JP2006307255A5 - - Google Patents

Download PDF

Info

Publication number
JP2006307255A5
JP2006307255A5 JP2005128931A JP2005128931A JP2006307255A5 JP 2006307255 A5 JP2006307255 A5 JP 2006307255A5 JP 2005128931 A JP2005128931 A JP 2005128931A JP 2005128931 A JP2005128931 A JP 2005128931A JP 2006307255 A5 JP2006307255 A5 JP 2006307255A5
Authority
JP
Japan
Prior art keywords
processing chamber
supplying
processing
microwave
rust
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2005128931A
Other languages
Japanese (ja)
Other versions
JP2006307255A (en
JP4702680B2 (en
Filing date
Publication date
Application filed filed Critical
Priority to JP2005128931A priority Critical patent/JP4702680B2/en
Priority claimed from JP2005128931A external-priority patent/JP4702680B2/en
Publication of JP2006307255A publication Critical patent/JP2006307255A/en
Publication of JP2006307255A5 publication Critical patent/JP2006307255A5/ja
Application granted granted Critical
Publication of JP4702680B2 publication Critical patent/JP4702680B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Description

第2の発明として、被処理物を取出し自在に内装する処理室を備えると共に、前記処理室内を減圧する減圧手段、前記処理室内に少なくとも水素ガスを供給するガス供給手段、前記処理室内にマイクロ波電力を供給するマイクロ波供給手段からなるプラズマ発生手段を設け、プラズマ発生手段が発生する水素プラズマを被処理物に照射し、被処理物に付着している有機物をクリーニングする構成としたことを特徴とするマイクロ波を利用した錆落とし等の処理装置を提案する。

According to a second aspect of the present invention, there is provided a processing chamber in which an object to be processed is detachably provided, a decompression unit that decompresses the processing chamber, a gas supply unit that supplies at least hydrogen gas into the processing chamber, and a microwave in the processing chamber provided a plasma generating means comprising microwave supply means for supplying power, the plasma generating means hydrogen plasma generated by irradiating the object to be processed, and configured to clean the organic material adhering to the object to be processed We propose a processing device for rust removal, etc., using the characteristic microwave.

Claims (4)

被処理物を取出し自在に内装する処理室を備えると共に、
前記処理室内を減圧する減圧手段、前記処理室内に少なくとも水素ガスを供給するガス供給手段、前記処理室内にマイクロ波電力を供給するマイクロ波供給手段からなるプラズマ発生手段を設け、
プラズマ発生手段が発生する水素プラズマを被処理物に照射し、被処理物の錆を還元する構成としたことを特徴とするマイクロ波を利用した錆落とし等の処理装置。
In addition to having a processing chamber that allows the workpiece to be removed,
A pressure reducing means for reducing the pressure in the processing chamber, a gas supplying means for supplying at least hydrogen gas into the processing chamber, and a plasma generating means comprising a microwave supplying means for supplying microwave power into the processing chamber,
A processing apparatus for removing rust and the like using microwaves, characterized in that the processing object is irradiated with hydrogen plasma generated by plasma generating means to reduce rust of the processing object.
被処理物を取出し自在に内装する処理室を備えると共に、
前記処理室内を減圧する減圧手段、前記処理室内に少なくとも水素ガスを供給するガス供給手段、前記処理室内にマイクロ波電力を供給するマイクロ波供給手段からなるプラズマ発生手段を設け、
プラズマ発生手段が発生する水素プラズマを被処理物に照射し、被処理物に付着している有機物をクリーニングする構成としたことを特徴とするマイクロ波を利用した錆落とし等の処理装置。
In addition to having a processing chamber that allows the workpiece to be removed,
A pressure reducing means for reducing the pressure in the processing chamber, a gas supplying means for supplying at least hydrogen gas into the processing chamber, and a plasma generating means comprising a microwave supplying means for supplying microwave power into the processing chamber,
Hydrogen plasma plasma generating means generates and irradiates the object to be processed, the processing apparatus such as a dropped rust using microwaves, characterized in that a configuration in which clean the organic material adhering to the object to be processed.
請求項1又は2に記した処理装置において、
前記処理室には開閉可能なドアを設け、ドアの閉成状態で前記減圧手段、ガス供給手段、マイクロ波供給手段を動作可能に移行させるコントローラを備えたことを特徴とするマイクロ波を利用した錆落とし等の処理装置。
In the processing apparatus described in claim 1 or 2,
The processing chamber is provided with an openable / closable door, and a microwave is used, which includes a controller that operably shifts the decompression means, the gas supply means, and the microwave supply means when the door is closed. Processing equipment such as rust removal.
請求項1又は2に記載した処理装置において、
被処理物を収納させる籠状体と、この籠状体を処理室内で回転させる駆動機構とを設け、
籠状体を回転させながら被処理物の錆及び/又は有機物を還元する構成としたことを特徴とするマイクロ波を利用した錆落とし等の処理装置。
In the processing apparatus according to claim 1 or 2,
Provided with a bowl-shaped body for storing the workpiece and a drive mechanism for rotating the bowl-shaped body in the processing chamber;
A processing apparatus for removing rust and the like using microwaves, which is configured to reduce rust and / or organic matter of an object to be processed while rotating a rod-like body.
JP2005128931A 2005-04-27 2005-04-27 Processing equipment using microwaves Active JP4702680B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005128931A JP4702680B2 (en) 2005-04-27 2005-04-27 Processing equipment using microwaves

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005128931A JP4702680B2 (en) 2005-04-27 2005-04-27 Processing equipment using microwaves

Publications (3)

Publication Number Publication Date
JP2006307255A JP2006307255A (en) 2006-11-09
JP2006307255A5 true JP2006307255A5 (en) 2008-05-29
JP4702680B2 JP4702680B2 (en) 2011-06-15

Family

ID=37474473

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005128931A Active JP4702680B2 (en) 2005-04-27 2005-04-27 Processing equipment using microwaves

Country Status (1)

Country Link
JP (1) JP4702680B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019230184A1 (en) * 2018-05-29 2019-12-05 株式会社エスイー Manufacturing apparatus and manufacturing method for treating raw material with microwave surface wave plasma and obtaining product different from raw material
JP2021188092A (en) 2020-05-29 2021-12-13 ウシオ電機株式会社 Reduction treatment method

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8827933D0 (en) * 1988-11-30 1989-01-05 Plessey Co Plc Improvements relating to soldering processes
JPH06226086A (en) * 1993-01-28 1994-08-16 Daido Steel Co Ltd Plasma treating device
JPH06322163A (en) * 1993-05-10 1994-11-22 Daido Steel Co Ltd Rotary barrel type plasma treating device
US5938854A (en) * 1993-05-28 1999-08-17 The University Of Tennessee Research Corporation Method and apparatus for cleaning surfaces with a glow discharge plasma at one atmosphere of pressure
JP3213157B2 (en) * 1994-02-17 2001-10-02 住友特殊金属株式会社 Surface treatment method for Fe-BR-based magnet material
US6079426A (en) * 1997-07-02 2000-06-27 Applied Materials, Inc. Method and apparatus for determining the endpoint in a plasma cleaning process
FR2775986B1 (en) * 1998-03-10 2000-05-05 Air Liquide PROCESS AND INSTALLATION FOR SURFACE TREATMENT OF A METAL PART

Similar Documents

Publication Publication Date Title
HK1115836A1 (en) Apparatus for treatment of organic waste material and method for separating and recovering liquid material
WO2008000510A3 (en) Apparatus for treating organic waste material
TW200715412A (en) Method and apparatus for forming metal film
PL1893385T3 (en) Process and apparatus for treating exhausted abrasive slurries for the recovery of their reusable components
WO2008127315A3 (en) Apparatus and method for treating impurities in air and materials
WO2008105255A1 (en) Method of cleaning plasma-treating apparatus, plasma-treating apparatus where the cleaning method is practiced, and memory medium memorizing program executing the cleaning method
EP1748687A4 (en) Power supply circuit for plasma generation, plasma generating apparatus, plasma processing apparatus and plasma-processed object
WO2009036015A3 (en) Portable autonomous material processing system
WO2004066365A3 (en) Cleaning of cvd chambers using remote source with cxfyoz based chemistry
NL1033983A1 (en) Device for generating extreme ultraviolet radiation by means of electrical discharge on regenerable electrodes.
EP1736175A4 (en) Method of sterilization and apparatus therefor
TWI340178B (en) Apparatus for metal plasma vapor deposition and re-sputter with source and bias power frequencies applied through the workpiece
WO2011084121A3 (en) Apparatus and method for treating impurities in air and materials
TW200511430A (en) Plasma processing apparatus and plasma processing method
JP2006307255A5 (en)
DE602006001655D1 (en) Device for piecewise or batchwise handling of articles, with a supercritical or almost supercritical treatment agent at high pressure
JP2007208302A5 (en)
JP2004511328A (en) Waste treatment
WO2007106888A3 (en) Ozone based sanitizer
JP6511608B2 (en) Isostatic pressure device and pressure processing method using the same
TW200629986A (en) Plasma processing apparatus
JP2012172208A5 (en)
JP2004306029A (en) Chemical reactor and decomposing method of toxic substance
TW200801851A (en) Apparatus and method for photoresist removal processing
PL2178677T3 (en) A shot-blasting machine for surface treatment of products