JP2006302785A5 - - Google Patents
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- Publication number
- JP2006302785A5 JP2006302785A5 JP2005125806A JP2005125806A JP2006302785A5 JP 2006302785 A5 JP2006302785 A5 JP 2006302785A5 JP 2005125806 A JP2005125806 A JP 2005125806A JP 2005125806 A JP2005125806 A JP 2005125806A JP 2006302785 A5 JP2006302785 A5 JP 2006302785A5
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005125806A JP4747361B2 (ja) | 2005-04-22 | 2005-04-22 | 多価イオン照射装置及びそれを用いた微細構造の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005125806A JP4747361B2 (ja) | 2005-04-22 | 2005-04-22 | 多価イオン照射装置及びそれを用いた微細構造の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2006302785A JP2006302785A (ja) | 2006-11-02 |
| JP2006302785A5 true JP2006302785A5 (enExample) | 2008-05-22 |
| JP4747361B2 JP4747361B2 (ja) | 2011-08-17 |
Family
ID=37470823
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005125806A Expired - Fee Related JP4747361B2 (ja) | 2005-04-22 | 2005-04-22 | 多価イオン照射装置及びそれを用いた微細構造の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4747361B2 (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5135503B2 (ja) * | 2007-07-03 | 2013-02-06 | 独立行政法人情報通信研究機構 | 多価イオンビーム照射方法及び装置 |
| JP2009248284A (ja) * | 2008-04-10 | 2009-10-29 | Japan Science & Technology Agency | ナノ構造体の作製方法及びナノ構造体の作製装置 |
| US10062546B2 (en) | 2013-05-14 | 2018-08-28 | Hitachi, Ltd. | Sample holder and focused-ion-beam machining device provided therewith |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2731886B2 (ja) * | 1993-04-27 | 1998-03-25 | ▲巌▼ 大泊 | シングルイオン注入装置及び方法 |
| JPH08166362A (ja) * | 1994-10-14 | 1996-06-25 | Hitachi Ltd | 表面解析方法および装置 |
| JPH08213363A (ja) * | 1995-02-03 | 1996-08-20 | Hitachi Ltd | 表面処理方法および装置 |
| JP3774953B2 (ja) * | 1995-10-19 | 2006-05-17 | 株式会社日立製作所 | 走査形電子顕微鏡 |
| JP2001023917A (ja) * | 1999-07-06 | 2001-01-26 | Univ Waseda | ゆらぎを抑制した半導体装置 |
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2005
- 2005-04-22 JP JP2005125806A patent/JP4747361B2/ja not_active Expired - Fee Related