JP2006332157A - Aluminum foil for electrolytic capacitor electrode and method for manufacturing same - Google Patents

Aluminum foil for electrolytic capacitor electrode and method for manufacturing same Download PDF

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JP2006332157A
JP2006332157A JP2005150581A JP2005150581A JP2006332157A JP 2006332157 A JP2006332157 A JP 2006332157A JP 2005150581 A JP2005150581 A JP 2005150581A JP 2005150581 A JP2005150581 A JP 2005150581A JP 2006332157 A JP2006332157 A JP 2006332157A
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aluminum foil
electrolytic capacitor
phosphorus
ppm
dissolution
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Koichiro Takiguchi
浩一郎 滝口
Atsushi Hibino
淳 日比野
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Sumitomo Light Metal Industries Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide aluminum foil for electrolytic capacitor electrode, in which defect distribution in an oxide film is uniform, dispersibility of bits is sufficient, invalid dissolution on a material surface is little and improved electrostatic capacity can be obtained. <P>SOLUTION: Aluminum foil comprises 0.1 to 2.0 ppm of Pb. Ratio P/O of phosphorous detection strength and oxygen detection strength on a surface of aluminum foil, which is measured by fluorescent X ray emission spectrum analysis, is 1.5 to 3.0 after last annealing. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、増大した静電容量を有する電解コンデンサ電極用アルミニウム箔およびその製造方法を提供する。   The present invention provides an aluminum foil for electrolytic capacitor electrodes having increased capacitance and a method for producing the same.

電子部品の小型化に伴い、電子部品に組み込まれる電解コンデンサの電極用アルミニウム箔についても静電容量の向上が要望されており、電解コンデンサ電極用アルミニウム箔をエッチング処理した後の表面積を拡大させるために多くの試みがなされている。   Along with the downsizing of electronic components, there is a demand for improved capacitance for the aluminum foil for electrolytic capacitor electrodes incorporated in electronic components. To increase the surface area after etching the aluminum foil for electrolytic capacitor electrodes Many attempts have been made.

エッチング処理後の表面積を拡大させるためには、ピット分散性の向上(合体して無効溶解となるピットの減少)、表面溶解の抑制、ピット長さの均一化などが有効であり、合金成分の最適化、結晶性酸化物の分散性向上、スパッタリングや印刷によるピット起点の付与など、数多くの試みが行われているが、技術面あるいはコスト面での問題のため、量産材への適用が進んでいないのが現状である。   In order to increase the surface area after etching, it is effective to improve pit dispersibility (reduction of pits that become coalesced and become ineffective dissolution), suppress surface dissolution, make the pit length uniform, etc. Many attempts have been made, including optimization, improvement of dispersibility of crystalline oxides, and addition of pit starting points by sputtering and printing, but due to technical and cost problems, application to mass-produced materials has progressed. The current situation is not.

発明者らは、工業的に量産が可能であり、ピット分散性の向上、表面溶解の抑制が同時に達成できる手法として、最終焼鈍前の薬剤処理に注目して検討を行った。ピット分散性を向上させるためには、箔圧延後の材料表面の不均一な酸化皮膜を溶解除去すれば良いが、強アルカリなど表面溶解減量が多い薬剤を使用した場合、薬剤処理により、付加圧延で導入された (100)方位の優先成長を促す表面歪が除去されてしまい、最終焼鈍後に粗大な異方位結晶粒が生成するという問題がある。   The inventors have studied the chemical treatment before final annealing as a technique that can be industrially mass-produced and can simultaneously achieve improvement in pit dispersibility and suppression of surface dissolution. In order to improve the pit dispersibility, it is only necessary to dissolve and remove the uneven oxide film on the surface of the material after the foil rolling. The surface strain that promotes the preferential growth of the (100) orientation introduced in (1) is removed, and coarse different orientation crystal grains are formed after the final annealing.

この問題を解決するため、発明者らは、強アルカリ中にアルミニウムより貴な金属イオンを含有させ、金属イオンを優先的に材料表面に析出させることにより溶解形態を全面溶解から局所溶解に変化させる手法(特願2003-124800号)を見出したが、材料表面に析出した金属イオンを除去するための中和処理が必要となるため、コスト面で難点がある。   In order to solve this problem, the inventors include a metal ion that is more noble than aluminum in a strong alkali and preferentially deposits the metal ion on the surface of the material, thereby changing the dissolution form from full dissolution to local dissolution. Although a technique (Japanese Patent Application No. 2003-124800) has been found, it requires a neutralization treatment to remove metal ions deposited on the surface of the material, which is difficult in terms of cost.

また、冷間圧延後の汚染層や不均質な酸化膜を除去して、安定して均質な表面酸化層を形成し、エッチング特性に優れたアルミニウム箔を得るために、箔圧延後のアルミニウム箔を硫酸、塩酸、リン元素を含む酸の1種または2種以上の酸を含む酸溶液で処理し、その後焼鈍する方法が提案されている(特許文献1参照)が、エッチング特性の改善が十分ではない。
特開2005−15916号公報
In addition, in order to remove the contaminated layer and the non-homogeneous oxide film after cold rolling to form a stable homogeneous surface oxide layer and obtain an aluminum foil with excellent etching characteristics, the aluminum foil after foil rolling Has been proposed (see Patent Document 1), in which a method of treating the substrate with an acid solution containing one or more acids including sulfuric acid, hydrochloric acid, and phosphorus element, and then annealing is proposed. is not.
JP 2005-15916 A

発明者らは、エッチング特性を向上させるための手法についてさらに試験、検討を重ねた結果、Pbを含有するアルミニウム箔を用い、リン酸溶液による酸処理を適用して、アルミニウム箔表面の不均一な酸化皮膜を除去するとともに、該表面に特定量のリン含有皮膜を生成させ、さらに焼鈍条件を特定することによって、確実に特性改善が得られることを見出した。   As a result of further testing and investigation on the technique for improving the etching characteristics, the inventors have used an aluminum foil containing Pb and applied an acid treatment with a phosphoric acid solution so that the surface of the aluminum foil is not uniform. It has been found that by removing the oxide film, generating a specific amount of phosphorus-containing film on the surface, and further specifying the annealing conditions, it is possible to reliably improve the characteristics.

本発明は、上記の知見に基いてなされたものであり、その目的は、酸化皮膜中の欠陥分布が均一で、ピットの分散性が良好であり、材料表面の無効溶解が少なく、改善された静電容量を得ることを可能とする電解コンデンサ電極用アルミニウム箔およびその製造方法を提供することにある。   The present invention has been made on the basis of the above knowledge, and the purpose thereof is to improve the uniformity of defect distribution in the oxide film, good pit dispersibility, less ineffective dissolution of the material surface, and the like. An object of the present invention is to provide an aluminum foil for an electrolytic capacitor electrode and a method for producing the same, which can obtain a capacitance.

上記の目的を達成するための請求項1による電解コンデンサ電極用アルミニウム箔は、 Pb:0.1〜2.0ppmを含有するアルミニウム箔であって、最終焼鈍後において、蛍光X線発光分光分析で測定したアルミニウム箔表面のリン検出強度と酸素検出強度の比P/Oが1.5〜3.0であることを特徴とする。   An aluminum foil for an electrolytic capacitor electrode according to claim 1 for achieving the above object is an aluminum foil containing Pb: 0.1 to 2.0 ppm, which is analyzed by fluorescent X-ray emission spectroscopy after final annealing. The ratio P / O of the measured phosphorus detection intensity and oxygen detection intensity on the surface of the aluminum foil is 1.5 to 3.0.

請求項2による電解コンデンサ電極用アルミニウム箔の製造方法は、箔圧延後のPb:0.1〜2.0ppmを含有するアルミニウム箔を濃度1〜5%のリン酸溶液に接触させて、アルミニウム箔の表面を溶解減量ΔWが0.03〜0.30g/m2となるよう処理した後、不活性ガス雰囲気中、510〜570℃の温度で焼鈍処理し、蛍光X線発光分光分析で測定したアルミニウム箔表面のリン検出強度と酸素検出強度の比P/Oを1.5〜3.0とすることを特徴とする。 The method for producing an aluminum foil for an electrolytic capacitor electrode according to claim 2 comprises contacting an aluminum foil containing Pb: 0.1 to 2.0 ppm after foil rolling with a phosphoric acid solution having a concentration of 1 to 5%, After the surface of the steel was treated so that the dissolution loss ΔW was 0.03 to 0.30 g / m 2, it was annealed in an inert gas atmosphere at a temperature of 510 to 570 ° C. and measured by fluorescent X-ray emission spectrometry. A ratio P / O of phosphorus detection intensity and oxygen detection intensity on the surface of the aluminum foil is set to 1.5 to 3.0.

請求項3による電解コンデンサ電極用アルミニウム箔の製造方法は、請求項2において、濃度1〜5%、温度20〜80℃のリン酸溶液に1〜30秒接触させることを特徴とする。   The method for producing an aluminum foil for electrolytic capacitor electrodes according to claim 3 is characterized in that, in claim 2, contact is made with a phosphoric acid solution having a concentration of 1 to 5% and a temperature of 20 to 80 ° C. for 1 to 30 seconds.

本発明によれば、熱間圧延→冷間圧延→中間焼鈍→付加圧延からなる諸工程により製造された硬質アルミニウム箔の表面を、最終焼鈍前に特定濃度のリン酸溶液と接触させることにより、前工程で生成した不均一な酸化皮膜を含む材料の表層部が溶解除去されて均一なリン含有皮膜が生成し、その後、真空中あるいは不活性ガス雰囲気中で最終焼鈍すると、(100)面が高密度に集積するとともに、材料中に添加された鉛が表面濃縮して酸化皮膜中に欠陥が均一に導入される。   According to the present invention, by contacting the surface of the hard aluminum foil produced by the processes consisting of hot rolling → cold rolling → intermediate annealing → addition rolling with a phosphoric acid solution having a specific concentration before final annealing, When the surface layer portion of the material containing the non-uniform oxide film generated in the previous step is dissolved and removed to form a uniform phosphorus-containing film, and then the final annealing is performed in a vacuum or in an inert gas atmosphere, the (100) surface becomes While accumulating at a high density, the lead added to the material is concentrated on the surface and defects are uniformly introduced into the oxide film.

その結果、本発明に従って製造された電解コンデンサ電極用アルミニウム箔は、酸化皮膜中の欠陥分布が均一で、ピットの分散性が良好となり、また、材料表面に生成したリン含有皮膜がDCエッチング初期の表面溶解を抑制するため、材料表面の無効溶解が少なく、静電容量と折曲げ強度が同時に向上する。   As a result, the aluminum foil for electrolytic capacitor electrodes manufactured according to the present invention has a uniform defect distribution in the oxide film, good pit dispersibility, and the phosphorus-containing film formed on the surface of the material is in the initial stage of DC etching. In order to suppress surface dissolution, there is little ineffective dissolution on the surface of the material, and electrostatic capacity and bending strength are improved simultaneously.

本発明においては、Pb:0.1〜2.0ppmを含有するアルミニウム箔を用いる。Pbが0.1ppm未満では最終焼鈍によるPbの表面濃縮が不均一となり、DCエッチング後に未エッチ部が生じて静電容量が低下する。Pbが2.0ppmを超えると、最終焼鈍によるPbの表面濃縮が多くなるため、DCエッチング初期に表面溶解が生じ、箔厚垂直方向に伸展するトンネルピットが減少するため静電容量が低下する。Pbのさらに好ましい含有範囲は0.3〜0.8ppmである。   In the present invention, an aluminum foil containing Pb: 0.1 to 2.0 ppm is used. If Pb is less than 0.1 ppm, the surface concentration of Pb by the final annealing becomes non-uniform, and an unetched portion is generated after DC etching, resulting in a decrease in capacitance. If Pb exceeds 2.0 ppm, the surface concentration of Pb due to the final annealing increases, so that surface dissolution occurs in the initial stage of DC etching, and tunnel pits extending in the direction perpendicular to the foil thickness decrease, resulting in a decrease in capacitance. A more preferable content range of Pb is 0.3 to 0.8 ppm.

アルミニウム箔には、他の成分として、Si:5〜60ppm、Fe:5〜60ppmが含有されることができ、または、さらにCu:30〜80ppmが含有されることができる。Si、Feはアルミニウムの不可避不純物であるが、Si、Feが5ppm未満では粗大粒が発生するおそれがあり、60ppmを超えると異方位結晶粒が成長し、(100)面占有率が低下し易くなる。   The aluminum foil can contain Si: 5 to 60 ppm and Fe: 5 to 60 ppm as other components, or can further contain Cu: 30 to 80 ppm. Si and Fe are inevitable impurities of aluminum, but if Si and Fe are less than 5 ppm, coarse grains may be generated. If it exceeds 60 ppm, different orientation crystal grains grow and the (100) plane occupancy tends to decrease. Become.

Cuは、ピット長さを増加させる効果を有するが、30ppm未満ではその効果が十分でなく、80ppmを超えると(100)面の集積を阻害する。Cuのさらに好ましい含有範囲は40〜60ppmである。   Cu has an effect of increasing the pit length, but if it is less than 30 ppm, the effect is not sufficient, and if it exceeds 80 ppm, accumulation of the (100) plane is inhibited. A more preferable content range of Cu is 40 to 60 ppm.

本発明によるアルミニウム箔は、最終焼鈍後において、蛍光X線発光分光分析で測定したアルミニウム箔表面のリン検出強度と酸素検出強度の比P/Oが1.5〜3.0であることを特徴とする。リン検出強度と酸素検出強度の比P/Oは、リン含有皮膜の生成度合いを示す指標となるもので、P/Oが1.5未満では、リン含有皮膜の生成量が少ないためDCエッチング初期の表面溶解を抑制する効果が不十分であり、P/Oが3.0を超えると、生成したリン含有皮膜が不均一となり、皮膜中の粗大欠陥が多くなるため、容量向上効果が得られなくなる。   The aluminum foil according to the present invention is characterized in that, after the final annealing, the ratio P / O of the phosphorus detection intensity and the oxygen detection intensity on the surface of the aluminum foil measured by fluorescent X-ray emission spectrometry is 1.5 to 3.0. And The ratio P / O between the phosphorus detection intensity and the oxygen detection intensity is an index indicating the degree of generation of the phosphorus-containing film. When the P / O is less than 1.5, the amount of phosphorus-containing film generated is small, so the initial stage of DC etching When the P / O exceeds 3.0, the generated phosphorus-containing coating becomes non-uniform and the number of coarse defects in the coating increases, resulting in a capacity improvement effect. Disappear.

本発明の電解コンデンサ電極用アルミニウム箔の製造は、所定の組成を有するアルミニウムの鋳塊を、常法に従って熱間圧延→冷間圧延→中間焼鈍→箔圧延した後、アルカリ脱脂し、続いて濃度1〜5%のリン酸溶液に接触させ、アルミニウム箔の表面を溶解減量ΔWが0.03〜0.30g/m2となるよう処理して、水洗、乾燥し、その後、不活性ガス雰囲気中、510〜570℃の温度で焼鈍処理することにより行われ、蛍光X線発光分光分析で測定したアルミニウム箔表面のリン検出強度と酸素検出強度の比P/Oを1.5〜3.0とする。 The aluminum foil for electrolytic capacitor electrodes of the present invention is manufactured by hot rolling, cold rolling, intermediate annealing, foil rolling, aluminum degreasing in accordance with a conventional method, followed by alkali degreasing, followed by concentration. Contact with 1-5% phosphoric acid solution, treat aluminum foil surface so that dissolution loss ΔW is 0.03 to 0.30 g / m 2 , wash with water, dry, then in inert gas atmosphere The ratio P / O of the phosphorus detection intensity and the oxygen detection intensity on the aluminum foil surface measured by fluorescent X-ray emission spectroscopic analysis is 1.5 to 3.0, which is performed by annealing at a temperature of 510 to 570 ° C. To do.

最終焼鈍前に行われるリン含有皮膜生成処理による溶解減量ΔWが0.03g/m2未満では、前工程で生成した不均一な酸化皮膜の除去が十分でなく、均一なピット分散性が得られないため、容量向上効果が小さい。また、ΔWが0.30g/m2を超えると、箔圧延で導入された(100)方位の優先成長を促す表面歪が除去されてしまい、最終焼鈍後に粗大な異方位結晶粒が生じるため、電解コンデンサ電極用として不適当となる。 If the loss of dissolution ΔW due to the phosphorus-containing film generation treatment performed before the final annealing is less than 0.03 g / m 2 , the uneven oxide film generated in the previous process is not sufficiently removed, and uniform pit dispersibility is obtained. Therefore, the capacity improvement effect is small. Further, if ΔW exceeds 0.30 g / m 2 , the surface strain that promotes the preferential growth of the (100) orientation introduced in the foil rolling is removed, and coarse different orientation crystal grains are generated after the final annealing. This is inappropriate for electrolytic capacitor electrodes.

リン含有皮膜生成処理において、リン酸濃度が1%未満ではリン含有皮膜の生成量が少ないため効果が不十分となり、リン酸濃度が5%を超えると、生成したリン含有皮膜が不均一となって皮膜中の粗大欠陥が多くなるため、容量向上効果が得られなくなる。上記のP/Oの範囲においては、生成したリン含有皮膜が緻密となり、ピット分散性の向上、表面溶解の抑制の効果が同時に得られる。   In the phosphorous-containing film production treatment, if the phosphoric acid concentration is less than 1%, the amount of the phosphorous-containing film produced is small and the effect is insufficient. If the phosphoric acid concentration exceeds 5%, the produced phosphorous-containing film becomes non-uniform. As a result, the number of coarse defects in the film increases, and the effect of improving the capacity cannot be obtained. In the above P / O range, the produced phosphorus-containing film becomes dense, and the effects of improving pit dispersibility and suppressing surface dissolution can be obtained at the same time.

リン含有皮膜生成処理は、リン酸濃度1〜5%、液温20〜80℃のリン酸溶液に1〜30秒接触させるのが好ましい。前記アルカリ脱脂およびリン含有皮膜生成処理をスプレー処理とし、且つ、アルカリ脱脂→水洗→リン含有皮膜生成処理→水洗→乾燥からなる連続処理とすることにより、大幅なコストアップを伴うことなしに量産化することが可能となる。   The phosphorus-containing film generation treatment is preferably performed in contact with a phosphoric acid solution having a phosphoric acid concentration of 1 to 5% and a liquid temperature of 20 to 80 ° C. for 1 to 30 seconds. The alkali degreasing and phosphorus-containing film generation treatment is a spray treatment, and the alkaline degreasing → water washing → phosphorus-containing film formation treatment → water washing → drying is followed by mass production without significant cost increase. It becomes possible to do.

最終焼鈍条件については、不活性ガス雰囲気中、510〜570℃の温度域で1〜60時間行うのが好ましく、510℃未満または1時間未満ではPbの表面濃縮が少ないためにピット発生数が減少し、静電容量が低下する。また、570℃を超えた温度または60時間を超えた時間で処理すると、コイル状態で焼鈍する際に箔面のハリツキが強くなり、剥離する際に酸化皮膜が破壊してしまうために静電容量が低下する。   The final annealing conditions are preferably performed in an inert gas atmosphere at a temperature range of 510 to 570 ° C. for 1 to 60 hours. If the temperature is less than 510 ° C. or less than 1 hour, the Pb surface concentration is small, so the number of pits is reduced. In addition, the capacitance decreases. In addition, if the treatment is performed at a temperature exceeding 570 ° C. or a time exceeding 60 hours, the foil surface is strongly peeled when annealed in a coil state, and the oxide film is destroyed when peeled off. Decreases.

本発明においては、リン含有皮膜生成処理によりピットの集中要因となる不均一な酸化皮膜を溶解除去し、アルミニウム箔表面にリン検出強度と酸素検出強度の比P/Oを1.5〜3.0とする緻密なリン含有皮膜を生成させてDCエッチング時の表面溶解を抑制し、Pb濃縮によりピットの分散性を向上させ、これらの相乗効果によって静電容量の増大を達成するものである。   In the present invention, the non-uniform oxide film that causes the concentration of pits is dissolved and removed by the phosphorus-containing film generation treatment, and the ratio P / O of phosphorus detection intensity to oxygen detection intensity is set to 1.5-3. A dense phosphorus-containing film having a density of 0 is generated to suppress surface dissolution during DC etching, pit dispersibility is improved by Pb concentration, and an increase in capacitance is achieved by a synergistic effect thereof.

以下、本発明の実施例を比較例と対比して説明するとともに、本発明の効果を実証する。なお、これらの実施例は、本発明の一実施態様を示すものであり、本発明はこれらに限定されるものではない。   Examples of the present invention will be described below in comparison with comparative examples, and the effects of the present invention will be demonstrated. In addition, these Examples show one embodiment of this invention, and this invention is not limited to these.

実施例、比較例
表1に示す量のPbを含有するアルミニウムの鋳塊を用いて、常法に従って厚さ110μmの硬質箔とした後、連続式スプレー洗浄機(ノズル流量10L/min)を用い、アルカリ脱脂(液温65℃で5秒間)→水洗(室温で5秒間)→リン含有皮膜生成処理(条件は表1参照)→水洗(室温で5秒間)を行った。上記の工程中、リン含有皮膜生成処理後のアルミニウム箔表面の溶解減量ΔW(g/m2)を処理前後の重量差より測定した。なお、処理後の板はリン含有皮膜生成による増量もあるがこれも含めて処理後の重量とした。
Examples and Comparative Examples After using an aluminum ingot containing Pb in the amount shown in Table 1 to form a hard foil having a thickness of 110 μm according to a conventional method, a continuous spray washer (nozzle flow rate 10 L / min) was used. Then, alkaline degreasing (liquid temperature of 65 ° C. for 5 seconds) → water washing (at room temperature for 5 seconds) → phosphorus-containing film formation treatment (see Table 1 for conditions) → water washing (at room temperature for 5 seconds) was performed. During the above steps, the loss on dissolution ΔW (g / m 2 ) on the surface of the aluminum foil after the phosphorus-containing film formation treatment was measured from the weight difference before and after the treatment. In addition, although the board after a process also has the increase by a phosphorus containing film production | generation, it was set as the weight after a process including this.

ついで、アルゴンガス雰囲気中、表1に示す温度、時間で最終焼鈍を実施し、得られた箔材について、塩酸1mol/Lと硫酸3mol/Lの混酸溶液を用いて、液温85℃、電流密度25A/dm2の条件で480秒間エッチング処理し、その後、ほう酸溶液中で200Vに化成し、静電容量を測定した。測定結果を表1に示す。 Next, final annealing was performed in an argon gas atmosphere at the temperature and time shown in Table 1, and the obtained foil material was mixed with a mixed acid solution of hydrochloric acid 1 mol / L and sulfuric acid 3 mol / L at a liquid temperature of 85 ° C. and a current. Etching was performed for 480 seconds under the condition of a density of 25 A / dm 2 , and then it was converted to 200 V in a boric acid solution, and the capacitance was measured. The measurement results are shown in Table 1.

また、化成後の箔材について、蛍光X線発光分光分析により箔表面のP/Oを測定した。 蛍光X線発光分光分析は、RIGAKU製RIX−3100により、真空雰囲気中、Rh管球を用いて30kV−130mAの条件で測定した。測定結果を表1に示す。   Moreover, about the foil material after chemical conversion, P / O of the foil surface was measured by the fluorescent X ray emission spectroscopic analysis. Fluorescence X-ray emission spectroscopic analysis was performed by RIX-3100 manufactured by RIGAKU in a vacuum atmosphere using a Rh tube under a condition of 30 kV-130 mA. The measurement results are shown in Table 1.

Figure 2006332157
Figure 2006332157

表1にみられるように、本発明に従う実施例1〜4はいずれも、リン含有皮膜生成処理無しの比較例1の静電容量を100%とした場合、100%を超える優れた静電容量値を示した。   As can be seen from Table 1, all of Examples 1 to 4 according to the present invention have excellent capacitance exceeding 100% when the capacitance of Comparative Example 1 without phosphorus-containing film generation treatment is 100%. The value is shown.

これに対して、本発明の条件を外れた比較例1〜11はいずれも、静電容量値が100%未満であった。比較例1はリン含有皮膜生成処理を行わないもので、静電容量比較の基準jとするものである。比較例2はPbの含有量が少ないため、エッチング時に未エッチング部分が生じ、比較例3はPbの含有量が多いため、エッチング時に表面溶解が生じ、いずれも静電容量に劣るものとなった。   On the other hand, all of Comparative Examples 1 to 11 that deviated from the conditions of the present invention had a capacitance value of less than 100%. Comparative Example 1 does not perform the phosphorus-containing film generation process, and is used as a reference j for comparing capacitances. Since Comparative Example 2 has a low Pb content, an unetched portion was generated during etching, and Comparative Example 3 had a high Pb content, resulting in surface dissolution during etching, both of which were inferior in capacitance. .

比較例4はリン含有皮膜処理においてリン酸濃度が低いため、溶解減量が少なく不均一な酸化皮膜の除去が十分でなく、また、P/Oの値も小さくリン含有皮膜の生成量も少なくなり、静電容量が劣る。比較例5はリン酸濃度が高いため、生成するリン含有皮膜が不均一となって皮膜中の粗大欠陥が多くなったため、静電容量が劣るものとなった。   In Comparative Example 4, since the phosphoric acid concentration is low in the phosphorous-containing film treatment, the dissolution loss is small and the uneven oxide film is not sufficiently removed, and the P / O value is small and the amount of the phosphorous-containing film produced is small. , Capacitance is inferior. In Comparative Example 5, since the phosphoric acid concentration was high, the produced phosphorus-containing film was non-uniform and the number of coarse defects in the film increased, resulting in inferior capacitance.

比較例6はリン含有皮膜生成処理における液温が低く、結果として溶解減量(ΔW)が少なくなったため、不均一な酸化皮膜の除去が十分に行われず、また、P/Oの値も小さくリン含有皮膜の生成量も少なくなり、静電容量が劣る。比較例7はリン含有皮膜生成処理における液温が高く、結果として溶解減量が多くなったため、生成するリン含有皮膜が不均一となって皮膜中の粗大欠陥が多くなり、静電容量が劣る。   In Comparative Example 6, the liquid temperature in the phosphorus-containing film generation treatment was low, and as a result, the loss on dissolution (ΔW) was small. Therefore, the uneven oxide film was not sufficiently removed, and the P / O value was small and phosphorus was low. The production amount of the contained film is also reduced and the capacitance is inferior. In Comparative Example 7, the liquid temperature in the phosphorus-containing film generation treatment was high, and as a result, the dissolution weight loss increased. Therefore, the generated phosphorus-containing film became non-uniform, resulting in an increase in coarse defects in the film and poor capacitance.

比較例8はリン含有皮膜生成処理における処理時間が短く、結果として溶解減量が少なくなり、また、比較例9はリン含有皮膜生成処理における処理時間が長く、結果として溶解減量が多くなり、上記と同様に静電容量が劣るものとなった。   Comparative Example 8 has a short treatment time in the phosphorus-containing film generation treatment, resulting in a decrease in dissolution loss, and Comparative Example 9 has a long treatment time in the phosphorus-containing film production treatment, resulting in an increase in dissolution loss. Similarly, the capacitance was inferior.

比較例10は最終焼鈍温度が低いため、Pbの表面濃縮が少なくピット発生数が減少して、静電容量が低下している。比較例11は最終焼鈍温度が高いため、箔面のハリツキが強くなり、剥離する際に酸化皮膜が破壊してしまい静電容量が低下している。   In Comparative Example 10, since the final annealing temperature is low, the surface concentration of Pb is small, the number of pits generated is reduced, and the capacitance is lowered. In Comparative Example 11, since the final annealing temperature is high, the flaking of the foil surface becomes strong, and the oxide film is destroyed when peeled, resulting in a decrease in capacitance.

Claims (3)

Pb:0.1〜2.0ppmを含有するアルミニウム箔であって、最終焼鈍後において、蛍光X線発光分光分析で測定したアルミニウム箔表面のリン検出強度と酸素検出強度の比P/Oが1.5〜3.0であることを特徴とする電解コンデンサ電極用アルミニウム箔。 Pb: an aluminum foil containing 0.1 to 2.0 ppm, and the ratio P / O of the phosphorus detection intensity and the oxygen detection intensity on the aluminum foil surface measured by fluorescent X-ray emission spectrometry after the final annealing is 1 An aluminum foil for electrolytic capacitor electrodes, characterized in that it is .5 to 3.0. 箔圧延後のPb:0.1〜2.0ppmを含有するアルミニウム箔を濃度1〜5%のリン酸溶液に接触させて、アルミニウム箔の表面を溶解減量ΔWが0.03〜0.30g/m2となるよう処理した後、不活性ガス雰囲気中、510〜570℃の温度で焼鈍処理し、蛍光X線発光分光分析で測定したアルミニウム箔表面のリン検出強度と酸素検出強度の比P/Oを1.5〜3.0とすることを特徴とする電解コンデンサ電極用アルミニウム箔の製造方法。 Pb after foil rolling: An aluminum foil containing 0.1 to 2.0 ppm is brought into contact with a phosphoric acid solution having a concentration of 1 to 5%, and the surface of the aluminum foil has a dissolution loss ΔW of 0.03 to 0.30 g / After the treatment to m 2 , the ratio of phosphorus detection intensity and oxygen detection intensity on the aluminum foil surface measured by fluorescent X-ray emission spectroscopic analysis was annealed at a temperature of 510 to 570 ° C. in an inert gas atmosphere P / The manufacturing method of the aluminum foil for electrolytic capacitor electrodes characterized by making O into 1.5-3.0. 濃度1〜5%、温度20〜80℃のリン酸溶液に1〜30秒接触させることを特徴とする請求項2記載の電解コンデンサ電極用アルミニウム箔の製造方法。 The method for producing an aluminum foil for an electrolytic capacitor electrode according to claim 2, wherein the aluminum foil for electrolytic capacitor electrodes is brought into contact with a phosphoric acid solution having a concentration of 1 to 5% and a temperature of 20 to 80 ° C for 1 to 30 seconds.
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JP2004319794A (en) * 2003-04-16 2004-11-11 Showa Denko Kk Aluminum material for electrolytic capacitor electrode, its manufacturing method and electrolytic capacitor
JP2005015916A (en) * 2003-06-03 2005-01-20 Showa Denko Kk Method of producing aluminum material for electrolytic capacitor electrode, aluminum material for electrolytic capacitor electrode, method of producing electrode material for electrolytic capacitor and aluminum electrolytic capacitor

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JP2004319794A (en) * 2003-04-16 2004-11-11 Showa Denko Kk Aluminum material for electrolytic capacitor electrode, its manufacturing method and electrolytic capacitor
JP2005015916A (en) * 2003-06-03 2005-01-20 Showa Denko Kk Method of producing aluminum material for electrolytic capacitor electrode, aluminum material for electrolytic capacitor electrode, method of producing electrode material for electrolytic capacitor and aluminum electrolytic capacitor

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008218773A (en) * 2007-03-06 2008-09-18 Sumitomo Light Metal Ind Ltd Aluminum foil for electrolytic capacitor electrode and its manufacturing method

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