JP2006217225A - Manufacturing method of surface acoustic wave device - Google Patents

Manufacturing method of surface acoustic wave device Download PDF

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JP2006217225A
JP2006217225A JP2005027572A JP2005027572A JP2006217225A JP 2006217225 A JP2006217225 A JP 2006217225A JP 2005027572 A JP2005027572 A JP 2005027572A JP 2005027572 A JP2005027572 A JP 2005027572A JP 2006217225 A JP2006217225 A JP 2006217225A
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piezoelectric substrate
surface acoustic
acoustic wave
wiring board
wave device
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JP2005027572A
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Japanese (ja)
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Mitsuhiro Furukawa
光弘 古川
Atsushi Matsui
敦志 松井
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Panasonic Holdings Corp
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Matsushita Electric Industrial Co Ltd
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Priority to JP2005027572A priority Critical patent/JP2006217225A/en
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Abstract

<P>PROBLEM TO BE SOLVED: To simplify processes and furthermore, to obtain a surface acoustic wave device with further reduced size. <P>SOLUTION: The manufacturing method includes an electrode forming step of providing interdigital electrodes 12 onto a piezoelectric substrate 11; a jointing step of connecting the piezoelectric substrate 11 to a wiring board aggregate 15; a first dicing step of dicing only the piezoelectric substrate 11; a sealing step of filling in air gaps, formed by the first dicing step by a gel state curing sheet 16 and curing the gel sheet 16; and a second dicing step of dicing the wiring board aggregate 15 and a sealing member 17, resulting from the cured gel state curing sheet on the aggregate 15 to separate individual devices, and can simplify the processes and reduce the size of the products. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、特に携帯電話等に用いられる、弾性表面波デバイスの製造方法に関するものである。   The present invention relates to a method for manufacturing a surface acoustic wave device, particularly for use in a mobile phone or the like.

近年、弾性表面波デバイスは、各種移動体通信端末機器等の電子機器に多く使用されているが、機器の小型化に対応して、弾性表面波デバイスの更なる小型化への要望が強くなってきている。これに対して、配線基板集合体に弾性表面波チップを1個ずつフリップチップ実装し、樹脂で封止した後、切断して個々の弾性表面波デバイスを得ることが提案されているが、この場合1個ずつフリップチップ実装するのに時間がかかることや、フリップチップ実装するために弾性表面波チップと弾性表面波チップの間を一定以上とる必要があるため、弾性表面波チップの大きさよりも大きくなるという問題があった。   In recent years, surface acoustic wave devices have been widely used in electronic devices such as various mobile communication terminal devices. However, in response to the downsizing of devices, the demand for further downsizing of surface acoustic wave devices has increased. It is coming. On the other hand, it has been proposed that surface acoustic wave chips are flip-chip mounted one by one on a wiring board assembly, sealed with resin, and then cut to obtain individual surface acoustic wave devices. In some cases, it takes time to perform flip chip mounting one by one, and it is necessary to take a certain distance between the surface acoustic wave chip and the surface acoustic wave chip for flip chip mounting. There was a problem of getting bigger.

なお、この出願の発明に関連する先行技術文献情報としては、例えば、特許文献1が知られている。
特開2003−17979号公報
As prior art document information related to the invention of this application, for example, Patent Document 1 is known.
JP 2003-17979 A

本発明は、工程を簡略化し、さらに小型化した弾性表面波デバイスを得ることを目的とするものである。   An object of the present invention is to obtain a surface acoustic wave device with simplified processes and further miniaturization.

前記目的を達成するために本発明は、圧電基板上に櫛型電極と少なくとも櫛型電極上に保護膜を設ける電極形成工程と、バンプを介して圧電基板と配線基板集合体とを電気的および機械的に接続する接合工程と、圧電基板のみを切断する第1のダイシング工程と、少なくとも第1のダイシング工程でできた空隙をゲル状硬化性シートで埋めて硬化する封止工程と、配線基板集合体およびその上のゲル状硬化性シートが硬化した封止材を切断して個々のデバイスに分離する第2のダイシング工程と、を備えたものである。   To achieve the above object, the present invention provides an electrode forming step of providing a comb-shaped electrode on a piezoelectric substrate and a protective film on at least the comb-shaped electrode, and electrically connecting the piezoelectric substrate and the wiring board assembly via bumps. A joining step for mechanical connection, a first dicing step for cutting only the piezoelectric substrate, a sealing step for filling and curing at least a gap formed in the first dicing step with a gel-like curable sheet, and a wiring board A second dicing step of cutting the sealing material in which the aggregate and the gel-like curable sheet thereon are cured and separating the sealing material into individual devices.

本発明によれば、弾性表面波チップを1個ずつ実装する必要がないため工程が簡略化され、また弾性表面波チップとほぼ同じ底面積の弾性表面波デバイスを得ることができる。   According to the present invention, since it is not necessary to mount the surface acoustic wave chips one by one, the process is simplified, and a surface acoustic wave device having substantially the same bottom area as the surface acoustic wave chip can be obtained.

(実施の形態1)
以下、実施の形態1を用いて、本発明について説明する。
(Embodiment 1)
Hereinafter, the present invention will be described using the first embodiment.

図1は、本発明の実施の形態1における弾性表面波デバイスの製造方法を説明する図である。   FIG. 1 is a diagram illustrating a method for manufacturing a surface acoustic wave device according to Embodiment 1 of the present invention.

まずφ4インチのタンタル酸リチウムからなる圧電基板11に櫛型電極12を含む電極パターンを形成し、櫛型電極12の上にSiNからなる保護膜13を形成する。一方、約100mm角のガラス基板にレーザー等で穴あけ加工を行い、電極22及びスルーホール21を形成して配線基板集合体15を得る。   First, an electrode pattern including a comb electrode 12 is formed on a piezoelectric substrate 11 made of φ4 inch lithium tantalate, and a protective film 13 made of SiN is formed on the comb electrode 12. On the other hand, drilling is performed on a glass substrate of about 100 mm square with a laser or the like to form the electrode 22 and the through hole 21 to obtain the wiring board assembly 15.

次に図1(a)のように、配線基板集合体15と圧電基板11とを、ハンダからなるバンプ14を介して、電気的接続および機械的接続を行う。ここでバンプ14の径を約90μmとし、配線基板集合体15と圧電基板11とのギャップを約60μmとする。配線基板集合体15をガラス基板を用いて、あとから電極22等を形成しているため、フォトリソグラフィー技術を用いることにより、電極の位置精度を十分に確保することができる。この位置精度が許容範囲で形成できる場合は、配線基板集合体にセラミック基板等を用いてもかまわない。   Next, as shown in FIG. 1A, the wiring board assembly 15 and the piezoelectric substrate 11 are electrically connected and mechanically connected via bumps 14 made of solder. Here, the diameter of the bump 14 is about 90 μm, and the gap between the wiring board assembly 15 and the piezoelectric substrate 11 is about 60 μm. Since the electrode substrate 22 is formed later by using a glass substrate for the wiring board assembly 15, the positional accuracy of the electrodes can be sufficiently ensured by using the photolithography technique. If this positional accuracy can be formed within an allowable range, a ceramic substrate or the like may be used for the wiring board assembly.

通常タンタル酸リチウム等の圧電単結晶では、バルク波の反射による影響を低減するために裏面を粗らしているため、裏面から電極パターンを認識することができず、以下に行うダイシング工程での切断ラインを決定することが難しくなるが、四角の配線基板集合体に円形の圧電基板を接合しているため、圧電基板がない部分の配線基板集合体のパターンを認識することにより、切断ラインの決定が容易に行える。なお、配線基板集合体から圧電基板がはみ出していると、後の工程で圧電基板が割れやすくなるため、配線基板集合体には圧電基板の直径と同程度以上のサイズを有するものを用いるのが望ましい。なお、配線基板集合体の形状は角型でなくても、圧電基板よりも大きいサイズであれば、同様の効果を得ることができる。   Usually, in piezoelectric single crystals such as lithium tantalate, the back surface is roughened to reduce the influence of reflection of bulk waves, so the electrode pattern cannot be recognized from the back surface, and cutting in the dicing process performed below Although it is difficult to determine the line, since a circular piezoelectric substrate is bonded to the square wiring board assembly, the cutting line is determined by recognizing the pattern of the wiring board assembly where there is no piezoelectric substrate. Can be done easily. In addition, if the piezoelectric substrate protrudes from the wiring board assembly, the piezoelectric substrate is likely to be cracked in a later process. Therefore, a wiring board assembly having a size equal to or larger than the diameter of the piezoelectric substrate is used. desirable. Note that even if the shape of the wiring board assembly is not rectangular, the same effect can be obtained as long as it is larger than the piezoelectric substrate.

次に図1(b)のように、接合した基板の、圧電基板11のみを刃厚約100μmのブレードで切断する(第1のダイシング工程)。ここでいう圧電基板11のみとは、圧電基板11は完全に切断して分離されるが、配線基板集合体15の方は、分離されていないという状態であり、配線基板集合体15に少しブレードがかかってもかまわない。圧電基板11の切断面は、電極を形成している面までフラットになっているのが望ましい。但しあまり深くブレードが入ると後の工程で割れやすくなるため、配線基板集合体15の厚さの20%程度までにするのが望ましい。   Next, as shown in FIG. 1B, only the piezoelectric substrate 11 of the bonded substrates is cut with a blade having a blade thickness of about 100 μm (first dicing step). Here, only the piezoelectric substrate 11 means that the piezoelectric substrate 11 is completely cut and separated, but the wiring substrate assembly 15 is not separated. It doesn't matter if it takes. The cut surface of the piezoelectric substrate 11 is preferably flat to the surface on which the electrodes are formed. However, if the blade enters too deep, it will be easily cracked in a later process, so it is desirable that the thickness be about 20% of the thickness of the wiring board assembly 15.

そのあと、減圧した状態で、切断した圧電基板側をゲル状硬化性シート16で覆い、約80℃に加熱しながら、ローラ等で圧力を加えて、第1のダイシング工程でできた空隙を埋め、さらに約150℃に加熱することにより、硬化させて封止する。   After that, in a state where the pressure is reduced, the cut piezoelectric substrate side is covered with a gel-like curable sheet 16 and heated to about 80 ° C., and pressure is applied with a roller or the like to fill the gap formed in the first dicing process. Further, by heating to about 150 ° C., it is cured and sealed.

このようにして図1(c)のようになる。このとき、ゲル状硬化性シートが硬化した封止材17は、切断された圧電基板の端部より内側に入るようにするのが望ましい。しかしながら、封止材17が櫛型電極、あるいは反射電極等の機械的振動が生じる部分に達すると、弾性表面波をダンピングしてしまい、電気的特性が変動してしまうため、これらの機能部分には達しないようにする必要がある。   In this way, it becomes as shown in FIG. At this time, it is desirable that the sealing material 17 having the gel-like curable sheet cured enter inside the end portion of the cut piezoelectric substrate. However, when the sealing material 17 reaches a portion where mechanical vibration such as a comb-shaped electrode or a reflective electrode occurs, the surface acoustic wave is damped and the electrical characteristics fluctuate. Need to not reach.

次に図1(d)のように、第1のダイシング工程で切断した同じラインの配線基板集合体15および封止材17を、刃厚約50μmのブレードで切断して、個々の弾性表面波デバイスに分離する(第2のダイシング工程)。このように第2のダイシング工程で第1のダイシング工程よりも、刃厚の薄いブレードを用いることにより、切断幅を狭くし、圧電基板の切断面にも封止材を残すことができ、安定した封止状態が得られる。   Next, as shown in FIG. 1 (d), the wiring board assembly 15 and the sealing material 17 of the same line cut in the first dicing step are cut with a blade having a blade thickness of about 50 μm to obtain individual surface acoustic waves. Separated into devices (second dicing step). In this way, by using a blade with a thinner blade thickness than in the first dicing step in the second dicing step, the cutting width can be narrowed, and the sealing material can be left on the cut surface of the piezoelectric substrate, which is stable. A sealed state is obtained.

以上のような封止では、完全な気密が得られるわけではないが、櫛型電極12を保護膜13で覆っているため、耐湿性は確保できている。そのため、封止材17は、ハンダ付け時のフラックスが中に入らない程度の封止であっても実用上問題ない。   In the sealing as described above, complete hermeticity is not obtained, but since the comb-shaped electrode 12 is covered with the protective film 13, moisture resistance can be secured. Therefore, even if the sealing material 17 is sealed to such an extent that flux during soldering does not enter, there is no practical problem.

本発明は、弾性表面波デバイス製造工程の簡略化とさらなる小型化を実現するものであり、産業上有用である。   The present invention realizes simplification of the surface acoustic wave device manufacturing process and further miniaturization, and is industrially useful.

本発明の実施の形態1における弾性表面波デバイスの製造方法を説明する図The figure explaining the manufacturing method of the surface acoustic wave device in Embodiment 1 of this invention

符号の説明Explanation of symbols

11 圧電基板
12 櫛型電極
13 保護膜
14 バンプ
15 配線基板集合体
16 ゲル状硬化性シート
17 封止材
21 スルーホール
22 電極
DESCRIPTION OF SYMBOLS 11 Piezoelectric substrate 12 Comb-shaped electrode 13 Protective film 14 Bump 15 Wiring board aggregate | assembly 16 Gel-like curable sheet 17 Sealing material 21 Through hole 22 Electrode

Claims (5)

圧電基板上に櫛型電極と少なくとも前記櫛型電極上に保護膜を設ける電極形成工程と、バンプを介して前記圧電基板と配線基板集合体とを電気的および機械的に接続する接合工程と、前記圧電基板のみを切断する第1のダイシング工程と、少なくとも前記第1のダイシング工程でできた空隙をゲル状硬化性シートで埋めて硬化する封止工程と、前記配線基板集合体およびその上のゲル状硬化性シートが硬化した封止材を切断して個々のデバイスに分離する第2のダイシング工程と、を備えた弾性表面波デバイスの製造方法。 A comb-shaped electrode on the piezoelectric substrate, an electrode forming step of providing a protective film on at least the comb-shaped electrode, and a bonding step of electrically and mechanically connecting the piezoelectric substrate and the wiring board assembly via bumps; A first dicing step of cutting only the piezoelectric substrate; a sealing step of filling at least a gap formed in the first dicing step with a gel-like curable sheet; And a second dicing step in which the sealing material on which the gel-like curable sheet is cured is cut and separated into individual devices. 配線基板集合体は、ガラス基板にスルーホールおよび電極を設けたものである請求項1記載の弾性表面波デバイスの製造方法。 The method for manufacturing a surface acoustic wave device according to claim 1, wherein the wiring board assembly is a glass substrate provided with through holes and electrodes. 第1のダイシング工程の切断幅よりも、第2のダイシング工程の切断幅を狭くした請求項1記載の弾性表面波デバイスの製造方法。 The method for manufacturing a surface acoustic wave device according to claim 1, wherein the cutting width in the second dicing step is narrower than the cutting width in the first dicing step. 封止工程において、減圧した状態で、切断した圧電基板側にゲル状硬化性シートをかぶせ、圧力を加えることにより、電気的特性に影響を及ぼさない範囲で、切断された圧電基板の端部より内側にまでゲル状硬化性シートによる封止材が入るようにした請求項1記載の弾性表面波デバイスの製造方法。 In the sealing process, cover the cut piezo-electric substrate with a gel-like curable sheet and apply pressure to the cut piezo-electric substrate so that the electrical characteristics are not affected. 2. The method for manufacturing a surface acoustic wave device according to claim 1, wherein a sealing material made of a gel-like curable sheet is inserted inside. 圧電基板には円形のウェハを用い、配線基板集合体には前記圧電基板の直径と同程度以上のサイズを有する角型の基板を用いた請求項1記載の弾性表面波デバイスの製造方法。 2. The method for manufacturing a surface acoustic wave device according to claim 1, wherein a circular wafer is used as the piezoelectric substrate, and a square substrate having a size equal to or larger than the diameter of the piezoelectric substrate is used as the wiring board assembly.
JP2005027572A 2005-02-03 2005-02-03 Manufacturing method of surface acoustic wave device Pending JP2006217225A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100891418B1 (en) 2006-11-28 2009-04-02 후지쓰 메디아 데바이스 가부시키가이샤 Acoustic wave device and method of manufacturing the same

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08213874A (en) * 1995-02-03 1996-08-20 Matsushita Electric Ind Co Ltd Surface acoustic wave device and its manufacture
JPH11150441A (en) * 1997-11-14 1999-06-02 Nec Corp Mounting structure for surface acoustic wave element and the mount method
JP2003017979A (en) * 2001-06-28 2003-01-17 Nagase Chemtex Corp Surface acoustic wave device and its manufacturing method
JP2003174345A (en) * 2001-12-07 2003-06-20 Samsung Electro Mech Co Ltd Manufacturing method of surface acoustic wave filter package
JP2004363770A (en) * 2003-06-03 2004-12-24 Toyo Commun Equip Co Ltd Method for manufacturing surface acoustic wave device
WO2005002049A1 (en) * 2003-06-26 2005-01-06 Murata Manufacturing Co., Ltd. Surface acoustic wave element

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08213874A (en) * 1995-02-03 1996-08-20 Matsushita Electric Ind Co Ltd Surface acoustic wave device and its manufacture
JPH11150441A (en) * 1997-11-14 1999-06-02 Nec Corp Mounting structure for surface acoustic wave element and the mount method
JP2003017979A (en) * 2001-06-28 2003-01-17 Nagase Chemtex Corp Surface acoustic wave device and its manufacturing method
JP2003174345A (en) * 2001-12-07 2003-06-20 Samsung Electro Mech Co Ltd Manufacturing method of surface acoustic wave filter package
JP2004363770A (en) * 2003-06-03 2004-12-24 Toyo Commun Equip Co Ltd Method for manufacturing surface acoustic wave device
WO2005002049A1 (en) * 2003-06-26 2005-01-06 Murata Manufacturing Co., Ltd. Surface acoustic wave element

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100891418B1 (en) 2006-11-28 2009-04-02 후지쓰 메디아 데바이스 가부시키가이샤 Acoustic wave device and method of manufacturing the same

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