JP2006222174A - Substrate processing apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To improve a throughput by shortening the conveyance time duration of a cassette in a substrate processing apparatus. <P>SOLUTION: The substrate processing apparatus includes a heat treatment furnace 6; a substrate holder 8; a substrate conveyance vessel containing means 3; a material conveying/delivering unit 2; one set of conveying means 4 for performing the conveyance of a substrate vessel; a substrate transfer means 9; a control means 13 for controlling the conveying means and the substrate transfer means; a designating means for specifying the conveying operation mode which forbids the above conveying means from performing the conveyance of the above substrate conveyance vessel between a buffer container and the above material conveying/delivering unit; and a selecting means for selecting a conveyance operation mode specified by this designation means and a conveyance operation mode which can convey the substrate conveyance vessel between the above buffer container and the above material conveying/delivering unit, even during the periods of the need that the above conveying means performs the conveyance of the substrate conveyance vessel between an object to be transferred and the above buffer container or the above material conveying/delivering unit by the conveying means. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

  The present invention relates to a substrate processing apparatus for performing processes such as thin film generation, impurity diffusion, annealing, and etching on a substrate such as a silicon wafer and a glass substrate.

  The substrate processing apparatus includes a single-wafer type substrate processing apparatus that processes substrates one by one, or a batch type substrate processing apparatus that processes a predetermined number of sheets at a time. The batch type substrate processing apparatus includes a vertical substrate processing apparatus having a vertical processing furnace and a horizontal substrate processing apparatus having a horizontal processing furnace.

  The substrate is carried into and out of the substrate processing apparatus by storing the substrate in a substrate transport container (hereinafter referred to as a cassette) such as a cassette and transporting the cassette by a person or an automatic transport machine.

  First, a substrate processing apparatus that includes a vertical furnace, which is one of the substrate processing apparatuses, and manufactures a semiconductor device from a silicon wafer or the like will be outlined with reference to FIG.

  The substrate processing apparatus 1 is installed so as to constitute a semiconductor manufacturing line, and the substrate is transferred to the substrate processing apparatus 1 by storing the substrate in a substrate transfer container such as a cassette.

  In FIG. 3, 2 is a material loading / unloading section (cassette transfer stage) provided on the front surface of the substrate processing apparatus 1, and 3 is a substrate transfer container storage means (cassette) for temporarily storing the material loaded in the cassette. (Shelf) 4 is a set of cassette carrying means provided between the cassette delivery stage 2 and the cassette shelf 3, and the cassette carrying means 4 is located between the cassette delivery stage 2 and the cassette shelf 3. To transport the cassette 5.

  A vertical heat treatment furnace 6 having a heater unit and a reaction chamber (both not shown) provided inside the heater unit is provided above the rear portion of the substrate processing apparatus 1. Below the vertical heat treatment furnace 6, there is provided a boat elevator 7 which is an elevating means. The boat elevator 7 raises and lowers a boat 8 which is a substrate holder, and the boat 8 is loaded into and extracted from the reaction chamber. .

  A substrate transfer device 9 is provided between the boat elevator 7 and the cassette shelf 3, and the substrate transfer device 9 is connected to the cassette 5 stored in the cassette shelf 3 and the boat elevator 7 in the lowered state. A substrate such as a wafer (hereinafter referred to as a wafer) is transferred between them.

  The cassette 5 is inserted into the cassette transfer stage 2 by a person or an external transfer device, and the cassette transfer means 4 transfers the cassette 5 of the cassette transfer stage 2 to the cassette shelf 3. The cassette shelf 3 simply has a buffer storage section for temporarily storing the cassette 5 and a transfer target section for storing the cassette 5 used for transferring wafers.

  The substrate transfer device 9 is capable of transferring wafers to the cassette 5 of the transfer target portion of the cassette shelf 3, and the cassette transfer means 4 includes a buffer storage portion and a transfer target portion. The cassette 5 is also transported between them. That is, the cassette 5 used for wafer transfer is moved from the buffer storage unit to the transfer target unit, and is transferred from the transfer target unit to the buffer storage unit. For example, when processing 100 wafers in a batch on a boat, it is necessary to transport a cassette containing 25 wafers from the buffer storage unit to the transfer target unit four times.

  The substrate transfer machine 9 transfers unprocessed wafers from the cassette 5 of the cassette shelf 3 to the boat 8, and the unprocessed wafers are held in the boat 8, and the reaction chamber ( (Not shown). When the boat 8 is loaded, the reaction chamber is in an airtight state, the wafer is heated by the heater unit (not shown), the reaction gas is introduced and exhausted, and a predetermined processing pressure and processing temperature are set. The wafer is processed by executing the steps set in the recipe.

  When the processing of the wafer is completed, the boat 8 is pulled out by the boat elevator 7, and the processed wafer is transferred from the boat 8 to the empty cassette 5 stored in the cassette shelf 3 by the substrate transfer device 9. A cassette (hereinafter referred to as a processed cassette) 5 that is loaded and stores processed wafers is discharged to the cassette transfer stage 2 by the cassette transfer means 4, and the processed cassette is transferred from the cassette transfer stage 2 by a person or an external transfer device. 5 is carried out. A cassette 5 for storing unprocessed wafers (hereinafter referred to as “unprocessed cassette”) is transferred from the buffer storage unit to the transfer target unit by the cassette transfer means 4. Further, the unprocessed cassette 5 carried into the cassette transfer stage 2 by the external transfer device is transferred from the cassette transfer stage 2 to the buffer storage section of the cassette shelf 3.

  There is an upper limit on the number of wafers (amount of material) that can be processed at one time in the substrate processing apparatus 1, and the required number of wafers to be processed is processed between one wafer and the upper limit. The upper limit is the number of wafers that can be held by the boat 8, for example, several cassettes.

  When the number of wafers for one batch corresponds to several cassettes, the cassette transport means 4 is a next batch processing preparation step, and the transport operation of the processed cassette 5 to the cassette transfer stage 2 is performed from the cassette transfer stage 2. The transfer operation of the unprocessed cassette 5 to the buffer storage unit and the transfer operation of moving the unprocessed cassette 5 from the buffer storage unit to the transfer target unit are sequentially performed in series.

  When the semiconductor production line is not automated with respect to the loading time of the cassette 5 (the loading time of the cassette 5 to the cassette transfer stage 2), the worker is in an empty state in the substrate processing apparatus 1, for example, the cassette shelf 3 is monitored to see if there is a vacant material and whether or not the material to be processed is generated (wafer is not being processed in the vertical heat treatment furnace 6 and the wafer is waiting to be loaded). Then, preparation for the next process is started.

  Conventionally, the movement of the unprocessed cassette 5 from the buffer storage unit to the transfer target unit by the cassette transport means 4 and the delivery of the processed cassette 5 from the transfer target unit to the cassette transfer stage 2 are performed in parallel. In other words, the processing is performed alternately, and after the processing of all the processed cassettes 5 and the transfer of all the predetermined number of unprocessed cassettes 5 to the transfer target portion is completed, the next processing is performed. Yes.

  For this reason, the cassette carrying work requires a lot of time, which has been a factor that hinders improvement in throughput.

  In view of such circumstances, the present invention intends to improve the throughput by shortening the transport time of the cassette in the substrate processing apparatus by transporting the cassette for batch processing with priority.

  The present invention carries in and out of a heat treatment furnace, a substrate holder for holding the substrate in the heat treatment furnace, a substrate transport container storage means provided in the apparatus, and the substrate transport container to and from the outside of the apparatus. A material loading / unloading unit, a substrate conveying container between the material loading / unloading unit and the substrate transfer container storage means, and a substrate between the buffer storage unit and the transfer target part in the substrate transfer container storage means A set of transport means for transporting the transport container, a substrate transfer means for transferring a substrate between the substrate transport container and the substrate holder of the transfer target section, the transport means, and the substrate In order to transfer a substrate to be processed next from the substrate transfer container of the transfer target unit to the substrate holder, the transfer unit controls the transfer unit and the transfer target unit and the transfer target unit. Transfer of substrate transfer container to / from buffer storage unit or material loading / unloading unit A designation unit that designates a conveyance operation mode that prohibits the conveyance unit from conveying the substrate conveyance container between the buffer storage unit and the material loading / unloading unit, and the designation unit; In order to transfer the substrate to be processed next from the substrate transfer container of the transfer target portion to the substrate holder, the transfer means transfers the transfer target portion and the buffer. Even during a period in which the substrate transfer container needs to be transferred between the storage unit or the material loading / unloading unit, the transfer unit transfers the substrate transfer container between the buffer storage unit and the material loading / unloading unit. The present invention relates to a substrate processing apparatus including a selection unit that selects a transfer operation mode that can be performed.

  The present invention also provides a heat treatment furnace, a substrate holder for holding the substrate in the heat treatment furnace, a substrate transport container storage means provided in the apparatus, and a substrate transport container carried in and out of the apparatus. A material loading / unloading unit for carrying out the substrate conveyance between the material loading / unloading unit and the substrate transfer container storage means, and between the buffer storage unit and the transfer target part in the substrate transfer container storage means; A set of transfer means for transferring the substrate transfer container; a substrate transfer means for transferring a substrate between the substrate transfer container and the substrate holder of the transfer target portion; the transfer means; Control means for controlling the substrate transfer means; and for transferring the substrate to be processed next from the substrate transfer container of the transfer target section to the substrate holder, the transfer means and the transfer target section Transporting the substrate transport container between the buffer storage unit and the material loading / unloading unit A designation means for designating a transport operation mode for prohibiting the transport means from transporting the substrate transport container between the buffer storage section and the material carry-in / out section; In order to transfer the substrate to be processed next from the substrate transfer container of the transfer target portion to the substrate holder, the transfer means and the transfer target portion and the transfer target portion specified by the means Even during a period in which the substrate transfer container needs to be transferred between the buffer storage unit or the material carry-in / out unit, the transfer unit transfers the substrate transfer container between the buffer storage unit and the material carry-in / out unit. In a substrate processing apparatus comprising a selection means for selecting a transfer operation mode that enables performing a transfer operation, a step of loading a substrate transfer container that is input from the outside and stores an unprocessed substrate into the buffer storage unit; ,processing A step of transferring a substrate to a substrate transfer container of the transfer target unit, a step of transferring a processed substrate transfer container storing a processed substrate from the transfer target unit to the buffer storage unit, and the transfer target A step of transferring the unprocessed substrates from the unprocessed substrate transfer container of the unit to the substrate holder, and processing from the buffer storage unit after transferring all the unprocessed substrates for the next batch to the substrate holder. A substrate processing method capable of selecting either a step of paying out a processed substrate transfer container or a step of discharging a processed substrate transfer container from the buffer storage unit while transferring an unprocessed substrate to the substrate holder. It is related.

  According to the present invention, a heat treatment furnace, a substrate holder for holding a substrate in the heat treatment furnace, a substrate transfer container storage means provided in the apparatus, and the substrate transfer container are carried in and out of the apparatus. A material carrying-in / out part for carrying out the process, between the material carrying-in / out part and the substrate transfer container storage means, between the buffer transfer part and the transfer target part in the substrate transfer container storage means A pair of transfer means for transferring the substrate transfer container, a substrate transfer means for transferring a substrate between the substrate transfer container and the substrate holder of the transfer target portion, the transfer means, Control means for controlling the substrate transfer means, and the transfer means to transfer the substrate to be processed next from the substrate transfer container of the transfer target portion to the substrate holder. And a substrate transfer container between the buffer storage unit and the material carry-in / out unit A designation unit that designates a conveyance operation mode that prohibits the conveyance unit from conveying the substrate conveyance container between the buffer storage unit and the material loading / unloading unit during a period during which conveyance is required; In order to transfer the substrate to be processed next from the substrate transfer container of the transfer target unit to the substrate holder, the transfer unit is connected to the transfer target unit. Even during a period in which the substrate transport container needs to be transported between the buffer storage unit or the material carry-in / out unit, the transport means can move the substrate transport container between the buffer storage unit and the material carry-in / out unit. Since there is a selection means for selecting a transfer operation mode that enables transfer, the transfer operation mode of the substrate transfer container can be brought into an optimum state according to the substrate processing, and throughput is improved. Can Kill.

  The best mode for carrying out the present invention will be described below with reference to the drawings.

  FIG. 1 shows an outline of a substrate processing apparatus according to the present invention, and the basic configuration of the substrate processing apparatus is the same as that shown in FIG. 3, and in FIG. 1 and FIG. The same symbols are attached to the same components and the description thereof is omitted.

  In FIG. 1, 11 is a heater for the vertical heat treatment furnace 6, a flow rate controller for controlling the supply of reaction gas, or a processing operation unit for controlling a pressure control valve, etc. 12 is a processing temperature, gas flow rate, pressure, etc. A cassette detector 23 for detecting the presence or absence of the cassette 5 is provided in the cassette transfer stage 2. Reference numeral 13 denotes a control device as a control means of the substrate processing apparatus 1. The control device 13 mainly includes a control unit 14, an external storage unit 15 such as a hard disk, a mechanical control unit 16, an input / output control unit 17, a display, It comprises a data display section 18 such as a display section provided on an operation panel, an input means 19 such as a keyboard, a material input management section 21, and a main input / output section 22 for a main control device (not shown).

  The external storage means 15 includes a cassette conveying means drive sequence program for driving the cassette conveying means 4, the boat elevator 7, the substrate transfer machine 9, etc., a substrate transfer machine drive sequence program, etc., and data in the processing setting table. Drive sequence program to be executed, process sequence program for processing the substrate in the vertical heat treatment furnace 6, various processing conditions for processing the substrate, process recipe in which steps for executing the processing are set, processing setting table Etc. are stored. The processing setting table holds a preprocessing time, a material waiting table, and a start instruction waiting flag, and the preprocessing time is a total of (material preparation time, substrate transfer time, cassette transfer time, precleaning time, etc.). The previously calculated data is input from the input unit 19 or the past data when the substrate processing apparatus 1 is operated is integrated and recorded by the control unit 14 and stored in the external storage unit 15. . A material waiting table (material waiting flag: wait / do not wait, material amount: material amount [the number of substrates] does not start until the specified number of substrates is reached) is held, and a start instruction waiting flag (person or main controller ( (Not shown) is held until a start instruction is received from (not shown).

  The data display unit 18 includes a loading timing of a substrate to be processed (hereinafter referred to as an unprocessed substrate), an appropriate timing of the loading timing, a pre-preparation time, a scheduled processing end time, an unprocessed substrate loading request, a material loading status, Whether batch processing or continuous processing is being performed, or the contents of the drive sequence program being executed, etc. are displayed.

  The input means 19 selects a drive sequence program to be executed, sets a processing setting table for the driving sequence program, sets processing conditions (recipe) for substrate processing, sets items for the processing setting table, and sets the processing setting table. The item is written through the control unit 14. Further, different operation conditions may be set for the setting items in the processing setting table so that they can be selected. The setting items of the processing setting table include, for example, whether or not a payout waiting step described later is specified.

  Here, the process setting table, the input means 19 for writing setting items to the process setting table, the control unit 14, etc. constitute a transport mode specifying means, and further select setting items in the process setting table. Is performed by the input unit 19 and the control unit 14, and the input unit 19, the control unit 14 and the like constitute a conveyance mode selection unit.

  The material input management unit 21 monitors the storage state of the cassette 5 in the cassette shelf 3 and the input state of unprocessed substrates, transports the cassette 5 from the cassette transfer stage 2 to the cassette shelf 3, The control unit 14 is notified of the transfer between the buffer storage unit and the transfer target unit in the cassette shelf 3, whether the transfer from the cassette shelf 3 to the cassette transfer stage 2 is possible, the notification that processing can be started, and the like.

  The control unit 14 starts a required program from the external storage means 15 according to a command from the input means 19 and a command from a main control device (not shown), executes the program under set conditions, The required data such as a process recipe is read from the external storage means 15. Further, the control unit 14 executes a process recipe in the substrate processing apparatus 1 and monitors the execution state of the process recipe in a state where the substrate is being processed, and calculates the remaining time of the process. When the time becomes equal to the preparation time (appropriate charging timing and timing of the unprocessed substrate), the determination result is sent to the material charging management unit 21 at this time.

  Further, the control unit 14 controls the processing operation unit 11 via the input / output control unit 17 based on a signal from the sensor unit 12 to make a recipe such as processing temperature, supply gas flow rate, processing pressure, processing time, etc. The substrate is processed with the set contents.

  The material input management unit 21 issues a substrate input request on the data display unit 18 based on the determination sent from the control unit 14 and displays the substrate input request via the main input / output unit 22. (Not shown).

  In the present invention, the substrate processing itself in the vertical heat treatment furnace 6 is the same as the conventional one, and the description thereof is omitted.

  Hereinafter, the cassette transport operation according to the embodiment of the present invention will be described with reference to FIG.

  A plurality of transport operation modes are set for the drive sequence of the cassette transport unit 4, and the selection of the transport operation mode is selected by the input unit 19. For example, in this embodiment, the transport operation mode A and the transport operation mode B are set. For example, by specifying whether or not the payout waiting step is specified in the setting item of the processing setting table, the transport operation mode A and the transport operation are specified. Any of the aspects B is selected. The control device 13 executes the selected transport operation mode. Here, the designation of having a payout waiting step is a transfer operation mode in which transfer of unprocessed substrates of the next batch to the boat 8 is prioritized over payout processing of processed substrates, etc., and there is no payout waiting step Is the same transport operation mode as before.

  First, a case where, for example, the transport operation mode A is selected by specifying that there is a payout waiting step will be described.

  When the substrate processing in the vertical heat treatment furnace 6 is completed, the processed substrate is carried out from the vertical heat treatment furnace 6 and transferred to the cassette shelf 3 (STEP: 01). That is, the boat 8 is lowered, and the processed substrate is transferred from the boat 8 to the empty cassette 5 accommodated in the transfer target portion by the substrate transfer device 9. The processed cassette 5 is transported to the buffer storage section by the cassette transport means 4.

  It is confirmed whether or not unprocessed cassettes for the next batch are stored in the cassette shelf 3, and if unprocessed cassettes for the next batch are not stored in the cassette shelf 3, The processing cassette is carried into the cassette shelf 3 (STEP: 02, STEP: 03). The unprocessed cassette is usually stored in the cassette shelf 3 while the substrate for the previous batch is heat-treated.

  When unprocessed cassettes for the next batch are stored in the cassette shelf 3, the start of the next batch process is instructed (STEP: 04), and it is determined whether or not a payout waiting step is specified (STEP 04). : 05).

  If it is determined that a payout waiting step is specified, a payout specifying step is executed (STEP: 06), and the unprocessed cassette 5 is moved from the buffer storage portion of the cassette shelf 3 to the transfer target portion by the cassette carrying means 4. Is done. Next, the substrate is transferred from the unprocessed cassette 5 of the transfer target portion to the boat 8. During the substrate transfer or during a period when the cassette transfer means 4 needs to transfer the unprocessed cassette 5 between the transfer target unit and the buffer storage unit, the buffer storage unit and the buffer storage unit 4 Transport of the processed cassette 5 between the cassette transfer stages 2 is prohibited.

  The control unit 14 monitors the driving state of the cassette conveying means 4 and has transferred all unprocessed substrates to be processed next to the boat 8 or the last unprocessed cassette to complete the transfer. When it is confirmed that 5 has moved from the buffer storage portion of the cassette shelf 3 to the transfer target portion, the processed cassette 5 is paid out to the cassette delivery stage 2 or transferred from the cassette delivery stage 2 to the cassette shelf 3. (STEP: 07). In the present embodiment, the processed cassette 5 is delivered to the cassette transfer stage 2 when the boat step is the next step after the step of transferring the unprocessed substrate to the boat 8. However, it suffices if all the substrates in the unprocessed cassette 5 are transferred to the boat 8 regardless of this timing.

  When it is determined that a payout waiting step has been specified and the payout specifying step is being executed, transport of the cassette 5 required for recipe execution is prioritized, and the cassette transfer stage 2 of the unprocessed cassette 5 is transferred to the cassette shelf 3. The transfer of the processed cassette 5 from the cassette shelf 3 to the cassette transfer stage 2 is made possible after the cassette 5 required for executing the recipe is transferred.

  Thus, in the transport operation of the cassette transport means 4, priority is given to transport of the cassette 5 necessary for execution of the substrate processing recipe, that is, transport of the cassette 5 related to substrate transfer by the substrate transfer machine 9. Done. Therefore, priority is given to the transfer of the unprocessed substrate to be processed next, and an improvement in throughput is expected.

  Next, a case where the transport operation mode B is selected by specifying no payout waiting step will be described.

  When the processing of the previous batch is completed, the boat 8 is lowered, and the processed substrate is transferred to the empty cassette 5 stored in the transfer target portion by the substrate transfer device 9. The processed cassette 5 is transported to the buffer storage unit by the cassette transport means 4.

  If it is determined in STEP: 05 that no payout waiting step is specified, the recipe steps are sequentially executed and the progress of the steps is monitored. When the step of transferring the unprocessed substrate to the boat 8 is executed, the cassette transfer means 4 transfers the unprocessed cassette 5 from the buffer storage unit to the transfer target unit, and the inside of the unprocessed cassette 5 Are transferred to the boat 8. During the transfer to the boat 8, the processed cassette 5 is discharged from the buffer storage portion to the cassette transfer stage 2 as necessary.

  As described above, the transfer mode designating unit and the transfer mode selection unit can select an optimal transfer operation mode for improving the throughput in accordance with the substrate processing conditions.

  In the above description, the case where the substrate is transferred to the boat 8 has been described. However, the present invention can also be applied when the substrate is discharged from the boat 8.

  Of course, the present invention can be implemented in general substrate processing such as CVD, oxidation, diffusion, and annealing. Further, in the present embodiment, the apparatus has the buffer storage unit and the transfer target unit on the cassette shelf, but the buffer storage unit and the transfer target unit do not have to be in one cassette shelf, and are individually installed. You may have in.

It is a block diagram which shows embodiment of this invention. It is a flowchart which shows embodiment of this invention. It is a schematic perspective view of a semiconductor manufacturing apparatus.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Substrate processing apparatus 2 Cassette transfer stage 3 Cassette shelf 4 Cassette conveyance means 5 Cassette 6 Vertical heat treatment furnace 9 Substrate transfer machine 11 Processing operation part 12 Sensor part 13 Control apparatus 14 Control part 15 External storage means 16 Mechanical control part 17 Input Output control unit 18 Data display unit 19 Input means 21 Material input management unit 22 Main input / output unit 23 Cassette detector

Claims (1)

  A heat treatment furnace, a substrate holder for holding the substrate in the heat treatment furnace, a substrate transport container storage means provided in the apparatus, and material loading for carrying the substrate transport container in and out of the apparatus Transporting the substrate transport container between the exit section, the material loading / unloading section and the substrate transport container storage means, and transporting the substrate transport container between the buffer storage section and the transfer target section in the substrate transport container storage means A pair of transfer means, a substrate transfer means for transferring a substrate between the substrate transfer container and the substrate holder of the transfer target portion, and the transfer means and the substrate transfer means. In order to transfer a substrate to be processed next from the substrate transfer container of the transfer target unit to the substrate holder, the transfer unit includes the transfer target unit and the buffer storage unit or It is necessary to transfer the substrate transfer container to / from the material loading / unloading unit For a certain period, a designation unit that designates a conveyance operation mode that prohibits the conveyance unit from conveying the substrate conveyance container between the buffer storage unit and the material loading / unloading unit, and the designation unit designates the period. In order to transfer the substrate to be processed next from the substrate transfer container of the transfer target portion to the substrate holder, the transfer means includes the transfer target portion and the buffer storage portion or Even during a period in which the substrate transfer container needs to be transferred to and from the material loading / unloading unit, the transfer means transfers the substrate transfer container between the buffer storage unit and the material loading / unloading unit. A substrate processing apparatus comprising: a selecting unit that selects a transfer operation mode to be enabled.

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