JP2006215479A - Cover glass, petri dish, optical disk, optical disk device, optical apparatus and optical system - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a cover glass capable of imaging hardly affected by absorption, scattering or else of light caused by noise, dust or medium presenting a negative refractive index from the inside or the outside of an optical system by averagely enhancing the intensity of Evanescent wave. <P>SOLUTION: A transmission type microscope 315 comprises an objective lens 306 and a cover glass 452 which is arranged between the objective lens 306 and a sample 307 and is formed of a negative refractive index medium 301. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

  The present invention relates to an optical system, an optical apparatus, or an optical element using a substance exhibiting negative refraction used in or together with a substance exhibiting negative refraction.

  Conventionally, in various optical systems for forming an image (forming an image of an object) or forming a light spot, the resolution is limited due to diffraction caused by the wave nature of the light or electromagnetic wave used. It was. Therefore, the following Non-Patent Document 2 and Non-Patent Document 5 disclose the use of a negative refractive index medium as a technique for realizing such imaging that exceeds the diffraction limit.

FIG. 15 is an explanatory diagram showing an image formed by the flat plate 380 formed of the negative refractive index medium 301. However,
t0 ... Distance between the object point and the left side surface of 380 t0 '... Distance between the image point and the right side surface of 380 t ... Thickness of 380 i ... Incident angle r ... Refraction angle ns ... Refractive index with respect to vacuum of 301.

  The refractive index around the flat plate 380 is n0, and n0 = 1 in the case of a vacuum. FIG. 15 shows the case where n0 = 1 and ns = -1.

  In this application, the term “light” includes electromagnetic waves.

The arrow indicates the emitted light component of the light emitted from the object. According to Non-Patent Document 2, the law of refraction holds. N0 sin i = ns sin r Equation (101)
If n0 = 1 and ns = -1, then r = -i Equation (102)
It becomes. Therefore,
t0 + t0 '= t (103)
The light of the radiated light component is imaged as an image point at t0 ′ that satisfies the above.

On the other hand, the evanescent wave emitted from the object point has the same intensity as the object point at t0 ′ satisfying the equation (103). Since all the light emitted from the object gathers at the image point, imaging that exceeds the diffraction limit is realized. This is called complete imaging. Even if the periphery of the negative refractive index medium 301 is not a vacuum, the complete image formation is performed using the equation (103) and ns = -n0 (equation 104).
It is known from Non-Patent Document 2 that it is realized if the above is satisfied.

Non-Patent Document 5 shows the case of t0> t0 '(Equation 201). At this time, the intensity of the evanescent wave is attenuated by an exponential function as it proceeds from the object point in the Z direction as shown in FIG. 16, and is amplified by the exponential function inside the negative refractive index medium 301, and the negative refractive index medium 301. After exiting, it decays again with an exponential function.
Mechanism and application of optical system 73-77, 166-170 Optronics 2003 JBPendry Phys. Rev. Lett., Vol85, 18 (2000) 3966-3969 M.Notomi Phys.Rev.B.Vol 62 (2000) 10696 VGVeselago Sov.Phys.Usp.Vol.10,509-514 (1968) L.Liu and S.He Optics Express Vol.12 No.20 4835-4840 (2004) Sato / Kawakami Optronics July 2001 issue 197 pages Published by Optronics US 2003/0227415 A1 US 2002/0175693 A1

  In FIG. 16, if the intensity of the evanescent wave at Z = t0 is G (t0), the value of G (t0) decreases as t0 increases. Therefore, there is a problem that the intensity of the evanescent wave is weak on average on the optical path from the object point to the image point, and is weak against noise from the outside.

  The present invention has been made paying attention to such a problem, and the object of the present invention is to increase the intensity of evanescent waves on average, and to reduce noise, dust, and negative refractive index from the inside and outside of the optical system. An object of the present invention is to enable image formation that is less affected by light absorption and scattering of the medium shown.

  In order to achieve the above object, for example, a first aspect of the present invention is a cover glass, which is formed of a medium exhibiting negative refraction.

  Moreover, the 2nd aspect of this invention is a Petri dish, Comprising: It forms with the medium which shows negative refraction.

  A third aspect of the present invention is an optical disc, which is formed of a medium exhibiting negative refraction.

  According to a fourth aspect of the present invention, there is provided an optical disc apparatus comprising a light source, an optical element formed of a medium exhibiting negative refraction, and an optical disc, wherein the negative refraction is applied when information is written to the optical disc. The optical element formed with the medium shown is moved to the light source side, and when reading information from the optical disk, the optical element formed with the medium showing negative refraction is moved to the optical disk side.

  According to a fifth aspect of the present invention, there is provided an optical device comprising: a light source; an object illuminated by the light source; an imaging optical system; and negative refraction placed in proximity to the imaging optical system. And an optical element formed of the medium shown.

  According to a sixth aspect of the present invention, there is provided an optical device, comprising: a light source; an object illuminated by the light source; and an optical element formed of a medium exhibiting negative refraction disposed in the vicinity of the object. And imaging the object.

  According to a seventh aspect of the present invention, there is provided an optical system using light or electromagnetic waves, the object illuminated by a light source or the object or image emitting light, and the object or image behind the object or image. An optical element formed of a medium exhibiting negative refraction arranged in proximity is formed to form an image of the object or image.

  According to the present invention, the intensity of evanescent waves is increased on average, and imaging that is less affected by light absorption, scattering, etc., in the optical system inside and outside, noise, dust, and the medium having a negative refractive index is possible. Become.

Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. First, the outline of the present invention will be described. As described above, if the intensity of the evanescent wave at Z = t0 is G (t0), the value of G (t0) decreases as t0 increases. Therefore, there is a problem that the intensity of the evanescent wave is weak on average on the optical path from the object point to the image point, and is weak against noise from the outside. Therefore, in this embodiment,
t0 <t0 'Formula (202)
By increasing the intensity of the evanescent wave on the average, it is possible to form an image that is less susceptible to light absorption and scattering of the optical system internal and external noise, dust, and the negative refractive index medium. .

  FIG. 1 is an explanatory diagram, and by setting t0 <t0 ', the value of G (t0) becomes larger than that in FIG. 16, and accordingly, the intensity of the evanescent wave in the region of Z> t0 is higher than that in FIG. You can see that it is getting bigger. This phenomenon can be achieved with either light or electromagnetic waves. In the present application, t0 'may be expressed as d.

  If the following equation (203) is satisfied instead of the equation (202), it may be less susceptible to noise or the like.

    2t0 <t0 '... It is even better to use equation (203).

    5t0 <t0 ′ (Equation (204) is better)

In practice, t0 <3t0 ′ (formula 205)
But it can be effective.

t0 <5t0 '(Formula 206)
But it is good depending on the application.

  In FIG. 15, if the image sensor 408 is placed at the position of the image point, an image-capturing apparatus for equal magnification imaging can be obtained.

  FIG. 2 shows an embodiment of the present invention, which is an example of a transmission microscope 315 using a negative refractive index medium 301 and is disposed in the air. Light emitted from the light source 303 (for example, a laser light source, a xenon lamp, a mercury lamp, etc.) passes through the illumination lenses 304 and 307 and enters the objective lens 306. The NA of the objective lens 306 exceeds 1, for example. The objective lens 306 includes optical elements formed of a medium having a positive refractive index, for example, lenses 306-1 and 306-2 made of glass.

  FIG. 3 shows an enlarged view of the vicinity of the objective lens 306 in FIG. Here, the most object side surface of the objective lens 306 is assumed to be 311. The intermediate image formation point of the objective lens 306 is represented by FF. Let g be the distance between the surface 311 and the intermediate image formation point FF.

  As shown in FIGS. 2 and 3, a cover glass 452 made of, for example, a parallel plate-like negative refractive index medium is disposed at a position d away from the intermediate imaging point FF. Reference numeral 453 denotes a slide glass. d represents the distance between the intermediate imaging point FF and the upper surface 310 of the negative refractive index medium. The value of d is 171 μm, for example. The value of t0 is 1 μm in this example. Reference numeral 312 denotes an object side surface of the negative refractive index medium 301.

  The light scattered by the sample 307 as an object passes through the negative refractive index medium 301, the objective lens 306, the mirror 454, and the eyepiece lens 308, and is observed by a TV camera, a cooled CCD camera, or the like provided with the eye 309 or the image sensor 408. can do. Hereinafter, this situation will be described in detail.

  Here, the refractive index of the negative refractive index medium 301 is −1, and the thickness is t (for example, 170 μm). t0 is the distance between the negative refractive index medium 301 and the sample 307 or an imaging member described later. t0 will be described in detail later.

  Since the refractive index of the negative refractive index medium 301 is −1, the light beam scattered by the sample 307 is refracted differently from normal as shown by the arrow in FIG. 3 (see Non-Patent Document 2).

According to the law of refraction, if the incident angle is i and the exit angle is r, then r = −i Equation (0-3)
It is. If the relative refractive index of the negative refractive index medium 301 with respect to the surrounding medium is n, sin r = (1 / n) sin i Expression (0-4)
It is.

According to Non-Patent Document 2, t = t0 + d (1)
In this case, the negative refractive index medium 301 completely symbolizes the sample 307 to the intermediate imaging point FF. The term “complete imaging” as used herein refers to imaging light as an electromagnetic field including radiated light and evanescent waves that are not affected by the diffraction limit. This is equivalent to the presence of an object in the FF.

The value of g is
0 ≦ g ≦ λ Formula (0)
The intermediate image formation point FF is very close to the surface 311. This is a desirable condition for effectively using the evanescent wave. Practically 0 ≦ g ≦ 10λ Formula (0-1)
But there is a case.

  Note that λ is the wavelength of light used, and in the case of visible light, λ is 0.35 μm to 0.7 μm.

  In this way, imaging including evanescent waves with NA> 1.0 is possible. A high-resolution microscope can be realized.

Depending on the application,
0 ≦ g ≦ 1000λ Formula (0-1-0)
But you can. In the example of FIG. 3, g = 0 μm.

  If the lower limit of g in the formulas (0) to (0-1-0) is (0.1λ) / A, dust, scratches, etc. on the lens surface 311 will be out of focus and adverse effects will be reduced. A is the numerical aperture (NA) of the objective lens 306 at the FF.

  If the lower limit of g is set to (0.6λ) / A in Expressions (0) to (0-1-0), the influence of dust, scratches, etc. may be further reduced. If the lower limit of g is set to (1.3λ) / A in the equations (0) to (0-1-0), the influence of dust, scratches, etc. may be further greatly reduced. When g is from 0 to several tens of nm, the imaging performance is almost equivalent to that of a solid immersion lens in which the objective lens 306 is almost in direct contact with the sample 307.

  One point of the embodiment of the present invention is that an optical element (such as 452) formed of the negative refractive index medium 301 and an imaging optical system (such as 306) are arranged in combination. In this embodiment, an imaging optical system is arranged on the image side of the negative refractive index medium 301.

  An object image (intermediate image) formed by the negative refractive index medium 301 is re-imaged by the objective lens 306. The intermediate image is a real image in the example of FIG. 3, but may be a virtual image depending on the application of the optical system.

  Further, since the cover glass is formed of a negative refractive index medium and the cover glass 452 formed of the negative refractive index medium is brought close to the sample 307, attenuation of the evanescent wave can be minimized, and in the optical system, An optical system in which the imaging performance is not easily deteriorated even if there is noise from the outside, a manufacturing defect of the negative refractive index medium 301, or the like can be obtained.

  The cover glass is one of the optical elements. The later-described Petri dish is also one of the optical elements.

In the above description, the case where g ≧ 0 has been described.
g <0 Formula (0-5)
But you can. Because d + g> 0 Formula (0-6)
This is because the imaging relationship can be maintained without the optical elements colliding with each other. g <0 means that the FF enters the lens (for example, 306-1). However, if g becomes too small, the conditions for complete imaging will be lost.
-T <g <0 Formula (0-7)
It is desirable to satisfy. Depending on the application,
−3t <g <0 Formula (0-8)
Should be satisfied. Depending on the optical system
−10t <g <0 Formula (0-9)
May be sufficient.

  D + g = 0 may also be used.

If the value of g is shown in actual length, −100 mm <g <0 Formula (0-10)
It is good to do. If the value of g falls below the lower limit of Expression 0-10, it becomes difficult to manufacture the lens.

−10 mm <g <0 Formula (0-11)
And that's even better.

  If the upper limit of g in Equations (0-5) to (0-11) is (−0.1λ) / A, the evanescent wave can be used reliably, and dust and scratches on the lens surface 311 are out of focus. It is still better because it will reduce adverse effects.

  If the upper limit of g is set to (−0.6λ) / A in the equations (0-5) to (0-11), the influence of dust, scratches, etc. may be further reduced.

  If the upper limit of g is set to (−1.3λ) / A in the equations (0-5) to (0-11), the influence of dust, scratches, etc. may be further greatly reduced.

  Equation (1) may not be strictly followed. This is because the image position by the negative refractive index medium 301 may deviate from the equation (1) due to a manufacturing error of the refractive index of the negative refractive index medium 301, an error in surface accuracy, and the like.

0.8 (t 0 + d) ≦ t ≦ 1.2 (t 0 + d) (2)
If it is.

Depending on the product
0.5 (t0 + d) ≤t≤1.5 (t0 + d) (3)
May be acceptable.

Depending on the usage conditions of the product, 0.15 (t0 + d) ≤ t ≤ 4.0 (t0 + d) (4)
But there are things you can do.

Or t ≦ 0.9 (t 0 + d) (formula (4-1))
If it is satisfied, a longer working distance can be secured.

  The concept described above is similarly applied to other embodiments of the present application. In other embodiments, the refractive index of the negative refractive index medium 301 is, for example, -1.

  FIG. 4 is an example of an inverted microscope 457 using a Petri dish 455 formed of the negative refractive index medium 301. The vicinity of the eyepiece disposed in the air is omitted, and the vicinity of the objective lens is enlarged. Only a portion through which light passes in the Petri dish 455 may be formed of the negative refractive index medium 301.

The light emitted from the upper light source 303 passes through the illumination lens 304 and illuminates the sample 307. The light scattered by the sample 307 passes through the Petri dish 455 and is completely imaged on the FF. The intermediate image formed on the FF is re-imaged by the objective lens 360 and observed by 308, 408 and the like. In this example, t0 = 0.1 μm
t = 500 μm
d = 499.9 μm
g = 0
It is.

  Formulas (0), (0-1), (0-1-0), (0-3),... (0-11), (1), (2), (3), (4), (4 The same applies to -1) in this example. 2 and 4 can also be applied to a scanning microscope.

  FIG. 5 shows an example of the optical disk 458 using the negative refractive index medium 301 and the optical disk optical system 320. At the time of writing, the light emitted from 321 passes through 305, the lens 459, and the probe 461 and reaches the minute aperture 462. The size of the minute aperture 462 is about 10 to 30 nm, and the near-field light emitted therefrom is completely imaged by the layer 463 formed of the negative refractive index medium 301 of the optical disk 458 and reaches the recording layer 464.

  Writing is then performed. Alternatively, the optical disk 458 may be a read-only type manufactured by another manufacturing method. In this case, the above writing process is unnecessary.

At the time of reading, the light that has advanced to 321, 305, 459, 461, 462, 301 is reflected by 464, travels to 301, 462, 461, 459, is reflected by 305, and enters 324. Information is then read out. In this example, g = 10 nm
d = 10 μm
t = 10 μm
t0 = 0 μm
It is.

By adopting such a configuration, the following equation (1) is established between the optical disk and the optical disk: d = t Equation (207)
This makes it possible to obtain a high-density optical disk apparatus in which the positioning of the 462 is easy and the evanescent wave is less attenuated at the time of reading, so that it is difficult to damage the disk which is hardly affected by dust and the like. .

  Alternatively, the optical disk 458 may be a read-only type made by another manufacturing method. In this case, the above writing process is unnecessary.

  Formulas (0), (0-1), (0-1-0), (0-3), ..., (0-9), (1), (2), (3), (4), ( 4-1) similarly applies to this example and the example of FIG. 8 described later.

  FIG. 6 shows an optical disc optical system 320-2 according to another embodiment of the optical system using the optical disc 458. Light emitted from the semiconductor laser as the light source 321 passes through the semi-transparent mirror 305 and the objective lens 322, and forms an image on the optical disk 458 for writing. The NA of the objective lens 322 exceeds 1, and writing can be performed at a higher density including evanescent light with a minute spot light without contact with the objective lens 322. 320-2 is arranged in the air.

  The imaging relationship of the negative refractive index medium 301 is the same as in FIG. In the case of reading a signal from the optical disk 458, the light emitted from the light source 321 is scattered on the surface of 464, proceeds to the negative refractive index medium 301, the objective lens 322, and the semi-transparent mirror 305 and enters the photodetector 324. Reading with high NA is possible without contact.

In this example, g = 0
d = 5 μm
t = 5 μm
t0 = 0
It is.

  In particular, it is characterized in that high-density reading can be performed with strong evanescent wave intensity during reading and hardly affected by noise. The optical disk 458 may be of a read only type (read only type) made by another manufacturing method.

  Light from the light source may be projected from the lower side of 458 and information may be read out with transmitted light. Further, as shown in FIG. 7, 301 may be moved along the optical axis 467 between 323 and 322. When information is written to H.323, the optical system can be operated in a state where the evanescent wave from the object is strong if 301 is brought closer to 322-1 and information is read from H.323 so that the optical system can function constantly. An optical system is obtained. Note that when writing, d is the distance between the lower surface of 301 and 323, t0 is the distance between FF and the upper surface of 301, d is the distance between the upper surface of 301 and FF, and t0 is the distance between 323 and the lower surface of 301. .

  The configuration in which 301 moves along the optical axis in this way can also be applied to the optical disc optical system 468 as shown in FIG.

  When writing 301 is close to 469, the light travels in the order of 321 → 305 → 462 → 301 → 323.

  At the time of reading, 301 moves to a position close to 323, that is, light incident as 321 → 305 → 462 → 301 → 323 is reflected by 323 and proceeds to 301 → 462 → 305 → 324 to be converted into an electrical signal.

  As described above, when the 301 moves on the optical axis, the light can be used in a strong state of the evanescent wave according to the traveling direction of the light beam at the time of writing and reading, so that an optical disc optical system which is resistant to noise and the like can be obtained.

  Note that the distance between 462 and 301 at the time of writing is t0, the distance between 301 and 323 is d, the distance between 462 and 301 at reading is d, and the distance between 301 and 323 is different from t0. Further, if the optical surface 301 is a curved surface, zooming can be performed by moving 301.

  Even if 301 is not moved, even if it is fixed between 469 and 323, it operates as an optical disk optical system.

  6, the photomask 325 is arranged between the light source 321 and the objective lens 322 as shown in FIG. 9, and 464 is replaced with a silicon wafer 326, and the photomask 325 and the silicon wafer 326 are optically arranged. , A projection exposure apparatus (such as a stepper) 349 for manufacturing an LSI can be obtained. Since NA exceeds 1, and an evanescent wave can be used, it is convenient to perform exposure with high resolution and non-contact. The optical system of the projection exposure apparatus is placed in a vacuum.

  6, 7, and 9, the equations (0), (0-1), (0-1-0), (0-3),..., (0-11), (1), ( 2), (3), (4), and (4-1) hold. 305 and 324 are not used in the stepper. In the example of FIG. 9, the definition of d is the distance between the image side surface 301 and 326, and the definition of t0 is the distance between the upper surface of 301 and the intermediate imaging point FF.

  In the examples of FIGS. 2, 3, 4, 6, 7, and 9, the negative refractive index medium 301 and the lens closest to 301 are disposed with a space therebetween.

  In this way, for example, even if 301 collides with an object and is damaged, the function can be recovered by replacing only 301. In other words, it is easy to repair.

  FIG. 10 is a diagram showing contact-type lithography conventionally proposed. When illumination light is applied from above to the transparent polymer photomask 330 having a line width of about 20 nm, an evanescent wave is generated below the convex portion 331, and the photoresist on the silicon wafer 326 is exposed. Then, LSI is manufactured. The polymer photomask 330 is a member having a fine structure. However, the polymer photomask 330 and the silicon wafer 326 must be brought into close contact with each other, and there are problems such that the life of the polymer photomask 330 is short during use and the polymer photomask 330 is easily broken. This problem has occurred even when a chrome photomask is used instead of the polymer photomask. A photomask is a member having a fine structure.

  In view of this point, according to the present invention, high-resolution lithography can be realized in a non-contact manner by using the negative refractive index medium 301.

  FIG. 11 is an explanatory diagram in which a parallel plate of the negative refractive index medium 301 is arranged between the silicon wafer 326 and the polymer photomask 330 so as to be close to 326. The optical system of FIG. 11 is disposed in a vacuum or in air.

  In this way, the evanescent wave generated below the convex portion 331 of the polymer photomask 330 is completely imaged by the negative refractive index medium 301 and forms an image on the silicon wafer 326. The imaging magnification is 1. Thus, high resolution lithography with a large WD can be realized.

  If the distance between the convex portion 331 and the negative refractive index medium 301 is d, the expressions (1) to (3), (4), and (4-1) are satisfied.

  Regarding the objective lens 306 and the objective lens 322, the NA on the object side or the optical disc side of these optical systems is preferably 1.0 or more, but may be less than 1.0. For example, it may be 0.2 or more or less. This is because the negative refractive index medium 301 has the effect of extending WD.

  If the NA of 306, 322, etc. is 1.15 or more, high resolution can be realized.

  Furthermore, if the NA is 1.3 or more, it is preferable that a high resolution that cannot be achieved with a water immersion objective lens or with a water immersion objective lens can be realized.

  If the NA is 1.5 or more, the high resolution equivalent to that of an oil immersion objective lens can be realized.

  Note that, regarding the shape of the negative refractive index medium 301, the shape of the negative refractive index medium 301 may not be a parallel plate in the embodiments of FIGS. 2, 3, 4, 7, and 9. FIG.

The following is a description common to the present invention. A specific material of the negative refractive index medium 301 is a photonic crystal. FIG. 12 shows a first specific example of the photonic crystal 340, and FIG. 13 shows a second specific example of the photonic crystal 340. As shown in FIGS. 12 and 13, the photonic crystal 340 is a substance having a periodic structure of λ to a fraction of λ, and is formed by lithography or the like. The material is a dielectric such as a synthetic resin such as SiO ₂ , TiO ₂ , acrylic, polycarbonate, or GaAs. Here, λ is the wavelength of light used. The values of the repetitive cycles Sx, Sy, Sz in the X, Y, and Z directions in the figure have a value of λ to a fraction of 1λ. It is known that a negative refractive index can be realized in the vicinity of the band edge of a photonic crystal (see Non-Patent Document 3). The z direction in the figure is preferably the optical axis of the optical system.

  The Z axis is the direction of the axis having the best rotational symmetry of the photonic crystal.

  Sx, Sy, and Sz desirably satisfy any of the following formulas.

λ / 10 <Sx <λ Formula (5-1)
λ / 10 <Sy <λ Formula (5-2)
λ / 10 <Sz <λ Formula (5-3)
If the values of Sx, Sy, Sz exceed the upper limit or fall below the lower limit, they will not function as a photonic crystal.

Depending on the application,
λ / 30 <Sx <4λ Formula (5-4)
λ / 30 <Sy <4λ Formula (5-5)
λ / 30 <Sz <4λ Formula (5-6)
Any one of the above may be satisfied.

As for the negative refractive index medium, when the relative dielectric constant ε of the medium is negative and the relative permeability μ of the medium is negative, the refractive index of the medium is

It is known to become.
Further, the negative refractive index medium includes a material exhibiting negative refraction, a material exhibiting negative refraction approximately, such as a thin film of silver, gold, copper, etc., a material exhibiting a negative refractive index with respect to a specific polarization direction, and a dielectric constant ε May be a thin film or the like of a substance having an approximate -1.

Further, the negative refractive index medium may be referred to as a left handed material. This application includes all of these negative refractive index media, left-handed materials, substances that exhibit negative refraction approximately, substances that exhibit a negative refractive index for a specific polarization direction, and thin films of substances having a dielectric constant ε of approximately −1. This is called a medium exhibiting negative refraction. Substances exhibiting complete imaging are also included in the medium exhibiting negative refraction. In the case of a thin film of a substance having a dielectric constant ε of approximately −1,
−1.2 <ε <−0.8 Formula (5-7)
It is good to satisfy. Depending on the application,
−1.6 <ε <−0.5 Formula (5-8)
But you can.

  The wavelength of light to be used is not limited to those described in the embodiment, and a continuous spectrum light source, a white light source, a sum of a plurality of monochromatic lights, a low coherence light source such as a super luminescent diode, or the like may be used. .

  The wavelength is preferably 0.1 μm to 3 μm because it can be transmitted in the air and the light source is easily available. Visible wavelengths are easier to use.

  It is even better if the wavelength is 0.6 μm or less because the resolution is improved.

  Hereinafter, d will be described in detail.

The value of d is 100 nm ≦ d ≦ 20 mm (7)
It is good to do.

  If the lower limit of Expression (7) is not reached, the working distance becomes too small and is difficult to handle. If the upper limit of Expression (7) is exceeded, the negative refractive index medium becomes too large, which is disadvantageous in terms of cost and processing. Another problem is that the size of the optical device becomes too large.

Depending on the product, 0 nm ≦ d ≦ 200 mm (8)
But it is acceptable.

  1100 nm ≦ d ≦ 200 mm Formula (8-0-1) provides an optical device that is easier to use.

  0.01 mm ≦ d ≦ 200 mm Formula (8-0-2) is easy to use, and the mechanism for determining the WD of the optical device may be simplified.

  0.1 mm ≦ d ≦ 200 mm Formula (8-0-3) makes it easier to use and further reduces the mechanical accuracy of the optical device.

The smaller t0 is, the better, but t0 ≤10000λ (18-1)
Or
t0 ≦ 1000λ Formula (18-2)
But some products are acceptable.

t0 ≦ 100λ (18-3)
If so, the evanescent wave can be used effectively.

t0 ≤ 5λ (18-4)
Even better.

  By reducing the value of t0, the size such as 452 can be reduced.

  Further, it is desirable that the value of d or t0 can be varied by devising the mechanical structure of the optical device. One example is a microscope stage.

  Alternatively, the negative refractive index medium 301 may be formed on a transparent flat plate, and the transparent flat plate may be arranged to form a part of a lens used for image formation. As a place to be arranged, the foremost part (the object side of the lens 306-1 in FIG. 2) or the last part (the disk side of 322 in FIG. 6) of the imaging lens system (the objective lens 306 in FIG. 2). ) Is good. If the lens or flat plate used as the substrate is made of a material having a positive refractive index, it can be manufactured at low cost. As described above, even when the negative refractive index medium 301 is provided on the substrate, the values of t0 and d are measured from the surface of the negative refractive index medium 301.

  Here, the influence on the imaging performance of dust, scratches and the like on the optical surface will be summarized. As already described in the conditional expressions g and d, the influence of dust, scratches, etc. on the optical surface becomes smaller as the distance from the FF to the immediately preceding or immediately following optical surface increases.

  The distance referred to here is an optical length (air equivalent length).

  The distance is preferably at least (0.1λ) / A or more. It is even better if it is (0.6λ) / A or (1.3λ) / A or more.

  The optical surface includes the surface of a negative refractive index medium.

  FIG. 14 shows an example of 315 using a flat plate 301 formed on a flat plate 450 made of a material having a positive refractive index.

  450, 306-1 and 306-2 are combined to form 306. 301 and 450 may be adhered or adhered.

  The optical system having such a configuration can be applied to the examples of FIGS. 2, 3, 4, 5, and 6.

Also, regarding the condition of complete imaging, the deviation from the equation (1),
t0 + dt = .DELTA. Expression (8-3)
In this case, the larger the value of | Δ |, the worse the image formation state.

| Δ | <λ Formula (8-4)
If so, the image formation state can be reduced to some extent.

Practically, depending on the product, | Δ | <10λ (8-4-1)
Up to acceptable. Depending on the use conditions, | Δ | <100λ (Equation (8-5)) is acceptable.

  If the lower limit of | Δ | in the expressions (8-4-1) to (8-5) is (0.1λ) / A, there may be a merit that WD can be secured longer, and so on.

  Further, when the refractive index of the negative refractive index medium 301 is n, n <0. In the embodiments described so far, n = -1. When the negative refractive index medium 301 is a parallel plate, ideally n = -1. However, in reality, there are cases where n = −1 cannot be achieved due to manufacturing errors of the negative refractive index medium 301, deviations in the wavelength used, and the like, and it is desirable to satisfy the following equation at this time.

−1.1 <n <−0.9 Formula (9)
If the value of n deviates from the above, complete image formation is not realized and the resolution is lowered. Depending on the product: -1.5 <n <-0.5 Formula (10)
If it is good.

-3 <n <-0.2 (Equation (11))
But sometimes it ’s okay.

  Assuming that the refractive index of the lens or optical element closest to the negative refractive index medium (306-1, 322-1 in FIGS. 2, 3, 4, and 6) is N, the larger the N, the higher the resolution. So good.

N ≧ 1.3 Formula (12)
If so, it can be used for a wide range of purposes.

N ≧ 1.7 Formula (13)
And that's even better.

  If the upper limit value of N is set to 1.82 in the expressions (12) and (13), the glass absorption (coloring) may be reduced.

N ≧ 1.86 Formula (13-1)
If so, it is good because high resolution can be realized although there is coloring.

  In addition, although it can be said in common with the Example of this application, although the circumference | surroundings of the negative refractive index medium 301 are considered to be air or a vacuum, it is good also as water and oil.

  Therefore, the refractive index n of 301 represents the relative refractive index with respect to the surrounding medium when the surrounding is air or the like, and represents the refractive index with respect to the vacuum when the surrounding is vacuum. When the surroundings are evacuated, good imaging performance can be obtained due to the fact that vacuum ultraviolet light having a short wavelength can be used and that there is no reduction in resolution due to air fluctuations. If the surroundings are air, an optical device can be easily manufactured and handled easily. Of the optical device, only the optical path around the negative refractive index medium 301 may be evacuated, and the rest of the optical device may be placed in the air.

  An optical device that is easy to handle and has good imaging performance can be obtained.

  1, 2, 3, 5, 5, 6, 7, 8, 9, 11, 15 and 16, the part d or t0 is made of liquid such as water or oil. May be satisfied. In this way, the value of nV does not have to be -1, and there is an advantage that it is easy to select 301 materials. However, the refractive index of 301 for vacuum is nV.

In this case, if the refractive index of a liquid such as water or oil is nL, the necessary condition for realizing complete imaging is nV = −nL (Equation (15-3))
It becomes.

  If the relative refractive index of 301 with respect to the liquid is n, the equations (9), (10), and (11) can be similarly applied.

  The refractive index of 301 for vacuum is nV, and the refractive index of air for vacuum is nA. NA = 1.0002818 when the pressure is 1 atm and the wavelength is 500 nm.

The necessary condition for ideal complete imaging in the case where the periphery of the optical device is air is nV = −nA (15)
It is.

The necessary condition for ideal complete imaging when the periphery of the optical device is a vacuum is nV = −1.0 (16)
It is.

The value of t will be described. In practice, it is better to increase the working distance in order to improve the usability of the optical device. From the equation (1), the working distance becomes a value similar to t. Therefore, 0.1 mm <= t <= 300 mm ... Formula (15-2)
It is good to do. If the value of t exceeds the upper limit, the optical device becomes large and difficult to manufacture.

0.01mm ≦ t ≦ 300mm depending on the product (16-2)
But it is acceptable.

Depending on the application, 1100 nm ≦ t ≦ 200 mm (17)
Alternatively, in the case where light is absorbed in 301, 30 nm ≦ t ≦ 50 mm (18)
But sometimes it is acceptable.

  Further, if the expression 15-2 or 16-2 is satisfied, the mechanical strength of the negative refractive index medium as an optical element increases, so that the handling at the time of assembling the optical device may be facilitated.

  Alternatively, there is a possibility that a substrate for supporting the negative refractive index medium may be unnecessary.

  If the upper limit of t is set to 0.01 mm in the equations (17) and (18), the negative refractive index medium may be manufactured as a thin film by vapor deposition or sputtering.

  For example, it is conceivable to produce a photonic crystal by a self-cloning method (see Non-Patent Document 6).

  In addition, if the length measured along the optical axis of the optical system including the negative refractive index medium is 20 m or less, the optical system and the optical device can be easily manufactured.

  Further, as shown in the embodiments of FIGS. 2, 3, 4, 5, and 6 of the present application, object points (FF, 321, 325, etc.) with respect to the imaging optical system (306, 322, etc.) Alternatively, the distance between the image point (real image before 308, image on FF, 324, etc.) and the imaging optical system is finite. When the term light is used in the present application, it also includes electromagnetic waves.

  Further, the term “complete imaging” is used in the present application, but this also includes a case where 100% complete imaging is not performed (for example, 50% resolution is improved). In other words, for example, the case where the resolution is improved to some extent over the normal diffraction limit is also included.

  Expressions (202) to (206) and Expressions (18-1), (18-2), (18-3), and (18-4) can be applied to all examples of the present application.

  Finally, definitions of technical terms used in this embodiment will be described.

  An optical device is a device including an optical system or an optical element. The optical device alone may not function. That is, it may be a part of the apparatus.

  The optical device includes an imaging device, an observation device, a display device, an illumination device, a signal processing device, an optical information processing device, a projection device, a projection exposure device, and the like.

Examples of imaging devices include film cameras, digital cameras, PDA digital cameras, robot eyes, interchangeable lens digital single lens reflex cameras, television cameras, video recording devices, electronic video recording devices, camcorders, VTR cameras, and mobile phones. Digital camera, mobile phone TV camera, electronic endoscope, capsule endoscope, in-vehicle camera, satellite camera, planetary explorer camera, space probe camera, surveillance camera, various sensor eyes, recording Equipment digital camera, artificial vision, laser scanning microscope, projection exposure equipment, stepper, aligner,
There are optical probe microscopes and the like. Digital camera, card-type digital camera, TV camera, VTR camera, video recording camera, mobile phone digital camera, mobile phone TV camera, in-vehicle camera, satellite camera, planetary probe camera, space probe camera, recording device These digital cameras are examples of electronic imaging devices.

  Examples of the observation apparatus include a microscope, a telescope, glasses, binoculars, a loupe, a fiberscope, a viewfinder, a viewfinder, a contact lens, an intraocular lens, and artificial vision.

  Examples of the display device include a liquid crystal display, a viewfinder, a game machine (Sony PlayStation), a video projector, a liquid crystal projector, a head mounted display (HMD), a PDA (personal digital assistant), Mobile phones, artificial vision, etc.

  Video projectors, liquid crystal projectors, etc. are also projection devices.

  Examples of the illumination device include a camera strobe, an automobile headlight, an endoscope light source, and a microscope light source.

  Examples of signal processing devices include mobile phones, personal computers, game machines, optical disk reading / writing devices, computing devices for optical computers, optical interconnection devices, optical information processing devices, optical LSIs, optical computers, PDAs, etc. .

  An information transmission device is a device that can input and transmit any information such as a remote control such as a mobile phone, a fixed phone, a game machine, a TV, a radio cassette, a stereo, a personal computer, a keyboard of a personal computer, a mouse, a touch panel, etc. Point to.

  It shall also include a television monitor with an imaging device, a personal computer monitor, and a display.

  The information transmission device is included in the signal processing device.

  The imaging device refers to, for example, a CCD, an imaging tube, a solid-state imaging device, a photographic film, and the like. The plane parallel plate is included in one of the prisms. The change of the observer includes the change of the diopter. The change in the subject includes a change in the object distance as the subject, movement of the object, movement of the object, vibration, blurring of the object, and the like. Imaging elements, wafers, optical disks, silver salt films, etc. are examples of imaging members.

  The definition of the extended surface is as follows.

  In addition to spherical surfaces, flat surfaces, rotationally symmetric aspheric surfaces, spherical surfaces that are decentered with respect to the optical axis, flat surfaces, rotationally symmetric aspheric surfaces, aspherical surfaces having a symmetric surface, aspherical surfaces having only one symmetric surface, non-symmetrical surfaces Any shape such as a spherical surface, a free-form surface, a non-differentiable point, or a surface having a line may be used. It may be a reflective surface or a refractive surface as long as it can have some influence on light.

  In the present invention, these are collectively referred to as an extended curved surface.

  The imaging optical system refers to an imaging optical system, an observation optical system, a projection optical system, a projection exposure optical system, a display optical system, a signal processing optical system, and the like.

  An example of the imaging optical system is an imaging lens for a digital camera.

  Examples of the observation optical system include a microscope optical system and a telescope optical system.

  Examples of the projection optical system include a video projector optical system, a lithography optical system, an optical disk read / write optical system, and an optical pickup optical system.

  As an example of the projection exposure optical system, there is an optical system for lithography.

  An example of the display optical system is a viewfinder optical system of a video camera.

  Examples of the signal processing optical system include an optical disk read / write optical system and an optical pickup optical system.

  An optical element refers to a lens, an aspheric lens, a mirror, a mirror, a prism, a free-form surface prism, a diffractive optical element (DOE), a heterogeneous lens, and the like. A parallel plate is also an optical element.

(Appendix)
1. A cover glass made of a medium exhibiting negative refraction.

1-2. A microscope including a cover glass formed of a medium exhibiting negative refraction in an optical path.

2. A Petri dish made of a medium exhibiting negative refraction.

2-2. A microscope including a Petri dish formed of a medium exhibiting negative refraction in an optical path.

3. An optical disc formed of a medium exhibiting negative refraction.

3-1. 2. having a recording layer and a layer of a medium exhibiting negative refraction formed thereon; An optical disc that is subordinate to.

3-2. 2. having a recording layer and a layer of a medium exhibiting negative refraction formed thereon; A read-only optical disc that depends on

3-3. 2. formed of a medium exhibiting negative refraction. To 3-2. Optical disk apparatus using an optical disk subordinate to.

3-4. 2. formed of a light source, a small aperture, and a medium exhibiting negative refraction. To 3-3. An optical disk device comprising an optical disk subordinate to

3-4-2. 2. formed of a medium exhibiting negative refraction. To 3-3. An optical disc apparatus comprising: an optical disc that is dependent on the optical disc;

3-5. 2. formed of a light source, an imaging optical system, and a medium exhibiting negative refraction. To 3-3. An optical disk device comprising an optical disk subordinate to

3-5-2. 2. formed of a medium exhibiting negative refraction. To 3-3. An optical disk apparatus comprising a light source in which an optical disk subordinate to the optical system and an imaging optical system are sequentially arranged.

4). A light source, an optical element formed of a medium exhibiting negative refraction, and an optical disc, and when writing information to the optical disc, the optical element formed of the medium exhibiting negative refraction is moved to the light source side, An optical disc apparatus, wherein when reading information from an optical disc, an optical element formed of a medium exhibiting negative refraction is moved to the optical disc side.

4-2. A light source, an imaging optical system, an optical element formed of a medium exhibiting negative refraction, and an optical disc, and the optical element formed of the medium exhibiting negative refraction when the information is written to the optical disc And an optical element formed of a medium exhibiting negative refraction is moved toward the optical disk when reading information from the optical disk.

5. An optical device comprising: a light source; an object illuminated by the light source; an imaging optical system; and an optical element formed of a medium exhibiting negative refraction placed in proximity to the imaging optical system. apparatus.

5-2. Projection exposure apparatus comprising: a light source; an object having a fine structure illuminated by the light source; an imaging optical system; and a member formed of a medium exhibiting negative refraction placed in proximity to the imaging optical system .

6). An optical system comprising: a light source; an object illuminated by the light source; and an optical element formed of a medium exhibiting negative refraction disposed in the vicinity of the object, and imaging the object. apparatus.

7). An object having a fine structure illuminated by the light source and an optical element formed of a medium exhibiting negative refraction arranged in the vicinity of the object, and imaging the object having the fine structure A projection exposure apparatus which is performed on a wafer.

8). An optical element formed of an object illuminated by a light source or an object or image that emits light, and a negative refraction medium disposed in proximity to the object or image behind the object or image, An optical system for forming an image of an object or an image.

8-2. 7. The optical element formed of the medium exhibiting negative refraction is movable. The optical system described in 1.

8-3. An optical system comprising an optical element formed of a medium exhibiting negative refraction, wherein the optical element moves.

8-4. An optical system comprising an optical element formed of a substance exhibiting negative refraction, wherein the optical element is movable, and further includes an optical element formed of a medium having a positive refractive index.

9. An optical system using light or electromagnetic waves, characterized in that it has an optical element formed of a medium exhibiting negative refraction, and the optical element is arranged at a position satisfying formula (206).

9-2. Further, it has an optical element formed with a positive refractive index. The optical system described in 1.

9-3. Furthermore, it has a plurality of optical elements formed with a positive refractive index. The optical system described in 1.

9-4. Furthermore, an imaging optical system is provided in front of or behind the optical element formed of the medium exhibiting negative refraction. The optical system described in 1.

10. An optical system using light or electromagnetic waves, comprising an optical element formed of a medium exhibiting negative refraction, wherein the optical element is disposed at a position satisfying the formula (18-1).

10-2. Furthermore, it has an optical element formed with a positive refractive index. The optical system described in 1.

10-3. Furthermore, it has a plurality of optical elements formed with a positive refractive index. The optical system described in 1.

10-4. Furthermore, an imaging optical system is provided in front of or behind the optical element formed of the medium exhibiting negative refraction. The optical system described in 1.

11. 1-2, 2-2, 3-3, 3-5, 3-5-2, wherein the optical system or optical apparatus has a light incident side, an outgoing side, or an intermediate imaging NA of 1 or more. 4, 4-2, 5, 5-2, or 8. Or those described in 10-4.

12 1. The optical element formed of the medium exhibiting negative refraction is a parallel plate. To 10. Those described in.

12-2. 1. The optical element formed of a medium exhibiting negative refraction has a curved optical surface. To 10. Those described in.

13. 1. Having an image sensor To 10-4. An optical apparatus having the following optical system.

14 1. Use of light or electromagnetic waves Thru 13. Optical elements, optical systems or optical devices.

15. The medium exhibiting negative refraction is a negative refractive index medium. To 14.

16. 1. The medium exhibiting negative refraction is a photonic crystal. To 15. Those described in.

17. 1. The medium exhibiting negative refraction is a medium exhibiting complete imaging properties. To 16.

18. A lens formed of a medium exhibiting negative refraction.

18-1. A lens having a flat surface on one side, which is formed of a medium exhibiting negative refraction.

18-2. A biconcave or biconvex lens formed of a medium exhibiting negative refraction.

18-3. A meniscus lens formed of a medium exhibiting negative refraction.

18-4. An aspheric lens formed of a medium exhibiting negative refraction.

18-5. A lens having a rotationally asymmetric surface, which is formed of a medium exhibiting negative refraction.

18-6. A lens having an extended curved surface, which is formed of a medium exhibiting negative refraction.

18-7. A lens having an optical element made of a material having a positive refractive index, and a medium exhibiting negative refraction formed on the optical element using the optical element as a substrate.

18-8. An optical element having an optical element made of a material having a positive refractive index and having a negative refraction medium formed on the optical element with the optical element as a substrate.

18-9. An optical element having a transparent flat plate and having a medium exhibiting negative refraction formed on the flat plate using the flat plate as a substrate.

18-10. An optical element having a transparent flat plate made of a material having a positive refractive index, and a medium exhibiting negative refraction formed on the flat plate using the flat plate as a substrate.

19. An optical system having an optical element formed of a medium exhibiting negative refraction.

20. An optical system comprising an optical element formed of a medium exhibiting negative refraction and another optical element.

21-1. An optical system comprising: an optical element formed of a medium exhibiting negative refraction; and an optical element formed of a medium having a positive refractive index.

21-1-0. An optical system comprising: an optical element having a curved surface formed of a medium exhibiting negative refraction; and an optical element formed of a medium having a positive refractive index.

21-1-1. An optical element formed of a medium exhibiting negative refraction and an optical element formed of a medium having positive refractive index, and the closest positive refractive index of the optical element formed of the medium exhibiting negative refraction An optical system characterized in that there is a gap between an optical element formed of the above medium and an optical element formed of the medium exhibiting negative refraction.

22. An optical system comprising an optical element formed of a medium exhibiting negative refraction and an imaging optical system.

22-0. An optical system having an imaging relationship with an optical element formed of a medium exhibiting negative refraction, and further including an optical element other than the optical element formed of the medium exhibiting negative refraction.

22-1. An optical system comprising both an imaging relationship by an optical element formed of a medium exhibiting negative refraction and an imaging relationship by an imaging optical system.

22-1-1. An image formed by an optical element formed of a medium exhibiting negative refraction includes both an image forming relationship formed by a medium exhibiting negative refraction and an image forming relationship formed by an image forming optical system. An optical system characterized by that.

22-2. An optical system, wherein an image of an object is formed by an optical system including an optical element formed of a medium exhibiting negative refraction, and the image is re-imaged by an imaging optical system.

22-3. An optical system, wherein an image of an object is formed by an imaging optical system, and the image is re-imaged by an optical system including an optical element formed of a medium exhibiting negative refraction.

22-4. The object according to any one of 19 to 22-3, wherein the object has a two-dimensional or three-dimensional shape.

22-5. The material according to 19 to 22-4, wherein light passes through the medium exhibiting negative refraction twice.

22-10. The optical element according to 19 to 22-5, wherein the optical element formed of the medium exhibiting negative refraction is a parallel plate.

22-11. The thing in any one of 19 thru | or 22-10 characterized by satisfy | filling Formula (0-1-0) or Formula (0-5).

22-12. Any of 19 thru | or 22-11 characterized by satisfy | filling Formula (4).

Where WD is the distance between the negative refraction medium and the object or image plane, d is the distance between the negative refraction medium and the intermediate imaging point of the optical system, t is the thickness of the medium exhibiting negative refraction. 22-13. The medium according to any one of 19 to 22-12, wherein a refractive index of the medium exhibiting negative refraction is about -1.

22-13-1. The medium according to any one of 19 to 22-12, wherein a refractive index of the medium exhibiting negative refraction is not -1, and the formula (11) is satisfied.

22-14. The thing of 19 thru | or 22-12 characterized by the refractive index of the medium which shows the said negative refraction satisfy | filling Formula (11).

22-15. 15. The optical system according to any one of 19 to 22-14, wherein the NA of the object side, the image side, or the intermediate image of the optical system is a value exceeding 0.2.

22-16. 15. The optical system according to any one of 19 to 22-14, wherein the NA of the optical system on the object side, the image side, or intermediate imaging is less than 1.0.

22-17. 15. The optical system according to any one of 19 to 22-14, wherein the NA of the object side or image side or intermediate image of the optical system is 1 or more.

22-17-1. 15. The object according to any one of 19 to 22-14, wherein NA of the object side, the image side, or the intermediate image of the optical system is a value exceeding 1.15.

22-17-2. 15. The optical system according to any one of 19 to 22-14, wherein NA of the optical system on the object side, the image side, or intermediate imaging is a value exceeding 1.3.

22-17-3. 15. The object according to any one of 19 to 22-14, wherein NA of the object side or image side of the optical system or intermediate image formation is a value exceeding 1.5.

22-18. The distance between the medium exhibiting negative refraction and an object or an image satisfies the formula (8), according to any one of 19 to 22-17-3.

22-19. The thing in any one of 19 thru | or 22-18 characterized by satisfy | filling Formula (8-2).

22-20. The thing in any one of 19 thru | or 22-19 characterized by satisfy | filling Formula (8-5).

22-21. 21. The apparatus according to any one of 19 to 22-20, wherein an imaging optical system is disposed behind an optical element formed of a medium exhibiting negative refraction.

22-22. An optical apparatus comprising the optical system according to 22-21.

22-23. A microscope having the optical system according to 22-21.

22-24. An episcopic microscope having the optical system according to 22-21.

22-25. A transmission microscope having the optical system according to 22-21.

22-26. An observation apparatus comprising the optical system according to 22-21.

22-27. An imaging apparatus comprising the optical system according to 22-21.

22-27-1. A scanning microscope having the optical system according to 22-21.

22-28. 21. Any one of 19 to 22-20, wherein an imaging optical system is disposed in front of an optical element formed of a medium exhibiting negative refraction.

22-29. An optical apparatus comprising the optical system according to 22-28.

22-30. An optical disc apparatus comprising the optical system according to 22-28.

22-31. A projection exposure apparatus comprising the optical system according to 22-28.

22-32. A projection apparatus comprising the optical system according to 22-28.

22-33. A signal processing apparatus having the optical system according to 22-28.

22-34. An image pickup apparatus having the optical system according to 22-28.

22-35. An optical apparatus comprising the optical system according to 19 to 22-20.

22-36. The thing in any one of 19 thru | or 22-35 characterized by satisfy | filling Formula (12).

22-37. The optical element formed of a medium exhibiting negative refraction has the above 1. To 1-10. Any of 19 thru | or 22-35 which has the structure in any one of these.

The lens or optical element of 22-38.18-7 to 18-10 is provided, and the substrate forms part of the imaging optical system or the optical system. Things.

22-39.18-7 to 18-10, and the substrate constitutes a part of the imaging optical system or the optical system, and the substrate exhibits a negative refraction. The object according to 19 to 22-36, wherein the object is on the side opposite to the object.

22-39-1.18-7 to 18-10, the substrate constitutes the imaging optical system or a part of the optical system, and the substrate is the imaging optical system. A material according to 19 to 22-36, which is adhered to an optical element constituting the material.

22-39-2. The apparatus according to 20 to 22-36, wherein the medium exhibiting negative refraction and the optical element constituting the optical system are bonded or integrated.

22-40. The thing of 22-38 in which the refractive index of the said board | substrate satisfy | fills Formula (12).

22-41-1. An imaging optical system having an optical element formed of a medium exhibiting negative refraction.

22-41-2. An imaging optical system having an optical element formed of a medium exhibiting negative refraction and another optical element.

22-41-3. An imaging optical system having an optical element formed of a medium exhibiting negative refraction and an optical element formed of a medium having a positive refractive index.

22-42-1. An imaging optical system having an optical element formed of a medium exhibiting negative refraction.

22-42-2. An imaging optical system comprising: an optical element formed of a medium exhibiting negative refraction, and another optical element.

22-42-2-1. An imaging optical system comprising an optical element formed of a medium exhibiting negative refraction, an optical element other than that, and an imaging element.

22-42-3. An imaging optical system having an optical element formed of a medium exhibiting negative refraction and an optical element formed of a medium having a positive refractive index.

22-42-3-1. An imaging optical system comprising an optical element formed of a medium exhibiting negative refraction, an optical element formed of a medium having a positive refractive index, and an imaging element.

22-43-1. An observation optical system having an optical element formed of a medium exhibiting negative refraction.

22-43-2. An observation optical system comprising an optical element formed of a medium exhibiting negative refraction and another optical element.

22-43-3. An observation optical system comprising an optical element formed of a medium exhibiting negative refraction and an optical element formed of a medium having a positive refractive index.

22-44-1. A signal processing optical system having an optical element formed of a medium exhibiting negative refraction.

22-44-2. A signal processing optical system comprising: an optical element formed of a medium exhibiting negative refraction; and another optical element.

22-44-3. A signal processing optical system comprising: an optical element formed of a medium exhibiting negative refraction; and an optical element formed of a medium having a positive refractive index.

23. An optical apparatus comprising: a light source; a member having a fine structure; and an optical element formed of a medium exhibiting negative refraction, and imaging the fine structure.

23-0-1. An optical device, wherein a light source, a member having a fine structure, and an optical element formed of a medium exhibiting negative refraction are arranged in order to form an image of the fine structure.

23-1. An exposure apparatus, wherein a light source, a photomask, and an optical element formed of a medium exhibiting negative refraction are arranged in order, and exposure is performed on a wafer.

23-2. 24. The optical element according to any one of 23 to 23-1, wherein the optical element formed of a medium exhibiting negative refraction is a parallel plate.

23-3. The thing of 23-2 characterized by satisfy | filling Formula (4).

Where WD is the distance between the medium exhibiting negative refraction and the image plane or wafer, d is the distance between the medium exhibiting negative refraction and a member or photomask having a fine structure, t is the thickness of the medium exhibiting negative refraction. .

23-4. The medium according to any one of 23 to 23-3, wherein the medium exhibiting negative refraction has a refractive index of about -1.

23-4-1. The medium according to any one of 23 to 5-3, wherein the medium exhibiting negative refraction does not have a refractive index of -1, and satisfies Expression (11).

23-5. The medium according to any one of 23 to 23-3, wherein a refractive index of the medium exhibiting negative refraction satisfies Expression (11).

23-6. 24. The apparatus according to any one of 23 to 23-5, wherein a distance between the medium exhibiting negative refraction and an image plane satisfies Expression (8).

23-7. The thing in any one of 23 thru | or 23-6 characterized by satisfy | filling Formula (8-2).

23-8. The thing in any one of 23 thru | or 23-7 characterized by satisfy | filling Formula (8-5).

23-8-1. The optical element formed of a medium exhibiting negative refraction is 1-8. To 1-10. The thing in any one of 23 thru | or 23-7 which has either structure.

23-9. The material according to any one of 18 to 23-8-1, wherein a photonic crystal is used as a medium exhibiting negative refraction.

23-9-1. The photonic crystal is used as a medium exhibiting negative refraction, and the Z axis of the photonic crystal is directed to the optical axis direction of the optical element or the optical system. .

23-10. The thing of 23-9 characterized by satisfy | filling Formula (5-4) or Formula (5-5), or Formula (5-6).

23-11. The light according to any one of 18 to 23-10, wherein the light used is monochromatic light.

23-12. The light according to any one of 18 to 23-9, wherein the wavelength of light used is from 0.1 μm to 3 μm.

23-12-1. The one according to any one of 19 to 23-12, further comprising a light source.

23-13. The object according to any one of 19 to 23-12, wherein an object or an imaging member is illuminated by a light source and light of the light source.

23-14. The apparatus according to any one of 18 to 22-15 or 22-17 to 23-13, wherein an evanescent wave is used for imaging.

23-15. The object according to any one of 19 to 23-14, wherein a distance between the negative refraction medium and an object or an imaging member can be varied.

24-10. The medium according to any one of 18 to 23-15, wherein the periphery of the medium exhibiting negative refraction is air.

24-11. The medium according to any one of 18 to 23-15, wherein the medium exhibiting negative refraction is vacuum.

24-11-2. The one according to any one of 18 to 23-15, wherein the periphery or part of the medium exhibiting negative refraction is a liquid.

24-12. 18-8 thru | or 18-10, or 22-11 thru | or 23-17 characterized by the said optical element formed with the medium which shows the said negative refraction, or the said medium which shows the negative refraction (18-11 thru | or 23-17) However, 22-37, 22-38, 23-8-1 are excluded).

24-13. The thickness of the optical element formed of the medium exhibiting negative refraction or the medium exhibiting negative refraction is 18 to 24-12 satisfying any one of formulas (15), (16), (17), and (18). Listed.

25-1. An optical element formed of a medium exhibiting negative refraction and an imaging optical system, and the absolute distance from the intermediate image forming point of the imaging optical system to the surface of the optical element formed of the medium exhibiting negative refraction An optical apparatus having an optical system characterized in that the value is (0.1λ) / A or more (where A is the numerical aperture at the intermediate image forming point of the image forming optical system).

25-2. The imaging optical system includes an optical element formed of a medium exhibiting negative refraction and an imaging optical system, and the optical surface of the imaging optical system closest to the optical element formed of the medium exhibiting negative refraction. An optical apparatus provided with an optical system, characterized in that the absolute value of the distance to the intermediate imaging point is (0.1λ) / A or more (where A is the intermediate imaging point of the imaging optical system) Numerical aperture).

25-3. A light source, a member having a fine structure, and an optical element formed of a medium exhibiting negative refraction, and a distance between the member having the fine structure and the surface of the optical element formed of the medium exhibiting negative refraction is An optical apparatus characterized by being 0.1λ or more.

25-4. An optical element formed of a medium exhibiting negative refraction and an imaging optical system, and the thickness of the optical element formed of the medium exhibiting negative refraction is expressed by the equations (15), (16), (17), ( 18) An optical apparatus including an optical system that satisfies any one of the above.

25-5. A light source, a member having a fine structure, and an optical element formed of a medium exhibiting negative refraction, and the thickness of the optical element formed of the medium exhibiting negative refraction is represented by formulas (15), (16), (17) An optical device satisfying any one of (18).

25-6. An optical system having an optical element formed of a medium exhibiting negative refraction, using a photonic crystal as the medium exhibiting negative refraction, and the axis having the best rotational symmetry of the photonic crystal being the optical system An optical apparatus provided with an optical system characterized by being directed in an optical axis direction.

25-7. An optical apparatus comprising: an optical system including an optical element formed of a medium exhibiting negative refraction, wherein the length of the optical system measured along the optical axis of the optical system is 20 m or less.

26-1. 19. The medium according to 18, wherein the medium exhibiting negative refraction is a negative refractive index medium.

26-2. 27. The medium according to any one of 18 to 26-1, wherein the medium exhibiting negative refraction is a medium exhibiting a complete imaging property.

It is a figure for demonstrating the outline of this invention. FIG. 4 is a diagram illustrating an example of a transmission microscope 315 using a negative refractive index medium 301 as an embodiment of the present invention. It is a figure which shows the enlarged view of the objective lens 306 vicinity of FIG. It is a figure which shows the example of the inverted microscope 457 using the Petri dish 455 formed with the negative refractive index medium 301. FIG. 4 is a diagram illustrating an example of an optical disc 458 using a negative refractive index medium 301 and an optical disc optical system 320. FIG. FIG. 10 is a diagram for explaining another embodiment of an optical system using an optical disk 458. FIG. 10 is a diagram for explaining still another embodiment of an optical system using an optical disk 458. FIG. 10 is a diagram for explaining still another embodiment of an optical system using an optical disk 458. It is a figure which shows a structure when this invention is applied to projection exposure apparatus (stepper etc.) 349. FIG. It is a figure which shows the contact-type lithography proposed conventionally. It is a figure which shows a structure when this invention is applied to lithography. FIG. 4 is a diagram showing a first specific example of a photonic crystal 340. A second example of the photonic crystal 340 is shown. It is a figure which shows the example of the transmission microscope 315 using the flat negative refractive index medium 301 formed on the flat plate 450 made of the material which has a positive refractive index. It is a figure for demonstrating the specific structure using the negative refractive index medium 301. FIG. It is a figure which shows a mode that the intensity | strength of an evanescent wave changes.

Explanation of symbols

301 Negative refractive index medium 303 Light source 304 Illumination lens 306 Objective lens 307 Sample 308 Eyepiece 452 Cover glass 454 made of negative refractive index medium Mirror

Claims (8)

A cover glass formed of a medium exhibiting negative refraction. A Petri dish formed of a medium exhibiting negative refraction. An optical disc formed of a medium exhibiting negative refraction. A light source, an optical element formed of a medium exhibiting negative refraction, and an optical disc, and when writing information to the optical disc, the optical element formed of the medium exhibiting negative refraction is moved to the light source side, An optical disc apparatus, wherein when reading information from an optical disc, an optical element formed of a medium exhibiting negative refraction is moved to the optical disc side. An optical device comprising: a light source; an object illuminated by the light source; an imaging optical system; and an optical element formed of a medium exhibiting negative refraction placed in proximity to the imaging optical system. apparatus. An optical system comprising: a light source; an object illuminated by the light source; and an optical element formed of a medium exhibiting negative refraction disposed in the vicinity of the object, and imaging the object. apparatus. An optical element formed of an object illuminated by a light source or an object or image that emits light, and a negative refraction medium disposed in proximity to the object or image behind the object or image, An optical system for forming an image of an object or an image. An optical system comprising an optical element formed of a medium exhibiting negative refraction, wherein the optical element moves.

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