AU2003298774A1 - A method for measuring and reducing angular deviations of a charged particle beam - Google Patents

A method for measuring and reducing angular deviations of a charged particle beam

Info

Publication number
AU2003298774A1
AU2003298774A1 AU2003298774A AU2003298774A AU2003298774A1 AU 2003298774 A1 AU2003298774 A1 AU 2003298774A1 AU 2003298774 A AU2003298774 A AU 2003298774A AU 2003298774 A AU2003298774 A AU 2003298774A AU 2003298774 A1 AU2003298774 A1 AU 2003298774A1
Authority
AU
Australia
Prior art keywords
measuring
charged particle
particle beam
angular deviations
reducing angular
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003298774A
Other languages
English (en)
Other versions
AU2003298774A8 (en
Inventor
Ofer Adan
Charles Archie
Roger Steele Cornell
Guy Eytan
Jason Mayer
Zvika Rosenberg
Eric Solecky
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Israel Ltd
Applied Materials Inc
International Business Machines Corp
Original Assignee
Applied Materials Israel Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Israel Ltd filed Critical Applied Materials Israel Ltd
Publication of AU2003298774A8 publication Critical patent/AU2003298774A8/xx
Publication of AU2003298774A1 publication Critical patent/AU2003298774A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/282—Determination of microscope properties
    • H01J2237/2826—Calibration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Electron Beam Exposure (AREA)
  • Electron Sources, Ion Sources (AREA)
AU2003298774A 2003-02-05 2003-11-24 A method for measuring and reducing angular deviations of a charged particle beam Abandoned AU2003298774A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US44578003P 2003-02-05 2003-02-05
US60/445,780 2003-02-05
PCT/US2003/038140 WO2004072631A2 (en) 2003-02-05 2003-11-24 A method for measuring and reducing angular deviations of a charged particle beam

Publications (2)

Publication Number Publication Date
AU2003298774A8 AU2003298774A8 (en) 2004-09-06
AU2003298774A1 true AU2003298774A1 (en) 2004-09-06

Family

ID=32869421

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003298774A Abandoned AU2003298774A1 (en) 2003-02-05 2003-11-24 A method for measuring and reducing angular deviations of a charged particle beam

Country Status (3)

Country Link
JP (2) JP2006514408A (enExample)
AU (1) AU2003298774A1 (enExample)
WO (1) WO2004072631A2 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101035426B1 (ko) * 2003-07-11 2011-05-18 어플라이드 머티리얼즈 이스라엘 리미티드 기준 구조 엘리먼트를 이용하여 구조 엘리먼트의 단면 피쳐를 결정하는 시스템 및 방법

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62121306A (ja) * 1985-11-21 1987-06-02 Nec Corp 微細パタ−ンの検査方法
JPH06150868A (ja) * 1992-10-30 1994-05-31 Fujitsu Ltd 走査型電子顕微鏡
US6025600A (en) * 1998-05-29 2000-02-15 International Business Machines Corporation Method for astigmatism correction in charged particle beam systems
US6028662A (en) * 1999-05-26 2000-02-22 International Business Machines Corporation Adjustment of particle beam landing angle
KR100576940B1 (ko) * 1999-12-14 2006-05-10 어플라이드 머티어리얼스, 인코포레이티드 하전 입자 빔을 사용하여 표본을 검사하는 방법 및 시스템
EP1150327B1 (en) * 2000-04-27 2018-02-14 ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Multi beam charged particle device
US6472662B1 (en) * 2000-08-30 2002-10-29 International Business Machines Corporation Automated method for determining several critical dimension properties from scanning electron microscope by using several tilted beam or sample scans

Also Published As

Publication number Publication date
JP5431440B2 (ja) 2014-03-05
JP2012060154A (ja) 2012-03-22
WO2004072631A2 (en) 2004-08-26
JP2006514408A (ja) 2006-04-27
WO2004072631A3 (en) 2004-10-28
AU2003298774A8 (en) 2004-09-06

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Legal Events

Date Code Title Description
TH Corrigenda

Free format text: IN VOL 18, NO 39, PAGE(S) 9377 UNDER THE HEADING APPLICATIONS OPI - NAME INDEX UNDER THE NAME APPLIED MATERIALS ISRAEL, LTD., APPLICATION NO. 2003298774, UNDER INID (71) CORRECT THE NAME TO READ APPLIED MATERIALS, INC.; INTERNATIONAL BUSINESS MACHINES CORPORATION; APPLIED MATERIALS ISRAEL, LTD.

MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase