JP2006278796A - Exposure method and exposure apparatus, and device-manufacturing method - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an exposure method capable of preventing deterioration in exposure accuracy, due to bubbles inside a liquid. <P>SOLUTION: This method has a first process of supplying a second liquid different in at least either of specific gravity and temperature from a first liquid into the first liquid in a second space K2, or a second process of discharging the second liquid from the second space K2. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to an exposure method and an exposure apparatus for exposing a substrate through a liquid, and a device manufacturing method.

In a photolithography process that is one of the manufacturing processes of microdevices such as semiconductor devices and liquid crystal display devices, an exposure apparatus that projects and exposes a pattern formed on a mask onto a photosensitive substrate is used. This exposure apparatus has a mask stage for supporting a mask and a substrate stage for supporting a substrate, and projects the mask pattern onto the substrate via a projection optical system while sequentially moving the mask stage and the substrate stage. is there. In the manufacture of micro devices, miniaturization of patterns formed on a substrate is required in order to increase the density of devices. In order to meet this demand, it is desired to further increase the resolution of the exposure apparatus. As one of means for realizing the high resolution, a liquid that fills the optical path space of the exposure light with a liquid and irradiates the substrate with the exposure light through the liquid as disclosed in Patent Document 1 below. An immersion exposure apparatus has been devised.
International Publication No. 99/49504 Pamphlet

  By the way, when the optical path space is filled with liquid, foreign substances such as bubbles may be generated in the liquid. If a foreign matter such as a bubble is left in the liquid, the exposure accuracy (pattern transfer accuracy) when the pattern is projected and exposed to the substrate may deteriorate due to the foreign matter.

  The present invention has been made in view of such circumstances, and an object of the present invention is to provide an exposure method, an exposure apparatus, and a device manufacturing method that can prevent deterioration in exposure accuracy due to foreign matter in a liquid.

  In order to solve the above-described problems, the present invention employs the following configurations corresponding to the respective drawings shown in the embodiments. However, the reference numerals with parentheses attached to each element are merely examples of the element and do not limit each element.

  According to the first aspect of the present invention, a predetermined space (K2) that is a part of the optical path space of the exposure light (EL) is filled with the first liquid (LQ1), and the substrate (P ) Is irradiated with exposure light (EL) to expose the substrate (P), and the second liquid is different from the first liquid (LQ1) in at least one of specific gravity and temperature. There is provided an exposure method including a first step of supplying (LQ2) and a second step of removing the second liquid (LQ2) from the predetermined space (K2).

  According to the first aspect of the present invention, after the second liquid is supplied to the first liquid in the predetermined space, the second liquid is excluded from the predetermined space, thereby removing the foreign matter existing in the first liquid. And can be eliminated. Therefore, it is possible to prevent the deterioration of exposure accuracy due to the foreign matter in the first liquid filled in the predetermined space.

  According to the second aspect of the present invention, a predetermined space (K2) of a part of the optical path space of the exposure light (EL) is filled with the first liquid (LQ1), and the substrate (P ) Is exposed to exposure light (EL) to expose the substrate (P), the first supply section (31) capable of supplying the first liquid (LQ1) to the predetermined space (K2), and the predetermined space ( A second supply unit (35) capable of supplying a second liquid (LQ2) having at least one of specific gravity and temperature different from that of the first liquid (LQ1) to K2), and the first liquid supplied to the predetermined space (K2) An exposure apparatus (EX) provided with a control device (CONT) for controlling the operations of the first and second supply sections (31, 35) so as to supply the second liquid (LQ2) to (LQ1). Provided.

  According to the second aspect of the present invention, after the second liquid is supplied to the first liquid in the predetermined space, the second liquid is excluded from the predetermined space, thereby removing the foreign matter existing in the first liquid. And can be eliminated. Therefore, it is possible to prevent the deterioration of exposure accuracy due to the foreign matter in the first liquid filled in the predetermined space.

  According to the third aspect of the present invention, a device manufacturing method using the exposure apparatus (EX) of the above aspect is provided.

  According to the third aspect of the present invention, a device can be manufactured using an exposure apparatus in which deterioration of exposure accuracy due to foreign matter in the first liquid filled in a predetermined space is prevented.

  According to the present invention, it is possible to expose a substrate while preventing deterioration in exposure accuracy due to foreign matters in the liquid.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings, but the present invention is not limited thereto.

<First Embodiment>
FIG. 1 is a schematic block diagram that shows an exposure apparatus EX according to the first embodiment. In FIG. 1, an exposure apparatus EX exposes a mask stage MST that is movable while holding a mask M, a substrate stage PST that is movable while holding a substrate P, and a mask M that is held by the mask stage MST. The operation of the illumination optical system IL that illuminates with EL, the projection optical system PL that projects and exposes the pattern image of the mask M illuminated with the exposure light EL onto the substrate P held by the substrate stage PST, and the overall operation of the exposure apparatus EX. And a control device CONT for overall control. The control device CONT is connected to a display device DY that displays information related to the exposure process.

  The exposure apparatus EX of the present embodiment is an immersion exposure apparatus to which an immersion method is applied in order to substantially shorten the exposure wavelength to improve the resolution and substantially widen the depth of focus. Of the plurality of optical elements LS1 to LS7 constituting the PL, the first liquid LQ1 fills the first space K1 between the lower surface T1 of the first optical element LS1 closest to the image plane of the projection optical system PL and the substrate P. A first immersion mechanism 1 is provided. The substrate P is provided on the image plane side of the projection optical system PL, and the lower surface T1 of the first optical element LS1 is disposed so as to face the surface of the substrate P. The first liquid immersion mechanism 1 includes an annular first nozzle member 71 provided so as to surround the side surface of the first optical element LS1 above the substrate P (substrate stage PST), the first supply pipe 13, and the first The first liquid supply unit 11 capable of supplying the first liquid LQ1 to the first space K1 between the lower surface T1 of the first optical element LS1 and the substrate P through the first supply port 12 provided in the one nozzle member 71. And a liquid recovery part 21 capable of recovering the first liquid LQ1 in the first space K1 via the first recovery port 22 provided in the first nozzle member 71 and the first recovery pipe 23. The operation of the first immersion mechanism 1 is controlled by the control device CONT.

  Further, the exposure apparatus EX fills the second space K2 between the first optical element LS1 and the second optical element LS2 next to the image plane of the projection optical system PL after the first optical element LS1 with the first liquid LQ1. A second immersion mechanism 2 is provided. The second optical element LS2 is disposed above the first optical element LS1, and the upper surface T2 of the first optical element LS1 is disposed so as to face the lower surface T3 of the second optical element LS2. The second liquid immersion mechanism 2 includes an annular second nozzle member 72 provided so as to surround the side surface of the second optical element LS2 above the first optical element LS1, a second supply pipe 33, and a second nozzle. A first liquid LQ1 that can be supplied to the second space K2 between the lower surface T3 of the second optical element LS2 and the upper surface T2 of the first optical element LS1 through the second supply port 32 provided in the member 72. The liquid supply unit 31, the recovery port 42 provided in the second nozzle member 72, and the liquid recovery unit 41 that can recover the first liquid LQ1 in the second space K2 through the second recovery pipe 43 are provided. . The operation of the second immersion mechanism 2 is controlled by the control device CONT.

  The second liquid immersion mechanism 2 includes a second liquid supply unit 35 that can supply the second liquid LQ2 having a specific gravity different from that of the first liquid LQ1 to the second space K2. In the present embodiment, the first liquid supply units 11 and 31 supply pure water as the first liquid LQ1, and the second liquid supply unit 35 has a specific gravity as the second liquid LQ2 than the first liquid (pure water) LQ1. Supply small alcohol. More specifically, the second liquid supply unit 35 supplies ethanol (or methanol) as the second liquid LQ2.

  In the present embodiment, the first space K1 between the first optical element LS1 and the substrate P and the second space K2 between the first optical element LS1 and the second optical element LS2 are independent spaces. The liquid does not enter or exit from one of the first space K1 and the second space K2. The control device CONT performs the liquid supply operation and the recovery operation for the first space K1 by the first liquid immersion mechanism 1 and the liquid supply operation and the recovery operation for the second space K2 by the second liquid immersion mechanism 2 independently of each other. be able to.

  The exposure apparatus EX uses the first liquid immersion mechanism 1 to transfer the first optical element LS1 and the substrate P arranged on the image plane side at least while transferring the pattern image of the mask M onto the substrate P. The first space K1 including the optical path space of the exposure light EL is filled with the first liquid LQ1 to form the first immersion region LR1, and the second immersion mechanism 2 is used to connect the first optical element LS1 and the first optical element LS1. The second space K2 including the optical path space between the two optical elements LS2 is filled with the first liquid LQ1 to form the second immersion region LR2. In the present embodiment, the exposure apparatus EX locally places the first immersion region LR1 larger than the projection region AR1 and smaller than the substrate P on a part of the substrate P including the projection region AR1 of the projection optical system PL. The local immersion method is used. In the present embodiment, the exposure apparatus EX forms the second immersion region LR2 of the first liquid LQ1 in the region including the region AR2 through which the exposure light EL passes on the upper surface T2 of the first optical element LS1. The exposure apparatus EX irradiates the substrate P with the exposure light EL that has passed through the mask M through the projection optical system PL and the first liquid LQ1 in the first and second spaces K1 and K2, thereby forming a pattern of the mask M. Projection exposure is performed on the substrate P.

  The substrate stage PST is provided with a detection device 160 capable of detecting the states of the first space K1 and the second space K2. The detection device 160 is provided inside the substrate stage PST. The detection device 160 can detect the presence or absence of foreign matter in the first and second spaces K1, K2.

  In the present embodiment, the exposure apparatus EX is a scanning exposure apparatus (so-called so-called exposure apparatus EX) that exposes the pattern formed on the mask M onto the substrate P while synchronously moving the mask M and the substrate P in different directions (reverse directions) in the scanning direction. A case where a scanning stepper) is used will be described as an example. In the following description, the direction that coincides with the optical axis AX of the projection optical system PL is the Z-axis direction, the synchronous movement direction (scanning direction) between the mask M and the substrate P in the plane perpendicular to the Z-axis direction is the X-axis direction, A direction (non-scanning direction) perpendicular to the Z-axis direction and the X-axis direction is defined as a Y-axis direction. Further, the rotation (inclination) directions around the X axis, Y axis, and Z axis are the θX, θY, and θZ directions, respectively.

The illumination optical system IL includes an exposure light source that emits exposure light EL, an optical integrator that equalizes the illuminance of the exposure light EL emitted from the exposure light source, a condenser lens that collects the exposure light EL from the optical integrator, and a relay. A lens system and a field stop for setting an illumination area on the mask M by the exposure light EL are included. A predetermined illumination area on the mask M is illuminated with the exposure light EL having a uniform illuminance distribution by the illumination optical system IL. As the exposure light EL emitted from the exposure light source, for example, far ultraviolet light (DUV light) such as bright lines (g-line, h-line, i-line) and KrF excimer laser light (wavelength 248 nm) emitted from a mercury lamp, , Vacuum ultraviolet light (VUV light) such as ArF excimer laser light (wavelength 193 nm) and F ₂ laser light (wavelength 157 nm) is used. In this embodiment, ArF excimer laser light is used.

  The pure water used as the first liquid LQ1 is not only ArF excimer laser light, but also, for example, bright lines (g-line, h-line, i-line) emitted from a mercury lamp and KrF excimer laser light (wavelength 248 nm). Ultraviolet light (DUV light) can also be transmitted.

  Mask stage MST is movable while holding mask M. Mask stage MST holds mask M by vacuum suction (or electrostatic suction). The mask stage MST is in a plane perpendicular to the optical axis AX of the projection optical system PL in a state where the mask M is held by driving a mask stage driving device MSTD including a linear motor controlled by the control device CONT, that is, XY. It can move two-dimensionally in the plane and can rotate slightly in the θZ direction. The mask stage MST is movable at a scanning speed designated in the X-axis direction, and has a movement stroke in the X-axis direction that allows the entire surface of the mask M to cross at least the optical axis AX of the projection optical system PL. is doing.

  A movable mirror 51 is provided on the mask stage MST. A laser interferometer 52 is provided at a position facing the moving mirror 51. The position of the mask M on the mask stage MST in the two-dimensional direction and the rotation angle in the θZ direction (including rotation angles in the θX and θY directions in some cases) are measured by the laser interferometer 52 in real time. The measurement result of the laser interferometer 52 is output to the control device CONT. The control device CONT drives the mask stage driving device MSTD based on the measurement result of the laser interferometer 52, and controls the position of the mask M held on the mask stage MST.

  The projection optical system PL projects and exposes the pattern of the mask M onto the substrate P at a predetermined projection magnification β, and includes a plurality of optical elements LS1 including the first optical element LS1 provided at the front end portion on the substrate P side. ~ LS7. Among the plurality of optical elements LS <b> 1 to LS <b> 7, the first optical element LS <b> 1 is held by a holding member (lens cell) 60, and the holding member 60 is connected to the second nozzle member 72. A plurality of optical elements LS2 to LS7 other than the first optical element LS1 are supported by a lens barrel PK. The second nozzle member 72 is connected to the lower end of the lens barrel PK. In the present embodiment, the second nozzle member 72 and the lens barrel PK are substantially integrated. In other words, the second nozzle member 72 constitutes a part of the lens barrel PK. In the present embodiment, the projection optical system PL is a reduction system having a projection magnification β of, for example, 1/4, 1/5, or 1/8. Note that the projection optical system PL may be either an equal magnification system or an enlargement system.

  The substrate stage PST is capable of moving a substrate holder PH that holds the substrate P. The substrate holder PH holds the substrate P by, for example, vacuum suction. The substrate stage PST is driven in the XY plane on the base BP in a state where the substrate P is held via the substrate holder PH by driving the substrate stage driving device PSTD including a linear motor and the like controlled by the control device CONT. Dimensional movement is possible, and minute rotation is possible in the θZ direction. Furthermore, the substrate stage PST is also movable in the Z-axis direction, the θX direction, and the θY direction.

  A movable mirror 53 is provided on the side surface of the substrate stage PST. A laser interferometer 54 is provided at a position facing the moving mirror 53. The position and rotation angle of the substrate P on the substrate stage PST in the two-dimensional direction are measured in real time by the laser interferometer 54. Although not shown, the exposure apparatus EX includes a focus / leveling detection system that detects positional information on the surface of the substrate P supported by the substrate stage PST. As the focus / leveling detection system, an oblique incidence method in which the surface of the substrate P is irradiated with detection light from an oblique direction, a method using a capacitive sensor, or the like can be employed. The focus / leveling detection system detects position information in the Z-axis direction of the surface of the substrate P and tilt information in the θX and θY directions of the substrate P through the first liquid LQ1 or without the first liquid LQ1. .

  The measurement result of the laser interferometer 54 is output to the control device CONT. The detection result of the focus / leveling detection system is also output to the control device CONT. The control device CONT drives the substrate stage driving device PSTD based on the detection result of the focus / leveling detection system, and controls the focus position and the tilt angle of the substrate P so that the surface of the substrate P is auto-focused and auto-leveling. The position of the substrate P in the X-axis direction and the Y-axis direction is controlled based on the measurement result of the laser interferometer 54 while matching with the image plane of the projection optical system PL.

  A recess 55 is provided on the substrate stage PST, and a substrate holder PH for holding the substrate P is disposed in the recess 55. The upper surface 56 of the substrate stage PST other than the concave portion 55 is a flat surface (flat portion) that is substantially the same height (level) as the surface of the substrate P held by the substrate holder PH.

  The first liquid immersion mechanism 1 includes a first liquid supply unit 11 that can deliver the first liquid LQ1, and a first supply pipe 13 that connects one end of the first liquid supply unit 11 to the first liquid supply unit 11. The other end of the first supply pipe 13 is connected to the first nozzle member 71. The first liquid supply unit 11 includes a tank that accommodates the first liquid LQ1, a pressure pump, a temperature adjustment device that adjusts the temperature of the first liquid LQ1 to be supplied, and foreign matter (including bubbles) in the first liquid LQ1. A filter unit to be removed is provided. The operation of the first liquid supply unit 11 is controlled by the control device CONT.

  Further, the first liquid immersion mechanism 1 includes a liquid recovery unit 21 that can recover the first liquid LQ1, and a first recovery pipe 23 that connects one end of the liquid recovery unit 21 to the liquid recovery unit 21. The other end of the first recovery pipe 23 is connected to the first nozzle member 71. The liquid recovery unit 21 includes, for example, a vacuum system (a suction device) such as a vacuum pump, a gas-liquid separator that separates the recovered first liquid LQ1 and gas, a tank that stores the recovered first liquid LQ1, and the like. Yes. The operation of the liquid recovery unit 21 is controlled by the control device CONT.

  The second liquid immersion mechanism 2 includes a first liquid supply unit 31 that can deliver the first liquid LQ1, and a second supply pipe 33 that connects one end of the first liquid supply unit 31 to the first liquid supply unit 31. The other end of the second supply pipe 33 is connected to the second nozzle member 72. The first liquid supply unit 31 includes a tank that accommodates the first liquid LQ1, a pressure pump, a temperature adjustment device that adjusts the temperature of the first liquid LQ1 to be supplied, and foreign matters (including bubbles) in the first liquid LQ1. A filter unit to be removed is provided. The operation of the first liquid supply unit 31 is controlled by the control device CONT.

  The second liquid immersion mechanism 2 includes a second liquid supply unit 35 that can deliver the second liquid LQ2, and a branch pipe 36 that connects one end of the second liquid supply unit 35 to the second liquid supply unit 35. The other end of the branch pipe 36 is connected to a predetermined position in the middle of the second supply pipe 33. A switching device 37 that switches the flow path is provided at a connection portion between the branch pipe 36 and the second supply pipe 33. The switching device 37 switches the supply of the first liquid LQ1 from the first liquid supply unit 31 to the second space K2 via the second supply port 32 and the supply of the second liquid LQ2 from the second liquid supply unit 35. It can be performed. The second liquid supply unit 35 includes a tank that accommodates the second liquid LQ2, a pressure pump, a temperature adjustment device that adjusts the temperature of the second liquid LQ2 to be supplied, and foreign matter (including bubbles) in the second liquid LQ2. A filter unit to be removed is provided. The operation of the second liquid supply unit 35 is controlled by the control device CONT.

  The second immersion mechanism 2 includes a liquid recovery unit 41 that can recover the first and second liquids LQ1 and LQ2, and a second recovery pipe 43 that connects one end of the liquid recovery unit 41 to the liquid recovery unit 41. . The other end of the second recovery pipe 43 is connected to the second nozzle member 72. The liquid recovery unit 41 includes, for example, a vacuum system (suction device) such as a vacuum pump, a gas-liquid separator that separates the recovered first and second liquids LQ1, LQ2, and gas, and the recovered first and second liquids LQ1. And a tank for storing LQ2. The operation of the liquid recovery unit 41 is controlled by the control device CONT.

  FIG. 2 is a side sectional view showing the vicinity of the first and second optical elements LS1, LS2. The first optical element LS1 is a non-refractive parallel plane plate capable of transmitting the exposure light EL, and the lower surface T1 and the upper surface T2 are parallel to each other. In addition, the projection optical system PL includes the first optical element LS1 and imaging characteristics such as aberrations are within a predetermined allowable range. The outer diameter of the upper surface T2 is larger than the outer diameter of the lower surface T1, and the first optical element LS1 has a flange portion F1. The flange portion F1 of the first optical element LS1 is held by a holding member (lens cell) 60. The lower surface T1 and the upper surface T2 of the first optical element LS1 held by the holding member 60 are substantially parallel to the XY plane.

  The holding member 60 that holds the first optical element LS <b> 1 is connected to the second nozzle member 72. The holding member 60 and the second nozzle member 72 are connected to each other by a plurality of bolts 61. Further, the first optical element LS1 is released from the holding by the holding member 60 by releasing the connection by the bolt 61. That is, the first optical element LS1 is provided so as to be easily detachable (replaceable).

  The second optical element LS2 is an optical element having a refractive power (lens action), and is formed in a convex shape toward the planar lower surface T3 and the object surface side (mask M side), and has a positive refractive power. And an upper surface T4. The outer diameter of the upper surface T4 is larger than the outer diameter of the lower surface T3, and the second optical element LS2 has a flange surface F2. And the edge part of the flange surface F2 of 2nd optical element LS2 is supported by the support part 58 provided in the lower end part of the lens-barrel PK. The second optical element LS2 (and the optical elements LS3 to LS7) is configured to be held by the lens barrel PK.

  The lower surface T3 of the second optical element LS2 supported by the support portion 58 and the upper surface T2 of the first optical element LS1 held by the holding member 60 are substantially parallel. Further, as described above, since the upper surface T4 of the second optical element LS2 has a positive refractive power, the reflection loss of light (exposure light EL) incident on the upper surface T4 is reduced, and consequently a large image. Side numerical aperture is secured. Further, the second optical element LS2 having refractive power (lens action) is supported by the support portion 58 of the lens barrel PK in a well-positioned state. In the present embodiment, the outer diameter of the lower surface T3 of the second optical element LS2 facing the first optical element LS1 is smaller than the outer diameter of the upper surface T2 of the first optical element LS1.

  In the present embodiment, the first optical element LS1 made of a plane-parallel plate is disposed under the second optical element LS2 having a lens action. However, the first optical element LS1 on the lower surface T1 side of the first optical element LS1 is disposed. By filling each of the space K1 and the second space K2 on the upper surface T2 side with the first liquid LQ1, the reflection loss on the lower surface T3 of the second optical element LS2 and the upper surface T2 of the first optical element LS1 is reduced, which is large. The substrate P can be exposed satisfactorily with the image-side numerical aperture secured.

  The exposure light EL emitted from the illumination optical system IL passes through each of the plurality of optical elements LS7 to LS3, then passes through a predetermined area on the upper surface T4 of the second optical element LS2, and passes through a predetermined area on the lower surface T3. Thereafter, the light enters the second immersion region LR2. The exposure light EL that has passed through the second immersion region LR2 passes through a predetermined region on the upper surface T2 of the first optical element LS1, then passes through a predetermined region on the lower surface T1, and enters the first immersion region LR1. It reaches on the substrate P.

  The first nozzle member 71 constitutes a part of the first liquid immersion mechanism 1 and is an annular member provided so as to surround the side surface LT1 of the first optical element LS1. The lower surface T1 of the first optical element LS1 held by the holding member 60 and the lower surface 71A of the first nozzle member 71 are substantially flush with each other. A predetermined gap (gap) G1 is provided between the inner side surface 71T of the first nozzle member 71 and the side surface LT1 of the first optical element LS1.

  A first supply port 12 for supplying the first liquid LQ1 and a first recovery port 22 for recovering the first liquid LQ1 are formed on the lower surface 71A of the first nozzle member 71. The first supply port 12 is disposed so as to surround the projection area AR1 of the projection optical system PL irradiated with the exposure light EL. In the present embodiment, a plurality of first supply ports 12 are formed on the lower surface 71A of the first nozzle member 71 so as to surround the projection area AR1. The first recovery port 22 is provided outside the first supply port 12 with respect to the projection region AR1 of the projection optical system PL, and the first supply port 12 and the projection region AR1 irradiated with the exposure light EL. It is formed in an annular slit shape so as to surround. Further, a porous member 22P having a plurality of holes is disposed in the first recovery port 22 so as to cover the first recovery port 22. The porous member 22P is configured by a mesh member having a plurality of holes.

  Inside the first nozzle member 71, a first supply flow path 14 that is an internal flow path connecting each of the plurality of first supply ports 12 and the supply pipe 13 is provided. The first supply channel 14 formed in the first nozzle member 71 is branched from the middle so as to be connectable to each of the plurality of first supply ports 12. In addition, a first recovery flow path 24 that is an internal flow path for connecting the annular first recovery port 22 and the recovery pipe 23 is provided inside the first nozzle member 71. The first recovery channel 24 is formed in an annular shape so as to correspond to the annular first recovery port 22, and an annular channel connected to the recovery port 22, a part of the annular channel and the recovery pipe 23 are connected to each other. And a manifold channel to be connected.

  When filling the first space K1 including the optical path space of the exposure light EL with the first liquid LQ1, the control device CONT uses the first liquid immersion mechanism 1 to supply the first liquid LQ1 to the first space K1, The recovery operation of the first liquid LQ1 in the first space K1 is performed in parallel. When supplying the first liquid LQ1 to the first space K1, the control device CONT sends out the first liquid LQ1 from the first liquid supply unit 11, and supplies the first supply pipe 13 and the first nozzle member 71 to the first supply. The first liquid LQ1 is supplied from the first supply port 12 to the optical path space K1 via the flow path 14. When recovering the first liquid LQ1 in the first space K1, the control device CONT drives the liquid recovery unit 21. When the liquid recovery part 21 is driven, the first liquid LQ1 in the first space K1 flows into the first recovery flow path 24 of the first nozzle member 71 via the first recovery port 22 and passes through the recovery pipe 23. Then, it is recovered by the liquid recovery unit 21. Thereby, the first liquid LQ1 is filled in the first space K1 between the lower surface 71A of the first nozzle member 71, the lower surface T1 of the optical element LS1 of the projection optical system PL, and the surface of the substrate P, and the first liquid immersion is performed. Region LR1 is formed.

  The second nozzle member 72 constitutes a part of the second liquid immersion mechanism 2, and the second optical element LS2 is interposed between the flange surface F2 of the second optical element LS2 and the first optical element LS1. It is an annular member provided so as to surround the side surface LT2. The flange surface F2 of the second optical element LS2 faces the upper surface 72J of the second nozzle member 72. The second nozzle member 72 is connected to the lower end of the lens barrel PK and is configured to be supported by the lens barrel PK. As described above, the second nozzle member 72 and the lens barrel PK are substantially integrated, and the second nozzle member 72 constitutes a part of the lens barrel PK. A predetermined gap (gap) G2 is provided between the inner side surface 72T of the second nozzle member 72 and the side surface LT2 of the second optical element LS2.

  The second nozzle member 72 has a second supply port 32 for supplying the first liquid LQ1 (or the second liquid LQ2) and a second recovery port 42 for recovering the first liquid LQ1 (or the second liquid LQ2). Has been. The second supply port 32 is provided on the inner surface 72T of the second nozzle member 72 at a position facing the second space K2. The second recovery port 42 is provided on the inner side surface 72T of the second nozzle member 72 that faces the side surface LT2 of the second optical element LS2. The second recovery port 42 is provided at a position higher than the lower surface T3 of the second optical element LS2. In the present embodiment, the second recovery port 42 faces sideways, but may face obliquely downward or upward, for example.

  In addition, a second supply channel 34 that is an internal channel for connecting the second supply port 32 and the second supply pipe 33 is provided inside the second nozzle member 72. In addition, a second recovery flow path 44 that is an internal flow path for connecting the second recovery port 42 and the second recovery pipe 43 is provided inside the second nozzle member 72.

  FIG. 3 is a cross-sectional view of the second nozzle member 72 as viewed from above. As shown in FIG. 3, in the present embodiment, the second supply port 32 is provided on the + X side of the second space K2, and the second recovery port 42 is provided on the −X side of the second space K2. . The second supply port 32 has a slit shape having a predetermined width, and the second recovery port 42 is formed larger than the second supply port 32.

  Returning to FIG. 2, a part of the second recovery flow path 44 formed in the second nozzle member 72 is provided with a bent portion 44 </ b> R that is bent upward from the second recovery port 42. Further, the connecting portion between the second recovery flow path 44 and the second recovery pipe 43 is provided below the bent portion 44R. That is, the first liquid LQ1 (or the second liquid LQ2) recovered from the second recovery port 42 flows in a substantially horizontal direction, then flows upward, then flows downward, and then the second recovery. It flows into the pipe 43. A hole 44 </ b> K that circulates between the inside and the outside of the second recovery channel 44 is provided in the upper portion of the bent portion 44 </ b> R. The second recovery flow path 44 is opened to the atmosphere by the hole 44K. By providing the hole 44K for opening to the atmosphere, even if the second space K2 is sucked by the liquid recovery part 41, the second space K2 (the space inside the lens barrel PK) is prevented from becoming negative pressure. can do.

  When filling the second space K2 including the optical path space of the exposure light EL with the first liquid LQ1, the control device CONT uses the second liquid immersion mechanism 2 to supply the first liquid LQ1 to the second space K2. The recovery operation of the first liquid LQ1 in the second space K2 is performed in parallel. When supplying the first liquid LQ1 to the second space K2, the control device CONT closes the flow path of the branch pipe 36 by the switching device 37, and the second nozzle member 72 (second supply port 32) and the first liquid. The first liquid LQ1 is sent from the first liquid supply unit 31 in a state where the flow path connecting the supply unit 31 is opened, and the second supply pipe 33 and the second supply flow path 34 of the second nozzle member 72 are connected. Then, the first liquid LQ1 is supplied from the second supply port 32 to the second space K2. When recovering the first liquid LQ1 in the second space K2, the control device CONT drives the liquid recovery part 41. When the liquid recovery part 41 is driven, the first liquid LQ1 in the second space K2 is supplied to the second nozzle member 72 via the second recovery port 42 provided at a position higher than the lower surface T3 of the second optical element LS2. Into the second recovery flow path 44 and is recovered by the liquid recovery section 41 via the second recovery pipe 43. The first liquid LQ1 is filled in the second space K2 between the lower surface T3 of the second optical element LS2 and the upper surface T2 of the first optical element LS1 to form the second immersion region LR2.

  A seal member 64 is provided between the upper surface T2 of the first optical element LS1 and the lower surface 72K of the second nozzle member 72. Further, a seal member 63 is also provided between the upper surface 60J of the holding member 60 and the lower surface 72K of the second nozzle member 72. The seal members 63 and 64 can be configured by, for example, an O ring, a V ring, a C ring, or the like.

  A seal member 76A is also provided in the gap G2 between the inner side surface 72T of the second nozzle member 72 and the side surface LT2 of the second optical element LS2, and the upper surface 72J of the second nozzle member 72 and its upper surface Seal members 76B and 76C are also provided between the flange surface F2 of the second optical element LS2 facing 72J.

  In addition, a recess 75 for holding the second liquid LQ2 flowing out from the second space K2 is provided on the outer surface of the seal member 76 (76B) on the upper surface 72J of the nozzle member 72. The recess 75 is formed in an annular shape on the upper surface 72J of the second nozzle member 72. Even if the first liquid LQ1 (or the second liquid LQ2) in the second space K2 flows out of the seal member 76 via the gap G2 or the like, the first liquid LQ1 can be held by the recess 75.

  Next, a method for exposing the pattern image of the mask M onto the substrate P using the exposure apparatus EX having the above-described configuration will be described with reference to the flowchart of FIG. 4 and the schematic diagrams of FIGS.

  When performing exposure of the substrate P, as shown in FIG. 5, the control device CONT enters the first liquid into the second space K <b> 2 from the first liquid supply unit 31 of the second liquid immersion mechanism 2 via the second supply port 32. While supplying LQ1, the liquid recovery part 41 recovers the first liquid LQ1 in the second space K2 via the second recovery port 42. By the liquid supply operation by the first liquid supply unit 31 and the liquid recovery operation by the liquid recovery unit 41, the second space K2 between the first optical element LS1 and the second optical element LS2 is filled with the first liquid LQ1 ( Step SA1).

  When the second space K2 is filled with the first liquid LQ1, bubbles (gas portions) may be generated in the first liquid LQ1 of the second space K2. In particular, immediately after the supply of the first liquid LQ1 is started in order to fill the second space K2 in the absence of liquid with the first liquid LQ1 (immediately after the formation operation of the second immersion region LR2 is started), the second There is a high possibility that bubbles are generated in the first liquid LQ1 in the space K2. Since the bubbles have a specific gravity smaller than that of the first liquid LQ1, the generated bubbles are highly likely to adhere to the lower surface T3 of the second optical element LS2, as shown in FIG.

  After filling the second space K2 with the first liquid LQ1 by supplying the first liquid LQ1 to the second space K2, the control device CONT uses the detection device 160 as shown in FIG. The presence or absence of K2 bubbles is detected (step SA2).

  In FIG. 6, the substrate stage PST has an internal space 166 connected to the opening 164K. The detection device 160 is disposed in the internal space 166 of the substrate stage PST. The detection device 160 includes an optical system 161 disposed on the lower side of the transparent member 164, and an imaging element 163 configured by a CCD or the like. The image sensor 163 can acquire an optical image (image) such as a liquid (LQ1, LQ2) or an optical element (LS1, LS2) via the transparent member 164 and the optical system 161. The image sensor 163 converts the acquired image into an electrical signal and outputs the signal (image information) to the control device CONT. The detection device 160 includes an adjustment mechanism 162 that can adjust the focal position of the optical system 161 in the Z-axis direction. Further, the detection device 160 has a visual field capable of detecting the entire first immersion region LR1 and the second immersion region LR2. The entire detection device 160 may be disposed inside the substrate stage PST. For example, some of the optical elements constituting the optical system 161, the imaging element 163, and the like are outside the substrate stage PST. May be arranged.

  The control device CONT uses the detection device 160 to detect the state of the second space K2 filled with the first liquid LQ1. When detecting the state of the second space K2 using the detection device 160, the control device CONT drives the substrate stage PST and arranges the detection device 160 under the projection optical system PL. The detection device 160 detects the state of the second space K2 via the first optical element LS1 and the transparent member 164. When the detection device 160 detects the state of the second space K2, the first space K1 may be filled with the first LQ1, or may not be filled. When the detection device 160 detects the state of the second space K2, the substrate stage PST is almost stationary. The optical system 161 of the detection device 160 is disposed in the internal space 166 below the transparent member 164, and the image sensor 163 displays an image of the first liquid LQ1 filling the second space K2 in the first optical element LS1. And obtained through the transparent member 164 and the optical system 161. When detecting the state of the second space K2 using the detection device 160, the control device CONT uses the adjustment mechanism 162 to adjust the focal position of the optical system 161 near the lower surface T3 of the second optical element LS2. Therefore, the image sensor 163 can acquire an image in the vicinity of the lower surface T3 of the second optical element LS2 satisfactorily.

  Image information regarding the first liquid LQ1 in the second space K2 acquired by the imaging element 163 is output to the control device CONT. Based on the signal (image information) output from the image sensor 163, the control device CONT displays an image of the first liquid LQ1 filled in the second space K2 on the display device DY.

  The control device CONT performs arithmetic processing (image processing) on the signal output from the image sensor 163, and determines whether or not there are bubbles in the second space K2 based on the processing result (step SA3). The control device CONT determines whether or not to supply the second liquid LQ2 to the first liquid LQ1 in the second space K2 according to the detection result of the presence or absence of bubbles in the second space K2 by the detection device 160. And the control apparatus CONT controls each operation | movement of the 1st, 2nd liquid supply parts 31 and 35 of the 2nd liquid immersion mechanism 2 based on the detection result of the detection apparatus 160. FIG.

  In Step SA3, when it is determined that there are bubbles in the first liquid LQ1 in the second space K2, the control device CONT supplies a predetermined amount of the second liquid LQ2 to the first liquid LQ1 in the second space K2 (Step S3). SA4). That is, as shown in FIG. 7, the control device CONT drives the switching device 37 to close the flow path connecting the first liquid supply unit 31 and the second supply port 32 of the second nozzle member 72, and The flow path which connects the 2 liquid supply part 35 and the 2nd supply port 32 of the 2nd nozzle member 72 is opened. Thus, the supply of the first liquid LQ1 from the first liquid supply unit 31 to the second space K2 via the second supply port 32 is switched to the supply of the second liquid LQ2 from the second liquid supply unit 35.

  The control device CONT supplies a predetermined amount of the second liquid LQ2 to the first liquid LQ1 so that each of the first liquid LQ1 and the second liquid LQ2 exists at a predetermined ratio in the second space K2. In the present embodiment, the second liquid LQ2 is supplied so that the amount of the second liquid LQ2 in the second space K2 is about 1 to 1.5 times that of the first liquid LQ1. Then, the control device CONT is left for a predetermined time in a state where the second liquid LQ2 is supplied to the first liquid LQ1 in the second space K2 (step SA5). Note that after the predetermined amount of the second liquid LQ2 is supplied to the first liquid LQ1 in the second space K2, the supply of the second liquid LQ2 to the second space K2 may be stopped, or a small amount of the second liquid LQ1 may be stopped. LQ2 may continue to be supplied.

  Since the first liquid LQ1 and the second liquid LQ2 have different specific gravities, the first liquid LQ1 is fluctuated by the supplied second liquid LQ2 in the second space K2. In particular, in the present embodiment, since the second liquid LQ2 has a specific gravity smaller than that of the first liquid LQ1, the second liquid LQ2 is supplied mainly to the first liquid LQ1 existing near the lower surface T3 of the second optical element LS2. Is done. In other words, the second liquid LQ2 is supplied near the lower surface T3 of the second optical element LS2 to form a high-concentration layer. The first liquid LQ1 causes fluctuation mainly in the vicinity of the lower surface T3 of the second optical element LS2 by the supplied second liquid LQ2.

  Due to the fluctuations generated by the first and second liquids LQ1, LQ2, as shown in the schematic diagram of FIG. 8, the bubbles adhering to the lower surface T3 of the second optical element LS2 exhibit a state of Brownian motion, It starts moving randomly.

  The fluctuations generated by the first and second liquids LQ1 and LQ2 may cause the bubbles attached to the lower surface T3 of the second optical element LS2 to move randomly, and pull the bubbles away from the lower surface T3 of the second optical element LS2. it can. The control device CONT was attached to the lower surface T3 of the second optical element LS2 by leaving it for a predetermined time in a state where the second liquid LQ2 was supplied to the first liquid LQ1 in the second space K2. The bubble can be moved sufficiently to separate the bubble from the lower surface T3 of the second optical element LS2.

  After a predetermined time has elapsed, the control device CONT controls the operations of the first and second liquid supply units 31 and 35 of the second immersion mechanism 2 so as to exclude the second liquid LQ2 from the second space K2. . That is, the control device CONT performs the flow channel switching operation by the switching device 37, stops the supply of the second liquid LQ2 to the second space K2, and causes the first liquid LQ1 to flow into the second space K2. The first liquid LQ1 is caused to flow through the second space K2. By flowing the first liquid LQ1 into the second space K2, as shown in FIG. 9, the control device CONT can discharge the bubbles in the first liquid LQ1 in the second space K2 from the second space K2. That is, since the bubbles are separated from the lower surface T3 of the second optical element LS2, the control device CONT can move the bubbles to the second recovery port 42 by flowing the first liquid LQ1 into the second space K2. it can. The control unit CONT performs the liquid recovery operation by the liquid recovery unit 41 in parallel with the operation of supplying the first liquid LQ1 to the second space K2 by the first liquid supply unit 31, thereby causing the liquid recovery unit 41 to generate bubbles. Can be recovered together with the first and second liquids LQ1, LQ2, and the bubbles in the second space K2 can be discharged.

  The control device CONT continues the supply operation of the first liquid LQ1 to the second space K2 by the first liquid supply unit 31 and the liquid recovery operation by the liquid recovery unit 41 even after the bubbles in the second space K2 are discharged. Thus, the second liquid LQ2 can be excluded from the second space K2 (step SA6).

Here, the controller CONT determines the amount of the first liquid LQ1 supplied from the second supply port 32 in step SA6 per unit time, for example, the amount of the first liquid LQ1 supplied from the second supply port 32 in step SA1. It can be less than the amount per unit time. In other words, when the bubbles are discharged from the second space K2, the bubbles can be smoothly discharged from the second space K2, even if the flow of the liquid generated in the second space K2 is relatively weak. In the present embodiment, the amount per unit time of the first liquid LQ1 supplied from the second supply port 32 in step SA6 is 10 cm ³ / min. -2000 cm < ³ > / min. Is set to a degree.

  After removing the second liquid LQ2 from the second space K2, the second liquid KQ1 is filled in the second space K2. The controller CONT uses the first immersion mechanism 1 to apply the first liquid LQ1 to the first space K1 with the projection optical system PL and the substrate P facing each other in order to perform immersion exposure on the substrate P. Fulfill. The control device CONT irradiates the substrate P with the exposure light EL via the projection optical system PL and the first liquid LQ1 in a state where each of the first and second spaces K1, K2 is filled with the first liquid LQ1. The substrate P is exposed (step SA7).

  On the other hand, if it is determined in step SA3 that there are no bubbles in the first liquid LQ1 in the second space K2, the control device CONT exposes the substrate P without supplying the second liquid LQ2 to the second space K2. (Step SA7).

  During the exposure of the substrate P, the supply operation and the recovery operation of the first liquid LQ1 by the second immersion mechanism 2 may be stopped or may be performed continuously. By preventing the supply and recovery of the first liquid LQ1 by the second immersion mechanism 2 during the exposure of the substrate P, vibration associated with the supply and recovery of the first liquid LQ1 occurs during the exposure of the substrate P. Does not occur. In this case, the first liquid LQ1 in the second space K2 is exchanged intermittently at predetermined time intervals, for example, substrate (wafer) exchange, mask exchange, etc., in a state where the substrate P is not exposed. On the other hand, the first liquid LQ1 is continuously supplied and recovered by the second liquid immersion mechanism 2 during and before and after the exposure of the substrate P, so that the first temperature of the second space K2 is always cleanly controlled. Can be filled with liquid LQ1.

  As described above, after supplying the second liquid LQ2 to the first liquid LQ1 in the second space K2, by removing the second liquid LQ2 from the second space K2, bubbles existing in the first liquid LQ1 are removed. It can be excluded together with the second liquid LQ2. Since the bubbles act as foreign matters, if there are bubbles (for example, bubbles having a diameter of 0.1 mm or more) in the first liquid LQ1 filled in the second space K2, the exposure accuracy is deteriorated. In the embodiment, since the bubbles can be removed well, it is possible to prevent the deterioration of the exposure accuracy due to the bubbles (foreign matter).

  Since the second space K2 is a closed space, it is difficult to remove bubbles adhering to the lower surface T3 and the like of the second optical element LS2, but the first space filled in the second space K2 as in the present embodiment. The second liquid LQ2 having a specific gravity different from that of the first liquid LQ1 is supplied to the liquid LQ1, and then the second liquid LQ2 is excluded from the second space K2, and bubbles are formed together with the second liquid LQ2. Can be removed.

  Further, after leaving the second liquid LQ2 to be supplied to the first liquid LQ1, the second liquid LQ2 is removed from the second space K2 by allowing the first liquid LQ1 to flow into the second space K2, and then leaving the second liquid LQ2. Since the second space K2 is filled with the first liquid LQ1 in which no bubbles are present, the exposure operation can be immediately started.

  In addition, since the detection device 160 capable of detecting the presence or absence of bubbles (foreign matter) in the second space K2 is provided, for example, when there are no bubbles in the second space K2, the second space K2 In addition, it is possible to omit a wasteful operation such as supplying the second liquid LQ2 to the lowering of the operation rate of the exposure apparatus EX.

  In the present embodiment, since the second recovery port 42 of the second immersion mechanism 2 is provided at a position higher than the lower surface T3 of the second optical element LS2, the bubbles are the first and second liquids LQ1, Since it moves upward due to the difference in specific gravity with LQ2, the second recovery port 42 provided at a position higher than the lower surface T3 of the second optical element LS2 can smoothly recover the bubbles.

  In the present embodiment, the second liquid LQ2 is supplied to the first liquid LQ1 in the second space K2 to generate fluctuation (Brownian motion), thereby separating the bubbles attached to the lower surface T3. Even if the fluctuation (Brownian motion) does not occur, the second liquid LQ2 is supplied to the first liquid LQ1 in the second space K2, and then the second liquid LQ2 is excluded from the second space K2, so that the second liquid Together with LQ2, bubbles (foreign matter) existing in the second space K2 can be removed.

  In the present embodiment, the operation of supplying the second liquid LQ2 to the first liquid LQ1 in the second space K2 is performed only once, but may be performed a plurality of times. That is, the supply of the first liquid LQ1 and the supply of the second liquid LQ2 to the second space K2 may be alternately repeated a plurality of times.

  In addition, for example, after step SA6 described above, the control device CONT may check whether or not bubbles have disappeared in the first liquid LQ1 in the second space K2, using the detection device 160. If the bubbles are not lost, the above sequence may be executed again.

  In this embodiment, alcohol (ethanol, methanol) is used as the second liquid LQ2, but the flow path (second nozzle member 72) through which the first and second optical elements LS1, LS2 and the second liquid LQ2 flow is used. Any liquid can be used as long as it does not affect the second supply pipe 33, the second recovery pipe 43, etc.) and has a specific gravity smaller than that of the first liquid LQ1.

  In the present embodiment, the presence or absence of bubbles (foreign matter) is detected by the detection device 160, and the operation of the first and second liquid supply units 31 and 35 is controlled based on the detection result, but step SA1 Then, after supplying the first liquid LQ1 to the second space K2, the second liquid LQ2 may be supplied from the second liquid supply unit 35 without performing the detection operation by the detection device 160. In this case, the detection device 160 can be omitted.

<Second Embodiment>
Next, a second embodiment will be described with reference to FIG. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  As shown in FIG. 10, the characteristic part of the present embodiment is that the supply port 32 for supplying the first liquid LQ1 from the first liquid supply unit 31 to the second space K2 and the second liquid supply unit 35 are provided. And a supply port 32 ′ for supplying the second liquid LQ2 from the second space K2 to the second space K2. A supply channel 34 connected to the first liquid supply unit 31 via a supply pipe 33 is connected to the supply port 32, and the supply pipe 33 is connected to the second liquid supply unit 35 at the supply port 32 ′. A supply flow path 34 ′ connected via another supply pipe is connected. According to such a configuration, the first and second liquids LQ1 and LQ2 can be supplied to the second space K2 via the supply ports 32 and 32 'without providing the switching device 37. According to such a configuration, when the first liquid LQ1 is supplied to the second space K2, the second liquid LQ2 can also be supplied to the first liquid LQ1. In other words, the first liquid LQ1 and the second liquid LQ2 can be supplied almost simultaneously to the second space K2.

<Third Embodiment>
Next, a third embodiment will be described with reference to FIGS. The characteristic part of this embodiment is that the second liquid supply unit 35 can supply a plurality of types of second liquids LQ2 having different specific gravities. In the present embodiment, the second liquid supply unit 35 can supply each of the second liquid LQ2 having a specific gravity lower than that of the first liquid LQ1 and the second liquid LQ2 having a specific gravity higher than that of the first liquid LQ1.

  As described above, the detection device 160 includes the adjustment mechanism 162 that can adjust the focal position of the optical system 161 in the Z-axis direction. That is, the detection device 160 can detect the position of the bubble (foreign matter) in the second space K2 in the Z-axis direction by adjusting the focal position of the optical system 161 by the adjustment mechanism 162.

  As shown in FIG. 11, there is a possibility that bubbles may adhere to the upper surface T2 of the first optical element LS1, but the control device CONT sets the focal position of the optical system 161 of the detection device 160 to the upper surface of the first optical element LS1. By adjusting to the vicinity of T2, bubbles adhering to the upper surface T2 of the first optical element LS1 can be detected.

  The control device CONT selects the type of the second liquid LQ2 supplied to the second space K2 based on the detection result of the detection device 160. That is, in the case where bubbles are attached to the lower surface T3 of the second optical element LS2 as in the first embodiment described above, the liquid fluctuation is generated in the vicinity of the lower surface T3 of the second optical element LS2. The control device CONT supplies the second liquid LQ2 having a specific gravity smaller than that of the first liquid LQ1 to the second space K2 so that the second liquid LQ2 is mainly supplied in the vicinity of the lower surface T3 of the second optical element LS2. . Thereby, the control apparatus CONT can generate fluctuation mainly in the vicinity of the lower surface T3 of the second optical element LS2. On the other hand, as shown in FIGS. 11 and 12, when bubbles are attached to the upper surface T2 of the first optical element LS1, in order to generate liquid fluctuation in the vicinity of the upper surface T2 of the first optical element LS1, The control device CONT supplies the second liquid LQ2 having a larger specific gravity than the first liquid LQ1 to the second space K2 so that the second liquid LQ2 is supplied mainly near the upper surface T2 of the first optical element LS1. Thereby, the control apparatus CONT can generate a fluctuation mainly in the vicinity of the upper surface T2 of the first optical element LS1. Therefore, the bubbles adhering to the upper surface T2 of the first optical element LS1 can be separated from the upper surface T2.

  Here, the second liquid supply unit 35 has been described as supplying two types of second liquid LQ2. However, of course, it may be configured to be able to supply any two or more types of second liquid LQ2. .

  In the first to third embodiments described above, a liquid having a specific gravity different from that of the first liquid LQ1 is used as the second liquid LQ2, but a liquid having a different temperature may be used. Even when a liquid having a temperature different from that of the first liquid LQ1 is used as the second liquid LQ2, fluctuation (Brownian motion) can be generated. In this case, the second liquid LQ2 may be the same type (namely, pure water) as the first liquid LQ1, or may be a different type (physical properties, specific gravity).

  In each of the above-described first to third embodiments, the bubble has been described as an example of the foreign matter. However, even a foreign matter other than the bubble can be smoothly removed from the second space K2.

  In the first to third embodiments described above, the case of removing the bubbles (foreign matter) in the second space K2 has been described as an example. However, the bubbles in the first space K1, for example, the lower surface of the first optical element LS1. When removing bubbles (foreign matter) adhering to T1, the second liquid LQ2 may be supplied to the first space K1. In that case, the projection optical system PL and the upper surface 56 of the substrate stage PST (or the dummy substrate held by the substrate holder PH) are opposed to each other, and the projection optical system PL and the upper surface 56 of the substrate stage PST (or the substrate holder PH are held). The second liquid LQ2 can be supplied to the first liquid LQ1 filled with the (dummy substrate).

  As described above, the first liquid LQ1 in the present embodiment is composed of pure water. Pure water has an advantage that it can be easily obtained in large quantities at a semiconductor manufacturing factory or the like, and has no adverse effect on the photoresist, optical element (lens), etc. on the substrate P. In addition, pure water has no adverse effects on the environment, and since the impurity content is extremely low, it can be expected to clean the surface of the substrate P and the surface of the optical element provided on the front end surface of the projection optical system PL. . When the purity of pure water supplied from a factory or the like is low, the exposure apparatus may have an ultrapure water production device.

  The refractive index n of pure water (water) with respect to the exposure light EL having a wavelength of about 193 nm is said to be approximately 1.44. When ArF excimer laser light (wavelength 193 nm) is used as the light source of the exposure light EL, On the substrate P, the wavelength is shortened to 1 / n, that is, about 134 nm, and a high resolution can be obtained. Furthermore, since the depth of focus is enlarged by about n times, that is, about 1.44 times compared with that in the air, the projection optical system PL can be used when it is sufficient to ensure the same depth of focus as that in the air. The numerical aperture can be further increased, and the resolution is improved in this respect as well.

The first liquid LQ1 of the present embodiment is water, a liquid other than water may be, for example, when the light source of exposure light EL is an F ₂ laser, the F ₂ laser beam is transmitted through the water Therefore, the first liquid LQ1 may be, for example, a fluorinated fluid such as perfluorinated polyether (PFPE) or fluorinated oil that can transmit the F ₂ laser beam. In this case, a lyophilic treatment is performed by forming a thin film with a substance having a molecular structure with a small polarity including fluorine, for example, at a portion that contacts the first liquid LQ1. In addition, the first liquid LQ1 has other properties that are transmissive to the exposure light EL, have a refractive index as high as possible, and is stable with respect to the photoresist applied to the projection optical system PL and the surface of the substrate P ( For example, cedar oil) can be used.

  The substrate P in each of the above embodiments is not only a semiconductor wafer for manufacturing a semiconductor device, but also a glass substrate for a display device, a ceramic wafer for a thin film magnetic head, or an original mask or reticle used in an exposure apparatus. (Synthetic quartz, silicon wafer) or the like is applied.

  As the exposure apparatus EX, in addition to the step-and-scan type scanning exposure apparatus (scanning stepper) that scans and exposes the pattern of the mask M by moving the mask M and the substrate P synchronously, the mask M and the substrate P Can be applied to a step-and-repeat type projection exposure apparatus (stepper) in which the pattern of the mask M is collectively exposed while the substrate P is stationary and the substrate P is sequentially moved stepwise.

  Further, as the exposure apparatus EX, a reduced image of the first pattern is projected with the first pattern and the substrate P being substantially stationary (for example, a refraction type projection optical system that does not include a reflecting element at 1/8 reduction magnification). The present invention can also be applied to an exposure apparatus that performs batch exposure on the substrate P using the above. In this case, after that, with the second pattern and the substrate W substantially stationary, a reduced image of the second pattern is collectively exposed onto the substrate W by partially overlapping the first pattern using the projection optical system. It can also be applied to a stitch type batch exposure apparatus. Further, the stitch type exposure apparatus can be applied to a step-and-stitch type exposure apparatus in which at least two patterns are partially transferred on the substrate P, and the substrate P is sequentially moved.

  The present invention can also be applied to a twin stage type exposure apparatus disclosed in Japanese Patent Application Laid-Open No. 10-163099, Japanese Patent Application Laid-Open No. 10-214783, and Japanese Translation of PCT International Publication No. 2000-505958.

  Further, as disclosed in Japanese Patent Application Laid-Open No. 11-135400, an exposure apparatus including a substrate stage for holding a substrate, a reference member on which a reference mark is formed, and a measurement stage on which various photoelectric sensors are mounted. The present invention can be applied.

  In the above-described embodiment, an exposure apparatus that locally fills the liquid between the projection optical system PL and the substrate P is employed. However, the present invention is disclosed in Japanese Patent Laid-Open No. 6-124873. The present invention is also applicable to an immersion exposure apparatus that exposes the entire surface of the substrate to be exposed in a liquid immersion state.

  The type of the exposure apparatus EX is not limited to an exposure apparatus for manufacturing a semiconductor element that exposes a semiconductor element pattern on the substrate P, but an exposure apparatus for manufacturing a liquid crystal display element or a display, a thin film magnetic head, an image sensor (CCD). ) Or an exposure apparatus for manufacturing reticles or masks.

  When using a linear motor (see USP5,623,853 or USP5,528,118) for the substrate stage PST and mask stage MST, use either an air levitation type using air bearings or a magnetic levitation type using Lorentz force or reactance force. Also good. Each stage PST, MST may be a type that moves along a guide, or may be a guideless type that does not have a guide.

  As a driving mechanism for each stage PST, MST, a planar motor that drives each stage PST, MST by electromagnetic force with a magnet unit having a two-dimensionally arranged magnet and an armature unit having a two-dimensionally arranged coil facing each other is provided. It may be used. In this case, either one of the magnet unit and the armature unit may be connected to the stages PST and MST, and the other of the magnet unit and the armature unit may be provided on the moving surface side of the stages PST and MST.

  As described in JP-A-8-166475 (USP 5,528,118), the reaction force generated by the movement of the substrate stage PST is not transmitted to the projection optical system PL, but mechanically using a frame member. You may escape to the floor (ground).

  As described in JP-A-8-330224 (USP 5,874,820), the reaction force generated by the movement of the mask stage MST is not transmitted to the projection optical system PL, but mechanically using a frame member. You may escape to the floor (ground).

  As described above, the exposure apparatus EX according to the present embodiment maintains various mechanical subsystems including the respective constituent elements recited in the claims of the present application so as to maintain predetermined mechanical accuracy, electrical accuracy, and optical accuracy. Manufactured by assembling. In order to ensure these various accuracies, before and after assembly, various optical systems are adjusted to achieve optical accuracy, various mechanical systems are adjusted to achieve mechanical accuracy, and various electrical systems are Adjustments are made to achieve electrical accuracy. The assembly process from the various subsystems to the exposure apparatus includes mechanical connection, electrical circuit wiring connection, pneumatic circuit piping connection and the like between the various subsystems. Needless to say, there is an assembly process for each subsystem before the assembly process from the various subsystems to the exposure apparatus. When the assembly process of the various subsystems to the exposure apparatus is completed, comprehensive adjustment is performed to ensure various accuracies as the entire exposure apparatus. The exposure apparatus is preferably manufactured in a clean room where the temperature, cleanliness, etc. are controlled.

  As shown in FIG. 13, a microdevice such as a semiconductor device includes a step 201 for designing a function / performance of the microdevice, a step 202 for producing a mask (reticle) based on the design step, and a substrate which is a base material of the device. Manufacturing step 203, exposure processing step 204 for exposing the mask pattern onto the substrate by the exposure apparatus EX of the above-described embodiment, device assembly step (including dicing process, bonding process, packaging process) 205, inspection step 206, etc. It is manufactured after.

It is a schematic block diagram which shows the exposure apparatus which concerns on 1st Embodiment. It is the sectional side view to which the principal part of the projection optical system was expanded. It is sectional drawing of the 2nd nozzle member which concerns on 1st Embodiment. It is a flowchart figure for demonstrating the exposure method which concerns on 1st Embodiment. It is a schematic diagram for demonstrating operation | movement of the exposure method which concerns on 1st Embodiment. It is a schematic diagram for demonstrating operation | movement of the exposure method which concerns on 1st Embodiment. It is a schematic diagram for demonstrating operation | movement of the exposure method which concerns on 1st Embodiment. It is a schematic diagram for demonstrating operation | movement of the exposure method which concerns on 1st Embodiment. It is a schematic diagram for demonstrating operation | movement of the exposure method which concerns on 1st Embodiment. It is sectional drawing of the 2nd nozzle member which concerns on 2nd Embodiment. It is a schematic diagram for demonstrating operation | movement of the exposure method which concerns on 3rd Embodiment. It is a schematic diagram for demonstrating operation | movement of the exposure method which concerns on 3rd Embodiment. It is a flowchart figure for demonstrating an example of the manufacturing process of a microdevice.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 ... 1st liquid immersion mechanism, 2 ... 2nd vibration mechanism, 31 ... 1st liquid supply part (1st supply part), 32 ... Supply port, 35 ... 2nd liquid supply part (2nd supply part), 37 ... Switching device, 160 ... Detection device, EX ... Exposure device, EL ... Exposure light, CONT ... Control device, K2 ... Second space (predetermined space), LQ1 ... First liquid, LQ2 ... Second liquid, LS1 ... First Optical element, LS2 ... second optical element, P ... substrate, PL ... projection optical system

Claims (16)

In an exposure method in which a predetermined space in a part of an optical path space of exposure light is filled with a first liquid, and the substrate is exposed by irradiating the substrate with exposure light through the first liquid.
A first step of supplying to the first liquid a second liquid having at least one of specific gravity and temperature different from that of the first liquid;
And a second step of removing the second liquid from the predetermined space.   2. The exposure method according to claim 1, wherein the first step includes a step of supplying a predetermined amount of the second liquid to the predetermined space after the predetermined space is filled with the first liquid.   2. The exposure method according to claim 1, wherein the first step supplies the second liquid to the first liquid when the first liquid is supplied to the predetermined space.   The exposure method according to any one of claims 1 to 3, further comprising a step of leaving the first liquid for a predetermined time in a state where the second liquid is supplied to the first liquid before the second step.   A step of stopping the supply of the second liquid to the predetermined space after the predetermined time has elapsed and before discharging the foreign matter in the predetermined space by flowing the first liquid into the predetermined space. 5. The exposure method according to claim 4, further comprising:   The predetermined space is a first optical element closest to an image plane of the projection optical system among a plurality of optical elements constituting the projection optical system through which the exposure light passes, and the image plane next to the first optical element. The exposure method according to claim 1, further comprising a space between the second optical element and the second optical element.   The presence or absence of foreign matter in the predetermined space is detected, and whether or not to supply the second liquid to the first liquid is determined according to the detection result. The exposure method according to item. In an exposure apparatus that exposes the substrate by filling a predetermined space in a part of the optical path space of the exposure light with the first liquid and irradiating the substrate with the exposure light through the first liquid.
A first supply unit capable of supplying the first liquid to the predetermined space;
A second supply unit capable of supplying a second liquid having at least one of specific gravity and temperature different from that of the first liquid in the predetermined space;
An exposure apparatus comprising: a control device that controls operations of the first and second supply units so as to supply the second liquid to the first liquid supplied to the predetermined space. . A supply port connected to the predetermined space;
A switching device configured to switch supply of the first liquid from the first supply unit to the predetermined space via the supply port and supply of the second liquid from the second supply unit. 9. An exposure apparatus according to claim 8, wherein A first supply port for supplying the first liquid from the first supply unit to the predetermined space;
9. The exposure apparatus according to claim 8, further comprising a second supply port for supplying the second liquid from the second supply unit to the predetermined space.   11. The method according to claim 8, wherein the second liquid is left in a state where the second liquid is supplied to the first liquid supplied to the predetermined space before the second liquid is removed from the predetermined space. The exposure apparatus according to any one of the above.   The control device stops the supply of the second liquid to the predetermined space after the predetermined time has elapsed, and causes each of the first and second supply units to flow the first liquid into the predetermined space. 12. The exposure apparatus according to claim 11, wherein the operation is controlled. A projection optical system having a plurality of optical elements through which the exposure light passes;
The projection optical system includes a first optical element closest to the image plane of the projection optical system, and a second optical element closest to the image plane after the first optical element,
The exposure apparatus according to claim 8, wherein the predetermined space includes a space between the first optical element and the second optical element. A detection device for detecting the presence or absence of foreign matter in the predetermined space;
14. The exposure apparatus according to claim 8, wherein the control device controls each operation of the first supply unit and the second supply unit based on a detection result of the detection device. The second supply unit can supply a plurality of types of second liquids having at least one of specific gravity and temperature different from each other,
The detection device is capable of detecting the position of a foreign object in the predetermined space,
15. The exposure apparatus according to claim 14, wherein the control device selects a type of the second liquid to be supplied to the predetermined space based on a detection result of the detection device. 16. A device manufacturing method using the exposure apparatus according to any one of claims 8 to 15.

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