JP2006219687A5

JP2006219687A5 -

Info

Publication number: JP2006219687A5
Application number: JP2005031229A
Authority: JP
Filing date: 2005-02-08
Publication date: 2008-03-27
Anticipated expiration: 2025-02-08

Description

上記目的を達成するため、本発明の成膜装置は、ターゲットからスパッタリングされた粒子をワークに成膜する成膜装置において、内部に前記ターゲットが配置され、前記ワークに向かって開口する開口部を備えた真空室と、前記真空室内において、前記ターゲットを逐次前記開口部に対応するスパッタ位置に移動させるターゲット移動手段と、前記スパッタ位置における前記ターゲットの裏面に対向するように配設されたスパッタ駆動源と、前記スパッタ駆動源を前記スパッタ位置において前記ターゲットの裏面側に押圧するスパッタ駆動源移動手段と、前記ターゲット移動手段によって前記スパッタ位置に移動させられ、前記スパッタ位置において前記開口部を閉じるように構成された蓋と、を有することを特徴とする。 In order to achieve the above object, a film forming apparatus according to the present invention is a film forming apparatus that forms particles sputtered from a target on a workpiece, and the opening is disposed toward the workpiece with the target disposed therein. a vacuum chamber having, in the vacuum chamber, a target moving means for moving the sputtering position corresponding to the successive said opening said target, sputtering driving said disposed so as to face the back surface of the target in the sputtering position source and said a sputter drive source moving means for the sputter driving source have you to the sputtering position to press on the back side of the target, which Serra moved to the sputtering position by prior Symbol target moving means, before at the sputtering position SL And a lid configured to close the opening.

図１に示すように、真空室１の開口部にワーク室２内のワークＷを搬送する搬送手段と、それぞれターゲットＴを保持した１つまたは複数のターゲット支持板３と、真空室１の開口部を密封するためのシール手段４を有する圧力分離用の蓋５と、ターゲット支持板３および蓋５を周方向に等間隔でそれぞれ揺動自在に支持するターゲット移動手段である回転テーブル６と、回転テーブル６の回転軸６ａを回転駆動する図示しないモータと、ベローズ７を介して大気側に配設されたスパッタ駆動源移動手段である直動アクチュエータによって矢印Ｒで示す方向に往復駆動されるスパッタ駆動源８を有し、スパッタ駆動源８は、ターゲット支持板３または蓋５の裏面側から前記揺動方向に押圧し、真空室１の前記開口部に当接する。 As shown in FIG. 1, transport means for transporting the workpiece W in the work chamber 2 to the opening of the vacuum chamber 1, one or more target support plates 3 each holding a target T, and the opening of the vacuum chamber 1. A pressure-separating lid 5 having a sealing means 4 for sealing the part , a rotary table 6 which is a target moving means for supporting the target support plate 3 and the lid 5 oscillatingly at equal intervals in the circumferential direction, a motor, not shown FIG rotates the rotation shaft 6a of the rotary table 6, and is reciprocally driven in the direction indicated by the arrow R by the linear actuator is a sputter drive source moving means disposed on the atmosphere side via the bellows 7 The sputter drive source 8 has a sputter drive source 8 that presses in the swing direction from the back side of the target support plate 3 or the lid 5 and abuts against the opening of the vacuum chamber 1.

Claims

A film forming apparatus for forming the sputtered particles from the target to the workpiece, the target is placed inside a vacuum chamber having an opening which opens toward the workpiece, in the vacuum chamber, the target sequential a target moving means for moving the sputtering position corresponding to the opening portion, and the sputtering drive source which is disposed so as to face the back surface of the target in the sputtering position, said have you said sputter driving source to the sputtering position and the sputtering drive source moving means for pressing on the back side of the target, which Serra moved to the sputtering position by prior Symbol target moving means, having a lid configured to close the front SL openings at the sputtering position A film forming apparatus characterized by the above.

The film forming apparatus according to claim 1, wherein the lid is pressed against the opening by the movement of the sputtering drive source to close the opening.

The target moving means, a plurality of targets before Symbol lid and a film forming apparatus according to claim 1, wherein the supporting at predetermined intervals in the circumferential direction in the same plane.

4. The film forming apparatus according to claim 3, wherein the plurality of targets and the lid are supported by the target moving means via a leaf spring .

The sputter drive source, a cooling water channel for flowing a coolant, any one of claims 1 to 4, characterized in that it comprises a tilt mechanism for uniformly abut the back side of the target 1 The film-forming apparatus of description.

The sputter drive source has a cooling plate that can be deformed by a pressure difference between a vacuum chamber and the atmosphere, and is configured to be pressed against the back side of the target through the cooling plate. Item 6. The film forming apparatus according to Item 4 or 5.

7. The film forming apparatus according to claim 6, wherein a thickness t (m) of the cooling plate is set so as to satisfy a relationship represented by the following formula.

Where p [Pa]: pressure difference acting on the cooling plate
r [m]: Radius of the circle on which the pressure difference acts
v [non]: Poisson's ratio of the cooling plate material
E [Pa]: Young's modulus of the cooling plate material
δ [m]: Deformation amount of heating side plane

A deposition method of performing sputtering film formation on the workpiece by the claims 1 to 7 deposition apparatus according to any one,
A step of sequentially moving the target to a sputtering position corresponding to the opening of the vacuum chamber and pressing the sputtering drive source to perform sputtering;
And a step of exchanging the work in a state where the opening of the vacuum chamber is closed by moving the pressure separation lid to the sputtering position.