JP2006287214A5 - - Google Patents
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- Publication number
- JP2006287214A5 JP2006287214A5 JP2006062375A JP2006062375A JP2006287214A5 JP 2006287214 A5 JP2006287214 A5 JP 2006287214A5 JP 2006062375 A JP2006062375 A JP 2006062375A JP 2006062375 A JP2006062375 A JP 2006062375A JP 2006287214 A5 JP2006287214 A5 JP 2006287214A5
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- manufacturing apparatus
- semiconductor manufacturing
- ionizer
- sheath
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Claims (6)
前記チャンバー内に回転可能に設けられたキャリア載置体と、
前記キャリア載置体に設けられたキャリア固定治具と、
前記チャンバーに近接して設けられたイオナイザーと、
前記チャンバーに近接し、前記イオナイザーを内包するように設けられたシースと、
前記チャンバー及び前記シースに形成された開口部と、
を有し、
前記開口部は、前記イオナイザーで発生したイオンが前記チャンバー内に拡散するように設けられている
ことを特徴とする半導体製造装置。 A cylindrical chamber;
A carrier mounting body rotatably provided in the chamber;
A carrier fixing jig provided on the carrier mounting body;
An ionizer provided close to the chamber;
A sheath provided close to the chamber and enclosing the ionizer;
An opening formed in the chamber and the sheath;
Have
The semiconductor manufacturing apparatus , wherein the opening is provided so that ions generated by the ionizer diffuse into the chamber .
前記チャンバー内に回転可能に設けられたキャリア載置体と、
前記キャリア載置体に設けられたキャリア固定治具と、
前記チャンバーに近接して設けられた軟Ｘ線イオナイザーと、
前記チャンバーに近接し、前記軟Ｘ線イオナイザーを内包するように設けられたシースと、
前記チャンバー及び前記シースに形成された開口部と、
を有し、
前記開口部は、前記軟Ｘ線イオナイザーで発生したイオンは前記チャンバー内に拡散し、前記軟Ｘ線イオナイザーから照射される軟Ｘ線は遮蔽するように遮蔽板が設けられている
ことを特徴とする半導体製造装置。 A cylindrical chamber;
A carrier mounting body rotatably provided in the chamber;
A carrier fixing jig provided on the carrier mounting body;
A soft X-ray ionizer provided close to the chamber;
A sheath provided close to the chamber and enclosing the soft X-ray ionizer;
An opening formed in the chamber and the sheath;
Have
The opening is provided with a shielding plate so that ions generated by the soft X-ray ionizer diffuse into the chamber and shield soft X-rays emitted from the soft X-ray ionizer. A semiconductor manufacturing apparatus .
前記遮蔽板は、ポリ塩化ビニルまたはアルミニウムからなるThe shielding plate is made of polyvinyl chloride or aluminum.
ことを特徴とする半導体製造装置。A semiconductor manufacturing apparatus.
前記キャリア固定治具は可動である
ことを特徴とする半導体製造装置。 In any one of Claims 1 thru | or 3,
The semiconductor manufacturing apparatus, wherein the carrier fixing jig is movable .
前記チャンバー内、若しくは前記チャンバーに近接して設けられた液体供給手段、気体供給手段、または被処理物感知手段を有する
ことを特徴とする半導体製造装置。 In any one of Claims 1 thru | or 4 ,
A semiconductor manufacturing apparatus comprising: a liquid supply means , a gas supply means, or an object sensing means provided in the chamber or in the vicinity of the chamber.
前記シースは、ガラス、金属、ポリプロピレン、ポリエチレン、またはポリテトラフルオロエチレンからなるThe sheath is made of glass, metal, polypropylene, polyethylene, or polytetrafluoroethylene.
ことを特徴とする半導体製造装置。A semiconductor manufacturing apparatus.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006062375A JP4767046B2 (en) | 2005-03-11 | 2006-03-08 | Semiconductor manufacturing equipment |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005068473 | 2005-03-11 | ||
| JP2005068473 | 2005-03-11 | ||
| JP2006062375A JP4767046B2 (en) | 2005-03-11 | 2006-03-08 | Semiconductor manufacturing equipment |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2006287214A JP2006287214A (en) | 2006-10-19 |
| JP2006287214A5 true JP2006287214A5 (en) | 2009-03-19 |
| JP4767046B2 JP4767046B2 (en) | 2011-09-07 |
Family
ID=37408720
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006062375A Expired - Fee Related JP4767046B2 (en) | 2005-03-11 | 2006-03-08 | Semiconductor manufacturing equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4767046B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2007113979A1 (en) * | 2006-03-30 | 2007-10-11 | Mitsubishi Electric Corporation | Power converter and its assembling method |
| WO2023150161A1 (en) * | 2022-02-07 | 2023-08-10 | Applied Materials, Inc. | Chamber ionizer for reducing electrostatic discharge |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0845894A (en) * | 1994-07-29 | 1996-02-16 | Nec Yamagata Ltd | Wafer drying apparatus |
| JP3121520B2 (en) * | 1995-04-24 | 2001-01-09 | 高砂熱学工業株式会社 | Local clean space |
| JP3471543B2 (en) * | 1996-11-07 | 2003-12-02 | 大日本スクリーン製造株式会社 | Rotary substrate drying equipment |
| JP4698871B2 (en) * | 2001-04-06 | 2011-06-08 | 一雄 岡野 | Soft X-ray ionizer |
| JP2005044975A (en) * | 2003-07-28 | 2005-02-17 | Dainippon Screen Mfg Co Ltd | Equipment and method for substrate processing |
-
2006
- 2006-03-08 JP JP2006062375A patent/JP4767046B2/en not_active Expired - Fee Related
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