device. FIG. 4 is an exploded perspective view for easy understanding of the inside.

  In FIG. 4, reference numeral 11 denotes a face plate, and a fluorescent film 12 and a metal back 13 are disposed on the inner surface thereof.

  In FIG. 4, reference numeral 14 denotes a rear plate, on the inner surface of which an electron source in which a plurality of electron-emitting devices 15 are matrix-wired by a plurality of row-direction wirings 16 and a plurality of column-direction wirings 17 is arranged. . The electron-emitting device 15, the row direction wiring 16, and the column direction wiring 17 are partly omitted for simplification of the drawing.

In FIG. 4, reference numeral 18 denotes an outer frame, and together with the face plate 11 and the rear plate 14, an airtight container that maintains a reduced pressure atmosphere of about 10 ⁻⁴ Pa is formed. The spacers 6 are arranged so as to maintain a distance between the face plate 11 and the rear plate 14. The spacer 6 is partially omitted for simplification of the drawing.

  Regarding the method for manufacturing the electron source, for example, JP 2000-31594 A and the method for installing the spacer in the hermetic container are performed by known methods described in JP 2000-251648 A, and the like. .

  The image display device manufactured in the above embodiment exhibits an excellent display image without any distortion of the display image or spacer buckling even when the spacer having any glass substrate of Examples 1 to 11 is used. It was a display device.

Example 13
In this example, a glass substrate having a stripe-shaped groove as shown in FIG. 5 was produced.

  A plurality of stripe-shaped grooves were formed in advance on each glass base material having the composition shown in Table 1 by grinding. The glass base material is stretched in the direction in which the stripes extend while being heated to 760 ° C., and the stretched glass member is cut into a predetermined length, whereby the thickness t as shown in FIG. A plurality of glass base materials each having 2 mm, a height h of 1.6 mm, a length l of 850 mm, a groove depth of 8 μm, a groove width x of 15 μm, and a groove pitch p of 30 μm for each of the glass base materials. Created one by one.

  A W-Ge-N resistive film having a thickness of 200 nm was formed on the glass substrate in the same manner as in Example 12.

  Thereafter, an image display device was produced in the same manner as in Example 12.

  The image display device manufactured as described above is also a display device that exhibits an excellent display image without display image distortion and spacer buckling.

It is a typical partially cutaway perspective view when the spacer of the present invention is applied to an image display device. It is a typical perspective view which shows the example of a glass base material. It is a perspective view for demonstrating the verification method of the pressure resistance of a glass base material. It is a typical exploded perspective view at the time of applying a spacer of the present invention to an image display device. It is a typical perspective view which shows the example of the glass base material in which the stripe-shaped groove | channel was formed.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1, 11 Face plate 2, 14 Rear plate 3 Sealing member 4, 6 Spacer 5 Glass base material 7 Glass substrate 8 Glass substrate 9, 18 Outer frame 10 Exhaust pipe 12 Fluorescent film 13 Metal back 15 Electron emitting element 16 Row direction wiring 17 Wiring direction

Claims (5)

30-60 wt% SiO ₂ (A component);
_{2 to 20} wt% B ₂ O ₃ (B component);
Selected from 0 to 20 wt% MgO, 0 to 30 wt% CaO, and 0 to 50 wt% SrO and BaO, respectively, one or more of 20 wt% or more, or two or more of the total amount of 20 to 60 wt% (component C) )When,
0-10 wt% of Li ₂ O, respectively, Na ₂ O, is selected from K ₂ O and Cs ₂ O, either one or the total amount of more than 0.6 wt% is 0.6～15Wt% of two or more ( D component),
From 0 to 15 wt% Al ₂ O ₃ , 0 to 15 wt% ZnO, 0 to 10 wt% ZrO ₂ and 0 to 30 wt% Ln ₂ O ₃ (where Ln represents Y, La, Gd, Yb) It has a composition containing one or more selected (E component), has a glass transition temperature of 550 ° C. or higher, and a thermal expansion coefficient at 100 to 300 ° C. of 74 to 94 × 10 ^−7. A spacer for an image display device, comprising: a glass substrate having a difference between the bending point temperature and the glass transition temperature of 50 ° C. or higher. 36-50 wt% of SiO _{2 as the} A component,
B ₂ O ₃ is 5 to 15 wt% of component B,
C component is 0 to 25 wt% CaO, each of 0 to 45 wt% selected from SrO and BaO, 24 wt% or more, or 0 to 15 wt% MgO, 0 to 25 wt% CaO, 0 to 45 wt%, respectively. % Of SrO and BaO in a total amount of 24 to 50 wt%,
The D component is selected from 0 to 6 wt% of Li ₂ O, Na ₂ O, K ₂ O, and Cs ₂ O, respectively, or any one or more of 0.6 wt% or the total amount is 0.6 to 10 wt% Two or more of
The E component is one or more selected from 0-10 wt% Al ₂ O ₃ , 0-10 wt% ZnO, 0-7 wt% ZrO ₂ and 0-20 wt% Ln ₂ O _3. The spacer for an image display device according to claim 1.   The spacer for an image display device according to claim 1, wherein the glass substrate has irregularities on a surface thereof.   The spacer for an image display device according to claim 1, further comprising a resistance film on a surface of the glass substrate.   It is an image display apparatus provided with an image display member and the spacer which hold | maintains the airtight space in the said airtight container in an airtight container, Comprising: The said spacer is a spacer of any one of Claims 1-4. There is provided an image display device.

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