JP2006213789A - Curable organopolysiloxane composition and semiconductor device - Google Patents

Curable organopolysiloxane composition and semiconductor device Download PDF

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JP2006213789A
JP2006213789A JP2005026349A JP2005026349A JP2006213789A JP 2006213789 A JP2006213789 A JP 2006213789A JP 2005026349 A JP2005026349 A JP 2005026349A JP 2005026349 A JP2005026349 A JP 2005026349A JP 2006213789 A JP2006213789 A JP 2006213789A
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curable organopolysiloxane
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JP4841846B2 (en
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Koji Taiko
弘二 大皷
Nobuo Hirai
信男 平井
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Momentive Performance Materials Japan LLC
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GE Toshiba Silicones Co Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/13Discrete devices, e.g. 3 terminal devices
    • H01L2924/1301Thyristor

Abstract

<P>PROBLEM TO BE SOLVED: To provide a curable organopolysiloxane composition having high transparency, and a semiconductor device whose semiconductor element is sealed with the cured product of the composition. <P>SOLUTION: This curable organopolysiloxane composition comprises (A) an organopolysiloxane having at least 0.2 piece per one molecule on average of alkenyl group bound to a silicon atom, (B) a three-dimensionally network-structured organopolysiloxane having 400-5,000 ppm hydroxy group content each bound to a silicon atom, (C) an organohydrogenpolysiloxane having at least two hydrogen atoms each bound to a silicon atom in one molecule, and (D) a catalyst for hydrosilylation reaction. The semiconductor device in which semiconductor elements are coated with the cured product of the curable organopolysiloxane composition is provided. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、硬化性オルガノポリシロキサン組成物、及びこの硬化物により半導体素子が被覆されている半導体装置に関する。   The present invention relates to a curable organopolysiloxane composition and a semiconductor device in which a semiconductor element is coated with the cured product.

従来、半導体装置は、半導体素子を外気雰囲気や機械的な衝撃などから保護するために、半導体素子が樹脂で封止されている。   2. Description of the Related Art Conventionally, in a semiconductor device, a semiconductor element is sealed with a resin in order to protect the semiconductor element from an outside air atmosphere or mechanical shock.

例えば、特許文献1には、以下に示すような半導体装置が記載されている。この半導体装置は、半導体素子がリードフレーム上にダイボンドされ、この半導体素子とリードフレームとがボンディングワイヤによりワイヤボンディングされている。この半導体素子は、硬化性オルガノポリシロキサン組成物の硬化物により被覆されている。さらに、この硬化物により被覆された半導体素子をエポキシ樹脂等のモールド樹脂により樹脂封止されている。
特開2004−143361公報
For example, Patent Document 1 describes a semiconductor device as shown below. In this semiconductor device, a semiconductor element is die-bonded on a lead frame, and the semiconductor element and the lead frame are wire-bonded with a bonding wire. This semiconductor element is covered with a cured product of a curable organopolysiloxane composition. Furthermore, the semiconductor element covered with the cured product is resin-sealed with a mold resin such as an epoxy resin.
JP 2004-143361 A

しかしながら、特許文献1に記載の半導体装置において高電圧で稼動した場合、モールド樹脂と硬化性オルガノポリシロキサン組成物の硬化物との密着力が著しく低下してモールド樹脂が剥離し、その界面からのリークによって、半導体装置としての特性を損なうという問題があった。   However, when the semiconductor device described in Patent Document 1 is operated at a high voltage, the adhesion between the mold resin and the cured product of the curable organopolysiloxane composition is remarkably reduced, and the mold resin peels off from the interface. There has been a problem that characteristics as a semiconductor device are impaired due to leakage.

さらに、近年、硬化性オルガノポリシロキサン組成物等の半導体素子用封止剤には絶縁特性の向上が求められており、無機質充填剤の添加が行われていたが、該組成物の硬化物の透明性に悪影響を及ぼし、発光ダイオード等の半導体素子を用いた場合、光透過率が低下するという問題があった。   Furthermore, in recent years, sealing properties for semiconductor elements such as curable organopolysiloxane compositions have been required to improve insulation characteristics, and inorganic fillers have been added. When a semiconductor element such as a light emitting diode is used which adversely affects the transparency, there is a problem that the light transmittance is lowered.

本発明は、このような課題に対処するためになされたもので、硬化性オルガノポリシロキサン組成物の硬化物とモールド樹脂との密着性に優れ、且つ高い透明性を有する硬化性オルガノポリシロキサン組成物及びこの硬化物により半導体素子が封止され信頼性に優れた半導体装置を提供することを目的とする。   The present invention has been made to cope with such problems, and is a curable organopolysiloxane composition having excellent adhesion between a cured product of a curable organopolysiloxane composition and a mold resin and having high transparency. An object of the present invention is to provide a semiconductor device in which a semiconductor element is sealed with an object and this cured product and has excellent reliability.

本発明の硬化性オルガノポリシロキサン組成物は、
(A)一分子中に平均0.2個以上のケイ素原子結合アルケニル基を有するオルガノポリシロキサン、
(B)平均単位式:
(RSiO1/2(SiO4/2
(式中、Rは、同じか、または異なる置換もしくは非置換の一価炭化水素基であり、a、bはそれぞれ正数であり、且つa/bは0.2〜3の数である。)で表され、且つケイ素原子に結合する水酸基量が400〜5000ppmである三次元網目状構造のオルガノポリシロキサン {前記(A)成分と(B)成分との合計量に対して10〜80重量%}、
(C)一分子中に少なくとも2個のケイ素原子結合水素原子を有するオルガノハイドロジェンポリシロキサン {前記(A)成分中のケイ素原子結合アルケニル基と前記(B)成分中のケイ素原子結合アルケニル基との合計1モルに対して、本成分中のケイ素原子結合水素原子が0.2〜5モルとなる量}、
及び
(D)ヒドロシリル化反応用触媒 (触媒量)を有することを特徴とする。
The curable organopolysiloxane composition of the present invention comprises
(A) an organopolysiloxane having an average of 0.2 or more silicon-bonded alkenyl groups in one molecule;
(B) Average unit formula:
(R 3 SiO 1/2 ) a (SiO 4/2 ) b
(Wherein R is the same or different substituted or unsubstituted monovalent hydrocarbon group, a and b are each a positive number, and a / b is a number of 0.2 to 3. ) And an organopolysiloxane having a three-dimensional network structure in which the amount of hydroxyl groups bonded to silicon atoms is 400 to 5000 ppm {10 to 80 weights based on the total amount of the components (A) and (B) %},
(C) Organohydrogenpolysiloxane having at least two silicon atom-bonded hydrogen atoms in one molecule {Silicon atom-bonded alkenyl group in component (A) and silicon atom-bonded alkenyl group in component (B) In an amount of 0.2 to 5 mol of silicon-bonded hydrogen atoms in this component}
And (D) a catalyst for hydrosilylation reaction (catalytic amount).

また、本発明の半導体装置は、上記の硬化性オルガノポリシロキサン組成物の硬化物により半導体素子が封止されていることを特徴とする。   The semiconductor device of the present invention is characterized in that a semiconductor element is sealed with a cured product of the above curable organopolysiloxane composition.

本発明の硬化性オルガノポリシロキサン組成物によれば、モールド樹脂との密着力を改善して剥離を防止し、さらには高い透明性を有する硬化物を得ることができる。   According to the curable organopolysiloxane composition of the present invention, it is possible to improve adhesion with a mold resin to prevent peeling and to obtain a cured product having high transparency.

また、本発明の半導体装置によれば、この硬化物により半導体素子が封止されているため信頼性が優れているという効果を奏する。   Further, according to the semiconductor device of the present invention, since the semiconductor element is sealed with the cured product, there is an effect that the reliability is excellent.

以下、本発明の硬化性オルガノポリシロキサン組成物の実施の形態について説明する。   Hereinafter, embodiments of the curable organopolysiloxane composition of the present invention will be described.

[(A)成分]
(A)成分は、本組成物の主成分であり、一分子中に平均0.2個以上のケイ素原子結合アルケニル基を有し、好ましくは、1分子中に平均0.5個以上、より好ましくは1分子中に平均2個以上のケイ素原子に結合したアルケニル基を有する。これは、1分子中のアルケニル基の平均値が上記範囲の下限未満であると、得られる組成物が十分に硬化しなくなる場合があるからである。
[(A) component]
The component (A) is a main component of the present composition and has an average of 0.2 or more silicon-bonded alkenyl groups in one molecule, preferably 0.5 or more on average in one molecule. Preferably, it has an alkenyl group bonded to an average of 2 or more silicon atoms in one molecule. This is because if the average value of alkenyl groups in one molecule is less than the lower limit of the above range, the resulting composition may not be sufficiently cured.

(A)成分中のアルケニル基としては、ビニル基、アリル基、ブテニル基、ペテニル基、ヘキセニル基が例示され、特にビニル基であることが好ましい。   Examples of the alkenyl group in component (A) include a vinyl group, an allyl group, a butenyl group, a petenyl group, and a hexenyl group, with a vinyl group being particularly preferred.

(A)成分のケイ素原子結合全有機基中のケイ素原子結合アルケニル基の含有率は、0.0003モル%以上であることが好ましく、特に0.001モル%以上であることが好ましい。このアルケニル基は、分子鎖末端のケイ素原子に結合していても、分子鎖途中のケイ素原子に結合していても、前記両者に結合していてもよいが、得られる組成物の硬化速度、硬化物の物性等の点から、少なくとも分子鎖末端のケイ素原子、特に分子鎖両末端のケイ素原子に結合していることが好ましい。   The content of the silicon atom-bonded alkenyl group in the silicon atom-bonded all organic group of the component (A) is preferably 0.0003 mol% or more, particularly preferably 0.001 mol% or more. The alkenyl group may be bonded to the silicon atom at the end of the molecular chain, may be bonded to the silicon atom in the middle of the molecular chain, or may be bonded to the both, but the curing rate of the resulting composition, From the viewpoint of physical properties of the cured product, it is preferable that it is bonded to at least silicon atoms at the molecular chain terminals, particularly silicon atoms at both molecular chain terminals.

また、(A)成分のアルケニル基以外のケイ素原子結合有機基としては、例えば、メチル基、エチル基、プロピル基等のアルキル基、シクロペンチル基、シクロヘキシル基等のシクロアルキル基、ベンジル基、フェネチル基等のアラルキル基、フェニル基、トリル基、キシリル基等のアリール基あるいはこれらの水素原子が部分的に塩素原子、フッ素原子などで置換されたハロゲン化炭化水素基等の通常、炭素原子数1〜12個、好ましくは炭素原子数1〜8個程度のものが例示され、好ましくは、アルキル基、アリール基であり、より好ましくは、メチル基、フェニル基である。   Examples of the silicon-bonded organic group other than the alkenyl group of the component (A) include, for example, alkyl groups such as methyl group, ethyl group and propyl group, cycloalkyl groups such as cyclopentyl group and cyclohexyl group, benzyl group and phenethyl group Usually an aralkyl group such as phenyl group, tolyl group, xylyl group, etc., or a halogenated hydrocarbon group in which these hydrogen atoms are partially substituted by chlorine atoms, fluorine atoms, etc. Examples thereof include those having 12 carbon atoms, preferably about 1 to 8 carbon atoms, preferably alkyl groups and aryl groups, and more preferably methyl groups and phenyl groups.

(A)成分の分子構造は、特に限定されず、例えば、直鎖状、環状、分岐鎖状等が挙げられ、好ましくは、硬化物の機械的強度等の物性の点から直鎖状構造であることが好ましい。   The molecular structure of the component (A) is not particularly limited, and examples thereof include linear, cyclic, and branched chains. Preferably, the linear structure is used in view of physical properties such as mechanical strength of the cured product. Preferably there is.

このような(A)成分の25℃における粘度は、5〜100,000mPa・sであり、好ましくは、100〜50,000mPa・sである。これは、25℃における粘度が上記範囲の下限未満であると、機械的強度が低下する傾向があるからであり、一方、上記範囲の上限を超えると、取り扱い作業性が低下する傾向があるからである。   The viscosity at 25 ° C. of such component (A) is 5 to 100,000 mPa · s, and preferably 100 to 50,000 mPa · s. This is because if the viscosity at 25 ° C. is less than the lower limit of the above range, the mechanical strength tends to decrease, whereas if it exceeds the upper limit of the above range, the handling workability tends to decrease. It is.

(A)成分の例としては、下記一般式で示される化合物が挙げられる。   Examples of the component (A) include compounds represented by the following general formula.

下記一般式中、Rは脂肪族不飽和結合を含まない同じか、又は異なる置換もしくは非置換の一価炭化水素基であり、具体的には前記アルキル基、前記アラルキル基、前記アリール基、前記ハロゲン化炭化水素基等が例示され、好ましくはメチル基、フェニル基である。Xはアルケニル基であり、好ましくはビニル基である。また、式中、m、nは、m≧1、n≧0の整数であり、好ましくは、mは1〜100の整数、nは5〜3000の整数である。

Figure 2006213789
Figure 2006213789
Figure 2006213789
In the general formula below, R 1 is the same or different substituted or unsubstituted monovalent hydrocarbon group not containing an aliphatic unsaturated bond, specifically, the alkyl group, the aralkyl group, the aryl group, Examples of the halogenated hydrocarbon group include a methyl group and a phenyl group. X is an alkenyl group, preferably a vinyl group. In the formula, m and n are integers of m ≧ 1 and n ≧ 0. Preferably, m is an integer of 1 to 100 and n is an integer of 5 to 3000.
Figure 2006213789
Figure 2006213789
Figure 2006213789

[(B)成分]
(B)成分は、モールド樹脂との密着性が良好となる本組成物の特徴を付与する成分である。また、平均単位式:
(RSiO1/2(SiO4/2
で表される三次元網目状構造のオルガノポリシロキサンであり、上式中、Rは同じか、または異なる置換もしくは非置換の一価炭化水素基を表し、a、bはそれぞれ正数を表す。
[Component (B)]
(B) A component is a component which provides the characteristic of this composition from which adhesiveness with mold resin becomes favorable. Average unit formula:
(R 3 SiO 1/2 ) a (SiO 4/2 ) b
In the above formula, R represents the same or different substituted or unsubstituted monovalent hydrocarbon groups, and a and b each represent a positive number.

このような(B)成分の分子量は限定されないが、通常、標準ポリスチレン換算による重量平均分子量(Mw)が200〜20000、特に500〜10000の範囲内であることが好ましい。   Although the molecular weight of such (B) component is not limited, Usually, it is preferable that the weight average molecular weight (Mw) by standard polystyrene conversion exists in the range of 200-20000, especially 500-10000.

Rとしては、例えば、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、tert−ブチル基、ヘキシル基、シクロヘキシル基、オクチル基のようなアルキル基;ビニル基、アリル基、ブテニル基、ペテニル基、ヘキセニル基のようなアルケニル基;フェニル基、トリル基のようなアリール基;ベンジル基、フェニルエチル基のようなアラルキル基;およびこれらの基の水素原子の一部または全部がフッ素、塩素、臭素などのハロゲン原子やシアノ基で置換されているもの、例えばクロロメチル基、ブロモエチル基、トリフルオロプロピル基、シアノエチル基などを挙げることができる。このRは、前記アルキル基、前記アリール基、前記アルケニル基であることが好ましく、特に、メチル基、フェニル基、ビニル基であることが好ましい。これは、フェニル基を有することにより、屈折率が大きく、光透過率が高い硬化物を得ることができるからであり、また、ビニル基を有することにより、剥離強度等の機械的強度が高い硬化物を得ることができるからである。また、上式中、a、bはそれぞれ正数であり、且つa/bは0.2〜3、特に0.3〜2の数であることが好ましい。   R is, for example, an alkyl group such as methyl, ethyl, propyl, isopropyl, butyl, isobutyl, tert-butyl, hexyl, cyclohexyl, octyl; vinyl, allyl, butenyl An alkenyl group such as a group, a petenyl group or a hexenyl group; an aryl group such as a phenyl group or a tolyl group; an aralkyl group such as a benzyl group or a phenylethyl group; and some or all of the hydrogen atoms of these groups are fluorine. And those substituted with a halogen atom such as chlorine or bromine or a cyano group, such as a chloromethyl group, a bromoethyl group, a trifluoropropyl group, and a cyanoethyl group. This R is preferably the alkyl group, the aryl group, or the alkenyl group, and particularly preferably a methyl group, a phenyl group, or a vinyl group. This is because having a phenyl group makes it possible to obtain a cured product having a large refractive index and a high light transmittance, and by having a vinyl group, curing having high mechanical strength such as peel strength is achieved. This is because things can be obtained. In the above formula, a and b are each a positive number, and a / b is preferably 0.2 to 3, particularly 0.3 to 2.

さらに、(B)成分は、ケイ素原子に結合する水酸基を有し、その水酸基量は、400〜5000ppm、特に500〜4000ppmであることが好ましい。400ppmより少ないと、密着性改善等の効果が十分得られず、一方、5000ppmを超えると、硬化速度が低下したり、硬化物が発泡するという悪影響が生じる。このような特定少量の水酸基を導入することによって、本組成物のモールド樹脂に対する密着性を高めることができる。このような水酸基量を定量する方法としては、例えば、KF法(カールフィッシャー法)等が好ましい。   Furthermore, (B) component has a hydroxyl group couple | bonded with a silicon atom, and it is preferable that the amount of hydroxyl groups is 400-5000 ppm, especially 500-4000 ppm. If the amount is less than 400 ppm, the effect of improving the adhesion cannot be sufficiently obtained. On the other hand, if the amount exceeds 5000 ppm, the curing rate is lowered or the cured product is foamed. By introducing such a specific small amount of hydroxyl groups, the adhesion of the present composition to the mold resin can be enhanced. As a method for quantifying the amount of such a hydroxyl group, for example, the KF method (Karl Fischer method) is preferable.

このような(B)成分としては、例えば、平均単位式:
[(CHSiO1/2[SiO4/2
(式中、x、yはそれぞれ正数であり、x/yは0.2〜3の数である。)で表されるオルガノポリシロキサン、平均単位式:
[C(CHSiO1/2][(CHSiO1/2][SiO4/2
(式中、p、q、rはそれぞれ正数であり、p+q/rは0.2〜3の数であり、
且つp/qは0.005〜10の数である。)で表されるオルガノポリシロキサン、平均単位式:
[CH=CH(CHSiO1/2][(CHSiO1/2][SiO4/2
(式中、s、t、uはそれぞれ正数であり、s+t/uは0.2〜3の数であり、
且つs/tは0.005〜10の数である。)で表されるオルガノポリシロキサン等が挙げられる。
Examples of such a component (B) include an average unit formula:
[(CH 3 ) 3 SiO 1/2 ] x [SiO 4/2 ] y
(Wherein x and y are positive numbers, and x / y is a number of 0.2 to 3, respectively), an average unit formula:
[C 6 H 5 (CH 3 ) 2 SiO 1/2 ] p [(CH 3 ) 3 SiO 1/2 ] q [SiO 4/2 ] r
(In the formula, p, q and r are each a positive number, and p + q / r is a number of 0.2 to 3,
And p / q is a number of 0.005-10. ) Organopolysiloxane represented by the average unit formula:
[CH 2 = CH (CH 3 ) 2 SiO 1/2 ] s [(CH 3 ) 3 SiO 1/2 ] t [SiO 4/2 ] u
(In the formula, s, t, and u are positive numbers, and s + t / u is a number from 0.2 to 3,
And s / t is a number of 0.005-10. ) And the like.

このような三次元網目状構造のオルガノポリシロキサンは、SiO4/2単位を有するオルガノシロキサンとR3SiO1/2(Rは一価炭化水素基)単位を有するオルガノシロキサンとをR3SiO1/2単位/SiO4/2単位=0.2〜3となるモル比で組み合わせ、これを酸、アルカリ等の存在下で共加水分解することにより容易に得ることができる。 Such an organopolysiloxane having a three-dimensional network structure is obtained by combining an organosiloxane having SiO 4/2 units and an organosiloxane having R 3 SiO 1/2 (R is a monovalent hydrocarbon group) unit with R 3 SiO 1. / 2 units / SiO 4/2 units = combined in a molar ratio of 0.2 to 3, and can be easily obtained by cohydrolyzing in the presence of an acid, an alkali or the like.

(B)成分の含有量は、(A)成分と(B)成分との合計量(100重量%)に対し10〜80重量%、好ましくは20〜70重量%である。(B)成分の含有量が上記範囲の下限未満であると、硬化物とモールド樹脂との密着力が低下する傾向があるからであり、一方、上記範囲の上限を超えると、取り扱い作業性が低下する傾向があるからである。   (B) Content of a component is 10 to 80 weight% with respect to the total amount (100 weight%) of (A) component and (B) component, Preferably it is 20 to 70 weight%. This is because if the content of the component (B) is less than the lower limit of the above range, the adhesion between the cured product and the mold resin tends to decrease, whereas if the upper limit of the above range is exceeded, handling workability is increased. This is because it tends to decrease.

(B)成分は、1種単独で、又は2種以上を組み合わせて使用することができる。   (B) A component can be used individually by 1 type or in combination of 2 or more types.

[(C)成分]
(C)成分は、(A)成分及び(B)成分とヒドロシリル化反応により組成物を硬化させる架橋剤として作用する。1分子中に平均2個以上のケイ素原子に結合した水素原子(SiH基)を有する必要があり、このSiH基を好ましくは3個以上有することが望ましい。ケイ素原子に結合した水素原子は、分子鎖末端のケイ素原子に結合していても、また分子鎖中間のケイ素原子のいずれかに結合していてもよく、さらには両方に結合していてもよい。
[Component (C)]
The component (C) acts as a crosslinking agent for curing the composition by a hydrosilylation reaction with the components (A) and (B). It is necessary to have an average of 2 or more hydrogen atoms (SiH groups) bonded to silicon atoms in one molecule, and preferably 3 or more SiH groups. The hydrogen atom bonded to the silicon atom may be bonded to the silicon atom at the end of the molecular chain, may be bonded to one of the silicon atoms in the middle of the molecular chain, or may be bonded to both. .

(C)成分としては、平均組成式:
SiO[4−(d+e)]/2
で示されるものが用いられる。上記式中、Rは、脂肪族不飽和炭化水素基を除く、置換または非置換の1価炭化水素基である。
As the component (C), an average composition formula:
R 2 d H e SiO [4- (d + e)] / 2
What is shown by is used. In the above formula, R 2 is a substituted or unsubstituted monovalent hydrocarbon group excluding an aliphatic unsaturated hydrocarbon group.

としては、例えば、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、tert−ブチル基、ヘキシル基、シクロヘキシル基、オクチル基のようなアルキル基;フェニル基、トリル基のようなアリール基;ベンジル基、フェニルエチル基のようなアラルキル基;およびこれらの基の水素原子の一部または全部がフッ素、塩素、臭素などのハロゲン原子やシアノ基で置換されているもの、例えばクロロメチル基、ブロモエチル基、トリフルオロプロピル基、シアノエチル基などを挙げることができる。これらのうちで、炭素数が1〜4のものが好適であり、合成のし易さ、コストの面からアルキル基が好ましい。メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、tert-ブチル基であることが好ましく、特に、メチル基であることが好ましい。 R 2 includes, for example, an alkyl group such as a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a tert-butyl group, a hexyl group, a cyclohexyl group, and an octyl group; Aryl groups such as; aralkyl groups such as benzyl and phenylethyl groups; and those in which some or all of the hydrogen atoms in these groups are substituted with halogen atoms such as fluorine, chlorine, bromine or cyano groups, A chloromethyl group, a bromoethyl group, a trifluoropropyl group, a cyanoethyl group, etc. can be mentioned. Of these, those having 1 to 4 carbon atoms are suitable, and an alkyl group is preferred from the viewpoint of ease of synthesis and cost. A methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, and a tert-butyl group are preferable, and a methyl group is particularly preferable.

また、上記式中、d、eは、それぞれ、0.5≦d≦2、0<e≦2、0.5<d+e≦3を満足する正数であり、好ましくは、0.6≦d≦1.9、0.01≦e≦1.0、0.6≦d+e≦2.8を満足する正数である。   In the above formula, d and e are positive numbers satisfying 0.5 ≦ d ≦ 2, 0 <e ≦ 2, and 0.5 <d + e ≦ 3, respectively, preferably 0.6 ≦ d It is a positive number satisfying ≦ 1.9, 0.01 ≦ e ≦ 1.0, and 0.6 ≦ d + e ≦ 2.8.

(C)成分の分子構造としては、直鎖状、分岐鎖状、環状あるいは三次元網目状構造のいずれであってもよい。   The molecular structure of component (C) may be any of linear, branched, cyclic or three-dimensional network structure.

(C)成分としては、例えば、1,1,3,3-テトラメチルジシロキサン、メチルハイドロジェンシクロポリシロキサン、メチルハイドロジェンシロキサン・ジメチルシロキサン環状共重合体、両末端トリメチルシロキシ基封鎖メチルハイドロジェンポリシロキサン、両末端トリメチルシロキシ基封鎖ジメチルシロキサン・メチルハイドロジェンシロキサン共重合体、両末端ジメチルハイドロジェンシロキシ基封鎖ジメチルポリシロキサンなどが挙げられる。   Examples of the component (C) include 1,1,3,3-tetramethyldisiloxane, methylhydrogencyclopolysiloxane, methylhydrogensiloxane / dimethylsiloxane cyclic copolymer, and trimethylsiloxy group-blocked methylhydrogen at both ends. Examples thereof include polysiloxane, a trimethylsiloxy group-capped dimethylsiloxane / methylhydrogensiloxane copolymer, and a both-end dimethylhydrogensiloxy group-capped dimethylpolysiloxane.

(C)成分の25℃における粘度は、1〜1000mPa・sであることが好ましく、特に10〜500mPa・sであることが好ましい。   The viscosity of component (C) at 25 ° C. is preferably 1 to 1000 mPa · s, and particularly preferably 10 to 500 mPa · s.

(C)成分の配合量は、(A)成分および(B)成分中のアルケニル基の合計1モルに対して、(C)成分のSi−H基が0.2〜5モルとなる量とすることが好ましく、さらに、0.3〜4モルとなる量とすることが好ましい。0.2モル未満では、十分な架橋が得られず、5モルを越えると未反応のSi−H結合が残存し、物性が不安定となるためである。   The blending amount of the component (C) is such that the Si—H group of the component (C) is 0.2 to 5 moles with respect to a total of 1 mole of the alkenyl groups in the component (A) and the component (B). It is preferable that the amount be 0.3 to 4 mol. When the amount is less than 0.2 mol, sufficient crosslinking cannot be obtained, and when the amount exceeds 5 mol, unreacted Si-H bonds remain and the physical properties become unstable.

[(D)成分]
(D)成分は、(A)成分および(B)成分中のアルケニル基と(C)成分のハイドロジェン基を反応させて、硬化物を得るための硬化用触媒である。
[(D) component]
The component (D) is a curing catalyst for obtaining a cured product by reacting the alkenyl group in the components (A) and (B) with the hydrogen group in the component (C).

(D)成分としては、例えば、白金黒、塩化第2白金、塩化白金酸、塩化白金酸と一価アルコールとの反応物、塩化白金酸とオレフィン類やビニルシロキサンとの錯体、白金ビスアセトアセテート等の白金系触媒、パラジウム系触媒、ロジウム系触媒などの白金族金属触媒が挙げられる。   Examples of the component (D) include platinum black, secondary platinum chloride, chloroplatinic acid, a reaction product of chloroplatinic acid and a monohydric alcohol, a complex of chloroplatinic acid with olefins and vinyl siloxane, and platinum bisacetoacetate. And platinum group metal catalysts such as platinum-based catalysts, palladium-based catalysts and rhodium-based catalysts.

(D)成分の配合量は、硬化に必要な量であれば特に限定されず、(A)成分と(C)成分の種類、所望の硬化速度などに応じて適宜調整することができる。通常、金属原子に換算して、得られる組成物の合計重量に対して、0.1〜1000ppmの範囲とすればよく、特に0.5〜500ppmの範囲が好ましい。
以上の(A)〜(D)成分から、本発明の硬化性オルガノポリシロキサン組成物が構成される。
The blending amount of the component (D) is not particularly limited as long as it is an amount necessary for curing, and can be appropriately adjusted according to the types of the components (A) and (C), a desired curing rate, and the like. Usually, it may be in the range of 0.1 to 1000 ppm, particularly in the range of 0.5 to 500 ppm, based on the total weight of the composition obtained in terms of metal atoms.
The curable organopolysiloxane composition of the present invention is composed of the above components (A) to (D).

このようにして得られる本組成物は液状であることが好ましく、25℃における粘度が、100〜1000000mPa・s、特に500〜1000000mPa・sであることが好ましい。   The composition thus obtained is preferably in a liquid state, and preferably has a viscosity at 25 ° C. of 100 to 1,000,000 mPa · s, particularly 500 to 1,000,000 mPa · s.

なお、本組成物には、その他任意の成分として、2−メチル−3−ブチン−2−オール、3,5−ジメチル−1−ヘキシン−3−オール、2−フェニル−3−ブチン−2−オール等のアルキンアルコール;3−メチル−3−ペンテン−1−イン、3,5−ジメチル−3−ヘキセン−1−イン等のエンイン化合物;1,3,5,7−テトラメチル−1,3,5,7−テトラビニルシクロテトラシロキサン、1,3,5,7−テトラメチル−1,3,5,7−テトラヘキセニルシクロテトラシロキサン、ベンゾトリアゾール等の反応抑制剤を含有してもよい。配合量は、(A)〜(D)成分の合計量100重量部あたり、通常10重量部以下である。   In addition, this composition contains 2-methyl-3-butyn-2-ol, 3,5-dimethyl-1-hexyn-3-ol, 2-phenyl-3-butyn-2-ol as other optional components. Alkyne alcohols such as all; Enyne compounds such as 3-methyl-3-penten-1-yne and 3,5-dimethyl-3-hexen-1-yne; 1,3,5,7-tetramethyl-1,3 , 5,7-tetravinylcyclotetrasiloxane, 1,3,5,7-tetramethyl-1,3,5,7-tetrahexenylcyclotetrasiloxane, benzotriazole, or other reaction inhibitors may be contained. The amount is usually 10 parts by weight or less per 100 parts by weight of the total amount of the components (A) to (D).

その他任意の成分として、本組成物の硬化物の透明性に悪影響を及ぼさない範囲の量で、通常使用されている各種の添加剤を配合してもよい。添加剤としては、例えば、ヒュームシリカ、ヒュームド二酸化チタン等の補強性無機フィラー;ケイ酸カルシウム、二酸化チタン、酸化第二鉄、カーボンブラック等の非補強性無機フィラー等が挙げられる。   As other optional components, various commonly used additives may be blended in amounts that do not adversely affect the transparency of the cured product of the present composition. Examples of the additive include reinforcing inorganic fillers such as fumed silica and fumed titanium dioxide; non-reinforcing inorganic fillers such as calcium silicate, titanium dioxide, ferric oxide, and carbon black.

また、本組成物には、接着性を付与するためにシランカップリング剤を添加してもよい。シランカップリング剤としては、例えば、エポキシ基含有アルコキシシラン、Si−H含有アルコキシシラン、ビニル基含有アルコキシシラン等が挙げられる。   In addition, a silane coupling agent may be added to the composition in order to impart adhesiveness. Examples of the silane coupling agent include epoxy group-containing alkoxysilanes, Si—H-containing alkoxysilanes, vinyl group-containing alkoxysilanes, and the like.

本組成物は、室温もしくは加熱により硬化が進行するが、迅速に硬化させるためには加熱することが好ましい。この加熱温度としては、50〜200℃の範囲内であることが好ましい。このようにして本組成物を硬化して得られる硬化物はゴム状およびゲル状であり、あるいは可撓性を有するレジン状で、高い透明性を有する。   The composition is cured at room temperature or by heating, but is preferably heated for rapid curing. The heating temperature is preferably in the range of 50 to 200 ° C. Thus, the hardened | cured material obtained by hardening | curing this composition is rubber-like and a gel form, or it is the resin form which has flexibility, and has high transparency.

このような本組成物の硬化物は、LED(発光ダイオード)、フォトカプラー、レーザ素子、光結合素子等の高い透明性を必要とする発光素子や高電圧を必要とする半導体素子の保護剤、下地又は外装用の封止剤等として好適である。   Such a cured product of the present composition is a protective agent for light emitting elements that require high transparency, such as LEDs (light emitting diodes), photocouplers, laser elements, optical coupling elements, and semiconductor elements that require high voltage, It is suitable as a sealant for a base or exterior.

次に、本発明の半導体装置について説明する。
本発明の半導体装置は、上述した硬化性オルガノポリシロキサン組成物の硬化物により半導体素子が封止されていることを特徴とする。
Next, the semiconductor device of the present invention will be described.
The semiconductor device of the present invention is characterized in that a semiconductor element is sealed with a cured product of the curable organopolysiloxane composition described above.

図1は、本発明の半導体装置の概略構成を示す断面図である。すなわち、同図に示す半導体装置(フォトカプラー)は、半導体素子1がリードフレーム2上にダイボンドされ、さらにボンディングワイヤ3により図示していない別のリードフレーム2にワイヤボンドされている。また、この半導体素子1と対向するように受光用の半導体素子4がリードフレーム5上にダイボンディングされ、さらにボンディングワイヤ6により図示していない別のリードフレーム5にワイヤボンディングされている。これらの半導体素子の間は、本発明の硬化性オルガノポリシロキサン組成物の硬化物7により被覆されている。さらに、この硬化物7により被覆された半導体素子はエポキシ樹脂等のモールド樹脂8により樹脂封止されている。   FIG. 1 is a cross-sectional view showing a schematic configuration of a semiconductor device of the present invention. That is, in the semiconductor device (photocoupler) shown in the figure, the semiconductor element 1 is die-bonded on the lead frame 2 and further wire-bonded to another lead frame 2 not shown by the bonding wire 3. Further, the semiconductor element 4 for light reception is die-bonded on the lead frame 5 so as to face the semiconductor element 1 and further wire-bonded to another lead frame 5 (not shown) by a bonding wire 6. These semiconductor elements are covered with a cured product 7 of the curable organopolysiloxane composition of the present invention. Furthermore, the semiconductor element covered with the cured product 7 is resin-sealed with a mold resin 8 such as an epoxy resin.

封止方法としては、半導体素子1をリードフレーム2にダイボンドし、次いで、この半導体素子1と図示していない別のリードフレーム2をボンディングワイヤ3(Au線)によりワイヤボンドする。同様に、この半導体素子1と対向する位置に受光用の半導体素子4をリードフレーム5上にダイボンドし、次いで、この半導体素子4と図示していない別のリードフレーム5をボンディングワイヤ6(Au線)によりワイヤボンドする。続いて、これらの半導体素子の間に本発明の硬化性オルガノポリシロキサン組成物を充填した後、50〜200℃に加熱することにより硬化させる。その後、前記硬化性オルガノポリシロキサン組成物の硬化物7により被覆された半導体素子をエポキシ樹脂等のモールド樹脂8により樹脂封止する。   As a sealing method, the semiconductor element 1 is die-bonded to the lead frame 2, and then another lead frame 2 (not shown) is wire-bonded with a bonding wire 3 (Au wire). Similarly, a semiconductor element 4 for light reception is die-bonded on a lead frame 5 at a position facing the semiconductor element 1, and then another lead frame 5 (not shown) is bonded to the bonding element 6 (Au wire). ) To wire bond. Subsequently, the curable organopolysiloxane composition of the present invention is filled between these semiconductor elements, and then cured by heating to 50 to 200 ° C. Thereafter, the semiconductor element covered with the cured product 7 of the curable organopolysiloxane composition is resin-sealed with a mold resin 8 such as an epoxy resin.

半導体素子としては、ダイオード、トランジスタ、サイリスタ、固体撮像素子、モノリシックIC、さらにはハイブリッドIC中の半導体素子が挙げられる。   Examples of semiconductor elements include diodes, transistors, thyristors, solid-state imaging elements, monolithic ICs, and semiconductor elements in hybrid ICs.

また、半導体装置としては、ダイオード、発光ダイオード(LED)、トランジスタ、サイリスタ、フォトカプラー、電荷結合素子(CCD)、モノリシックIC、ハイブリッドIC、LSI、VLSIが例示され、好ましくは、発光ダイオード(LED)、フォトカプラー等が挙げられる。   Examples of the semiconductor device include a diode, a light emitting diode (LED), a transistor, a thyristor, a photocoupler, a charge coupled device (CCD), a monolithic IC, a hybrid IC, an LSI, and a VLSI, and preferably a light emitting diode (LED). And photocouplers.

以下に本発明の実施例および比較例を示す。各例中、部は重量部、実施例中の粘度は、25℃において測定した値である。
硬化性オルガノポリシロキサン組成物の硬化物の特性は、次のようにして測定した。
Examples of the present invention and comparative examples are shown below. In each example, parts are parts by weight, and the viscosity in the examples is a value measured at 25 ° C.
The properties of the cured product of the curable organopolysiloxane composition were measured as follows.

[硬化物の剥離強度]
硬化性オルガノポリシロキサン組成物を150×150×1mmの金型に注入し、100℃で1時間加熱し、シート状の硬化物を作成した。これを室温まで冷却した後、150×500×0.1mmのポリエチレンシートに張り合わせて、密着させた。このポリエチレンシートと該硬化物をオートグラフ(島津製作所社製)にセットし、測定温度23℃、剥離速度100mm/min、剥離角度180度の条件で測定した。
[Peel strength of cured product]
The curable organopolysiloxane composition was poured into a 150 × 150 × 1 mm mold and heated at 100 ° C. for 1 hour to prepare a sheet-like cured product. After cooling this to room temperature, it was stuck to a polyethylene sheet of 150 × 500 × 0.1 mm and adhered. This polyethylene sheet and the cured product were set in an autograph (manufactured by Shimadzu Corporation) and measured under the conditions of a measurement temperature of 23 ° C., a peeling rate of 100 mm / min, and a peeling angle of 180 degrees.

また、半導体装置の信頼性を次のようにして評価した。   Further, the reliability of the semiconductor device was evaluated as follows.

[半導体装置の信頼性の評価方法]
図1で示したフォトカプラーを次のようにして作成した。すなわち、Ga−Al−As化合物系の半導体素子1をリードフレーム2に導電性ペーストによりダイボンドし、次いで、この半導体素子1とリードフレーム2をボンディングワイヤ(Au線)3によりワイヤボンドした。この半導体素子1と対向する位置に受光用の半導体素子4をリードフレーム5上に導電性ペーストを用いてダイボンドし、次いで、半導体素子4と別のリードフレーム5をボンディングワイヤ6(Au線)により、ワイヤボンドした。これらの半導体素子の間を硬化性オルガノポリシロキサン組成物により充填した後、150℃の乾燥機で1時間加熱して硬化させた。次に、硬化性オルガノポリシロキサン組成物の硬化物7により被覆されたこれらの半導体素子をモールド樹脂8(エポキシ樹脂)で樹脂封止した。
[Method for evaluating reliability of semiconductor device]
The photocoupler shown in FIG. 1 was prepared as follows. That is, the Ga—Al—As compound semiconductor element 1 was die-bonded to the lead frame 2 with a conductive paste, and then the semiconductor element 1 and the lead frame 2 were wire-bonded with a bonding wire (Au wire) 3. The light receiving semiconductor element 4 is die-bonded on the lead frame 5 using a conductive paste at a position facing the semiconductor element 1, and then the semiconductor element 4 and another lead frame 5 are bonded by a bonding wire 6 (Au wire). Wire-bonded. The space between these semiconductor elements was filled with a curable organopolysiloxane composition, and then cured by heating for 1 hour in a dryer at 150 ° C. Next, these semiconductor elements covered with the cured product 7 of the curable organopolysiloxane composition were resin-sealed with a mold resin 8 (epoxy resin).

このようにして10個のフォトカプラーを作製した。これらのフォトカプラーについて、冷熱サイクル試験(1サイクル:−50℃×30分+150℃×1時間)を1000サイクル行った。試験後の硬化物7の割れ、および硬化物7とモールド樹脂8との界面の剥離を100倍の顕微鏡を用いて観察した。割れ、剥離したフォトカプラーを不良とし、不良個数を調べた。   In this way, 10 photocouplers were produced. These photocouplers were subjected to 1000 cycles of a cooling / heating cycle test (1 cycle: −50 ° C. × 30 minutes + 150 ° C. × 1 hour). Cracks of the cured product 7 after the test and peeling of the interface between the cured product 7 and the mold resin 8 were observed using a 100 × microscope. The cracked and peeled photocoupler was regarded as defective, and the number of defects was examined.

[合成例1]
16%塩酸100重量部、水143重量部、SiO4/2単位源となる26%SiO含有オルガノシロキサン(ケイ酸ソーダ)100重量部、IPA100部を仕込み、(CHSiO1/2単位源となるトリメチルクロロシラン50重量部にキシレン50重量部を加えて滴下し、加熱還流を2時間行った。その後、分液を行い下層の水を取り除き、さらに加熱により脱溶を行い60%オルガノポリシロキサンのキシレン溶液を得た。
[Synthesis Example 1]
100% by weight of 16% hydrochloric acid, 143 parts by weight of water, 100 parts by weight of 26% SiO 2 -containing organosiloxane (sodium silicate) serving as a SiO 4/2 unit source, and 100 parts of IPA are charged, and (CH 3 ) 3 SiO 1/2 50 parts by weight of xylene was added dropwise to 50 parts by weight of trimethylchlorosilane serving as a unit source, followed by heating under reflux for 2 hours. Thereafter, liquid separation was performed to remove water in the lower layer, and further desolubilization was performed by heating to obtain a 60% organopolysiloxane xylene solution.

このようにして得られたオルガノポリシロキサン(B−1)に(A)成分のビニル基含有オルガノポリシロキサンを加えて、脱水および脱溶を十分に行い(A)成分との混合物を得た。この混合物と用いた(A)成分をカールフィッシャー法(KF法)によりそれぞれの水酸基量を測定し、該混合物の水酸基量から(A)成分の水酸基量を差し引いて、得られたオルガノポリシロキサン(B−1)の水酸基量を測定した。この水酸基量は1400ppmであった。   The vinyl group-containing organopolysiloxane (A) component was added to the organopolysiloxane (B-1) thus obtained, and the mixture was sufficiently dehydrated and desolubilized to obtain a mixture with the component (A). The component (A) used with this mixture was measured for the amount of each hydroxyl group by the Karl Fischer method (KF method), and the amount of hydroxyl group of the component (A) was subtracted from the amount of hydroxyl group in the mixture to obtain the organopolysiloxane ( The hydroxyl amount of B-1) was measured. The amount of this hydroxyl group was 1400 ppm.

なお、水酸基量の測定は、カールフィッシャー法自動水分測定装置(KF−06型、三菱化成(株)製)で、KF試薬(カールフィッシャー試薬SS、(株)エーピーアイコーポレーション製)を使用し、脱水溶剤(CM50mlとML10ml、(株)エーピーアイコーポレーション製)を用いて水分量を測定し、この水分量から水酸基量を計算することによって測定を行った。   In addition, the measurement of the amount of hydroxyl groups is a Karl Fischer method automatic moisture measuring device (KF-06 type, manufactured by Mitsubishi Kasei Co., Ltd.) using a KF reagent (Karl Fischer reagent SS, manufactured by API Corporation), The amount of water was measured using a dehydrating solvent (CM 50 ml and ML 10 ml, manufactured by API Corporation), and the hydroxyl amount was calculated from the amount of water.

[合成例2]
(CHSiO1/2単位源となるトリメチルクロロシラン35部、C(CHSiO1/2単位源となるジメチルフェニルクロロシラン5重量部、SiO4/2単位源となるケイ酸ソーダ100重量部とした以外は合成例1と同様にして水酸基含有のポリオルガノシロキサンを得た。このポリオルガノシロキサン(B−2)について、KF法により測定した水酸基量は3300ppmであった。
[Synthesis Example 2]
(CH 3 ) 3 SiO 1/2 unit source 35 parts trimethylchlorosilane 35 parts C 6 H 5 (CH 3 ) 2 SiO 1/2 unit source dimethylphenylchlorosilane 5 parts by weight, SiO 4/2 unit source A hydroxyl group-containing polyorganosiloxane was obtained in the same manner as in Synthesis Example 1 except that 100 parts by weight of sodium silicate was used. About this polyorganosiloxane (B-2), the amount of hydroxyl groups measured by KF method was 3300 ppm.

[合成例3]
(CHSiO1/2単位源となるトリメチルクロロシラン55部、CH=CH(CHSiO1/2単位源となるビニルジメチルクロロシラン2部、SiO4/2単位源となるケイ酸ソーダ100部とした以外は合成例1と同様にして水酸基含有のポリオルガノシロキサンを得た。このポリオルガノシロキサン(B−3)について、KF法により測定した水酸基量は700ppmであった。
[Synthesis Example 3]
55 parts of trimethylchlorosilane as a source of (CH 3 ) 3 SiO 1/2 unit, 2 parts of vinyldimethylchlorosilane as a source of CH 2 ═CH (CH 3 ) 2 SiO 1/2, and silicon as a source of SiO 4/2 unit A hydroxyl-containing polyorganosiloxane was obtained in the same manner as in Synthesis Example 1 except that 100 parts of acid soda was used. About this polyorganosiloxane (B-3), the amount of hydroxyl groups measured by KF method was 700 ppm.

[実施例1]
粘度500cPであり、分子鎖両末端がビニルジメチルシロキシ基で封鎖された直鎖状のビニル基含有オルガノポリシロキサン(A−1)50重量部、式:
[(CHSiO1/21.07[SiO4/2
で表され、合成例1で得られたオルガノポリシロキサン(B−1)(標準ポリスチレン換算の重量平均分子量1900)50重量部、粘度30mPa・sであり、式:
(CH1.640.45SiO(1.91/2)
で表されるオルガノハイドロジェンポリシロキサン(ケイ素原子結合全基中のケイ素原子結合水素原子の含有量50モル%)2.4重量部、白金触媒(白金原子として10ppm)を混合して攪拌し、硬化性オルガノポリシロキサン組成物を調整した。
[Example 1]
50 parts by weight of a linear vinyl group-containing organopolysiloxane (A-1) having a viscosity of 500 cP and having both molecular chain ends blocked with vinyldimethylsiloxy groups, the formula:
[(CH 3 ) 3 SiO 1/2 ] 1.07 [SiO 4/2 ]
And 50 parts by weight of an organopolysiloxane (B-1) (weight average molecular weight 1900 in terms of standard polystyrene) obtained in Synthesis Example 1, and a viscosity of 30 mPa · s, the formula:
(CH 3 ) 1.64 H 0.45 SiO (1.91 / 2)
2.4 parts by weight of an organohydrogenpolysiloxane represented by (content of silicon atom-bonded hydrogen atoms in all silicon atom-bonded groups: 50 mol%) and platinum catalyst (10 ppm as platinum atoms) are mixed and stirred. A curable organopolysiloxane composition was prepared.

この硬化性オルガノポリシロキサン組成物の硬化物の特性を測定し、結果を表1に示した。また、この硬化性オルガノポリシロキサン組成物を用いてフォトカプラーを作成し、この半導体装置の信頼性の評価結果を表1に示した。   The properties of the cured product of this curable organopolysiloxane composition were measured and the results are shown in Table 1. Further, a photocoupler was prepared using this curable organopolysiloxane composition, and the reliability evaluation results of this semiconductor device are shown in Table 1.

[実施例2]
粘度1000cPであり、下記式:

Figure 2006213789
[Example 2]
The viscosity is 1000 cP and the following formula:
Figure 2006213789

で表される直鎖状のビニル基含有オルガノポリシロキサン(A−2)(ケイ素原子結合フェニル基含有率5モル%)50重量部、式:
[C(CHSiO1/20.02[(CHSiO1/21.05[SiO4/2
で表され、合成例2で得られたオルガノポリシロキサン(B−2)(標準ポリスチレン換算の重量平均分子量4100)50重量部、粘度25mPa・sであり、式:
(CH1.640.45SiO(1.91/2)
で表されるオルガノハイドロジェンポリシロキサン(ケイ素原子結合水素原子の含有量50モル%)2.4重量部、白金触媒(白金原子として10ppm)を混合して攪拌し、硬化性オルガノポリシロキサン組成物を調整した。
50 parts by weight of a linear vinyl group-containing organopolysiloxane (A-2) (silicon atom-bonded phenyl group content 5 mol%) represented by the formula:
[C 6 H 5 (CH 3 ) 2 SiO 1/2 ] 0.02 [(CH 3 ) 3 SiO 1/2 ] 1.05 [SiO 4/2 ]
And 50 parts by weight of the organopolysiloxane (B-2) (weight average molecular weight 4100 in terms of standard polystyrene) obtained in Synthesis Example 2, and a viscosity of 25 mPa · s.
(CH 3 ) 1.64 H 0.45 SiO (1.91 / 2)
And 2.4 parts by weight of an organohydrogenpolysiloxane (content of silicon atom-bonded hydrogen atoms 50 mol%) and a platinum catalyst (10 ppm as platinum atoms) are mixed and stirred to obtain a curable organopolysiloxane composition. Adjusted.

この硬化性オルガノポリシロキサン組成物の硬化物の特性を測定し、結果を表1に示した。また、この硬化性オルガノポリシロキサン組成物を用いてフォトカプラーを作成し、この半導体装置の信頼性の評価結果を表1に示した。   The properties of the cured product of this curable organopolysiloxane composition were measured and the results are shown in Table 1. Further, a photocoupler was prepared using this curable organopolysiloxane composition, and the reliability evaluation results of this semiconductor device are shown in Table 1.

[実施例3]
粘度500cPであり、分子鎖両末端がビニルジメチルシロキシ基で封鎖された直鎖状のビニル基含有オルガノポリシロキサン(A−1)50重量部、式:
[(CH=CH)(CHSiO1/20.04[(CHSiO1/21.17[SiO4/2
で表され、合成例3で得られたオルガノポリシロキサン(B−3)(標準ポリスチレン換算の重量平均分子量1200)50重量部、式:
(CH1.640.45SiO(1.91/2)
で表されるオルガノハイドロジェンポリシロキサン(ケイ素原子結合水素原子の含有量50モル%)3.0重量部、白金触媒(白金原子として10ppm)を混合して攪拌し、硬化性オルガノポリシロキサン組成物を調整した。
[Example 3]
50 parts by weight of a linear vinyl group-containing organopolysiloxane (A-1) having a viscosity of 500 cP and having both molecular chain ends blocked with vinyldimethylsiloxy groups, the formula:
[(CH 2 = CH) (CH 3 ) 2 SiO 1/2 ] 0.04 [(CH 3 ) 3 SiO 1/2 ] 1.17 [SiO 4/2 ]
50 parts by weight of the organopolysiloxane (B-3) (weight average molecular weight 1200 in terms of standard polystyrene) obtained in Synthesis Example 3 and the formula:
(CH 3 ) 1.64 H 0.45 SiO (1.91 / 2)
A curable organopolysiloxane composition comprising 3.0 parts by weight of an organohydrogenpolysiloxane (content of silicon atom-bonded hydrogen atoms 50 mol%) and a platinum catalyst (10 ppm as platinum atoms) mixed and stirred. Adjusted.

この硬化性オルガノポリシロキサン組成物の硬化物の特性を測定し、結果を表1に示した。また、この硬化性オルガノポリシロキサン組成物を用いてフォトカプラーを作成し、この半導体装置の信頼性の評価結果を表1に示した。   The properties of the cured product of this curable organopolysiloxane composition were measured and the results are shown in Table 1. Further, a photocoupler was prepared using this curable organopolysiloxane composition, and the reliability evaluation results of this semiconductor device are shown in Table 1.

[実施例4]
粘度500cPであり、一分子中に平均0.5個のケイ素原子結合ビニル基を有し、分子鎖末端にビニルジメチルシロキシ基を有する直鎖状のビニル基含有オルガノポリシロキサン(A−4)50重量部、式:
[(CHSiO1/21.07[SiO4/2
で表され、合成例1で得られたオルガノポリシロキサン(B−1)(標準ポリスチレン換算の重量平均分子量1900)50重量部、粘度30mPa・sであり、式:
(CH1.640.45SiO(1.91/2)
で表されるオルガノハイドロジェンポリシロキサン(ケイ素原子結合全基中のケイ素原子結合水素原子の含有量50モル%)1.2重量部、白金触媒(白金原子として10ppm)を混合して攪拌し、硬化性オルガノポリシロキサン組成物を調整した。
[Example 4]
A linear vinyl group-containing organopolysiloxane (A-4) 50 having a viscosity of 500 cP, an average of 0.5 silicon atom-bonded vinyl groups in one molecule, and a vinyldimethylsiloxy group at the molecular chain terminal. Parts by weight, formula:
[(CH 3 ) 3 SiO 1/2 ] 1.07 [SiO 4/2 ]
And 50 parts by weight of an organopolysiloxane (B-1) (weight average molecular weight 1900 in terms of standard polystyrene) obtained in Synthesis Example 1, and a viscosity of 30 mPa · s, the formula:
(CH 3 ) 1.64 H 0.45 SiO (1.91 / 2)
1.2 parts by weight of an organohydrogenpolysiloxane represented by (content of silicon atom-bonded hydrogen atoms in all silicon atom-bonded groups: 50 mol%) and platinum catalyst (10 ppm as platinum atoms) are mixed and stirred. A curable organopolysiloxane composition was prepared.

この硬化性オルガノポリシロキサン組成物の硬化物の特性を測定し、結果を表1に示した。また、この硬化性オルガノポリシロキサン組成物を用いてフォトカプラーを作成し、この半導体装置の信頼性の評価結果を表1に示した。   The properties of the cured product of this curable organopolysiloxane composition were measured and the results are shown in Table 1. Further, a photocoupler was prepared using this curable organopolysiloxane composition, and the reliability evaluation results of this semiconductor device are shown in Table 1.

[比較例1]
粘度500cPであり、分子鎖両末端がビニルジメチルシロキシ基で封鎖された直鎖状のビニル基含有オルガノポリシロキサン(A−1)50重量部、粘度10000cPであり、分子鎖両末端がビニルジメチルシロキシ基で封鎖された直鎖状のビニル基含有オルガノポリシロキサン(A−3)50重量部、粘度30mPa・sであり、式:
(CH1.640.45SiO(1.91/2)
で表されるオルガノハイドロジェンポリシロキサン(ケイ素原子結合水素原子の含有量50モル%)2.6重量部、白金触媒(白金原子として10ppm)を混合して攪拌し、組成物を調整した。
[Comparative Example 1]
50 parts by weight of a linear vinyl group-containing organopolysiloxane (A-1) having a viscosity of 500 cP and both ends of the molecular chain blocked with vinyldimethylsiloxy groups, a viscosity of 10000 cP, and both ends of the molecular chain are vinyldimethylsiloxy The linear vinyl group-containing organopolysiloxane (A-3) blocked with a group is 50 parts by weight, and the viscosity is 30 mPa · s.
(CH 3 ) 1.64 H 0.45 SiO (1.91 / 2)
2.6 parts by weight of an organohydrogenpolysiloxane (content of silicon-bonded hydrogen atoms 50 mol%) and a platinum catalyst (10 ppm as platinum atoms) were mixed and stirred to prepare a composition.

この硬化性オルガノポリシロキサン組成物の硬化物の特性を測定し、結果を表1に示した。また、この硬化性オルガノポリシロキサン組成物を用いてフォトカプラーを作成し、この半導体装置の信頼性の評価結果を表1に示した。   The properties of the cured product of this curable organopolysiloxane composition were measured and the results are shown in Table 1. Further, a photocoupler was prepared using this curable organopolysiloxane composition, and the reliability evaluation results of this semiconductor device are shown in Table 1.

[比較例2]
粘度500cPであり、分子鎖両末端がビニルジメチルシロキシ基で封鎖された直鎖状のビニル基含有オルガノポリシロキサン(A−1)95重量部、式:
[(CHSiO1/21.07[SiO4/2
で表され、合成例1で得られたオルガノポリシロキサン(B−1)(標準ポリスチレン換算の重量平均分子量1900)5重量部、粘度30mPa・sであり、式:
(CH1.640.45SiO(1.91/2)
で表されるオルガノハイドロジェンポリシロキサン(ケイ素原子結合水素原子の含有量50モル%)4.6重量部、白金触媒(白金原子として10ppm)を混合して攪拌し、組成物を調整した。
[Comparative Example 2]
95 parts by weight of a linear vinyl group-containing organopolysiloxane (A-1) having a viscosity of 500 cP and having both ends of the molecular chain blocked with vinyldimethylsiloxy groups, the formula:
[(CH 3 ) 3 SiO 1/2 ] 1.07 [SiO 4/2 ]
5 parts by weight of the organopolysiloxane (B-1) (weight average molecular weight 1900 in terms of standard polystyrene) obtained in Synthesis Example 1 and a viscosity of 30 mPa · s, the formula:
(CH 3 ) 1.64 H 0.45 SiO (1.91 / 2)
And 4.6 parts by weight of an organohydrogenpolysiloxane (content of silicon atom-bonded hydrogen atoms 50 mol%) and a platinum catalyst (10 ppm as platinum atoms) were mixed and stirred to prepare a composition.

この硬化性オルガノポリシロキサン組成物の硬化物の特性を測定し、結果を表1に示した。また、この硬化性オルガノポリシロキサン組成物を用いてフォトカプラーを作成し、この半導体装置の信頼性の評価結果を表1に示した。

Figure 2006213789
The properties of the cured product of this curable organopolysiloxane composition were measured and the results are shown in Table 1. Further, a photocoupler was prepared using this curable organopolysiloxane composition, and the reliability evaluation results of this semiconductor device are shown in Table 1.
Figure 2006213789

本発明の半導体装置の一例を示す断面図である。It is sectional drawing which shows an example of the semiconductor device of this invention.

符号の説明Explanation of symbols

1…半導体素子、2…リードフレーム、3…ボンディングワイヤ、4…半導体素子、5…リードフレーム、6…ボンディングワイヤ、7…硬化物、8…モールド樹脂   DESCRIPTION OF SYMBOLS 1 ... Semiconductor element, 2 ... Lead frame, 3 ... Bonding wire, 4 ... Semiconductor element, 5 ... Lead frame, 6 ... Bonding wire, 7 ... Hardened | cured material, 8 ... Mold resin

Claims (5)

(A)一分子中に平均0.2個以上のケイ素原子結合アルケニル基を有するオルガノポリシロキサン、
(B)平均単位式:
(RSiO1/2(SiO4/2
(式中、Rは、同じか、または異なる置換もしくは非置換の一価炭化水素基であり、a、bはそれぞれ正数であり、且つa/bは0.2〜3の数である。)で表され、且つケイ素原子に結合する水酸基量が400〜5000ppmである三次元網目状構造のオルガノポリシロキサン {前記(A)成分と(B)成分との合計量に対して10〜80重量%}、
(C)一分子中に少なくとも2個のケイ素原子結合水素原子を有するオルガノハイドロジェンポリシロキサン {前記(A)成分中のケイ素原子結合アルケニル基と前記(B)成分中のケイ素原子結合アルケニル基との合計1モルに対して、本成分中のケイ素原子結合水素原子が0.2〜5モルとなる量}、
及び
(D)ヒドロシリル化反応用触媒 (触媒量)
を有することを特徴とする硬化性オルガノポリシロキサン組成物。
(A) an organopolysiloxane having an average of 0.2 or more silicon-bonded alkenyl groups in one molecule;
(B) Average unit formula:
(R 3 SiO 1/2 ) a (SiO 4/2 ) b
(Wherein R is the same or different substituted or unsubstituted monovalent hydrocarbon group, a and b are each a positive number, and a / b is a number of 0.2 to 3. ) And an organopolysiloxane having a three-dimensional network structure in which the amount of hydroxyl groups bonded to silicon atoms is 400 to 5000 ppm {10 to 80 weights based on the total amount of the components (A) and (B) %},
(C) Organohydrogenpolysiloxane having at least two silicon atom-bonded hydrogen atoms in one molecule {Silicon atom-bonded alkenyl group in component (A) and silicon atom-bonded alkenyl group in component (B) In an amount of 0.2 to 5 mol of silicon-bonded hydrogen atoms in this component}
And (D) catalyst for hydrosilylation reaction (catalytic amount)
A curable organopolysiloxane composition characterized by comprising:
前記(A)成分が、一般式:
Figure 2006213789
(式中、Rは、脂肪族不飽和結合を含まない同じか、又は異なる非置換もしくは置換の一価炭化水素基であり、Xはアルケニル基であり、nは5〜3000の整数である。)で表されるオルガノポリシロキサンであることを特徴とする請求項1に記載の硬化性オルガノポリシロキサン組成物。
The component (A) has the general formula:
Figure 2006213789
Wherein R 1 is the same or different unsubstituted or substituted monovalent hydrocarbon group not containing an aliphatic unsaturated bond, X is an alkenyl group, and n is an integer of 5 to 3000. The curable organopolysiloxane composition according to claim 1, which is an organopolysiloxane represented by the formula:
前記(B)成分は、平均単位式:
[C(CHSiO1/2][(CHSiO1/2][SiO4/2
(式中、p、q、rはそれぞれ正数であり、p+q/rは0.2〜3の数であり、
且つp/qは0.005〜10の数である。)で表され、且つケイ素原子に結合する水酸基量が400〜5000ppmである三次元網目状構造のオルガノポリシロキサンであることを特徴とする請求項1又は2に記載の硬化性オルガノポリシロキサン組成物。
The component (B) is an average unit formula:
[C 6 H 5 (CH 3 ) 2 SiO 1/2 ] p [(CH 3 ) 3 SiO 1/2 ] q [SiO 4/2 ] r
(In the formula, p, q and r are each a positive number, and p + q / r is a number of 0.2 to 3,
And p / q is a number of 0.005-10. The curable organopolysiloxane composition according to claim 1, wherein the curable organopolysiloxane composition is a three-dimensional network organopolysiloxane having a hydroxyl group content of 400 to 5000 ppm. .
前記(C)成分が、平均組成式:
SiO[4−(d+e)]/2
(式中、Rは、脂肪族不飽和炭化水素基を除く、置換または非置換の1価炭化水素基であり、d、eは、それぞれ、0.5≦d≦2、0<e≦2、0.5<d+e≦3を満足する正数であり、好ましくは、0.6≦d≦1.9、0.01≦e≦1.0、0.6≦d+e≦2.8を満足する正数である。)で表され、且つ一分子中に少なくとも2個のケイ素原子結合水素原子を有するオルガノハイドロジェンポリシロキサンであることを特徴とする請求項1乃至3のいずれか1項に記載の硬化性オルガノポリシロキサン組成物。
The component (C) is an average composition formula:
R 2 d H e SiO [4- (d + e)] / 2
(Wherein R 2 is a substituted or unsubstituted monovalent hydrocarbon group excluding an aliphatic unsaturated hydrocarbon group, and d and e are 0.5 ≦ d ≦ 2, 0 <e ≦, respectively. 2, 0.5 <d + e ≦ 3, preferably 0.6 ≦ d ≦ 1.9, 0.01 ≦ e ≦ 1.0, 0.6 ≦ d + e ≦ 2.8. 4. An organohydrogenpolysiloxane represented by the formula (1) and having at least two silicon-bonded hydrogen atoms in one molecule. The curable organopolysiloxane composition described in 1.
請求項1乃至4のいずれか1項に記載の硬化性オルガノポリシロキサン組成物の硬化物によって半導体素子が封止されていることを特徴とする半導体装置。   A semiconductor device, wherein a semiconductor element is sealed with a cured product of the curable organopolysiloxane composition according to claim 1.
JP2005026349A 2005-02-02 2005-02-02 Curable organopolysiloxane composition and semiconductor device Active JP4841846B2 (en)

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JP2007191504A (en) * 2006-01-17 2007-08-02 Shin Etsu Chem Co Ltd Curable silicone rubber composition and cured material of the same
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US10040924B2 (en) 2015-11-02 2018-08-07 Shin-Etsu Chemical Co., Ltd. Adhesion promoter, addition curable organopolysiloxane resin composition and semiconductor apparatus
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US11879060B2 (en) 2018-02-07 2024-01-23 Dow Toray Co., Ltd. Curable silicone composition, cured product thereof, and optical semiconductor device
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