JP2006245165A5 - - Google Patents

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Publication number
JP2006245165A5
JP2006245165A5 JP2005056964A JP2005056964A JP2006245165A5 JP 2006245165 A5 JP2006245165 A5 JP 2006245165A5 JP 2005056964 A JP2005056964 A JP 2005056964A JP 2005056964 A JP2005056964 A JP 2005056964A JP 2006245165 A5 JP2006245165 A5 JP 2006245165A5
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JP
Japan
Prior art keywords
layer
iii
semiconductor light
compound semiconductor
active layer
Prior art date
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Pending
Application number
JP2005056964A
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Japanese (ja)
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JP2006245165A (en
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Publication date
Application filed filed Critical
Priority to JP2005056964A priority Critical patent/JP2006245165A/en
Priority claimed from JP2005056964A external-priority patent/JP2006245165A/en
Publication of JP2006245165A publication Critical patent/JP2006245165A/en
Publication of JP2006245165A5 publication Critical patent/JP2006245165A5/ja
Pending legal-status Critical Current

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Claims (5)

活性層と、
前記活性層の両側にそれぞれ配置された、Al a In b Ga 1-a-b N(0<a≦0.2,0<b≦0.2)からなるIII−V族化合物半導体層と
を備えたことを特徴とする半導体発光素子。
An active layer,
A III-V group compound semiconductor layer made of Al a In b Ga 1-ab N (0 <a ≦ 0.2, 0 <b ≦ 0.2) , disposed on both sides of the active layer, A semiconductor light emitting element characterized by the above.
前記活性層は、量子井戸層と障壁層とを交互に積層してなる多重量子井戸構造を有し、
前記量子井戸層は、5%以上30%以下のIn組成を有すると共に、0.5nm以上6nm以下の厚さを有し、
前記III−V族化合物半導体層は、前記量子井戸層より低いIn組成を有すると共に、2nm以上500nm以下の厚さを有する
ことを特徴とする請求項1に記載の半導体発光素子。
The active layer may have a multiple quantum well structure formed by alternately stacking quantum well layers and barrier layers,
The quantum well layer has an In composition of 5% to 30% and a thickness of 0.5 nm to 6 nm.
The semiconductor light emitting element according to claim 1, wherein the III-V compound semiconductor layer has an In composition lower than that of the quantum well layer and has a thickness of 2 nm to 500 nm.
前記活性層の一方の側に設けられたIII−V族化合物半導体層と、前記活性層の他方の側に設けられたIII−V族化合物半導体層は、互いに異なる組成により構成されている
ことを特徴とする請求項1に記載の半導体発光素子。
And one group III-V compound semiconductor layer provided on the side of the active layer, and the active layer other group III-V provided on the side compound semiconductor layer is that it is composed of different compositions The semiconductor light-emitting device according to claim 1.
前記III−V族化合物半導体層は、厚さ方向にAl組成およびIn組成を変化させた傾斜構造を有する
ことを特徴とする請求項1に記載の半導体発光素子。
The semiconductor light emitting element according to claim 1, wherein the III-V compound semiconductor layer has an inclined structure in which an Al composition and an In composition are changed in a thickness direction.
前記III−V族化合物半導体層は、Alw Inx Ga1-w-x N(0<w<1,0<x<1)からなる層と、Aly Inz Ga1-y-z N(0<y<w,x<z<1)からなる層とを交互に積層してなる多重構造を有する
ことを特徴とする請求項1に記載の半導体発光素子。
The III-V group compound semiconductor layer includes Al w In x Ga 1 -wx N (0 <w <1, 0 <x <1), Al y In z Ga 1-yz N (0 <y The semiconductor light-emitting device according to claim 1, wherein the semiconductor light-emitting device has a multiple structure in which layers made of <w, x <z <1) are alternately stacked.
JP2005056964A 2005-03-02 2005-03-02 Semiconductor light-emitting element Pending JP2006245165A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005056964A JP2006245165A (en) 2005-03-02 2005-03-02 Semiconductor light-emitting element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005056964A JP2006245165A (en) 2005-03-02 2005-03-02 Semiconductor light-emitting element

Publications (2)

Publication Number Publication Date
JP2006245165A JP2006245165A (en) 2006-09-14
JP2006245165A5 true JP2006245165A5 (en) 2007-09-20

Family

ID=37051291

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005056964A Pending JP2006245165A (en) 2005-03-02 2005-03-02 Semiconductor light-emitting element

Country Status (1)

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JP (1) JP2006245165A (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101344181B1 (en) 2008-01-30 2013-12-20 엘지전자 주식회사 Nitride semiconductor device and method for manufacturing the same
JP4892618B2 (en) 2010-02-16 2012-03-07 株式会社東芝 Semiconductor light emitting device
JP5325171B2 (en) 2010-07-08 2013-10-23 株式会社東芝 Semiconductor light emitting device
JP5337862B2 (en) * 2011-12-19 2013-11-06 株式会社東芝 Semiconductor light emitting device
JP5554387B2 (en) * 2012-10-25 2014-07-23 株式会社東芝 Semiconductor light emitting device
JP6192378B2 (en) 2013-06-18 2017-09-06 学校法人 名城大学 Nitride semiconductor light emitting device
JP5764184B2 (en) * 2013-11-18 2015-08-12 株式会社東芝 Semiconductor light emitting device
JP7492328B2 (en) 2019-11-18 2024-05-29 シャープ福山レーザー株式会社 Image display element and method for manufacturing the image display element

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004087762A (en) * 2002-08-27 2004-03-18 Sony Corp Nitride-based semiconductor light emitting device

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