JP2006277962A - Manufacturing method of transparent conductive film - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a transparent film of a higher conductivity. <P>SOLUTION: A photosensitive material having a lamination of a physical development center layer and a silver halide emulsion layer in this order is exposed on a transparent support body and a metal silver is precipitated in an image on the above-mentioned physical development center layer by a development process and thereafter, a layer formed on the physical development center layer is removed to make a transparent conductive film. The above development process is conducted under an existence of a defoaming agent. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to a method for producing a transparent conductive film that can be used for applications such as electromagnetic wave shielding films and touch panels.

  In recent years, with the rapid development of the information-oriented society, technologies related to information-related devices have rapidly advanced and become popular. Among them, the display device is used for televisions, personal computers, guidance displays for stations, airports, and other information. In particular, plasma displays have attracted attention in recent years.

  In such an information society, there is a concern about the influence of electromagnetic waves radiated from these display devices. For example, the influence on surrounding electronic devices and the influence on the human body are considered. In particular, the effects on human health cannot be ignored, and there is a need to reduce the intensity of the electromagnetic field applied to the human body. In response to such demands, various transparent conductive films (electromagnetic waves) Shield film) has been developed. For example, JP-A-9-53030, JP-A-11-122024, JP-A-2000-294980, JP-A-2000-357414, JP-A-2000-329934, JP-A-2001-38843, JP-A-2001-47549. JP-A-2001-51610, JP-A-2001-57110, JP-A-2001-60416, and the like.

  As a method for producing these transparent conductive films, conductive metals such as silver, copper, nickel, and indium are formed on a transparent resin film by sputtering, ion plating, ion beam assist, vacuum deposition, and wet coating. In general, a method of forming a metal thin film is commonly used. In recent years, a demand for a transparent conductive film is expanding, and a manufacturing method with low cost and high productivity is demanded.

  In addition, there are electrical conductivity and light transmittance as performance required for the transparent conductive film, but a metal thin film with a certain thickness is required to increase the conductivity, and there is a problem in that the transmittance is lowered. . Therefore, there is a demand for a conductive film having high conductivity and high light transmittance.

  The basic technique of the silver thin film forming method targeted by the present invention is described in Japanese Patent Publication No. 42-23745 (Patent Document 1). Furthermore, in order to satisfy the electrical conductivity and transmittance required for the transparent conductive film in recent years, and to satisfy the high metallic luster required for the reflective film, Japanese Patent Application Laid-Open No. 2003-77350 (Patent Document 2). Describes a technique relating to a method for producing an improved silver thin film-forming film.

However, these techniques have not been sufficiently satisfactory for applications requiring high conductivity such as transparent electromagnetic wave shielding films. For this reason, the technical development regarding the manufacturing method for obtaining the transparent conductive film from which higher electroconductivity is obtained was calculated | required.
Japanese Examined Patent Publication No. 42-23745 (pages 1 to 3) JP 2003-77350 A (pages 4 to 5)

  Therefore, the objective of this invention is providing the manufacturing method for obtaining the transparent conductive film with higher electroconductivity in the manufacturing method of a transparent conductive film.

The above object of the present invention has been basically achieved by the following invention.
(1) A light-sensitive material having a physical development nucleus layer and a silver halide emulsion layer in this order is exposed on a transparent support, and silver metal is deposited imagewise on the physical development nucleus layer by a development process, A method for producing a transparent conductive film, comprising removing a layer provided on a physical development layer, wherein the development treatment is performed in the presence of an antifoaming agent.
(2) The method for producing a transparent conductive film according to claim 1, wherein the antifoaming agent is a silicone oil antifoaming agent or a polyalkylene glycol antifoaming agent.

  The manufacturing method of the transparent conductive film of this invention can obtain a transparent conductive film with high transparency and higher conductivity of metallic silver. For this reason, the range of application of the transparent conductive film has expanded.

  The method for producing a transparent conductive film of the present invention is an application of silver complex diffusion transfer development (hereinafter referred to as development) known in photographic development. -23745. That is, the silver halide grains are exposed imagewise, the silver halide grains in the image area are dissolved with a soluble silver complex salt forming agent to form a soluble silver complex salt, and simultaneously reduced with a reducing agent (developing agent) such as hydroquinone. An image is formed by depositing metallic silver on physical development nuclei.

  The antifoaming agent used in the present invention will be described. The antifoaming agent used in the present invention is not particularly limited, and preferable examples include silicone-based antifoaming agents, polyalkylene glycol-based antifoaming agents, polyether-based antifoaming agents, and fatty acid ester-based antifoaming agents. . These may be used alone or in combination of two or more. It was a surprising fact that the surface resistance value of metallic silver that was image-deposited by physical development in the presence of an antifoaming agent was lower than when no antifoaming agent was present. When developing the photosensitive material, it is expected that some bubbles are generated at the interface between the photosensitive material and the developer, but these bubbles are considered to be negligible in normal development. However, since the development process in the method for producing a transparent conductive film of the present invention requires a longer time than a normal development process in order to increase the conductivity of metallic silver, the presence of such bubbles makes the developability. It is speculated that it may affect. For this reason, by eliminating air bubbles with an antifoaming agent, the balance between the physical development speed and the chemical development speed in development is slightly changed, and the metallic silver obtained in the presence of the antifoaming agent has no antifoaming agent. It is presumed that a denser one can be obtained and the conductivity is increased.

  Among the antifoaming agents, silicone antifoaming agents and polyalkylene glycol antifoaming agents are preferable. Commercially available products may be used for these antifoaming agents. Examples of commercially available products include silicone antifoaming agents (KS508, KS531, KM72, KM90, etc.) manufactured by Shin-Etsu Chemical Co., Ltd., Toray Dow Corning Co., Ltd. ) Silicone antifoaming agents (Q2-3183A, SH5510, etc.) manufactured by Nippon Unicar Co., Ltd. (SAG30 etc.), antifoaming agents (Adecanate series, etc.) manufactured by Asahi Denka Kogyo Co. Examples include polyalkylene glycol antifoaming agents (CA-220, CB-442, CC-222, CE-457, CK-140) manufactured by Nippon Oil & Fats Co., Ltd.

  In the present invention, as a method of developing in the presence of an antifoaming agent, a method of adding an antifoaming agent to the photosensitive material or developer used in the present invention can be exemplified. When an agent is added, the coating stability of the light-sensitive material may be lowered depending on the amount used. Therefore, it is preferably added to the developer.

  When the antifoaming agent is added to the developer, the amount added is preferably 10 mg to 1000 mg, more preferably 50 mg to 500 mg per 1,000 ml of the processing solution. When added to the light-sensitive material, it is preferably added to the silver halide emulsion layer coated on the light-sensitive material, and the addition amount is preferably within a range where the coating stability of the light-sensitive material does not deteriorate.

  Next, the developer used in the present invention will be described. The developer is an alkaline solution containing a soluble silver complex salt forming agent and a reducing agent. The soluble silver complex salt forming agent is a compound that dissolves silver halide to form a soluble silver complex salt, and the reducing agent is a compound for reducing the soluble silver complex salt to deposit metallic silver on the physical development nucleus. .

  Soluble silver complex forming agents used in the developer include thiosulfates such as sodium thiosulfate and ammonium thiosulfate, thiocyanates such as sodium thiocyanate and ammonium thiocyanate, and sulfites such as sodium sulfite and potassium bisulfite. Salts, oxadoridones, 2-mercaptobenzoic acid and its derivatives, cyclic imides such as uracil, alkanolamines, diamines, mesoionic compounds described in JP-A-9-171257, as described in USP 5,200,294 Thioethers, 5,5-dialkylhydantoins, alkyl sulfones, and others. H. Examples thereof include compounds described in 474-475 (1977) of The Theory of the Photographic Process, 4th edition, edited by James.

  Among these soluble silver complex salt forming agents, alkanolamine is particularly preferable. A relatively low value is obtained for the surface resistance of the transparent conductive film developed with a processing solution containing an alkanolamine.

  Examples of the alkanolamine include 2- (2-aminoethylamino) ethanolamine, diethanolamine, N-methylethanolamine, triethanolamine, N-ethyldiethanolamine, diisopropanolamine, ethanolamine, 4-aminobutanol, N, N -Dimethylethanolamine, 3-aminopropanol, N, N-ethyl-2,2'-iminodiethanol, 2-methylaminoethanol, 2-amino-2-methyl-1-propanol and the like.

  These soluble silver complex salt forming agents can be used alone or in combination.

  As the reducing agent used in the developer, a developing agent known in the field of photographic development can be used. For example, hydrohydroxyquinone, catechol, pyrogallol, methylhydroquinone, chlorohydroquinone and other polyhydroxybenzenes, ascorbic acid and its derivatives, 1-phenyl-4,4-dimethyl-3-pyrazolidone, 1-phenyl-3-pyrazolidone, 1-phenyl Examples include 3-pyrazolidones such as -4-methyl-4-hydroxymethyl-3-pyrazolidone, paramethylaminophenol, paraaminophenol, parahydroxyphenylglycine, and paraphenylenediamine. These reducing agents can be used alone or in combination.

  The content of the soluble silver complex salt forming agent is preferably 0.001 to 5 mol, more preferably 0.005 to 1 mol, per liter of the processing solution. The content of the reducing agent is preferably from 0.01 to 1 mol, more preferably from 0.05 to 1 mol, per liter of the treatment liquid.

  The pH of the developer is preferably 10 or more, and more preferably 11-14. In order to adjust to a desired pH, an alkali agent such as sodium hydroxide or potassium hydroxide, or a buffering agent such as phosphoric acid or carbonic acid is contained alone or in combination. The treatment liquid of the present invention preferably contains a preservative such as sodium sulfite or potassium sulfite.

It is preferable to add bromides such as potassium bromide and sodium bromide to the developer. This is because when the development is performed in the presence of an appropriate amount of bromide, the conductivity of the obtained metallic silver is improved. A preferable bromide concentration is 1 × 10 ⁻⁴ mol / L or more and 1 × 10 ⁻² mol / L or less.

  The potassium ion concentration in the developer is preferably 70 mol% or more of the total alkali metal ions in the developer. This is because the conductivity of the obtained metallic silver is relatively good even when the precursor is physically developed to some extent by setting the potassium ion concentration to 70 mol% or more. Potassium ions may be supplied in any form and method. For example, a method in which a hydroxide salt, a sulfite salt, a carbonate salt, a carboxylate salt, or the like is previously added to the developer can be mentioned.

  In the present invention, the developing method may be an immersion method or a coating method. In the immersion method, for example, a plastic resin film (silver thin film forming film precursor) provided with a physical development nucleus layer and a silver halide emulsion layer is transported while being immersed in a large amount of processing liquid stored in a tank. In the coating method, for example, about 40 to 120 ml of processing solution per square meter is coated on the silver halide emulsion layer.

  Preferable development processing conditions for improving conductivity and metallic luster are as follows. The development temperature is 2 ° C to 25 ° C, and 10 ° C to 20 ° C is more preferable. The development time is 30 seconds to 180 seconds, preferably 40 seconds to 120 seconds.

  Next, the photosensitive material (hereinafter referred to as a transparent conductive film precursor) used in the present invention will be described. The transparent conductive film precursor has at least a physical development nucleus layer and a silver halide emulsion layer on the support in this order from the side closer to the support. Furthermore, a non-photosensitive layer may be provided as an outermost layer farthest from the support and / or an intermediate layer between the physical development nucleus layer and the silver halide emulsion layer. These non-photosensitive layers are layers having a hydrophilic polymer as a main binder. As the hydrophilic polymer here, any polymer can be selected as long as it easily swells with the above-described developer and allows the developer to easily penetrate into the underlying silver halide emulsion layer and physical development nucleus layer.

  Specifically, gelatin, albumin, casein, polyvinyl alcohol, or the like can be used. Particularly preferred hydrophilic binders are proteins such as gelatin, albumin and casein. In order to sufficiently obtain the effect of the present invention, the binder amount of the non-photosensitive layer is preferably in the range of 20% by mass to 100% by mass, particularly 30% by mass with respect to the total binder amount of the silver halide emulsion layer. % To 80% by mass is preferable.

  These non-photosensitive layers may contain additives known in the photographic industry as necessary. Further, the film can be hardened with a crosslinking agent as long as the peeling of the silver halide emulsion layer after the treatment is not prevented.

  As the physical development nuclei of the physical development nuclei layer in the transparent conductive film precursor, fine particles (having a particle size of about 1 to several tens of nm) made of heavy metals or sulfides thereof are used. Examples thereof include colloids such as gold and silver, metal fluids obtained by mixing sulfides with water-soluble salts such as palladium and zinc, and silver colloids and palladium sulfide nuclei are preferable. The fine particle layer of these physical development nuclei can be provided on the plastic resin film by vacuum deposition, cathode sputtering, or coating. From the viewpoint of production efficiency, a coating method is preferably used. The content of physical development nuclei in the physical development nuclei layer is suitably about 0.1 to 10 mg per square meter in solid content.

  The physical development nucleus layer may contain a hydrophilic binder. The amount of the hydrophilic binder is preferably about 10 to 500% by mass with respect to the physical development nucleus. As the hydrophilic binder, gelatin, gum arabic, cellulose, albumin, casein, sodium alginate, various starches, polyvinyl alcohol, polyvinyl pyrrolidone, polyacrylamide, a copolymer of acrylamide and vinyl imidazole, and the like can be used. Preferred hydrophilic binders are proteins such as gelatin, albumin and casein.

  Examples of the physical development nucleus layer include inorganic compounds such as chromium alum, formalins, glyoxal, malealdehyde, aldehydes such as glutaraldehyde, N-methylol compounds such as urea and ethylene urea, mucochloric acid, 2,3- Aldehydes such as dihydroxy-1,4-dioxane, compounds having an active halogen such as 2,4-dichloro-6-hydroxy-s-triazine salt and 2,4-dihydroxy-6-chloro-triazine salt, Divinyl sulfone, divinyl ketone, N, N, N-triacroylhexahydrotriazine, compounds having two or more active three-membered ethyleneimino groups and epoxy groups in the molecule, as a polymer hardener Containing one or more of various protein crosslinking agents (hardeners) such as dialdehyde starch Preferred. Among these crosslinking agents, dialdehydes such as glyoxal, glutaraldehyde, 3-methylglutaraldehyde, succinaldehyde, and adipaldehyde are preferable, and glutaraldehyde is more preferable. The crosslinking agent preferably contains 0.1 to 30% by mass in the physical development nucleus layer, particularly 1 to 20% by mass, based on the total protein contained in the base layer and the physical development nucleus layer.

  In the transparent conductive film precursor, it is preferable to have a base layer (protein-containing base layer; hereinafter simply referred to as a base layer) made of protein between the physical development nucleus layer and the transparent support. It is preferable to further have an easy adhesion layer such as vinylidene chloride or polyurethane between the transparent support and the base layer. As the protein used for the base layer, gelatin, albumin, casein or a mixture thereof is preferably used. The protein content in the base layer is preferably 10 to 300 mg per square meter.

  The physical development nucleus layer and the base layer can be applied by application methods such as dip coating, slide coating, curtain coating, bar coating, air knife coating, roll coating, gravure coating, and spray coating.

  For forming the silver halide emulsion grains used in the silver halide emulsion layer of the transparent conductive film precursor, methods well known in the art such as forward mixing, back mixing and simultaneous mixing are used. Among them, it is preferable to use a so-called controlled double jet method, which is one of the simultaneous mixing methods and keeps the pAg in the liquid phase to be formed constant, from the viewpoint of obtaining silver halide emulsion grains having a uniform particle size. . In the present invention, the average grain size of preferable silver halide emulsion grains is 0.25 μm or less, particularly preferably 0.05 to 0.2 μm. There is a preferable range for the halide composition of the silver halide emulsion used in the present invention, and it is preferable that the chloride content is 80 mol% or more, and it is particularly preferable that 90 mol% or more is chloride.

  In the silver halide emulsion, a sulfite, lead salt, thallium salt, rhodium salt or complex thereof, iridium salt or complex thereof may coexist in the process of grain formation or physical ripening, if necessary. Further, it can be sensitized by various chemical sensitizers, and methods commonly used in the art such as sulfur sensitization method, selenium sensitization method and noble metal sensitization method can be used alone or in combination.

  The ratio of the amount of silver halide and the amount of gelatin contained in the silver halide emulsion layer is such that the mass ratio of silver halide (silver equivalent) to gelatin (silver / gelatin) is 1.2 or more, more preferably 1. 5 or more.

  In the silver halide emulsion layer, known photographic additives can be used for various purposes. These are described in Research Disclosure Items 17643 (December 1978) and 18716 (November 1979) 308119 (December 1989) or cited.

  Examples of the transparent support used for the transparent conductive film precursor include polyester resins such as polyethylene terephthalate, diacetate resins, triacetate resins, acrylic resins, polycarbonate resins, polyvinyl chloride, polyimide resins, cellophane, and celluloid. A film is mentioned.

  Examples of a method for producing a transparent conductive film using the transparent conductive film precursor include formation of a silver thin film having a mesh pattern. In this case, the silver halide emulsion layer is exposed in a reticulated pattern. As an exposure method, a method for exposing the retransmitted original of the reticulated pattern and the silver halide emulsion layer for exposure, or scanning using various laser beams. There are exposure methods. In the above-described method of exposing with laser light, for example, a blue semiconductor laser (also referred to as a violet laser diode) having an oscillation wavelength of 400 to 430 nm can be used.

  For the transparent conductive film precursor, it is preferable to use a non-sensitizing dye or pigment having an absorption maximum in the photosensitive wavelength region of the silver halide emulsion layer as a halation for improving image quality or an irradiation prevention agent. The antihalation agent is preferably a base layer or a physical development nucleus layer, an intermediate layer provided as necessary between the physical development nucleus layer and the silver halide emulsion layer, or a back surface provided with a support interposed therebetween. It can be contained in the coating layer. The irradiation inhibitor is preferably contained in the silver halide emulsion layer. The amount added can vary widely as long as the desired effect is obtained, but when it is contained in the backing layer as an antihalation agent, for example, the range of about 20 mg to about 1 g per square meter is desirable, The optical density at the maximum absorption wavelength is 0.5 or more.

  After exposing a transparent original having an arbitrary shape pattern such as a mesh pattern and the precursor, or by scanning and exposing a digital image of an arbitrary shape pattern to the precursor with various laser light output machines, To develop a silver thin film with a shape pattern by causing physical development to occur, whereby the unexposed silver halide is dissolved to form a silver complex salt, and reduced on the physical development nuclei to deposit metal silver. Can do. The exposed portion is chemically developed in the silver halide emulsion layer to become blackened silver. After development, the silver halide emulsion layer, intermediate layer and protective layer are washed away with water, and a silver thin film having a shape pattern is exposed on the surface.

  As a method for removing a layer provided on a physical development nucleus layer such as a silver halide emulsion layer after development, there is a method of removing by washing with water or transferring to a release paper. There are two methods for removing the water washing: a method of removing hot water using a scrubbing roller or the like while jetting a hot water shower, or a method of removing hot water by jetting with a nozzle or the like. In addition, the method of transferring and peeling with a release paper or the like is to squeeze the excess alkali solution (silver complex diffusion transfer developer) on the silver halide emulsion layer in advance with a roller or the like, and remove the silver halide emulsion layer and the release paper. In this method, the silver halide emulsion layer and the like are transferred from a plastic resin film to a release paper and peeled off. As the release paper, water-absorbing paper or non-woven fabric, or paper having a water-absorbing void layer provided on a paper with a fine particle pigment such as silica and a binder such as polyvinyl alcohol is used.

  In the present invention, in order to apply to a product requiring high conductivity and transmittance, such as a transparent electromagnetic wave shield film, plating with a metal such as copper or nickel on the silver thin film pattern obtained as described above. (Plating) can be applied. The thickness of the metal-plated fine line pattern can be arbitrarily changed according to desired characteristics, but is in the range of 0.5 to 15 μm, preferably 2 to 12 μm. By performing this plating treatment, a shielding effect of 30 dB or more can be exhibited over a wide frequency band such as 30 MHz to 1,000 MHz.

  In the present invention, the silver thin film having a shape pattern can be plated by any of electroless plating, electrolytic plating, or a combination of both. However, the conductive property obtained by the manufacturing method of the present invention is good. The transparent conductive film can be easily electroplated. In the present invention, the metal plating method can be performed by a known method.

Examples of the production method of the present invention are shown below. In order to produce the precursor used in the present invention, a polyethylene terephthalate film having an undercoat layer containing vinylidene chloride having a thickness of 100 μm was used as a transparent support. Before the physical development nucleus layer was applied, a base layer of 50 mg / m ² gelatin was applied to the film and dried. Next, a physical development nucleus layer made of palladium sulfide prepared as described below was applied and dried.

<Preparation of palladium sulfide sol>
Liquid A Palladium chloride 5g
Hydrochloric acid 40ml
1000ml distilled water
B liquid sodium sulfide 8.6g
1000ml distilled water
Liquid A and liquid B were mixed with stirring, and 30 minutes later, the solution was passed through a column filled with an ion exchange resin to obtain a palladium sulfide sol.

<Preparation of physical development nucleus layer coating solution>
50 ml of palladium sulfide sol
20% 2% glutaraldehyde solution
Surfactant (S-1) 1g
Add water to make a total volume of 2000 ml.
This physical development nucleus layer coating solution was applied on the base layer and dried so that palladium sulfide had a solid content of 0.4 mg / m ² .

Subsequently, a backing layer having the following composition was applied on the side opposite to the side on which the physical development nucleus layer was applied.
<Backcoat layer composition / per 1 m ² >
2g of gelatin
Amorphous silica matting agent (average particle size 5μm) 20mg
Dye 1 200mg
Surfactant (S-1) 400mg
Surfactant (S-2) 5mg

  Subsequently, an intermediate layer, a silver halide emulsion layer, and an outermost layer having the following composition were coated on the physical development nucleus layer in order from the side closer to the support. The silver halide emulsion was prepared by a general double jet mixing method for photographic silver halide emulsions. This silver halide emulsion was prepared with 95 mol% of silver chloride and 5 mol% of silver bromide, and an average grain size of 0.15 μm. The silver halide emulsion thus obtained was subjected to gold sulfur sensitization using sodium thiosulfate and chloroauric acid according to a conventional method. The silver halide emulsion thus obtained contains 0.5 g of gelatin per gram of silver.

<Intermediate layer composition / 1 m ² per>
Gelatin 0.5g
Surfactant (S-1) 5mg

<Silver halide emulsion layer composition / 1m ² per>
Gelatin 0.5g
Silver halide emulsion 3.0g Silver equivalent 1-Phenyl-5-mercaptotetrazole 3.0mg
Surfactant (S-1) 20mg

<Outermost layer composition / per 1 m ² >
1g of gelatin
Amorphous silica matting agent (average particle size 3.5μm) 10mg
Surfactant (S-1) 10mg
Surfactant (S-2) 0.1mg

  The precursor thus obtained was exposed by closely contacting a transparent original having a fine line width of 20 μm and a lattice pattern of 250 μm through a resin filter that cuts light of 400 nm or less with a contact printer using a mercury lamp as a light source.

  Subsequently, the following developer was prepared. At that time, the amount of silicone oil manufactured by Shin-Etsu Chemical Co., Ltd. was changed as shown in Table 1. Thereafter, the previously exposed transparent conductive film precursor was immersed in each developer at 15 ° C. for 90 seconds, and then the silver halide emulsion layer and the non-photosensitive layer were removed by washing with warm water to obtain a silver having a mesh pattern. A thin film was formed.

<Developer>
Potassium hydroxide 25g
Hydroquinone 18g
1-phenyl-3-pyrazolidone 2g
Potassium sulfite 80g
N-methylethanolamine 15g
Potassium bromide 1.2g
KM-90 Amounts listed in Table 1
Total volume 1000ml with water
Adjust to pH = 12.2.

  The surface resistivity of the transparent conductive film on which the mesh-patterned silver thin film obtained as described above was formed was measured according to JIS K 7194 using a Loresta-GP / ESP probe manufactured by Dia Instruments Co., Ltd. . The results obtained are summarized in Table 1.

  As is apparent from Table 1, sample No. 1 treated with the developer added with the silicone oil-based antifoaming agent KM-90 was used. Sample Nos. 2 and 3 were not added. It can be seen that the surface resistivity is lower than 1.

  A test was performed in the same manner as in Example 1 except that KM-90 used in Example 1 was changed to a polyalkylene glycol antifoaming agent CE-457 manufactured by NOF Corporation. The amount of CE-457 added and the measurement results of the surface resistivity are shown in Table 2.

  As is apparent from Table 2, the sample No. 1 was treated with the treatment liquid to which the polyalkylene glycol antifoaming agent CE-457 was added. Nos. 4 and 5 are sample Nos. Of Example 1 that were not added. It can be seen that the surface resistivity is lower than 1. From the above results, the effect of the present invention that the conductivity of the transparent conductive film is improved by performing physical development in the presence of an antifoaming agent can be understood.

Claims (2)

  A light-sensitive material having a physical development nucleus layer and a silver halide emulsion layer in this order is exposed on a transparent support, and metallic silver is deposited imagewise on the physical development nucleus layer by development processing, and then the physical development nucleus A method for producing a transparent conductive film, comprising: removing a layer provided on the layer, wherein the developing treatment is performed in the presence of an antifoaming agent.   The method for producing a transparent conductive film according to claim 1, wherein the antifoaming agent is a silicone oil-based antifoaming agent or a polyalkylene glycol-based antifoaming agent.