JP2006272466A - Polishing pad and polishing method - Google Patents

Polishing pad and polishing method Download PDF

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JP2006272466A
JP2006272466A JP2005090794A JP2005090794A JP2006272466A JP 2006272466 A JP2006272466 A JP 2006272466A JP 2005090794 A JP2005090794 A JP 2005090794A JP 2005090794 A JP2005090794 A JP 2005090794A JP 2006272466 A JP2006272466 A JP 2006272466A
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polishing
elastic
polishing pad
base material
pad
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Masaki Ihara
正樹 井原
Yoshinori Tabata
喜則 田畑
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Seiko Epson Corp
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Seiko Epson Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a polishing pad that has the improved workability in sticking it to an elastic base material, can not be easily peeled off from the elastic base material, can suppress occurrence of polishing defects, and can execute polishing with high yield, and to provide a polishing method. <P>SOLUTION: The polishing pad 1 is composed such that a cut 1c composed of a row of a large number of holes penetrating the polishing pad 1 is formed from the central part of the polishing pad 1 over the outer peripheral part in a shape that a large number of polygonal contours are arranged side by side. An elastic polisher 3, in which the polishing pad 1 is stuck on the surface of a dome-like elastic base material 2, is mounted to a polishing device. Tension is given to the elastic polisher 3 by applying pressure of 0.1-2.0 kgf/cm<SP>2</SP>to a sealed space formed between the elastic polisher 3 and the polishing device. Consequently, the polishing pad 1 is broken along the cut 1c and separated into many pads, and also, a groove functioning as a water passing groove is formed. The polishing is executed by pressing the elastic polisher 3 against a face of an object to be polished. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、研磨パッド及び研磨方法に関し、特に、レンズ等の曲面の平滑化又は鏡面化に適した研磨パッド及び研磨方法に関する。   The present invention relates to a polishing pad and a polishing method, and more particularly to a polishing pad and a polishing method suitable for smoothing or mirroring a curved surface of a lens or the like.

従来、眼鏡レンズ等の凹面は、切削等により、球面、軸対称非球面、非球面乱視面、累進面、あるいはトーリック面と累進面とが合成された曲面等の、いわゆる自由曲面が形成され、最終的に光学面となるよう鏡面研磨される。球面やトーリック面等の単純な曲面形状の鏡面研磨には、剛体の研磨皿を用いた擦り合わせ研磨が用いられる。研磨皿を用いる鏡面研磨方法は、研磨皿の面形状を被研磨面に転写する方法であるため、自由曲面を研磨することができない。そのため、自由曲面の研磨には、弾性研磨工具を用いる方法が一般的に行われている。   Conventionally, a concave surface such as a spectacle lens is formed by cutting or the like to form a so-called free curved surface such as a spherical surface, an axially symmetric aspherical surface, an aspherical astigmatic surface, a progressive surface, or a curved surface in which a toric surface and a progressive surface are combined, The mirror surface is finally polished to become an optical surface. For mirror polishing of a simple curved surface such as a spherical surface or a toric surface, rubbing polishing using a rigid polishing dish is used. Since the mirror polishing method using a polishing dish is a method of transferring the surface shape of a polishing dish to a surface to be polished, a free curved surface cannot be polished. Therefore, a method using an elastic polishing tool is generally performed for polishing a free-form surface.

弾性研磨工具を用いる方法としては、風船型研磨や、部分研磨が知られている。
風船型研磨は、風船型弾性研磨工具の内側に圧力気体を送り、内圧で風船型弾性研磨工具を膨らませ、その内圧を変更することによって被研磨面の曲面形状に合った曲率を設定し、被研磨面全体を、回転する風船型弾性研磨工具に当接しながら走査させることによって研磨する方法である。また、部分研磨は、被研磨面の形状から算出される平均曲率半径より小さく、被研磨面の一部に当接する小さいドーム状の弾性研磨工具を用い、弾性研磨工具を回転等させながら被研磨面に当接し、被研磨面全体に走査させることによって研磨する方法である。
Balloon-type polishing and partial polishing are known as methods using an elastic polishing tool.
In balloon-type polishing, pressure gas is sent to the inside of a balloon-type elastic polishing tool, the balloon-type elastic polishing tool is inflated with internal pressure, and the internal pressure is changed to set a curvature that matches the curved shape of the surface to be polished. In this method, the entire polishing surface is polished by scanning while contacting a rotating balloon-type elastic polishing tool. In addition, partial polishing uses a small dome-shaped elastic polishing tool that is smaller than the average radius of curvature calculated from the shape of the surface to be polished and abuts a part of the surface to be polished, and rotates the elastic polishing tool while rotating it. This is a method of polishing by contacting the surface and scanning the entire surface to be polished.

何れの研磨方法も、弾性研磨工具がレンズの凹面の形状に追随して変形しながら擦り合わせることで、自由曲面を研磨することができる。
なお、弾性研磨工具は、弾性基材の表面には研磨パッドが貼り付けられて弾性ポリシャを構成し、被研磨面に研磨液を供給しながら弾性ポリシャを当接して、研磨が行われる。
In any of the polishing methods, an elastic polishing tool can polish a free curved surface by rubbing while deforming following the shape of the concave surface of the lens.
In the elastic polishing tool, a polishing pad is attached to the surface of the elastic base material to constitute an elastic polisher, and polishing is performed by contacting the elastic polisher while supplying a polishing liquid to the surface to be polished.

こうした弾性研磨工具を用いた研磨方法において、弾性基材に接着した研磨パッドが、研磨加工中に剥離し難く、研磨不良を発生させないことを目的に、0.1〜5mm幅の通水溝が設けられた研磨パッドが、弾性基材の表面を覆って貼り付けられたポリシャを、研磨する被研磨物の被研磨面に押し当てて研磨する、研磨方法および弾性ポリシャが提案されている(例えば、特許文献1参照)。   In such a polishing method using an elastic polishing tool, a polishing pad bonded to an elastic substrate is difficult to peel off during polishing processing, and a water passage groove having a width of 0.1 to 5 mm is formed so as not to cause poor polishing. A polishing method and an elastic polisher have been proposed in which a polishing pad provided is pressed against a surface to be polished of a polishing object to be polished by pressing the polisher that covers the surface of the elastic substrate (for example, polishing) , See Patent Document 1).

特開2002−263998号公報JP 2002-263998 A

しかしながら、特許文献1に示される研磨パッドは、通水溝の幅を狭くする(0.1〜5mm幅)ために、幅の広い切欠部を備えた花びら形状の切欠部に別の研磨パッドを弾性基材に接着する、あるいは複数の多角形の研磨パッドを、一枚ずつ互いの辺を近接させて弾性基材に接着することで通水溝が形成される。こうした複数の多角形の研磨パッドを、一枚一枚弾性基材に貼り付ける作業は、煩雑であり、しかも接着作業に熟練を必要とする。また、貼り付け作業に長い作業時間を要することから作業コストが高くなる等の課題がある。
そこで本発明は、このような事情に鑑みてなされたものであり、弾性基材に貼り付ける作業性が向上し、しかも弾性基材から剥離し難く、研磨不良の発生を抑制し歩留まり良く研磨を行うことができる研磨パッド及び研磨方法を提供することを目的とする。
However, the polishing pad shown in Patent Document 1 is provided with another polishing pad in the petal-shaped notch portion having a wide notch portion in order to narrow the width of the water passage groove (0.1 to 5 mm width). A water flow groove is formed by adhering to an elastic base material, or by adhering a plurality of polygonal polishing pads one by one with their sides close to each other. The operation of attaching such a plurality of polygonal polishing pads one by one to the elastic base material is complicated and requires skill in the bonding operation. Moreover, since a long work time is required for the pasting work, there are problems such as an increase in work cost.
Therefore, the present invention has been made in view of such circumstances, and the workability to be attached to the elastic base material is improved, and it is difficult to peel off from the elastic base material. An object is to provide a polishing pad and a polishing method that can be performed.

上記課題を解決するために、本発明の研磨パッドは、ドーム状の弾性基材の内側に圧力流体を導入し、被研磨物の被研磨面に当接して研磨する弾性ポリシャの、前記ドーム状の弾性基材表面に貼着される研磨パッドにおいて、前記研磨パッドは、パッド基材を有し、前記パッド基材のどちらか一方の面に前記パッド基材を前記弾性基材表面へ貼着する両面テープが粘着され、かつ、前記研磨パッドを貫通する多数の穴の列からなる切れ目を備えたことを特徴とする。   In order to solve the above problems, the polishing pad of the present invention is the dome-shaped elastic polisher that introduces a pressure fluid into the inside of a dome-shaped elastic base material and abuts against the surface to be polished of the object to be polished. In the polishing pad attached to the surface of the elastic base material, the polishing pad has a pad base material, and the pad base material is attached to the surface of the elastic base material on one side of the pad base material. The double-sided tape to be adhered is provided with a cut formed by a row of a plurality of holes penetrating the polishing pad.

これによれば、研磨パッドを貫通する多数の穴の列からなる切れ目を備え、ドーム状の弾性基材の表面に粘着層を介して貼着されていることにより、ドーム状の弾性基材の内側に圧力流体を導入されると、一枚であった研磨パッドが、弾性基材の伸縮による変形に追従して伸縮し、研磨パッドを貫通する多数の穴の列からなる切れ目に沿って張り裂かれ、溝を形成する。形成された溝は、研磨する際の通水溝として機能することができる。したがって、弾性基材上に多数の研磨パッドを一枚一枚貼り付けることなく、一枚からなる研磨パッドを貼り付ける容易な貼着作業で、通水溝が形成された研磨パッドが得られる。   According to this, it is provided with a cut consisting of a row of a large number of holes penetrating the polishing pad, and is adhered to the surface of the dome-shaped elastic substrate via the adhesive layer, so that the dome-shaped elastic substrate When pressure fluid is introduced to the inside, the single polishing pad expands and contracts following the deformation caused by the expansion and contraction of the elastic base material, and stretches along the cut line made up of a number of holes penetrating the polishing pad. It is torn and forms a groove. The formed groove can function as a water flow groove when polishing. Therefore, a polishing pad in which a water flow groove is formed can be obtained by an easy sticking operation of sticking a single polishing pad without sticking a large number of polishing pads one by one on the elastic substrate.

また、本発明の研磨パッドは、ドーム状の弾性基材の内側に圧力流体を導入し、被研磨物の被研磨面に当接して研磨する弾性ポリシャの、前記ドーム状の弾性基材表面に貼着される研磨パッドにおいて、前記研磨パッドは、パッド基材を有し、前記パッド基材のどちらか一方の面に前記パッド基材を前記弾性基材表面へ貼着する両面テープが粘着され、かつ、前記パッド基材を貫通すると共に前記両面テープを貫通することなく形成された多数の穴の列からなる切れ目を備えたことを特徴とする。   Further, the polishing pad of the present invention introduces a pressure fluid into the inside of the dome-shaped elastic substrate, and contacts the surface to be polished of the object to be polished to polish the surface of the dome-shaped elastic substrate. In the polishing pad to be adhered, the polishing pad has a pad base material, and a double-sided tape for adhering the pad base material to the elastic base material surface is adhered to one surface of the pad base material. In addition, it is characterized in that it is provided with a cut consisting of a row of a plurality of holes formed so as to penetrate the pad base material and not penetrate the double-sided tape.

これによれば、研磨パッドが一枚からなり、研磨パッド上にパッド基材を貫通すると共に両面テープを貫通することなく延長された多数の穴の列からなるような一定厚みを残した多数の穴の列からなる切れ目を備え、ドーム状の弾性基材の表面に粘着層を介して貼着されたことにより、ドーム状の弾性基材の内側に圧力流体を導入されると、一枚であった研磨パッドが、弾性基材の伸縮による変形に追従して伸縮し、両面テープの一定厚みを残した多数の穴の列からなる切れ目に沿って張り裂かれ、溝を形成する。形成された溝は、研磨する際の通水溝として機能することができる。したがって、弾性基材上に多数の研磨パッドを一枚一枚貼り付けることなく、一枚からなる研磨パッドを貼り付ける容易な貼着作業で、通水溝が形成された研磨パッドが得られる。   According to this, the polishing pad consists of a single sheet, and a large number of holes that have a constant thickness such that the polishing pad extends through the pad base material on the polishing pad and extends without penetrating the double-sided tape. When a pressure fluid is introduced into the inside of the dome-shaped elastic base material by providing a cut consisting of a row of holes and being attached to the surface of the dome-shaped elastic base material via an adhesive layer, The existing polishing pad expands and contracts following the deformation caused by the expansion and contraction of the elastic base material, and is torn along a notch formed by a row of many holes leaving a certain thickness of the double-sided tape, thereby forming a groove. The formed groove can function as a water flow groove when polishing. Therefore, a polishing pad in which a water flow groove is formed can be obtained by an easy sticking operation of sticking a single polishing pad without sticking a large number of polishing pads one by one on the elastic substrate.

また、本発明の研磨パッドは、パッド基材を有し、前記パッド基材のどちらか一方の面に前記パッド基材を前記弾性基材表面へ貼着する両面テープが粘着され、かつ、前記パッド基材を貫通すると共に前記両面テープを貫通することなく形成された、前記切れ目の形状が、連続した溝形状であることを特徴とする。
これによれば、連続した溝形状の切れ目を備えた研磨パッドをドーム状の弾性基材の表面に粘着層を介して貼着することにより、切れ目が予め溝状に形成されているため、溝を形成する際の外力をあまり加えなくても通水溝を容易に得ることができる。
Moreover, the polishing pad of the present invention has a pad base material, and a double-sided tape for adhering the pad base material to the elastic base material surface is adhered to either one of the pad base materials, and The shape of the cut formed through the pad base material and without penetrating the double-sided tape is a continuous groove shape.
According to this, since the cut is formed in a groove shape in advance by sticking a polishing pad provided with a continuous groove-shaped cut to the surface of the dome-shaped elastic substrate via the adhesive layer, the groove The water flow groove can be easily obtained without applying much external force when forming the.

また、本発明の研磨パッドは、前記切れ目が、多数の多角形の輪郭を並設した形状に前記研磨パッドの中央部から外周部に亘って形成されていることを特徴とする。
これによれば、研磨パッドが一枚からなり、研磨パッド上に形成された切れ目が、多数の多角形の輪郭を並設した形状に、研磨パッドの中央部から外周部に亘って形成され、ドーム状の弾性基材の表面に粘着層を介して貼着されたことにより、ドーム状の弾性基材の内側に圧力流体を導入されると、一枚であった研磨パッドが、弾性基材の伸縮による変形に追従して伸縮し、切れ目に沿って張り裂かれ、多数の多角形のパッドに分離して、張り裂かれた切れ目が研磨パッドの中央部から外周部に連通した溝を形成し、スラリーの供給および研磨屑を効率良く排出し、研磨不良の発生を抑制した研磨パッドが得られる。
Moreover, the polishing pad of the present invention is characterized in that the cut is formed in a shape in which a large number of polygonal outlines are arranged in parallel from the center to the outer periphery of the polishing pad.
According to this, the polishing pad consists of one piece, and the cut formed on the polishing pad is formed from the center part of the polishing pad to the outer peripheral part in a shape in which a large number of polygonal contours are arranged in parallel, When the pressure fluid is introduced into the inside of the dome-shaped elastic base material by being attached to the surface of the dome-shaped elastic base material through the adhesive layer, the single polishing pad becomes the elastic base material. Stretches along the cuts, splits into a number of polygonal pads, and forms a groove in which the cut slits communicate with the outer periphery of the polishing pad. Thus, a polishing pad can be obtained in which the supply of slurry and polishing waste are efficiently discharged, and the occurrence of defective polishing is suppressed.

また、本発明の研磨方法は、一枚の研磨パッドからなり、研磨パッドを貫通する多数の穴の列からなる切れ目、または両面テープの一定厚みを残した連続する切れ目が、多数の多角形の輪郭を並設した形状に、研磨パッドの中央部から外周部に亘って形成された研磨パッドが、ドーム状の弾性基材の表面に貼着された弾性ポリシャを、研磨装置に装着し、前記弾性ポリシャと前記研磨装置との間に形成された密閉空間に、0.1〜2.0kgf/cm2の圧力を加えて前記弾性ポリシャに張りを与え、該弾性ポリシャを、被研磨物の被研磨面に押し当てて研磨することを特徴とする。 Further, the polishing method of the present invention comprises a single polishing pad, and a cut formed by a row of a plurality of holes penetrating the polishing pad or a continuous cut leaving a constant thickness of the double-sided tape has a large number of polygons. The polishing pad formed from the center part of the polishing pad to the outer periphery in the shape in which the contours are arranged side by side is attached to the polishing apparatus with an elastic polisher attached to the surface of the dome-shaped elastic base material, A pressure of 0.1 to 2.0 kgf / cm 2 is applied to the sealed space formed between the elastic polisher and the polishing apparatus to apply tension to the elastic polisher, and the elastic polisher is applied to the object to be polished. It is characterized by being pressed against the polishing surface for polishing.

この研磨方法によれば、一枚のシートからなり、研磨パッドの上下面に貫通する多数の穴の列からなる切れ目、あるいは両面テープの一定厚みを残した連続する切れ目が、多数の多角形の輪郭を並設した形状に、研磨パッドの中央部から外周部に亘って形成されている研磨パッドが、弾性を有する弾性基材の表面に粘着層を介して貼着された弾性ポリシャと、研磨装置との間に形成された密閉空間に、0.1〜2.0kgf/cm2の圧力を加えることで、一枚の研磨パッドが、切れ目に沿って張り裂け、多数のパッドに分離される。分離された各パッドは、弾性基材の伸縮による変形に追従して伸縮し、弾性基材から剥離し難くなる。そのため、研磨パッドの剥離による研磨不良の発生を抑制し、歩留まり良い研磨加工を行うことができる。 According to this polishing method, a slit formed of a single sheet and formed of a plurality of holes penetrating the upper and lower surfaces of the polishing pad, or a continuous cut leaving a constant thickness of the double-sided tape is formed of a number of polygons. The polishing pad formed from the center part of the polishing pad to the outer peripheral part in a shape in which the contours are arranged in parallel, and an elastic polisher bonded to the surface of an elastic base material having elasticity via an adhesive layer, and polishing By applying a pressure of 0.1 to 2.0 kgf / cm 2 to the sealed space formed with the apparatus, one polishing pad tears along the cut and is separated into a number of pads. Each separated pad expands and contracts following the deformation caused by expansion and contraction of the elastic base material, and is difficult to peel off from the elastic base material. Therefore, it is possible to suppress the occurrence of polishing failure due to the peeling of the polishing pad and perform polishing with good yield.

また、眼鏡レンズの被研磨面の一部に当接する小さいドーム状の弾性研磨工具を用いる部分研磨を用いた場合には、前記研磨パッドの切れ目が、前記パッド基材を貫通すると共に前記両面テープを貫通することなく延長される溝状の連続する切れ目である研磨パッドを用いると、弾性ポリシャと、研磨装置との間に形成された密閉空間に加圧を行わなくても、同様な効果が得られる。   In the case of using partial polishing using a small dome-shaped elastic polishing tool that contacts a part of the surface to be polished of the spectacle lens, the cut of the polishing pad penetrates the pad base material and the double-sided tape Using a polishing pad that is a continuous cut in the form of a groove that extends without penetrating the same effect can be obtained without applying pressure to the sealed space formed between the elastic polisher and the polishing apparatus. can get.

以下、本発明の実施形態を図面に基づいて説明する。なお本実施形態は、被研磨面全体を研磨する風船型弾性研磨工具を用いた場合で説明する。
図1(a)は、本発明の研磨パッドが貼着された弾性ポリシャの上面図であり、同図(b)は研磨パッドが貼着された弾性ポリシャの断面図である。図2は、研磨パッド上に形成された切り取り線の部分拡大図を示し、(a)は上面図であり、(b)は、断面図である。
Hereinafter, embodiments of the present invention will be described with reference to the drawings. This embodiment will be described using a balloon-type elastic polishing tool that polishes the entire surface to be polished.
FIG. 1A is a top view of an elastic polisher to which the polishing pad of the present invention is attached, and FIG. 1B is a cross-sectional view of the elastic polisher to which the polishing pad is attached. 2A and 2B are partially enlarged views of a cut line formed on the polishing pad, where FIG. 2A is a top view and FIG. 2B is a cross-sectional view.

図1において、研磨パッド1は、パッド基材1aと両面テープ1bとで構成され、両面テープ1bを介して弾性基材2に貼着されて、弾性ポリシャ3を形成している。
研磨パッド1は、例えば不織布からなるパッド基材1aの一方の面に、ポリエステルからなるテープ基材の両面に強接着性粘着剤が塗布された両面テープ1bが、貼着されている。
In FIG. 1, a polishing pad 1 is composed of a pad base 1a and a double-sided tape 1b, and is attached to an elastic base 2 via a double-sided tape 1b to form an elastic polisher 3.
In the polishing pad 1, for example, a double-sided tape 1b in which a strong adhesive is applied to both sides of a polyester tape base material is attached to one surface of a pad base material 1a made of nonwoven fabric.

また、研磨パッド1は、図2の研磨パッド上に形成された切れ目の部分拡大図に示すように、研磨パッド1(パッド基材1aと両面テープ1b)を貫通する細長い長方形の穴1dと、ブリッジ状のつなぎ部1eからなる切り取り線状の切れ目1cが、多数の正六角形を蜂の巣状に並べた形状(図1(a)参照)に、研磨パッド1の中央部から外周部に亘って形成されている。   In addition, the polishing pad 1 includes an elongated rectangular hole 1d penetrating the polishing pad 1 (pad base material 1a and double-sided tape 1b), as shown in a partially enlarged view of a cut formed on the polishing pad in FIG. A cut line-shaped cut 1c composed of a bridge-shaped connecting portion 1e is formed from the center portion of the polishing pad 1 to the outer peripheral portion in a shape in which a number of regular hexagons are arranged in a honeycomb shape (see FIG. 1A). Has been.

なお、研磨パッド1を弾性基材2の表面に設ける領域として、被研磨物を研磨する際に、少なくとも被研磨物が摺り合わせ運動する範囲A(二点鎖線で示す)をカバーする広さに設定される。また、切れ目1cを形成する細長い長方形の穴1dの幅αは、研磨時に砥粒を加工液中に分散させたスラリーの供給や研磨屑を排出する通水溝として機能する幅を持っている必要があり、0.1〜5mm、好ましくは0.2〜3mm程度に設定される。   In addition, as a region where the polishing pad 1 is provided on the surface of the elastic base material 2, an area covering at least a range A (indicated by a two-dot chain line) in which the polishing object slides and moves when the polishing object is polished. Is set. Further, the width α of the elongated rectangular hole 1d that forms the cut 1c needs to have a width that functions as a water supply groove for supplying slurry in which abrasive grains are dispersed in the processing liquid and discharging polishing debris during polishing. And is set to about 0.1 to 5 mm, preferably about 0.2 to 3 mm.

また、パッド基材1aの素材としては、不織布の他にフェルト、ポリウレタン等の多孔質素材で構成されるシート、合成樹脂のシートに短繊維が植毛されたもの等を用いることができる。さらに、一般に市販されている、不織布の一面にプライマー層(バインダー層)と弱粘着性接着剤層が積層された構成を有する研磨パッド、あるいはプライマー層のみ、または弱粘着性接着剤層のみを有する不織布からなる研磨パッドを用いても良い。   Moreover, as a raw material of the pad base material 1a, the sheet | seat comprised by porous materials, such as felt and a polyurethane other than a nonwoven fabric, the thing by which the short fiber was planted in the sheet | seat of a synthetic resin, etc. can be used. Furthermore, it has the polishing pad which has the structure by which the primer layer (binder layer) and the weak adhesive layer were laminated | stacked on the surface of the nonwoven fabric generally marketed, or only a primer layer, or only a weak adhesive layer You may use the polishing pad which consists of a nonwoven fabric.

弾性基材2は、弾性を有するシートからなり、ドーム状に成形されたドーム状部2aと、ドーム状部2aの周縁に外周方向に突き出たリング状のフランジ部2bが一体に成形された形状を有する。   The elastic base material 2 is made of a sheet having elasticity, and is a shape in which a dome-shaped portion 2a formed in a dome shape and a ring-shaped flange portion 2b protruding in the outer peripheral direction at the periphery of the dome-shaped portion 2a are integrally formed. Have

ドーム状部2aのドーム面の形状は、研磨するレンズのほぼ被研磨面(凹面)の形状に沿った曲面に形成されている。ドーム状部2aの直径は、研磨するレンズの直径の1.1〜10倍、好ましくは1.5〜5倍程度の大きさとすることが望ましい。また、ドーム状部2aの表面積は、研磨するレンズの被研磨面の面積よりも大きな面積となるように設定される。   The shape of the dome surface of the dome-shaped portion 2a is formed to be a curved surface substantially along the shape of the surface to be polished (concave surface) of the lens to be polished. It is desirable that the diameter of the dome-shaped portion 2a is 1.1 to 10 times, preferably 1.5 to 5 times the diameter of the lens to be polished. Further, the surface area of the dome-shaped portion 2a is set to be larger than the area of the polished surface of the lens to be polished.

これにより、被研磨面のほぼ全面にドーム状部2aを当接させて研磨することが可能となる。また、ドーム状部2aの面積が研磨されるレンズの被研磨面の面積よりも大きな面積とすることにより、弾性基材2の自転の周速度を速くして研磨速度を向上させると共に、弾性基材2の形状追随性を向上させることができる。   As a result, it is possible to polish the dome-shaped portion 2a in contact with almost the entire surface to be polished. Further, by setting the area of the dome-shaped portion 2a to be larger than the area of the polished surface of the lens to be polished, the peripheral speed of rotation of the elastic base material 2 is increased to improve the polishing speed, and the elastic base The shape following property of the material 2 can be improved.

なお、弾性シートの材質は、天然ゴム、ニトリルゴム、クロロプレンゴム、スチレン−ブタジエンゴム(SBR)、アクリロニトリル−ブタジエンゴム(NBR)、シリコンゴム、フッ素ゴム等のゴム、ポリエチレン、ナイロン等の熱可塑性樹脂、スチレン系、ウレタン系等の熱可塑性樹脂エラストマーを例示することができる。また、弾性シートの厚さは、0.1〜10mm、特に0.2〜5mmの範囲が好ましく、JIS−A硬さ(タイプAデュロメータ)10〜100、ヤング率102〜103Ncm-2の物性値を備えるものが好ましい。 The elastic sheet is made of natural rubber, nitrile rubber, chloroprene rubber, styrene-butadiene rubber (SBR), acrylonitrile-butadiene rubber (NBR), rubber such as silicon rubber or fluoro rubber, or thermoplastic resin such as polyethylene or nylon. And thermoplastic resin elastomers such as styrene and urethane. The thickness of the elastic sheet is preferably 0.1 to 10 mm, particularly preferably 0.2 to 5 mm, JIS-A hardness (type A durometer) 10 to 100, Young's modulus 10 2 to 10 3 Ncm −2. What has the physical-property value of is preferable.

以上の様に構成された弾性ポリシャ3は、研磨装置の取付治具に固定されて、弾性研磨工具として用いられる。
図3は、レンズの凹面を風船型研磨する態様を示す研磨装置の研磨部の断面模式図であり、図3を参照して、取付治具の構成および弾性ポリシャの取付治具への装着方法を説明する。
The elastic polisher 3 configured as described above is fixed to a mounting jig of a polishing apparatus and used as an elastic polishing tool.
FIG. 3 is a schematic cross-sectional view of a polishing portion of a polishing apparatus showing an embodiment in which a concave surface of a lens is balloon-shaped polished. With reference to FIG. 3, the structure of the mounting jig and the method of mounting the elastic polisher on the mounting jig Will be explained.

取付治具4は、弾性ポリシャ3を保持すると共に、弾性ポリシャ3(ドーム状部2a)の内面側に密閉空間21を形成し、密閉空間21内に圧力流体を導入する流路として機能する。また、取付治具4は、取付治具本体41とリング状の押さえ部材42を備えている。   The mounting jig 4 holds the elastic polisher 3, forms a sealed space 21 on the inner surface side of the elastic polisher 3 (dome-shaped portion 2 a), and functions as a flow path for introducing pressure fluid into the sealed space 21. The attachment jig 4 includes an attachment jig main body 41 and a ring-shaped pressing member 42.

取付治具本体41は、円筒状の筒状部411と、筒状部411の中心軸と直交する方向に張り出した上端部の外周部に、筒状部411の中心軸を同軸とするフランジ状の弾性ポリシャ取付部412とを有する。筒状部411の下端部には、テーパー状の装着部413が外方に突出して設けられている。なお、装着部413が研磨装置の回転台(図示せず)に装着して固定されている。
押さえ部材42は、下面が平坦で弾性ポリシャ取付部412の外周とほぼ同じ外周を有するリング状の部材である。
The mounting jig body 41 has a cylindrical shape of the cylindrical portion 411 and an outer peripheral portion of an upper end projecting in a direction orthogonal to the central axis of the cylindrical portion 411 so that the central axis of the cylindrical portion 411 is coaxial. And an elastic polisher mounting portion 412. A tapered mounting portion 413 is provided at the lower end portion of the cylindrical portion 411 so as to protrude outward. A mounting portion 413 is mounted and fixed on a turntable (not shown) of the polishing apparatus.
The pressing member 42 is a ring-shaped member having a flat bottom surface and substantially the same outer periphery as the outer periphery of the elastic polisher mounting portion 412.

このように構成された取付治具4に弾性ポリシャ3が固定される。固定方法は、弾性ポリシャ3のフランジ部2bを弾性ポリシャ取付部412上に載置し、載置されたフランジ部2b上に、押さえ部材42を重ねて載置する。そして、図示しないボルト等を用いて、フランジ部2bを弾性ポリシャ取付部412と押さえ部材42との間に挟んで固定する。その結果、弾性ポリシャ3のドーム状部2aの内面と弾性ポリシャ取付部412上面との間にドーム状の密閉空間21が形成される。密閉空間21は筒状部411の内部空隙を介して外部と連通している。この筒状部411の内部空隙を介して、密閉空間21に後述する所定の圧力が導入される。   The elastic polisher 3 is fixed to the mounting jig 4 configured as described above. In the fixing method, the flange portion 2b of the elastic polisher 3 is placed on the elastic polisher mounting portion 412, and the pressing member 42 is placed on the placed flange portion 2b. Then, using a bolt or the like (not shown), the flange portion 2b is sandwiched and fixed between the elastic polisher mounting portion 412 and the pressing member 42. As a result, a dome-shaped sealed space 21 is formed between the inner surface of the dome-shaped portion 2 a of the elastic polisher 3 and the upper surface of the elastic polisher mounting portion 412. The sealed space 21 communicates with the outside through the internal space of the cylindrical portion 411. A predetermined pressure, which will be described later, is introduced into the sealed space 21 through the internal space of the cylindrical portion 411.

次に、取付治具4に弾性ポリシャ3が固定された弾性研磨工具を用いて、被研磨物を研磨する研磨方法について説明する。なお、研磨方法は、被研磨物として眼鏡レンズの凹面を研磨する場合を一例として説明する。
図3は、眼鏡レンズの凹面を風船型研磨する態様を示す研磨装置の研磨部の断面模式図であり、図4は、切れ目に沿って張り裂けた研磨パッドの部分拡大図を示し、(a)は上面図であり、(b)は、断面図である。
Next, a polishing method for polishing an object to be polished using an elastic polishing tool in which the elastic polisher 3 is fixed to the mounting jig 4 will be described. The polishing method will be described as an example in which the concave surface of the spectacle lens is polished as an object to be polished.
FIG. 3 is a schematic cross-sectional view of a polishing portion of a polishing apparatus showing an embodiment in which a concave surface of an eyeglass lens is balloon-shaped polished. FIG. 4 is a partially enlarged view of a polishing pad that is torn along a cut line. Is a top view, and (b) is a cross-sectional view.

図3において、被研磨物としての眼鏡レンズ5は、被研磨面の凹面の他方の凸面側を、低融点金属からなるブロック部6を介して取付治具7に位置決め固定されている。取付治具7に位置決め固定された眼鏡レンズ5は、研磨装置のチャック(図示せず)に装着される。
なお、チャックは、チャックの中心軸を中心に回転(自転)すると共に、弾性ポリシャ3のドーム状部2aの頂点近傍と端部側とを往復する揺動運動を行う。またチャックは、例えば空気圧が加えられることにより、取付治具4方向に移動し、眼鏡レンズ5の被研磨面を所定の圧力で取付治具4に固定された弾性ポリシャ3(弾性基材2)に押し当てる機構を備えている。
In FIG. 3, the spectacle lens 5 as an object to be polished is positioned and fixed to the attachment jig 7 via a block portion 6 made of a low melting point metal on the other convex surface side of the concave surface of the surface to be polished. The spectacle lens 5 positioned and fixed to the mounting jig 7 is attached to a chuck (not shown) of the polishing apparatus.
The chuck rotates (rotates) around the central axis of the chuck and performs a swinging motion that reciprocates between the vicinity of the apex of the dome-shaped portion 2a of the elastic polisher 3 and the end side. The chuck moves in the direction of the mounting jig 4 by applying, for example, air pressure, and an elastic polisher 3 (elastic base material 2) in which the polished surface of the spectacle lens 5 is fixed to the mounting jig 4 with a predetermined pressure. It has a mechanism to press against.

研磨に際して、取付治具4と取付治具4に固定された弾性ポリシャ3との間に形成されたドーム状の密閉空間21に、筒状部411の内部空隙を介して、所定の圧力の圧縮空気を送り込む。圧縮空気が送り込まれ、密閉空間21が所定の圧力に達することで、弾性ポリシャ3(弾性基材2)のドーム状部2aに張りが与えられ、弾性基材2に貼付けられた研磨パッド1が、弾性基材2(ドーム状部2a)と共に伸びる。   At the time of polishing, a predetermined pressure is compressed in the dome-shaped sealed space 21 formed between the mounting jig 4 and the elastic polisher 3 fixed to the mounting jig 4 via the internal gap of the cylindrical portion 411. Bring in air. When the compressed air is sent and the sealed space 21 reaches a predetermined pressure, the dome-shaped portion 2a of the elastic polisher 3 (elastic base material 2) is stretched, and the polishing pad 1 attached to the elastic base material 2 is The elastic base material 2 (dome-shaped part 2a) extends.

この伸びにより、図4の切れ目に沿って張り裂けた研磨パッドの部分拡大図に示すように、研磨パッド1上に形成された切れ目1cのブリッジ状のつなぎ部1eが、圧力による弾性基材2の伸びに耐えきれずに、切れ目1cに沿って張り裂ける。その結果、研磨パッド1は、多数の正六角形が蜂の巣状に形成された切れ目1cに沿って分かれ、多数の正六角形のパッドに分離する。なお、ドーム状の密閉空間21に送り込まれる圧縮空気の所定の圧力は、0.1〜2kgf/cm2程度である。 Due to this elongation, as shown in the partial enlarged view of the polishing pad that has been torn along the cut line in FIG. 4, the bridge-like connecting portion 1 e of the cut line 1 c formed on the polishing pad 1 is formed on the elastic base material 2 by pressure. Without being able to withstand the elongation, it tears along the cut 1c. As a result, the polishing pad 1 is divided along the cuts 1c in which a large number of regular hexagons are formed in a honeycomb shape, and is separated into a large number of regular hexagonal pads. In addition, the predetermined pressure of the compressed air sent into the dome-shaped sealed space 21 is about 0.1 to 2 kgf / cm 2 .

この切れ目1cに沿って分かれた正六角形からなる多数のパッドの間隔部分が、互いに連通する溝1fを形成し、研磨する際の通水溝として機能する。通水溝として機能する溝1fの幅は、切れ目1cを形成する細長い長方形の穴1dの幅α程度になる。なお、切れ目1cの伸びによる裂けやすさは、切れ目1cを形成するブリッジ状のつなぎ部1eの長さ(長方形の穴1d間の間隔部)を選択することで、調節することができる。   Spacing portions of a large number of regular hexagonal pads separated along the cut 1c form grooves 1f communicating with each other and function as water passage grooves when polishing. The width of the groove 1f that functions as a water flow groove is about the width α of the elongated rectangular hole 1d that forms the cut 1c. The ease of tearing due to the elongation of the cut 1c can be adjusted by selecting the length of the bridge-like connecting portion 1e forming the cut 1c (the interval between the rectangular holes 1d).

そして、研磨パッド1を多数の正六角形のパッドに分離した後、密閉空間21内の圧力を維持してドーム状部2aに張りを与えながら、取付治具4の筒状部411の中心軸を回転軸として所定の回転数で回転させる。
そして、研磨装置のチャックが回転駆動され、取付治具7に位置決め固定された眼鏡レンズ5を所定の回転数で回転(自転)させる。そして、研磨装置のチャックを所定の研磨圧力で回転する弾性研磨工具の弾性ポリシャ3(研磨パッド1)に押し付けると共に、被研磨物に揺動運動を与えて、眼鏡レンズ5の凹面の研磨が行われる。研磨の際には、ノズル8から砥粒を加工液中に分散させたスラリー9が弾性ポリシャ3(研磨パッド1)表面に供給される。
Then, after separating the polishing pad 1 into a number of regular hexagonal pads, the central axis of the cylindrical portion 411 of the mounting jig 4 is adjusted while maintaining the pressure in the sealed space 21 and tensioning the dome-shaped portion 2a. It is rotated at a predetermined rotation speed as a rotation axis.
And the chuck | zipper of a grinding | polishing apparatus is rotationally driven, and the spectacle lens 5 positioned and fixed to the attachment jig 7 is rotated (autorotated) at a predetermined rotational speed. Then, the chuck of the polishing apparatus is pressed against the elastic polisher 3 (polishing pad 1) of an elastic polishing tool that rotates at a predetermined polishing pressure, and the object to be polished is given a swinging motion to polish the concave surface of the spectacle lens 5. Is called. At the time of polishing, a slurry 9 in which abrasive grains are dispersed in a processing liquid is supplied from the nozzle 8 to the surface of the elastic polisher 3 (polishing pad 1).

こうした眼鏡レンズ5の凹面の研磨加工時に、切れ目1cに沿って分かれた0.1〜5mm幅の互いに連通する溝1fが、ノズル8から供給されるスラリー9や研磨屑を排出する通水溝として機能する。   When polishing the concave surface of the spectacle lens 5, the groove 1 f having a width of 0.1 to 5 mm separated along the cut 1 c is a water passage groove for discharging the slurry 9 and polishing waste supplied from the nozzle 8. Function.

以上に説明した本実施形態の研磨パッドおよび研磨方法によれば、弾性ポリシャ3(密閉空間21)に、0.1〜2.0kgf/cm2の圧力を加えることで、弾性基材2に貼付けられた研磨パッド1が、多数のパッドに分離される。分離された各パッドは、弾性基材2の伸縮による変形に追従して伸縮し、弾性基材2から、より剥離し難くなる。そのため、研磨パッド1の剥離による研磨不良の発生を抑制し、歩留まり良く研磨を行うことができる。 According to the polishing pad and the polishing method of the present embodiment described above, the pressure is applied to the elastic substrate 2 by applying a pressure of 0.1 to 2.0 kgf / cm 2 to the elastic polisher 3 (sealed space 21). The polished polishing pad 1 is separated into a number of pads. Each separated pad expands and contracts following the deformation caused by the expansion and contraction of the elastic base material 2, and becomes more difficult to peel from the elastic base material 2. Therefore, generation | occurrence | production of the polishing defect by peeling of the polishing pad 1 can be suppressed, and it can grind | polish with a sufficient yield.

また、弾性ポリシャ3(密閉空間21)に、0.1〜2.0kgf/cm2の圧力を加えることで、弾性基材2に貼付けられた研磨パッド1が、切れ目1cに沿って張り裂け、研磨パッド1が多数のパッドに分離して、分離した各パッドの間隔部分が互いに連通する溝1fを形成し、溝1fが研磨する際にスラリー9の供給や研磨屑を排出する通水溝として機能する。そのため、弾性基材2に多数の研磨パッドを一枚一枚貼り付けることなく、研磨パッド1を貼り付ける容易な貼着作業で、研磨パッド1の中央部から外周部に連通する通水溝が形成された弾性ポリシャ3(弾性研磨工具)が得られる。 Further, by applying a pressure of 0.1 to 2.0 kgf / cm 2 to the elastic polisher 3 (sealed space 21), the polishing pad 1 attached to the elastic base material 2 is torn along the cut 1c and polished. The pad 1 is separated into a large number of pads, and the gaps between the separated pads form a groove 1f that communicates with each other, and the groove 1f functions as a water flow groove for supplying slurry 9 and discharging polishing debris when polishing. To do. Therefore, there is a water flow groove that communicates from the center portion of the polishing pad 1 to the outer peripheral portion by an easy sticking operation of sticking the polishing pad 1 without sticking a large number of polishing pads one by one to the elastic substrate 2. The formed elastic polisher 3 (elastic polishing tool) is obtained.

また、研磨パッド1が分離されたことにより、弾性基材2の伸縮に追従し、剥離し難くなると共に、研磨パッド1が強接着性粘着剤により弾性基材2に貼着されていることにより、研磨パッド1を弾性基材2に一回貼着することで、弾性ポリシャ3(弾性研磨工具)を繰り返し研磨加工に用いることが可能となり、製造コストを低減することができる。   In addition, since the polishing pad 1 is separated, it follows the expansion and contraction of the elastic base material 2 and is difficult to peel off, and the polishing pad 1 is attached to the elastic base material 2 with a strong adhesive. By sticking the polishing pad 1 to the elastic substrate 2 once, the elastic polisher 3 (elastic polishing tool) can be repeatedly used for polishing, and the manufacturing cost can be reduced.

また、研磨パッド1が多数のパッドに分離して、研磨パッド1の中央部から外周部に連通して形成された溝1fの幅が0.1〜5mmと狭いことから、スラリー9の供給や研磨屑を排出する通水溝として機能しつつ、研磨の際に研磨される眼鏡レンズ5の周縁によって研磨パッド1が剥ぎ取られることが抑制され、剥離による研磨不良の発生を防止することできる。   In addition, since the polishing pad 1 is separated into a large number of pads and the width of the groove 1f formed from the central portion of the polishing pad 1 to the outer peripheral portion is as narrow as 0.1 to 5 mm, While functioning as a water flow groove for discharging polishing debris, it is possible to prevent the polishing pad 1 from being peeled off by the peripheral edge of the spectacle lens 5 to be polished at the time of polishing, thereby preventing occurrence of poor polishing due to peeling.

さらに、研磨パッド1が弾性基材2の表面に貼着される領域が、少なくとも研磨される眼鏡レンズ5が摺り合わせ運動(揺動)する範囲Aをカバーするように設定されることから、眼鏡レンズ5の周縁が研磨パッド1の端縁を捲ることがなく、研磨パッド1の剥離防止効果がより高まる。
以上は、研磨パッド1(パッド基材1aおよび両面テープ1b)を貫通する多数の穴の列からなる切れ目を備えた研磨パッド1について説明したが、パッド基材1aを貫通し両面テープ1bを貫通しない断面形状(後述する図6(b)に示すような断面形状)を有する、多数の穴の列からなる切れ目が形成された研磨パッドを用いた場合にも上記と同様の効果を得ることが可能である。
Furthermore, the region where the polishing pad 1 is adhered to the surface of the elastic base 2 is set so as to cover at least the range A in which the spectacle lens 5 to be polished slides (oscillates). The peripheral edge of the lens 5 does not hit the edge of the polishing pad 1, and the peeling prevention effect of the polishing pad 1 is further enhanced.
The above description has been given of the polishing pad 1 having a cut line made up of a plurality of holes passing through the polishing pad 1 (pad base material 1a and double-sided tape 1b). The same effect as described above can be obtained even when a polishing pad having a cross-sectional shape that is not formed (cross-sectional shape as shown in FIG. Is possible.

以上の実施形態の変形例を以下に示す。
(1)弾性ポリシャ3と研磨装置(取付治具4)との間に形成されたドーム状の密閉空間21に、所定の圧力の圧縮空気を導入した場合で説明したが、他の圧力流体、あるいは弾性素材で充填する場合であっても良い。
A modification of the above embodiment is shown below.
(1) The case where compressed air having a predetermined pressure is introduced into the dome-shaped sealed space 21 formed between the elastic polisher 3 and the polishing apparatus (mounting jig 4) has been described. Alternatively, it may be filled with an elastic material.

(2)研磨パッド1上に形成される切れ目1cが、細長い長方形の穴1dと、ブリッジ状のつなぎ部1eからなる場合で説明したが、円形の穴の列がミシン目状に形成される場合であっても良い。この場合の穴径は、ミシン目状の穴に沿ってブリッジ状のつなぎ部1eが張り裂けて、互いに連通した溝1fが、ノズル8から供給されるスラリー9や研磨屑を排出する通水溝として機能する幅を持っている必要があり、0.1〜5mm、好ましくは0.2〜3mm程度に設定される。   (2) The case where the cut 1c formed on the polishing pad 1 is composed of the elongated rectangular hole 1d and the bridge-shaped connecting portion 1e has been described. However, the circular hole array is formed in a perforated shape. It may be. The hole diameter in this case is such that the bridge-shaped connecting portion 1e tears along the perforated hole, and the grooves 1f communicating with each other serve as water passage grooves for discharging the slurry 9 and polishing debris supplied from the nozzle 8. It is necessary to have a functioning width, and is set to about 0.1 to 5 mm, preferably about 0.2 to 3 mm.

(3)研磨パッド1上に、切れ目1cが多数の正六角形を蜂の巣状に並べた形状に形成された場合で説明したが、三角形以上の多角形の各辺を互いに並べた形状に形成しても良い。また、切れ目1cが研磨パッド1の中央部から外周端部に亘って互いに連通して形成されるどんな形状であっても良い。例えば、図5の研磨パッド11が貼着された弾性ポリシャ31の上面図に示すように、輪の形がひろがる波紋状の円形の切れ目11aと中央部から外周端部に伸びる放射状の切れ目11bを組み合わせた形状であっても良い。   (3) The case where the cut 1c is formed in a shape in which a number of regular hexagons are arranged in a honeycomb shape on the polishing pad 1 has been described. Also good. Further, the cut 1c may have any shape formed so as to communicate with each other from the center portion of the polishing pad 1 to the outer peripheral end portion. For example, as shown in the top view of the elastic polisher 31 to which the polishing pad 11 of FIG. 5 is attached, a ripple-like circular cut 11a having a ring shape and a radial cut 11b extending from the central portion to the outer peripheral end portion. A combined shape may also be used.

(4)研磨パッド1上に切れ目1cが形成された場合で説明したが、図6の切れ目が形成された研磨パッドの部分拡大図((a)は上面図、(b)は断面図)に示すように、研磨パッド1に厚みβを残した連続的な切れ目1gを形成しても同様な効果が得られる。切れ目1gの残される厚みβは、研磨パッド1のパッド基材1aの一部を残す、あるいは両面テープ1b全ての厚さに設定される。これにより、連続的な切れ目1gが形成された一枚からなる研磨パッド1を弾性基材2に容易に貼着することができると共に、切れ目1gがノズル8から供給されるスラリー9や研磨屑を排出する通水溝として機能することができる。この場合の切れ目1gの幅は、0.1〜5mm、好ましくは0.2〜3mm程度に設定される。なお、切れ目1gが形成された研磨パッド1は、予め連続的な溝が形成されていることから、ドーム状の密閉空間21に圧縮空気が送り込まれて切れ目1gに沿って張り裂ける際、全ての切れ目1gが張り裂けなくても同様な効果が得られる。   (4) Although the case where the cut 1c is formed on the polishing pad 1 has been described, FIG. 6 is a partially enlarged view of the polishing pad formed with the cut ((a) is a top view, (b) is a cross-sectional view). As shown, the same effect can be obtained by forming a continuous cut 1g leaving a thickness β on the polishing pad 1. The remaining thickness β of the cut 1g is set to the thickness of the pad base material 1a of the polishing pad 1 or the thickness of the entire double-sided tape 1b. Thereby, the polishing pad 1 consisting of a single sheet having continuous cuts 1g can be easily attached to the elastic substrate 2, and the slurry 9 and polishing scraps supplied from the nozzle 8 by the cuts 1g can be removed. Can function as a drainage channel to discharge. In this case, the width of the cut 1g is set to about 0.1 to 5 mm, preferably about 0.2 to 3 mm. In addition, since the polishing pad 1 in which the cut 1g is formed has a continuous groove formed in advance, when compressed air is fed into the dome-shaped sealed space 21 and tears along the cut 1g, Even if the cut 1g does not tear, the same effect can be obtained.

(5)研磨パッド及び研磨方法は、眼鏡レンズ5の被研磨面全体を研磨する風船型弾性研磨の場合で説明したが、眼鏡レンズ5の被研磨面の一部に当接する小さいドーム状の弾性研磨工具を用いる部分研磨であっても、同様な効果が得られる。
部分研磨方法における研磨パッド及び研磨方法を、図7に示す弾性研磨工具を用いてレンズの凹面を部分研磨する態様を示す研磨装置の研磨部の断面模式図に基づいて説明する。
(5) Although the polishing pad and the polishing method have been described in the case of balloon-type elastic polishing in which the entire surface to be polished of the spectacle lens 5 is polished, the small dome-like elasticity that contacts a part of the surface to be polished of the spectacle lens 5 Similar effects can be obtained even with partial polishing using a polishing tool.
A polishing pad and a polishing method in the partial polishing method will be described based on a schematic cross-sectional view of a polishing portion of a polishing apparatus showing an aspect in which a concave surface of a lens is partially polished using an elastic polishing tool shown in FIG.

弾性研磨工具53は、研磨パッド51、弾性研磨体52、研磨体基材54を備え、研磨体基材54の上面に弾性研磨体52が取り付けられ、さらに弾性研磨体52の上面に研磨パッド51が取り付けられている。
弾性研磨体52は、眼鏡レンズ55の被研磨面(凹面)55aに倣って形状を変えることが可能なシリコンゴム等の弾性を有する材料で形成され、円筒形の一方の面(凸面)に眼鏡レンズ55の研磨面形状に近い所定の曲率半径を有するドーム状の曲面が形成されている。弾性研磨体52の直径は、眼鏡レンズ55の被研磨面55aの光学面形状を崩さずに研磨するために、眼鏡レンズ55の最外径よりも小さく設定される。
The elastic polishing tool 53 includes a polishing pad 51, an elastic polishing body 52, and a polishing body base material 54. The elastic polishing body 52 is attached to the upper surface of the polishing body base material 54, and the polishing pad 51 is further mounted on the upper surface of the elastic polishing body 52. Is attached.
The elastic polishing body 52 is formed of an elastic material such as silicon rubber whose shape can be changed following the surface to be polished (concave surface) 55a of the spectacle lens 55, and has spectacles on one surface (convex surface) of the cylindrical shape. A dome-shaped curved surface having a predetermined radius of curvature close to the polished surface shape of the lens 55 is formed. The diameter of the elastic polishing body 52 is set smaller than the outermost diameter of the spectacle lens 55 in order to polish without breaking the optical surface shape of the surface 55a to be polished of the spectacle lens 55.

研磨パッド51は、円形の不織布からなるパッド基材とテープ基材の両面に粘着剤が塗布された両面テープとで構成され、研磨パッド51上に研磨パッドの厚みβを一定に残した連続的な溝状の切れ目1gが形成されている(図6参照)。この研磨パッド51は、両面テープを介して弾性研磨体52のドーム状の曲面に貼着されている。なお、円形の研磨パッド51の外径は、弾性研磨体52のドーム状曲面の全面をカバーし、弾性研磨体52が有する円筒形の外径程度の大きさが好ましい。   The polishing pad 51 is composed of a pad base material made of a circular non-woven fabric and a double-sided tape in which an adhesive is applied to both sides of the tape base material. The polishing pad 51 has a constant thickness β of the polishing pad left on the polishing pad 51 continuously. A groove-shaped cut 1g is formed (see FIG. 6). The polishing pad 51 is attached to the dome-shaped curved surface of the elastic polishing body 52 via a double-sided tape. The outer diameter of the circular polishing pad 51 covers the entire surface of the dome-shaped curved surface of the elastic polishing body 52, and is preferably about the size of the cylindrical outer diameter of the elastic polishing body 52.

このように構成された弾性研磨工具53は、研磨装置の研磨軸(図示せず)に装着される。なお、研磨装置の研磨軸は、例えば空気圧力が加えられることにより、弾性研磨工具53を眼鏡レンズ55の被研磨面55aに所定の研磨圧力で圧接する機構を備えている。   The elastic polishing tool 53 configured as described above is attached to a polishing shaft (not shown) of the polishing apparatus. The polishing shaft of the polishing apparatus includes a mechanism that presses the elastic polishing tool 53 against the surface 55a to be polished of the spectacle lens 55 with a predetermined polishing pressure, for example, by applying air pressure.

一方、被研磨物としての眼鏡レンズ55は、被研磨面55aの反対側の面(凸面)が、低融点金属等からなるブロック部56を介して、取付治具57に位置決め固定されている。眼鏡レンズ55が位置決め固定された取付治具57は、研磨装置のチャック(図示せず)に装着して固定される。なお、研磨装置のチャックは、自転(回転)機構と揺動機構を備えている。
また、研磨装置は、弾性研磨工具53と眼鏡レンズ55の被研磨面55aの間に砥粒を加工液中に分散させたスラリー59を供給するノズル58を備えている。
On the other hand, the spectacle lens 55 as an object to be polished is positioned and fixed to the attachment jig 57 via a block portion 56 made of a low melting point metal or the like on the surface (convex surface) opposite to the surface 55a to be polished. The mounting jig 57 on which the spectacle lens 55 is positioned and fixed is mounted and fixed to a chuck (not shown) of the polishing apparatus. The chuck of the polishing apparatus includes a rotation (rotation) mechanism and a swing mechanism.
Further, the polishing apparatus includes a nozzle 58 that supplies a slurry 59 in which abrasive grains are dispersed in a processing liquid between the elastic polishing tool 53 and the surface 55a to be polished of the spectacle lens 55.

眼鏡レンズ55の被研磨面55aの研磨方法は、先ず、研磨装置の研磨軸を回転駆動し、研磨軸に装着された弾性研磨工具53を回転させる。そして、研磨軸を被研磨面55aに圧接する機構に空気圧力を加えて、弾性研磨工具53を所定の圧力で眼鏡レンズ55の被研磨面55aに圧接させると共に、チャックを回転機構により所定の回転数で回転(自転)させつつ、揺動機構が稼動して、眼鏡レンズ55が弾性研磨工具53(研磨パッド51)上を揺動する。
チャック及び研磨軸の回転と共に、ノズル58からスラリー59が弾性研磨工具53と被研磨面55aの間に供給されて眼鏡レンズ55の被研磨面55aの研磨が行われる。
In the polishing method of the surface 55a to be polished of the spectacle lens 55, first, the polishing shaft of the polishing apparatus is driven to rotate, and the elastic polishing tool 53 mounted on the polishing shaft is rotated. Then, air pressure is applied to the mechanism for pressing the polishing shaft against the surface 55a to be polished, the elastic polishing tool 53 is pressed against the surface 55a to be polished of the spectacle lens 55 with a predetermined pressure, and the chuck is rotated by the rotation mechanism with a predetermined rotation. The rotation mechanism operates while rotating (spinning) by a number, and the spectacle lens 55 swings on the elastic polishing tool 53 (polishing pad 51).
Along with the rotation of the chuck and the polishing shaft, the slurry 59 is supplied from the nozzle 58 between the elastic polishing tool 53 and the surface 55a to be polished, and the surface 55a to be polished of the spectacle lens 55 is polished.

(6)弾性ポリシャを用いた研磨方法は、被研磨物として眼鏡レンズの凹面を研磨する場合を一例としたが、被研磨物としては、平滑化または鏡面研磨を必要とするものであれば制限はない。例えば、カメラレンズ、望遠鏡用レンズ、顕微鏡用レンズ、ステッパー用集光レンズ等に代表される光学レンズの他に、プラスチックレンズを注型重合するためのガラス型、携帯機器のカバーガラス等の光学部品を挙げることができる。   (6) The polishing method using the elastic polisher is an example in which the concave surface of the spectacle lens is polished as an object to be polished. However, the object to be polished is limited if it requires smoothing or mirror polishing. There is no. For example, in addition to optical lenses represented by camera lenses, telescope lenses, microscope lenses, stepper condenser lenses, etc., optical parts such as glass molds for cast polymerization of plastic lenses, cover glasses for portable devices, etc. Can be mentioned.

(a)は、本発明の研磨パッドが貼着された弾性ポリシャの上面図、(b)は研磨パッドが貼着された弾性ポリシャの断面図。(A) is a top view of the elastic polisher to which the polishing pad of this invention was stuck, (b) is sectional drawing of the elastic polisher to which the polishing pad was stuck. 研磨パッド上に形成された切れ目の部分拡大図であり、(a)は上面図、(b)は断面図。It is the elements on larger scale of the cut | interruption formed on the polishing pad, (a) is a top view, (b) is sectional drawing. レンズの凹面を風船型研磨する態様を示す研磨装置の研磨部の断面模式図。The cross-sectional schematic diagram of the grinding | polishing part of the grinding | polishing apparatus which shows the aspect which carries out balloon type grinding | polishing of the concave surface of a lens. 切れ目に沿って張り裂けた研磨パッドの部分拡大図を示し、(a)は上面図、(b)は、断面図。The partial enlarged view of the polishing pad torn along the cut is shown, (a) is a top view, (b) is a cross-sectional view. 別の研磨パッドが貼着された弾性ポリシャの上面図。The top view of the elastic polisher in which another polishing pad was stuck. 別の切れ目が形成された研磨パッドの部分拡大図であり、(a)は上面図、(b)は断面図。It is the elements on larger scale of the polishing pad in which another cut | interruption was formed, (a) is a top view, (b) is sectional drawing. レンズの凹面を部分研磨する態様を示す研磨装置の研磨部の断面模式図。The cross-sectional schematic diagram of the grinding | polishing part of the grinding | polishing apparatus which shows the aspect which partially grinds the concave surface of a lens.

符号の説明Explanation of symbols

1,11,51…研磨パッド、1a…パッド基材、1b…両面テープ、1c,1g,11a,11b…切れ目、1f…溝、2…弾性基材、2a…ドーム状部、2b…フランジ部、3,31…弾性ポリシャ、4,7,57…取付治具、5,55…眼鏡レンズ、6,56…ブロック部、8,58…ノズル、9,59…スラリー、21…密閉空間、41…取付治具本体、42…押さえ部材、52…弾性研磨体、53…弾性研磨工具、54…研磨体基材、55a…被研磨面、411…筒状部、412…弾性ポリシャ取付部、413…装着部、A…被研磨物が摺り合わせ運動する範囲。
DESCRIPTION OF SYMBOLS 1,11,51 ... Polishing pad, 1a ... Pad base material, 1b ... Double-sided tape, 1c, 1g, 11a, 11b ... Cut, 1f ... Groove, 2 ... Elastic base material, 2a ... Dome-shaped part, 2b ... Flange part 3, 31 ... elastic polisher, 4, 7, 57 ... mounting jig, 5, 55 ... spectacle lens, 6, 56 ... block portion, 8, 58 ... nozzle, 9, 59 ... slurry, 21 ... sealed space, 41 DESCRIPTION OF SYMBOLS ... Attachment jig main body, 42 ... Holding member, 52 ... Elastic polishing body, 53 ... Elastic polishing tool, 54 ... Polishing body base material, 55a ... Polishing surface, 411 ... Cylindrical part, 412 ... Elastic polisher attachment part, 413 ... Attached part, A ... A range in which an object to be polished moves.

Claims (5)

ドーム状の弾性基材の内側に圧力流体を導入し、被研磨物の被研磨面に当接して研磨する弾性ポリシャの、前記ドーム状の弾性基材表面に貼着される研磨パッドにおいて、
前記研磨パッドは、パッド基材を有し、前記パッド基材のどちらか一方の面に前記パッド基材を前記弾性基材表面へ貼着する両面テープが粘着され、かつ、前記研磨パッドを貫通する多数の穴の列からなる切れ目を備えたことを特徴とする研磨パッド。
In the polishing pad attached to the surface of the dome-shaped elastic base material, the pressure polisher is introduced into the inside of the dome-shaped elastic base material and polished against the surface to be polished of the object to be polished.
The polishing pad has a pad base material, and a double-sided tape for adhering the pad base material to the elastic base material surface is adhered to one surface of the pad base material, and penetrates the polishing pad. A polishing pad comprising a plurality of holes formed by a plurality of holes.
ドーム状の弾性基材の内側に圧力流体を導入し、被研磨物の被研磨面に当接して研磨する弾性ポリシャの、前記ドーム状の弾性基材表面に貼着される研磨パッドにおいて、
前記研磨パッドは、パッド基材を有し、前記パッド基材のどちらか一方の面に前記パッド基材を前記弾性基材表面へ貼着する両面テープが粘着され、かつ、前記パッド基材を貫通すると共に前記両面テープを貫通することなく形成された多数の穴の列からなる切れ目を備えたことを特徴とする研磨パッド。
In the polishing pad attached to the surface of the dome-shaped elastic base material, the pressure polisher is introduced into the inside of the dome-shaped elastic base material and polished against the surface to be polished of the object to be polished.
The polishing pad has a pad base material, and a double-sided tape for adhering the pad base material to the elastic base material surface is adhered to one surface of the pad base material, and the pad base material A polishing pad comprising a cut formed by a row of a plurality of holes formed so as to pass through and not through the double-sided tape.
請求項2に記載の研磨パッドにおいて、
前記切れ目の形状が、連続した溝形状であることを特徴とする研磨パッド。
The polishing pad according to claim 2, wherein
The polishing pad, wherein the shape of the cut is a continuous groove shape.
請求項1乃至3の何れか一項に記載の研磨パッドにおいて、
前記切れ目が、多数の多角形の輪郭を並設した形状に前記研磨パッドの中央部から外周部に亘って形成されていることを特徴とする研磨パッド。
The polishing pad according to any one of claims 1 to 3,
The polishing pad, wherein the cut is formed in a shape in which a large number of polygonal outlines are arranged side by side from a central portion to an outer peripheral portion of the polishing pad.
請求項1乃至4の何れか一項に記載の前記研磨パッドが前記ドーム状の弾性基材の表面に貼着された前記弾性ポリシャを研磨装置に装着し、
前記弾性ポリシャと前記研磨装置との間に形成された密閉空間に、
0.1〜2.0kgf/cm2の圧力を加えて前記弾性ポリシャに張りを与え、
該弾性ポリシャを、被研磨物の被研磨面に押し当てて研磨することを特徴とする研磨方法。
The polishing pad according to any one of claims 1 to 4 is mounted on a polishing apparatus with the elastic polisher attached to the surface of the dome-shaped elastic substrate,
In a sealed space formed between the elastic polisher and the polishing apparatus,
Apply a pressure of 0.1 to 2.0 kgf / cm 2 to give tension to the elastic polisher,
A polishing method, wherein the elastic polisher is pressed against a surface to be polished of an object to be polished.
JP2005090794A 2005-03-28 2005-03-28 Polishing pad and polishing method Withdrawn JP2006272466A (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011173204A (en) * 2010-02-24 2011-09-08 Hoya Corp Method for manufacturing optical lens
JP2013163235A (en) * 2012-02-09 2013-08-22 Olympus Corp Optical element machining tool and optical element manufacturing method
GB2582639A (en) * 2019-03-29 2020-09-30 Zeeko Innovations Ltd Shaping apparatus, method and tool

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011173204A (en) * 2010-02-24 2011-09-08 Hoya Corp Method for manufacturing optical lens
JP2013163235A (en) * 2012-02-09 2013-08-22 Olympus Corp Optical element machining tool and optical element manufacturing method
GB2582639A (en) * 2019-03-29 2020-09-30 Zeeko Innovations Ltd Shaping apparatus, method and tool
GB2582639B (en) * 2019-03-29 2023-10-18 Zeeko Innovations Ltd Shaping apparatus, method and tool

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