JP2006251635A - Semiconductor device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a liquid crystal display having a hybrid type color filter structure, wherein application to high definition (pitch narrowed pixel) is also performed. <P>SOLUTION: A colored part CFH and a low colored part CFL whose color density is lower than that of the colored part are formed in a reflection region CFR on a CF substrate 2b in order to have the hybrid type color filter structure. The shape of the low colored part CFL is so formed that at least a part of the low colored part CFL comes in contact with a peripheral edge of the reflection region CFR and does not come in contact with a peripheral edge on the opposite side of the reflection region CFR. As one example, the low colored part CFL is formed in a recessed shape. In formation of a resist pattern, constraints of the minimum size of a remaining pattern and a removed pattern is reduced as compared with the case the low colored part is formed in a slit shape and a window shape and the recessed shape can be adapted to high definition. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

  The present invention relates to a semiconductor device. More specifically, the present invention relates to a display device (electro-optical device) such as an active matrix system in which a pixel transistor typified by a liquid crystal display (LCD) is provided on a semiconductor substrate. The present invention relates to a structure of a so-called composite color filter having a transmission part.

  In recent years, display devices that use liquid crystal or organic EL (Electroluminescence / OLED: Organic Light Emitting Diode) as a display functional element have been made thin and have low power consumption. It is widely used for OA (Office Automation) equipment such as a personal computer, portable information equipment such as an electronic notebook, or a camera-integrated VTR equipped with a display monitor. In recent years, with the spread of digital equipment such as terrestrial digital, the need for high-definition display is increasing.

  Here, in the liquid crystal display device, a transmissive liquid crystal display device that irradiates illumination light from the back surface of the panel using a transparent conductive thin film such as ITO (Indium Tin Oxide) for the pixel electrode, and a metal electrode or the like for the pixel electrode. It is roughly divided into a reflective liquid crystal display device that irradiates illumination light from the front of the panel using a reflective electrode, and a composite (hybrid) liquid crystal display device that has both the reflective and transmissive functions. The

  The reflective liquid crystal display device has a drawback that the visibility is extremely lowered when the ambient light is used, particularly when the outside light is dark. In the transmissive liquid crystal display device, On the other hand, when the outside light is very bright, for example, the visibility under a clear sky is lowered.

  As a mechanism for solving such a problem, a composite type liquid crystal display device (also referred to as a hybrid type or a reflection / transmission type) proposed in Patent Documents 1 and 2, for example, has been proposed.

JP 2000-111902 A JP 2003-215560 A

  The composite type liquid crystal display device has a reflective part that reflects external light and a transmissive part that transmits light from the backlight in one display pixel. As a transmissive liquid crystal display device that performs display using light transmitted through the transmissive part, and when the external light is dark, the light transmitted through the transmissive part from the backlight and a film having a relatively high light reflectance As a dual-use liquid crystal display device that displays using both the light reflected by the formed reflective portion and when the external light is bright, it is reflected by the reflective portion formed by a film having a relatively high light reflectance. This is a reflection / transmission type liquid crystal display device having such a structure that it can be used as a reflection type liquid crystal display device that performs display using the light to be transmitted.

  However, such a composite liquid crystal display device can always have excellent visibility regardless of the brightness of external light, but it is bright in both transmissive and reflective types and has high color purity. In order to realize color display, there is a problem in terms of color purity.

  That is, when a color filter layer that has been used conventionally is applied to a reflection / transmission liquid crystal display device, light from the backlight is transmitted only once in the color filter layer corresponding to the transmission portion. On the other hand, the color filter layer corresponding to the reflective part transmits twice when external light is incident and when it is emitted, thereby realizing bright and high color purity color display in both the transmission type and the reflection type. It is difficult to do.

  In order to solve this problem, it is also considered that the reflective region corresponding to the reflective portion and the transmissive region corresponding to the transmissive portion are separately configured with different materials. In other words, the color density of the reflective area is previously set lower than the color density of the transmissive area so that there is no great difference in color tone between the reflective area and the transmissive area. However, for this purpose, it is necessary to create the color filter portions colored in the same color within the same pixel by using different materials for the reflective region and the transmissive region in different processes.

  That is, in order to realize such a composite type, it is necessary to form a color filter region adapted for the transmission type and a color filter region adapted for the reflection type on the color filter substrate side using different materials. . In this case, it is necessary to form the color filter through the manufacturing process of the transmissive color filter and the manufacturing process of the reflective color filter separately. However, this method requires a long manufacturing process and increases the types of materials used. For this reason, the manufacturing cost of the composite type color filter is higher than that of a color filter used in a normal transmission type display.

  As a technique for solving the above-described various problems, Patent Documents 1 and 2 disclose that a reflective region on a color filter substrate is a colored portion where a color filter layer is formed, and a color filter layer where the color density is zero. A mechanism is proposed in which a portion is formed by a portion in which no color is formed (white portion) or a portion colored at a density lower than the coloring density of the colored portion (light-colored portion; collectively referred to as the white portion and the low-colored portion). Yes. For example, an example in which the shape of the low coloring portion is a circular or rectangular window shape or slit shape is shown.

  According to the mechanisms described in Patent Documents 1 and 2, since it is not necessary to control the film thickness of the color filter layer separately for the transmissive portion and the reflective portion, the color filter used in the transmissive liquid crystal display device In comparison, the manufacturing process is not increased, the process can be simplified and the degree of design freedom can be improved, and white can be displayed to improve the brightness.

  However, with the mechanisms described in Patent Documents 1 and 2, there is a problem that it becomes difficult or impossible to form a stable low-colored portion due to the patterning characteristics of the resist as the pixels become higher in definition. In order to cut out the low-colored portion into a slit shape or a window shape, the desired size can be removed at the time of high definition (narrow pitch pixel) due to the limited capability due to resist characteristics and device characteristics as the pixels become higher definition. This is because it becomes impossible or difficult to form.

  In addition, simply providing a low color portion in the color filter pixel does not provide sufficient white balance performance, leading to a problem of reduced display quality.

  14 and 15 are diagrams for explaining this problem. Here, FIG. 14 is a diagram showing a color filter reflection spectrum. FIG. 15 is a graph (chromaticity diagram) showing the chromaticity of the color filter.

  First, as a technique before providing the low-colored portion of the window structure, a color filter that is optimal for transmission characteristics is used for the transmission portion, and a color filter that is optimal for reflection characteristics is used for the reflection portion. In this case, the liquid crystal panel had good characteristics in both transmission characteristics and reflection characteristics (in other words, reflectance and white balance). Here, the color filter optimal for the reflection characteristic means a color filter that maintains the hue of each color to increase the transmittance and has a transmission characteristic in consideration of white balance.

  On the other hand, as a process reduction or cost reduction measure, when the same color filter material as that of the transmission portion is disposed in the reflection portion (however, the low color portion of the window structure is not disposed), FIG. As can be seen from FIGS. 15A and 15B, the reflectance is significantly lowered and the reflection white balance is also greatly degraded. Since this is a color filter that places importance on the transmitted color, in the case of a reflected color (a color in which light has passed through the color filter twice), the y value increases, resulting in a hue shifted to the very yellow side.

  As a technique for solving this problem, the mechanisms described in Patent Documents 1 and 2 employ a structure in which a low color portion is provided and the size and color purity of the RGB low color portion are optimized. However, as can be seen from FIG. 14B and FIGS. 15A and 15B, the level of white balance of the prior art in which the low color portion of the window structure is provided has not been reached.

  On the other hand, as can be seen from FIGS. 14C and 15A and 15B, the white balance can be improved by increasing (optimizing) the size of the low-colored portion of the window structure. it can. However, when this method is adopted, as can be seen from FIG. 14C and FIGS. 15A and 15B, the color purity is lowered. That is, sufficient white balance performance cannot be obtained only by improvement by providing the low coloring portion.

  The present invention has been made in view of the above circumstances, and it is possible to form a composite color filter without increasing the number of processes as compared with a conventional color filter even at the time of high definition (narrow pitch pixelization). The purpose is to provide a mechanism that can do this.

  It is another object of the present invention to provide a mechanism that can realize white reproduction satisfactorily even when a composite color filter structure is used.

  A first semiconductor device according to the present invention includes a pair of substrates disposed to face each other with a layer having a composition related to a display function interposed therebetween, and pixels are formed on one substrate. A semiconductor device in which a pixel includes a reflective portion that reflects external light and a transmissive portion that transmits light, and a color filter colored in a different color corresponding to each pixel is formed on the other substrate. In the color filter of at least one color, the low colored portion whose coloring density is lower than other portions is present in the reflective region corresponding to the pixel and inside the pixel region corresponding to the pixel, and at least a part of the color filter is the reflective region. It is assumed that the outer periphery of the reflective region is not in contact with the peripheral edge on the opposite side of the reflective region, that is, does not extend to the peripheral edge of the reflective region.

  Here, “the color density is lower than that of the other part” means that the transmittance of the wavelength component of the color is higher than that of the colored part which is the other part of the reflection region. It is sufficient that the transmittance of the wavelength component of the color is higher than that of the colored portion, and ultimately the color filter layer may not be formed, and the color density is substantially zero when the color filter layer is not formed. (= 0) may be sufficient.

  The invention described in the dependent claims relating to the first semiconductor device defines further advantageous specific examples of the first semiconductor device according to the present invention.

  For example, it is preferable that the transmissive region on the color filter substrate on which the color filter corresponding to the transmissive portion on the pixel substrate on which the pixel is formed is configured by a region in which the color filter layer is formed.

  Moreover, as a shape of a low coloring part, it shall be a concave shape, for example.

  Further, the number of low coloring portions is not limited to one for one color filter, and a plurality of low coloring portions may be formed. In this case, the plurality of low coloring portions may be formed so as to be in contact with the peripheral edges on the opposite sides of the reflection region. Further, in this case, it is preferable to form the same number at each periphery, or to form the same shape at each periphery.

  In addition, when the plurality of low-colored portions are formed so that the arrangement coordinates on the respective peripheral edges are the same, pattern finished shape management at the time of mass production becomes easy. In addition, when the plurality of low-colored portions are formed so that the arrangement coordinates on the peripheral edges are different, it is advantageous for pattern formation in fine pixels (narrow pitch pixels) rather than the same arrangement coordinates.

  In addition, regarding the relationship between adjacent pixel regions of different colors, if the low color portions formed so as to be in contact with the edge of the boundary portion are opposed to each other at the boundary portion, a shift at the time of color filter bonding is performed. The degree of color mixing in the low-colored portion due to can be alleviated. In this case, the color mixture in the low-colored portion can be almost completely prevented by forming the vicinity of the facing portion corresponding to the overlapping portion due to the deviation at the time of bonding with substantially the same shape.

  In addition, when considering the influence of color mixing due to misalignment at the time of color filter bonding on the color tone, the opposite portion of the low-colored portion of the colored portion having a high transmittance is changed to the low-colored portion of the colored portion having a low transmittance. It is good to form with a shape larger than the opposing part. In this case, even if the shape is not the same, the colored portion having a high transmittance does not enter the low colored portion having a low transmittance. Color mixing due to misalignment can be prevented almost completely.

  On the other hand, for the low-colored portion of the color having a high transmittance, the colored portion having a low transmittance enters the portion having a different size, so that a color shift due to the color mixture may occur, but the color mixture is a color mixture with a color having a low transmittance. Therefore, the effect is small.

  The second semiconductor device according to the present invention has a pair of substrates arranged to face each other with a layer having a composition related to a display function interposed therebetween, and pixels are formed on one substrate. A semiconductor device in which each pixel has a reflection portion that reflects external light and a transmission portion that transmits light, and a color filter colored in a different color corresponding to each pixel is formed on the other substrate In the color filter of at least one color, a low color portion having a lower color density than other portions is formed inside the pixel region corresponding to the pixel and in the reflective region corresponding to the reflective portion. A part or the whole of the part is colored with a color different from the color of the part (colored part) excluding the low-colored part of the reflective region in the color filter.

  In addition, the shape and arrangement | positioning aspect of the low coloring part in the 2nd semiconductor device which concerns on this invention can utilize the mechanism in the said 1st semiconductor device which concerns on the said this invention, A low coloring part is at least one part. Can be formed so as to be in contact with the peripheral edge of the reflective region and non-contact with the peripheral edge on the opposite side of the reflective region.

  The invention described in the dependent claims relating to the second semiconductor device defines further advantageous specific examples of the second semiconductor device according to the present invention.

  For example, a part or the whole of the low coloring portion may be colored with the color of another color filter adjacent to the color filter.

  For example, in two types of relationships of red and blue, a low color portion may be formed in a red color filter, and a part or the whole of the low color portion may be colored in blue.

  Alternatively, in the three types of relationships, low colored portions are formed on the opposing edges of any one of the color filters, and each is colored with a different color, that is, one of the low colored portions. The part or the whole may be colored with one of the remaining two colors, and part or the whole of the other low-colored part may be colored with the other of the remaining two colors.

  For example, in the three types of relationships of green, red, and blue, a low color portion is formed on each of the opposing edges of the green color filter, and a part or the whole of one low color portion is made red, blue It is good to color with any one of these, and to color a part or whole of the other low coloring part with the other color of red and blue.

  According to the first semiconductor device of the present invention, when a colored portion and a low colored portion whose coloring density is lower than other portions are formed in the reflective region on the color filter substrate, the composite color filter structure is low. The shape of the colored portion was formed such that at least a part of the low colored portion was in contact with the peripheral edge of the reflective region and was not in contact with the peripheral edge on the opposite side of the reflective region.

  As a result, in resist pattern formation, there are fewer restrictions on the minimum size of the remaining pattern and punched pattern than when the low-colored portion is shaped like a slit or window, making it suitable for high definition (narrow pitch pixels). become able to.

  Further, in adjusting the area ratio of the low coloring portion, it is possible to adjust from the two viewpoints of the size of the reflection region peripheral portion of the low coloring portion and the amount of insertion from the peripheral portion, and the degree of freedom of area adjustment is high. Thereby, in the case of high-definition pixels, the area of the low-colored portion is reduced, but even a small area can be formed without any problem.

  Further, according to the second semiconductor device of the present invention, when a colored portion and a low colored portion whose coloring density is lower than other portions are formed in the reflective region on the color filter substrate to form a composite type color filter structure, The color filter with the low color portion formed is partly or entirely filled with a color different from the color filter color, so that the color purity of the color filter is maintained. Thus, white reproduction can be adjusted by adjusting the arrangement ratio of other colors in the low coloring portion, and good white reproduction can be achieved.

  The optimum values of brightness and color purity can also be set for each color by adjusting the area ratio of the low coloring portion with a plurality of color filters. However, in the second semiconductor device of the present invention, further, Subtle adjustments can be made by adjusting the arrangement ratio of other colors in the image, and it becomes easier than the prior art in maintaining brightness and color purity at optimum values for each color and improving white reproduction. This is because it can be subtly seasoned.

  In addition, in both the first and second semiconductor devices of the present invention, similarly to Patent Documents 1 and 2, a colored portion and a low colored portion having a lower coloring concentration than other portions are formed in the reflective region. Since the color filter structure is formed, a composite color filter can be formed without increasing the number of processes as compared with a conventional color filter.

  Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

<Overall configuration of liquid crystal display device>
FIG. 1 is a diagram showing an outline of the overall configuration of an embodiment of a liquid crystal display device to which a color filter configuration according to the present invention is applied, for example, using a liquid crystal cell as an electro-optical element.

  As shown in FIG. 1, a liquid crystal display device 1 includes a pixel array unit 3, a vertical driving unit 5, a horizontal driving unit 6, a level shifter unit (L / S) 7, an external connection terminal unit (on the substrate 2). Pad portion) 8 and the like are integrated. That is, peripheral drive circuits such as the vertical drive unit 5, the horizontal drive unit 6, and the level shifter unit 7 are formed on the same substrate 2 as the pixel array unit 3.

  The pixel array unit 3 is driven by the vertical drive unit 5 from both the left and right sides. Various pulse signals are supplied to the terminal portion 8 from a driving IC arranged outside the liquid crystal display device 1.

  As an example, in addition to the shift start pulse IN, necessary pulse signals such as a clock pulse CK and a clock pulse xCK (a logically inverted CK), a standby signal STB (or xSTB obtained by logically inverting STB), an enable pulse EN, etc. Supplied.

  Each terminal of the terminal unit 8 is connected to the vertical driving unit 5 and the horizontal driving unit 6 via the wiring 9. For example, each pulse supplied to the terminal unit 8 is supplied to the vertical driving unit 5 and the horizontal driving unit 6 through a buffer after the voltage level is internally adjusted by the level shifter unit 7.

  In the illustrated example, only the vertical drive unit 5 is interposed via the level shifter unit 7. The vertical drive unit 5 scans the pixel array unit 3 line-sequentially, and the horizontal drive unit 6 writes an image signal in the pixel array unit 3 in synchronization with this.

  Although not shown, the pixel array unit 3 has a panel structure including a pair of substrates 2 and a liquid crystal held between them. For example, pixels including pixel transistors and the like are two-dimensionally arranged in a matrix on a transparent insulating substrate, for example, a first glass substrate (driving side substrate; pixel substrate), and a scanning line is provided for each row with respect to this pixel array. In addition to being wired, signal lines are wired for each column. The first glass substrate is disposed so as to face the second glass substrate (opposite side substrate; color filter substrate) with a predetermined gap, and is bonded through a sealing agent (not shown). Then, the liquid crystal material is sealed in a region inside the position of the sealant.

  In the pixel array section 3, scanning lines (gate lines) 12 and signal lines (data lines) 14 are formed. A pixel electrode and a thin film transistor (TFT) for driving the pixel electrode are formed at the intersection between the two. A pixel cell 30 is composed of a combination of a pixel electrode and a thin film transistor.

  As will be described in detail later, one of color separation filters (CF: Color Filter) among color separation filters formed by a combination of color filters of a predetermined color for color image display is formed in the pixel cell 30.

  The vertical driving unit 5 sequentially selects each pixel cell 30 via the scanning line 12. The horizontal driving unit 6 writes an image signal to the selected pixel cell 30 via the signal line 14.

  For example, the vertical drive unit 5 includes a combination of logic gates (including latches), and selects each pixel cell 30 of the pixel array unit 3 in units of rows. Although FIG. 1 shows a configuration in which the vertical drive unit 5 is disposed only on one side of the pixel array unit 3, a configuration in which the vertical drive unit 5 is disposed on both the left and right sides with the pixel array unit 3 in between is adopted. Is also possible.

  The horizontal driving unit 6 includes a shift register, a sampling switch (horizontal switch), and the like, and writes a video signal in units of pixels to each pixel cell 30 in a row selected by the vertical driving unit 5.

  In this example, dot sequential driving is described in which a video signal is written to each pixel cell 30 in the selected row in units of pixels. It is also possible to take sequential driving.

<Basic configuration of color filter>
FIG. 2 is a diagram for explaining a color filter configuration according to the present invention. For example, as shown in the plan views of FIGS. 2A and 2B, the substrate 2 includes a pair of TFT substrates 2a and a CF substrate 2b disposed to face each other with a liquid crystal layer interposed therebetween. .

  Pixel cells 30 arranged in a matrix are formed on the TFT substrate 2a, and each pixel cell 30 is formed with a reflection portion 30R that reflects external light and a transmission portion 30T that transmits light. On the other hand, the color filter CF colored in different colors such as the three primary colors of red (Red), green (Green), and blue (Blue) is provided on the CF substrate corresponding to each pixel cell 30. It is formed.

  The color filter CF has a reflection region CFR corresponding to the reflection portion 30R and a transmission region CFT corresponding to the transmission portion 30T inside the pixel region corresponding to each pixel cell 30. In the present embodiment, a color filter having a common color density is formed over both the reflection region CFR and the transmission region CFT. Therefore, there is no difference in material between the reflection CF and the transmission CF. Instead, in some regions of the reflective region CFR of the color filter CF, in addition to the colored portion CFH that is colored in the same manner as the colored concentration of the transmissive region CFT, the coloring concentration is higher than other portions (colored portion CFH). One or more low colored portions CFL are provided.

  Here, “the color density is lower than that of the other part” means that the transmittance of the wavelength component of the color is higher than that of the colored part CFH. It is sufficient that the transmittance of the wavelength component of the color is higher than that of the colored portion CFH. Ultimately, the color filter layer may not be formed. It may be zero (= 0).

  For example, the low color portion CFL can be formed by forming a light shielding film on a photomask and performing an exposure process. In this case, since the colored layer of the color filter is completely removed from the low colored portion CFL, the coloring density becomes zero. Alternatively, the color density may be lowered by leaving a color filter to some extent in the low color portion CFL. Specifically, the film thickness of the colored layer of the low colored portion CFL can be reduced by creating a half exposure state using a slit-shaped light shielding film pattern.

  Here, as will be described later in detail as a configuration unique to the present embodiment, at least a part of the low color portion CFL formed in the reflective region CFR of the color filter CF is in contact with the periphery of the reflective region CFR in the pixel region, and The reflection region CFR is formed so as not to be in contact with the opposite periphery, that is, so as not to contact the opposite periphery.

  By doing so, in the reflective region CFR corresponding to the reflective part 30R, the colored part CFH in which the color filter layer is formed by being colored with a predetermined concentration and the color filter layer is not substantially formed, or A low colored portion CFL provided with a colored portion having a lower concentration than the colored portion CFH is formed.

  Here, the reason why at least a part thereof is formed so as to be in contact with the periphery of the reflective region CFR in the pixel region is to eliminate the so-called window shape in which the colored portion CFH exists around the entire periphery of the low colored portion CFL of the reflective region CFR. It is. Also, the reason why the non-contact is formed with the peripheral edge on the opposite side of the reflective region CFR is to eliminate the slit shape in which the other side of the low coloring portion CFL extends to the peripheral end of the reflective region CFR. is there.

  As a typical shape of the low color portion CFL in the present embodiment, a concave portion may be formed from the periphery of the color filter CF. Or you may form so that the corner | angular part of reflective area | region CFR may be shaved.

  However, wiring (gate lines, signal lines, etc.) is arranged on the TFT substrate 2a side at the corners, and there are many areas that do not contribute to reflection, which is caused by misalignment of the cell process or color filter alignment. It can be a problem that the effective area of the low coloring portion CFL varies. For this reason, the concave shape has an advantage that it is not adversely affected.

  As shown in FIG. 2C, the spectral transmittance of the color filter CF is basically the same in the transmissive region and the reflective region, and the low colored portion CFL is provided in a part of the reflective region CFR, whereby the low colored portion CFL. The light that has passed through is reflected without being colored in the color of the color filter CF.

  An observer reflects most of the light that passes through the colored portion CFH reflected by the reflective portion 30R of the pixel and is colored by the color filter CF, and the low colored portion CFL that is part of the reflective region CFR that is uncolored or colored at a low density. The light passing therethrough is recognized as a mixture, and as a result, it is recognized as a color whose coloring density is close to that of a conventional reflective color filter. If the area of the low coloring portion CFL is adjusted, the purity of the color can be adjusted.

<Filter Configuration; First Embodiment>
3 to 7 are diagrams for explaining a first embodiment of a technique for providing a low color portion CFL in the reflection region CFR of the color filter CF. Here, (A) to (C) in FIG. 3 show the low color portion CFL of the present embodiment. 4A to 4C show a conventional low color portion CFL as a comparative example. 5A to 5C are diagrams for explaining a method of adjusting the area of the low coloring portion CFL. 6A to 6D and FIG. 7 are diagrams for explaining the relationship between the alignment error and the transmittance or reflectance.

  3A to 3C, the low color portion CFL formed in the reflective region CFR of the color filter CF has a concave shape so that at least a part thereof is in contact with the periphery of the reflective region CFR. It is formed to exhibit. The color density of the low color portion CFL may be substantially zero (= 0) where the color filter layer is not formed, or may be set lower than other portions, and as a result, The transmittance of the wavelength component of the color is made higher than the other parts.

  In this way, optical characteristics required for the color filter CF in the reflective region CFR can be realized by forming such a low color portion CFL in the color filter CF that is basically adapted for transmission. . Even if the material of the color filter CF for reflection is not used, the color filter CF for reflection can be equivalently formed by providing the low color portion CFL.

  Generally, the smallest unit that can be confirmed by human eyes is about 30 μm square. Therefore, the color filter CF in the reflective region CFR is adjusted in color without making the presence of the low color portion CFL visually noticeable by miniaturizing the maximum size portion of the low color portion CFL for color adjustment to 30 μm or less. can do. In this way, it is possible to reduce the cost of the color filter by realizing a process saving with a small amount of material.

  For example, in FIGS. 4A to 4C showing the prior art, the low-colored portion CFL has a slit shape as shown in FIG. 4A, a circular window shape as shown in FIG. 4B, or FIG. ), A rectangular window shape is used, and as the pixel becomes higher in definition, it becomes impossible to form a desired size at the time of higher definition (narrow pitch pixel) due to the capability limitation due to resist characteristics and device characteristics. That is, in the resist pattern formation, since there are minimum size restrictions for the remaining pattern and the extracted pattern, the minimum values of the slit size and the window size are determined.

  For example, when one pixel is 30 μm, the width WCF of the color filter CF must be approximately 30 μm. In this case, when the low colored portion CFL having a circular or rectangular window shape is provided as shown in FIGS. 4B and 4C, the size DL of the extraction pattern must be less than 30 μm.

  Further, in order to prevent alignment errors from overlapping with the low color portion CFL of the adjacent pixel, it is necessary to secure a certain width LWR of the remaining pattern. For example, in consideration of an alignment error between pixels, it is necessary to form the low color portion CFL 2 μm or more inside the reflection region CFR. Therefore, when the area AL is adjusted while maintaining a circular or rectangular shape, the size DL is naturally further restricted. As a result, the adjustment range of the area AL of the low coloring portion CFL is further restricted.

  If the same area AL is attempted, the width LWR of the remaining pattern formed on both sides of the low color portion CFL becomes narrower as the pixel size becomes smaller. The minimum value of the width LWR of the remaining pattern may be restricted due to processing restrictions. For example, when the width LWR needs to be 7 μm or more, the size DL of the low coloring portion CFL is limited to about 15 μm. End up. As a result, the adjustment range of the area AL of the low coloring portion CFL is restricted.

  Further, when the slit-shaped low colored portion CFL is provided as shown in FIG. 4A, to adjust the area AL of the low colored portion CFL, the size, that is, the slit width SWW is adjusted. If the minimum value of the remaining pattern width LWR is restricted, the adjustment range of the slit width SWW, that is, the adjustment range of the area AL of the low coloring portion CFL is restricted.

  On the other hand, in FIGS. 3A to 3C showing the first embodiment, the low coloring portion CFL is formed in a concave shape so that a part thereof is in contact with the peripheral edge of the reflection region CFR, thereby forming the pixel. Even when high definition is accompanied, the extraction size can be minimized, and a pattern can be formed even in high definition pixels (narrow pitch pixels).

  For example, in the first embodiment, the spectral transmittance of the color filter CF is basically the same in the transmission region CFT and the reflection region CFR. In the reflection region CFR, by providing the low color portion CFL, the light that has passed through the low color portion CFL is not colored in the color of the color filter CF or reflected at a low density. The observer recognizes a mixture of most of the light reflected by the reflective portion 30R of the pixel and colored by the color filter CF and a portion of uncolored or low-density light that has passed through the low-colored portion CFL. As a color with a reduced color density close to that of a conventional reflective color filter.

  Theoretically, the spectral transmittance in the case where the low coloring portion CFL is provided together with the normal transmission type color filter CF is given by the following equation (1-1). Here, TCF represents the transmittance after synthesis, TL represents the transmittance of the low color portion CFL, S represents the aperture ratio of the low color portion CFL, and TR represents the transmittance of the color filter CF. Moreover, the aperture ratio S of the low coloring part CFL is given by the following formula (1-2).

  Further, the total chromaticity x, y of the color filter CF in the X, Y, Z color space when the low coloring portion CFL is provided can be obtained by the following equation (2).

  As is apparent from the equation (2), the total chromaticity x, y depends on the combined transmittance TCF and the aperture ratio S of the low coloring portion CFL. As can be seen from the equation (1-1), the transmittance TCF after the synthesis depends on the aperture ratio S of the low coloring portion CFL.

  Therefore, by adjusting the aperture ratio S of the low color portion CFL, the total chromaticity x, y of the color filter CF can be moved on the xy plane, and as a result, the aperture ratio S of the low color portion CFL. By adjusting, the total chromaticity x, y of the color filter CF can be set optimally. Further, as can be seen from the equation (1-2), in order to optimally set the chromaticity x and y by adjusting the aperture ratio S of the low coloring portion CFL, the area AL of the low coloring portion CFL is adjusted. Good.

  As described above, in the case of a composite color filter, by providing a colored portion having a color filter layer and a low colored portion in a reflective region on the color filter substrate corresponding to the reflective portion on the pixel substrate. Compared with a color filter used in a transmissive liquid crystal display device, the manufacturing process is not increased, and white can be displayed to improve brightness. This is because there is no need to control the film thickness of the color filter layer separately for the transmission part and the reflection part.

  Further, when adjusting the optimization of brightness and color purity with the color plate of the color filter, it takes time and effort to adjust the concentration of the pigment and the concentration dispersed in the resin. The optimization of brightness and color purity can be adjusted only by design, and the simplification of the process and the freedom of design can be improved.

  In the reflective area CFR, the light emitted through the color filter layer (colored portion CFH) with high color purity and the light emitted through the low colored portion CFL are mixed to realize a bright color display necessary for the reflective display. can do. At this time, since a color filter layer with high color purity is formed in the transmissive region CFT, display with high color purity can be performed as in a conventional transmissive liquid crystal display device.

  Here, in order to change the aperture ratio S by adjusting the area AL of the low color portion CFL, a method of changing the number and size of the low color portions CFL can be employed. That is, by optimizing the aperture ratio S, it is possible to realize a color filter CF that is close to the spectral characteristics of the color filter CF adapted to the conventional reflection type. What is important at this time is that the color tone changes considerably even if the aperture ratio S changes by several percent, so that it is necessary to increase the processing accuracy in forming the low coloring portion CFL.

  If the low-colored portion CFL is formed so that at least part of the low-colored portion CFL is in contact with the peripheral edge of the reflective region CFR and the shape of the punched portion exhibits a concave portion as in this embodiment, the degree of freedom of area adjustment is very high It is high and resist pattern formation is difficult to be restricted by the minimum size of the remaining pattern and blank pattern. Therefore, pattern formation with a smaller area is possible compared to the conventional technology that forms the low color portion CFL in the slit shape or window shape. And high definition pixels (narrow pitch pixels) can be realized. In the prior art, the area must be adjusted from one point of view, such as the slit width in the case of a slit, and the diameter in the case of a circular window, making it difficult to achieve high definition pixels (narrow pitch pixels). It is.

  For example, when adjusting the area AL of the low coloring portion CFL, as shown in FIG. 5A, the amount of low coloring can be reduced by adjusting the insertion amount ZL from the periphery of the reflective region CFR while maintaining the same shape and size. The area AL of the part CFL can be adjusted. In addition, as shown in FIG. 5B, the area AL of the low coloring portion CFL can be adjusted by adjusting the size D while keeping the blank shape and the insertion amount ZL from the periphery of the reflection region CFR the same.

  Further, by making the low color portion CFL concave so that a part thereof is in contact with the periphery of the reflection region CFR, the remaining pattern formed by the low color portion CFL is brought to only one of the reflection regions CFR. Can do. As a result, the margin for the restriction of the remaining pattern width LWR is doubled as compared with the conventional technique in which the remaining pattern is formed on both sides of the reflection region CFR when the circular low colored portion CFL is used. . Accordingly, the adjustment range of the area AL of the low coloring portion CFL is widened by adjusting the insertion amount ZL.

  In addition, even when it is necessary to secure the width LWR of the remaining pattern to some extent, the area AL of the low coloring portion CFL can be adjusted by adjusting the size D while maintaining the width LWR. Therefore, even when it is necessary to increase the definition of the pixel, there are few restrictions on the minimum size of the remaining pattern and the extraction pattern, and the area AL for forming the low coloring portion CFL can be minimized.

  As shown in FIG. 3A, the low color portion CFL may include one color adjustment low color portion CFL in one pixel region, but 2 in one pixel region. A plurality of low color portions CFL for color adjustment, such as two, may be included. For example, as shown in FIG. 3B or FIG. 3C, one low color portion CFL may be disposed on each side of the reflective region CFR. Or although illustration is omitted, you may arrange | position the some low coloring part CFL on the one side of the reflective area | region CFR.

  When a plurality of low color portions CFL are arranged on both sides of the reflection region CFR, as shown in FIG. 3B, the concave low color portions CFL for color adjustment arranged on both sides of the color filter CF are provided. Each of the low colored portions CFL can be arranged so as to have the same arrangement coordinates, that is, to have a concave shape and to face each other from the edges on both sides of the reflection region CFR. In this case, the margin for the restriction of the remaining pattern width LWR is doubled as compared with the prior art in which the circular low colored portion CFL is used, and the low colored portion by adjusting the amount of insertion ZL is correspondingly increased. The adjustment range of the area AL of the CFL becomes wide.

  Alternatively, as shown in FIG. 3C, the concave color-reduced portions CFL for color adjustment arranged on both sides of the color filter CF can be set to different arrangement coordinates. In this case, there is a high degree of freedom in the arrangement position of each low color portion CFL, the restriction on the minimum size of the remaining pattern and the removal pattern is less than that in FIG. 3B, and each low color portion CFL may be excessively close. In addition, the area AL for forming the low coloring portion CFL can be further minimized.

  For example, in general, the low color portion CFL can be formed by using a photolithography technique. In this case, considering the resolution of the exposure apparatus, the low color portion CFL with high accuracy can be formed by separating 10 μm or more. . When the low coloring portion CFL is closer than this, it may be difficult to separate the two by photolithography.

  Here, in the case where the reflective regions CFR are arranged at a distance of 10 μm or more, in the arrangement form shown in FIG. 3B, the facing distance between the two low colored portions CFL having the remaining pattern width LWR must be 10 μm or more. However, in the arrangement shown in FIG. 3C, the interval between the edges facing the two low colored portions CFL having the remaining pattern widths LWR1 and LWR2, and the two low colored portions CFL having the remaining pattern width LWR3 are used. The spacing between the two patterns may be 10 μm or more, and the margin for the remaining pattern width becomes larger than that in FIG.

  On the other hand, as shown in FIG. 3B, the measurement pattern of the remaining pattern width is one of the remaining pattern width LWR1 when the low coloring portion CFL is arranged at the same coordinate position on the opposite edges of the reflection region CFR. On the other hand, as shown in FIG. 3C, if the low color portion CFL is arranged at different coordinate positions on the opposite edges of the reflective region CFR, the remaining pattern widths LWR1, LWR2, and LWR3 are provided. In the arrangement mode shown in FIG. 3B, pattern finished shape management at the time of mass production becomes easier.

  Further, as shown in FIGS. 3B and 3C, if the low coloring portion CFL is disposed on both sides of the reflective region CFR, the color filter CF is misaligned or the cell process is bonded, that is, the TFT substrate and the CF. Even if there is misalignment during the bonding process with the substrate and there is an alignment error, it is possible to prevent changes in the transmittance and reflectance of the low-colored portion CFL, and a change in transmittance or reflectance due to the alignment error. It is possible to achieve a color filter without In other words, display defects such as white balance can be reduced by minimizing the area of the low-colored portion CFL due to the alignment error, that is, the amount of variation in color adjustment removal.

  For example, as shown in FIG. 6, when the color filters CF are arranged in the order of R, B, G or B, R, G coloring, attention is paid to the low colored portion CFL of the G color filter CF. In this case, the B color pattern is aligned with a predetermined error with respect to the R color pattern, and similarly, the G color pattern is aligned with a predetermined error with respect to the R color pattern and the B color pattern. When alignment is performed so that an overlap occurs, a color overlap portion is formed by overlapping a color filter CF that is colored later on the color filter CF that is colored first, at a boundary portion between adjacent color filters CF. Will be placed.

  Actually, there is an invalid area that does not contribute to display (reflection display) on a signal line or the like. Therefore, a color overlap portion is formed in this invalid area. Although this point omits illustration of the invalid area in other examples to be described later, the same applies.

  In this way, regarding the influence of the alignment error and the increase or decrease of the low colored portion described later, the low colored portion (specifically, the invalid region in detail) The increase / decrease of the effective low coloring portion excluding the portion is influenced. As a result, the formation order of R, G, and B does not affect the alignment error and the increase / decrease of the low coloring portion.

  Here, as shown in FIG. 6A, if one or more (two in the figure) low-colored portions CFL are arranged on one side edge of the reflective region CFR, misalignment of the cell bonding process occurs. In this case, since the area AL of the low color portion CFL changes only on one edge side, the aperture ratio S of the low color portion CFL cannot be maintained, and the transmittance and reflectivity are affected. A color shift occurs and, for example, white balance fluctuates.

  On the other hand, as shown in FIGS. 6B, 6C, and 6D, when a plurality of low coloring portions CFL are arranged on both sides of the reflection region CFR (one in each drawing), a color filter process is performed. In this case, even when an alignment shift as shown by the arrow direction in the figure occurs, the area decrease at one edge can be offset by the area increase at the other edge, or the overlapping portion can be contained in the ineffective region. Therefore, the variation amount of the area AL of the total low coloring portion CFL can be reduced or zero, and the variation of the white balance can be reduced.

  For example, in the figure with alignment misalignment shown on the right side of FIG. 6B, the color filter CF for G color is shown with respect to the state in which the color filters CF for R color and B color are arranged without error. The case where it arrange | positions by shifting on the left side (namely, the color filter CF side for R colors) is shown. In this case, in the color filter CF for G color, it is effective to offset the decrease in the area of the concave portion on the R color side (low colored portion CFL) by the increase in the area of the concave portion on the B color side (low colored portion CFL). It is possible to reduce the total area change of the low colored portion CFL.

  FIG. 6C shows a state in which all colors are arranged with an error. In particular, in the illustrated example, the color filters CF for R color and G color are close to each other, and the color for B color is used. A case is shown in which the filter CF is displaced from the G color filter CF side. In this case, in this case, in the color filter CF for G color, the decrease in the area of the recess on the R color side (low color portion CFL) is offset by the increase in the area of the recess on the B color side (low color portion CFL). The total area change of the effective low coloring portion CFL can be reduced.

  In FIG. 6D, both the R color filter and the B color filter CF are shifted to the G color filter CF side with respect to the state in which the G color filter CF is arranged without error. It shows the case where it is arranged. However, the deviation shall be small. In this case, in the G color filter CF, since the overlapping portion is hidden in the invalid region, the effective area of the low color portion CFL does not vary even if the alignment of R and B is shifted.

In addition, the misalignment can occur not only in the R, G, and B exposure alignment misalignment in the color filter process, but also in the cell process, that is, when the TFT substrate and the CF substrate are bonded. As an advantage of providing low color portions on both sides for these two types of alignment misalignment,
1) Even when the pixel provided with the low coloring portion is misaligned, the area changes of the right and left fixing color portions cancel each other. On the other hand, when the pixels other than the pixel provided with the low coloring portion are misaligned, they are hidden in the invalid area and thus do not affect. Usually, since the invalid area is designed in consideration of variations in the alignment accuracy of the color filter and the alignment accuracy of the cell process bonding, the design is made so that other colors do not appear from the invalid area.
2) In the cell process, when the alignment between the TFT substrate and the CF substrate is misaligned, it is equivalent to R, G, and B all deviating in the same direction with respect to the invalid region. In this case, as shown in FIG. 7, the change in the area of the low coloring portion cancels the decrease in one area with the increase in the other area, and the total change in area is reduced. Usually, since the invalid area is designed in consideration of variations in the alignment accuracy of the color filter and the alignment accuracy of the cell process bonding, the design is such that other colors do not appear from the invalid area.

  On the other hand, as shown in FIG. 6A, when one or a plurality of (two in the figure) low colored portions CFL are arranged on one side edge of the reflective region CFR, the alignment deviation of the color filter CF, Or when the alignment shift | offset | difference at the time of cell process bonding generate | occur | produces, the site | part which cancels the area change of a low coloring part does not exist, but the shift | offset | difference of alignment will affect the area of the effective low coloring part CFL.

  Here, if the low colored portions CFL are arranged in different numbers on each edge, the area changes in accordance with the number of shifts on the larger edge, so it is desirable to arrange the same number on each edge. . That is, in particular, if the same number of low colored portions CFL are arranged on each edge, the decrease in area on one edge can be offset by the increase in area on the other edge, so that fluctuations in area AL can be suppressed. The effect is the highest.

  In addition, even when the low color portions CFL are arranged in the same number on each edge, if the low color portions CFL are arranged in different sizes and shapes, the area change is shifted according to the difference between them. It is desirable that the contact portions have the same size and the same outer shape (collectively, the vicinity of the facing portion is the same shape) and the same number is arranged on the target.

  That is, if the low-colored portion CFL is arranged on the target so as to be in contact with the same number and the same size on each edge, and further enter the inside with the same outline shape, the area reduction on one edge is reduced on the other. Since the area rise at the edge can be almost completely offset, the amount of variation of the area AL can be made almost zero, and the effect becomes the highest.

<Filter Configuration; Second Embodiment>
FIG. 8 and FIG. 9 are diagrams for explaining a second embodiment of a method for providing a low color portion CFL in the reflection region CFR of the color filter CF. Here, (A) to (D) of FIG. 8 are diagrams for explaining the relationship between the arrangement form of the low coloring portion CFL of the present embodiment and the resulting color mixture. FIGS. 9A to 9C are views for explaining the relationship between the size of the low coloring portion CFL of the present embodiment and the resulting color mixture.

  In the second embodiment, attention is paid to the arrangement form of each low color portion CFL formed so as to be in contact with the edge of the boundary portion between adjacent pixel regions of different colors. It is characterized in that it is an arrangement mode that suppresses color mixing due to misalignment. In particular, when the low color portion CFL is disposed on one side of the reflection region CFR, or when the low color portion CFL is disposed on both sides of the reflection region CFR, the color filter CF may be arranged in a different number on each edge. This is a mechanism that can suppress color mixing due to misalignment.

  Specifically, for example, as shown in FIGS. 8A to 8D, the arrangement coordinates of the low color portion CFL which is a concave portion for color adjustment and the low color portion CFL of the adjacent pixel are set. By making the same, the low color portions CFL at the boundary portions in the color filters CF for the respective colors are disposed so as to face each other.

  Here, a case where the color filters CF are arranged in the order of G and R coloring is shown. However, as described above, in practice, there is an invalid area that does not contribute to display (reflection display) on a signal line, and a color overlap portion is formed in this invalid area. Not affected.

  In this case, as shown in FIG. 8A, the color of the low color portion CFL of one color filter CF (for R color in this example) is a concave shape, while the color of the other (for G color in this example) is used. The shape of the low colored portion CFL of the filter CF may be a concave shape. Alternatively, the shape of the low color portion CFL of the color filter CF of one (for R color in this example) is a concave shape while the shape of the low color portion CFL of the color filter CF of the other (for G color in this example) is Other than the concave shape, for example, as shown in FIGS. 8B and 8C, a slit shape may be used as in the conventional example.

  In this way, by adopting an arrangement mode in which the low color portions CFL at the boundary portions in the color filters CF for the respective colors are opposed to and in contact with each other, even when misalignment occurs in the cell bonding process, adjacent pixels Color mixing of (other colors) can be minimized, display defects due to misalignment such as white balance defects can be reduced, and chromaticity stability can be improved.

  This is because, as shown in FIG. 8D, in the case where the arrangement coordinates of the low color portion CFL which is a concave portion for color adjustment and the low color portion CFL of the adjacent pixel are different, the cell When misalignment occurs so that both the R color filter and the G color filter CF overlap in the pasting process, the G color filter CF enters the entire entering portion in the low color portion CFL for R color, and R In the color reflection region CFR, color mixing occurs between the R color and the G color, and the color tone changes in the R color reflection region CFR.

  On the other hand, if it is set as the arrangement | positioning aspect shown to FIG. 8 (A)-FIG. 8 (C), alignment shift will generate | occur | produce so that both R color filters and G color filters CF may overlap in a cell bonding process, R Even when the G color filter CF enters the low-colored portion CFL for color, the G-colored low-colored portion CFL is colored except for the G-colored low-colored portion CFL in the entering portion. Is not colored in the G color or is colored at a low density, the R color reflection region CFR reduces the degree of color mixing between the R color and the G color, and the R color reflection region CFR. It is possible to reduce fluctuations in color tone.

  For example, as shown in FIG. 8C, even when the G color size of the portion where the overlapping of the opposing portions may occur when the misalignment occurs is smaller than the R color size, the low coloring for the R color The area of the G color portion that enters the portion CFL can be made smaller than that in FIG. 8D, and the color mixing degree between the R color and the G color can be reduced in the reflection region CFR for the R color.

  In particular, as shown in FIG. 8A and FIG. 8B, the size of the concave shape for color adjustment (size DL of the extraction pattern) is set to the same size as the color adjustment space for adjacent pixels. If the relationship between the low-colored portions CFL of the portions where the overlapping of the opposing portions may occur when the misalignment occurs, for example, the inner portion is inserted in the outer shape, the entire other portion is colored in the other color. There is almost nothing, a greater effect can be obtained, and color mixing in the low coloring portion CFL can be almost completely prevented.

  Since the optimum values of brightness and color purity differ for each color, it is necessary to optimize the aperture ratio S (that is, the area of the low colored portion CFL) for each color, but the size DL of the extraction pattern is the same between adjacent colors. In addition, the area AL of the low-colored portion CFL of each color can be optimally adjusted by adjusting the insertion amount ZL from the periphery of the reflective region CFR for each color.

  However, in consideration of processing variations, when using different resist patterns in which the aperture ratio S of the low colored portion CFL is optimized for each color, the size of each low colored portion CFL in the portion where the overlapping portion of the opposing portion may occur (opposing It is considered difficult to make the (size) completely the same. A resist pattern having the maximum aperture ratio S is used for all colors, and in order to optimize the aperture ratio S of other colors, a submask that adjusts the amount ZL of insertion from the periphery of the reflective region CFR is used. However, the resist pattern increases accordingly.

  On the other hand, if the opposing size of the low-colored portion CFL of each color is set in consideration of the degree of influence of the color mixture on the color tone, different resist patterns in which the aperture ratio S of the low-colored portion CFL is optimized for each color. Even when it is used, it is possible to mitigate the effect of color shift due to color mixing in the low coloring portion CFL.

  Specifically, as shown in FIGS. 9A and 9B, when the color filter includes the R color and the G color, the overlap of the opposing portions when the misalignment occurs may occur. When the size of the colored portion CFH having a high transmittance and high visibility (G color in the figure) is designed larger than the size of the colored portion CFH having a low transmittance and low visibility (R color in the drawing) Good.

  In this case, regarding the low colored portion CFL of the low transmittance color filter CF, if the low colored portion CFL is uncolored, the high transmittance color of the entire intrusion portion corresponding to the overlapping amount regardless of the coloring order. The colored portion CFH of the filter CF does not enter. The color of the colored portion CFH is not colored, and color mixing by the color filter CF having high transmittance in the low colored portion CFL can be completely prevented. Further, when the low color portion CFL of the color filter CF having high transmittance is colored at a lower density than the color portion CFH, color mixing is caused by the color of the low color portion CFL of the color filter CF having high transmittance. However, since the low coloring portion CFL has a low density, the influence of the color mixture is small, and the color change of the color filter CF having a low transmittance can be minimized.

  On the other hand, regarding the low colored portion CFL of the high transmittance color filter CF, the low transmittance color filter CF of the low transmittance color filter CF, regardless of the order of coloring, regardless of the size difference from the low colored portion CFL of the low transmittance color filter CF. The colored portion CFH enters by an amount corresponding to the overlap amount, and causes color mixing by the color filter CF having a low transmittance in the low colored portion CFL. However, since the colored portion CFH has a low transmittance, there is little influence of color mixing, and the color change of the color filter CF having a high transmittance can be minimized.

  In particular, in general, the G color has high transmittance and high visual sensitivity, so the influence of color shift due to color mixing with other colors is high, and considering the difficulty of size identity, FIG. The effect of the arrangement mode shown in FIG. 9B is high. In other words, by designing the size of the concave shape for color adjustment to be larger for the G color than for the R color, the color of the G color due to the R color can be suppressed almost completely while suppressing the color change of the R color due to the G color. Change can be minimized. Similarly, by designing the G color larger than the B color, it is possible to minimize the color change of the G color due to the B color while almost completely suppressing the color change of the B color due to the G color.

  As for the relationship between the R color and the B color, since the R color has higher transmittance and higher visibility, the influence of the color mixture on the B color is higher. In addition, by designing the R color larger than the B color, it is possible to minimize the color change of the R color due to the B color while suppressing the color change of the B color due to the R color almost completely.

  Considering these, when the color filter includes R color, G color, and B color, as shown in FIG. 9C, the low color portion CFL of each color filter CF has a color filter CF ( The size of the low colored portion CFL of the G color for the R color and the B color and the R color for the B color is set to the color filter CF having a low transmittance (the R color and the B color for the G color). In addition, it is preferable to form an array larger than the size of the low color portion CFL of B color with respect to R color).

<Filter Configuration; Third Embodiment>
FIGS. 10 and 11 are diagrams illustrating a third embodiment of a method of providing a low color portion CFL in the reflection region CFR of the color filter CF. Here, FIG. 10 shows the relationship between the two colors, and FIG. 11 shows the relationship between the three colors.

  This third embodiment is characterized in that it is an arrangement mode in which chromaticity adjustment for white reproduction can be performed by positively arranging other colors in the low coloring portion CFL. Specifically, a color (hereinafter also referred to as a chromaticity adjustment color) different from the color of the color filter CF is disposed in a part or the whole of the low color portion CFL of the reflective region CFR. Hereinafter, the chromaticity adjustment color portion in the low coloring portion CFL of the reflection region CFR is referred to as a color adjustment window CAW (Color Adjustment Window). By doing so, the adjustable range of chromaticity is expanded, and the chromaticity can be adjusted to a range that cannot be adjusted by the arrangement mode of the low coloring portion CFL in the conventional method.

  For example, as shown in FIG. 10A, when the first pixel is R color, the second pixel is B, and the R and B color filters CF are adjacent to each other, the R color filter A B color filter CF adjacent to the R color is projected over a part of the low color portion CFL having a concave shape in the CF.

  Alternatively, as shown in FIG. 10B, when the R and B color filters CF are adjacent to each other, the entire low color portion CFL having a concave shape in the color filter CF for R color The B color filter CF adjacent to the R color is projected.

  In this way, even when no misalignment occurs, as described in FIG. 8D, the B color filter CF enters the low color portion CFL for R color, and the reflection for R color is performed. In the region CFR, color mixing can be caused between the R color and the B color, and the color tone can be positively changed in the R color reflection region CFR.

  In particular, by adjusting the color tone between the R color and the B color without adjusting the G color having high visibility, the chromaticity is adjusted gently (low adjustment sensitivity), that is, the area. It is possible to adjust the chromaticity with a small chromaticity variation with respect to changes. This is a mechanism for adjusting the degree of mixing of R and B color signals with low visibility while making no adjustment for G color signals with high visibility when performing white balance adjustment in signal processing. It becomes equivalent. More specifically, in the illustrated example, there is no adjustment for the R color signal, and the B color signal is equivalent to a mechanism for adjusting the degree of mixing of the G color signal and the B color signal with respect to the R color signal. The white color can be adjusted by adjusting the mixing degree of the B color while maintaining the color purity of the G color and the R color itself.

  In FIGS. 10A and 10B, the B color is included as a chromaticity adjustment color in a part or the whole of the low-colored portion CFL for R color. On the contrary, the R color may be inserted as a chromaticity adjustment color in a part or the whole of the low color portion CFL for B color. Further, the R color or the B color may be inserted as a chromaticity adjustment color in a part or the whole of the low color portion CFL for G color.

  Now consider the effect of each color adjustment. Conventionally, when a color filter with optimized transmission characteristics is used for the reflection portion, as described with reference to FIGS. 14A, 15A, and 15B, the reflected white shifts to yellow. Simply providing a low colored portion does not significantly improve the yellowness.

  On the other hand, yellowing can be effectively improved by adding B to the low colored portion of R. This is because the effect of shifting white to the blue side can be obtained by adding B to the low coloring portion. Since it is a feature that B is put in the low coloring portion, B may be put in G, although there is a detrimental effect on the reflectance.

  Therefore, when considering pixels of three colors of R, G, and B, in particular, in the relationship between the B color and the R color or the G color, if only yellowness improvement is achieved, the first pixel is the R pixel and Any of the G pixels may be used, and the second pixel may be the B pixel. More preferably, the first pixel is an R pixel and the second pixel is a B pixel if yellowness is to be improved while minimizing the reduction in reflectance.

  Alternatively, as shown in FIG. 11A, the first pixel is G color, the second pixel is R color, the third pixel is B color, and the R, G, and B color filters CF Are adjacent to each other in this order, each color of the R and B colors adjacent to the G color is partially or entirely in the low colored portion CFL of each edge exhibiting the concave shape in the G color filter CF. The filter CF is projected.

  By doing so, even when misalignment does not occur, the R or B color filter CF enters the low color portion CFL for G color, and the R and G colors are reflected in the G color reflection region CFR. Color mixture between the B color and the B color and the G color, respectively, and the color tone can be positively changed in the reflection region CFR for the G color.

  In particular, chromaticity adjustment can be performed more delicately and in a wide range by causing a change in color tone between the R color and the B color with respect to the G color. This is because the mixing degree can be adjusted for the two colors of R and B. This is because, when white balance adjustment is performed by signal processing, no adjustment is made for the G color signal with high visibility, and each of the R color signal and the B color signal with low visibility is set for each of the G color signals. This is equivalent to a mechanism for adjusting the degree of mixing. By adjusting the mixing degree of the R color and the B color while maintaining the color purity of the G color itself, the white color can be adjusted over a wider range than those shown in FIGS. Of course, the larger the area of each low color portion CFL, the wider the adjustment range of the degree of color mixture, that is, the chromaticity adjustment range.

  In FIGS. 10A (A) and 10 (B), the R color and the B color are included as chromaticity adjustment colors in part or all of the two low color portions CFL for G color. G color and B color may be inserted as chromaticity adjustment colors in a part or the whole of the two low color parts CFL for use, or a part or the whole in the two low color parts CFL for the B color , G color and R color may be inserted as chromaticity adjustment colors.

  Now consider the effect of each color adjustment. Conventionally, when a color filter with optimized transmission characteristics is used for the reflection portion, as described with reference to FIGS. 14A, 15A, and 15B, the reflected white shifts to yellow. Simply providing a low colored portion does not significantly improve the yellowness.

  In addition, it is effective for improving the white balance that the area where the low-colored portion is provided is G> R> B. This is originally effective for yellowing without a low-colored portion, and since the y value is large, it is effective by providing a large low-colored portion in the order of G, R, and B having more transmission components that increase the y value. This is to improve the yellowness.

  However, when the y value is reduced by optimizing the low colored portion, it is effective to eliminate the low colored portion of R and B (that is, white is shifted to the R and B sides). No further y value reduction effect can be obtained.

  On the other hand, yellowness can be effectively improved by adding R and B to the low colored portion of G. The effect of adding not only B but also R is that not only the adjustment of the y value but also the effect of the adjustment of the x value is possible, and the white balance can be improved with finer adjustment. is there. Only with B, the x value shifts in a smaller direction and the balance becomes poor.

  Therefore, in the overall relationship of the three color pixels of R, G, and B, the first pixel is the G pixel and the second pixel in terms of the overall white balance improvement effect including improvement in yellowness and reduction in reflectance. The pixel is preferably an R pixel and the third pixel is a B pixel.

  Further, in the third embodiment, the shape of the low color portion CFL used for color adjustment removal is at least part of the reflective region CFR in the pixel region as shown in the first or second embodiment. It does not need to be formed so as to be in contact with the peripheral edge and not in contact with the opposite peripheral edge.

  For example, as shown in FIG. 11B, when the color filters CF of R color, G color, and B color are adjacent in this order, the low color portion CFL having a slit shape in the color filter CF for G color. And the color filters CF of the R color and the B color adjacent to the G color may be projected over a part of the low color portion CFL. Although not shown, a low color portion CFL having a circular window may be provided in the G color filter CF, and R or B color may be inserted into a part of the low color portion CFL.

  In any of the embodiments shown in FIGS. 10 (A) to 11 (B), even when no misalignment occurs in the cell laminating process, white balance adjustment can be performed over a wide range by using a color mixture with other colors. Can be realized.

  In particular, in the third embodiment, since the other color that enters the low color portion CFL is the color of the adjacent pixel (adjacent color), a color filter capable of adjusting chromaticity can be realized by a process similar to the conventional one. That is, the color filter CF of the pixel (other color) adjacent to the low color portion CFL provided to form a hybrid (both reflection and transmission) type structure in which the transmission region CFT and the reflection region CFR coexist in each pixel. The low coloring portion CFL is used for white balance adjustment as a color adjustment removal.

  By doing so, it is not necessary to separately provide a window portion or a slit for white balance adjustment, and white chromaticity adjustment can be performed over a wide range without increasing the number of resists. It is only necessary to change the resist pattern shape, and the white chromaticity can be adjusted over a wide range without increasing the number of resists. A mechanism capable of color adjustment over a wide range can be realized while forming the color filter of the present embodiment without increasing the number of processes compared to the color filter in the conventional liquid crystal display device.

  In the description of the third embodiment, the chromaticity adjustment color that enters the low coloring portion CFL is the color of the adjacent pixel. However, it is not essential that the chromaticity adjustment color is the color of the adjacent pixel. 11 (C), other than the adjacent pixels, such as B color for the low colored portion CFL at the boundary portion between G and B, and R color for the low colored portion CFL at the boundary portion between G and B. The color may be inserted as a chromaticity adjusting color in a part or the whole of the low coloring portion CFL. Of course, a fourth color other than R, G, and B used in the arrangement of the color filters CF may be inserted.

  However, in this case, the smaller the size of the color adjustment window CAW into which colors other than the adjacent pixels are inserted, the more difficult the resist pattern formation process may be. On the other hand, if the color of the adjacent pixel is used, the color adjustment window CAW and the color filter CF for the adjacent pixel can be integrated to form a resist pattern, thereby reducing the difficulty of processing. In addition, in terms of color mixing when misalignment occurs in the cell bonding process, the degree of color mixing is not only between two adjacent colors but also between the chromaticity adjustment colors inserted into the color adjustment window CAW. Since it changes, there is a difficulty that the variation in color tone becomes more complicated.

<Chromaticity diagram>
FIG. 12 is a graph (chromaticity diagram) showing the chromaticity of the color filter CF shown in the third embodiment. Note that FIG. 12B is an enlarged view of white in FIG. 12A and 12B, the conventional reflective CF is a case where a color filter corresponding to each of the low-colored portion CFL and the transmissive region CFT is provided without providing a CF window. This is a case where a CF window is provided in the reflective region CFR while keeping the entire color filter CF in the same colored state, and the new CF is the case of the mode of FIG. 10C in the third embodiment.

  FIG. 13 is a diagram showing a reflection spectrum of the color filter CF shown in the third embodiment. Here, FIG. 13A is a mode of the conventional window CF as in FIG. 14B, and FIG. 13B is a mode of the third embodiment (denoted as new CF in the figure). It shows that the higher the relative reflectance spectral intensity (Relative reflectivity), the higher the color purity of each color itself.

  In the aspect of the conventional window CF, when the low color portion CFL is provided in the reflection region CFR of the transmissive color filter CF, the low color portion CFL is formed into a window shape or a slit shape, thereby approximately reflecting. A state close to the chromaticity of the color filter CF is obtained.

  However, if only the low color portion CFL is provided in the color filter pixel, as described with reference to FIG. 14 and FIG. 15, sufficient white balance performance cannot be obtained, leading to a problem that the display quality is deteriorated.

  On the other hand, each of the R, G, and B color filters CF is provided with a concave low color portion CFL of a predetermined size to form a composite structure, and each of the G color color filters CF has a concave shape. The white balance performance can be improved by projecting the R and B color filters CF over a part or the whole of the low colored portion CFL on the edge and arranging the R and B colors in an appropriate ratio. .

  For example, as shown in FIG. 13B, the white color is finely adjusted (white balance) by adjusting the arrangement ratio of other colors in the low coloring portion CFL while maintaining the color purity of the G color itself. As shown in FIGS. 12A and 12B, the color purity can be sufficiently maintained and the white balance can be adjusted well. Unlike the method of simply increasing the size of the low-colored portion of the window structure, the white balance performance can be improved without reducing the color purity. As an example, it is desirable that the arrangement ratios of the R color and the B color are about 10% to 25% with respect to the area of the color pixel extraction portion (low color portion CFL).

  Although not shown in the figure, similarities can be obtained by setting the first pixel to the R color and the second pixel to the B color as in the modes of FIGS. 10A and 10B in the third embodiment. Effects can be obtained.

It is a figure which shows the outline of the whole structure of one Embodiment of the liquid crystal display device to which the color filter structure concerning this invention is applied. It is a figure explaining the color filter structure which concerns on this invention. It is a figure explaining 1st Embodiment of the method of providing a low coloring part in the reflective area | region of a color filter. It is a figure which shows the conventional low coloring part as a comparative example. It is a figure explaining the method of area adjustment of a low coloring part. It is FIG. (1) explaining the relationship between alignment error and the transmittance | permeability and a reflectance. It is FIG. (2) explaining the relationship between an alignment error and the transmittance | permeability and a reflectance. It is a figure explaining the 2nd Embodiment of the method of providing the low coloring part in the reflective area | region of a color filter, and the relationship between the arrangement | positioning form of a low coloring part and color mixing. It is a figure explaining 2nd Embodiment of the method of providing a low coloring part in the reflective area | region of a color filter, and explaining the relationship between the size of a low coloring part and color mixing. It is the figure which showed the relationship of 2 colors explaining 3rd Embodiment of the method of providing a low coloring part in the reflective area | region of a color filter. It is the figure which showed the relationship of 3 colors explaining 3rd Embodiment of the method of providing a low coloring part in the reflective area | region of a color filter. It is a graph (chromaticity diagram) showing the chromaticity of the color filter shown in 3rd Embodiment. It is the figure which showed the color filter reflection spectrum shown in 3rd Embodiment. It is a figure explaining the problem of the conventional white balance performance, Comprising: It is the figure which showed the color filter reflection spectrum. It is a figure explaining the problem of the conventional white balance performance, Comprising: It is the graph (chromaticity diagram) showing the chromaticity of the color filter.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 1 ... Liquid crystal display device, 2 ... Substrate, 2a ... TFT substrate, 2b ... CF substrate, 3 ... Pixel array part, 5 ... Vertical drive part, 6 ... Horizontal drive part, 7 ... Level shifter part, 8 ... Terminal part, 30 ... Pixel cell, 30R ... reflecting portion, 30T ... transmitting portion, CFH ... colored portion, CFL ... low colored portion, CFR ... reflecting region, CFT ... transmitting region, CAW ... color adjustment window

Claims (20)

A pair of substrates disposed opposite to each other with a layer having a composition related to a display function interposed therebetween, pixels are formed on one substrate, and each pixel includes a reflective portion that reflects external light A semiconductor device in which a transmissive portion that transmits light is formed and a color filter colored in a different color corresponding to each pixel is formed on the other substrate,
The color filter of at least one color has a low colored portion whose coloring density is lower than that of the other portion inside the pixel region corresponding to the pixel and corresponding to the reflective portion, and at least a part of the color filter is the reflective region. The semiconductor device is formed so as to be in contact with the periphery of the substrate and to be non-contact with the periphery on the opposite side of the reflection region. The semiconductor device according to claim 1, wherein the low coloring portion has a concave shape. The semiconductor device according to claim 1, wherein the plurality of low-colored portions are formed so as to be in contact with peripheral edges on the opposite side of the reflective region. 4. The semiconductor device according to claim 3, wherein the even number of the low-colored portions are formed so as to have the same number at each peripheral edge. 5. The semiconductor device according to claim 4, wherein the even number of the low-colored portions are formed in the same shape at each peripheral edge. The semiconductor device according to claim 3, wherein the plurality of low-colored portions are formed so that arrangement coordinates on each periphery are the same. The semiconductor device according to claim 3, wherein the plurality of low-colored portions are formed so that arrangement coordinates on each peripheral edge are different. The adjacent low-color portions formed so as to be in contact with the edge of the boundary portion between adjacent pixel regions of different colors are formed so as to face each other at the boundary portion. A semiconductor device according to 1. 9. The semiconductor device according to claim 8, wherein each of the low-colored portions of the boundary portion is formed in substantially the same shape in the vicinity of the opposing portion. In the colored portion excluding each low colored portion of the boundary portion in the reflective region, the adjacent reflective regions of different colors are overlapping,
In addition, the facing portion of the low-colored portion of the colored portion having a high transmittance is formed in a larger shape than the facing portion of the low-colored portion of the colored portion having a low transmittance. The semiconductor device according to claim 8. 11. The adjacent reflective regions of different colors are overlapped such that the portion of the reflective region excluding the low-colored portion has a higher transmittance is on the lower side. Semiconductor device. The color filter includes one of green and one of red and blue, and the boundary portion between the adjacent different colors is overlapped so that green is on the lower side. The semiconductor device according to claim 10. The color filter includes three types of green, red, and blue, and the boundary portion between the adjacent different colors is overlapped so as to be on the upper side in this order. Item 11. The semiconductor device according to Item 10. The semiconductor device according to claim 10, wherein the color filter includes two types of red and blue, and overlaps so that red is on a lower side. A pair of substrates disposed opposite to each other with a layer having a composition related to a display function interposed therebetween, pixels are formed on one substrate, and each pixel includes a reflective portion that reflects external light A semiconductor device in which a transmissive portion that transmits light is formed and a color filter colored in a different color corresponding to each pixel is formed on the other substrate,
In the color filter of at least one color, a low color portion having a lower color density than other portions is formed inside the pixel region corresponding to the pixel and in the reflective region corresponding to the reflective portion,
A part or the whole of the low coloring part is colored with a color different from the color of the part other than the low coloring part of the reflective region in the color filter. The low-colored portion is formed so that at least a part thereof is in contact with the periphery of the reflection region and is not in contact with the periphery on the opposite side of the reflection region. Semiconductor device. The semiconductor device according to claim 15, wherein a part or the whole of the low coloring portion is colored with a color of another color filter adjacent to the color filter. The color filter includes two types of blue and red arranged adjacent to each other,
The red color filter has the low-colored portion formed,
The semiconductor device according to claim 17, wherein a part or the whole of the low coloring portion is colored in blue. The at least one color filter is formed with a plurality of the low-colored portions,
A part or the whole of each of the low color portions is colored with another adjacent color different from the color of the reflection region in the color filter excluding the low color portion. Item 18. The semiconductor device according to Item 17. The color filter is arranged so that three types of red, green, and blue are adjacent in this order,
The green color filter has a plurality of low-colored portions formed,
A part or the whole of one of the low color portions is colored in one of the red and blue, and a part or the whole of the other low color portion is colored in the other of the red and blue. The semiconductor device according to claim 19.

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