JP2006514408A - 帯電粒子ビームの角状変位を測定および縮小するための方法 - Google Patents

帯電粒子ビームの角状変位を測定および縮小するための方法 Download PDF

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Publication number
JP2006514408A
JP2006514408A JP2004568318A JP2004568318A JP2006514408A JP 2006514408 A JP2006514408 A JP 2006514408A JP 2004568318 A JP2004568318 A JP 2004568318A JP 2004568318 A JP2004568318 A JP 2004568318A JP 2006514408 A JP2006514408 A JP 2006514408A
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JP
Japan
Prior art keywords
charged particle
particle beam
sidewall
angular displacement
measurement
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Pending
Application number
JP2004568318A
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English (en)
Japanese (ja)
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JP2006514408A5 (enExample
Inventor
オフェル アダン，
ロジャー， スチール コーネル，
ズヴィカ ローゼンベルグ，
ガイ エイタン，
チャールズ アーチー，
エリック ソレッキー，
ジェイソン メイヤー，
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Applied Materials Inc
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Applied Materials Inc
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Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of JP2006514408A publication Critical patent/JP2006514408A/ja
Publication of JP2006514408A5 publication Critical patent/JP2006514408A5/ja
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/282—Determination of microscope properties
    • H01J2237/2826—Calibration

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Electron Beam Exposure (AREA)
  • Electron Sources, Ion Sources (AREA)
JP2004568318A 2003-02-05 2003-11-24 帯電粒子ビームの角状変位を測定および縮小するための方法 Pending JP2006514408A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US44578003P 2003-02-05 2003-02-05
PCT/US2003/038140 WO2004072631A2 (en) 2003-02-05 2003-11-24 A method for measuring and reducing angular deviations of a charged particle beam

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2011258065A Division JP5431440B2 (ja) 2003-02-05 2011-11-25 帯電粒子ビームの角状変位を測定および縮小するための方法

Publications (2)

Publication Number Publication Date
JP2006514408A true JP2006514408A (ja) 2006-04-27
JP2006514408A5 JP2006514408A5 (enExample) 2010-09-24

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Family Applications (2)

Application Number Title Priority Date Filing Date
JP2004568318A Pending JP2006514408A (ja) 2003-02-05 2003-11-24 帯電粒子ビームの角状変位を測定および縮小するための方法
JP2011258065A Expired - Lifetime JP5431440B2 (ja) 2003-02-05 2011-11-25 帯電粒子ビームの角状変位を測定および縮小するための方法

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JP2011258065A Expired - Lifetime JP5431440B2 (ja) 2003-02-05 2011-11-25 帯電粒子ビームの角状変位を測定および縮小するための方法

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JP (2) JP2006514408A (enExample)
AU (1) AU2003298774A1 (enExample)
WO (1) WO2004072631A2 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101035426B1 (ko) * 2003-07-11 2011-05-18 어플라이드 머티리얼즈 이스라엘 리미티드 기준 구조 엘리먼트를 이용하여 구조 엘리먼트의 단면 피쳐를 결정하는 시스템 및 방법

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06150868A (ja) * 1992-10-30 1994-05-31 Fujitsu Ltd 走査型電子顕微鏡
WO2001045136A1 (en) * 1999-12-14 2001-06-21 Applied Materials, Inc. Method and system for the examination of specimen using a charged particle beam
EP1150327A1 (en) * 2000-04-27 2001-10-31 ICT Integrated Circuit Testing GmbH Multi beam charged particle device

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62121306A (ja) * 1985-11-21 1987-06-02 Nec Corp 微細パタ−ンの検査方法
US6025600A (en) * 1998-05-29 2000-02-15 International Business Machines Corporation Method for astigmatism correction in charged particle beam systems
US6028662A (en) * 1999-05-26 2000-02-22 International Business Machines Corporation Adjustment of particle beam landing angle
US6472662B1 (en) * 2000-08-30 2002-10-29 International Business Machines Corporation Automated method for determining several critical dimension properties from scanning electron microscope by using several tilted beam or sample scans

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06150868A (ja) * 1992-10-30 1994-05-31 Fujitsu Ltd 走査型電子顕微鏡
WO2001045136A1 (en) * 1999-12-14 2001-06-21 Applied Materials, Inc. Method and system for the examination of specimen using a charged particle beam
EP1150327A1 (en) * 2000-04-27 2001-10-31 ICT Integrated Circuit Testing GmbH Multi beam charged particle device

Also Published As

Publication number Publication date
JP5431440B2 (ja) 2014-03-05
JP2012060154A (ja) 2012-03-22
WO2004072631A2 (en) 2004-08-26
WO2004072631A3 (en) 2004-10-28
AU2003298774A8 (en) 2004-09-06
AU2003298774A1 (en) 2004-09-06

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