JP2006295095A - Image sensor in which glass having wiring is stuck to light receiving surface - Google Patents

Image sensor in which glass having wiring is stuck to light receiving surface Download PDF

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JP2006295095A
JP2006295095A JP2005144672A JP2005144672A JP2006295095A JP 2006295095 A JP2006295095 A JP 2006295095A JP 2005144672 A JP2005144672 A JP 2005144672A JP 2005144672 A JP2005144672 A JP 2005144672A JP 2006295095 A JP2006295095 A JP 2006295095A
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image sensor
glass
electrode
wiring
light receiving
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Takuo Sakurai
卓雄 櫻井
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Abstract

<P>PROBLEM TO BE SOLVED: To solve the problem wherein the degradation of reliability as a product such as the degradation of connection strength is incurred since it is needed to perform connection at an extremely small part in order to attach protective glass, to expose the electrode of input/output signals, and to directly connect it with the electrode of a signal processing substrate in an image sensor in which a light receiving surface occupies a very large ratio. <P>SOLUTION: An electrode and wiring are formed on glass originally attached for the purpose of protecting the light receiving surface of the image sensor, and the signals of the electrode are transmitted and received between the image sensor and the signal processing substrate through the electrode and the wiring on the glass. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は半導体であるイメージセンサと信号処理を行う基板との信号送受信を行うためにイメージセンサと基板の電極間の電気的接合を行う構造に関するものである。The present invention relates to a structure for performing electrical connection between an image sensor and an electrode of a substrate in order to perform signal transmission and reception between an image sensor that is a semiconductor and a substrate that performs signal processing.

従来のイメージセンサはその受光面をゴミや外力から保護するために光を透過する材料として石英ガラスを図17や図18のように貼り付けていた。
そして光をガラスを通じて受光したイメージセンサからはワイヤボンディングやフィンガーリードを用いて信号処理基板の電極と接続を行っていた。
In the conventional image sensor, quartz glass is pasted as shown in FIGS. 17 and 18 as a material that transmits light in order to protect the light receiving surface from dust and external force.
And the image sensor which received light through glass connected with the electrode of the signal processing board | substrate using the wire bonding or the finger lead.

従来の実施例ではイメージセンサーの電極と信号処理を行う基板の電極を直接に配線材の金属ワイヤやフィンガーリードを接続させて電気的導通を行うために絶縁材料のガラスから露出させる必要があった。
さらにガラスとイメージセンサとの接着面積が小さくなるためイメージセンサのチップサイズに対して受光面積の大きいイメージセンサチップでは十分なガラスの接着強度を得ることが難しく更に接続部分もガラスの存在のため非常に小さな部分となり十分に熱や荷重を加えることが困難になる問題を有していた。その結果、接続の信頼性が低下する問題を有していた。
またイメージセンサーにマイクロレンズが設けてある場合、イメージセンサーチップとガラスとの間でマイクロレンズ保護のため空間を要する必要がありそのためガラスを接着する際には空間を確保する部材を別に設ける必要があった。
In the conventional example, it is necessary to expose the electrode of the image sensor and the electrode of the substrate for signal processing from the glass of the insulating material in order to directly connect the metal wire or the finger lead of the wiring material to perform electrical conduction. .
Furthermore, since the bonding area between the glass and the image sensor is small, it is difficult to obtain sufficient glass bonding strength with an image sensor chip having a large light receiving area relative to the chip size of the image sensor. However, it becomes difficult to apply heat and load sufficiently. As a result, there is a problem that the reliability of connection is lowered.
If the image sensor has a microlens, it is necessary to provide a space between the image sensor chip and the glass to protect the microlens. Therefore, it is necessary to provide a separate member to secure the space when bonding the glass. there were.

イメージイメージセンサ受光面の保護を目的に貼り付けていたガラスに電気的導通が可能な配線を設けてイメージセンサの保護のみならずイメージセンサの電極と基板電極との電気的導通路としての橋渡しを行うようにする。
またガラスとイメージセンサ間の空間を維持するためにガラス電極上又はイメージセンサ電極上に突起の導電材料を用いたバンプ又は配線材料もしくは配線材の上に一定の厚みの絶縁材料を形成することで空間を確保できるようにする。
The glass that has been pasted for the purpose of protecting the light receiving surface of the image sensor is provided with a wiring that can be electrically connected to bridge not only the protection of the image sensor but also the electrical connection between the electrode of the image sensor and the substrate electrode. To do.
Further, in order to maintain the space between the glass and the image sensor, an insulating material with a certain thickness is formed on the glass electrode or the image sensor electrode by using a bump conductive material or a wiring material or a wiring material. Make space available.

ガラス表面上に配線を形成することでイメージセンサの電極を露出させる必要は無く受光面がチップサイズに対してその割合が大きくなっても信頼性に必要な接続面積を得ることが可能となった。
しかもガラス貼り付けと同時にイメージセンサ電極の電気的接続を外部電極まで導通させることが出来るため製造工程でガラス貼付と電極の接続を分けて行う必要がなく製造工程の短縮を行うことが出来た。
また凸型電極もしくは導通粒子を電極間に介在させることよりガラスとイメージセンサ間の空間を製造上安定的にかつ接続工程内で実施できるようになった。
しかも接続部分はガラスを通じて透過して観察することができるため接続性の検査を目視にて行うことができる利点を保持することが出来た。
By forming wiring on the glass surface, it is not necessary to expose the electrode of the image sensor, and it is possible to obtain the connection area necessary for reliability even if the ratio of the light receiving surface to the chip size increases. .
In addition, since the electrical connection of the image sensor electrode can be conducted to the external electrode at the same time as the application of the glass, it is not necessary to separately connect the application of the glass and the electrode in the manufacturing process, and the manufacturing process can be shortened.
In addition, the space between the glass and the image sensor can be stably produced in the connection process in the connection process by interposing the convex electrode or the conductive particles between the electrodes.
In addition, since the connecting portion can be observed through the glass, the advantage that the inspection of connectivity can be performed visually can be maintained.

ガラス表面上のイメージセンサ電極と接続する位置と信号処理基板の電極と接続する位置に電気的導通材料で電極を形成しその電極間にも導通材料で配線を形成する。
そしてイメージセンサ電極とガラス上の電極を接続しガラス上に形成した配線を通じて信号処理基板の電極まで電気的導通を実現する。
図1のようにイメージセンサーの受光側に面するガラス面においてイメージセンサ4の電極配置に合わせて導通材料で配線30を設ける。配線材料はITO,Poly−Si、Al、Au、Cu、Ni、Wi、Sn、Cr、In、半田などの金属をはじめとする導通材料を用いてCVD、蒸着、めっき又はインクジェット方式や印刷方式などの塗布手段を用いて配線を作成する。
配線形状はイメージセンサーチップの電極からチップの外側に伸びる形で図1のように配置する。配線の構造は単一の材料を用いて行ってもよいが接続の寿命・信頼性確保のため導電材料の多層の構造としても実現してもよい。
An electrode is formed of an electrically conductive material at a position connected to the image sensor electrode on the glass surface and a position connected to an electrode of the signal processing substrate, and wiring is also formed between the electrodes using the conductive material.
Then, the image sensor electrode and the electrode on the glass are connected, and electrical conduction is realized up to the electrode of the signal processing substrate through the wiring formed on the glass.
As shown in FIG. 1, a wiring 30 is provided with a conductive material on the glass surface facing the light receiving side of the image sensor in accordance with the electrode arrangement of the image sensor 4. Wiring materials are conductive materials including metals such as ITO, Poly-Si, Al, Au, Cu, Ni, Wi, Sn, Cr, In, solder, CVD, vapor deposition, plating, inkjet method, printing method, etc. Wiring is created using the coating means.
The wiring shape is arranged as shown in FIG. 1 so as to extend from the electrode of the image sensor chip to the outside of the chip. The wiring structure may be made using a single material, but it may also be realized as a multi-layer structure of conductive materials in order to ensure the life and reliability of the connection.

図1に示すようにまず加熱により硬化する接着剤を含んだ異方性導電材料6を用いてイメージセンサーチップ4と導通配線30を設けたガラス1を接続する。
このときイメージセンサーチップ裏面より荷重と熱を加えて異方性導電材料の接着材を硬化させるとともに導電粒子をガラス電極とイメージセンサチップの電極間に接触させる。その後基板8の電極9とガラスの電極3を同じ異方性導電材料6にて基板側より熱と荷重を加えることにより基板電極とガラス電極間の接続を行う。
この結果、受光した画像のデータをイメージセンサーにより電気信号に変換して基板側へ画像のデータを電気信号として送信することが可能となる。
ガラスとイメージセンサまたは基板との接続を異方性導電材料で行う場合に導通性を良好に確保するためにAu、Alなどの金属を下地の配線材料の上にめっきや蒸着又は析出などの手法により設けたガラスの実施例を図4に示す。
As shown in FIG. 1, first, the image sensor chip 4 and the glass 1 provided with the conductive wiring 30 are connected using an anisotropic conductive material 6 containing an adhesive that is cured by heating.
At this time, a load and heat are applied from the back surface of the image sensor chip to cure the adhesive of the anisotropic conductive material, and the conductive particles are brought into contact between the glass electrode and the electrode of the image sensor chip. After that, the electrode 9 of the substrate 8 and the glass electrode 3 are connected to the substrate electrode and the glass electrode by applying heat and load from the substrate side with the same anisotropic conductive material 6.
As a result, the received image data can be converted into an electrical signal by the image sensor, and the image data can be transmitted as an electrical signal to the substrate side.
Methods such as plating, vapor deposition or deposition on the underlying wiring material with a metal such as Au or Al in order to ensure good conductivity when the glass is connected to the image sensor or substrate with an anisotropic conductive material An example of the glass provided by is shown in FIG.

図5と図6においてイメージセンサをガラスに接続する際に基板電極とガラス電極間の電気的導通を計る部分の異方性導電材料が熱により接続前に硬化することを防ぐためにイメージセンサとガラス接続の後に再度 異方性導電材料を貼付または塗布してから基板とガラスを接続した実施例2を示す。5 and 6, when connecting the image sensor to the glass, the image sensor and the glass are used to prevent the anisotropic conductive material of the portion for measuring the electrical continuity between the substrate electrode and the glass electrode from being cured by the heat before the connection. Example 2 is shown in which the substrate and the glass are connected after the anisotropic conductive material is pasted or applied again after the connection.

図7は同じく基板とガラスの接続前にイメージセンサチップとガラスの接続の際に用いられる熱が伝導することを減少させるために空間を設けた実施例3を示す。
図7の実施例3を基板に接続した場合を示している。
FIG. 7 also shows a third embodiment in which a space is provided in order to reduce the conduction of heat used when the image sensor chip and the glass are connected before the substrate and the glass are connected.
The case where Example 3 of FIG. 7 is connected to the substrate is shown.

図9及び図10はガラスとチップ電極及び基板電極との接続を溶融する導通材料を用いて行う場合にその溶融する導通材料を配線の上に選択的に形成した構造を示したものである。
具体的な実施例としてイメージセンサ側の溶融する導電材料にIn又はSnを設け
FIGS. 9 and 10 show a structure in which the conductive material that melts is selectively formed on the wiring when the conductive material that melts the glass, the chip electrode, and the substrate electrode is used.
As a specific example, In or Sn is provided in the melting conductive material on the image sensor side.

また溶融材料を精度よく所定の位置に設けるために、またイメージセンサ及び基板上の配線との短絡を防止するためにガラス上の配線に絶縁材料31を設けて接続部分Further, in order to provide the molten material accurately at a predetermined position and to prevent a short circuit between the image sensor and the wiring on the substrate, an insulating material 31 is provided on the wiring on the glass to connect

図11ではイメージセンサ受光面以外のイメージセンサの部分に接触する位置に10−300umぐらいの高さで配線の短絡防止の材料又は凸型の電極形成時の金属又は絶縁材料で形成した部分19を用いてガラスとイメージセンサ間の空間を確保した実施例である。In FIG. 11, a portion 19 formed of a material for preventing a short circuit of wiring or a metal or an insulating material at the time of forming a convex electrode at a height of about 10 to 300 μm at a position in contact with a portion of the image sensor other than the light receiving surface of the image sensor. It is the Example which secured the space between glass and an image sensor using.

図12はガラスとイメージセンサとの接続を行った後に空間が出来るが粘度の高いシールド材20をイメージセンサ周辺に塗布することによりゴミや水分の侵入を防ぎ、一部開口した孔23より内部での結露を防ぐことが出来る実施例である。
ガラス上にイメージセンサとは接続するための配線以外に、結露した水分を蒸発させるヒータ21も設けて容易に結露を消滅させることが出来る。
In FIG. 12, a space is formed after the glass and the image sensor are connected, but a high-viscosity shield material 20 is applied to the periphery of the image sensor to prevent intrusion of dust and moisture. This is an embodiment that can prevent the dew condensation.
In addition to the wiring for connecting to the image sensor on the glass, a heater 21 for evaporating the condensed water can also be provided to easily eliminate the condensation.

図14及び図15はガラス上の電極とイメージセンサの凸電極間を異方性導電材料6で接続して基板電極とガラスの電極とは半田ボールを用いて溶融する金属にて接続し露出した配線上には溶融した金属が広がらないようにソルダレジストのような絶縁材25にて覆った構造とした本発明のガラス上の配線を利用した実施例8のイメージセンサを示したものである。
この実施例では前もってガラスに半田ボールを接続しておきその後イメージセンサをガラスに接続してその後基板上の電極に一括リフローによって溶融した半田ペースト26にて基板上の電極と半田ボールを接続した実施例である。
この場合、150c程度の加熱で接続が出来る異方性導電材料を使用し尚且つガラスが一括リフローの熱を遮断するためイメージセンサへの過度の加熱を防ぐことが出来る利点がある。
14 and 15, the electrode on the glass and the convex electrode of the image sensor are connected by an anisotropic conductive material 6, and the substrate electrode and the glass electrode are connected and exposed by a metal that is melted using a solder ball. The image sensor of Example 8 using the wiring on the glass of this invention made into the structure covered with the insulating material 25 like solder resist so that the molten metal may not spread on wiring was shown.
In this embodiment, the solder balls are connected to the glass in advance, and then the image sensor is connected to the glass, and then the electrodes on the substrate and the solder balls are connected to the electrodes on the substrate by solder paste 26 melted by batch reflow. It is an example.
In this case, there is an advantage that an anisotropic conductive material that can be connected by heating at about 150c is used, and that the glass blocks heat of reflow, so that excessive heating to the image sensor can be prevented.

本発明のイメージセンサ構造は高さが非常に小さくまた信号処理基板とガラス上の配線を通じて行うため実装面積としては非常に小さくすることが可能で携帯電話のカメラ及びカメラサイズを小さくすることが要求される監視カメラなど広く適用することが可能である。The image sensor structure of the present invention is extremely small in height and is implemented through wiring on the signal processing board and glass, so that the mounting area can be very small, and the camera of the mobile phone and the camera size must be reduced. It can be widely applied to surveillance cameras.

配線が形成されたガラスに異方性導電材料で接続されたイメージセンサの平面図Plan view of an image sensor connected to the glass with wiring with anisotropic conductive material 図1をAA’で切断した断面図1 is a cross-sectional view taken along AA ' 図1で示されたイメージセンサが接続されたガラスを基板に接続した場合の断面図Sectional view when the glass to which the image sensor shown in FIG. 1 is connected is connected to the substrate 配線上に金属がめっきされたガラス構造の図Illustration of glass structure with metal plated on wiring イメージセンサの電極とガラス上の配線電極とを接続する異方導電材料のみが設けられたガラスGlass provided only with an anisotropic conductive material that connects the electrode of the image sensor and the wiring electrode on the glass 図5のあとに更に異方性導電材料が取り付けられて基板と接続されたイメージセンサImage sensor in which an anisotropic conductive material is further attached after FIG. 5 and connected to the substrate 基板電極接続用の異方性導電材料が接続前に熱硬化することを防ぐために分離して異方性導電材料が取り付けられたガラスとイメージセンサの構造図Structure diagram of glass and image sensor with anisotropic conductive material attached separately to prevent anisotropic conductive material for substrate electrode connection from thermosetting before connection 図7のイメージセンサが取り付いたガラスを基板に接続した状態を示す断面図Sectional drawing which shows the state which connected the glass with which the image sensor of FIG. 7 was attached to the board | substrate イメージセンサ電極と基板電極に対してそれぞれ溶融して接続する異なった金属が形成された配線構造を持つガラスGlass with a wiring structure in which different metals are formed that are melted and connected to the image sensor electrode and the substrate electrode, respectively. 図9の配線構造を持つガラスを用いてイメージセンサと基板を接続した実施例の断面図Sectional drawing of the Example which connected the image sensor and the board | substrate using the glass with the wiring structure of FIG. ガラスとイメージセンサ間の空間を配線材料により確保した場合の断面図Sectional view when space between glass and image sensor is secured by wiring material イメージセンサの廻りにガラスとイメージセンサ間の空間を覆うシール材を取り付けてガラス上にヒータ配線を形成した実施例の平面図The top view of the Example which attached the sealing material which covers the space between glass and an image sensor around the image sensor, and formed the heater wiring on glass 図12のBB’にて切断した場合の断面図Sectional view when cut along BB 'in FIG. ガラスの基板電極との接続部分に半田ボールを取り付けガラスの配線上に短絡防止の絶縁材料を取り付けた実施例の平面図Plan view of an embodiment in which a solder ball is attached to a connection portion with a glass substrate electrode, and an insulating material for preventing a short circuit is attached on a glass wiring 図14のCC’線にて切断した場合の断面図Sectional view when cut along line CC 'in FIG. 図15の実施例を基板に実装した場合の実施例の構造図Structure diagram of the embodiment when the embodiment of FIG. 15 is mounted on a substrate 従来のワイヤボンディングを用いた場合のイメージセンサ組立状態を示す断面図Sectional drawing which shows the image sensor assembly state at the time of using the conventional wire bonding 従来のフィンガーリードを用いた場合のイメージセンサ組立状態を示す断面図Sectional drawing which shows the image sensor assembly state at the time of using the conventional finger lead | read | reed

符号の説明Explanation of symbols

1 ガラス
2 イメージセンサの電極と接続するガラス上の電極
3 基板上の電極と接続するガラス上の電極
4 イメージセンサ
5 イメージセンサ上の電極
6 異方性導電材料
7 受光する光
8 基板
9 基板上の電極配線
10 ガラス上の電極配線を覆うめっき金属
11 イメージセンサ電極接続用の異方性導電材料
12 11の異方性導電材料が硬化した後で取り付けられた異方性導電材料
13 熱伝導を抑制するために設けられた隙間
14 熱伝導を抑制するために分断されて取り付けられた異方性導電材料
15 基板電極と溶融して接続する金属材料
16 イメージセンサ電極と溶融して接続する金属材料
17 基板電極と溶融して接続した金属材料
18 イメージセンサ電極と溶融して接続した金属材料
19 ガラスとイメージセンサ間の空間を保つための配線材料
20 シールド材
21 ガラス上のヒータ配線
22 ヒータ配線の電極
23 水蒸気逃がし孔
24 半田ボール
25 絶縁材
26 半田ボールを保持するために溶融した金属材料
27 基板電極上で溶融した半田ペースト
28 イメージセンサの電極と基板電極とを接続するボンディングワイヤ
29 フィンガーリード
30 ガラス上の配線
31 絶縁材料
DESCRIPTION OF SYMBOLS 1 Glass 2 Electrode on glass connected to electrode of image sensor 3 Electrode on glass connected to electrode on substrate 4 Image sensor 5 Electrode on image sensor 6 Anisotropic conductive material 7 Light 8 to receive light Substrate 9 On substrate The electrode wiring 10 of the metal plating 11 covering the electrode wiring on the glass 11 The anisotropic conductive material 12 for connecting the image sensor electrode 11 The anisotropic conductive material 13 attached after the anisotropic conductive material is cured 13 Clearance 14 provided to suppress anisotropic conductive material 15 that is divided and attached to suppress heat conduction Metal material 16 that melts and connects to substrate electrode Metal material that melts and connects to image sensor electrode 17 Metal material fused and connected to the substrate electrode 18 Metal material fused and connected to the image sensor electrode 19 For maintaining a space between the glass and the image sensor Wiring material 20 Shielding material 21 Heater wiring 22 on glass Heater wiring electrode 23 Water vapor escape hole 24 Solder ball 25 Insulating material 26 Metal material melted to hold solder ball 27 Solder paste 28 melted on substrate electrode Image sensor Bonding wire 29 for connecting the electrode and substrate electrode 29 Finger lead 30 Wiring 31 on glass Insulating material

Claims (4)

イメージセンサの受光面に貼り付けるガラスに導電材料にて配線と外部電極を形成しイメージセンサの電極とガラス表面上の配線を電気的に接続させて、そのガラスの電極と信号処理を行う基板電極も電気的に接続させてイメージセンサと信号処理の基板との信号の送受信をイメージセンサ受光面の保護を目的としたガラス上に形成した配線より行うことを特徴とした構造を持つイメージセンサA substrate electrode that performs signal processing by forming a wiring and an external electrode with a conductive material on the glass to be attached to the light receiving surface of the image sensor and electrically connecting the electrode of the image sensor and the wiring on the glass surface. An image sensor having a structure characterized in that a signal is transmitted and received between the image sensor and a signal processing board by a wiring formed on glass for the purpose of protecting the light receiving surface of the image sensor. 請求項1において用いるイメージセンサの電極とガラスの電極との接続はイメージセンサとガラスとの間隔を保持するためにイメージセンサ又はガラスの電極または双方を凸形状の電極として一方の金属を溶融させて接続、又は電極間に導通粒子を介在させて電気的導通を確保すると同時にガラスとイメージセンサ受光面との間隔を保持することを特徴とする構造を有したイメージセンサThe connection between the electrode of the image sensor and the glass electrode used in claim 1 is performed by melting one metal using the image sensor or the glass electrode or both as convex electrodes in order to maintain the distance between the image sensor and the glass. An image sensor having a structure characterized in that electrical conductivity is ensured by interposing conductive particles between the electrodes or electrodes, and at the same time the distance between the glass and the light receiving surface of the image sensor is maintained. 請求項1においてガラス表面上に電気的導通性を有しない部材を形成してイメージセンサの受光面以外の部分に接触させてガラスとイメージセンサ受光面との間隔を保持することを特徴とする構造を有したイメージセンサ2. A structure according to claim 1, wherein a member having no electrical continuity is formed on the glass surface and brought into contact with a portion other than the light receiving surface of the image sensor to maintain a distance between the glass and the light receiving surface of the image sensor. Image sensor with 請求項1、2,3においてガラスとイメージセンサ間の空間にゴミや液体または多量の水分を含んだ空気が侵入してくることを防ぐためにシール材を取り付け防止するとともにそのシール材の塗布形状において外気と通じる孔を設けてガラスとイメージセンサ間の空間で露となった水分が蒸発して外気に逃げて行くようにしたことを特徴としたイメージセンサIn claim 1, 2, and 3, in order to prevent dust, liquid or air containing a large amount of moisture from entering the space between the glass and the image sensor, the sealing material is prevented from being attached and the sealing material is applied in the shape. An image sensor characterized in that a hole communicating with the outside air is provided so that the moisture dew is evaporated in the space between the glass and the image sensor and escapes to the outside air.
JP2005144672A 2005-04-14 2005-04-14 Image sensor in which glass having wiring is stuck to light receiving surface Withdrawn JP2006295095A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008193441A (en) * 2007-02-06 2008-08-21 Matsushita Electric Ind Co Ltd Optical device and manufacturing method thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008193441A (en) * 2007-02-06 2008-08-21 Matsushita Electric Ind Co Ltd Optical device and manufacturing method thereof

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