JP2006519923A - 高屈折率光学層を製造するための蒸着材料 - Google Patents
高屈折率光学層を製造するための蒸着材料 Download PDFInfo
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Abstract
Description
実施例1
Dy2O3とTiO2の混合物
68.3重量%のDy2O3と31.7重量%の二酸化チタンを互いに緊密に混合し、続いてタブレットに成形する。これらは空気中で約1500℃で4時間焼成する。続いてタブレットを電子ビーム蒸発器を備える、例えばLeybold A700Q型蒸着ユニットの中へ導入し、約2000℃の温度および酸素圧力2×10-2Paで蒸発させる。装置の中へ基板として配置し蒸着の前に約300℃に加熱した石英ガラスの上に薄い層が堆積する。この層の厚さは約340nmに設定される。冷却し蒸発装置から取り出した後、分光光度計を用いてコーティングされたガラスの透過と反射スペクトルを測定する。層の屈折率をスペクトルから求める。波長500nmで2.28の屈折率を有する均質な層が得られる。層は400nm〜約5μmのスペクトル範囲で透明であり、この範囲で吸収がない。層は例えば相対湿度80%、および50℃の高温多湿環境中で耐久性があり、良好な硬度と接着強度を有する。コーティングされた基板を脱イオン水で10分間煮沸し、4.5重量%の脱イオン水塩水中で室温で6時間、および0.01モルの塩酸溶液中で室温で6時間貯蔵する。それぞれの試験の後、いずれのサンプルガラスも施用された層の脱離は観察されない。点および/または曇りは認められない。
実施例2
Dy2O3、TiO2およびTiの混合物
71.03重量%のDy2O3と、26.20重量%の二酸化チタンと、2.77重量%のチタンとの均質な混合物からタブレットを製造し、続いて1×10-1Paの減圧下で約1600℃で10時間焼成する。続いてタブレットを電子ビーム蒸発器を備えるLeybold A700Q型蒸着ユニットの中へ導入し、約2000℃の温度および酸素圧力2×10-2Paで蒸発させる。装置の中へ基板として配置し蒸着の前に約300℃に加熱した石英ガラスの上に薄い層が堆積する。この層の厚さは約340nmに設定される。冷却し蒸発装置から取り出した後、分光光度計を用いてコーティングされたガラスの透過と反射スペクトルを測定する。層の屈折率をスペクトルから求める。波長500nmで2.25の屈折率を有する均質な層が得られる。層は400nm〜約5μmのスペクトル範囲で透明であり、この範囲で吸収がない。層は高温多湿環境中で耐久性があり、良好な硬度と接着強度を有する。
実施例3
Dy2O3、Gd2O3およびTiO2の混合物
25モル%のDy2O3と、25モル%のGd2O3と、50モル%の二酸化チタンを互いに緊密に混合し、続いてタブレットに成形する。これらを空気中で約1500℃で6時間焼成する。続いてタブレットを電子ビーム蒸発器を備えるLeybold L560型蒸着ユニットの中へ導入し、約2000℃の温度および酸素圧力2×10-2Paで蒸発させる。装置の中へ基板として配置し蒸着の前に約300℃に加熱した石英ガラスの上に薄い層が堆積する。この層の厚さは約240nmに設定される。冷却し蒸発装置から取り出した後、分光光度計を用いてコーティングされたガラスの透過と反射スペクトルを測定する。層の屈折率をスペクトルから求める。波長500nmで2.2の屈折率を有する均質な層が得られる。層は400nm〜約5μmのスペクトル範囲で透明であり、この範囲で吸収がない。層は高温多湿環境中で耐久性があり、良好な硬度と接着強度を有する。
実施例4
Gd2O3、TiO2およびTiの混合物
83.45重量%のGd2O3と、13.79重量%の二酸化チタンと、2.76重量%のチタンとの均質な混合物からタブレットを製造し、続いて1×10-1Paの減圧下で約1600℃で10時間焼成する。続いてタブレットを電子ビーム蒸発器を備えるLeybold L560型蒸着ユニットの中へ導入し、約1800℃の温度および酸素圧力2×10-2Paで蒸発させる。装置の中へ基板として配置し蒸着の前に約300℃に加熱した石英ガラスの上に薄い層が堆積する。この層の厚さは約220nmに設定される。冷却し蒸発装置から取り出した後、分光光度計を用いてコーティングされたガラスの透過と反射スペクトルを測定する。層の屈折率をスペクトルから求める。波長500nmで2.2の屈折率を有する均質な層が得られる。層は400nm〜約5μmのスペクトル範囲で透明であり、この範囲で吸収がない。層は高温多湿環境中で耐久性があり、良好な硬度と接着強度を有する。
Claims (20)
- 酸化チタンと酸化ガドリニウムおよび/または酸化ジスプロシウムとを含む、高屈折率の光学層を製造するための蒸着材料。
- 二酸化チタンと酸化ガドリニウムおよび/または酸化ジスプロシウムとを含む、請求項1に記載の蒸着材料。
- 酸化チタンと酸化ガドリニウムおよび/または酸化ジスプロシウムとを4:1〜1:4のモル比で含み、各場合における最後の数が、酸化ガドリニウムまたは酸化ジスプロシウムのモル比、あるいは酸化ガドリニウムと酸化ジスプロシウムのモル比の総計に関係している請求項1または2に記載の蒸着材料。
- 酸化チタンと酸化ガドリニウムおよび/または酸化ジスプロシウムとを2.6:1〜1:1.3のモル比で含み、各場合における最後の数が、酸化ガドリニウムまたは酸化ジスプロシウムのモル比、あるいは酸化ガドリニウムと酸化ジスプロシウムのモル比の総計に関係している請求項3に記載の蒸着材料。
- 酸化ガドリニウムおよび酸化ジスプロシウムの混合物を1:99〜99:1の比で含む、請求項1から4のいずれか一項に記載の蒸着材料。
- 二酸化チタンと、チタンと、酸化ガドリニウムおよび/または酸化ジスプロシウムとを含む、請求項1から4のいずれか一項に記載の蒸着材料。
- 酸化ガドリニウムおよび酸化ジスプロシウムを1:99〜99:1の比で含む、請求項6に記載の蒸着材料。
- 混合物の総重量基準で、50〜92重量部の酸化ガドリニウムおよび/または酸化ジスプロシウムと、7〜42重量部の二酸化チタンと、0〜8重量部のチタンとを含む、請求項1から7のいずれか一項に記載の蒸着材料。
- 混合物の総重量基準で、50〜92重量部の酸化ジスプロシウムと、7〜42重量部の二酸化チタンと、0〜8重量部のチタンとを含む、請求項8に記載の蒸着材料。
- 混合物の総重量基準で、67〜76重量部の酸化ガドリニウムおよび/または酸化ジスプロシウムと、15〜27重量部の二酸化チタンと、2〜5重量部のチタンとを含む、請求項1から8のいずれか一項に記載の蒸着材料。
- 混合物の総重量基準で、67〜76重量部の酸化ジスプロシウムと、15〜27重量部の二酸化チタンと、2〜5重量部のチタンとを含む、請求項10に記載の蒸着材料。
- 酸化チタンが酸化ガドリニウムおよび/または酸化ジスプロシウムと混合され、前記混合物が圧縮または懸濁され、成形され、続いて焼結される、請求項1から11のいずれか一項に記載の蒸着材料を調製する方法。
- 前記混合物にチタンが追加で加えられる請求項12に記載の方法。
- 前記焼結が空気を流入させて実施される請求項12または13に記載の方法。
- 前記焼結が減圧下で実施される請求項12または13に記載の方法。
- 前記焼結が不活性ガス中で実施される請求項12または13に記載の方法。
- 前記混合物がタブレット、窓ガラス(panes)、ペレット、円錐台、粒、顆粒、棒、またはビーズに成形される、請求項12または13に記載の方法。
- 高屈折率光学層を製造するための請求項1から11のいずれか一項に記載の蒸着材料の使用。
- 請求項1から11のいずれか一項に記載の蒸着材料を含む、n≧2.0の屈折率を有する高屈折率光学層。
- 請求項1から11のいずれか一項に記載の蒸着材料を含む、n≧2.0の屈折率を有する高屈折率光学層を少なくとも1層含む多層光学系。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10307117.2 | 2003-02-19 | ||
DE10307117A DE10307117A1 (de) | 2003-02-19 | 2003-02-19 | Aufdampfmaterial zur Herstellung hochbrechender optischer Schichten |
PCT/EP2004/000553 WO2004074539A1 (de) | 2003-02-19 | 2004-01-23 | Aufdampfmaterial zur herstellung hochbrechender optischer schichten |
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JP2011010450A Division JP2011084819A (ja) | 2003-02-19 | 2011-01-21 | 高屈折率光学層を製造するための蒸着材料 |
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US (1) | US8029923B2 (ja) |
EP (1) | EP1595002B1 (ja) |
JP (2) | JP5095994B2 (ja) |
KR (1) | KR101114652B1 (ja) |
CN (1) | CN100478490C (ja) |
AT (1) | ATE408034T1 (ja) |
DE (2) | DE10307117A1 (ja) |
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2008123575A1 (ja) * | 2007-03-30 | 2008-10-16 | Fuji Titanium Industry Co., Ltd. | 蒸着材料及びそれより得られる光学薄膜 |
WO2008133136A1 (ja) * | 2007-04-16 | 2008-11-06 | Konica Minolta Opto, Inc. | 反射鏡 |
JP2014055079A (ja) * | 2012-09-11 | 2014-03-27 | Japan Fine Ceramics Center | 熱反射材 |
KR101514090B1 (ko) | 2006-12-22 | 2015-04-21 | 더 트러스티즈 오브 프린스턴 유니버시티 | 배기관을 이용하는 유기 증기 제트 증착 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
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CN104969099A (zh) | 2012-09-26 | 2015-10-07 | 8797625加拿大有限公司 | 多层光干涉滤片 |
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JPH09241830A (ja) * | 1996-03-01 | 1997-09-16 | Merck Patent Gmbh | 酸化チタンをベースとする安定化した蒸着材料 |
JPH11278927A (ja) * | 1998-01-14 | 1999-10-12 | Kyocera Corp | 誘電体磁器組成物、誘電体磁器の製造方法並びに誘電体共振器 |
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JPH01108124A (ja) | 1987-10-17 | 1989-04-25 | Natl Inst For Res In Inorg Mater | チタン添加ガドリニウムスカンジウムアルミニウムガーネット結晶およびその製造法 |
US5747397A (en) | 1996-11-04 | 1998-05-05 | Bay Glass Research | Optical glass |
US6258467B1 (en) * | 2000-08-17 | 2001-07-10 | Siemens Westinghouse Power Corporation | Thermal barrier coating having high phase stability |
KR100415757B1 (ko) * | 1999-01-14 | 2004-01-31 | 교오세라 가부시키가이샤 | 유전체 자기(誘電體磁器)조성물, 유전체 자기의 제조방법 및 유전체 공진기(共振器) |
TWI250135B (en) * | 2001-10-15 | 2006-03-01 | Hoya Corp | Optical glass, glass material for press molding, optical element, and method of manufacturing same |
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2003
- 2003-02-19 DE DE10307117A patent/DE10307117A1/de not_active Withdrawn
-
2004
- 2004-01-23 KR KR1020057015337A patent/KR101114652B1/ko active IP Right Grant
- 2004-01-23 WO PCT/EP2004/000553 patent/WO2004074539A1/de active Application Filing
- 2004-01-23 DE DE502004008022T patent/DE502004008022D1/de not_active Expired - Lifetime
- 2004-01-23 US US10/546,026 patent/US8029923B2/en not_active Expired - Fee Related
- 2004-01-23 AT AT04704605T patent/ATE408034T1/de not_active IP Right Cessation
- 2004-01-23 JP JP2006501587A patent/JP5095994B2/ja not_active Expired - Fee Related
- 2004-01-23 EP EP04704605A patent/EP1595002B1/de not_active Expired - Lifetime
- 2004-01-23 CN CNB2004800047500A patent/CN100478490C/zh not_active Expired - Fee Related
- 2004-02-16 TW TW093103644A patent/TW200500480A/zh unknown
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2011
- 2011-01-21 JP JP2011010450A patent/JP2011084819A/ja active Pending
Patent Citations (3)
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JPS57160956A (en) * | 1981-03-11 | 1982-10-04 | Philips Nv | Composite body |
JPH09241830A (ja) * | 1996-03-01 | 1997-09-16 | Merck Patent Gmbh | 酸化チタンをベースとする安定化した蒸着材料 |
JPH11278927A (ja) * | 1998-01-14 | 1999-10-12 | Kyocera Corp | 誘電体磁器組成物、誘電体磁器の製造方法並びに誘電体共振器 |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101514090B1 (ko) | 2006-12-22 | 2015-04-21 | 더 트러스티즈 오브 프린스턴 유니버시티 | 배기관을 이용하는 유기 증기 제트 증착 |
WO2008123575A1 (ja) * | 2007-03-30 | 2008-10-16 | Fuji Titanium Industry Co., Ltd. | 蒸着材料及びそれより得られる光学薄膜 |
JP5358430B2 (ja) * | 2007-03-30 | 2013-12-04 | 富士チタン工業株式会社 | 蒸着材料及びそれより得られる光学薄膜 |
WO2008133136A1 (ja) * | 2007-04-16 | 2008-11-06 | Konica Minolta Opto, Inc. | 反射鏡 |
JP2014055079A (ja) * | 2012-09-11 | 2014-03-27 | Japan Fine Ceramics Center | 熱反射材 |
Also Published As
Publication number | Publication date |
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EP1595002A1 (de) | 2005-11-16 |
JP5095994B2 (ja) | 2012-12-12 |
EP1595002B1 (de) | 2008-09-10 |
DE502004008022D1 (de) | 2008-10-23 |
US8029923B2 (en) | 2011-10-04 |
WO2004074539A1 (de) | 2004-09-02 |
DE10307117A1 (de) | 2004-09-02 |
TW200500480A (en) | 2005-01-01 |
CN100478490C (zh) | 2009-04-15 |
US20060083949A1 (en) | 2006-04-20 |
KR20050102129A (ko) | 2005-10-25 |
KR101114652B1 (ko) | 2012-03-05 |
CN1751136A (zh) | 2006-03-22 |
ATE408034T1 (de) | 2008-09-15 |
JP2011084819A (ja) | 2011-04-28 |
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