JP2006267774A - Exposure device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an exposure device for a substrate having a photosensitive layer that can complete exposure in a short period of time. <P>SOLUTION: A lamp 9a has a light source 21a and is provided with a cold filter 23 above the light source 21a. Further, reflecting plates 25a and 25b are provided around the light source 21a. Heat discharge openings 27a and 27b are formed between the cold filter 23 and reflecting plates 25a and 25b, and a heat discharge opening 29 is provided between the reflecting plates 25a and 25b. The lamp 9a is provided in the exposure device. The cold filter 23 is thus provided to absorb heat of ultraviolet light emitted by the light source 21a, so the temperature in the exposure device can be prevented from rising. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to an exposure apparatus.

2. Description of the Related Art In recent years, electronic devices have been reduced in size and densification, and a fine pattern with high accuracy has been demanded also for parts constituting electronic devices.
In particular, with the widespread use of mobile phones and notebook personal computers, there is a significant improvement in the fineness of color liquid crystal displays required for these display devices.

  A color liquid crystal display usually has a color filter with three primary color patterns of red, green, and blue, and turns on and off the current flowing through the electrodes corresponding to the red, green, and blue pixels. Accordingly, the liquid crystal operates as a shutter, and light is transmitted through each pixel to perform color display.

  Color filter coloring methods include a dyeing method in which a substrate is immersed in a dyeing bath, and a pigment dispersion method in which a photosensitive resin layer in which a pigment is dispersed is formed and patterned, but in recent years, coloring is performed by an inkjet method. A method for spraying ink onto a substrate has been proposed.

  When using the inkjet method, it is necessary to apply a photosensitizer to the substrate surface in advance, and then expose a part of the substrate using ultraviolet rays or the like in a dark box to form a parent ink surface and a habit ink surface. There is.

When ink is sprayed on the surface subjected to such treatment, the ink is fixed only on the parent ink surface, so that a desired colored layer pattern can be formed. As such a method, the following is known.
(Patent Document 1).
JP 2001-74928 A

However, since the ultraviolet rays used when exposing the photosensitive agent have large heat energy, the inside of the dark box becomes high temperature, and the substrate and the transport device may be deformed. Irradiation amount was not uniform, and a defect that a fine pattern was not formed as designed occurred.
In order to eliminate such defects, it is necessary to irradiate with the output of ultraviolet rays lowered, and it took time for exposure.

  The present invention has been made in view of such problems, and an object thereof is to provide an exposure apparatus capable of performing exposure in a short time.

In order to achieve the above-described object, the present invention is an exposure apparatus that exposes a substrate having a photosensitive layer, and irradiates the dark box and the substrate that is provided inside the dark box and is conveyed with ultraviolet rays. An ultraviolet irradiation device, and the ultraviolet irradiation device comprises a light source and a heat absorption filter provided between the light source and the substrate.
The substrate may be a color filter substrate.
A film that absorbs the heat of ultraviolet rays emitted from the light source may be provided on at least one surface of the heat absorption filter.
The coating may be a metal oxide deposition coating.
The photosensitive agent constituting the photosensitive layer may contain at least a titanium oxide sol solution and a hydrolyzed solution of fluoroalkylsilane.

  In the present invention, the ultraviolet irradiation device provided in the exposure apparatus includes a heat absorption filter, and the heat absorption filter absorbs heat, thereby preventing the exposure apparatus from becoming hot.

  According to the present invention, the exposure apparatus can perform exposure in a short time.

Hereinafter, an example of a color filter which is a preferred embodiment of the present invention will be described based on the drawings.
First, the outline of the coloring process of the color filter substrate 71 will be described with reference to FIG.

FIG. 1 is a flowchart showing a coloring process of a color filter substrate 71 according to this embodiment, FIG. 2 is a view showing a substrate 71 before processing, and FIG. 3 is a substrate for forming a photosensitive layer 19. It is a figure which shows the application | coating process of the photosensitive agent to 71. FIG.
4 is a diagram showing a drying process of the photosensitive layer 19 formed by applying a photosensitive agent to the substrate 71, FIG. 5 is a diagram showing a washing process of the substrate 71, and FIG. 6 is a diagram showing an exposure process of the substrate 71. FIG. 7 is a diagram showing a step of spraying ink onto the substrate 71.

  As shown in FIG. 2, the color filter substrate 71 has a structure in which black matrices 75 a, 75 b, 75 c, and 75 d are arranged on a glass substrate 73.

First, as shown in FIGS. 1 and 3, a photosensitive agent 19 is formed on the substrate 71 by using a die head 77 to form the photosensitive layer 19 (step 101).
Specific examples of the photosensitive layer 19 will be described later.

Next, as shown in FIGS. 1 and 4, the photosensitive layer 19 applied on the substrate 71 is dried in the dryer 81 (step 102).
In this state, the surface of the photosensitive layer 19 has ink repellency to repel ink.

Next, as shown in FIGS. 1 and 5, the substrate 71 coated with the photosensitive layer 19 is washed with water in a shower 83 (step 103).
The purpose of washing with water is to remove dust adhering to the substrate 71, and the other is to attach water to the surface of the photosensitive layer 19 to promote the reaction of the photosensitive agent, This is for shortening the exposure time.

Next, as shown in FIGS. 1 and 6, the substrate 71 coated with the photosensitive layer 19 is irradiated with ultraviolet rays 89 to expose a part of the photosensitive layer 19 (step 104).
At this time, since the ultraviolet rays 89 are irradiated from the back surface of the substrate 71, that is, the glass substrate 73 side, the ultraviolet rays 89 are not applied to the photosensitive layer 19 applied to the upper portions of the black matrices 75a, 75b, 75c, and 75d serving as light shielding portions. This portion remains the ink repellent portions 87a, 87b, 87c and 87d having ink repellency.

  On the other hand, since the photosensitive layer 19 applied to the portions where the black matrices 75a, 75b, 75c, and 75d are not placed is exposed to the ultraviolet rays 89, these portions are exposed to the ultraviolet rays to change their physical properties, thereby improving the ink affinity. The parent ink portions 85a, 85b, and 85c are provided.

Next, color inks 91a, 91b, 91c are sprayed onto the surface of the substrate 71 using a nozzle or the like (step 105).
At this time, as shown in FIG. 7, since the ink repellent portions 87a, 87b, 87c and 87d have ink repellency, the color inks 91a, 91b and 91c do not spread, and only the parent ink portions 85a, 85b and 85c. Color inks 91a, 91b, 91c are applied.

  In this way, ink is applied onto the substrate 71.

Here, the components of the photosensitive agent constituting the photosensitive layer 19 will be described.
The photosensitizer is a solution obtained by mixing two kinds of solutions. One solution is a solution containing at least titanium oxide and an alkyl silicate, and the other solution is a solution containing at least polysiloxane.

First, titanium oxide will be described. Titanium oxide acts as a photocatalyst when irradiated with ultraviolet rays, generates active oxygen on the titanium surface, and decomposes organic matter.
In the present embodiment, active oxygen generated by light irradiation decomposes an organic substance that exhibits ink repellency, and therefore changes to ink affinity.
Titanium oxide includes an anatase type and a rutile type, both of which can be used in this embodiment, but it is preferable to use an anatase type.

  Further, since the photocatalytic reaction occurs more effectively as the particle size of titanium oxide is smaller, the average particle size is preferably 50 nm or less, and particularly preferably 20 nm or less.

  Next, the alkyl silicate will be described. Alkyl silicate is used as a dispersion stabilizer for titanium oxide.

The alkyl silicate is a compound represented by the general formula Si _n O _n-1 (OR) _{2n + 2} (wherein Si represents silicon, O represents oxygen, and R represents an alkyl group), and n is within a range of 1 to 6, R is preferably an alkyl group having 1 to 4 carbon atoms.

The amount of alkyl silicate, the weight ratio of the silicon in the alkyl silicate and the amount as calculated as SiO _2, an amount obtained by converting the titanium in titanium oxide TiO ₂ is _{(SiO 2} / TiO 2) _0.2~ The ratio is preferably 1.5, particularly preferably 0.2 to 1.0.
This is because the dispersion stability tends to be lowered when the amount of the alkyl silicate is less than the above range, and conversely, when it is more than the above range, the photocatalytic function of titanium oxide is lowered.

  Next, polysiloxane will be described. In the present embodiment, a polysiloxane in which a substituent having an ink-ink property is directly bonded to Si atoms constituting the polysiloxane is used.

Specific examples of the substituent having ink repellency include an alkyl group, a fluoroalkyl group, a vinyl group, an amino group, a phenyl group, and an epoxy group.
Since the substituent having the ink repellency is directly bonded to the Si atom constituting the polysiloxane, the surface of the photosensitive layer 19 becomes ink repellant when the photosensitive layer 19 is formed by applying a photosensitive agent. Is expressed.

  On the other hand, by irradiating the wettability changing layer with ultraviolet rays or the like, these substituents are decomposed, and the surface of the photosensitive layer 19 exhibits ink affinity.

  The state in which the substituent is directly bonded to the Si atom constituting the polysiloxane means that the substituent is directly bonded to the Si atom without passing through an O atom or the like.

  Moreover, the polysiloxane used in the present embodiment usually has a plurality of alkoxyl groups, acetyl groups, or halogens as substituents.

  Such polysiloxanes are particularly limited as long as they have a high binding energy such that the main skeleton is not decomposed by photoexcitation of titanium oxide when condensed by hydrolysis to form a wettability changing layer. Instead, there can be mentioned, for example, those exhibiting high strength by hydrolysis and polycondensation by sol-gel reaction or the like.

In this case, the general formula Y _n SiX _(4-n)
(Y represents an alkyl group, a fluoroalkyl group, a vinyl group, an amino group, a phenyl group, or an epoxy group, X represents an alkoxyl group, an acetyl group, or a halogen. N is an integer from 0 to 3) It is preferable that it is a hydrolysis condensate or a cohydrolysis condensate of the silicon compound shown by these, and the hydrolysis condensate or cohydrolysis condensate of the said 2 or more types of silicon compounds may be sufficient.

  Here, the number of carbon atoms of the group represented by Y is preferably in the range of 1 to 20, and the alkoxyl group represented by X is a methoxy group, an ethoxy group, a propoxy group, or a butoxy group. preferable.

  In the present embodiment, among the substituents having the ink-repellent property, a fluoroalkyl group is particularly preferable.

  Examples of the silicon compound containing a fluoroalkyl group include fluoroalkylsilanes, and those generally known as fluorine-based silane coupling agents can be used, and examples thereof include the following.

_{CF 3 (CF 2) 3 CH} 2 CH 2 Si (OCH 3) 3;
_{CF 3 (CF 2) 5 CH} 2 CH 2 Si (OCH 3) 3;
_{CF 3 (CF 2) 7 CH} 2 CH 2 Si (OCH 3) 3;
_{CF 3 (CF 2) 9 CH} 2 CH 2 Si (OCH 3) 3;
(CF ₃ ) ₂ CF (CF ₂ ) ₄ CH ₂ CH ₂ Si (OCH ₃ ) ₃ ;
_{(CF 3) 2 CF (CF} 2) 6 CH 2 CH 2 Si (OCH 3) 3;
_{(CF 3) 2 CF (CF} 2) 8 CH 2 CH 2 Si (OCH 3) 3;
_{CF 3 (C 6 H 4)} C 2 H 4 Si (OCH 3) 3;
_{CF 3 (CF 2) 3 (} C 6 H 4) C 2 H 4 Si (OCH 3) 3;
_{CF 3 (CF 2) 5 (} C 6 H 4) C 2 H 4 Si (OCH 3) 3;
_{CF 3 (CF 2) 7 (} C 6 H 4) C 2 H 4 Si (OCH 3) 3;
_{CF 3 (CF 2) 3 CH} 2 CH 2 SiCH 3 (OCH 3) 2;
_{CF 3 (CF 2) 5 CH} 2 CH 2 SiCH 3 (OCH 3) 2;
_{CF 3 (CF 2) 7 CH} 2 CH 2 SiCH 3 (OCH 3) 2;
_{CF 3 (CF 2) 9 CH} 2 CH 2 SiCH 3 (OCH 3) 2;
_{(CF 3) 2 CF (CF} 2) 4 CH 2 CH 2 SiCH 3 (OCH 3) 2;
_{(CF 3) 2 CF (CF} 2) 6 CH 2 CH 2 SiCH 3 (OCH 3) 2;
_{(CF 3) 2 CF (CF} 2) 8 CH 2 CH 2 SiCH 3 (OCH 3) 2;
_{CF 3 (C 6 H 4)} C 2 H 4 SiCH 3 (OCH 3) 2;
_{CF 3 (CF 2) 3 (} C 6 H 4) C 2 H 4 SiCH 3 (OCH 3) 3;
_{CF 3 (CF 2) 5 (} C 6 H 4) C 2 H 4 SiCH 3 (OCH 3) 3;
_{CF 3 (CF 2) 7 (} C 6 H 4) C 2 H 4 SiCH 3 (OCH 3) 3;
_{CF 3 (CF 2) 3 CH} 2 CH 2 Si (OCH 2 CH 3) 3;
_{CF 3 (CF 2) 5 CH} 2 CH 2 Si (OCH 2 CH 3) 3;
_{CF 3 (CF 2) 7 CH} 2 CH 2 Si (OCH 2 CH 3) 3;
_{CF 3 (CF 2) 9 CH} 2 CH 2 Si (OCH 2 CH 3) 3; and _{CF 3 (CF 2) 7 SO} 2 N (C 2 H 5) C 2 H 4 CH 2 Si (OCH 3) 3.

  Next, the structure of the exposure apparatus 1 used in the exposure process will be described. FIG. 8 is a view showing the structure of the exposure apparatus 1.

As shown in FIG. 8, the exposure apparatus 1 has an outer box 3a, and an inner box 3b is provided inside the outer box 3a.
The inner box 3b is provided with heat exhaust ports 5a, 5b, 5c, 5d, 5e, 5f, 5g, 5h, 5i, 5j, 5k, 5l, and the heat exhaust ports 5a, 5b, 5c, 5d, 5e. The shielding plates 7a, 7b, 7c, 7d, 7e, 7f, 7g, 7h, 7i, 7j, 7k, 7l are at a predetermined angle so as to cover 5f, 5g, 5h, 5i, 5j, 5k, 5l. Is provided.

The lamps 9a and 9b are provided inside the inner box 3b, and conveyance rollers 11a, 11b, 11c, 11d, 11e, 11f, and 11g for conveying the substrate 71 are provided above the lamps 9a and 9b. Yes.
The lamps 9a and 9b have light sources 21a and 21b that emit ultraviolet rays.

Triangular covers 13a, 13b, 13c, and 13d are provided around the conveying rollers 11b, 11c, 11e, and 11f, and quadrangular covers 15a, 15b, and 15c are provided around the conveying rollers 11a, 11d, and 11g. Yes.
The substrate 71 is transported on the transport rollers 11a, 11b, 11c, 11d, 11e, 11f, and 11g, and is exposed to ultraviolet rays irradiated from the lamps 9a and 9b.

  A light shielding plate 17 is provided above the transport rollers 11a, 11b, 11c, 11d, 11e, 11f, and 11g.

  Next, the structure of the shielding plate 7g and the shielding plate 17 will be described in detail. 9 is a perspective view of the vicinity of the shielding plate 7g in FIG. 8 as viewed from the B direction, and FIG. 10 is a view in the C direction of the vicinity of the shielding plate 17 of FIG.

First, the structure of the shielding plate 7g will be described.
As shown in FIG. 9, the shielding plates 7g and 7h have a "<" shape, and one end thereof is connected to the inner box 3b using bolts 8g and 8h.
In addition, since the structure of shielding board 7a, 7b, 7c, 7d, 7e, 7f, 7i, 7j, 7k, 7l is the same, description is abbreviate | omitted.

Next, the structure of the light shielding plate 17 will be described.
As shown in FIG. 10, the light shielding plate 17 has a flat plate shape, and exposure portions 17a and 17b, which are openings, are provided above the lamps 9a and 9b.

  In other words, the substrate 71 is exposed by the lamps 9a and 9b only at the upper portions of the exposure portions 17a and 17b.

  Here, the surfaces of the shielding plates 7a, 7b, 7c, 7d, 7e, 7f, 7g, 7h, 7i, 7j, 7k, 7l, the inner box 3b, and the light shielding plate 17 are provided with films that absorb ultraviolet rays. The ultraviolet rays irradiated from the lamps 9a and 9b are irradiated to the shielding plates 7a, 7b, 7c, 7d, 7e, 7f, 7g, 7h, 7i, 7j, 7k, 7l, the inner box 3b and the light shielding plate 17. And most is absorbed by the film.

As such a film, a black film is used, and the reflectance in the ultraviolet region of 200 to 400 nm is 5% or less, preferably 1% or less.
Since the film irradiated with such ultraviolet rays absorbs the energy of ultraviolet rays and becomes high temperature, the film is also required to have heat resistance.

  As a film that absorbs ultraviolet rays and has heat resistance, electroless black nickel-phosphorous plating, electroless black nickel-boron plating, or the like is used.

  Further, since the shielding plates 7a, 7b, 7c, 7d, 7e, 7f, 7g, 7h, 7i, 7j, 7k, 7l are provided in the inner box 3b at a predetermined angle, the shielding plates 7a, 7b, Even if ultraviolet rays are reflected on the surfaces of 7c, 7d, 7e, 7f, 7g, 7h, 7i, 7j, 7k, and 7l, the reflected ultraviolet rays are not irradiated onto the substrate.

  For example, as shown in FIG. 8, if the ultraviolet rays 10a, 10b, and 10c irradiated from the lamp 9a are reflected by the surfaces of the shielding plates 7d, 7e, and 7g, the reflected light is irradiated to the adjacent shielding plates 7e and 7f. .

  Thereafter, the reflected light is repeatedly reflected on the shielding plate until it is absorbed by any one of the shielding plates, or is discharged to the outside of the heat exhaust port, so that the substrate 71 is not irradiated.

  Furthermore, even if the reflected light becomes stray light 10d and 10e and is irradiated on the substrate 71 side, most of the light is absorbed by the light shielding plate 17, and the amount of stray light 10d and 10e irradiated on the substrate 71 is as follows. rare.

  Thus, in the present embodiment, the surfaces of the shielding plates 7a, 7b, 7c, 7d, 7e, 7f, 7g, 7h, 7i, 7j, 7k, 7l, the inner box 3b and the light shielding plate 17 are irradiated with ultraviolet rays. Since the film to be absorbed is provided and the shielding plates 7a, 7b, 7c, 7d, 7e, 7f, 7g, 7h, 7i, 7j, 7k, 7l are provided on the inner box 3b at a predetermined angle, exposure It is possible to prevent the ultraviolet rays reflected in the apparatus 1 from being irradiated to a portion that should not be exposed in the substrate 71.

  Next, the structure of the lamp 9a will be described in detail. FIG. 11 is a sectional view showing the structure of the lamp 9a. Note that the structure of the lamp 9b is the same as the structure of the lamp 9a, and a description thereof will be omitted.

As shown in FIG. 11, the lamp 9a has a light source 21a, and a cold filter 23 is provided on the light source 21a.
Reflectors 25a and 25b are provided around the light source 21a.

Heat exhaust ports 27a and 27b are provided between the cold filter 23 and the reflection plates 25a and 25b, and a heat exhaust port 29 is provided between the reflection plates 25a and 25b.
This is because the light source 21a has a high temperature when irradiated with ultraviolet rays, and thus it is necessary to discharge heat to the outside.

  The cold filter 23 includes a glass 31 and a heat ray absorption filter 33 provided on the surface thereof.

The heat ray absorbing filter 33 absorbs heat of ultraviolet rays irradiated from the light source 21a.
As a material of the heat ray absorption filter 33, for example, a metal oxide is used, and this is deposited on the surface of the glass 31.

By providing the cold filter 23, the heat of ultraviolet rays irradiated from the light source 21a is absorbed by the cold filter 23, so that the amount of heat irradiated to the substrate 71 and the like is reduced. Therefore, the temperature rise in the exposure apparatus 1 can be prevented.
Therefore, even if irradiation with a strong output ultraviolet ray is performed, the processing in the substrate surface does not become uneven, so that the exposure can be performed uniformly in a short time.

  On the other hand, the reflecting plates 25a and 25b are made of glass 35a and 35b and reflecting films 37a and 37b provided on the surfaces thereof.

The reflective films 37a and 37b reflect the ultraviolet rays emitted from the light source 21a to the upper surface of the light source 21a.
As a material of the reflection films 37a and 37b, for example, a dielectric multilayer film is used.

As shown in FIG. 11, by providing the reflectors 25a and 25b, not only the ultraviolet rays 39b, 39c and 39d irradiated on the upper surface of the light source 21a, but also the ultraviolet rays 39a and 39e irradiated on the side surfaces and the lower surface of the light source 21a Since the upper surface of the light source 21a is irradiated, the amount of ultraviolet rays irradiated on the substrate 71 can be increased.
Therefore, the exposure time can be shortened.

  By the way, in this embodiment, as shown in FIG. 6, ultraviolet rays are irradiated from the lower surface of the substrate 71, but at this time, depending on the wavelength of the ultraviolet rays, the glass substrate 73 cannot be transmitted. In some cases, the photosensitive layer 19 coated on the surface cannot be exposed.

  FIG. 12 is a graph showing the relationship between the wavelength of ultraviolet rays and the transmittance of ultraviolet rays to the glass substrate 73.

As shown in FIG. 12, the transmittance decreases as the wavelength of the ultraviolet light decreases.
Therefore, the light source 21a used in the present embodiment is preferably a light source that mainly emits long-wavelength ultraviolet light, specifically, a wavelength of 280 to 365 nm, more preferably 300 to 350 nm.
An example of such a light source is a metal halide lamp.
The metal halide lamp is a light source in which a metal halide is sealed in addition to mercury or the like in an arc tube.

Next, the structures of the transport rollers 11a, 11b, 11c, 11d, 11e, 11f, and 11g and the triangular covers 13a, 13b, 13c, and 13d, and the quadrangular covers 15a, 15b, and 15c will be described in detail.
FIG. 13 is a diagram illustrating the structures of the transport rollers 11a, 11b, 11c, 11d, 11e, 11f, and 11g and the triangular covers 13a, 13b, 13c, and 13d, and the quadrangular covers 15a, 15b, and 15c.
FIG. 14 is an enlarged view of the vicinity of the conveyance rollers 11b and 11c in FIG.

As shown in FIG. 13, the transport rollers 11 a, 11 b, 11 c, 11 d, 11 e, 11 f, and 11 g have a cylindrical shape, and the plane portion is pivotally supported by the connecting plates 16 a and 16 b.
When transporting the substrate 71, the transport rollers 11a, 11b, 11c, 11d, 11e, 11f, and 11g are rotated by a motor or the like (not shown) to transport the substrate 71 in the A direction.

In addition, triangular covers 13a, 13b, 13c, and 13d are provided around the conveyance rollers 11b, 11c, 11e, and 11f adjacent to the lamps 9a and 9b.
The other conveyance rollers 11a, 11d, and 11g are provided with quadrangular covers 15a, 15b, and 15c.

  The triangular covers 13a, 13b, 13c, and 13d and the quadrangular covers 15a, 15b, and 15c are configured so that the heat of ultraviolet rays emitted from the lamps 9a and 9b is applied to the conveying rollers 11a, 11b, 11c, 11d, 11e, 11f, and 11g. It is provided to prevent transmission.

  If the heat of the ultraviolet rays irradiated from the lamps 9a and 9b is transmitted to the transport roller, the transport roller may be deformed by the heat and the movement of the substrate 71 may be hindered. Therefore, it is necessary to provide such a cover.

  Although all the covers may be triangular, it is desirable to provide a triangular cover at least around the transport rollers 11b, 11c, 11e, and 11f adjacent to the lamps 9a and 9b.

  This is because the triangular cover is less susceptible to heat because the distance from the light source is longer than the rectangular cover.

For example, let us consider a case where triangular covers 13a and 13b or quadrangular covers 14a and 14b are provided around the transport rollers 11b and 11c as shown in FIG.
In this case, when the triangular covers 13a and 13b are provided, the distances 51a and 51b between the light source 21a and the triangular covers 13a and 13b are longer than the distances 53a and 53b when the quadrangular covers 14a and 14b are provided.

  Therefore, the triangular covers 13a and 13b are less susceptible to heat than the quadrangular covers 14a and 14b, and accordingly, the transport rollers 11b and 11c are also less susceptible to heat.

Thus, according to the present embodiment, since the cold filter 23 that absorbs heat is provided above the light source 21a, the inside of the exposure apparatus 1 can be prevented from becoming high temperature.
Therefore, the output of the lamps 9a and 9b can be increased, and exposure can be performed in a short time.

  As mentioned above, although embodiment of this invention was described referring an accompanying drawing, the technical scope of this invention is not influenced by embodiment mentioned above. It is obvious for those skilled in the art that various modifications or modifications can be conceived within the scope of the technical idea described in the claims, and these are naturally within the technical scope of the present invention. It is understood that it belongs.

For example, the device of the present invention forms a fine pattern when an organic EL light emitting layer is provided, when a display electrode is provided, or when an electronic circuit is provided on a substrate, in addition to providing a colored layer of a color filter. It can also be used when
In addition, the example in which the light shielding part is provided on the substrate and the substrate, the light shielding part, and the photosensitive layer are integrated has been described, but the substrate with the photosensitive layer and the light shielding part may be separated, In addition to the black matrix, the light-shielding portion may be striped or curved.

Flow chart showing the coloring process of the color filter substrate 71 The figure which shows the board | substrate 71 before a process The figure which shows the application | coating process of the photosensitive agent to the board | substrate 71 for forming the photosensitive layer 19 The figure which shows the drying process of the photosensitive layer 19 which apply | coated the photosensitive agent to the board | substrate 71. FIG. The figure which shows the water-washing process of the board | substrate 71 The figure which shows the exposure process of the board | substrate 71 The figure which shows the spraying process of the ink to the board | substrate 71 The figure which shows the structure of the exposure apparatus 1 The perspective view which looked at the shielding board 7g vicinity of FIG. 8 from the B direction C direction arrow view near the light shielding plate 17 in FIG. Sectional drawing which shows the structure of the lamp | ramp 9a The graph which showed the relationship between the wavelength of an ultraviolet-ray, and the transmittance | permeability to the glass substrate 73 of an ultraviolet-ray The figure which shows the structure of conveyance roller 11a, 11b, 11c, 11d, 11e, 11f, 11g and the three-sided covers 13a, 13b, 13c, 13d, and the four-sided covers 15a, 15b, 15c Enlarged view of the vicinity of the conveyance rollers 11b and 11c in FIG.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 ......... Exposure apparatus 3a ......... Outer box 3b ......... Inner box 5a ......... Heat exhaust port 7a ......... Shielding plate 9a ......... Lamp 11a ... Conveyance roller 13a ... Triangle cover 15a ... ... Quad cover 17 ... …… Light-shielding plate 17a …… Exposure part 21a …… Light source 23 ……… Cold filter 25a …… Reflector 27a …… Heat outlet 29 ……… Heat outlet 31 ……… Glass 33… …… Heat absorption filter 35a …… Glass 37a …… Reflective film 71 ……… Substrate 73 ……… Glass substrate 75a …… Black matrix 77 ……… Die head 79 ……… Sensitive agent 81 ……… Dryer 83 …… ... Shower 85a …… Tail ink part 87a …… Parent ink part 89 ……… Ultraviolet light 91a …… Color ink

Claims (5)

An exposure apparatus for exposing a substrate having a photosensitive layer,
A dark box,
An ultraviolet irradiation device that is provided inside the dark box and irradiates the substrate to be conveyed with ultraviolet rays;
Have
The ultraviolet irradiation device is
A light source;
A heat absorption filter provided between the light source and the substrate;
An exposure apparatus comprising:   2. The exposure apparatus according to claim 1, wherein the substrate is a substrate for a color filter.   The exposure apparatus according to claim 1, wherein a film that absorbs heat of ultraviolet rays emitted from the light source is provided on at least one surface of the heat absorption filter.   4. The exposure apparatus according to claim 3, wherein the film is a vapor-deposited film of metal oxide.   2. The exposure apparatus according to claim 1, wherein the photosensitive agent constituting the photosensitive layer contains at least a titanium oxide sol solution and a hydrolyzed solution of fluoroalkylsilane.

Images